CN111337543A - Sampling device and sampling test method for resistivity test of polycrystalline silicon ingot - Google Patents
Sampling device and sampling test method for resistivity test of polycrystalline silicon ingot Download PDFInfo
- Publication number
- CN111337543A CN111337543A CN202010286366.5A CN202010286366A CN111337543A CN 111337543 A CN111337543 A CN 111337543A CN 202010286366 A CN202010286366 A CN 202010286366A CN 111337543 A CN111337543 A CN 111337543A
- Authority
- CN
- China
- Prior art keywords
- silicon ingot
- sampling
- resistivity
- groove
- polycrystalline silicon
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 238000005070 sampling Methods 0.000 title claims abstract description 165
- 238000012360 testing method Methods 0.000 title claims abstract description 93
- 229910021420 polycrystalline silicon Inorganic materials 0.000 title claims abstract description 53
- 238000010998 test method Methods 0.000 title claims abstract description 15
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 claims abstract description 134
- 229910052710 silicon Inorganic materials 0.000 claims abstract description 134
- 239000010703 silicon Substances 0.000 claims abstract description 134
- 238000000034 method Methods 0.000 claims abstract description 32
- 230000008569 process Effects 0.000 claims abstract description 9
- 238000005192 partition Methods 0.000 claims description 17
- 230000009471 action Effects 0.000 claims description 7
- 239000000049 pigment Substances 0.000 claims description 7
- 239000011229 interlayer Substances 0.000 claims 1
- 238000009826 distribution Methods 0.000 abstract description 7
- 230000002159 abnormal effect Effects 0.000 abstract description 5
- 230000000694 effects Effects 0.000 abstract description 3
- 238000003466 welding Methods 0.000 abstract description 3
- 239000003550 marker Substances 0.000 description 8
- 238000013461 design Methods 0.000 description 6
- 230000008859 change Effects 0.000 description 5
- 238000005520 cutting process Methods 0.000 description 4
- 238000010586 diagram Methods 0.000 description 4
- 235000012431 wafers Nutrition 0.000 description 4
- 230000009286 beneficial effect Effects 0.000 description 3
- 238000005259 measurement Methods 0.000 description 3
- 238000012544 monitoring process Methods 0.000 description 3
- 239000003086 colorant Substances 0.000 description 2
- 238000000605 extraction Methods 0.000 description 2
- 238000005266 casting Methods 0.000 description 1
- 238000011161 development Methods 0.000 description 1
- 230000007613 environmental effect Effects 0.000 description 1
- 238000002474 experimental method Methods 0.000 description 1
- 239000003973 paint Substances 0.000 description 1
- 239000002994 raw material Substances 0.000 description 1
- 230000008685 targeting Effects 0.000 description 1
- 235000013619 trace mineral Nutrition 0.000 description 1
- 239000011573 trace mineral Substances 0.000 description 1
Images
Classifications
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N27/00—Investigating or analysing materials by the use of electric, electrochemical, or magnetic means
- G01N27/02—Investigating or analysing materials by the use of electric, electrochemical, or magnetic means by investigating impedance
- G01N27/04—Investigating or analysing materials by the use of electric, electrochemical, or magnetic means by investigating impedance by investigating resistance
- G01N27/041—Investigating or analysing materials by the use of electric, electrochemical, or magnetic means by investigating impedance by investigating resistance of a solid body
Landscapes
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Electrochemistry (AREA)
- Physics & Mathematics (AREA)
- Health & Medical Sciences (AREA)
- Life Sciences & Earth Sciences (AREA)
- Analytical Chemistry (AREA)
- Biochemistry (AREA)
- General Health & Medical Sciences (AREA)
- General Physics & Mathematics (AREA)
- Immunology (AREA)
- Pathology (AREA)
- Testing Or Measuring Of Semiconductors Or The Like (AREA)
Abstract
Description
技术领域technical field
本发明属于光伏行业多晶硅锭性能测试领域。更具体地,本发明涉及一种用于多晶硅锭电阻率测试的抽样装置及抽样测试方法。The invention belongs to the field of performance testing of polycrystalline silicon ingots in photovoltaic industry. More specifically, the present invention relates to a sampling device and a sampling test method for resistivity testing of polycrystalline silicon ingots.
背景技术Background technique
目前光伏行业发展迅速,对以往的G4、G5锭已经无法适应发展需要,为降低成本,行业内以G6、G7锭为主,且铸锭的质量以硅片效率作为评价硅片质量的重要依据,硅锭电阻率分布趋势及标准范围对效率影响至关重要,对多晶硅锭的电阻率性能监控要建立起来,采用合适的抽样取点方法进行测试。At present, the photovoltaic industry is developing rapidly, and the previous G4 and G5 ingots cannot meet the development needs. In order to reduce costs, G6 and G7 ingots are mainly used in the industry, and the quality of the ingots is based on the wafer efficiency as an important basis for evaluating the quality of wafers. , The resistivity distribution trend and standard range of silicon ingots are very important to the efficiency. The resistivity performance monitoring of polycrystalline silicon ingots should be established, and the appropriate sampling point method should be used for testing.
