CN111154565A - 一种硅料清洗剂 - Google Patents
一种硅料清洗剂 Download PDFInfo
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- 239000012459 cleaning agent Substances 0.000 title claims abstract description 37
- 239000002210 silicon-based material Substances 0.000 title claims abstract description 30
- KRKNYBCHXYNGOX-UHFFFAOYSA-N citric acid Chemical compound OC(=O)CC(O)(C(O)=O)CC(O)=O KRKNYBCHXYNGOX-UHFFFAOYSA-N 0.000 claims abstract description 30
- QTBSBXVTEAMEQO-UHFFFAOYSA-N Acetic acid Chemical compound CC(O)=O QTBSBXVTEAMEQO-UHFFFAOYSA-N 0.000 claims abstract description 29
- KRHYYFGTRYWZRS-UHFFFAOYSA-N Fluorane Chemical compound F KRHYYFGTRYWZRS-UHFFFAOYSA-N 0.000 claims abstract description 20
- 239000008367 deionised water Substances 0.000 claims abstract description 10
- 229910021641 deionized water Inorganic materials 0.000 claims abstract description 10
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Chemical compound O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims abstract description 10
- KWIUHFFTVRNATP-UHFFFAOYSA-N Betaine Natural products C[N+](C)(C)CC([O-])=O KWIUHFFTVRNATP-UHFFFAOYSA-N 0.000 claims abstract description 7
- KWIUHFFTVRNATP-UHFFFAOYSA-O N,N,N-trimethylglycinium Chemical compound C[N+](C)(C)CC(O)=O KWIUHFFTVRNATP-UHFFFAOYSA-O 0.000 claims abstract description 7
- 229960003237 betaine Drugs 0.000 claims abstract description 7
- 239000012498 ultrapure water Substances 0.000 claims abstract description 4
- 238000004140 cleaning Methods 0.000 abstract description 13
- 239000002253 acid Substances 0.000 abstract description 11
- MWUXSHHQAYIFBG-UHFFFAOYSA-N nitrogen oxide Inorganic materials O=[N] MWUXSHHQAYIFBG-UHFFFAOYSA-N 0.000 abstract description 9
- 238000000034 method Methods 0.000 abstract description 8
- 239000007788 liquid Substances 0.000 abstract description 4
- 239000002699 waste material Substances 0.000 abstract description 4
- 239000000463 material Substances 0.000 description 4
- 229910052751 metal Inorganic materials 0.000 description 4
- 239000002184 metal Substances 0.000 description 4
- 239000002912 waste gas Substances 0.000 description 4
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical group [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 3
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 3
- 239000003153 chemical reaction reagent Substances 0.000 description 3
- 230000000694 effects Effects 0.000 description 3
- XEEYBQQBJWHFJM-UHFFFAOYSA-N iron Substances [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 3
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 2
- 238000011109 contamination Methods 0.000 description 2
- 229910052742 iron Inorganic materials 0.000 description 2
- 230000003647 oxidation Effects 0.000 description 2
- 238000007254 oxidation reaction Methods 0.000 description 2
