CN111239175A - Three-dimensional topological insulator Bi2Te3Method for distinguishing upper and lower surface state photoinduced anomalous Hall current - Google Patents

Three-dimensional topological insulator Bi2Te3Method for distinguishing upper and lower surface state photoinduced anomalous Hall current Download PDF

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CN111239175A
CN111239175A CN202010169319.2A CN202010169319A CN111239175A CN 111239175 A CN111239175 A CN 111239175A CN 202010169319 A CN202010169319 A CN 202010169319A CN 111239175 A CN111239175 A CN 111239175A
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俞金玲
武文逸
程树英
赖云锋
郑巧
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Abstract

本发明涉及一种三维拓扑绝缘体Bi2Te3上下表面态光致反常霍尔电流区分方法,该方法包括:制备Bi2Te3样品并在其上沉积点状钛金电极和条形钛金电极;获取样品氧化前的XPS光谱;将激光依次通过起偏器、光弹性调制器以及杜瓦瓶窗口,垂直照射在真空杜瓦瓶中样品的几何中心;使用直流电压源施加可调的电压提供纵向电场,在垂直于电场方向上测得氧化前的光致反常霍尔电流;同理获取样品氧化后的XPS光谱和光致反常霍尔电流;对比氧化前后样品的XPS光谱和光致反常霍尔电流,区分三维拓扑绝缘体Bi2Te3上下表面态光致反常霍尔电流。该方法有利于简单、快捷、有效地区分三维拓扑绝缘体Bi2Te3上下表面态光致反常霍尔电流。

Figure 202010169319

The invention relates to a method for distinguishing the upper and lower surface states of a three-dimensional topological insulator Bi 2 Te 3 by photo-induced anomalous Hall current. The method comprises: preparing a Bi 2 Te 3 sample and depositing a point-shaped titanium-gold electrode and a strip-shaped titanium-gold electrode thereon ; Obtain the XPS spectrum of the sample before oxidation; pass the laser through the polarizer, the photoelastic modulator and the Dewar window in sequence, and irradiate the geometric center of the sample in the vacuum dewar vertically; use a DC voltage source to apply an adjustable voltage to provide Longitudinal electric field, the photo-induced anomalous Hall current before oxidation is measured in the direction perpendicular to the electric field; similarly, the XPS spectrum and photo-induced anomalous Hall current of the sample after oxidation are obtained; the XPS spectrum and photo-induced anomalous Hall current of the sample before and after oxidation are compared. , distinguish the photoinduced anomalous Hall currents from the upper and lower surface states of the three-dimensional topological insulator Bi 2 Te 3 . This method is beneficial to simply, quickly and effectively distinguish the photoinduced anomalous Hall currents from the upper and lower surface states of the three-dimensional topological insulator Bi 2 Te 3 .

Figure 202010169319

Description

三维拓扑绝缘体Bi2Te3上下表面态光致反常霍尔电流区分 方法Discrimination of photoinduced anomalous Hall currents between upper and lower surface states of a three-dimensional topological insulator Bi2Te3 method

技术领域technical field

本发明属于自旋电子学领域,具体涉及一种三维拓扑绝缘体Bi2Te3上下表面态光致反常霍尔电流区分方法。The invention belongs to the field of spintronics, and in particular relates to a method for distinguishing light-induced anomalous Hall currents from upper and lower surface states of a three-dimensional topological insulator Bi 2 Te 3 .

背景技术Background technique

三维拓扑绝缘体是一种在表面具有自旋动量锁定狄拉克电子态的新型量子物质态,具有许多奇异的性质。Bi2Te3是一种典型的三维拓扑绝缘体,在自旋电子学和量子计算领域具有很大的应用潜力。由于自旋电子学器件具有低能耗、高集成度、高数据处理速度等优点,因此成为当前的研究热点。自旋电流的产生、操纵与探测是自旋电子学的一个重要的研究内容。Three-dimensional topological insulators are a new type of quantum matter state with spin-momentum-locked Dirac electronic states on the surface, which have many exotic properties. Bi 2 Te 3 is a typical three-dimensional topological insulator with great potential for applications in spintronics and quantum computing. Due to the advantages of low energy consumption, high integration, and high data processing speed, spintronic devices have become a current research hotspot. The generation, manipulation and detection of spin current is an important research content in spintronics.

在三维拓扑绝缘体中,由于存在强自旋轨道耦合,可以实现自旋霍尔效应和逆自旋霍尔效应,可以实现自旋极化和自旋状态的有效控制。如果在具有自旋轨道耦合的系统中用圆偏振光注入自旋极化载流子,在自旋霍尔效应作用下,会在垂直于外加电场的方向上测量到电流,该电流称为光致反常霍尔电流。光致反常霍尔电流是研究自旋电流的产生、操纵与探测的有力工具。对三维拓扑绝缘体来说,光致反常霍尔电流有三个来源,即上表面态、体态和下表面态。但这三者的信号往往混在一起,要分析光致反常霍尔电流的产生机理与调控机制,必须要能够区分出光致反常霍尔电流的主要贡献,即分析出其主要来源于上表面态、体态还是下表面态。然而,目前还没有方法能够区分光致反常霍尔电流的主要贡献。In three-dimensional topological insulators, due to the strong spin-orbit coupling, the spin Hall effect and the inverse spin Hall effect can be realized, and the spin polarization and spin state can be effectively controlled. If circularly polarized light is used to inject spin-polarized carriers in a system with spin-orbit coupling, under the spin Hall effect, a current is measured in a direction perpendicular to the applied electric field, which is called light cause anomalous Hall current. Photoinduced anomalous Hall current is a powerful tool to study the generation, manipulation and detection of spin current. For three-dimensional topological insulators, there are three sources of photoinduced anomalous Hall currents, namely upper surface state, bulk state and lower surface state. However, the signals of these three are often mixed together. To analyze the generation mechanism and regulation mechanism of the photo-induced anomalous Hall current, it is necessary to distinguish the main contribution of the photo-induced anomalous Hall current, that is, to analyze that it mainly comes from the upper surface state, The body is still the lower surface. However, there is currently no way to distinguish the main contribution of the photoinduced anomalous Hall current.

发明内容SUMMARY OF THE INVENTION

有鉴于此,本发明的目的在于提供一种三维拓扑绝缘体Bi2Te3上下表面态光致反常霍尔电流区分方法,该方法有利于简单、快捷、有效地区分三维拓扑绝缘体Bi2Te3上下表面态光致反常霍尔电流。In view of this, the purpose of the present invention is to provide a method for distinguishing the upper and lower surface states of a three-dimensional topological insulator Bi 2 Te 3 by photo-induced anomalous Hall currents, which is conducive to simple, fast and effective distinction between the upper and lower surface states of a three-dimensional topological insulator Bi 2 Te 3 Surface state photoinduced anomalous Hall current.

