CN111252971A - Ultrapure water manufacturing system and ultrapure water manufacturing method using same - Google Patents
Ultrapure water manufacturing system and ultrapure water manufacturing method using same Download PDFInfo
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- CN111252971A CN111252971A CN202010222544.8A CN202010222544A CN111252971A CN 111252971 A CN111252971 A CN 111252971A CN 202010222544 A CN202010222544 A CN 202010222544A CN 111252971 A CN111252971 A CN 111252971A
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- 229910021642 ultra pure water Inorganic materials 0.000 title claims abstract description 94
- 239000012498 ultrapure water Substances 0.000 title claims abstract description 94
- 238000004519 manufacturing process Methods 0.000 title claims abstract description 52
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims abstract description 209
- 239000012528 membrane Substances 0.000 claims abstract description 86
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 claims abstract description 84
- 238000007872 degassing Methods 0.000 claims abstract description 68
- 229920005989 resin Polymers 0.000 claims abstract description 67
- 239000011347 resin Substances 0.000 claims abstract description 67
- 230000008929 regeneration Effects 0.000 claims abstract description 59
- 238000011069 regeneration method Methods 0.000 claims abstract description 59
- 238000001223 reverse osmosis Methods 0.000 claims abstract description 51
- 238000005342 ion exchange Methods 0.000 claims abstract description 50
- 229910052757 nitrogen Inorganic materials 0.000 claims abstract description 42
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 claims abstract description 38
- 238000011033 desalting Methods 0.000 claims abstract description 30
- ZOXJGFHDIHLPTG-UHFFFAOYSA-N Boron Chemical compound [B] ZOXJGFHDIHLPTG-UHFFFAOYSA-N 0.000 claims abstract description 26
- 229910052796 boron Inorganic materials 0.000 claims abstract description 25
- 239000002253 acid Substances 0.000 claims abstract description 22
- 238000005262 decarbonization Methods 0.000 claims abstract description 16
- 229920001429 chelating resin Polymers 0.000 claims abstract description 15
- 238000010926 purge Methods 0.000 claims abstract description 15
- 238000000034 method Methods 0.000 claims abstract description 13
- 238000000108 ultra-filtration Methods 0.000 claims abstract description 12
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 claims description 27
- 239000001301 oxygen Substances 0.000 claims description 27
- 229910052760 oxygen Inorganic materials 0.000 claims description 27
- 238000005498 polishing Methods 0.000 claims description 21
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 claims description 18
- 238000010612 desalination reaction Methods 0.000 claims description 17
- 238000011001 backwashing Methods 0.000 claims description 14
- 229910052799 carbon Inorganic materials 0.000 claims description 12
- 239000013535 sea water Substances 0.000 claims description 11
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 claims description 9
- 238000005086 pumping Methods 0.000 claims description 7
- 238000002360 preparation method Methods 0.000 claims description 6
- 230000000844 anti-bacterial effect Effects 0.000 claims description 2
- 239000003899 bactericide agent Substances 0.000 claims description 2
- 239000000701 coagulant Substances 0.000 claims description 2
- 239000003513 alkali Substances 0.000 abstract description 13
- 239000002585 base Substances 0.000 description 17
- NWUYHJFMYQTDRP-UHFFFAOYSA-N 1,2-bis(ethenyl)benzene;1-ethenyl-2-ethylbenzene;styrene Chemical compound C=CC1=CC=CC=C1.CCC1=CC=CC=C1C=C.C=CC1=CC=CC=C1C=C NWUYHJFMYQTDRP-UHFFFAOYSA-N 0.000 description 11
- 239000003456 ion exchange resin Substances 0.000 description 11
- 229920003303 ion-exchange polymer Polymers 0.000 description 11
- 239000002699 waste material Substances 0.000 description 10
- 150000002500 ions Chemical class 0.000 description 9
- 239000004065 semiconductor Substances 0.000 description 8
- 239000007788 liquid Substances 0.000 description 7
- 238000011084 recovery Methods 0.000 description 7
- 239000005708 Sodium hypochlorite Substances 0.000 description 5
- 239000003957 anion exchange resin Substances 0.000 description 5
- 239000012535 impurity Substances 0.000 description 5
- 239000002245 particle Substances 0.000 description 5
- SUKJFIGYRHOWBL-UHFFFAOYSA-N sodium hypochlorite Chemical compound [Na+].Cl[O-] SUKJFIGYRHOWBL-UHFFFAOYSA-N 0.000 description 5
- ZAMOUSCENKQFHK-UHFFFAOYSA-N Chlorine atom Chemical compound [Cl] ZAMOUSCENKQFHK-UHFFFAOYSA-N 0.000 description 4
- 239000000460 chlorine Substances 0.000 description 4
- 229910052801 chlorine Inorganic materials 0.000 description 4
- 230000000694 effects Effects 0.000 description 4
- 230000003203 everyday effect Effects 0.000 description 4
- 239000000945 filler Substances 0.000 description 4
- 239000007789 gas Substances 0.000 description 4
- 238000005192 partition Methods 0.000 description 4
- 239000000126 substance Substances 0.000 description 4
- 230000003647 oxidation Effects 0.000 description 3
- 238000007254 oxidation reaction Methods 0.000 description 3
- 238000004140 cleaning Methods 0.000 description 2
- 238000010586 diagram Methods 0.000 description 2
- 239000003792 electrolyte Substances 0.000 description 2
- 238000011049 filling Methods 0.000 description 2
- 239000003014 ion exchange membrane Substances 0.000 description 2
- 241000894006 Bacteria Species 0.000 description 1
- BVKZGUZCCUSVTD-UHFFFAOYSA-M Bicarbonate Chemical compound OC([O-])=O BVKZGUZCCUSVTD-UHFFFAOYSA-M 0.000 description 1
- 239000006004 Quartz sand Substances 0.000 description 1
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 1
- 208000034699 Vitreous floaters Diseases 0.000 description 1
- 230000002411 adverse Effects 0.000 description 1
- 238000005349 anion exchange Methods 0.000 description 1
- 150000001450 anions Chemical class 0.000 description 1
- RHZUVFJBSILHOK-UHFFFAOYSA-N anthracen-1-ylmethanolate Chemical compound C1=CC=C2C=C3C(C[O-])=CC=CC3=CC2=C1 RHZUVFJBSILHOK-UHFFFAOYSA-N 0.000 description 1
- 239000003830 anthracite Substances 0.000 description 1
- 230000009286 beneficial effect Effects 0.000 description 1
- 238000007664 blowing Methods 0.000 description 1
- 238000005341 cation exchange Methods 0.000 description 1
- 239000013522 chelant Substances 0.000 description 1
- 238000006243 chemical reaction Methods 0.000 description 1
- 230000015271 coagulation Effects 0.000 description 1
- 238000005345 coagulation Methods 0.000 description 1
