CN111394712A - 双层石英工艺室结构 - Google Patents
双层石英工艺室结构 Download PDFInfo
- Publication number
- CN111394712A CN111394712A CN202010344692.7A CN202010344692A CN111394712A CN 111394712 A CN111394712 A CN 111394712A CN 202010344692 A CN202010344692 A CN 202010344692A CN 111394712 A CN111394712 A CN 111394712A
- Authority
- CN
- China
- Prior art keywords
- furnace
- tube
- furnace tube
- flange
- process chamber
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000000034 method Methods 0.000 title claims abstract description 56
- 239000010453 quartz Substances 0.000 title claims abstract description 31
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 title claims abstract description 31
- 238000010438 heat treatment Methods 0.000 claims abstract description 17
- 238000007789 sealing Methods 0.000 claims description 37
- 238000005086 pumping Methods 0.000 claims description 7
- 230000000149 penetrating effect Effects 0.000 claims description 2
- 239000010410 layer Substances 0.000 abstract description 10
- 239000011229 interlayer Substances 0.000 abstract description 8
- 230000001681 protective effect Effects 0.000 abstract description 5
- 230000002035 prolonged effect Effects 0.000 abstract description 4
- 239000000376 reactant Substances 0.000 abstract description 4
- 239000007789 gas Substances 0.000 description 27
- 238000004519 manufacturing process Methods 0.000 description 6
- 230000008602 contraction Effects 0.000 description 5
- 238000000576 coating method Methods 0.000 description 4
- 239000000498 cooling water Substances 0.000 description 3
- 230000035882 stress Effects 0.000 description 3
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 3
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 2
- 239000000463 material Substances 0.000 description 2
- 229910052710 silicon Inorganic materials 0.000 description 2
- 239000010703 silicon Substances 0.000 description 2
- 239000002356 single layer Substances 0.000 description 2
- 235000012431 wafers Nutrition 0.000 description 2
- 230000032683 aging Effects 0.000 description 1
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 1
- 230000000740 bleeding effect Effects 0.000 description 1
- 238000006243 chemical reaction Methods 0.000 description 1
- 239000011248 coating agent Substances 0.000 description 1
- 238000004891 communication Methods 0.000 description 1
- 230000008021 deposition Effects 0.000 description 1
- 238000009826 distribution Methods 0.000 description 1
- 239000011261 inert gas Substances 0.000 description 1
- 238000002347 injection Methods 0.000 description 1
- 239000007924 injection Substances 0.000 description 1
- 238000013021 overheating Methods 0.000 description 1
- 239000001301 oxygen Substances 0.000 description 1
- 229910052760 oxygen Inorganic materials 0.000 description 1
- 231100000572 poisoning Toxicity 0.000 description 1
- 230000000607 poisoning effect Effects 0.000 description 1
- 230000008092 positive effect Effects 0.000 description 1
- 238000009827 uniform distribution Methods 0.000 description 1
Images
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/455—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for introducing gases into reaction chamber or for modifying gas flows in reaction chamber
Landscapes
- Chemical & Material Sciences (AREA)
- General Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
Abstract
Description
Claims (10)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CN202010344692.7A CN111394712A (zh) | 2020-04-27 | 2020-04-27 | 双层石英工艺室结构 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CN202010344692.7A CN111394712A (zh) | 2020-04-27 | 2020-04-27 | 双层石英工艺室结构 |