为实现上述目的,本发明采用的技术方案是:一种三维拓扑绝缘体Bi2Te3上下表面态光致反常霍尔电流区分方法,包括以下步骤:In order to achieve the above object, the technical solution adopted in the present invention is: a method for distinguishing the upper and lower surface states of a three-dimensional topological insulator Bi 2 Te 3 photoinduced anomalous Hall current, comprising the following steps:

步骤S1:在(111)面的高阻单晶硅上,用分子束外延设备生长Bi2Te3样品,然后在样品表面通过电子束蒸发沉积一对点状钛金电极和一对条形钛金电极;Step S1: On the high-resistance single crystal silicon of the (111) plane, a Bi 2 Te 3 sample is grown by molecular beam epitaxy equipment, and then a pair of point-shaped titanium-gold electrodes and a pair of strip-shaped titanium electrodes are deposited on the surface of the sample by electron beam evaporation. gold electrode;

步骤S2:对样品进行X射线光电子能谱分析测试,记得到的XPS光谱为XPS1光谱;Step S2: perform X-ray photoelectron spectroscopy analysis and test on the sample, and remember that the XPS spectrum is XPS1 spectrum;

步骤S3:将样品放置在真空杜瓦瓶中;通过激光器发出激光依次通过起偏器、光弹性调制器以及杜瓦瓶窗口,垂直照射在样品的几何中心,即四个电极的中心位置;Step S3: place the sample in a vacuum Dewar flask; emit laser light through the polarizer, the photoelastic modulator and the Dewar flask window in sequence, and irradiate vertically on the geometric center of the sample, that is, the center position of the four electrodes;

步骤S4:将样品左、右两侧的条形钛金电极分别接直流电压源的正、负极输出端,通过计算机控制直流电压源输出一组从正到负的直流电压,从而产生一组从正到负的纵向电场;步骤S3中的光照射在样品上后产生光电流;从点状钛金电极采集光电流,然后依次输入前置放大器和锁相放大器,所述锁相放大器的参考频率为光弹性调制器的一倍频工作频率,锁相放大器输出的信号通过数据采集卡输入计算机;测量这组纵向电场E下的光电流,即通过锁相放大器提取出与光弹性调制器的一倍频同频率的光电流信号,记为I+Step S4: Connect the strip-shaped titanium-gold electrodes on the left and right sides of the sample to the positive and negative output terminals of the DC voltage source, respectively, and control the DC voltage source to output a set of DC voltages from positive to negative, thereby generating a set of DC voltages from positive to negative. Positive to negative longitudinal electric field; photocurrent is generated after the light in step S3 is irradiated on the sample; photocurrent is collected from the point-shaped titanium-gold electrode, and then input to the preamplifier and the lock-in amplifier in turn, the reference frequency of the lock-in amplifier It is the one frequency operating frequency of the photoelastic modulator, and the signal output by the lock-in amplifier is input into the computer through the data acquisition card; The photocurrent signal with the same frequency doubled as I + ;

步骤S5:将样品右、左两侧的条形钛金电极分别接直流电压源的正、负极输出端,即相较于步骤S4将两条形钛金电极的接线对调,通过计算机控制直流电压源输出一组从正到负的直流电压,从而产生一组从正到负的纵向电场;步骤S3中的光照射在样品上后产生光电流;从点状钛金电极采集光电流,然后依次输入前置放大器和锁相放大器,所述锁相放大器的参考频率为光弹性调制器的一倍频工作频率,锁相放大器输出的信号通过数据采集卡输入计算机;测量这组纵向电场E下的光电流,即通过锁相放大器提取出与光弹性调制器的一倍频同频率的光电流信号,记为I-Step S5: Connect the strip-shaped titanium-gold electrodes on the right and left sides of the sample to the positive and negative output terminals of the DC voltage source, respectively, that is, compare the wiring of the two-shaped titanium-gold electrodes in step S4, and control the DC voltage through a computer. The source outputs a set of DC voltages from positive to negative, thereby generating a set of longitudinal electric fields from positive to negative; the photocurrent is generated after the light in step S3 is irradiated on the sample; the photocurrent is collected from the point-shaped titanium-gold electrode, and then sequentially Input the preamplifier and the lock-in amplifier, the reference frequency of the lock-in amplifier is the one-fold operating frequency of the photoelastic modulator, and the signal output by the lock-in amplifier is input into the computer through the data acquisition card; The photocurrent, that is, the photocurrent signal with the same frequency as the one-time frequency of the photoelastic modulator is extracted through the lock-in amplifier, denoted as I - ;

步骤S6:通过如下公式(1)提取光致反常霍尔电流IPAHEStep S6: Extract the photo-induced anomalous Hall current I PAHE by the following formula (1):

IPAHE = (I+-I-)/2 (1)I PAHE = (I + -I - )/2 (1)

I+对应的纵向电场和I-对应的纵向电场的绝对值相等,但方向相反;记得到的光致反常霍尔电流IPAHE随纵向电场E的变化曲线为IPAHE1The absolute value of the longitudinal electric field corresponding to I + and the longitudinal electric field corresponding to I - are equal, but the directions are opposite; remember that the photoinduced anomalous Hall current I PAHE changes with the longitudinal electric field E as I PAHE1 ;

步骤S7:对样品进行氧化处理,然后对氧化后的样品重复步骤S2~S6,记氧化后得到的XPS光谱为XPS2光谱,记氧化后得到的光致反常霍尔电流IPAHE随纵向电场E的变化曲线为IPAHE2Step S7: perform oxidation treatment on the sample, and then repeat steps S2 to S6 for the oxidized sample, denote the XPS spectrum obtained after oxidation as the XPS2 spectrum, and denote the photoinduced anomalous Hall current I PAHE obtained after oxidation with the longitudinal electric field E. The change curve is I PAHE2 ;