现有的测试抽样方法往往是随机拿取剖开后的硅锭块进行取样,没有固定的抽样方法,无法有效控制变量以便在多次测试中缩小因取样方法不同带来的误差;对于取样后的硅锭的电阻率测试,现有技术往往是采用在硅锭表面随机取点进行测试的方法。现有的抽样方案随意性较大,不能准确反应出整个锭的电阻率趋势和范围,对铸锭质量的把控方向不清晰,缺少数据支撑,不能准确的判定硅锭/硅片的效率波动影响,对铸锭的原材料的投入影响性无法准确判断,电阻率性能是铸锭品质及硅片效率的重要指标之一,对硅块多次使用无法计算铸锭工艺中的微量元素。The existing testing and sampling methods are often to randomly take the cut silicon ingots for sampling. There is no fixed sampling method, and the variables cannot be effectively controlled so as to reduce the errors caused by different sampling methods in multiple tests; For the resistivity test of the silicon ingot, the prior art often adopts the method of randomly picking points on the surface of the silicon ingot for testing. The existing sampling plan is very random, cannot accurately reflect the resistivity trend and range of the entire ingot, the control direction of the ingot quality is unclear, lacks data support, and cannot accurately determine the efficiency fluctuation of silicon ingots/wafers The impact on the input of raw materials for ingots cannot be accurately judged. The resistivity performance is one of the important indicators of ingot quality and silicon wafer efficiency. It is impossible to calculate trace elements in the ingot casting process after repeated use of silicon blocks.
因此,设计一种固定的、科学的抽样和测试取点方法,以及相应配套的抽样装置,就显得十分必要了。Therefore, it is very necessary to design a fixed and scientific method of sampling and testing points, as well as the corresponding sampling device.
发明内容SUMMARY OF THE INVENTION
本发明的目的是提供一种用于多晶硅锭电阻率测试的抽样装置及抽样测试方法,通过对多晶硅锭电阻率抽样测试的方法进行规定和固化,并设计相应的抽样装置配套使用;在多晶硅锭测试过程中监控电阻率值的大小和分布,准确有效的将硅锭异常部分进行反馈并去除不合格部分,以达到保证多晶硅锭的电性能质量稳定的效果。The purpose of the present invention is to provide a sampling device and a sampling test method for the resistivity test of polycrystalline silicon ingots. Monitor the size and distribution of the resistivity value during the test, accurately and effectively feed back the abnormal part of the silicon ingot and remove the unqualified part, so as to ensure the stable electrical performance and quality of the polycrystalline silicon ingot.
为了实现上述的技术特征,本发明采用的技术方案是:一种用于多晶硅锭电阻率测试的抽样装置,它包括取样板,所述取样板为n*n个硅锭槽焊接成的正方形结构;所述硅锭槽为表面开口的中空矩形体结构;取样板的所有硅锭槽表面开口方向相同。In order to realize the above technical features, the technical solution adopted in the present invention is: a sampling device for resistivity testing of polycrystalline silicon ingots, which includes a sampling plate, and the sampling plate is a square structure formed by welding n*n silicon ingot grooves ; The silicon ingot groove is a hollow rectangular structure with an open surface; all the silicon ingot grooves of the sampling plate have the same opening direction on the surface.
所述取样板中硅锭槽的尺寸由所测试多晶硅锭的尺寸确定;硅锭槽内部的尺寸与多晶硅锭的尺寸相同。The size of the silicon ingot groove in the sample plate is determined by the size of the tested polycrystalline silicon ingot; the size of the inside of the silicon ingot groove is the same as that of the polycrystalline silicon ingot.
所述取样板一条对角线上的硅锭槽为抽样槽,抽样槽外表面涂覆颜料,所涂颜料与其余硅锭槽的表面颜色不同。The silicon ingot groove on a diagonal line of the sampling plate is a sampling groove, and the outer surface of the sampling groove is coated with pigment, and the color of the coated pigment is different from the surface color of the remaining silicon ingot grooves.
所述抽样槽内部连接有隔板,隔板与抽样槽底板平行;隔板与抽样槽底板之间形成中空的夹层结构。A partition is connected inside the sampling tank, and the partition is parallel to the bottom plate of the sampling tank; a hollow sandwich structure is formed between the partition plate and the bottom plate of the sampling tank.
所述夹层结构内设置有定位装置,定位装置与抽样槽底板连接。A positioning device is arranged in the sandwich structure, and the positioning device is connected with the bottom plate of the sampling tank.
所述定位装置的数量为五个,五个定位装置成一条直线,位于抽样槽底板侧边缘的中线上;其中靠近抽样槽底板两端的定位装置与抽样槽底板的两侧边缘相距10mm;其余三个定位装置将中间的长度均分为四等份。The number of the positioning devices is five, and the five positioning devices form a straight line and are located on the midline of the side edge of the bottom plate of the sampling tank; wherein the positioning devices near the two ends of the bottom plate of the sampling tank are 10 mm away from the edges on both sides of the bottom plate of the sampling tank; the remaining three Each positioning device divides the length in the middle into four equal parts.
所述定位装置包括中空圆柱体结构的限位筒,限位筒连接于抽样槽底板;限位筒内连接有弹簧,弹簧一端连接有顶杆。The positioning device comprises a limiting cylinder with a hollow cylindrical structure, the limiting cylinder is connected to the bottom plate of the sampling tank; a spring is connected in the limiting cylinder, and one end of the spring is connected with an ejector rod.
所述顶杆顶端穿过隔板表面预留的孔洞,伸入抽样槽内部;顶杆顶端连接有记号笔头。The top end of the ejector rod passes through the hole reserved on the surface of the partition plate and extends into the interior of the sampling slot; the top end of the ejector rod is connected with a marker tip.
