CN111188016B - High-performance CrAlSiX alloy target and preparation method thereof - Google Patents
High-performance CrAlSiX alloy target and preparation method thereof Download PDFInfo
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- CN111188016B CN111188016B CN201911401707.2A CN201911401707A CN111188016B CN 111188016 B CN111188016 B CN 111188016B CN 201911401707 A CN201911401707 A CN 201911401707A CN 111188016 B CN111188016 B CN 111188016B
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/34—Sputtering
- C23C14/3407—Cathode assembly for sputtering apparatus, e.g. Target
- C23C14/3414—Metallurgical or chemical aspects of target preparation, e.g. casting, powder metallurgy
-
- C—CHEMISTRY; METALLURGY
- C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
- C22C—ALLOYS
- C22C21/00—Alloys based on aluminium
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- C—CHEMISTRY; METALLURGY
- C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
- C22C—ALLOYS
- C22C27/00—Alloys based on rhenium or a refractory metal not mentioned in groups C22C14/00 or C22C16/00
- C22C27/06—Alloys based on chromium
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- C—CHEMISTRY; METALLURGY
- C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
- C22C—ALLOYS
- C22C30/00—Alloys containing less than 50% by weight of each constituent
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/34—Sputtering
- C23C14/3407—Cathode assembly for sputtering apparatus, e.g. Target
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- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
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Abstract
The invention discloses a high-performance CrAlSiX alloy target and a preparation method thereof, wherein X is one or more of W, mo, nb, ta, the high-performance CrAlSiX alloy target has a double-layer structure and is formed by compounding an upper layer and a bottom layer, the upper layer is a CrAlSiX matrix target, and the CrAlSiX matrix target comprises the following components in percentage by atom: cr=20-70%, al=20-70%, si=0-20%, x=1-20%; the bottom layer is a metal alloy with good heat conducting property and mechanical property. The cutter coating prepared by the target material can obviously improve the cutting rate and the service life of the cutter during high-speed dry cutting.
Description
Technical Field
The invention belongs to the technical field of powder metallurgy, and particularly relates to a high-performance CrAlSiX alloy target and a preparation method thereof.
Background
Since the 60 s of the 20 th century, superhard film materials are deposited on the surface of a metal cutting tool by PVD technology, so that the cutting speed and the wear resistance can be remarkably improved, the service life of the tool is prolonged, and the method becomes a main method for improving the performance of the tool. According to statistics, the coating proportion of the cutters for machining in developed countries at present exceeds 90%, the coating proportion of the cutters in China is also continuously improved, and the requirement is increasingly expanded when the target material is used as a key source material in the coating technology.
In practical application, different kinds of materials are processed, and the requirements on the performance of tools and dies are various. To meet the requirements of higher-speed dry cutting, the tool coating must have higher red hardness and high-temperature oxidation resistance, but the existing TiN, crN, tiAlN, crAlN coating cannot meet the requirements. In recent years, diversification and multilayering of film layers have become a major development direction of current tool coatings, and thus target diversification is also strongly demanded. The addition of multiple components, each component can play a respective special role; the multilayer film is designed to exhibit excellent properties of each film layer.
The AlCr-based coating can improve the hot hardness and high-temperature oxidation resistance of the coating by adding IVA Si element or V b and VIb group refractory transition metal elements W, mo, nb and Ta. In high-speed dry processing, crescent bay abrasion can be effectively reduced, and therefore the service life of the cutter is prolonged. Is especially suitable for milling materials difficult to machine, such as tool steel, hardened steel, stainless steel, cast iron, titanium alloy and the like.
However, the craalsix (x=w, mo, ta, nb) alloy target preparation technology has a high barrier. On one hand, the specific gravity difference of the four components is large, the mutual flow of the powder bodies causes uneven structure, and segregation is easy to occur; on the other hand, as the addition amount of Si, W, mo, ta, nb and other alloy elements in the AlCr-based target material is increased, the intrinsic brittleness of the material is obviously increased, and a clamping area (such as ears and steps) cannot bear mechanical load in the use process of the target material so as to cause fracture failure. At present, the related research literature of the targets is less, and the patent technology is more fresh.