步骤S8:分别记XPS1、XPS2光谱中拓扑绝缘体的Bi元素的特征峰与Bi的氧化物的特征峰的强度比值分别为fBi1、fBi2,分别记XPS1、XPS2光谱中拓扑绝缘体的Te元素的特征峰与Te的氧化物的特征峰的强度比值分别为fTe1、fTe2,分别记IPAHE1、IPAHE2曲线的斜率分别为σ1、σ2;若氧化后fBi2和fTe2的值相较于氧化前fBi1和fTe1的值减小,且斜率σ2相较于斜率σ1减小,则判断IPAHE1和IPAHE2都为上表面态的贡献占主导;若氧化后fBi2和fTe2的值相较于氧化前fBi1和fTe1的值减小,且斜率σ2相较于斜率σ1出现反号,则判断IPAHE1为上表面态的贡献占主导,而IPAHE2为下表面态的贡献占主导;若氧化后fBi2和fTe2的值相较于氧化前fBi1和fTe1的值减小,且斜率σ2相较于斜率σ1减小,则判断IPAHE1和 IPAHE2都为下表面态的贡献占主导。Step S8: Denote the intensity ratio of the characteristic peak of the Bi element of the topological insulator and the characteristic peak of the Bi oxide in the XPS1 and XPS2 spectra respectively as f Bi1 , f Bi2 , and denote the Te element of the topological insulator in the XPS1 and XPS2 spectra, respectively. The intensity ratios of the characteristic peaks and the characteristic peaks of Te oxides are f Te1 and f Te2 respectively, and the slopes of the curves of I PAHE1 and I PAHE2 are respectively σ 1 and σ 2 ; if the values of f Bi2 and f Te2 are the same after oxidation Compared with the values of f Bi1 and f Te1 before oxidation, and the slope σ 2 decreases compared with the slope σ 1 , it is judged that I PAHE1 and I PAHE2 are both dominated by the contribution of the upper surface state; if after oxidation, f Bi2 and f Bi2 and The value of f Te2 decreases compared with the values of f Bi1 and f Te1 before oxidation, and the slope σ 2 has an inverse sign compared with the slope σ 1 , then it is judged that I PAHE1 is the dominant contribution of the upper surface state, and I PAHE2 is The contribution of the lower surface state is dominant; if the values of f Bi2 and f Te2 after oxidation decrease compared with the values of f Bi1 and f Te1 before oxidation, and the slope σ 2 decreases compared with the slope σ 1 , then judge I PAHE1 and IPAHE2 are both dominated by the contribution of the lower surface states.

进一步地,所述Bi2Te3样品为矩形结构,所述一对点状钛金电极沉积于矩形两长边内侧的中线上,所述一对条形钛金电极沿矩形两短边内侧边缘沉积。Further, the Bi 2 Te 3 sample has a rectangular structure, the pair of point-shaped titanium-gold electrodes is deposited on the midline of the inner sides of the two long sides of the rectangle, and the pair of strip-shaped titanium-gold electrodes is along the inner edges of the two short sides of the rectangle. deposition.

进一步地,所述步骤S1中,所述Bi2Te3样品为单晶结构,样品短边≥2 mm,长边≥5mm,厚度为3~5纳米。Further, in the step S1, the Bi 2 Te 3 sample has a single crystal structure, the short side of the sample is ≥ 2 mm, the long side is ≥ 5 mm, and the thickness is 3-5 nanometers.

进一步地,所述点状钛金电极为直径0.25 mm的圆形点状钛金电极,两个圆形点状钛金电极内侧的间距≥1.5 mm;所述条形钛金电极的宽度为1 mm,长度与样本短边相适应,两个条形钛金电极内侧的间距≥3 mm。Further, the point-shaped titanium-gold electrodes are circular point-shaped titanium-gold electrodes with a diameter of 0.25 mm, and the distance between the inner sides of the two circular point-shaped titanium-gold electrodes is ≥1.5 mm; the width of the strip-shaped titanium-gold electrodes is 1.5 mm. mm, the length is adapted to the short side of the sample, and the distance between the inner sides of the two strip-shaped titanium electrodes is ≥3 mm.

进一步地,所述步骤S3中,激光器的功率为30~200 mW,发出的激光的波长为1064nm,打在样品上的光斑的直径小于两个点状钛金电极的间距,也小于两个条形钛金电极的间距;所述光弹性调制器的工作频率为50 KHz,光弹性调制器的主轴方向与起偏器的偏振方向夹角为45度,光弹性调制器的位相延迟为0.25×波长。Further, in the step S3, the power of the laser is 30-200 mW, the wavelength of the emitted laser is 1064 nm, and the diameter of the spot hit on the sample is smaller than the distance between the two point-shaped titanium electrodes, and is also smaller than the two strips. The working frequency of the photoelastic modulator is 50 KHz, the angle between the main axis direction of the photoelastic modulator and the polarization direction of the polarizer is 45 degrees, and the phase retardation of the photoelastic modulator is 0.25× wavelength.

进一步地,所述步骤S4中,直流电压源的输出电压的最小值的取值范围为-10~-1V,最小值的取值范围为1~10 V,计算机控制直流电压源每10 s改变一次电压,步长为0.1~0.5 V。Further, in the step S4, the value range of the minimum value of the output voltage of the DC voltage source is -10~-1V, the value range of the minimum value is 1~10V, and the computer-controlled DC voltage source changes every 10 s. Primary voltage, step size is 0.1~0.5 V.

进一步地,所述步骤S7中,对样品进行氧化处理的方法为:将样品置入无尘的空气氛围中,在室温下使其自然氧化1~20天。Further, in the step S7, the method for oxidizing the sample is: placing the sample in a dust-free air atmosphere, and naturally oxidizing it at room temperature for 1-20 days.

相较于现有技术,本发明具有以下有益效果:通过简单易行的方法将光致反常霍尔电流测量出来,并通过对比氧化前后的X射线光电子能谱和光致反常霍尔电流,区分三维拓扑绝缘体Bi2Te3上下表面态光致反常霍尔电流,测量结果准确,简单易行,成本低廉,具有很强的实用性和广阔的应用前景。Compared with the prior art, the present invention has the following beneficial effects: the photo-induced anomalous Hall current is measured by a simple and easy method, and the X-ray photoelectron spectrum and the photo-induced anomalous Hall current before and after oxidation are compared to distinguish three-dimensional The photoinduced anomalous Hall current on the upper and lower surface states of the topological insulator Bi 2 Te 3 has the advantages of accurate measurement results, simple operation, low cost, strong practicability and broad application prospects.

附图说明Description of drawings

图1是本发明实施例的方法实现流程图。FIG. 1 is a flow chart of a method implementation according to an embodiment of the present invention.

图2是本发明实施例中测量光致反常霍尔电流的实验光路示意图。FIG. 2 is a schematic diagram of an experimental optical circuit for measuring photo-induced anomalous Hall current in an embodiment of the present invention.

图3是本发明实施例中厚度为3 nm的三维拓扑绝缘体Bi2Te3样品在氧化前后的光致反常霍尔电流随纵向电场变化的曲线的比较图。3 is a comparison diagram of the curves of the photoinduced anomalous Hall current as a function of the longitudinal electric field before and after oxidation of a three-dimensional topological insulator Bi 2 Te 3 sample with a thickness of 3 nm in an embodiment of the present invention.

图4是本发明实施例中厚度为3 nm的三维拓扑绝缘体Bi2Te3样品在氧化前对应Td3d和Bi 4f能级的XPS谱。FIG. 4 is the XPS spectrum of the three-dimensional topological insulator Bi 2 Te 3 sample with a thickness of 3 nm before oxidation corresponding to the Td3 d and Bi 4 f energy levels in the embodiment of the present invention.

图5是本发明实施例中厚度为3 nm的三维拓扑绝缘体Bi2Te3样品在氧化后对应Td3d和Bi 4f能级的XPS谱。5 is the XPS spectrum of the three-dimensional topological insulator Bi 2 Te 3 sample with a thickness of 3 nm corresponding to the Td3 d and Bi 4 f energy levels after oxidation in the embodiment of the present invention.