- 229910021420 polycrystalline silicon Inorganic materials 0.000 description 2
- 229910052710 silicon Inorganic materials 0.000 description 2
- 239000010703 silicon Substances 0.000 description 2
- QTBSBXVTEAMEQO-UHFFFAOYSA-M Acetate Chemical compound CC([O-])=O QTBSBXVTEAMEQO-UHFFFAOYSA-M 0.000 description 1
- KRKNYBCHXYNGOX-UHFFFAOYSA-K Citrate Chemical compound [O-]C(=O)CC(O)(CC([O-])=O)C([O-])=O KRKNYBCHXYNGOX-UHFFFAOYSA-K 0.000 description 1
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 1
- FYYHWMGAXLPEAU-UHFFFAOYSA-N Magnesium Chemical compound [Mg] FYYHWMGAXLPEAU-UHFFFAOYSA-N 0.000 description 1
- GRYLNZFGIOXLOG-UHFFFAOYSA-N Nitric acid Chemical compound O[N+]([O-])=O GRYLNZFGIOXLOG-UHFFFAOYSA-N 0.000 description 1
- HCHKCACWOHOZIP-UHFFFAOYSA-N Zinc Chemical compound [Zn] HCHKCACWOHOZIP-UHFFFAOYSA-N 0.000 description 1
- 230000002378 acidificating effect Effects 0.000 description 1
- 239000003513 alkali Substances 0.000 description 1
- 239000002585 base Substances 0.000 description 1
- 230000009286 beneficial effect Effects 0.000 description 1
- 239000013043 chemical agent Substances 0.000 description 1
- 238000001816 cooling Methods 0.000 description 1
- 238000005260 corrosion Methods 0.000 description 1
- 230000007797 corrosion Effects 0.000 description 1
- 239000013078 crystal Substances 0.000 description 1
- 238000001035 drying Methods 0.000 description 1
- 239000007789 gas Substances 0.000 description 1
- -1 iron ions Chemical class 0.000 description 1
- 229910052749 magnesium Inorganic materials 0.000 description 1
- 239000011777 magnesium Substances 0.000 description 1
- 229910001437 manganese ion Inorganic materials 0.000 description 1
- 150000002739 metals Chemical class 0.000 description 1
- 244000005700 microbiome Species 0.000 description 1
- 150000007522 mineralic acids Chemical class 0.000 description 1
- 230000007935 neutral effect Effects 0.000 description 1
- 229910017604 nitric acid Inorganic materials 0.000 description 1
- 238000005554 pickling Methods 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- 239000000377 silicon dioxide Substances 0.000 description 1
- 235000012239 silicon dioxide Nutrition 0.000 description 1
- 239000004094 surface-active agent Substances 0.000 description 1
- 235000012431 wafers Nutrition 0.000 description 1
- 238000005406 washing Methods 0.000 description 1
- 239000002351 wastewater Substances 0.000 description 1
- 229910052725 zinc Inorganic materials 0.000 description 1
- 239000011701 zinc Substances 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
- C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
- C11D1/00—Detergent compositions based essentially on surface-active compounds; Use of these compounds as a detergent
- C11D1/88—Ampholytes; Electroneutral compounds
- C11D1/90—Betaines
-
