CN111270206A - Coating film correction device and coating machine for coating film on curved substrate - Google Patents
Coating film correction device and coating machine for coating film on curved substrate Download PDFInfo
- Publication number
- CN111270206A CN111270206A CN201811479808.7A CN201811479808A CN111270206A CN 111270206 A CN111270206 A CN 111270206A CN 201811479808 A CN201811479808 A CN 201811479808A CN 111270206 A CN111270206 A CN 111270206A
- Authority
- CN
- China
- Prior art keywords
- shielding
- correction device
- coating
- plating
- curved substrate
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000000576 coating method Methods 0.000 title claims abstract description 78
- 239000011248 coating agent Substances 0.000 title claims abstract description 77
- 239000000758 substrate Substances 0.000 title claims abstract description 48
- 238000007747 plating Methods 0.000 claims description 24
- 239000013077 target material Substances 0.000 claims description 6
- 230000000694 effects Effects 0.000 abstract description 4
- 238000010586 diagram Methods 0.000 description 4
- 239000005341 toughened glass Substances 0.000 description 4
- 239000007888 film coating Substances 0.000 description 3
- 238000009501 film coating Methods 0.000 description 3
- 238000009792 diffusion process Methods 0.000 description 2
- 238000006467 substitution reaction Methods 0.000 description 2
- 230000004075 alteration Effects 0.000 description 1
- 239000003086 colorant Substances 0.000 description 1
- 230000005672 electromagnetic field Effects 0.000 description 1
- 238000010894 electron beam technology Methods 0.000 description 1
- 230000008020 evaporation Effects 0.000 description 1
- 238000001704 evaporation Methods 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 238000009434 installation Methods 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 230000000149 penetrating effect Effects 0.000 description 1
- 230000007704 transition Effects 0.000 description 1
Images
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/24—Vacuum evaporation
- C23C14/28—Vacuum evaporation by wave energy or particle radiation
- C23C14/30—Vacuum evaporation by wave energy or particle radiation by electron bombardment
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/04—Coating on selected surface areas, e.g. using masks
- C23C14/042—Coating on selected surface areas, e.g. using masks using masks
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/50—Substrate holders
Landscapes
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Health & Medical Sciences (AREA)
- Toxicology (AREA)
- Coating Apparatus (AREA)
Abstract
The invention provides a coating correction device and a coating machine for coating a curved substrate. Thus, when the coating correction device is arranged on the coating machine, the shielding areas of the shielding areas are different, the shielding effect on the target gas is different, and the concentration of the target gas in the areas corresponding to the different shielding areas can be adjusted. The position relation between the different shielding areas and the curved substrate to be coated is controlled, so that the thickness of the coating on the curved substrate to be coated can be adjusted through the coating correction device, the coating thickness is more uniform, and the color difference of the coated curved substrate to be coated is reduced.
Description
Technical Field
The invention relates to the technical field of coating, in particular to a coating correction device and a coating machine for coating a curved substrate.
Background
The toughened glass tile can be formed into different colors by plating different film systems on a curved toughened glass substrate. The existing curved surface toughened glass base material usually comprises a plurality of wave crests and wave troughs, and in the coating process, because of the height difference between the wave crests and the wave troughs, the distances between the wave crests and the wave troughs and an evaporation source for coating are different, so that the coating is easy to be uneven, and the color difference between the wave crests and the wave troughs is larger.
Disclosure of Invention
The embodiment of the invention provides a coating correction device and a coating machine for coating a curved substrate, which aim to solve the problem of large chromatic aberration at the wave crest and the wave trough of a curved toughened glass substrate caused by uneven coating.
In a first aspect, an embodiment of the present invention provides a coating correction device, which includes a first end and a second end opposite to the first end, wherein a plurality of shielding regions are sequentially arranged along a direction from the first end to the second end, and two adjacent shielding regions have different shielding areas.
Optionally, the first end is an installation end of the coating correction device, and the second end is a free end of the coating correction device.
Optionally, the plurality of shielding regions include first shielding regions and second shielding regions that are alternately arranged, and a shielding area of the first shielding region is larger than a shielding area of the adjacent second shielding region.