- 230000000052 comparative effect Effects 0.000 description 1
- 238000005261 decarburization Methods 0.000 description 1
- 238000006298 dechlorination reaction Methods 0.000 description 1
- 230000007423 decrease Effects 0.000 description 1
- 238000005265 energy consumption Methods 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 238000001914 filtration Methods 0.000 description 1
- 239000004615 ingredient Substances 0.000 description 1
- 239000004973 liquid crystal related substance Substances 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 238000001471 micro-filtration Methods 0.000 description 1
- 229920001467 poly(styrenesulfonates) Polymers 0.000 description 1
- 230000001172 regenerating effect Effects 0.000 description 1
- 150000003839 salts Chemical class 0.000 description 1
- 238000007789 sealing Methods 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
- 230000001954 sterilising effect Effects 0.000 description 1
- 238000004659 sterilization and disinfection Methods 0.000 description 1
- 238000006467 substitution reaction Methods 0.000 description 1
- 239000008399 tap water Substances 0.000 description 1
- 235000020679 tap water Nutrition 0.000 description 1
- 239000002351 wastewater Substances 0.000 description 1
Images
Classifications
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- C—CHEMISTRY; METALLURGY
- C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F9/00—Multistage treatment of water, waste water or sewage
-
- C—CHEMISTRY; METALLURGY
- C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F1/00—Treatment of water, waste water, or sewage
- C02F1/001—Processes for the treatment of water whereby the filtration technique is of importance
-
- C—CHEMISTRY; METALLURGY
- C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F1/00—Treatment of water, waste water, or sewage
- C02F1/20—Treatment of water, waste water, or sewage by degassing, i.e. liberation of dissolved gases
-
- C—CHEMISTRY; METALLURGY
- C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F1/00—Treatment of water, waste water, or sewage
- C02F1/30—Treatment of water, waste water, or sewage by irradiation
- C02F1/32—Treatment of water, waste water, or sewage by irradiation with ultraviolet light
-
- C—CHEMISTRY; METALLURGY
- C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F1/00—Treatment of water, waste water, or sewage
- C02F1/42—Treatment of water, waste water, or sewage by ion-exchange
-
- C—CHEMISTRY; METALLURGY
- C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F1/00—Treatment of water, waste water, or sewage
- C02F1/44—Treatment of water, waste water, or sewage by dialysis, osmosis or reverse osmosis
- C02F1/441—Treatment of water, waste water, or sewage by dialysis, osmosis or reverse osmosis by reverse osmosis
-
- C—CHEMISTRY; METALLURGY
- C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F1/00—Treatment of water, waste water, or sewage
- C02F1/50—Treatment of water, waste water, or sewage by addition or application of a germicide or by oligodynamic treatment
-
- C—CHEMISTRY; METALLURGY
- C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F1/00—Treatment of water, waste water, or sewage
- C02F1/52—Treatment of water, waste water, or sewage by flocculation or precipitation of suspended impurities
- C02F1/5236—Treatment of water, waste water, or sewage by flocculation or precipitation of suspended impurities using inorganic agents
-
- C—CHEMISTRY; METALLURGY
- C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F1/00—Treatment of water, waste water, or sewage
- C02F1/66—Treatment of water, waste water, or sewage by neutralisation; pH adjustment
-
- C—CHEMISTRY; METALLURGY
- C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F1/00—Treatment of water, waste water, or sewage
- C02F1/42—Treatment of water, waste water, or sewage by ion-exchange
- C02F2001/427—Treatment of water, waste water, or sewage by ion-exchange using mixed beds
-
- C—CHEMISTRY; METALLURGY
- C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F2103/00—Nature of the water, waste water, sewage or sludge to be treated
- C02F2103/02—Non-contaminated water, e.g. for industrial water supply
- C02F2103/04—Non-contaminated water, e.g. for industrial water supply for obtaining ultra-pure water
-
- C—CHEMISTRY; METALLURGY
- C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F2303/00—Specific treatment goals
- C02F2303/04—Disinfection
-
- C—CHEMISTRY; METALLURGY
- C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F2303/00—Specific treatment goals
- C02F2303/14—Maintenance of water treatment installations
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- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02A—TECHNOLOGIES FOR ADAPTATION TO CLIMATE CHANGE
- Y02A20/00—Water conservation; Efficient water supply; Efficient water use
- Y02A20/124—Water desalination
- Y02A20/131—Reverse-osmosis
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- Life Sciences & Earth Sciences (AREA)
- Hydrology & Water Resources (AREA)
- Engineering & Computer Science (AREA)
- Environmental & Geological Engineering (AREA)
- Water Supply & Treatment (AREA)
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Treatment Of Water By Ion Exchange (AREA)
- Separation Using Semi-Permeable Membranes (AREA)
- Physical Water Treatments (AREA)
Abstract
The invention provides an ultrapure water production system, which does not need acid and alkali to regenerate an ion exchange device, reduces the cost and reduces the concentration of dissolved nitrogen in the prepared ultrapure water. The system comprises a raw water tank, a first heat exchanger, a multi-media filter, a decarbonization tower, an activated carbon filter, a UV sterilizer, a cartridge filter, a reverse osmosis system, a water production tank, a first TOC-UV device, a double-bed resin electric regeneration desalting system, a boron removal chelating resin tower, a first degassing membrane device, a ultrapure water tank, a second heat exchanger, a second TOC-UV device, an ion exchange device, a degassing membrane system, a terminal ultrafiltration device and an ultrapure water using point which are connected in sequence; the ultrapure water tank is connected with the double-layer bed resin electric regeneration desalting system; the degassing membrane system comprises a second degassing membrane device and a third degassing membrane device which are connected in sequence, wherein the second degassing membrane device adopts a nitrogen purging and vacuumizing operation mode, and the third degassing membrane device adopts a vacuumizing operation mode. In addition, methods of using the system are also provided.