- C—CHEMISTRY; METALLURGY
- C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
- C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
- C11D3/00—Other compounding ingredients of detergent compositions covered in group C11D1/00
- C11D3/02—Inorganic compounds ; Elemental compounds
- C11D3/04—Water-soluble compounds
- C11D3/042—Acids
-
- C—CHEMISTRY; METALLURGY
- C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
- C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
- C11D3/00—Other compounding ingredients of detergent compositions covered in group C11D1/00
- C11D3/16—Organic compounds
- C11D3/20—Organic compounds containing oxygen
- C11D3/2075—Carboxylic acids-salts thereof
- C11D3/2079—Monocarboxylic acids-salts thereof
-
- C—CHEMISTRY; METALLURGY
- C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
- C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
- C11D3/00—Other compounding ingredients of detergent compositions covered in group C11D1/00
- C11D3/16—Organic compounds
- C11D3/20—Organic compounds containing oxygen
- C11D3/2075—Carboxylic acids-salts thereof
- C11D3/2086—Hydroxy carboxylic acids-salts thereof
-
- C—CHEMISTRY; METALLURGY
- C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
- C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
- C11D2111/00—Cleaning compositions characterised by the objects to be cleaned; Cleaning compositions characterised by non-standard cleaning or washing processes
- C11D2111/10—Objects to be cleaned
- C11D2111/14—Hard surfaces
- C11D2111/22—Electronic devices, e.g. PCBs or semiconductors
-
- C—CHEMISTRY; METALLURGY
- C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
- C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
- C11D2111/00—Cleaning compositions characterised by the objects to be cleaned; Cleaning compositions characterised by non-standard cleaning or washing processes
- C11D2111/40—Specific cleaning or washing processes
- C11D2111/44—Multi-step processes
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- Chemical & Material Sciences (AREA)
- Oil, Petroleum & Natural Gas (AREA)
- Life Sciences & Earth Sciences (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Wood Science & Technology (AREA)
- Organic Chemistry (AREA)
- Emergency Medicine (AREA)
- Health & Medical Sciences (AREA)
- Inorganic Chemistry (AREA)
- Cleaning Or Drying Semiconductors (AREA)
- Detergent Compositions (AREA)
- Cleaning And De-Greasing Of Metallic Materials By Chemical Methods (AREA)
Abstract
一种硅料清洗剂,包括了清洗剂SX1和清洗剂SX2两部分；所述清洗剂SX1由柠檬酸、乙酸、甜菜碱和高纯水配置组成，质量比为柠檬酸0.5‑1份、乙酸0.2‑0.5份、甜菜碱0.5‑1.0份、余量为高纯水；所述清洗剂SX2由氢氟酸配置去离子水制成，质量比为氢氟酸5份、余量为去离子水。有益效果在于：所使用的酸均为弱酸，不会对操作人员产生危害，安全性高；在对硅料的清洗过程中不会产生氮氧化物，对硅料表面伤害小，对环境不会产生污染，清洗后的废液酸性弱，容易处理。
Description
技术领域
本发明属于废气处理技术领域，尤其涉及半导体行业硅料、硅芯、硅片酸洗环节产生的废气处理处理装置。
背景技术