图2中:1-1064nm激光器,2-衰减片,3-起偏器,4-光弹性调制器,5-拓扑绝缘体Bi2Te3样品,6-沉积在样品上的电极,7-前置放大器,8-锁相放大器,9-直流电压源,10-低温杜瓦瓶,11-计算机。In Figure 2: 1-1064nm laser, 2-attenuator, 3-polarizer, 4-photoelastic modulator, 5-topological insulator Bi 2 Te 3 sample, 6- electrode deposited on sample, 7- front Amplifier, 8-lock-in amplifier, 9-DC voltage source, 10-low temperature dewar, 11-computer.

具体实施方式Detailed ways

下面结合附图及具体实施例对本发明作进一步的详细说明。The present invention will be further described in detail below with reference to the accompanying drawings and specific embodiments.

本发明提供了一种三维拓扑绝缘体Bi2Te3上下表面态光致反常霍尔电流区分方法,如图1所示,包括以下步骤:The present invention provides a method for distinguishing photo-induced anomalous Hall currents from upper and lower surface states of a three-dimensional topological insulator Bi 2 Te 3 , as shown in FIG. 1 , including the following steps:

步骤S1:在(111)面的高阻单晶硅上,用分子束外延设备生长Bi2Te3样品,然后在样品表面通过电子束蒸发沉积一对点状钛金电极和一对条形钛金电极。Step S1: On the high-resistance single crystal silicon of the (111) plane, a Bi 2 Te 3 sample is grown by molecular beam epitaxy equipment, and then a pair of point-shaped titanium-gold electrodes and a pair of strip-shaped titanium electrodes are deposited on the surface of the sample by electron beam evaporation. Gold electrodes.

在本发明较佳实施例中,所述Bi2Te3样品为矩形的单晶结构,样品短边≥2 mm,长边≥5 mm,厚度为3~5纳米(包含3纳米和5纳米)。所述一对点状钛金电极沉积于矩形两长边内侧的中线上,所述一对条形钛金电极沿矩形两短边内侧边缘沉积。所述点状钛金电极为直径0.25 mm的圆形点状钛金电极,两个圆形点状钛金电极内侧的间距≥1.5 mm;所述条形钛金电极的宽度为1 mm,长度与样本短边相适应,两个条形钛金电极内侧的间距≥3 mm。In a preferred embodiment of the present invention, the Bi 2 Te 3 sample has a rectangular single crystal structure, the short side of the sample is ≥ 2 mm, the long side is ≥ 5 mm, and the thickness is 3 to 5 nanometers (including 3 nanometers and 5 nanometers) . The pair of point-shaped titanium-gold electrodes is deposited on the midline inside the two long sides of the rectangle, and the pair of strip-shaped titanium-gold electrodes is deposited along the inner edges of the two short sides of the rectangle. The point-shaped titanium-gold electrode is a circular point-shaped titanium-gold electrode with a diameter of 0.25 mm, and the distance between the inner sides of the two circular point-shaped titanium-gold electrodes is ≥1.5 mm; the width of the strip-shaped titanium-gold electrode is 1 mm, and the length is 1 mm. Compatible with the short side of the sample, the distance between the inner sides of the two strip titanium electrodes is ≥3 mm.

在本实施例中,所述Bi2Te3样品的尺寸大小为2 mm × 12 mm,厚度为约3纳米。所述点状钛金电极为直径0.25 mm的圆形点状钛金电极,两个圆形点状钛金电极内侧的间距为1.5 mm;所述条形钛金电极大小为1 mm× 2 mm,两个条形钛金电极内侧的间距为10 mm。In this embodiment, the size of the Bi 2 Te 3 sample is 2 mm×12 mm, and the thickness is about 3 nanometers. The point-shaped titanium-gold electrode is a circular point-shaped titanium-gold electrode with a diameter of 0.25 mm, and the distance between the inner sides of the two circular point-shaped titanium-gold electrodes is 1.5 mm; the size of the strip-shaped titanium-gold electrode is 1 mm × 2 mm , the distance between the inner sides of the two strip-shaped titanium electrodes is 10 mm.

步骤S2:对样品进行X射线光电子能谱分析(XPS)测试,记得到的XPS光谱为XPS1光谱。Step S2: perform X-ray photoelectron spectroscopy (XPS) test on the sample, and remember that the XPS spectrum obtained is the XPS1 spectrum.

步骤S3:为了防止样品氧化,将样品放置在真空度约为1帕的真空杜瓦瓶中;通过激光器发出激光依次通过起偏器、光弹性调制器以及杜瓦瓶窗口,垂直照射在样品的几何中心,即四个电极的中心位置。Step S3: In order to prevent the oxidation of the sample, the sample is placed in a vacuum Dewar flask with a vacuum degree of about 1 Pa; laser light is emitted by the laser through the polarizer, the photoelastic modulator and the Dewar flask window in turn, and is irradiated vertically on the sample. Geometric center, that is, the center position of the four electrodes.

在本实施例中,激光器的功率为30~200 mW,发出的激光的波长为1064 nm,打在样品上的光斑的直径小于两个点状钛金电极的间距,也小于两个条形钛金电极的间距。所述光弹性调制器的工作频率为50 KHz,光弹性调制器的主轴方向与起偏器的偏振方向夹角为45度,光弹性调制器的位相延迟为0.25×波长。In this embodiment, the power of the laser is 30-200 mW, the wavelength of the emitted laser is 1064 nm, and the diameter of the spot hit on the sample is smaller than the distance between the two point-shaped titanium-gold electrodes, and also smaller than the two strip-shaped titanium electrodes. Spacing of gold electrodes. The working frequency of the photoelastic modulator is 50 KHz, the included angle between the main axis direction of the photoelastic modulator and the polarization direction of the polarizer is 45 degrees, and the phase retardation of the photoelastic modulator is 0.25×wavelength.

步骤S4:将样品左、右两侧的条形钛金电极分别接直流电压源的正、负极输出端,通过计算机控制直流电压源输出一组从正到负的直流电压,从而产生一组从正到负的纵向电场;步骤S3中的光照射在样品上后产生光电流;从点状钛金电极采集光电流,然后依次输入前置放大器和锁相放大器,所述锁相放大器的参考频率为光弹性调制器的一倍频工作频率,即50 KHz,锁相放大器输出的信号通过数据采集卡输入计算机;测量这组纵向电场E下的光电流,即通过锁相放大器提取出与光弹性调制器的一倍频同频率的光电流信号,记为I+Step S4: Connect the strip-shaped titanium-gold electrodes on the left and right sides of the sample to the positive and negative output terminals of the DC voltage source, respectively, and control the DC voltage source to output a set of DC voltages from positive to negative, thereby generating a set of DC voltages from positive to negative. Positive to negative longitudinal electric field; photocurrent is generated after the light in step S3 is irradiated on the sample; photocurrent is collected from the point-shaped titanium-gold electrode, and then input to the preamplifier and the lock-in amplifier in turn, the reference frequency of the lock-in amplifier It is the one frequency working frequency of the photoelastic modulator, that is, 50 KHz. The signal output by the lock-in amplifier is input into the computer through the data acquisition card; The photocurrent signal of the same frequency as the one-time frequency of the modulator is denoted as I + .