Description
Technical Field
The invention relates to the technical field of water treatment, in particular to an ultrapure water manufacturing system and an ultrapure water manufacturing method using the same.
Background
Conventionally, in the field of manufacturing electronic devices such as semiconductors and liquid crystal panels, it has been necessary to use a large amount of ultrapure water containing a very small amount of impurities, ions, and organic substances in order to clean the products. In particular, in a semiconductor manufacturing process, as the production of semiconductors decreases and the wafer size increases, higher and higher demands are being placed on ultrapure water to be used.
Ultrapure water used in a semiconductor manufacturing process is mainly manufactured by an ultrapure water manufacturing system and supplied to a point of use, and a conventional ultrapure water manufacturing system generally includes: pretreatment system, system of making, polishing system. In the pretreatment system, raw water is often subjected to turbidity removal by a turbidity removal treatment apparatus such as coagulation filtration, microfiltration membrane, ultrafiltration membrane, or the like, and a dechlorination treatment apparatus such as activated carbon or the like. The system is made to remove impurities such as ions, TOC (total organic carbon) and the like contained in the pretreated effluent through different combinations of devices such as an ion exchange device, a reverse osmosis membrane and the like. The polishing system removes very small amounts of particles, ions, and organic substances from the produced water by an ultraviolet oxidation apparatus (UV apparatus), an ion exchange apparatus, a degassing membrane apparatus, a terminal ultrafiltration apparatus (UF apparatus), and the like, thereby producing ultrapure water having a higher purity.
In a manufacturing system, through different combinations of devices such as an ion exchange device and a reverse osmosis membrane (RO membrane), the common combinations are a cation exchange device, a decarbonization tower, an anion exchange device, a reverse osmosis membrane and a mixed bed ion exchange device or a two-stage reverse osmosis membrane and a mixed bed ion exchange device, and excessive acid and alkali are used when the ion exchange device is regenerated, so that the treatment cost of a large amount of acid and alkali waste liquid is high, a large amount of acid and alkali waste is caused, and simultaneously impurities and organic matters in the acid and alkali solution bring more potential risks to the operation of equipment. Further, adverse effects of dissolved nitrogen contained in ultrapure water on semiconductor products have been problematic, and it has been an important technical problem to reduce the concentration of dissolved nitrogen in ultrapure water in addition to low dissolved oxygen.
The system and method for producing ultrapure water of chinese patent CN 109982976 propose to produce ultrapure water by using a system of "2B 3T ion exchanger + RO system + mixed bed type ion exchanger + boron selective ion exchange resin + polishing system". The process still uses a large amount of acid and alkali to regenerate the ion exchange device, the regeneration cost is high, and secondary pollution is also caused.
Chinese patent CN 110049952 ultrapure water manufacturing apparatus and method for operating ultrapure water manufacturing apparatus, in the polishing system, the method of degassing membrane is used to remove dissolved oxygen in water, and the method of nitrogen purging and vacuum pumping is still used, which mainly aims at the ultrapure water processing system that does not require dissolved nitrogen, and does not consider the removal of dissolved nitrogen in ultrapure water, which results in high content of dissolved nitrogen at the using point of ultrapure water and increases the risk of water use.
Disclosure of Invention
Aiming at the problems of cost increase and high dissolved nitrogen concentration caused by using excessive acid and alkali to regenerate the ion exchange device in the existing pure water preparation process, the invention provides an ultrapure water preparation system and an ultrapure water preparation method using the system, which does not need to use acid and alkali to regenerate the ion exchange device, reduces the cost and reduces the dissolved nitrogen concentration of the prepared ultrapure water.
The technical scheme is as follows: an ultrapure water manufacturing system comprises a pretreatment system, a manufacturing system and a polishing system, wherein the pretreatment system comprises a raw water tank, a first heat exchanger, a multi-media filter, a decarbonization tower, an activated carbon filter, a UV sterilizer, a safety filter and a reverse osmosis system which are connected in sequence, the water produced by the reverse osmosis system is connected with the manufacturing system, the manufacturing system comprises a water producing tank, a first TOC-UV device, a double-bed resin electric regeneration desalting system, a boron removal chelating resin tower, a first degassing membrane device and an ultrapure water tank which are connected in sequence, the ultrapure water tank is connected with the polishing system, and the polishing system comprises a second heat exchanger, a second TOC-UV device, an ion exchange device, a degassing membrane system, a terminal ultrafiltration device and an ultrapure water using point which are connected in sequence; the ultrapure water tank is connected with the double-layer bed resin electric regeneration desalting system; the degassing membrane system comprises a second degassing membrane device and a third degassing membrane device which are connected in sequence, wherein the second degassing membrane device adopts a nitrogen purging and vacuumizing operation mode, and the third degassing membrane device adopts a vacuumizing operation mode.
Preferably, the double-bed resin electric regeneration desalting system comprises a double-bed type ion exchange device, and a positive electrode plate and a negative electrode plate which are arranged at two ends of a resin layer in the double-bed type ion exchange device.
Preferably, the double-bed resin electric regeneration desalting system comprises a shell, wherein the positive electrode plate, the upper-layer partition plate, the strong acid and strong base mixed resin, the middle-layer partition plate, the weak acid and strong base mixed resin, the lower-layer partition plate and the negative electrode plate are sequentially arranged in the shell.
Preferably, the reverse osmosis system is a seawater desalination type reverse osmosis device.
An ultrapure water production method using the ultrapure water production system, wherein raw water is pretreated by using the pretreatment system; treating the produced water of the pretreatment system by using the preparation system; the production of the production system was treated using the polishing system described above and ultrapure water was produced.