Disclosure of Invention
Aiming at the defects and the shortcomings existing in the prior art, the invention aims to provide a high-performance CrAlSiX alloy target, and the target is added with at least one of alloy elements Si, W, mo, ta and Nb on the basis of a CrAl target, so that the cutting efficiency of a coating can be remarkably improved, and the service life of the coating can be remarkably prolonged.
The second purpose of the invention is to provide a preparation method of the high-performance CrAlSiX alloy target. The prepared alloy target material has the characteristics of high purity, high density, accurate component control, uniform and non-segregation structure, good heat conduction performance and mechanical property, excellent coating performance, large specification and size and the like.
The technical scheme adopted for solving the technical problems is as follows:
the high-performance CrAlSiX alloy target comprises a CrAlSiX matrix target, wherein the CrAlSiX matrix target comprises the following components in percentage by atom: cr=20-70% (e.g. 25%, 30%, 35%, 40%, 45%, 50%, 55%, 60%, 65%), al=20-70% (e.g. 25%, 30%, 35%, 40%, 45%, 50%, 55%, 60%, 65%), si=0-20% (e.g. 0%, 2%, 4%, 6%, 8%, 10%, 12%, 14%, 16%, 18%), x=1-20% (e.g. 2%, 3%, 5%, 7%, 9%, 11%, 13%, 15%, 17%, 19%); wherein X is one or more of W, mo, nb, ta.
In the high-performance CrAlSiX alloy target, as a preferred embodiment, the CrAlSiX matrix target comprises the following components in atomic percent: cr=20-70%, al=20-70%, si=0-15%, x=1-10%.
In the high-performance CrAlSiX alloy target, as a preferred embodiment, the CrAlSiX matrix target comprises the following components in atomic percent: cr=20-70%, al=20-70%, si=2-10%, x=1-5%.
In the high-performance CrAlSiX alloy target, as a preferred embodiment, the relative density of the CrAlSiX matrix target exceeds 99%, and the average grain size is not more than 100 μm.
In the above high-performance CrAlSiX alloy target, as a preferred embodiment, the high-performance CrAlSiX alloy target is formed by compounding an upper layer and a bottom layer, the upper layer is the CrAlSiX matrix target, and the bottom layer is an alloy with good heat-conducting property and mechanical property; more preferably, the thermal conductivity of the bottom layer is not less than 150W/(m.K), the tensile strength is not less than 100MPa, the yield strength is not less than 75MPa, and the plasticity is not less than 2%.
In the high-performance CrAlSiX alloy target, as a preferred embodiment, the underlayer is an aluminum alloy, a copper alloy, or a molybdenum alloy.
In the high-performance CrAlSiX alloy target, as a preferred embodiment, the bottom layer is an aluminum alloy, and the aluminum alloy contains at least one of Si, cu, mn, mg, zn, ti, cr alloy elements; more preferably, the aluminum alloy is AlY, wherein Y is selected from one or more of Cr, ti, si, cu, mn and Zn, and the content of the Y element is 2% -40% (for example, 3%, 5%, 10%, 15%, 20%, 25%, 30%, 35%) by atom percent.
In the high performance CrAlSiX alloy target described above, as a preferred embodiment, the underlayer is intimately welded to the upper layer by a hot isostatic diffusion welding joining technique (i.e., hot isostatic pressing).
In the high-performance CrAlSiX alloy target, as a preferred embodiment, the thickness of the target is 12-32mm for a single-layer CrAlSiX matrix target; for the double-layer target, the thickness of the upper layer is 3-27mm, and the thickness of the bottom layer is 2-10mm.
