CN111333347A - 一种高透单银低辐射镀膜玻璃及制备方法 - Google Patents
一种高透单银低辐射镀膜玻璃及制备方法 Download PDFInfo
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Abstract
本发明提供了一种高透单银低辐射镀膜玻璃及制备方法,属于镀膜玻璃技术领域。本高透单银低辐射镀膜玻璃包括玻璃基片层和镀膜层,镀膜层自玻璃基片层向外依次复合有八个膜层,其中第一层为SiNx层,第二层为ZnAl层,第三层为Ag层,第四层为NiCr层,第五层为ZnAl层,第六层为ZnSn层,第七层为SiNx层,第八层为ZrOx层;第一层和第二层为为第一电介质组合层,第三层为低辐射功能层,第四层为第一阻挡保护层,第五层和第六层为第二电介质组合层,第七层为膜层保护层;通过磁控溅射的方式对各膜层进行分别溅射镀膜。本发明具有透光率高、抗氧化性能好等优点。
Description
技术领域
本发明属于镀膜玻璃技术领域,涉及一种高透单银低辐射镀膜玻璃及制备方法。
背景技术
作为一种优良的建筑材料,玻璃由于其良好的通透性,具有透光防风雪的功能,被广泛应用于建筑上。随着现代科技水平的发展,玻璃被赋予各种新的内涵,其中low-E玻璃以其美观大方的颜色、较好的质感以及优良的节能特性,在建筑幕墙领域已受到广泛应用。Low-E玻璃又称低辐射玻璃,常使用磁控溅射法在玻璃基片表面沉积出纳米膜层,进而改变玻璃的光学、电学、机械和化学等方面的性能,达到装饰、节能、环保等目的。
作为节能建筑材料,low-E玻璃的节能特性与普通玻璃及热反射镀膜玻璃相比,Low-E玻璃对远红外辐射具有极高的反射率。可保持室内温度稳定,减少建筑加热或制冷的能耗,起到了非常优秀的节能降耗作用。而高透型Low-E玻璃在保障绝佳的保温性能的同时具有较高的可见光透射率,所以采光效果好,适用于北方寒冷地区和部分地域的高通透性建筑,突出自然采光效果。
经检索,中国专利201811478740.0公开了一种高透低辐射镀膜玻璃,包括玻璃基片和镀在玻璃基片一个表面的膜层,膜层自玻璃基片的一侧由里向外依次包括:第一层保护层、第二层连接层、第三层功能层、第四层阻挡层、第五层连接层、第六层保护层、第七层耐氧化保护层。第一层保护层材料为金属氮化物、硅的氮化物或者金属氮化物与硅的氮化物组合物;所述第二层连接层材料为ZnAlOx或陶瓷状态的AZO材料;所述第三层功能层材料为Ag,所述第四层阻挡层材料为NiCr,所述第五层连接层材料为陶瓷状态的AZO;所述第六层保护层材料为SiAlNx;所述第七层耐氧化保护层材料为陶瓷状态的ZrOx。
以上技术方案存在如下问题或特点:
1)从其提供的数据可以看出,单一ZrOx的透光率最高仅能够达到80%左右,在复合其他膜层后透光率最高只能达到65%。
2)现有高透单银低辐射镀膜玻璃耐加工性能较差,耐氧化性能较差,使其单片存放时间较短,与后续加工的间隔不能够太长,对加工车间的调运配合、协调能够要求较高。
3)以AZO作为连接层,使膜系呈浅蓝色,透光率较低,使其高透单银低辐射镀膜玻璃室外反射偏蓝。
发明内容
本发明的目的是针对现有的技术存在的上述问题,提供一种高透单银低辐射镀膜玻璃,本发明所要解决的技术问题是如何提高透光率和抗氧化性能。
本发明的目的可通过下列技术方案来实现:一种高透单银低辐射镀膜玻璃,其特征在于,本高透单银低辐射镀膜玻璃包括玻璃基片层和镀膜层,所述镀膜层自所述玻璃基片层向外依次复合有八个膜层,其中第一层为SiNx层,第二层为ZnAl层,第三层为Ag层,第四层为NiCr层,第五层为ZnAl层,第六层为ZnSn层,第七层为SiNx层,第八层为ZrOx层;
其中,第一层和第二层为为第一电介质组合层,第三层为低辐射功能层,第四层为第一阻挡保护层,第五层和第六层为第二电介质组合层,第七层为膜层保护层。
一种高透单银低辐射镀膜玻璃的制备方法,其特征在于,本方法包括如下步骤:
1)、磁控溅射镀膜层;
A、磁控溅射第一层:
靶材数量:交流旋转靶3~4个;靶材配置为硅铝(SiAl);工艺气体比例:氩气和氮气,氩气和氮气的比例为1:1.14,溅射气压为3~5×10-3mbar;镀膜厚度为10~30nm;