Publications (1)
Publication Number | Publication Date |
---|---|
CN111394712A true CN111394712A (zh) | 2020-07-10 |
Family
ID=71426673
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
CN202010344692.7A Pending CN111394712A (zh) | 2020-04-27 | 2020-04-27 | 双层石英工艺室结构 |
Country Status (1)
Country | Link |
---|---|
CN (1) | CN111394712A (zh) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN112382553A (zh) * | 2020-11-16 | 2021-02-19 | 拉普拉斯(无锡)半导体科技有限公司 | 一种双层反应腔体结构 |
CN112553595A (zh) * | 2020-12-08 | 2021-03-26 | 深圳市捷佳伟创新能源装备股份有限公司 | 反应室以及炉管设备 |
Citations (20)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR19980017370U (ko) * | 1996-09-23 | 1998-07-06 | 김영환 | 저압 화학 기상 증착장치용 반응로 |
CN201124233Y (zh) * | 2007-10-18 | 2008-10-01 | 河南科技大学 | 一种制备易氧化金属非晶薄带用石英喷嘴 |
US20100162958A1 (en) * | 2008-12-25 | 2010-07-01 | Hitachi-Kokusai Electric Inc. | Substrate processing apparatus and reaction tube for processing substrate |
CN201522194U (zh) * | 2009-10-30 | 2010-07-07 | 中芯国际集成电路制造(上海)有限公司 | 具有内外压力平衡功能的垂直式加热炉 |
CN201826013U (zh) * | 2010-09-29 | 2011-05-11 | 中国科学院苏州纳米技术与纳米仿生研究所 | 用于化学气相沉积设备中的气体墙结构 |
CN102492934A (zh) * | 2011-12-26 | 2012-06-13 | 彭鹏 | 一种制备石墨烯薄膜的装置、方法及所得石墨烯薄膜 |
CN202756798U (zh) * | 2012-08-13 | 2013-02-27 | 合肥荣业新材料设备有限公司 | 一种炉管炉膛双管密封结构 |
CN102965724A (zh) * | 2012-12-18 | 2013-03-13 | 福建福晶科技股份有限公司 | 一种双层石英管密封结构提拉法单晶炉 |
US20130276707A1 (en) * | 2012-04-23 | 2013-10-24 | Asm Ip Holding B.V. | Vertical furnace with circumferentially distributed gas inlet system |
CN103626381A (zh) * | 2012-08-27 | 2014-03-12 | 浙江富通光纤技术有限公司 | 一种用于烧结玻璃松散体的石墨炉 |
CN106323923A (zh) * | 2015-07-08 | 2017-01-11 | 北京瑞利分析仪器有限公司 | 双区温控屏蔽式石英炉原子化器 |
CN109207961A (zh) * | 2018-10-23 | 2019-01-15 | 电子科技大学 | 一种管式炉及利用该管式炉制备石墨烯/六方氮化硼异质结的方法 |
CN109338333A (zh) * | 2018-11-30 | 2019-02-15 | 湖南红太阳光电科技有限公司 | 一种管式lpcvd真空反应室 |
CN208588247U (zh) * | 2018-08-02 | 2019-03-08 | 绵阳力洋英伦科技有限公司 | 一种高温真空炉管悬浮式密封装置 |
CN109595941A (zh) * | 2019-01-16 | 2019-04-09 | 上海上创超导科技有限公司 | 一种金属炉管热胀变形可控的高温热处理管式炉 |
CN110042370A (zh) * | 2019-05-22 | 2019-07-23 | 湖南红太阳光电科技有限公司 | 一种管式pecvd设备的反应室结构 |
CN110528084A (zh) * | 2018-12-03 | 2019-12-03 | 北京北方华创微电子装备有限公司 | 低压扩散炉的密封系统及密封方法 |
CN110562983A (zh) * | 2019-09-04 | 2019-12-13 | 哈尔滨工业大学(威海) | 高性能吸波材料的高效制备装置及制备方法 |
CN210261955U (zh) * | 2019-06-26 | 2020-04-07 | 无锡松煜科技有限公司 | 一种高温气相沉积炉体结构 |
CN212610887U (zh) * | 2020-04-27 | 2021-02-26 | 青岛赛瑞达电子装备股份有限公司 | 双层石英工艺室结构 |
-
2020
- 2020-04-27 CN CN202010344692.7A patent/CN111394712A/zh active Pending
Patent Citations (20)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR19980017370U (ko) * | 1996-09-23 | 1998-07-06 | 김영환 | 저압 화학 기상 증착장치용 반응로 |
CN201124233Y (zh) * | 2007-10-18 | 2008-10-01 | 河南科技大学 | 一种制备易氧化金属非晶薄带用石英喷嘴 |
US20100162958A1 (en) * | 2008-12-25 | 2010-07-01 | Hitachi-Kokusai Electric Inc. | Substrate processing apparatus and reaction tube for processing substrate |
CN201522194U (zh) * | 2009-10-30 | 2010-07-07 | 中芯国际集成电路制造(上海)有限公司 | 具有内外压力平衡功能的垂直式加热炉 |
CN201826013U (zh) * | 2010-09-29 | 2011-05-11 | 中国科学院苏州纳米技术与纳米仿生研究所 | 用于化学气相沉积设备中的气体墙结构 |
CN102492934A (zh) * | 2011-12-26 | 2012-06-13 | 彭鹏 | 一种制备石墨烯薄膜的装置、方法及所得石墨烯薄膜 |
US20130276707A1 (en) * | 2012-04-23 | 2013-10-24 | Asm Ip Holding B.V. | Vertical furnace with circumferentially distributed gas inlet system |
CN202756798U (zh) * | 2012-08-13 | 2013-02-27 | 合肥荣业新材料设备有限公司 | 一种炉管炉膛双管密封结构 |
CN103626381A (zh) * | 2012-08-27 | 2014-03-12 | 浙江富通光纤技术有限公司 | 一种用于烧结玻璃松散体的石墨炉 |