Optionally, each of the first shielding regions has a shape gradually narrowing in a direction from the mounting end to the free end, and each of the second shielding regions has a shape gradually narrowing in a direction from the mounting end to the free end.
Optionally, a first shielding area of the first shielding area close to the free end is smaller than a shielding area of the first shielding area relatively far away from the free end, and a second shielding area of the second shielding area close to the free end is smaller than a shielding area of the second shielding area relatively far away from the free end.
Optionally, a third shielding area is further disposed between the first shielding area and the second shielding area, and a shielding area of the third shielding area is between shielding areas of the adjacent first shielding area and second shielding area.
Optionally, the coating correction device is a plate-shaped body, and the plate-shaped body is provided with a plurality of missing portions for forming the plurality of shielding regions.
Optionally, the missing part is a notch recessed inwards from an edge of the plate-shaped body extending in a direction from the first end to the second end.
Optionally, the missing part is a through hole penetrating through the plate-shaped body in a thickness direction of the plate-shaped body.
In a second aspect, an embodiment of the present invention provides a film plating machine for plating a curved substrate, including a film plating chamber, and a target and a fixture located in the film plating chamber, and further including any one of the above film plating correction devices, where the film plating correction device is fixed on an inner wall of the film plating chamber and located between the target and the fixture.
Optionally, the curved substrate to be coated is a wavy substrate having at least one protruding portion and at least one recessed portion opposite to the target, the plurality of shielding regions include first shielding regions and second shielding regions that are alternately arranged, and when the wavy substrate is clamped by the clamp, the positions of the first shielding regions and the second shielding regions respectively correspond to the protruding portion and the recessed portion.
Optionally, the coating correction device is installed such that when the fixture clamps the curved substrate to be coated, the coating correction device is parallel to the curved substrate to be coated.
The application discloses coating film correction device includes a plurality of shelters from the district that sets up of arranging in proper order in the direction by first end to second end, and adjacent two shelter from the district and have different area of sheltering from. Thus, when the coating correction device is arranged on the coating machine, the shielding areas of the shielding areas are different, the shielding effect on the target gas is different, and the concentration of the target gas in the areas corresponding to the different shielding areas can be adjusted. The position relation between the different shielding areas and the curved substrate to be coated is controlled, so that the thickness of the coating on the curved substrate to be coated can be adjusted through the coating correction device, the coating thickness is more uniform, and the color difference of the coated curved substrate to be coated is reduced.
Drawings
In order to more clearly illustrate the technical solutions of the embodiments of the present invention, the drawings required to be used in the description of the embodiments of the present invention will be briefly introduced below, and it is obvious that the drawings in the following description are only some embodiments of the present invention, and it is obvious for those skilled in the art to obtain other drawings based on these drawings without inventive exercise.
FIG. 1 is a schematic structural diagram of a coating machine provided in an embodiment of the present invention;
FIG. 2 is a schematic structural diagram of a compensating plate according to an embodiment of the present invention;
FIG. 3 is a schematic structural diagram of another correction plate provided in the embodiment of the present invention;
FIG. 4 is a further perspective view of the correction plate of FIG. 2 or FIG. 3;
FIG. 5 is a diagram showing the positional relationship between the correction plate and the curved substrate to be coated;
fig. 6 is a further perspective view of fig. 5.
Detailed Description
The technical solutions in the embodiments of the present invention will be clearly and completely described below with reference to the drawings in the embodiments of the present invention, and it is obvious that the described embodiments are some, not all, embodiments of the present invention. All other embodiments, which can be derived by a person skilled in the art from the embodiments given herein without making any creative effort, shall fall within the protection scope of the present invention.
The present application provides a coating correction device 100.
As shown in fig. 2 and 3, in one embodiment, the coating correction device 100 includes a first end and a second end opposite to the first end, and a plurality of shielding regions are sequentially arranged along a direction from the first end to the second end, and two adjacent shielding regions have different shielding areas.
As shown in fig. 1, the plating correction device 100 is installed in a coater 300 and is used to adjust the thickness of a film to be plated on a substrate by the coater 300.