原生多晶硅是硅材料行业的基础材料，原生多晶硅、单晶拉制切断硅棒头尾、原生多晶料在运输、储存、使用过程中表面污染；因而在使用这些料之前必须对表面清洗，主要祛除有机物、氧化层、金属沾污，确保表面质量。
传统的硅料清洗方法是HF+HNO3强酸或者NaOH等强酸强碱的化学试剂清洗。使用强酸或者强碱腐蚀硅料表面会产生氮氧化物等气体。对操作人员危害大，产生的废气、废液不好处理，对环境造成严重污染。另外强酸、强碱腐蚀造成硅料的损耗大且成本高。
发明内容
本发明的目的是为了解决现有硅料清洗试剂腐蚀性强，清洗过程产生的废气废水危害大处理成本高的问题，提供一种腐蚀性低、污染小的硅料清洗剂。
为了实现上述目的，本发明所采用的技术方案是配置两种弱酸性清洗试剂，利用这两种弱酸试剂对硅料表面依次进行清洗，将硅料表面的有机物、金属沾污、氧化物清洗干净。
本发明硅料清洗剂,包括了清洗剂SX1和清洗剂SX2两部分；所述清洗剂SX1由柠檬酸、乙酸、甜菜碱和高纯水配置组成，质量比为柠檬酸0.5-1份、乙酸0.2-0.5份、甜菜碱0.5-1.0份、余量为高纯水；所述清洗剂SX2由氢氟酸配置去离子水制成，质量比为氢氟酸5份、余量为去离子水。
所述清洗剂SX1中的柠檬酸分子式为C6H10O8、乙酸分子式为CH3COOH、甜菜碱分子式为12H25-N(CH3)2CH2COO。
所述清洗剂SX2中的氢氟酸分子式为4HF。
本发明的有益效果在于：所使用的酸均为弱酸，不会对操作人员产生危害，安全性高；在对硅料的清洗过程中不会产生氮氧化物，对硅料表面伤害小，对环境不会产生污染，清洗后的废液酸性弱，容易处理。
具体实施方式
为使本发明的目的、技术方案和优点更加清楚，下面将对本发明的技术方案结合实施例进行详细的描述。
实施例1
一种硅料的清洗工艺及过程：
1)按照以下配方(质量比)配置清洗剂SX1：柠檬酸(C6H10O8)0.5-1份、乙酸(CH3COOH)0.2-0.5份、甜菜碱(12H25-N(CH3)2CH2COO)0.5-1.0份、余量为高纯水；
2)按照以下配方(质量比)配置清洗剂SX2：氢氟酸5份、余量为去离子水；
3)将硅料放入步骤1)的清洗剂SX1中持续清洗五分钟；
4)将步骤3)清洗好的硅料放入清洗剂SX2中浸泡十分钟；
5)将步骤4)浸泡好的硅料利用去离子水反复冲洗，直到冲洗至中性；
6)将步骤5)冲洗好的硅料利用超声波清洗十五分钟；
7)将步骤6)清洗好的硅料烘干冷却。
实施例2
本发明硅料清洗剂的在实施例1中的作用原理。
清洗剂SX1：
1.清洗剂SX1中的柠檬酸(C6H10O8)和无机酸相比较而言，柠檬酸的酸性相对比较弱，柠檬酸清洗的安全可靠性比较强，对人体不会造成危害，废液也比较容易处理；柠檬酸自身的螯合能力也比较强，主要及时柠檬酸盐对锰离子以及铁离子等有着比较强的螯合能力，使用效果也比较突出；柠檬酸的使用对环境不会造成影响，在微生物以及热等作用下比较容易降解。
2.清洗剂SX1中的乙酸(CH3COOH)为弱酸，对硅料不会产生腐蚀，但是对许多金属有腐蚀效果，例如铁、镁和锌，能够反应生成氢气和金属乙酸盐。
3.清洗剂SX1中的甜菜碱(12H25-N(CH3)2CH2COO)在酸性及碱性条件下均具有优良的稳定性，是一种表面活性剂，能祛除表面有机沾污。
清洗剂SX2：
4.清洗剂SX2中的氢氟酸具有能够与二氧化硅反应的特性，对于祛除硅料表面的氧化有很好的作用，氢氟酸属于弱酸，使用比较安全。
Claims (3)
1.一种硅料清洗剂,其特征在于：包括了清洗剂SX1和清洗剂SX2两部分；所述清洗剂SX1由柠檬酸、乙酸、甜菜碱和高纯水配置组成，质量比为柠檬酸0.5-1份、乙酸0.2-0.5份、甜菜碱0.5-1.0份、余量为高纯水；所述清洗剂SX2由氢氟酸配置去离子水制成，质量比为：氢氟酸5份、余量为去离子水。
2.如权利要求1所述的硅料清洗剂,其特征在于：所述清洗剂SX1中的柠檬酸分子式为C6H10O8、乙酸分子式为CH3COOH、甜菜碱分子式为12H25-N(CH3)2CH2COO。
3.如权利要求1所述的硅料清洗剂,其特征在于：所述清洗剂SX2中的氢氟酸分子式为4HF。
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| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN112852564A (zh) * | 2021-01-08 | 2021-05-28 | 孟闯 | 一种硅料清洗剂及清洗方法 |
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| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN103426744A (zh) * | 2011-09-02 | 2013-12-04 | 气体产品与化学公司 | 用于硅片制绒的组合物和方法 |
| CN103589538A (zh) * | 2013-08-30 | 2014-02-19 | 横店集团东磁股份有限公司 | 一种太阳能硅片的清洗液及其使用方法 |
| CN103666784A (zh) * | 2013-11-29 | 2014-03-26 | 孙爱玲 | 硅片预清洗剂 |
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Patent Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN103426744A (zh) * | 2011-09-02 | 2013-12-04 | 气体产品与化学公司 | 用于硅片制绒的组合物和方法 |
| CN103589538A (zh) * | 2013-08-30 | 2014-02-19 | 横店集团东磁股份有限公司 | 一种太阳能硅片的清洗液及其使用方法 |
| CN103666784A (zh) * | 2013-11-29 | 2014-03-26 | 孙爱玲 | 硅片预清洗剂 |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN112852564A (zh) * | 2021-01-08 | 2021-05-28 | 孟闯 | 一种硅料清洗剂及清洗方法 |
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Application publication date: 20200515 |
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