Preferably, the ultrapure water is manufactured by the specific steps that raw water enters a raw water pool, the water temperature of the water in the raw water pool is adjusted to 21-25 ℃ through a first heat exchanger, then the water passes through a multi-media filter, the pH is adjusted to 6.5-6.8 through adding hydrochloric acid before entering the multi-media filter, and a bactericide and a coagulant are added; adjusting pH of the water passing through the multi-media filter to 3-4 by adding hydrochloric acid, and thenIntroducing into a decarbonizing tower to remove CO2Removing; conveying the produced water of the decarbonization tower to an active carbon filter through a water pump, adding sodium hydroxide into the produced water of the active carbon filter to adjust the pH value to 8.5-9.5, then passing through a UV sterilizer, passing the effluent of the UV sterilizer through a security filter, then entering a reverse osmosis system, passing the reverse osmosis produced water into a water producing pool, passing the water in the water producing pool through a first TOC-UV device, then entering a double-bed resin electric regeneration desalting system, leading the speed of the water led into the double-bed resin electric regeneration desalting system to be within the range of 30-80 m/h, arranging a pair of positive and negative electrodes at two ends of a resin layer, adopting the alternating operation of ion exchange treatment and electric regeneration, applying direct current to the resin layer and leading pure water reversely during regeneration, wherein the flow rate of the water is within the range of 5-10 m/h; then entering a boron removal chelating resin tower, wherein the water inlet speed is within the range of 30-80 m/h, the water passing through the boron removal chelating resin tower passes through a first degassing membrane device to remove dissolved oxygen in the water, the degassing membrane device adopts a nitrogen purging and vacuum operation mode, the produced water directly enters a ultrapure water tank, the water in the ultrapure water tank firstly passes through a second heat exchanger to adjust the water temperature to the terminal water supply temperature, then passes through a second TOC-UV device, the water passing through the second TOC-UV device passes through an ion exchange device, the effluent enters a degassing membrane system, the second degassing membrane device in the degassing membrane system adopts the nitrogen purging and vacuum operation mode, the third degassing membrane device adopts a vacuum operation mode, and the nitrogen flow of the second degassing membrane device is 2.0 m/h3/h-2.5m3Between every two hours, the vacuum degrees of the second degassing membrane device and the third degassing membrane device are both greater than 0.09MPa when the vacuum degree is pumped; finally, the ultra-pure water is directly supplied to a water point for ultra-pure water through the treatment of a terminal ultra-filtration device.
Preferably, the reverse osmosis system adopts a seawater desalination membrane.
Preferably, the reverse osmosis system is further connected with a backwashing water tank, the backwashing water tank is connected with the multi-media filter and the activated carbon filter, and the double-bed resin electric regeneration desalting system is connected with the backwashing water tank.
Preferably, the ultrapure water use point is connected to the ultrapure water tank, and the ultrapure water not used at the ultrapure water use point is returned to the ultrapure water tank.
Preferably, the ion exchange device is a mixed bed type ion exchange device, and the interior of the mixed bed type ion exchange device is filled with polishing resin.
The beneficial effects brought by adopting the system and the method are as follows: the common double-bed ion exchange tower is replaced by the double-bed resin electric regeneration desalting system, and under the condition of similar removal efficiency, pure water is used for replacing acid and alkali for regeneration in an electrifying mode, so that the discharge of a large amount of acid and alkali waste liquid in the regeneration of the traditional process is avoided, the total ion exchange resin regeneration cost is saved, and the investment cost of the total acid and alkali regeneration system is saved; meanwhile, the degassing membrane system in the polishing stage adopts two stages of degassing membrane devices with different operation modes, and adopts the modes of nitrogen purging, vacuum pumping and vacuum pumping respectively in sequence, so that extremely low dissolved oxygen and dissolved nitrogen concentration can be achieved simultaneously, and the effluent quality of terminal ultrapure water is improved.
Drawings
FIG. 1 is a block diagram of the present invention;
FIG. 2 is a schematic diagram of a double bed resin electric regeneration desalination system;
FIG. 3 is a schematic view of a mixed bed ion exchange apparatus.
Detailed Description
An ultrapure water production system as shown in fig. 1 comprises a pretreatment system, a production system and a polishing system, wherein the pretreatment system comprises a raw water tank 1, a first heat exchanger 2, a multimedia filter 3 (the adopted filter material can be anthracite, quartz sand and gravel), a decarburization tower 4, an activated carbon filter 5, a UV sterilizer 6, a security filter 7 and a reverse osmosis system 8 which are connected in sequence, the reverse osmosis system 8 produces water and is connected with the production system, the production system comprises a water production tank 9, a first TOC-UV device 10 (an ultraviolet oxidation device, which can adopt SCD H series of quaafine), a double-bed resin electric regeneration desalting system 11, a boron removal chelating resin tower 12 (boron removal resin can adopt UP7530 of Rohm and Haas, anion resin is Dowex Monosphere 550A of Dow), a first degassing membrane device 13, an ultrapure water tank 14, the ultrapure water tank 14 is connected with the polishing system, the polishing system comprises a second heat exchanger 15, a second TOC-UV device 16, an ion exchange device 17, a degassing membrane system 18, a terminal ultrafiltration device 19 and an ultrapure water use point 20 which are connected in sequence; the ultrapure water tank 14 is connected with the double-layer bed resin electric regeneration desalting system 11; degassing membrane system 18 includes a second degassing membrane apparatus that employs a nitrogen purge and evacuation mode of operation and a third degassing membrane apparatus that employs an evacuation mode of operation connected in series.
Adopt the electric regeneration desalination system of double-deck bed resin to replace the double-deck bed ion exchange device who commonly uses, can reach the same effect of getting rid of even better to ion and TOC, when regenerating, pressurize resin layer both ends through the mode of circular telegram, replace the acid-base with pure water and regenerate, avoided the discharge of a large amount of acid-base waste liquids when traditional ion exchange technology regeneration like this, practiced thrift the regenerated acid-base of whole ion exchange resin, saved the investment cost of whole acid-base regeneration acid-base system. Meanwhile, a set of boron removal chelating resin tower is added behind the desalting system, so that weak electrolyte boron in water can be removed deeply, the operation load of a terminal polishing system can be reduced, and the effluent quality of terminal ultrapure water is improved. And moreover, a two-stage degassing membrane device with different operation modes is adopted, a first stage adopts a nitrogen purging and vacuum adding mode to ensure that the removal rate of dissolved oxygen reaches more than 99.9 percent and ensure that the content of the dissolved oxygen is less than or equal to 0.5 mu g/L, and a second stage adopts a gas side vacuum pumping mode, so that compared with the first stage adopting gas side vacuum pumping, the second stage adopts a nitrogen purging and vacuum adding mode, the lower content of the dissolved nitrogen (less than or equal to 0.5 mg/L) can be achieved, and the dissolved nitrogen impurities introduced by the second stage nitrogen purging are avoided while the higher removal rate of the dissolved oxygen (less than or equal to 0.2 mu g/L) is obtained.