如上所述的一种用于多晶硅锭电阻率测试的抽样装置的抽样测试方法,其特征在于,它包括以下步骤:The above-mentioned sampling test method for a sampling device for resistivity testing of polycrystalline silicon ingots, is characterized in that it comprises the following steps:
S1,将所需测试的多晶硅锭进行剖锭,剖成n*n个硅锭块,然后按照剖开后对应的位置填入取样板的n*n个硅锭槽中;硅锭规格为G4、G5、G6……Gn对应测试的硅锭块数为4*4、5*5、6*6……n*n块;S1, cut the polycrystalline silicon ingot to be tested, cut it into n*n silicon ingot blocks, and then fill the n*n silicon ingot grooves of the sampling plate according to the corresponding position after cutting; the silicon ingot specification is G4 , G5, G6...Gn corresponds to the number of tested silicon ingots: 4*4, 5*5, 6*6...n*n blocks;
S2,抽出填入对角线上的抽样槽中的硅锭,作为抽取的测试硅锭;S2, extracting the silicon ingot filled in the sampling slot on the diagonal as the extracted test silicon ingot;
S3,抽样槽中的顶杆在弹簧的作用下,压紧填入的硅锭表面,通过顶杆的记号笔头在硅锭表面打上五个电阻率测试的标记点;其中两端的两个标记点分别距离硅锭侧边缘10mm,中间的三个标记点等间距分布;S3, under the action of the spring, the ejector pin in the sampling slot presses the surface of the filled silicon ingot, and marks five marking points for resistivity test on the surface of the silicon ingot through the marker tip of the ejector pin; two marking points at both ends They are 10mm away from the side edge of the silicon ingot, and the three marking points in the middle are equally spaced;
S4,使用电阻率测试装置通过标记的五个标记点对抽取出的待测试硅锭进行电阻率测试,并记录相应数据制成图表。S4, use a resistivity testing device to test the resistivity of the extracted silicon ingot to be tested through the five marked points, and record the corresponding data to make a graph.
一种用于多晶硅锭电阻率测试的抽样装置,它包括取样板,所述取样板为n*n个硅锭槽焊接成的正方形结构;所述硅锭槽为表面开口的中空矩形体结构;取样板的所有硅锭槽表面开口方向相同。该发明通过对多晶硅锭电阻率抽样测试的方法进行规定和固化,并设计相应的抽样装置配套使用;在多晶硅锭测试过程中监控电阻率值的大小和分布,准确有效的将硅锭异常部分进行反馈并去除不合格部分,以达到保证多晶硅锭的电性能质量稳定的效果。A sampling device for resistivity testing of polycrystalline silicon ingots, comprising a sampling plate, wherein the sampling plate is a square structure formed by welding n*n silicon ingot grooves; the silicon ingot groove is a hollow rectangular structure with an open surface; All ingot groove surfaces of the sampling plate have the same opening direction. The invention specifies and solidifies the method for sampling and testing the resistivity of polycrystalline silicon ingots, and designs a corresponding sampling device for use; monitors the size and distribution of the resistivity value during the testing process of polycrystalline silicon ingots, and accurately and effectively measures the abnormal parts of the silicon ingots. Feedback and remove unqualified parts to achieve the effect of ensuring stable electrical performance and quality of polycrystalline silicon ingots.
在优选的方案中,取样板中硅锭槽的尺寸由所测试多晶硅锭的尺寸确定;硅锭槽内部的尺寸与多晶硅锭的尺寸相同。结构简单,使用时,硅锭槽的内部尺寸根据产品线上剖锭后的多晶硅锭的尺寸进行提前铸造,使得多晶硅锭可以恰好置于硅锭槽内部。In a preferred solution, the size of the silicon ingot groove in the sampling plate is determined by the size of the tested polycrystalline silicon ingot; the size of the inside of the silicon ingot groove is the same as that of the polycrystalline silicon ingot. The structure is simple. When in use, the inner size of the silicon ingot groove is cast in advance according to the size of the polycrystalline silicon ingot after ingot slitting on the product line, so that the polycrystalline silicon ingot can be placed inside the silicon ingot groove.
在优选的方案中,取样板一条对角线上的硅锭槽为抽样槽,抽样槽外表面涂覆颜料,所涂颜料与其余硅锭槽的表面颜色不同。结构简单,使用时,选取对角线的硅锭块的抽样方式使得抽取的样品具有充分的代表性,可以均匀的反映整锭中硅块头尾部电阻率的变化,从而针对硅块头尾部电阻率变化趋势进行铸锭质量监控;不同颜色的设计便于操作人员抽取对角线位置的硅锭块。In a preferred solution, the silicon ingot groove on a diagonal line of the sampling plate is a sampling groove, and the outer surface of the sampling groove is coated with pigment, and the color of the coated pigment is different from the surface color of the remaining silicon ingot grooves. The structure is simple. When used, the sampling method of the diagonal silicon ingot is selected to make the sampled sample fully representative, which can evenly reflect the change of the resistivity of the head and tail of the silicon block in the whole ingot. Trend for ingot quality monitoring; different colors are designed to facilitate the extraction of silicon ingots in diagonal positions.