B、磁控溅射第二层:
靶材数量:交流旋转靶1~2个;靶材配置为锌铝(ZnAl);工艺气体比例:氩气和氧气,氩气和氧气的比例为1:2,溅射气压为3~5×10-3mbar;镀膜厚度为10~25nm;
C、磁控溅射第三层:
靶材数量:直流旋转靶1个;靶材配置为银(Ag);工艺气体比例:纯氩气,溅射气压为2~3×10-3mbar;镀膜厚度为5~20nm;
D、磁控溅射第四层:
靶材数量:交流旋转靶1个;靶材配置为镍铬(NiCr);工艺气体比例:纯氩气,溅射气压为2~3×10-3mbar;镀膜厚度为1~10nm;
E、磁控溅射第五层:
靶材数量:交流旋转靶2个;靶材配置为锌铝(ZnAl);工艺气体比例:氩气和氧气,氩气和氧气的比例为1:2,溅射气压为3~5×10-3mbar;镀膜厚度为5~15nm;
F、磁控溅射第六层:
靶材数量:交流旋转靶2个;靶材配置为锌锡(ZnSn);工艺气体比例:氩气和氧气,氩气和氧气的比例为1:2,溅射气压为3~5×10-3mbar;镀膜厚度为5~10nm;
G、磁控溅射第七层:
靶材数量:交流旋转靶4~6个;靶材配置为硅铝(SiAl);工艺气体比例:氩气和氮气,氩气和氮气的比例为1:1.14,溅射气压为3~5×10-3mbar;镀膜厚度为10~30nm;
H、磁控溅射第八层:
靶材数量:交流旋转靶1个;靶材配置为锆(ZrOx);工艺气体比例:氩气和氧气,氩气和氧气的比例为1:0.4,溅射气压为2~3×10-3mbar;镀膜厚度为5~20nm;
2)、镀膜层总厚度控制在46~135nm,溅射室传动走速控制在4~6m/min。
与现有技术相比,本发明具有以下优点:
1、使用普通白玻原片作为基片生产时,产品室外观察整体为无色。
2、通过使用锌锡和锌铝材料的结合,可增加膜层可见光透过率。
3、通常使用Tiox作为改善膜层耐加工性能,但由于Tiox材料致密性较差,附着力不强并没有很好的起到后续耐加工性能保护,现将其换为ZrOx,且减少溅射室氧气占比,使其基于稳定性大大提高,使镀膜玻璃单片在车间内的存留时间可以延长至180小时——在湿度≥70%、温度≥20℃的环境中进行检测的结果。
4、可获的更高可见光透过率,整片玻璃透光率达80%以上,室外颜色为无色透明状态。
5、车间耐氧化性能对比传统单银高透低辐射镀膜玻璃抗氧化性能更高。
6、本专利技术产品6mm单片透过率为80%-86%。外观颜色为无色,其中透过色a*∈[-1.5,0],b*∈[1.5,1];膜面颜色a*∈[-1,-3],b*∈[-2,-5];玻面颜色a*∈[0,-1],b*∈[-1,-5];耐氧化性能好,车间放置实验,时间大于180小时(湿度≥70%,温度≥20℃)。
附图说明
图1是本镀膜玻璃层状结构示意图。
图中,G、玻璃基片层;1、第一层;2、第二层;3、第三层;4、第四层;5、第五层;6、第六层;7、第七层;8、第八层。
具体实施方式
以下是本发明的具体实施例并结合附图,对本发明的技术方案作进一步的描述,但本发明并不限于这些实施例。
本高透单银低辐射镀膜玻璃包括玻璃基片层G和镀膜层,所述镀膜层自所述玻璃基片层G向外依次复合有八个膜层,其中第一层1为SiNx层,第二层2为ZnAl层,第三层3为Ag层,第四层4为NiCr层,第五层5为ZnAl层,第六层6为ZnSn层,第七层7为SiNx层,第八层8为ZrOx层;
其中,第一层1和第二层2为为第一电介质组合层,第三层3为低辐射功能层,第四层4为第一阻挡保护层,第五层5和第六层6为第二电介质组合层,第七层7为膜层保护层。
制备方法包括如下步骤:
1)、磁控溅射镀膜层;
A、磁控溅射第一层1:
靶材数量:交流旋转靶3~4个;靶材配置为硅铝(SiAl);工艺气体比例:氩气和氮气,氩气和氮气的比例为1:1.14,溅射气压为3~5×10-3mbar;镀膜厚度为10~30nm;
B、磁控溅射第二层2:
靶材数量:交流旋转靶1~2个;靶材配置为锌铝(ZnAl);工艺气体比例:氩气和氧气,氩气和氧气的比例为1:2,溅射气压为3~5×10-3mbar;镀膜厚度为10~25nm;
C、磁控溅射第三层3:
靶材数量:直流旋转靶1个;靶材配置为银(Ag);工艺气体比例:纯氩气,溅射气压为2~3×10-3mbar;镀膜厚度为5~20nm;