Specifically, the double-bed resin electric regeneration desalination system 11 shown in fig. 2 comprises a double-bed ion exchange device, and a positive electrode plate 111 and a negative electrode plate 117 which are arranged at two ends of a resin layer in the double-bed ion exchange device; the double-bed resin electric regeneration desalting system 11 comprises a shell, wherein a positive pole plate 111, an upper-layer clapboard 112, strong acid and strong base mixed resin 113, a middle-layer clapboard 114, weak acid and strong base mixed resin 115, a lower-layer clapboard 116 and a negative pole plate 117 are sequentially arranged in the shell; the reverse osmosis system 8 is a seawater desalination type reverse osmosis device, which is a reverse osmosis device adopting a seawater desalination membrane, the seawater desalination membrane can be a seawater desalination membrane SW30HRLE-440i produced by the Dow chemical company, under the condition that the quality of the inlet water is basically the same, the method has good effects of desalting, removing boron and removing TOC, can reduce the operation load of a subsequent system, reduces the cleaning times of a reverse osmosis system, and the cleaning cost of the reverse osmosis system is further saved, and meanwhile, the traditional 2B3T ion exchange device used at the stage is reduced, so that the discharge of a large amount of acid-base waste liquid in the regeneration of the traditional ion exchange process is avoided, the cost of acid-base generated by the regeneration of ion exchange resin is saved, the investment cost of an acid-base regeneration system is saved, and the cost of dangerous waste disposal in the replacement of waste resin is also avoided. The reverse osmosis system 8 is also connected with a backwashing water tank 21, the backwashing water tank 21 is connected with the multi-media filter 3 and the activated carbon filter 5, and the double-bed resin electric regeneration desalting system 11 is connected with the backwashing water tank 21; the ultrapure water using point 20 is connected with the ultrapure water tank 14; the ion exchange apparatus 17 shown in fig. 3 is a mixed bed type ion exchange apparatus, the interior of which is filled with a polishing resin 172 (polishing resin UP6040 of roman hass may be used) through a lower partition plate 171, which can further remove dissolved oxygen in water on the basis of removing residual ions in pure water, and can further reduce the concentration of dissolved oxygen in ultrapure water on the basis of a degassing membrane apparatus using two stages of different operation modes by using the mixed bed type ion exchange apparatus.
The method using the ultrapure water manufacturing system comprises the following steps: raw water enters a raw water tank 1, water in the raw water tank 1 passes through a raw water heat exchanger through a water pump, the water temperature is adjusted to 21-25 ℃, then the water passes through a multi-media filter 3, the pH is adjusted to 6.5-6.8 by adding hydrochloric acid before entering the multi-media filter 3, then sodium hypochlorite and PAC are added simultaneously, the sodium hypochlorite is added to sterilize tap water, and the PAC is added to flocculate suspended matters in the water into larger floaters so that the multi-media filter 3 can effectively intercept the suspended matters. Adding hydrochloric acid into water passing through a multi-media filter 3 to adjust pH to 3-4, and then feeding into a decarbonization tower 4, H+With HCO3 -Combined to CO2And CO is passed through a decarbonizing column 42And (5) removing.
The water produced by the decarbonization tower 4 enters a decarbonization water tank, and is conveyed to an activated carbon filter 5 through a water pump, the activated carbon filter 5 and the filler are mainly activated carbon and are mainly used for removing organic substances and residual chlorine in the water so as to protect a subsequent RO (reverse osmosis) membrane from oxidation and organic pollution. The pH value of the produced water of the activated carbon filter 5 is adjusted to 8.5-9.5 by adding sodium hydroxide, the desalination rate and the TOC (total organic carbon) removal rate of a rear-end RO (reverse osmosis) membrane are improved to a certain extent, the produced water of the activated carbon filter 5 passes through the UV sterilizer 6, the UV sterilizer 6 adopts ultraviolet rays with the wavelength of 254nm for sterilization, and the RO membrane is sterilized by adopting UV before the system, so that the condition that the RO membrane is polluted and blocked by bacteria can be effectively prevented.
The effluent of the UV sterilizer 6 passes through a 5 mu m filter cartridge 7 and enters a seawater desalination type reverse osmosis device by the pressurization of an RO high-pressure pump, the reverse osmosis device adopts a seawater desalination reverse osmosis membrane element with high desalination rate and low energy consumption, the water inlet pressure is more than 2.0MPa, the removal rate of TDS (total dissolved solids) can exceed 99.2 percent, and the recovery rate can reach 75-80 percent of water recovery rate, by adopting the seawater desalination type reverse osmosis system, higher desalination rate and boron removal rate can be realized under the conditions of higher salt content of inlet water and higher water inlet pressure, and simultaneously higher TOC removal rate is also realized for inlet water, the TDS of produced water is 0.5-1.3mg/L, and the TOC is 30-100 mu g/L. The reverse osmosis produced water enters a water producing tank 9, the concentrated water enters a backwashing water tank 21, and the concentrated water can be used for backwashing of the pretreatment system.
Water in the water producing tank 9 is conveyed by a water pump, firstly passes through a first TOC-UV device 10, the TOC-UV device adopts ultraviolet light with 185nm wavelength, the ultraviolet light with 185nm wavelength can effectively decompose TOC in the water, and then enters a double-bed resin electric regeneration desalting system 11, a pair of positive and negative electrodes can be arranged at two ends of a resin layer of a traditional double-bed ion exchange device, an ion exchange membrane does not need to be added in a mode of adding the electrodes, the difficulty in manufacturing equipment is reduced, and the alternative operation of exchange treatment and electric regeneration or other ion exchange resin electric regeneration devices can be adopted. In operation, as with conventional double bed ion exchange columns, the strong exchange capacity of the resin is relied upon to remove impurities from the waterA proton ion; during electric regeneration, direct current is applied to the resin layer to enable ion exchange balance to move towards the direction of regeneration reaction, and meanwhile, pure water is introduced to discharge regenerated ions out of the resin layer into a backwashing water tank, so that the regeneration system can be used for backwashing. The double-layer bed is formed by filling a weak acid and strong base resin 115 at the lower layer and filling a strong acid and strong base resin 113 at the upper layer. The velocity of water introduced into the double-layer bed resin electric regeneration desalting system is in the range of 30-80 m/h, generally 60m/h can be selected, the water flow direction is opposite during regeneration, the water flow velocity is in the range of 5-10 m/h, generally 10m/h can be selected, and the bed height and the resin height can be calculated by applying direct current voltage to the resin layer. The effluent resistivity can be stabilized above 17.5M omega cm, and the effluent TOC is less than 5 mu g/L. Further, in order to remove weak electrolyte boron in water, a set of boron removal chelating resin tower 12 is additionally arranged behind a double-bed resin electric regeneration desalting system, the filler of the set of boron removal chelating resin tower 12 is divided into two layers of boron removal ion exchange resin and anion exchange resin, boron is removed through touching the ion exchange resin, then TOC ingredients dissolved out from the boron removal ion exchange resin are removed through the anion exchange resin, the speed of water is within the range of 30-80 m/h, generally 60m/h can be selected, the volume ratio of the boron removal ion exchange resin to the anion exchange resin is 3: 1-4: 1, and the set of boron removal chelating resin tower does not need to be regenerated. The water passing through the boron-removing chelate resin tower passes through a first degassing membrane device 13 to remove dissolved oxygen in the water, the degassing membrane device adopts a nitrogen blowing and vacuum operation mode, and the nitrogen flow rate is 2.0-2.5m3The vacuum degree is more than 0.09MPa when the vacuum is pumped between hours. The produced water directly enters the ultrapure water tank 14, and the ultrapure water tank 14 adopts a nitrogen sealing mode to prevent other gases from being dissolved into the water.