The working principle of the coater 300 can be understood as that the target material 303 is vaporized by heating or bombardment with high-energy electron beams to form a target material gas, and the target material gas flows towards the curved substrate 200 to be coated under the action of an electromagnetic field and is deposited on the curved substrate 200 to be coated to form a coating.
As shown in fig. 1, the diffusion shape of the target gas is substantially conical with the target 303 as a vertex during use, that is, the concentration of the target gas is substantially equal at a position equidistant from the target 303 as shown by the broken line in fig. 1. It should be understood that each position equal to the position of the target 303 constitutes a partial spherical surface with the target 303 as the center of the sphere; however, for ease of understanding, it can also be approximately understood that the concentration of the target gas is substantially equal in each plane perpendicular to the axis of the cone, ignoring certain errors that may exist.
The coating correction device 100 in this embodiment adjusts the coating thickness by shielding the target gas, and by providing shielding regions with different areas, when the target gas flows, due to the existence of each shielding region, a part of the target gas can be shielded, and the target gas is deposited on the coating correction device 100, so that the concentration of the target gas reaching the curved substrate 200 to be coated is reduced, and correspondingly, the coating thickness is also reduced, thereby controlling the coating thickness on the curved substrate 200 to be coated.
In this way, when the film coating correction device 100 is installed on the film coating machine 300, the shielding areas of the shielding regions are different from each other, and the shielding effect for the target gas is also different from each other, so that the concentration of the target gas in the regions corresponding to the different shielding regions can be adjusted. By controlling the position relationship between the different shielding areas and the curved substrate 200 to be coated, the thickness of the coating on the curved substrate 200 to be coated can be adjusted by the coating correction device 100, so that the coating thickness is more uniform, and the color difference of the coated curved substrate 200 to be coated can be reduced.
Further, as shown in fig. 4, the first end is a mounting end 105 of the plating film correction apparatus 100, and the second end is a free end of the plating film correction apparatus 100.
In practice, the coating correction device 100 is mounted on the coating machine 300 through the mounting end 105, the mounting end 105 may be a plug-in structure, or may be provided with a screw hole or a positioning hole, and is fixed by a fastener such as a bolt, as long as the coating correction device 100 can be fixed, which is not further limited and described herein.
The shielding areas comprise first shielding areas 101 and second shielding areas 102 which are alternately arranged, and the shielding area of each first shielding area 101 is larger than that of the adjacent second shielding area 102.
As shown in fig. 1, 5 and 6, in one embodiment, the curved substrate 200 to be coated is used to have a plurality of convex portions 202 and concave portions 201 toward the target 303, wherein the convex portions 202 refer to portions convex toward the target 303, and the concave portions 201 refer to portions concave away from the target 303.
The distance between each convex portion 202 and the concave portion 201 is different from that between the target 303, the distance between the convex portion 202 and the target 303 is closer, and the distance between the concave portion 201 and the target 303 is further, which results in that the target gas concentration of the concave portion 201 is smaller than that of the convex portion 202, and the coating thickness of the concave portion 201 is smaller than that of the convex portion 202.
In practice, the first shielding region 101 may correspond to each convex portion 202, and each second shielding region 102 corresponds to each concave portion 201, and since the shielding area of the first shielding region 101 is larger than the shielding area of the adjacent second shielding region 102, more target gas can be shielded, so that the target gas concentration at each convex portion 202 can be reduced, and the difference in coating thickness between each convex portion 202 and each concave portion 201 on the curved substrate 200 to be coated can be reduced.
Further, the first shielding region 101 near the free end in the first shielding region 101 has a smaller shielding area than the first shielding region 101 relatively far from the free end, and the second shielding region 102 near the free end in the second shielding region 102 has a smaller shielding area than the second shielding region 102 relatively far from the free end.
In one embodiment, the curved substrate 200 to be coated is inclined with respect to the conical axis of the target gas diffusion, so the distance between each convex portion 202 and the target 303 is different, and the distance between each concave portion 201 and the target 303 is different. Therefore, in the present embodiment, the shielding areas of the first shielding region 101 and the second shielding region 102 are also changed so as to be adjusted to make the target gas concentration of each convex portion 202 substantially equal and the target gas concentration of each concave portion 201 substantially equal.