在优选的方案中,抽样槽内部连接有隔板,隔板与抽样槽底板平行;隔板与抽样槽底板之间形成中空的夹层结构;夹层结构内设置有定位装置,定位装置与抽样槽底板连接。结构简单,使用时,抽样槽内部的定位装置用于对硅锭槽表面进行测试位置打点标记,在将硅锭块置于取样板内的过程中即可完成自动标记打点的作业,避免了后续人为测量选取测试点的工序,提高了测试效率。In a preferred solution, a partition is connected inside the sampling tank, and the partition is parallel to the bottom plate of the sampling tank; a hollow sandwich structure is formed between the partition plate and the bottom plate of the sampling tank; a positioning device is arranged in the sandwich structure, and the positioning device is connected to the bottom plate of the sampling tank connect. The structure is simple. When in use, the positioning device inside the sampling tank is used to mark the test position on the surface of the silicon ingot tank, and the automatic marking and marking operation can be completed during the process of placing the silicon ingot in the sampling plate, avoiding the subsequent operation. The process of manually measuring and selecting test points improves the test efficiency.
在优选的方案中,定位装置的数量为五个,五个定位装置成一条直线,位于抽样槽底板侧边缘的中线上;其中靠近抽样槽底板两端的定位装置与抽样槽底板的两侧边缘相距10mm;其余三个定位装置将中间的长度均分为四等份。结构简单,使用时,两端相距10mm的测试点设计利于反应出硅锭头尾部的电阻率分布趋势,中间均分设计的3个测试点规避了因随机取点带来的人为误差,可以分段记录电阻率值,为铸锭管控电阻率性能提供重要数据支撑,提高了测试的准确性。In a preferred solution, the number of positioning devices is five, and the five positioning devices form a straight line and are located on the midline of the side edge of the bottom plate of the sampling slot; wherein the positioning devices close to both ends of the bottom plate of the sampling slot are separated from the edges of both sides of the bottom plate of the sampling slot 10mm; the other three positioning devices divide the length in the middle into four equal parts. The structure is simple. When used, the design of test points with a distance of 10mm at both ends is beneficial to reflect the resistivity distribution trend of the head and tail of the silicon ingot. The 3 test points designed in the middle avoid the human error caused by random selection, and can be divided into The resistivity value is recorded in the segment, which provides important data support for the control of the resistivity performance of the ingot, and improves the accuracy of the test.
在优选的方案中,定位装置包括中空圆柱体结构的限位筒,限位筒连接于抽样槽底板;限位筒内连接有弹簧,弹簧一端连接有顶杆,顶杆顶端穿过隔板表面预留的孔洞,伸入抽样槽内部;顶杆顶端连接有记号笔头。结构简单,使用时,顶杆在弹簧作用下顶端伸出,当硅锭块置入抽样槽内时,在弹簧压力下顶杆顶端的记号笔头在硅锭块表面进行打点定位,同时在压力作用下顶杆缩回夹层结构内,不占用抽样槽内部空间;从而实现便捷的自动打点标记,后续测试电阻率时只需按照硅锭块表面的标记进行测试即可,无需通过测量进行逐个手动标记,规避了重复操作带来的人为误差。In a preferred solution, the positioning device includes a limit cylinder with a hollow cylindrical structure, the limit cylinder is connected to the bottom plate of the sampling tank; a spring is connected in the limit cylinder, one end of the spring is connected with a push rod, and the top end of the push rod passes through the surface of the partition plate The reserved hole extends into the interior of the sampling slot; the top of the ejector rod is connected with a marker tip. The structure is simple. When in use, the top of the ejector sticks out under the action of the spring. When the silicon ingot is placed in the sampling groove, the marker on the top of the ejector pin is positioned on the surface of the silicon ingot under the pressure of the spring. The lower ejector is retracted into the sandwich structure without occupying the internal space of the sampling tank; thus, convenient automatic marking can be realized. When the resistivity is tested subsequently, it is only necessary to test according to the marking on the surface of the silicon ingot, and there is no need to manually mark one by one through measurement. , to avoid human error caused by repeated operations.
在优选的方案中,上述一种用于多晶硅锭电阻率测试的抽样装置的抽样测试方法,其特征在于,它包括以下步骤:In a preferred solution, the above-mentioned sampling test method for a sampling device for resistivity testing of polycrystalline silicon ingots is characterized in that it comprises the following steps:
S1,将所需测试的多晶硅锭进行剖锭,剖成n*n个硅锭块,然后按照剖开后对应的位置填入取样板的n*n个硅锭槽中;硅锭规格为G4、G5、G6……Gn对应测试的硅锭块数为4*4、5*5、6*6……n*n块;S1, cut the polycrystalline silicon ingot to be tested, cut it into n*n silicon ingot blocks, and then fill the n*n silicon ingot grooves of the sampling plate according to the corresponding position after cutting; the silicon ingot specification is G4 , G5, G6...Gn corresponds to the number of tested silicon ingots: 4*4, 5*5, 6*6...n*n blocks;
S2,抽出填入对角线上的抽样槽中的硅锭,作为抽取的测试硅锭;S2, extracting the silicon ingot filled in the sampling slot on the diagonal as the extracted test silicon ingot;
S3,抽样槽中的顶杆在弹簧的作用下,压紧填入的硅锭表面,通过顶杆的记号笔头在硅锭表面打上五个电阻率测试的标记点;其中两端的两个标记点分别距离硅锭侧边缘10mm,中间的三个标记点等间距分布;S3, under the action of the spring, the ejector pin in the sampling slot presses the surface of the filled silicon ingot, and marks five marking points for resistivity test on the surface of the silicon ingot through the marker tip of the ejector pin; two marking points at both ends They are 10mm away from the side edge of the silicon ingot, and the three marking points in the middle are equally spaced;
S4,使用电阻率测试装置通过标记的五个标记点对抽取出的待测试硅锭进行电阻率测试,并记录相应数据制成图表。S4, use a resistivity testing device to test the resistivity of the extracted silicon ingot to be tested through the five marked points, and record the corresponding data to make a graph.