其中,直流电压源的输出电压的最小值的取值范围为-10~-1 V,最小值的取值范围为1~10 V,计算机控制直流电压源每10 s改变一次电压,步长为0.1~0.5 V。Among them, the value range of the minimum value of the output voltage of the DC voltage source is -10~-1 V, and the value range of the minimum value is 1~10 V. The computer controls the DC voltage source to change the voltage every 10 s, and the step size is 0.1~0.5V.

步骤S5:将样品右、左两侧的条形钛金电极分别接直流电压源的正、负极输出端,即相较于步骤S4将两条形钛金电极的接线对调,通过计算机控制直流电压源输出一组从正到负的直流电压,从而产生一组从正到负的纵向电场;步骤S3中的光照射在样品上后产生光电流;从点状钛金电极采集光电流,然后依次输入前置放大器和锁相放大器,所述锁相放大器的参考频率为光弹性调制器的一倍频工作频率,即50 KHz,锁相放大器输出的信号通过数据采集卡输入计算机;测量这组纵向电场E下的光电流,即通过锁相放大器提取出与光弹性调制器的一倍频同频率的光电流信号,记为I-Step S5: Connect the strip-shaped titanium-gold electrodes on the right and left sides of the sample to the positive and negative output terminals of the DC voltage source, respectively, that is, compare the wiring of the two-shaped titanium-gold electrodes in step S4, and control the DC voltage through a computer. The source outputs a set of DC voltages from positive to negative, thereby generating a set of longitudinal electric fields from positive to negative; the photocurrent is generated after the light in step S3 is irradiated on the sample; the photocurrent is collected from the point-shaped titanium-gold electrode, and then sequentially Input the preamplifier and the lock-in amplifier. The reference frequency of the lock-in amplifier is one frequency operating frequency of the photoelastic modulator, that is, 50 KHz. The signal output by the lock-in amplifier is input to the computer through the data acquisition card; The photocurrent under the electric field E, that is, the photocurrent signal with the same frequency as the one-time frequency of the photoelastic modulator extracted by the lock-in amplifier, is denoted as I - .

步骤S6:通过如下公式(1)提取光致反常霍尔电流IPAHEStep S6: Extract the photo-induced anomalous Hall current I PAHE by the following formula (1):

IPAHE = (I+-I-)/2 (1)I PAHE = (I + -I - )/2 (1)

I+对应的纵向电场和I-对应的纵向电场的绝对值相等,但方向相反;记得到的光致反常霍尔电流IPAHE随纵向电场E的变化曲线为IPAHE1The absolute value of the longitudinal electric field corresponding to I + and the longitudinal electric field corresponding to I - are equal, but the directions are opposite; remember that the photoinduced anomalous Hall current I PAHE changes with the longitudinal electric field E as I PAHE1 ;

步骤S7:对样品进行氧化处理,即将样品置入无尘的空气氛围中,在室温下使其自然氧化1~20天,然后对氧化后的样品重复步骤S2~S6,记氧化后得到的XPS光谱为XPS2光谱,记氧化后得到的光致反常霍尔电流IPAHE随纵向电场E的变化曲线为IPAHE2Step S7: The sample is oxidized, that is, the sample is placed in a dust-free air atmosphere, and it is naturally oxidized at room temperature for 1 to 20 days, and then steps S2 to S6 are repeated for the oxidized sample, and the XPS obtained after oxidation is recorded. The spectrum is the XPS2 spectrum, and the change curve of the photo-induced anomalous Hall current I PAHE obtained after oxidation with the longitudinal electric field E is recorded as I PAHE2 .

步骤S8:分别记XPS1、XPS2光谱中拓扑绝缘体的Bi元素的特征峰与Bi的氧化物的特征峰的强度比值分别为fBi1、fBi2,分别记XPS1、XPS2光谱中拓扑绝缘体的Te元素的特征峰与Te的氧化物的特征峰的强度比值分别为fTe1、fTe2,分别记IPAHE1、IPAHE2曲线的斜率分别为σ1、σ2;若氧化后fBi2和fTe2的值相较于氧化前fBi1和fTe1的值减小,且斜率σ2相较于斜率σ1减小,则判断IPAHE1和IPAHE2都为上表面态的贡献占主导;若氧化后fBi2和fTe2的值相较于氧化前fBi1和fTe1的值减小,且斜率σ2相较于斜率σ1出现反号,则判断IPAHE1为上表面态的贡献占主导,而IPAHE2为下表面态的贡献占主导;若氧化后fBi2和fTe2的值相较于氧化前fBi1和fTe1的值减小,且斜率σ2相较于斜率σ1减小,则判断IPAHE1和 IPAHE2都为下表面态的贡献占主导。Step S8: Denote the intensity ratio of the characteristic peak of the Bi element of the topological insulator and the characteristic peak of the Bi oxide in the XPS1 and XPS2 spectra respectively as f Bi1 , f Bi2 , and denote the Te element of the topological insulator in the XPS1 and XPS2 spectra, respectively. The intensity ratios of the characteristic peaks and the characteristic peaks of Te oxides are f Te1 and f Te2 respectively, and the slopes of the curves of I PAHE1 and I PAHE2 are respectively σ 1 and σ 2 ; if the values of f Bi2 and f Te2 are the same after oxidation Compared with the values of f Bi1 and f Te1 before oxidation, and the slope σ 2 decreases compared with the slope σ 1 , it is judged that I PAHE1 and I PAHE2 are both dominated by the contribution of the upper surface state; if after oxidation, f Bi2 and f Bi2 and The value of f Te2 decreases compared with the values of f Bi1 and f Te1 before oxidation, and the slope σ 2 has an inverse sign compared with the slope σ 1 , then it is judged that I PAHE1 is the dominant contribution of the upper surface state, and I PAHE2 is The contribution of the lower surface state is dominant; if the values of f Bi2 and f Te2 after oxidation decrease compared with the values of f Bi1 and f Te1 before oxidation, and the slope σ 2 decreases compared with the slope σ 1 , then judge I PAHE1 and IPAHE2 are both dominated by the contribution of the lower surface states.