CN102965724A (zh) * | 2012-12-18 | 2013-03-13 | 福建福晶科技股份有限公司 | 一种双层石英管密封结构提拉法单晶炉 |
CN106323923A (zh) * | 2015-07-08 | 2017-01-11 | 北京瑞利分析仪器有限公司 | 双区温控屏蔽式石英炉原子化器 |
CN208588247U (zh) * | 2018-08-02 | 2019-03-08 | 绵阳力洋英伦科技有限公司 | 一种高温真空炉管悬浮式密封装置 |
CN109207961A (zh) * | 2018-10-23 | 2019-01-15 | 电子科技大学 | 一种管式炉及利用该管式炉制备石墨烯/六方氮化硼异质结的方法 |
CN109338333A (zh) * | 2018-11-30 | 2019-02-15 | 湖南红太阳光电科技有限公司 | 一种管式lpcvd真空反应室 |
CN110528084A (zh) * | 2018-12-03 | 2019-12-03 | 北京北方华创微电子装备有限公司 | 低压扩散炉的密封系统及密封方法 |
CN109595941A (zh) * | 2019-01-16 | 2019-04-09 | 上海上创超导科技有限公司 | 一种金属炉管热胀变形可控的高温热处理管式炉 |
CN110042370A (zh) * | 2019-05-22 | 2019-07-23 | 湖南红太阳光电科技有限公司 | 一种管式pecvd设备的反应室结构 |
CN210261955U (zh) * | 2019-06-26 | 2020-04-07 | 无锡松煜科技有限公司 | 一种高温气相沉积炉体结构 |
CN110562983A (zh) * | 2019-09-04 | 2019-12-13 | 哈尔滨工业大学(威海) | 高性能吸波材料的高效制备装置及制备方法 |
CN212610887U (zh) * | 2020-04-27 | 2021-02-26 | 青岛赛瑞达电子装备股份有限公司 | 双层石英工艺室结构 |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN112382553A (zh) * | 2020-11-16 | 2021-02-19 | 拉普拉斯(无锡)半导体科技有限公司 | 一种双层反应腔体结构 |
CN112553595A (zh) * | 2020-12-08 | 2021-03-26 | 深圳市捷佳伟创新能源装备股份有限公司 | 反应室以及炉管设备 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
CN212610887U (zh) | 双层石英工艺室结构 | |
CN109338333B (zh) | 一种管式lpcvd真空反应室 | |
US10204805B2 (en) | Thin heated substrate support | |
CN111394712A (zh) | 双层石英工艺室结构 | |
CN102216656B (zh) | 用于处理室的密封装置 | |
CN202989354U (zh) | 高温减压扩散炉 | |
CN102410633A (zh) | 一种防爆立式电加热系统 | |
BRPI0708450A2 (pt) | dispositivo de vedação para entrada de gás num forno ou congêneres | |
CN111074239A (zh) | 一种lpcvd双材质真空反应室 | |
TW201529493A (zh) | 用於液體及真空之防漏供給的具有同心管之模具組合件 | |
JP2022117984A5 (zh) | ||
CN211595791U (zh) | 一种lpcvd双层炉管结构 | |
CN218296690U (zh) | 真空炉体及真空设备 | |
CN209819883U (zh) | 用于晶圆干燥工艺中的高纯氮气加热器 | |
KR101307137B1 (ko) | 반도체 제조장치 배출라인의 파우더 고착 방지장치 | |
CN103017337B (zh) | 一种高频感应流体加热器 | |
CN215163103U (zh) | 反应室以及炉管设备 | |
CN211013388U (zh) | 一种中速柴油机气缸盖泵压工具 | |
CN101463935A (zh) | 一种高温系统组件密封方法及其密封件 | |
CN219586178U (zh) | 一种lpcvd炉管组件和lpcvd设备 | |
CN218207258U (zh) | 扩散泵装置及真空系统 | |
CN220432969U (zh) | 一种炉体结构及热炉 | |
KR101853128B1 (ko) | 공정 챔버용 급배기 모듈 | |
CN220892972U (zh) | 一种炉管装置 | |
CN218095895U (zh) | 一种六流程立式低压加热器 |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
PB01 | Publication | ||
PB01 | Publication | ||
SE01 | Entry into force of request for substantive examination | ||
SE01 | Entry into force of request for substantive examination | ||
TA01 | Transfer of patent application right | ||
TA01 | Transfer of patent application right |
Effective date of registration: 20220310 Address after: 214000 workshop and office space on the south side of the first floor of Plant No. 4, precision machinery industrial park, Xishan District, Wuxi City, Jiangsu Province Applicant after: Sairuida intelligent electronic equipment (Wuxi) Co.,Ltd. Address before: 266000 f / F, 1022 Beilao Road, Licang District, Qingdao City, Shandong Province Applicant before: QINGDAO SUNRED ELECTRONIC EQUIPMENT Co.,Ltd. |
|
CB02 | Change of applicant information | ||
CB02 | Change of applicant information |
Address after: 214000 workshop and office space on the south side of the first floor of Plant No. 4, precision machinery industrial park, Xishan District, Wuxi City, Jiangsu Province Applicant after: Sairuida Intelligent Electronic Equipment (Wuxi) Co.,Ltd. Address before: 214000 workshop and office space on the south side of the first floor of Plant No. 4, precision machinery industrial park, Xishan District, Wuxi City, Jiangsu Province Applicant before: Sairuida intelligent electronic equipment (Wuxi) Co.,Ltd. |