According to another aspect of the present invention, there is also provided a method for preparing the high-performance CrAlSiX alloy target, including the steps of:
firstly, raw material powder is weighed according to the component design of the target material to prepare alloy powder; if the double-layer alloy target material is prepared, respectively preparing upper-layer CrAlSiX alloy powder and bottom-layer alloy powder;
step two, performing die pressing treatment on the alloy powder to obtain a die pressing compact; if the double-layer alloy target material is prepared, respectively performing mould pressing treatment on the upper layer CrAlSiX alloy powder (matrix alloy powder) and the bottom layer alloy powder to respectively obtain an upper layer mould pressing compact and a bottom layer mould pressing compact;
step three, the mould pressing pressed compact is put into a sheath, sealed, and then subjected to degassing treatment to obtain a degassed sheath; if the double-layer alloy target material is prepared, the upper layer mould pressing pressed compact and the bottom layer mould pressing pressed compact are overlapped and arranged in a sheath;
step four, carrying out hot isostatic pressing treatment on the degassed jacket to obtain a pressed ingot blank;
and fifthly, machining the pressed ingot blank, and cleaning to obtain the high-performance composite alloy target.
In the above-mentioned method for producing a high-performance CrAlSiX alloy target, as a preferred embodiment, the production of the alloy powder may be carried out by a method conventional in the art, that is, by preparing the raw material into an alloy powder by a method conventional in the art, unless otherwise specified. In the first step, the powder may be prepared by an atomization powder process or raw powder having a desired particle size may be directly mixed in a mixer (hereinafter referred to as an elemental powder mixing process). When the element powder mixing method is adopted, the elements are mixed in a V-shaped mixer or a three-dimensional mixer under vacuum or inert gas protection, and the mixing time is 3-10h (such as 4h, 5h, 6h, 7h and 8 h).
In the above method for producing a high-performance CrAlSiX alloy target, in the first step, the raw material powder is chromium powder, silicon powder, aluminum powder, W powder, mo powder, nb powder, ta powder, wherein the average particle size of the chromium powder and the silicon powder is 35 to 100 μm (for example, 40 μm, 50 μm, 60 μm, 70 μm, 80 μm, 90 μm, 95 μm); the average particle size D50 of the aluminum powder is 2 to 40 μm (e.g., 5 μm, 10 μm, 15 μm, 20 μm, 25 μm, 30 μm, 35 μm); the W, mo, nb, ta powder has an average particle size of 5 to 70 [ mu ] m (e.g., 6 [ mu ] m, 10 [ mu ] m, 15 [ mu ] m, 20 [ mu ] m, 25 [ mu ] m, 30 [ mu ] m, 35 [ mu ] m, 40 [ mu ] m, 45 [ mu ] m, 50 [ mu ] m, 55 [ mu ] m, 60 [ mu ] m, 65 [ mu ] m); preferably, the underlying alloy powder is an aluminum alloy powder having an average particle size of 35 to 100 μm (e.g., 40 μm, 50 μm, 60 μm, 70 μm, 80 μm, 90 μm, 95 μm); more preferably, the purity of the raw material powder is preferably 99.8wt% or more.
In the above method for preparing a high performance CrAlSiX alloy target, as a preferred embodiment, in the second step, the pressure of the press molding is 30-330 tons (for example, 32t,50t,100t,150t,200t,250t,300t,320t,325 t), the dwell time is 0-5min (for example, 0.5min, 1min, 1.5min, 2min, 2.5min, 3min, 3.5min, 4min, 4.5 min), the press molding is single-phase press molding, preferably, the relative density of the press molding is 60-90% (for example, 65%, 70%, 75%, 80%, 85%), for a single-layer target, the dimensions of the press molding are D (80-200) h (16-42) mm, for a double-layer target, the dimensions of the upper-layer press molding and the lower-layer press molding are D (80-200) h (6-35) mm and D (80-200) h (4) mm, respectively, and the differential in the press molding thickness of the lower-layer press molding is less than that in the press molding is needed, and the press molding thickness is reduced, for the press molding is further, for the press molding is reduced, for the press molding process, and the press molding has a low-molding cost.