光致反常霍尔电流的产生原理如下:在纵向电场的作用下,电子发生定向运动。在圆偏振光的照射下,样品中产生自旋极化的载流子。根据自旋霍尔效应,这些自旋极化的载流子将受到一个与运动方向垂直的力的作用,而且自旋向上和自旋向下的电子受到的力的方向是相反的。因此,自旋向上的电子和自旋向下的电子将分别向样品的两边偏转。由于在圆偏振光激发下,产生的自旋向上和向下的载流子数目是不等的,因此,向两边偏转的电子数目不等,从而产生电流。这个电流即为光致反常霍尔电流。显然,这个电流垂直于外加电场的方向,且其强度与自旋轨道耦合的强度成正比。The generation principle of the photoinduced anomalous Hall current is as follows: Under the action of the longitudinal electric field, the electrons move in a directional motion. Under the irradiation of circularly polarized light, spin-polarized charge carriers are generated in the sample. According to the spin Hall effect, these spin-polarized carriers will be subjected to a force perpendicular to the direction of motion, and the direction of the force on the spin-up and spin-down electrons is opposite. Therefore, spin-up electrons and spin-down electrons will be deflected to either side of the sample, respectively. Since the number of spin up and down carriers generated under the excitation of circularly polarized light is unequal, the number of electrons deflected to both sides is unequal, thereby generating current. This current is the photoinduced anomalous Hall current. Obviously, this current is perpendicular to the direction of the applied electric field, and its strength is proportional to the strength of the spin-orbit coupling.

三维拓扑绝缘体的上表面态和下表面态具有相反的自旋轨道耦合,因此,它们产生的光致反常霍尔电流的方向是相反的。体态也会产生光致逆自旋霍尔电流。因此,本发明测得的三维拓扑绝缘体的光致逆自旋霍尔电流是上表面态、下表面态和体态的贡献的总和。由于本发明所采用的样品很薄,只有约3纳米,考虑到体态的自旋轨道耦合强度比上、下表面态小很多,因此,体态的贡献可以忽略。The upper and lower surface states of 3D topological insulators have opposite spin-orbit couplings, and therefore, the directions of the photoinduced anomalous Hall currents they generate are opposite. The bulk state also produces a photoreverse spin Hall current. Therefore, the photoreversal spin Hall current of the three-dimensional topological insulator measured by the present invention is the sum of the contributions of the upper surface state, the lower surface state and the bulk state. Since the sample used in the present invention is very thin, only about 3 nanometers, considering that the spin-orbit coupling strength of the bulk state is much smaller than that of the upper and lower surface states, the contribution of the bulk state can be ignored.

图2为本实施例中测量光致反常霍尔电流的实验光路示意图。其中的样品5是用分子束外延生长技术(MBE)在(111)面绝缘硅衬底上生长的Bi2Te3薄膜。由于Bi2Te3薄膜在空气中易氧化变质,因此需要将样品装在杜瓦瓶中,真空条件下储存并进行测量。FIG. 2 is a schematic diagram of an experimental optical circuit for measuring the photo-induced anomalous Hall current in this embodiment. Among them, sample 5 is a Bi 2 Te 3 film grown on a (111)-plane insulating silicon substrate by molecular beam epitaxy (MBE). Since Bi 2 Te 3 films are prone to oxidative deterioration in air, the samples need to be packed in Dewar flasks, stored under vacuum conditions and measured.

本实施例采用1064 nm波长的固体激光器,光斑的强度是高斯分布的。激光器出来的光依次经过衰减片、起偏器、光弹性调制器后垂直打在样品四个电极的中心。打在样品上光斑的直径为1毫米,激光功率为50 mW。光照产生的光电流经过前置放大器放大后进入锁相放大器。锁相放大器的参考频率为光弹性调制器的一倍频信号。光弹性调制器的位相延迟设置为0.25×波长。此时,光弹性调制器相当于一个四分之一波片。因此,通过锁相放大器可以提取出圆偏振光产生的电流。由于光弹性调制器会引入一些与纵向电场无关的背景电流信号。为了除去该信号,按步骤S4-S6的方法进行处理,即通过公式(1)提取出真正的光致逆自旋霍尔电流。In this embodiment, a solid-state laser with a wavelength of 1064 nm is used, and the intensity of the light spot is Gaussian distributed. The light from the laser passes through the attenuator, polarizer, and photoelastic modulator in sequence, and then hits the center of the four electrodes of the sample vertically. The diameter of the spot hit on the sample is 1 mm, and the laser power is 50 mW. The photocurrent generated by illumination is amplified by the preamplifier and then enters the lock-in amplifier. The reference frequency of the lock-in amplifier is one frequency signal of the photoelastic modulator. The phase retardation of the photoelastic modulator was set to 0.25×wavelength. At this time, the photoelastic modulator is equivalent to a quarter-wave plate. Therefore, the current generated by the circularly polarized light can be extracted by the lock-in amplifier. Because the photoelastic modulator will introduce some background current signals that are independent of the longitudinal electric field. In order to remove this signal, it is processed according to the method of steps S4-S6, that is, the real photo-induced inverse spin Hall current is extracted by formula (1).

图3中实心小正方形所示的数据为样品氧化前由步骤S4-S6处理并由公式(1)提取得到的光致反常霍尔电流随纵向电场的变化曲线,即IPAHE1。可见,IPAHE1随纵向电场的斜率是正的。图3中实心小圆形所示的数据为样品氧化后由步骤S4-S6处理并由公式(1)提取得的光致反常霍尔电流随纵向电场的变化曲线,即IPAHE2。可见,IPAHE2随纵向电场的斜率是负的。The data shown in the solid small square in Fig. 3 is the variation curve of the photoinduced anomalous Hall current with the longitudinal electric field obtained by the steps S4-S6 before the oxidation of the sample and extracted by the formula (1), namely I PAHE1 . It can be seen that the slope of IPAHE1 with the longitudinal electric field is positive. The data shown by the solid small circles in Fig. 3 is the variation curve of the photo-induced anomalous Hall current with the longitudinal electric field obtained by the steps S4-S6 after oxidation of the sample, namely I PAHE2 . It can be seen that the slope of IPAHE2 with the longitudinal electric field is negative.

图4为本实施例中厚度为3 纳米的三维拓扑绝缘体Bi2Te3样品在氧化前对应Td 3d和Bi 4f能级的XPS谱。图中的实线是分峰拟合的曲线。其中,位于572.8 和583.2 eV 附近的峰为Bi2Te3中Te 3d3/2和Te 3d5/2的能级峰,而位于576.4 和586.9 eV附近的峰为Te的氧化物的能级峰。位于158.0和163.3 eV附近的峰为Bi2Te3中Bi 4f7/2和Bi 4f5/2的能级峰,而位于164.7和159.5 eV附近的峰对应Bi的氧化物的峰。FIG. 4 is the XPS spectrum of the three-dimensional topological insulator Bi 2 Te 3 sample with a thickness of 3 nanometers before oxidation corresponding to the Td 3 d and Bi 4 f energy levels in this example. The solid line in the figure is the peak-fitted curve. Among them, the peaks near 572.8 and 583.2 eV are the energy level peaks of Te 3d 3/2 and Te 3d 5/2 in Bi 2 Te 3 , and the peaks near 576.4 and 586.9 eV are the energy level peaks of Te oxides . The peaks located around 158.0 and 163.3 eV are the energy level peaks of Bi 4f 7/2 and Bi 4f 5/2 in Bi 2 Te 3 , while the peaks located around 164.7 and 159.5 eV correspond to the peaks of Bi oxides.