本发明的有益效果是:The beneficial effects of the present invention are:
1,本发明改变了现有技术中每次都采用不同的随机方式的抽样测试方法,将电阻率测试的抽样方法进行了规定和固化,保证每次进行测试抽样时均采用同一种抽样法,避免了因抽样方式不同带来的测试误差,在保证随机性的基础上大幅提高了测试的准确性。1, the present invention has changed the sampling test method that adopts different random methods every time in the prior art, and the sampling method of resistivity test is specified and solidified, so as to ensure that the same sampling method is adopted every time the test sampling is carried out, The test error caused by different sampling methods is avoided, and the test accuracy is greatly improved on the basis of ensuring randomness.
2,本发明采用选取剖锭后对角线硅锭块作为测试样品的抽样测试方法,取样位置具有充分的代表性,可以均匀的反映整锭中硅块头尾部电阻率的变化,从而针对硅块头尾部电阻率变化趋势进行铸锭质量监控。2. The present invention adopts the sampling test method of selecting the diagonal silicon ingots after the ingot is cut as the test sample, and the sampling position is fully representative, which can evenly reflect the change of the resistivity of the head and tail of the silicon ingot in the whole ingot, thereby targeting the head of the silicon ingot. The change trend of the resistivity of the tail is used to monitor the quality of the ingot.
3,本发明改进了现有技术在硅锭块表面随机取5点进行测试的取点方式,改用在硅块表面取5点测试,规定头尾处取点各后延10mm位置测试,中间三点均分剩余长度进行取点测试的固定取点方式;有效保证了测试取点的准确性和均匀性,减少了随意性带来的误差,可以均匀体现分段电阻率值,为铸锭管控电阻率性能提供重要数据支撑,可以准确有效的将硅块异常部分进行反馈并按标准去除不合格部分。3. The present invention improves the method of randomly taking 5 points on the surface of the silicon ingot for testing in the prior art, and uses 5 points on the surface of the silicon ingot for testing. A fixed point-taking method in which the remaining length is divided into three points for the point-taking test; the accuracy and uniformity of the test points are effectively ensured, the errors caused by randomness are reduced, and the segmental resistivity value can be uniformly reflected. Controlling the resistivity performance provides important data support, which can accurately and effectively feed back the abnormal part of the silicon block and remove the unqualified part according to the standard.
4,本发明还设计了配合该抽样测试方法使用的专用抽样设备——由硅锭槽焊接成的取样板;其中取样板中对角线位置的硅锭槽被改进成抽样槽,抽样槽内部设置有提前设置好位置的测试点定位装置,对填入的硅锭块进行电阻率测试点的自动标记,省去了后续人为对硅锭块表面进行测试点选取的工序,规避了多次重复人为操作带来的测量误差,进一步控制了环境变量,提高了电阻率测试的准确性。4. The present invention also designs a special sampling device used in conjunction with the sampling test method - a sampling plate welded from a silicon ingot slot; wherein the silicon ingot slot at the diagonal position in the sampling plate is improved into a sampling slot, and the inside of the sampling slot is improved. A test point positioning device with a pre-set position is provided to automatically mark the resistivity test points of the filled silicon ingots, which saves the subsequent process of manually selecting test points on the surface of the silicon ingots and avoids multiple repetitions. The measurement error caused by human operation further controls the environmental variables and improves the accuracy of the resistivity test.
附图说明Description of drawings
下面结合附图和实施例对本发明作进一步说明。The present invention will be further described below with reference to the accompanying drawings and embodiments.