In the above method for producing a high-performance CrAlSiX alloy target, in the third step, the temperature of the degassing treatment is 300-500 ℃ (e.g. 320 ℃, 350 ℃, 380 ℃, 400 ℃, 420 ℃, 450 ℃, 480 ℃) and the heat-preserving time is 4-40 hours (e.g. 5 hours, 8 hours, 10 hours, 15 hours, 20 hours, 25 hours, 30 hours, 35 hours, 38 hours), and the vacuum degree of the degassing treatment is controlled to 10 -1 Pa～10 -3 Pa (e.g. 5 x 10 -2 Pa、10 -2 Pa、5*10 -3 Pa)。
In the above method for producing a high-performance CrAlSiX alloy target, in the fourth step, the hot isostatic pressing treatment is performed at a temperature of 400-500 ℃ (e.g., 420 ℃, 440 ℃, 460 ℃, 480 ℃, 490 ℃) and a pressure of 100-135MPa (e.g., 105MPa, 110MPa, 115MPa, 120MPa, 125MPa, 130 MPa), and the holding time is 2-6 hours. If the temperature of the hot isostatic pressing treatment is too high, cr and Al in the upper layer target material have alloying reaction, so that an alloy phase is generated, and the coating performance is affected; if the temperature of the hot isostatic pressing treatment is too low, the obtained target material is low in density and more in gaps, so that the use is affected.
Compared with the prior art, the invention has the following beneficial effects:
(1) The CrAlSiX alloy target material prepared by the invention has the advantages of high purity, high density, uniform and non-segregation structure, good heat conduction performance and comprehensive mechanical property, excellent coating performance and the like.
(2) According to the high-performance CrAlSiX alloy target material, the bottom alloy (for example, aluminum-based alloy) stabilizing layer is tightly welded on the back surface of the CrAlSiX matrix target material through a hot isostatic pressure diffusion welding connection technology (hot isostatic pressure treatment), so that the prepared double-layer alloy target material has high heat conductivity and good comprehensive mechanical property, and when the target material is used under high sputtering power or power density, the clamping part of the target material can bear larger mechanical stress and thermal stress, and cannot be broken in brittleness or bent and warped due to good plasticity.
(3) The introduction of the bottom layer material (such as cheaper aluminum alloy powder) can effectively save the use of rare or noble metal materials such as W, mo, ta, nb and the like, reduce the development cost of the target material and the corresponding film layer, promote the popularization of the novel target material and the coating in the domestic market, and have more cost effectiveness.
(4) The tool coating prepared by the target material has improved red hardness, high-temperature oxidation resistance and extremely smooth surface, remarkably improves the cutting rate and the service life of the tool during high-speed dry cutting, and is particularly suitable for milling of tool steel, hardened steel, stainless steel, cast iron, titanium and titanium alloy.
Drawings
FIG. 1 is a microstructure of a CrAlSiW alloy target obtained in example 5 of the present invention.
Fig. 2 is a diagram of a structure corresponding to the double-layer target of the present invention, wherein (a) is a front view of the double-layer target, (b) is a side cross-sectional view of A-A section of the double-layer target, (b) 1 refers to a base CrAlSiX target, and 2 refers to a bottom aluminum alloy material.
Detailed Description
The present invention will be further described with reference to the following examples, which are presented by way of illustration of the invention and not limitation, in order to highlight the objects, technical solutions and advantages of the invention. The technical scheme of the invention is not limited to the specific embodiments listed below, but also includes any combination of the specific embodiments.
Examples 1 to 9
In order to adopt the preparation method provided by the invention, crAl, crAlSi, crAlW, crAlSiX (X=W, mo, ta and Nb) single-layer and double-layer targets are sequentially prepared, and the bottom layer material is aluminum alloy (according to the atomic percentage, al is 70 percent, cr is 30 percent).