图5为本实施例中厚度为3 纳米的三维拓扑绝缘体Bi2Te3样品在氧化后对应Td 3d和Bi 4f能级的XPS谱。图中的实线是分峰拟合的曲线。FIG. 5 shows the XPS spectra of the three-dimensional topological insulator Bi 2 Te 3 sample with a thickness of 3 nanometers corresponding to the Td 3 d and Bi 4 f energy levels after oxidation. The solid line in the figure is the peak-fitted curve.

对比图4和图5可以发现,氧化后XPS光谱中拓扑绝缘体的Bi元素的特征峰与Bi的氧化物的特征峰的强度的比值fBi减小了,氧化后XPS光谱中拓扑绝缘体的Te元素的特征峰与Te的氧化物的特征峰的强度的比值fTe也减小了,表明上表面态的氧化程度加重了。因此,可以预见,此时上表面态的贡献的光致反常霍尔电流将变小。对比氧化前后光致反常霍尔电流随纵向电场的斜率,发现氧化后,光致反常霍尔电流随纵向电场的斜率由氧化前的正变为负的了。因此,可以推断,氧化前的光致反常霍尔电流主要是由上表面态贡献的。此时,上表面态的贡献大于下表面态。由于上下表面态贡献的光致反常霍尔电流反号,因此,此时的光致霍尔电流与上表面态的电流信号符号一致。氧化后,上表面态氧化较为严重,使得上表面态的贡献减小。这时候,下表面态的贡献大于上表面态的贡献,由于上下表面态贡献的光致反常霍尔电流反号,所以导致氧化后的光致霍尔电流相比于氧化前发生反号,此时光致反常霍尔电流随纵向电场的斜率也发生了反号。这样通过对比氧化前后的X射线光电子能谱和光致反常霍尔电流信号,发现本实施例中的3纳米样品在氧化前的光致反常霍尔电流为上表面态占主导,而氧化后的光致反常霍尔电流为下表面态占主导。Comparing Figure 4 and Figure 5, it can be found that the ratio f Bi of the characteristic peak of the Bi element of the topological insulator and the characteristic peak of the Bi oxide in the XPS spectrum after oxidation decreases, and the Te element of the topological insulator in the XPS spectrum after oxidation is reduced. The ratio of the intensities of the characteristic peaks of f and the characteristic peaks of Te oxides, fTe, is also reduced, indicating that the oxidation degree of the upper surface states is aggravated. Therefore, it can be predicted that the photoinduced anomalous Hall current contributed by the upper surface state will become smaller at this time. Comparing the slope of photoinduced anomalous Hall current with longitudinal electric field before and after oxidation, it is found that after oxidation, the slope of photoinduced anomalous Hall current with longitudinal electric field changes from positive to negative before oxidation. Therefore, it can be inferred that the photoinduced anomalous Hall current before oxidation is mainly contributed by the upper surface states. At this time, the contribution of the upper surface states is greater than that of the lower surface states. Since the photoinduced anomalous Hall currents contributed by the upper and lower surface states have opposite signs, the photoinduced Hall currents at this time have the same sign as the current signals of the upper surface states. After oxidation, the oxidation of the upper surface state is more serious, so that the contribution of the upper surface state is reduced. At this time, the contribution of the lower surface state is greater than that of the upper surface state. Since the photo-induced anomalous Hall currents contributed by the upper and lower surface states are reversed, the photoinduced Hall current after oxidation is reversed compared with that before oxidation. The photoinduced anomalous Hall current also has an inverse sign with the slope of the longitudinal electric field. In this way, by comparing the X-ray photoelectron spectrum and photo-induced anomalous Hall current signals before and after oxidation, it is found that the photo-induced anomalous Hall current of the 3-nanometer sample in this example before oxidation is dominated by the upper surface state, while the photo-induced anomalous Hall current after oxidation is dominated by the upper surface state. The anomalous Hall current is dominated by the lower surface state.

综上,本发明提出了一种简单、易操作的区分三维拓扑绝缘体Bi2Te3上下表面态光致反常霍尔电流的方法。该方法将激光依次通过起偏器、光弹性调制器,垂直入射在适当厚度的Bi2Te3样品的几何中心,使用直流电压源施加可调的稳定电压提供纵向稳定电场,在垂直于电场方向上测量光致反常霍尔电流。通过对比氧化前后样品的X射线光电子能谱和光致反常霍尔电流,区分了三维拓扑绝缘体Bi2Te3上下表面态光致反常霍尔电流。In conclusion, the present invention proposes a simple and easy-to-operate method for distinguishing photo-induced anomalous Hall currents from upper and lower surface states of a three-dimensional topological insulator Bi 2 Te 3 . In this method, the laser passes through a polarizer and a photoelastic modulator in turn, and is vertically incident on the geometric center of a Bi 2 Te 3 sample with an appropriate thickness. A DC voltage source is used to apply a tunable stable voltage to provide a longitudinally stable electric field. Measure the photoinduced anomalous Hall current. By comparing the X-ray photoelectron spectra and photoinduced anomalous Hall currents of the samples before and after oxidation, the photoinduced anomalous Hall currents of the upper and lower surface states of the three-dimensional topological insulator Bi 2 Te 3 were distinguished.

以上所述的具体实施例,对本发明的目的、技术方案和成果进行了详尽说明,所应理解的是,以上所述仅为本发明的具体实施例而已,并不用于限制本发明,凡在本发明的精神和原则之内,所做的任何修改、等同替换、改进等,均应包含在本发明的保护范围之内。The specific embodiments described above describe in detail the purpose, technical solutions and achievements of the present invention. It should be understood that the above are only specific embodiments of the present invention, and are not intended to limit the present invention. Any modification, equivalent replacement, improvement, etc. made within the spirit and principle of the present invention shall be included within the protection scope of the present invention.