The water in the ultrapure water tank 14 is conveyed by a water pump, the temperature of the water is adjusted to 21-23 ℃ of the terminal water supply temperature through a pure water heat exchanger, and then the water passes through a second TOC-UV device 16, wherein ultraviolet light with 185nm wavelength is adopted by the second TOC-UV device 16. The water after TOC-UV TOC removal passes through the mixed bed type ion exchange device after being pressurized by the pure water booster pump, the speed of the water introduced into the mixed bed type ion exchange device is within the range of 50 m/h-100 m/h, generally 80m/h can be selected, and the mixed bed type ion exchange deviceThe resin does not need to be regenerated, the service life is 2-3 years generally, the resin can be directly and completely replaced after 2-3 years, and the water outlet resistivity can be stabilized above 18.2M omega cm. The effluent enters a degassing membrane system 18, enters a second degassing membrane device in a nitrogen purging and vacuum operation mode, enters a third degassing membrane device in a vacuum pumping operation mode, is connected in series, and has two vacuum pumps working independently, wherein the nitrogen flow rate of the first part is 2.0-2.5m3Between h, the vacuum degree of the two sections is more than 0.09 MPa. The ultrapure water is finally subjected to a final ultrafiltration treatment and directly supplied to an ultrapure water use point 20, and the ultrapure water not used at the use point can be returned to the ultrapure water tank 14 and circulated.
The following uses the examples to illustrate the effects:
example 1: the water quality of raw water in a certain 12-inch integrated circuit semiconductor manufacturing plant is 250-350 mu S/cm in electrical conductivity, 2-2.5mg/L in TOC and 100t/h in water consumption. The operation is carried out for 24 hours every day. The implementation of the embodiment comprises the following steps:
the first step is as follows: the water temperature is adjusted to 23 ℃ by a raw water heat exchanger, the pH is adjusted to 6.8 by adding hydrochloric acid before entering a multi-media filter, then sodium hypochlorite and PAC are added simultaneously, and the turbidity of filtered water passing through the multi-media filter is less than 0.01 NTU.
The second step is that: the pH value of the inlet water of the decarbonization tower is adjusted to 3.5, then the produced water of the decarbonization tower enters an active carbon filter, the residual chlorine of the outlet water of the active carbon filter is less than 0.1mg/L, and the pH value of the outlet water is adjusted to 9.0.
The third step: the reverse osmosis system has the water inlet pressure of 2.1MPa, the inlet water TDS of 150-200 mg/L, the inlet water TOC of 1.5-2mg/L, the recovery rate of the reverse osmosis system of 80 percent, the outlet water TDS of 0.8-1.2 mg/L and the TOC of 30-80 mu g/L.
The fourth step: the resistivity of the effluent of the double-layer bed resin electric regeneration desalting system is larger than 17.5M omega cm, the direct-current voltage applied to the resin layer during regeneration is changed between 1300V and 1500V, the resistivity of the effluent of the double-layer bed resin electric regeneration desalting system can be stabilized above 17.5M omega cm through multiple times of regeneration, and the TOC of the effluent is smaller than 5 mu g/L. The filler adopted by the boron-removing chelating resin tower is divided into two layers of boron-removing ion exchange resin and anion exchange resin, the boron concentration of effluent is less than 2 mug/L, and the TOC is less than 5 mug/L.
The fifth step: the dissolved oxygen of the inlet water of the first degassing membrane device after the boron chelate resin removal tower is 200-400 mu g/L, and the dissolved oxygen concentration of the outlet water is less than 10 mu g/L.
And a sixth step: the temperature of the outlet water of the ultrapure water tank is reduced to 23 +/-1 ℃ through a heat exchanger, the resistivity of the outlet water of the ion exchange device can be stabilized above 18.2M omega cm, and the TOC of the outlet water is less than 0.5 mu g/L.
The seventh step: the concentration of dissolved oxygen of inlet water of the degassing membrane system is 5-20 mu g/L, the concentration of dissolved nitrogen is 10-20 mg/L, the concentration of dissolved oxygen of outlet water of the first degassing membrane device is less than 0.5 mu g/L, the concentration of dissolved nitrogen is less than or equal to 2mg/L, the concentration of dissolved oxygen of outlet water of the second degassing membrane device is less than 0.2 mu g/L, the concentration of dissolved nitrogen is less than 0.5mg/L, and particles which are larger than or equal to 0.05 mu m and are discharged from ultrapure water after terminal ultrafiltration are less than 100 pcs/L.
Example 2: the water quality of raw water in a certain 12-inch integrated circuit semiconductor manufacturing plant has the conductivity of 200-. The operation is carried out for 24 hours every day. The implementation of the embodiment comprises the following steps:
the first step is as follows: the water temperature is adjusted to 23 ℃ by a raw water heat exchanger, the pH is adjusted to 6.5 by adding hydrochloric acid before entering a multi-media filter, then sodium hypochlorite and PAC are added simultaneously, and the turbidity of filtered water passing through the multi-media filter is less than 0.01 NTU.