The raw material powders used in examples 1 to 9 are commercially available in the following purities and particle sizes:
cr powder with purity of 99.8wt.% and granularity of-200 meshes;
al powder with purity of 99.8wt.% and granularity of-325 mesh;
si powder with purity of 99.8wt.% and granularity of-200 mesh;
w powder with purity of 99.9wt.% and granularity of-200 meshes;
mo powder, purity 99.9wt.%, particle size d50=8 μm;
ta powder, purity 99.7wt.%, particle size d50=8 μm;
nb powder, purity 99.5wt.%, particle size d50=8 μm.
The specific preparation steps of the target material are as follows:
step one, preparing mixed powder of a matrix and a bottom layer alloy: respectively taking raw material powder according to the component design in the following table 1, mixing the powder by a three-dimensional mixer for 8 hours;
step two, placing the alloy powder in the step one into a die pressing die, maintaining the pressure for 0.5min under 240 tons of pressure, and demolding to obtain die pressing compacts with different components, wherein the compactness is 70%; the size of a pressed compact used for manufacturing the single-layer target material is D200 x 20mm; the upper layer blank size for double layer target manufacture is d200×15mm, and the bottom layer blank size is d200×5mm.
Step three, for preparing a single-layer target material, directly putting the pressed compact into an aluminum sheath with proper size; overlapping the upper layer pressed compact and the bottom layer pressed compact into an aluminum sheath with proper size for the double-layer target; the sheath filled with the molded pressed compact is placed in a degassing furnace for degassing treatment, the heating temperature (i.e. the degassing treatment temperature) is 400 ℃, the heat preservation time is 5h, and the vacuum degree is controlled to be 10 during the heat preservation -3 About Pa.
And fourthly, sealing and welding the degassed sheath, and then placing the sheath into hot isostatic pressing equipment for sintering at the sintering temperature of 460 ℃ and the pressure of 120MPa, and preserving heat and pressure for 3 hours.
Machining the ingot blank subjected to the hot isostatic pressing treatment, and cleaning to obtain a required finished target, wherein the size of the obtained round target is D160 x 12mm; the alloy target with the double-layer structure is shown in fig. 2, the thickness of a substrate (upper layer) A is 8mm, and the thickness of a bottom layer B is 4mm.
Measuring the density of the target material by an Archimedes drainage method; measuring the purity of the target material by a GDMS method; and grading the grain size of the prepared target by using Nano Measurer grain size grading software. Table 1 shows the composition and basic performance parameters of the targets prepared in examples 1-9, wherein example 1 target composition CrAl30/70 represents the target in atomic percent Cr 30%, al 65%, W5%, other examples and so on, and so on in Table 2.
TABLE 1
In table 1 above, the symbols "r=" are about equal to.
And carrying out a coating experiment on the alloy target finished product with the size D160 x 12mm prepared in the embodiment, and testing the sputtering performance of the target. The matrix is hard alloy (WC-6% Co) with the specification of 15-6 mm, and is polished, mirror polished, ultrasonically cleaned and dried by hot air for later use. The same coating experimental parameters were selected: background vacuum degree 5 x 10 -4 Pa, heating the substrate to 500 ℃, and then charging pure N 2 The pressure is 3.5Pa, the substrate bias is 100V, and the power density is 17W/cm 2 The deposition time is adjusted to obtain a coating with a thickness of about 3 μm. The sputtering performance of the target is shown in table 2.
The discharge stabilization time is the idle firing time, "burn in time", and the time of idle sputtering of the target material (the discharge frequency reaches a certain value) before the target material reaches the requirement of depositing the thin film. The longer the discharge stabilization time, the more defects such as pores, inclusions, non-conductive oxides and the like in the target are shown, and the phase and structure uniformity is poor. The shorter the discharge stabilization time is, the higher the density of the target material is, and the better the tissue uniformity is.
The surface roughness of the coating was measured using a surface profilometer or atomic force microscope.
The hardness of the coating was measured with a microhardness tester and the load was 0.05kgf.
TABLE 2
The alloy targets of 30/70at% of CrAl and 30/60/10at% of CrAlSi prepared in examples 1 and 2 begin to bend and warp at the clamping part after sputtering coating for 120min, and the deformation degree is increased continuously along with the increase of sputtering time, so that the number of furnaces for using the targets is obviously reduced.