Further, each of the first shielding areas 101 has a shape gradually narrowing in a direction from the mounting end 105 to the free end, and each of the second shielding areas 102 has a shape gradually narrowing in a direction from the mounting end 105 to the free end.
When the curved substrate 200 to be coated is disposed obliquely, the distance between each position of each protrusion 202 or each recess 201 and the target 303 is also varied, and therefore, in this embodiment, the shape of each first shielding region 101 and each second shielding region 102 is also gradually narrowed along the direction from the mounting end 105 to the free end, so that the target gas concentration in each first shielding region 101 or each second shielding region 102 can be substantially equal, which helps to further improve the uniformity of the coating thickness.
Further, a third shielding area is further disposed between the first shielding area 101 and the second shielding area 102, and a shielding area of the third shielding area is between shielding areas of the adjacent first shielding area 101 and second shielding area 102.
In the transition region between the protruding portion 202 and the recessed portion 201, the distance between the curved substrate 200 to be coated and the target 303 is also between the neighboring protruding portion 202 and the recessed portion 201, therefore, in this embodiment, a third shielding region is further provided, and the area of the third shielding region is between the shielding areas of the neighboring first shielding region 101 and the second shielding region 102, which can further improve the uniformity of the coating thickness and reduce the overall coating thickness difference.
In one embodiment, the coating correction device 100 is a plate-shaped body, and a plurality of missing portions for forming a plurality of shielding regions are provided on the plate-shaped body.
In practice, the missing portion may be a notch 104 or a through hole 103, and specifically, as shown in fig. 2, in one embodiment, the missing portion is a notch 104 recessed inward from an edge of the plate-like body extending along the mounting end 105 toward the free end. In another embodiment, as shown in fig. 3, the missing portion is a through hole 103 provided through the plate-like body in the thickness direction thereof. Different shielding areas can be provided.
The embodiment of the invention also provides a film coating machine 300 for coating the curved-surface substrate.
The coating machine 300 comprises a coating cavity 304, a target 303 and a clamp 301 which are positioned in the coating cavity 304, the coating machine 300 further comprises any one of the coating correction devices 100, and the coating correction device 100 is fixed on the inner wall of the coating cavity 304 and positioned between the target 303 and the clamp 301.
Since the technical solution of this embodiment includes the technical solution of the above embodiment, at least all of the above technical effects can be achieved, and details are not described here.
Optionally, the curved substrate 200 to be coated is a wavy substrate having at least one convex portion 202 and at least one concave portion 201 corresponding to the target 303, the plurality of shielding regions includes a first shielding region 101 and a second shielding region 102 alternately arranged, and when the wavy substrate is clamped by the fixture 301, the positions of the first shielding region 101 and the second shielding region 102 respectively correspond to the convex portion 202 and the concave portion 201.
The closer the distance between the protrusion 202 and the target 303 and the further the distance between the recess 201 and the target 303, the lower the target gas concentration in the recess 201 than in the protrusion 202. In practice, each first shielding region 101 corresponds to each convex portion 202, each second shielding region 102 corresponds to each concave portion 201, and the shielding area of the first shielding region 101 is larger than the shielding area of the adjacent second shielding region 102, so that more target gas can be shielded, the concentration of the target gas at each convex portion 202 can be reduced, and the difference of the coating thickness of each convex portion 202 and each concave portion 201 on the curved substrate 200 to be coated can be reduced.
Further, as shown in fig. 1 and 6, the coating correction device 100 is installed such that the coating correction device 100 is parallel to the curved substrate 200 to be coated when the fixture 301 clamps the curved substrate 200 to be coated. Thus, it is more convenient to adjust the convex portions 202 of the substrate to be coated to correspond to the first shielding regions 101, and the concave portions 201 to correspond to the second shielding regions 102.
The above description is only for the specific embodiments of the present invention, but the scope of the present invention is not limited thereto, and any person skilled in the art can easily conceive of the changes or substitutions within the technical scope of the present invention, and the changes or substitutions should be covered within the scope of the present invention. Therefore, the protection scope of the present invention shall be subject to the protection scope of the claims.