The second step is that: the pH value of the inlet water of the decarbonization tower is adjusted to 4.5, then the produced water of the decarbonization tower enters an active carbon filter, the residual chlorine of the outlet water of the active carbon filter is less than 0.1mg/L, and the pH value of the outlet water is adjusted to 9.0.
The third step: the reverse osmosis system has the water inlet pressure of 2.2MPa, the inlet water TDS of 120-150 mg/L, the inlet water TOC of 1.5-2mg/L, the recovery rate of 85 percent, the outlet water TDS of 0.8-1.2 mg/L and the TOC of 20-70 mu g/L.
The fourth step: the resistivity of the effluent of the double-layer bed resin electric regeneration desalting system is larger than 17.7M omega cm, the direct-current voltage applied to the resin layer during regeneration is changed between 1200V and 1300V, the resistivity of the effluent of the double-layer bed resin electric regeneration desalting system can be stabilized above 17.7M omega cm through multiple times of regeneration, and the TOC of the effluent is smaller than 4 mug/L. The filler adopted by the boron-removing chelating resin tower is divided into two layers of boron-removing ion exchange resin and anion exchange resin, the boron concentration of effluent is less than 2 mug/L, and the TOC is less than 4 mug/L.
The fifth step: the dissolved oxygen of the inlet water of the first-stage degassing membrane device after the boron-removing chelating resin tower is 200-350 mu g/L, and the dissolved oxygen concentration of the outlet water is less than 10 mu g/L.
And a sixth step: the temperature of the outlet water of the ultrapure water tank is reduced to 22 +/-1 ℃ through a heat exchanger, the resistivity of the outlet water of the ion exchange device can be stabilized above 18.2M omega cm, and the TOC of the outlet water is less than 0.5 mu g/L.
The seventh step: the concentration of dissolved oxygen in inlet water of the degassing membrane system is 5-20 mu g/L, the concentration of dissolved nitrogen is 10-20 mg/L, the concentration of dissolved oxygen in outlet water of the first degassing membrane device is less than 0.5 mu g/L, the concentration of dissolved nitrogen is less than or equal to 2.2 mg/L, the concentration of dissolved oxygen in outlet water of the second degassing membrane device is less than 0.15 mu g/L, the concentration of dissolved nitrogen is less than 0.4 mg/L, and particles which are larger than or equal to 0.05 mu m and smaller than 100pcs/L in outlet water of ultrapure water after terminal ultrafiltration.
Comparative example: the water quality of raw water in a certain 12-inch integrated circuit semiconductor manufacturing plant has the conductivity of 200-. The operation is carried out for 24 hours every day. The implementation of the embodiment comprises the following steps:
the first step is as follows: the water temperature is adjusted to 23 ℃ by a raw water heat exchanger, the pH is adjusted to 6.8 by adding hydrochloric acid before entering a multi-media filter, then sodium hypochlorite and PAC are added simultaneously, and the turbidity of filtered water passing through the multi-media filter is less than 0.01 NTU.
The second step is that: the pH value of the inlet water of the decarbonization tower is adjusted to 3.5, then the produced water of the decarbonization tower enters an active carbon filter, the residual chlorine of the outlet water of the active carbon filter is less than 0.1mg/L, and the pH value of the outlet water is adjusted to 9.0.
The third step: the two-stage common reverse osmosis membrane system is adopted, the water inlet pressure of the two-stage reverse osmosis system is 1.2MPa, the water inlet TDS is 150-200 mg/L, the water inlet TOC is 1.5-2mg/L, the recovery rate of the first-stage reverse osmosis system is 80%, the recovery rate of the second-stage reverse osmosis system is 90%, the total recovery rate is 72%, the TDS of the two-stage reverse osmosis water outlet is 0.8-1.0 mg/L, and the TOC is 30-50 mu g/L.
The fourth step: the resistivity of the effluent of the mixed bed type ion exchange device is more than 17.7M omega cm, the TOC of the effluent is less than 5 mu g/L, and the boron concentration of the effluent is 20-50 mu g/L. During regeneration, backwashing, layering and acid-base regeneration are required, the total usage amount of acid and base used in one year exceeds 30 t/year, the discharge amount of waste liquid exceeds 300 t/year, and the generated acid-base waste liquid is discharged after entering a wastewater system for treatment.
The fifth step: the dissolved oxygen of the inlet water of the first-stage degassing membrane device behind the mixed bed type ion exchange device is 200-350 mu g/L, and the dissolved oxygen concentration of the outlet water is less than 10 mu g/L.
And a sixth step: the temperature of the outlet water of the ultrapure water tank is reduced to 22 +/-1 ℃ through a heat exchanger, the resistivity of the outlet water of the ion exchange device can be stabilized above 18.2M omega cm, and the TOC of the outlet water is less than 0.5 mu g/L.
The seventh step: the method is characterized in that a degassing membrane device with a first stage adopting gas side vacuumizing and a second stage adopting nitrogen purging and vacuumizing is adopted, the dissolved oxygen concentration of inlet water of the degassing membrane device is 5-20 mu g/L, the dissolved nitrogen concentration is 10-15 mg/L, the dissolved oxygen concentration of outlet water of the first degassing membrane device is less than 2 mu g/L, the dissolved nitrogen concentration is less than or equal to 0.8 mg/L, the dissolved oxygen concentration of outlet water of the second degassing membrane device is less than 0.5 mu g/L, the dissolved nitrogen concentration is less than 1.5mg/L, and particles larger than or equal to 0.05 mu m of outlet water of ultrapure water after terminal ultrafiltration are less than 100 pcs/L.
By adopting the process flow, the final effluent quality can reach the resistivity of more than or equal to 18.2M omega cm, the TOC of less than 0.5 mu g/L, the particle (more than or equal to 0.05 mu M) of less than 100pcs/L, the dissolved oxygen of less than 0.15 mu g/L, the dissolved nitrogen concentration can be optimized from less than or equal to 1.5mg/L to less than 0.5mg/L, the treatment process is simpler, acid and alkali are not needed for regeneration resin regeneration, the double-layer bed design of an ion exchange membrane is not needed, and the water consumption is 100 t/h. The operation is carried out for 24 hours every day, for example, the total usage of acid and alkali can be saved by more than 30 t/year in one year, and the discharge amount of waste liquid is reduced by more than 300 t/year.