图1为本发明中抽样槽在取样板中的位置示意图(以G6锭为例);Figure 1 is a schematic diagram of the position of the sampling slot in the sampling plate in the present invention (taking G6 ingot as an example);
图2为本发明中抽样槽的外部结构示意图;Fig. 2 is the external structure schematic diagram of sampling tank in the present invention;
图3为本发明中抽样槽内的定位装置示意图;Fig. 3 is the schematic diagram of the positioning device in the sampling tank in the present invention;
图4为本发明中硅锭块表面选取电阻率测试点的示意图;Fig. 4 is the schematic diagram of selecting resistivity test point on the surface of silicon ingot in the present invention;
图5为本发明中采用固定抽样方法的电阻率测试I-MR控制图;Fig. 5 is the resistivity test I-MR control chart that adopts fixed sampling method in the present invention;
图6为本发明中采用随机抽样方法的电阻率测试I-MR控制图;Fig. 6 adopts the resistivity test I-MR control chart of random sampling method in the present invention;
图中附图标记为:取样板1,硅锭槽2,抽样槽21,隔板3,夹层结构4,定位装置5,限位筒51,弹簧52,顶杆53。The reference numerals in the figure are: sampling
具体实施方式Detailed ways
如图1中,阴影部分表示抽样槽21。In FIG. 1, the hatched portion indicates the
如图1~图4中,一种用于多晶硅锭电阻率测试的抽样装置,它包括取样板1,由于现有常用为G7锭,所述取样板1采用7*7个硅锭槽2焊接成的正方形结构;所述硅锭槽2为表面开口的中空矩形体结构;取样板1的所有硅锭槽2表面开口方向相同。该发明通过对多晶硅锭电阻率抽样测试的方法进行规定和固化,并设计相应的抽样装置配套使用;在多晶硅锭测试过程中监控电阻率值的大小和分布,准确有效的将硅锭异常部分进行反馈并去除不合格部分,以达到保证多晶硅锭的电性能质量稳定的效果。As shown in Figures 1 to 4, a sampling device for resistivity testing of polycrystalline silicon ingots includes a
实施例1:Example 1:
优选的方案中,取样板1中硅锭槽2的尺寸由所测试多晶硅锭的尺寸确定;硅锭槽2内部的尺寸与多晶硅锭的尺寸相同。结构简单,使用时,硅锭槽2的内部尺寸根据产品线上剖锭后的多晶硅锭的尺寸进行提前铸造,使得多晶硅锭可以恰好置于硅锭槽2内部。In a preferred solution, the size of the
优选的方案中,取样板1一条对角线上的硅锭槽2为抽样槽21,抽样槽21外表面涂覆颜料,所涂颜料与其余硅锭槽2的表面颜色不同。结构简单,使用时,选取对角线的硅锭块的抽样方式使得抽取的样品具有充分的代表性,可以均匀的反映整锭中硅块头尾部电阻率的变化,从而针对硅块头尾部电阻率变化趋势进行铸锭质量监控;不同颜色的设计便于操作人员抽取对角线位置的硅锭块。In a preferred solution, a
优选的方案中,抽样槽21内部连接有隔板3,隔板3与抽样槽21底板平行;隔板3与抽样槽21底板之间形成中空的夹层结构4;夹层结构4内设置有定位装置5,定位装置5与抽样槽21底板连接。结构简单,使用时,抽样槽21内部的定位装置5用于对硅锭槽2表面进行测试位置打点标记,在将硅锭块置于取样板1内的过程中即可完成自动标记打点的作业,避免了后续人为测量选取测试点的工序,提高了测试效率。In a preferred solution, a
优选的方案中,定位装置5的数量为五个,五个定位装置5成一条直线,位于抽样槽21底板侧边缘的中线上;其中靠近抽样槽21底板两端的定位装置5与抽样槽21底板的两侧边缘相距10mm;其余三个定位装置5将中间的长度均分为四等份。结构简单,使用时,两端相距10mm的测试点设计利于反应出硅锭头尾部的电阻率分布趋势,中间均分设计的3个测试点规避了因随机取点带来的人为误差,可以分段记录电阻率值,为铸锭管控电阻率性能提供重要数据支撑,提高了测试的准确性。In a preferred solution, the number of
优选的方案中,定位装置5包括中空圆柱体结构的限位筒51,限位筒51连接于抽样槽21底板;限位筒51内连接有弹簧52,弹簧52一端连接有顶杆53,顶杆53顶端穿过隔板3表面预留的孔洞,伸入抽样槽21内部;顶杆53顶端连接有记号笔头。结构简单,使用时,顶杆53在弹簧52作用下顶端伸出,当硅锭块置入抽样槽21内时,在弹簧52压力下顶杆53顶端的记号笔头在硅锭块表面进行打点定位,同时在压力作用下顶杆53缩回夹层结构4内,不占用抽样槽21内部空间;从而实现便捷的自动打点标记,后续测试电阻率时只需按照硅锭块表面的标记进行测试即可,无需通过测量进行逐个手动标记,规避了重复操作带来的人为误差。In a preferred solution, the
优选的方案中,上述一种用于多晶硅锭电阻率测试的抽样装置的抽样测试方法,其特征在于,它包括以下步骤:In a preferred solution, the above-mentioned sampling test method for a sampling device used for resistivity testing of polycrystalline silicon ingots is characterized in that it comprises the following steps:
S1,由于硅锭规格为G4、G5、G6……Gn对应测试的硅锭块数为4*4、5*5、6*6……n*n块;将所需测试的多晶硅锭进行G7剖锭,剖成7*7个硅锭块,然后按照剖开后对应的位置填入取样板1的7*7个硅锭槽2中;S1, since the silicon ingot specifications are G4, G5, G6...Gn, the number of silicon ingots to be tested is 4*4, 5*5, 6*6...n*n blocks; the polycrystalline silicon ingots to be tested are subjected to G7 Cut the ingot, cut it into 7*7 silicon ingot blocks, and then fill in the 7*7
S2,抽出填入对角线上的抽样槽21中的硅锭,作为抽取的测试硅锭;S2, extracting the silicon ingot filled in the
S3,抽样槽21中的顶杆53在弹簧52的作用下,压紧填入的硅锭表面,通过顶杆53的记号笔头在硅锭表面打上五个电阻率测试的标记点;其中两端的两个标记点分别距离硅锭侧边缘10mm,中间的三个标记点等间距分布;S3, under the action of the
S4,使用电阻率测试装置通过标记的五个标记点对抽取出的待测试硅锭进行电阻率测试,并记录相应数据制成图表。S4, use a resistivity testing device to test the resistivity of the extracted silicon ingot to be tested through the five marked points, and record the corresponding data to make a graph.