The CrAlSiW30/60/8/2at% single-layer target prepared in example 5 has high intrinsic brittleness, and the clamping position is broken in the Ar gas etching process before film coating, so that sputtering cannot be continued.
The double-layer craalsix (x=w, mo, ta, nb) composite targets prepared in examples 6-9 had better coating hardness, and when used at high sputter power or power density, the clamping portions of the targets were able to withstand higher mechanical and thermal stresses, neither brittle fracture nor bending warpage, which benefited from the high thermal conductivity and excellent overall mechanical properties of the underlying aluminum alloy material. Meanwhile, due to the addition of the high-melting-point metal W, mo, ta, nb, the melting point of the alloy is increased, the molten pool area formed by arc ablation is reduced, large particles accumulated around the molten pool are reduced, the surface roughness is reduced, and the target can be used more continuously. The arc energy can be concentrated in a smaller area for sputtering after the molten pool is reduced, and the coating deposition rate is obviously improved. In addition, the introduction of the bottom aluminum-based alloy material can obviously reduce the use amount of noble metals W, mo, ta and Nb, and can obviously reduce the cost of the target material and the corresponding coating.
Using the targets prepared in examples 1,2,3,4,6-9, crAlN+CrAlSiXN (X=W, mo, nb, ta) bilayer coatings were synthesized on cemented carbide milling cutter surfaces by cathodic arc evaporation, the total thickness of the coatings was about 3 μm, the CrAlN transition layer thickness was about to (approximately equal to) 0.5 μm, and the CrAlSiXN main layer thickness was about to2.5 μm. N with a deposition temperature and a pressure of 3.5Pa for the coating at 500 DEG C 2 The process is performed under atmosphere, substrate bias voltages of-80V and-100V, respectively, target current 150A are applied.
The end mill with the double layer coating deposited thereon was used for stainless steel roughing and the tool life of the different component coatings was tested and listed in table 3.
Milling conditions:
cutting tool: end mill, diameter d=10 mm, number of teeth z=4;
work piece: austenitic stainless steel, 0Cr18Ni12Mo2Ti;
cutting parameters: cutting speed V C =60 m/min, feed speed f v Cutting tool amount a =252 mm/min p =7mm; and (3) cooling: 5% emulsion;
the process comprises the following steps: carrying out forward milling;
tool life criteria: when the width of the side wearing area of the cutter reaches 0.2mm, the total length of the cutting is taken as the cutting life of the cutter and the unit meter.
TABLE 3 coating composition and tool cutting life
The cutting test described above compares the cutting life of a coated cemented carbide end mill when used to machine stainless steel. Machining stainless steel is a very difficult process, and has the problems of large cutting force, serious work hardening, easy cutter sticking and easy cutter abrasion. The coatings 34, 35, 36, 37 achieve the best results in terms of tool cutting life. The improved cutting life of the tool is related to the improved hot hardness and oxidation resistance exhibited by the incorporation of Si, W, mo, ta, nb into the CrAlN coating, and thus the wear resistance is improved.
Examples 10 to 12
Compared with the double-layer target material of the embodiment 6, the composition ratio of the upper substrate layer is different in the embodiments 10-12, and other preparation processes are the same. The upper layer composition of the targets used only in examples 10-12 and the corresponding target properties are shown in Table 4.
TABLE 4 Table 4
Examples 13 to 16
In comparison to the bilayer target of example 6, examples 13-16 differ only in the hot isostatic pressing process and all other manufacturing processes are identical. The particle sizes and corresponding target properties of the raw material powders used only in examples 13 to 16 are shown in Table 7.