The above description is only for the preferred embodiment of the present invention, but the scope of the present invention is not limited thereto, and any changes or substitutions that can be easily conceived by those skilled in the art within the technical scope of the present invention are included in the scope of the present invention. Therefore, the protection scope of the present invention shall be subject to the protection scope of the claims.
Claims (10)
1. An ultrapure water production system, comprising a pretreatment system, a production system and a polishing system, characterized in that: the pretreatment system comprises a raw water pool, a first heat exchanger, a multi-media filter, a decarbonization tower, an activated carbon filter, a UV sterilizer, a security filter and a reverse osmosis system which are connected in sequence, the reverse osmosis system produces water and is connected with the preparation system, the preparation system comprises a water production pool, a first TOC-UV device, a double-bed resin electric regeneration desalting system, a boron removal chelating resin tower, a first degassing membrane device and a super pure water tank which are connected in sequence, the super pure water tank is connected with the polishing system, and the polishing system comprises a second heat exchanger, a second TOC-UV device, an ion exchange device, a degassing membrane system, a terminal ultrafiltration device and an ultrapure water using point which are connected in sequence; the ultrapure water tank is connected with the double-layer bed resin electric regeneration desalting system; the degassing membrane system comprises a second degassing membrane device and a third degassing membrane device which are connected in sequence, wherein the second degassing membrane device adopts a nitrogen purging and vacuumizing operation mode, and the third degassing membrane device adopts a vacuumizing operation mode.
2. An ultrapure water production system according to claim 1 wherein: the double-bed resin electric regeneration desalting system comprises a double-bed type ion exchange device, and a positive electrode plate and a negative electrode plate which are arranged at two ends of a resin layer in the double-bed type ion exchange device.
3. An ultrapure water production system according to claim 2 wherein: the double-layer bed resin electric regeneration desalting system comprises a shell, wherein the positive pole plate, the upper layer clapboard, the strong acid and strong base mixed resin, the middle layer clapboard, the weak acid and strong base mixed resin, the lower layer clapboard and the negative pole plate are sequentially arranged in the shell.
4. An ultrapure water production system according to claim 1 wherein: the reverse osmosis system is a seawater desalination type reverse osmosis device.
5. An ultrapure water production method using the ultrapure water production system according to any one of claims 1 to 4, characterized by comprising: pretreating raw water by using the pretreatment system; treating the produced water of the pretreatment system using the production system; the production of the production system is processed using the polishing system and ultrapure water is produced.
6. The method for producing ultrapure water according to claim 5, wherein: the method comprises the specific steps that raw water enters a raw water pool, the water temperature of the water in the raw water pool is adjusted to 21-25 ℃ through a first heat exchanger, then the water passes through a multi-media filter, the pH is adjusted to 6.5-6.8 through adding hydrochloric acid before entering the multi-media filter, and a bactericide and a coagulant are added; adding hydrochloric acid into water passing through a multi-media filter to adjust pH to 3-4, and introducing into a decarbonization tower to remove CO2Removing; conveying the produced water of the decarbonization tower to an active carbon filter through a water pump, adding sodium hydroxide into the produced water of the active carbon filter to adjust the pH value to 8.5-9.5, then passing through a UV sterilizer, passing the effluent of the UV sterilizer through a security filter, then entering a reverse osmosis system, passing the reverse osmosis produced water into a water producing pool, passing the water in the water producing pool through a first TOC-UV device, then entering a double-bed resin electric regeneration desalting system, leading the speed of the water led into the double-bed resin electric regeneration desalting system to be within the range of 30-80 m/h, arranging a pair of positive and negative electrodes at two ends of a resin layer, adopting the alternating operation of ion exchange treatment and electric regeneration, applying direct current to the resin layer and leading pure water reversely during regeneration, wherein the flow rate of the water is within the range of 5-10 m/h; then entering a boron removal chelating resin tower, wherein the water inlet speed is within the range of 30-80 m/h, the water passing through the boron removal chelating resin tower passes through a first degassing membrane device to remove dissolved oxygen in the water, the degassing membrane device adopts a nitrogen purging and vacuum adding operation mode, the produced water directly enters a ultrapure water tank, the water in the ultrapure water tank firstly passes through a second heat exchanger to adjust the water temperature to the terminal water supply temperature, then passes through a second TOC-UV device, the water passing through the second TOC-UV device passes through an ion exchange device, the effluent enters a degassing membrane system, the second degassing membrane device in the degassing membrane system adopts a nitrogen purging and vacuum adding operation mode, and the third degassing membrane device adopts a vacuum pumping operation modeIn the empty running mode, the nitrogen flow of the second degassing membrane device is 2.0m3/h-2.5m3Between every two hours, the vacuum degrees of the second degassing membrane device and the third degassing membrane device are both greater than 0.09MPa when the vacuum degree is pumped; finally, the ultra-pure water is directly supplied to a water point for ultra-pure water through the treatment of a terminal ultra-filtration device.
7. The method for producing ultrapure water according to claim 5 or 6, wherein: the reverse osmosis system adopts a seawater desalination membrane.
8. The method for producing ultrapure water according to claim 5 or 6, wherein: the reverse osmosis system is also connected with a backwashing water tank, the backwashing water tank is connected with the multi-media filter and the activated carbon filter, and the double-bed resin electric regeneration desalting system is connected with the backwashing water tank.
9. The method for producing ultrapure water according to claim 5 or 6, wherein: the ultrapure water using point is connected with the ultrapure water tank, and the ultrapure water which is not used at the ultrapure water using point returns to the ultrapure water tank.
10. The method for producing ultrapure water according to claim 5 or 6, wherein: the ion exchange device is a mixed bed type ion exchange device, and polishing resin is filled in the ion exchange device.
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| CN114772792A (en) * | 2022-05-23 | 2022-07-22 | 北部湾大学 | Seawater treatment method with synergistic effect of electrostatic adsorption and ultrasonic waves |
| CN114772792B (en) * | 2022-05-23 | 2023-06-23 | 北部湾大学 | Seawater treatment method with synergistic effect of electrostatic adsorption and ultrasonic waves |
| CN116969625A (en) * | 2023-06-26 | 2023-10-31 | 高频(北京)科技股份有限公司 | Wastewater treatment equipment for recycling semiconductor ultrapure water and wastewater treatment process |
| CN116969625B (en) * | 2023-06-26 | 2024-07-19 | 高频(北京)科技股份有限公司 | Waste water treatment equipment for recycling semiconductor ultrapure water |
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