实施例2:Example 2:
优选的方案中,取样板1中硅锭槽2的尺寸由所测试多晶硅锭的尺寸确定;硅锭槽2内部的尺寸与多晶硅锭的尺寸相同。结构简单,使用时,硅锭槽2的内部尺寸根据产品线上剖锭后的多晶硅锭的尺寸进行提前铸造,使得多晶硅锭可以恰好置于硅锭槽2内部。In a preferred solution, the size of the
优选的方案中,随机选取取样板1上的7个硅锭槽2为抽样槽21;且在每次测试前都进行随机选取。In a preferred solution, the seven
优选的方案中,抽样槽21内部不设置定位装置5,抽样槽21结构与一般硅锭槽2相同。In a preferred solution, the
优选的方案中,上述一种用于多晶硅锭电阻率测试的抽样装置的抽样测试方法,其特征在于,它包括以下步骤:In a preferred solution, the above-mentioned sampling test method for a sampling device used for resistivity testing of polycrystalline silicon ingots is characterized in that it comprises the following steps:
S1,由于硅锭规格为G4、G5、G6……Gn对应测试的硅锭块数为4*4、5*5、6*6……n*n块;将所需测试的多晶硅锭进行G7剖锭,剖成7*7个硅锭块,然后按照剖开后对应的位置填入取样板1的7*7个硅锭槽2中;S1, since the silicon ingot specifications are G4, G5, G6...Gn, the number of silicon ingots to be tested is 4*4, 5*5, 6*6...n*n blocks; the polycrystalline silicon ingots to be tested are subjected to G7 Cut the ingot, cut it into 7*7 silicon ingot blocks, and then fill in the 7*7
S2,随机抽取其中7个硅锭槽2中的硅锭块,作为抽取的测试硅锭;S2, randomly extract the silicon ingots in 7
S3,随机在抽取的测试用硅锭块表面打上5个标记点,作为电阻率测试的位置;S3, randomly mark 5 marking points on the surface of the selected silicon ingot for testing as the position of the resistivity test;
S4,使用电阻率测试装置通过标记的五个标记点对抽取出的待测试硅锭进行电阻率测试,并记录相应数据制成图表。S4, use a resistivity testing device to test the resistivity of the extracted silicon ingot to be tested through the five marked points, and record the corresponding data to make a graph.
如图5~图6中,是采用实施例1和实施例2分别进行多次试验得出的电阻率测试I-MR控制图:In Fig. 5~Fig. 6, it is the resistivity test I-MR control chart obtained by adopting
其中图5为实施例1中采用本发明提供的固定抽样方法和固定选取测试点的实验方法,得出的控制图无判异点或极少异点,数据趋势稳定,更能反馈出整锭电阻率的趋势变化;5 shows the fixed sampling method provided by the present invention and the experimental method for fixed selection of test points in Example 1. The obtained control chart has no discriminant points or very few different points, the data trend is stable, and the whole ingot can be fed back. Trend change in resistivity;
图6为实施例2中采用传统的随机抽样方式和随机选取测试点的试验方法,多次测试得到的结果控制图上有较多判异点,数据不稳定,无法确定是测试问题还是硅锭本身存在问题,说明传统的随机测试方法存在不合理,从而证明本发明有效的提高了电阻率测试的准确性和数据稳定性。Fig. 6 adopts the traditional random sampling method and the test method of randomly selecting test points in Example 2. There are many discriminative points on the result control chart obtained by multiple tests, and the data is unstable, and it is impossible to determine whether it is a test problem or a silicon ingot There is a problem in itself, which shows that the traditional random test method is unreasonable, and thus proves that the present invention effectively improves the accuracy and data stability of the resistivity test.
上述的实施例仅为本发明的优选技术方案,而不应视为对于本发明的限制,本申请中的实施例及实施例中的特征在不冲突的情况下,可以相互任意组合。本发明的保护范围应以权利要求记载的技术方案,包括权利要求记载的技术方案中技术特征的等同替换方案为保护范围。即在此范围内的等同替换改进,也在本发明的保护范围之内。The above-mentioned embodiments are only the preferred technical solutions of the present invention, and should not be regarded as limitations of the present invention. The embodiments and features in the present application may be arbitrarily combined with each other without conflict. The protection scope of the present invention shall take the technical solutions described in the claims, including the equivalent alternatives of the technical features in the technical solutions described in the claims, as the protection scope. That is, equivalent replacements and improvements within this scope are also within the protection scope of the present invention.