Claims (7)

1. Three-dimensional topological insulator Bi2Te3The method for distinguishing the photoinduced abnormal Hall current of the upper surface state and the lower surface state is characterized by comprising the following steps of:
step S1: growing Bi on the (111) plane high-resistance monocrystalline silicon by using molecular beam epitaxy equipment2Te3Depositing a pair of point-shaped titanium gold electrodes and a pair of strip-shaped titanium gold electrodes on the surface of the sample through electron beam evaporation;
step S2: carrying out X-ray photoelectron spectroscopy analysis and test on the sample, and recording the obtained XPS spectrum as XPS1 spectrum;
step S3: placing the sample in a vacuum dewar; laser emitted by a laser sequentially passes through a polarizer, a photoelastic modulator and a Dewar flask window and vertically irradiates the geometric center of a sample, namely the central positions of four electrodes;
step S4: respectively connecting strip titanium electrodes on the left side and the right side of the sample with a positive output end and a negative output end of a direct current voltage source, and controlling the direct current voltage source to output a group of positive-to-negative direct current voltages through a computer so as to generate a group of positive-to-negative longitudinal electric fields; generating a photocurrent after the light irradiated on the sample in the step S3; collecting photocurrent from the point titanium electrode, sequentially inputting into a preamplifier and a phase-locked amplifier, wherein the reference frequency of the phase-locked amplifier is a frequency doubling working frequency of the photoelastic modulator, and the phase-locked amplifier outputs a signalInputting the data into a computer through a data acquisition card; measuring the photocurrent of the group of longitudinal electric fields E, namely extracting a photocurrent signal with the same frequency as one frequency multiplication of the photoelastic modulator through a phase-locked amplifier, and marking as I+
Step S5: connecting the strip titanium gold electrodes on the right side and the left side of the sample to the positive output end and the negative output end of a direct current voltage source respectively, namely, compared with the step S4, exchanging the connection of the two strip titanium gold electrodes, and controlling the direct current voltage source to output a group of direct current voltages from positive to negative through a computer, so as to generate a group of longitudinal electric fields from positive to negative; generating a photocurrent after the light irradiated on the sample in the step S3; collecting photocurrent from a point titanium electrode, and then sequentially inputting the photocurrent into a preamplifier and a phase-locked amplifier, wherein the reference frequency of the phase-locked amplifier is a frequency doubling working frequency of the photoelastic modulator, and signals output by the phase-locked amplifier are input into a computer through a data acquisition card; measuring the photocurrent of the group of longitudinal electric fields E, namely extracting a photocurrent signal with the same frequency as one frequency multiplication of the photoelastic modulator through a phase-locked amplifier, and marking as I-
Step S6: extracting the photoinduced abnormal Hall current I by the following formula (1)PAHE
IPAHE= (I+-I-)/2 (1)
I+Corresponding longitudinal electric field and I-The absolute values of the corresponding longitudinal electric fields are equal, but the directions are opposite; recording the obtained photoinduced abnormal Hall current IPAHEThe change curve along the longitudinal electric field E is IPAHE1
Step S7: oxidizing the sample, repeating the steps S2-S6 on the oxidized sample, recording the XPS spectrum obtained after oxidation as the XPS2 spectrum, and recording the photoinduced abnormal Hall current I obtained after oxidationPAHEThe change curve along the longitudinal electric field E is IPAHE2
Step S8: the intensity ratios of the characteristic peak of Bi element and the characteristic peak of Bi oxide of the topological insulator in XPS1 and XPS2 spectra are respectively expressed as fBi1、fBi2The intensity ratios of the characteristic peak of Te element of topological insulator and the characteristic peak of Te oxide in XPS1 and XPS2 spectra were respectively recordedAre respectively fTe1、fTe2Respectively record IPAHE1、IPAHE2The slopes of the curves are respectively sigma1、σ2(ii) a If after oxidation fBi2And fTe2Value of (a) compared to f before oxidationBi1And fTe1Is reduced and the slope σ is2Compared with the slope σ1Decreasing, then judge IPAHE1And IPAHE2Are all the dominant contributions of the upper surface states; if after oxidation fBi2And fTe2Value of (a) compared to f before oxidationBi1And fTe1Is reduced and the slope σ is2Compared with the slope σ1If the opposite sign appears, the judgment is madePAHE1Is dominated by the contribution of the upper surface state, and IPAHE2The contribution of the lower surface state is dominant; if after oxidation fBi2And fTe2Value of (a) compared to f before oxidationBi1And fTe1Is reduced and the slope σ is2Compared with the slope σ1Decreasing, then judge IPAHE1And IPAHE2Are dominated by the contribution of the lower surface state.
2. The three-dimensional topological insulator Bi of claim 12Te3The method for distinguishing the photoinduced abnormal Hall current of the upper surface state and the lower surface state is characterized in that Bi is used2Te3The sample is of a rectangular structure, the pair of point-shaped titanium gold electrodes are deposited on the central line of the inner sides of the two long sides of the rectangle, and the pair of strip-shaped titanium gold electrodes are deposited along the inner side edges of the two short sides of the rectangle.
3. The three-dimensional topological insulator Bi of claim 22Te3The method for distinguishing the photoinduced abnormal Hall current of the upper surface state and the lower surface state is characterized in that in the step S1, the Bi2Te3The sample is of a single crystal structure, the short edge of the sample is larger than or equal to 2 mm, the long edge of the sample is larger than or equal to 5mm, and the thickness of the sample is 3-5 nanometers.
4. The three-dimensional topological insulator Bi of claim 32Te3The method for distinguishing the photoinduced abnormal Hall current of the upper surface state and the lower surface state is characterized in that the point-like titanium gold is used as a current sourceThe electrode is a round point titanium electrode with the diameter of 0.25 mm, and the distance between the inner sides of the two round point titanium electrodes is more than or equal to 1.5 mm; the width of the strip titanium gold electrode is 1 mm, the length of the strip titanium gold electrode is matched with the short side of the sample, and the distance between the inner sides of the two strip titanium gold electrodes is more than or equal to 3 mm.
5. The three-dimensional topological insulator Bi of claim 12Te3The method for distinguishing the photoinduced anomalous Hall current of the upper surface state and the lower surface state is characterized in that in the step S3, the power of a laser is 30-200 mW, the wavelength of the emitted laser is 1064nm, and the diameter of a light spot on a sample is smaller than the distance between two point-shaped titanium gold electrodes and the distance between two strip-shaped titanium gold electrodes; the working frequency of the photoelastic modulator is 50 KHz, the included angle between the main shaft direction of the photoelastic modulator and the polarization direction of the polarizer is 45 degrees, and the phase delay of the photoelastic modulator is 0.25 multiplied by the wavelength.
6. The three-dimensional topological insulator Bi of claim 12Te3The method for distinguishing the photoinduced anomalous Hall currents of the upper surface state and the lower surface state is characterized in that in the step S4, the minimum value of the output voltage of the direct current voltage source ranges from minus 10 to minus 1V, the minimum value ranges from 1 to 10V, the computer controls the direct current voltage source to change the voltage every 10S, and the step length is 0.1 to 0.5V.
7. The three-dimensional topological insulator Bi of claim 12Te3The method for distinguishing the photoinduced abnormal hall currents of the upper surface state and the lower surface state is characterized in that in the step S7, the method for carrying out the oxidation treatment on the sample comprises the following steps: and placing the sample in a dust-free air atmosphere, and naturally oxidizing the sample at room temperature for 1-20 days.
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