Claims (12)
1. The coating correction device is characterized by comprising a first end and a second end opposite to the first end, wherein a plurality of shielding areas are sequentially arranged in the direction from the first end to the second end, and two adjacent shielding areas have different shielding areas.
2. The coating correction device according to claim 1, wherein the first end is a mounting end of the coating correction device, and the second end is a free end of the coating correction device.
3. The coating correction device according to claim 2, wherein the shielding regions comprise first shielding regions and second shielding regions alternately arranged, and a shielding area of the first shielding region is larger than a shielding area of the adjacent second shielding region.
4. The plating correction device according to claim 3, wherein each of the first shielding regions has a shape that gradually narrows in a direction from the mounting end to the free end, and each of the second shielding regions has a shape that gradually narrows in a direction from the mounting end to the free end.
5. The coating correction device according to claim 3, wherein a first shielding region of the first shielding regions near the free end has a smaller shielding area than a first shielding region relatively far from the free end, and a second shielding region of the second shielding regions near the free end has a smaller shielding area than a second shielding region relatively far from the free end.
6. The coating correction device according to any one of claims 3 to 5, wherein a third shielding region is further provided between the first shielding region and the second shielding region, and a shielding area of the third shielding region is between shielding areas of the adjacent first shielding region and second shielding region.
7. The plating film correction apparatus according to claim 1, wherein the plating film correction apparatus is a plate-like body, and a plurality of missing portions for forming the plurality of shielding regions are provided on the plate-like body.
8. The plating correction device according to claim 7, wherein the missing portion is a notch recessed inward from an edge of the plate-like body extending in a direction from the first end toward the second end.
9. The plating correction device according to claim 7, wherein the missing portion is a through hole provided through the plate-like body in a thickness direction of the plate-like body.
10. A film plating machine for plating a curved substrate, which comprises a film plating cavity, a target material and a clamp, wherein the target material and the clamp are positioned in the film plating cavity, and the film plating machine is characterized by further comprising a film plating correction device according to any one of claims 1 to 9, wherein the film plating correction device is fixed on the inner wall of the film plating cavity and is positioned between the target material and the clamp.
11. The coater of claim 10 wherein the curved substrate to be coated is a corrugated substrate having at least one raised portion and at least one recessed portion relative to the target, and wherein the plurality of shielding areas comprises first and second shielding areas arranged alternately, the first and second shielding areas corresponding to the raised portion and the recessed portion, respectively, when the corrugated substrate is held by the fixture.
12. A coater for coating a curved substrate as set forth in claim 10 wherein said coating correction device is mounted so that it is parallel to the curved substrate to be coated when said fixture holds the curved substrate to be coated.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201811479808.7A CN111270206A (en) | 2018-12-05 | 2018-12-05 | Coating film correction device and coating machine for coating film on curved substrate |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201811479808.7A CN111270206A (en) | 2018-12-05 | 2018-12-05 | Coating film correction device and coating machine for coating film on curved substrate |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN111270206A true CN111270206A (en) | 2020-06-12 |
Family
ID=70996730
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201811479808.7A Pending CN111270206A (en) | 2018-12-05 | 2018-12-05 | Coating film correction device and coating machine for coating film on curved substrate |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN111270206A (en) |
Citations (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH10317135A (en) * | 1997-05-16 | 1998-12-02 | Hoya Corp | Coating thickness correcting mechanism for sputtering coating formation |