TABLE 5
Claims (7)
1. The high-performance CrAlSiX alloy target is characterized by being formed by compounding an upper layer and a bottom layer, wherein the upper layer is a CrAlSiX matrix target, and the CrAlSiX matrix target comprises the following components in percentage by atom: cr=30%, al=60%, si=8%, w=2%; or cr=30%, al=60%, si=8%, mo=2%; or cr=30%, al=60%, si=8%, ta=2%; or cr=28%, al=52%, si=15%, w=5%; or cr=30%, al=60%, si=5%, w=5%;
the CrAlSiX matrix target is prepared by weighing raw material powder according to the component design of the CrAlSiX matrix target material; the raw material powder is chromium powder, silicon powder, aluminum powder, W powder, mo powder and Ta powder, wherein the purity of the Cr powder is 99.8wt.%, and the granularity is-200 meshes; al powder with purity of 99.8wt.% and granularity of-325 mesh; si powder with purity of 99.8wt.% and granularity of-200 mesh; w powder with purity of 99.9wt.% and granularity of-200 meshes; mo powder, purity 99.9wt.%, particle size d50=8 μm; ta powder, purity 99.7wt.%, particle size d50=8 μm;
the bottom layer is made of aluminum alloy, and the aluminum alloy comprises the following components in percentage by atom: 70%, cr:30%;
the preparation method of the high-performance CrAlSiX alloy target comprises the following steps:
firstly, respectively preparing upper CrAlSiX alloy powder and bottom alloy powder by weighing raw material powder according to the component design of the target material;
respectively carrying out mould pressing treatment on the upper CrAlSiX alloy powder and the bottom alloy powder to respectively obtain an upper mould pressing compact and a bottom mould pressing compact; the pressure of the die pressing treatment is 30-330 tons, the dwell time is 0-5min and not 0min, and the die pressing treatment is one-way die pressing; the sizes of the upper layer die pressing compact and the bottom layer die pressing compact are represented by D, wherein D represents the compact diameter, the unit is mm, h represents the compact thickness, and the unit is mm; for the upper layer press-molded compact, d=80-200, h=6-35; for the bottom layer molded compact, d=80-200, h=4-15; the relative densities of the upper layer die pressing compact and the bottom layer die pressing compact are 60-90%;
step three, overlapping the upper layer die pressing compact and the bottom layer die pressing compact, filling the upper layer die pressing compact and the bottom layer die pressing compact into a sheath for sealing, and then carrying out degassing treatment to obtain a degassed sheath;
step four, carrying out hot isostatic pressing treatment on the degassed sheath to obtain the high-performance CrAlSiX alloy target;
the temperature of the hot isostatic pressing treatment is 460-480 ℃, the pressure is 100-135MPa, and the heat preservation and pressure maintaining time is 2-6 h.
2. The target according to claim 1, wherein the relative density of the CrAlSiX matrix target is more than 99%, the average grain size being no more than 100 μm.
3. The target according to claim 1, wherein the upper layer has a thickness of 3-27mm and the lower layer has a thickness of 2-10mm.
4. The target according to claim 1, wherein the preparation method of the high-performance CrAlSiX alloy target further comprises a step five of machining and cleaning the high-performance CrAlSiX alloy target to obtain a high-performance composite alloy target finished product.
5. The target according to claim 1, wherein in the first step of the preparation method of the high-performance CrAlSiX alloy target, the upper layer CrAlSiX alloy powder and the bottom layer alloy powder are prepared by adopting an atomization powder preparation method or directly mixing raw material powder with the particle size meeting the requirement in a mixer.
6. The target according to claim 5, wherein the upper layer CrAlSiX alloy powder and the bottom layer alloy powder are respectively prepared by mixing in a V-shaped mixer or a three-dimensional mixer under the protection of vacuum or inert gas for 3-10h.
7. The target according to claim 1, wherein in the third step of the method for producing a high-performance CrAlSiX alloy target, the temperature of the degassing treatment is 300-500 ℃, the heat preservation time is 4-40h, and the vacuum degree of the degassing treatment is controlled to be 10% -1 Pa~10 -3 Pa。
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| CN114000024A (en) * | 2021-11-03 | 2022-02-01 | 陕西科技大学 | High-strength and high-toughness Laves phase Cr2Ta-based in-situ authigenic composite material and preparation method thereof |
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