D、磁控溅射第四层4:
靶材数量:交流旋转靶1个;靶材配置为镍铬(NiCr);工艺气体比例:纯氩气,溅射气压为2~3×10-3mbar;镀膜厚度为1~10nm;
E、磁控溅射第五层5:
靶材数量:交流旋转靶2个;靶材配置为锌铝(ZnAl);工艺气体比例:氩气和氧气,氩气和氧气的比例为1:2,溅射气压为3~5×10-3mbar;镀膜厚度为5~15nm;
F、磁控溅射第六层6:
靶材数量:交流旋转靶2个;靶材配置为锌锡(ZnSn);工艺气体比例:氩气和氧气,氩气和氧气的比例为1:2,溅射气压为3~5×10-3mbar;镀膜厚度为5~10nm;
G、磁控溅射第七层7:
靶材数量:交流旋转靶4~6个;靶材配置为硅铝(SiAl);工艺气体比例:氩气和氮气,氩气和氮气的比例为1:1.14,溅射气压为3~5×10-3mbar;镀膜厚度为10~30nm;
H、磁控溅射第八层8:
靶材数量:交流旋转靶1个;靶材配置为锆(ZrOx);工艺气体比例:氩气和氧气,氩气和氧气的比例为1:0.4,溅射气压为2~3×10-3mbar;镀膜厚度为5~20nm;
2)、镀膜层总厚度控制在46~135nm,溅射室传动走速控制在4~6m/min。
本文中所描述的具体实施例仅仅是对本发明精神作举例说明。本发明所属技术领域的技术人员可以对所描述的具体实施例做各种各样的修改或补充或采用类似的方式替代,但并不会偏离本发明的精神或者超越所附权利要求书所定义的范围。
Claims (1)
1.一种高透单银低辐射镀膜玻璃的制备方法,其特征在于,所述高透单银低辐射镀膜玻璃包括玻璃基片层(G)和镀膜层,所述镀膜层自所述玻璃基片层(G)向外依次复合有八个膜层,其中第一层(1)为SiNx层,第二层(2)为ZnAl层,第三层(3)为Ag层,第四层(4)为NiCr层,第五层(5)为ZnAl层,第六层(6)为ZnSn层,第七层(7)为SiNx层,第八层(8)为ZrOx层;
其中,第一层(1)和第二层(2)为为第一电介质组合层,第三层(3)为低辐射功能层,第四层(4)为第一阻挡保护层,第五层(5)和第六层(6)为第二电介质组合层,第七层(7)为膜层保护层;
制备方法包括如下步骤:
1)、磁控溅射镀膜层;
A、磁控溅射第一层(1):
靶材数量:交流旋转靶3~4个;靶材配置为硅铝(SiAl);工艺气体比例:氩气和氮气,氩气和氮气的比例为1:1.14,溅射气压为3~5×10-3mbar;镀膜厚度为10~30nm;
B、磁控溅射第二层(2):
靶材数量:交流旋转靶1~2个;靶材配置为锌铝(ZnAl);工艺气体比例:氩气和氧气,氩气和氧气的比例为1:2,溅射气压为3~5×10-3mbar;镀膜厚度为10~25nm;
C、磁控溅射第三层(3):
靶材数量:直流旋转靶1个;靶材配置为银(Ag);工艺气体比例:纯氩气,溅射气压为2~3×10-3mbar;镀膜厚度为5~20nm;
D、磁控溅射第四层(4):
靶材数量:交流旋转靶1个;靶材配置为镍铬(NiCr);工艺气体比例:纯氩气,溅射气压为2~3×10-3mbar;镀膜厚度为1~10nm;
E、磁控溅射第五层(5):
靶材数量:交流旋转靶2个;靶材配置为锌铝(ZnAl);工艺气体比例:氩气和氧气,氩气和氧气的比例为1:2,溅射气压为3~5×10-3mbar;镀膜厚度为5~15nm;
F、磁控溅射第六层(6):
靶材数量:交流旋转靶2个;靶材配置为锌锡(ZnSn);工艺气体比例:氩气和氧气,氩气和氧气的比例为1:2,溅射气压为3~5×10-3mbar;镀膜厚度为5~10nm;
G、磁控溅射第七层(7):
靶材数量:交流旋转靶4~6个;靶材配置为硅铝(SiAl);工艺气体比例:氩气和氮气,氩气和氮气的比例为1:1.14,溅射气压为3~5×10-3mbar;镀膜厚度为10~30nm;
H、磁控溅射第八层(8):
靶材数量:交流旋转靶1个;靶材配置为锆(ZrOx);工艺气体比例:氩气和氧气,氩气和氧气的比例为1:0.4,溅射气压为2~3×10-3mbar;镀膜厚度为5~20nm;
2)、镀膜层总厚度控制在46~135nm,溅射室传动走速控制在4~6m/min。
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