| CN202116638U (en) * | 2011-03-25 | 2012-01-18 | 童筱钧 | Thin film thickness uniformity adjusting sheet for thin film vapor deposition equipment |
| CN103074587A (en) * | 2013-02-01 | 2013-05-01 | 湘潭宏大真空技术股份有限公司 | Adjusting device and adjusting method for large-area continuous magnetron sputtering coating uniformity |
| KR20160002524A (en) * | 2014-06-30 | 2016-01-08 | 주식회사 선익시스템 | A Thin Film Deposition Apparatus for Enhancing Uniformity of Deposited Film |
| CN106319471A (en) * | 2015-07-08 | 2017-01-11 | 英属开曼群岛商精曜有限公司 | Film coating carrying table and film coating device |
| CN209722282U (en) * | 2018-12-05 | 2019-12-03 | 汉能移动能源控股集团有限公司 | A kind of plated film compensating device and for the coating machine to curved substrate plated film |
-
2018
- 2018-12-05 CN CN201811479808.7A patent/CN111270206A/en active Pending
Patent Citations (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH10317135A (en) * | 1997-05-16 | 1998-12-02 | Hoya Corp | Coating thickness correcting mechanism for sputtering coating formation |
| CN202116638U (en) * | 2011-03-25 | 2012-01-18 | 童筱钧 | Thin film thickness uniformity adjusting sheet for thin film vapor deposition equipment |
| CN103074587A (en) * | 2013-02-01 | 2013-05-01 | 湘潭宏大真空技术股份有限公司 | Adjusting device and adjusting method for large-area continuous magnetron sputtering coating uniformity |
| KR20160002524A (en) * | 2014-06-30 | 2016-01-08 | 주식회사 선익시스템 | A Thin Film Deposition Apparatus for Enhancing Uniformity of Deposited Film |
| CN106319471A (en) * | 2015-07-08 | 2017-01-11 | 英属开曼群岛商精曜有限公司 | Film coating carrying table and film coating device |
| CN209722282U (en) * | 2018-12-05 | 2019-12-03 | 汉能移动能源控股集团有限公司 | A kind of plated film compensating device and for the coating machine to curved substrate plated film |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| KR100467805B1 (en) | Linear or planar type evaporator for the controllable film thickness profile | |
| US8980006B2 (en) | Apparatus for chemical vapor deposition | |
| US11441236B2 (en) | Chamber components for epitaxial growth apparatus | |
| US9515263B2 (en) | Device and method for depositing organic material | |
| KR20140045809A (en) | Depositing apparatus and method for manufacturing organic light emitting diode display using the same | |
| US20070119849A1 (en) | Heater and vapor deposition source having the same | |
| KR20160087985A (en) | Depositing apparatus | |
| KR20210144630A (en) | Metal substrate and Mask using the same | |
| KR102590892B1 (en) | Mask for oled | |
| US20170104186A1 (en) | Evaporation Mask and Evaporation Device | |
| CN102234791B (en) | Gas distribution shower module and coating equipment | |
| KR20200028018A (en) | Mask and display panel | |
| CN103088298A (en) | Coating correction plate and coating device | |
| CN112011757A (en) | Mask and evaporation device | |
| CN111270206A (en) | Coating film correction device and coating machine for coating film on curved substrate | |
| US20050006223A1 (en) | Sputter deposition masking and methods | |
| CN209722282U (en) | A kind of plated film compensating device and for the coating machine to curved substrate plated film | |
| KR101233482B1 (en) | Material Injection Angle limited Linear Source | |
| CN105336640A (en) | Reaction cavity and reaction equipment | |
| KR102185106B1 (en) | Vacuum evaporation source for thin film coating | |
| WO2012127957A1 (en) | Vapor-deposition device and vapor-deposition method | |
| CN108517489B (en) | Mask plate for evaporation of OLED display panel | |
| KR20150083066A (en) | Linear Depositing System for Substrate Cooling | |
| TW201930642A (en) | Shadow frame with sides having a varied profile for improved deposition uniformity | |
| WO2020113730A1 (en) | Evaporation device |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| PB01 | Publication | ||
| PB01 | Publication | ||
| SE01 | Entry into force of request for substantive examination | ||
| SE01 | Entry into force of request for substantive examination | ||
| TA01 | Transfer of patent application right | ||
| TA01 | Transfer of patent application right |
Effective date of registration: 20220111 Address after: 510670 room 229, annex building, No. 111, Kexue Avenue, Huangpu District, Guangzhou City, Guangdong Province (office only) Applicant after: Hanwa Technology Co.,Ltd. Address before: Room 107, building 2, Olympic Village street, Chaoyang District, Beijing Applicant before: HANERGY MOBILE ENERGY HOLDING GROUP Co.,Ltd. |
|
| WD01 | Invention patent application deemed withdrawn after publication | ||
| WD01 | Invention patent application deemed withdrawn after publication |
Application publication date: 20200612 |