Claims (9)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CN202010286366.5A CN111337543B (en) | 2020-04-13 | 2020-04-13 | Sampling device and sampling test method for resistivity test of polycrystalline silicon ingot |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CN202010286366.5A CN111337543B (en) | 2020-04-13 | 2020-04-13 | Sampling device and sampling test method for resistivity test of polycrystalline silicon ingot |
Publications (2)
Publication Number | Publication Date |
---|---|
CN111337543A true CN111337543A (en) | 2020-06-26 |
CN111337543B CN111337543B (en) | 2022-06-17 |
Family
ID=71180868
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
CN202010286366.5A Active CN111337543B (en) | 2020-04-13 | 2020-04-13 | Sampling device and sampling test method for resistivity test of polycrystalline silicon ingot |
Country Status (1)
Country | Link |
---|---|
CN (1) | CN111337543B (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN112067663A (en) * | 2020-08-05 | 2020-12-11 | 山东天岳先进材料科技有限公司 | Method and device for detecting resistivity of high-purity silicon carbide crystal |
Citations (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH07151799A (en) * | 1993-11-26 | 1995-06-16 | Kawasaki Steel Corp | Method for measuring resistivity of single-crystal silicon ingot |
CN104785451A (en) * | 2015-04-28 | 2015-07-22 | 华中科技大学无锡研究院 | Automatic coarse detection production line for silicon ingots |
CN206011471U (en) * | 2016-08-26 | 2017-03-15 | 福能科技江苏有限公司 | A kind of G7 silicon ingots evolution platform |
CN206311667U (en) * | 2016-12-16 | 2017-07-07 | 河北凌樱新能源科技有限公司 | A kind of polycrystal silicon ingot Resistivity testing servicing unit |
CN107247077A (en) * | 2017-06-16 | 2017-10-13 | 江苏协鑫硅材料科技发展有限公司 | A kind of method for characterizing the long crystal boundary face of ingot casting |
CN209946214U (en) * | 2019-03-28 | 2020-01-14 | 晶科能源有限公司 | A positioning device for silicon block resistivity testing |
-
2020
- 2020-04-13 CN CN202010286366.5A patent/CN111337543B/en active Active
Patent Citations (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH07151799A (en) * | 1993-11-26 | 1995-06-16 | Kawasaki Steel Corp | Method for measuring resistivity of single-crystal silicon ingot |
CN104785451A (en) * | 2015-04-28 | 2015-07-22 | 华中科技大学无锡研究院 | Automatic coarse detection production line for silicon ingots |
CN206011471U (en) * | 2016-08-26 | 2017-03-15 | 福能科技江苏有限公司 | A kind of G7 silicon ingots evolution platform |
CN206311667U (en) * | 2016-12-16 | 2017-07-07 | 河北凌樱新能源科技有限公司 | A kind of polycrystal silicon ingot Resistivity testing servicing unit |
CN107247077A (en) * | 2017-06-16 | 2017-10-13 | 江苏协鑫硅材料科技发展有限公司 | A kind of method for characterizing the long crystal boundary face of ingot casting |
CN209946214U (en) * | 2019-03-28 | 2020-01-14 | 晶科能源有限公司 | A positioning device for silicon block resistivity testing |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN112067663A (en) * | 2020-08-05 | 2020-12-11 | 山东天岳先进材料科技有限公司 | Method and device for detecting resistivity of high-purity silicon carbide crystal |
CN112067663B (en) * | 2020-08-05 | 2024-01-26 | 山东天岳先进科技股份有限公司 | Method and device for detecting resistivity of high-purity silicon carbide crystal |
Also Published As
Publication number | Publication date |
---|---|
CN111337543B (en) | 2022-06-17 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
DE2608642C2 (en) | Test equipment for integrated circuits | |
CN111337543B (en) | Sampling device and sampling test method for resistivity test of polycrystalline silicon ingot | |
DE112015005858T5 (en) | Method of making contact probes for a test head | |
EP3139150B1 (en) | Method and machine for embedding a tissue sample in an embedding medium | |
DE202010018093U1 (en) | test device | |
DE10036878C2 (en) | Printing chip for an ink jet printhead operating according to the bubble jet method with device for estimating the service life and a method for estimating the same | |
DE202012104416U1 (en) | Test socket with hook-like pin contact edge | |
CN111077422A (en) | Lithium ion battery diaphragm breakdown strength testing device and testing method thereof | |
CN103472304A (en) | Elastic probe array multi-channel resistance measurement method and device | |
CN102062725A (en) | Non-destructive analysis method for surface pigment characteristics of wall painting in museum | |
CN105259463A (en) | A high density laminated board copper clad line short circuit point and trip point test method | |
CN110554273A (en) | Detection method of PCBA short circuit point | |
CN103363944A (en) | Method for testing eroding rate and uniformity of drilling smear removal | |
CN209946214U (en) | A positioning device for silicon block resistivity testing | |
CN107481996A (en) | A method for calibrating a wafer and microwave monolithic integrated circuit comprehensive test system | |
CN110375696B (en) | Method for rapidly calculating thickness of copper in PCB (printed circuit board) via hole | |
CN116359768A (en) | Pole piece impedance testing device and consistency judging method | |
CN208607106U (en) | A kind of lead-acid accumulator apparent density test lead plaster sampling and testing tool | |
DE102021134334A1 (en) | Process for manufacturing a stack of solid oxide cells | |
CN222016500U (en) | Grid line resistance measuring device of solar cell | |
CN112284321A (en) | Device for measuring the wire diameter of a live wire and a method for measuring the wire diameter of a live wire | |
DE102004052634B4 (en) | Method for producing heat flow measuring elements | |
CN220922657U (en) | Uniform tissue slicing device | |
WO2008152506A2 (en) | A method and a device for depositing or removing a layer on/from a workpiece, an analysis method and device for analysing an expected layer thickness, a method for setting up a database for such an analysis method or device, as well as such a database | |
CN115027070B (en) | Auxiliary device for manufacturing temperature calibration probe and manufacturing process |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
PB01 | Publication | ||
PB01 | Publication | ||
SE01 | Entry into force of request for substantive examination | ||
SE01 | Entry into force of request for substantive examination | ||
GR01 | Patent grant | ||
GR01 | Patent grant |