CN111139456A - Glow area gas circuit arrangement method and gas circuit device for improving vacuum coating atmosphere uniformity - Google Patents
Glow area gas circuit arrangement method and gas circuit device for improving vacuum coating atmosphere uniformity Download PDFInfo
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- CN111139456A CN111139456A CN202010085998.5A CN202010085998A CN111139456A CN 111139456 A CN111139456 A CN 111139456A CN 202010085998 A CN202010085998 A CN 202010085998A CN 111139456 A CN111139456 A CN 111139456A
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- gas
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- air
- glow
- outlet pipe
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/455—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for introducing gases into reaction chamber or for modifying gas flows in reaction chamber
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
Abstract
The invention discloses a glow area gas circuit arrangement method and a gas circuit device for improving vacuum coating atmosphere uniformity, wherein the glow area is equally divided into 1-20 sections of sub gas supply areas according to the structure of a coating vacuum cavity and the length of the glow area, each sub gas supply area is independently supplied with gas respectively, the area with the length of 200-plus-500 mm extending from the two ends of the glow area is used as an auxiliary gas supply area, each auxiliary gas supply area is also independently supplied with gas respectively, each sub gas supply area and each auxiliary gas supply area are provided with a gas circuit device for supplying gas, and the gas circuit device quantitatively controls the flow through a mass flowmeter. Compared with the conventional gas circuit device, the gas circuit device provided by the invention has the advantages of more uniform atmosphere, higher controllability and high atmosphere adjusting speed.
Description
Technical Field
The invention relates to the technical field of vacuum coating such as physical vapor deposition, chemical vapor deposition and the like, in particular to a glow area gas circuit arrangement method and a gas circuit device for improving the uniformity of vacuum coating atmosphere.
Background
Vacuum coating technology includes Physical Vapor Deposition (PVD) and Chemical Vapor Deposition (CVD), and has been widely used in many fields, such as solar photovoltaic, photo-thermal, LED, magnetic storage material preparation, etc., especially in recent years, atmosphere uniformity is one of the key factors influencing the uniformity of large-area thin film materials, and the performance of large-area thin film materials and the large-scale production efficiency can be guaranteed only by ensuring the large-area atmosphere uniformity.
Aiming at atmosphere uniformity, a great deal of research is also carried out on gas circuit arrangement, and the existing mainstream gas circuit arrangement methods comprise a single-tube method, a sleeve gas mixing method, a gas mixing tank method and the like, which have advantages, but also have many problems, such as difficult adjustment and control delay of atmosphere, and the like, so that a new gas circuit arrangement method needs to be developed urgently to ensure the uniformity and the controllability of the atmosphere.
Disclosure of Invention
The invention aims to avoid the defects in the prior art and provides a glow area gas circuit arrangement method and a gas circuit device for improving the uniformity of vacuum coating atmosphere, thereby effectively solving the defects in the prior art.
In order to achieve the purpose, the invention adopts the technical scheme that: a glow area gas circuit arrangement method for improving vacuum coating atmosphere uniformity is characterized in that a glow area is divided into 1-20 sub gas supply areas equally according to the structure of a coating vacuum cavity and the length of the glow area, each sub gas supply area is independently supplied with gas respectively, the area with the length of 200-plus-500 mm extending from the two ends of the glow area is used as an auxiliary gas supply area, each auxiliary gas supply area is also independently supplied with gas respectively, each sub gas supply area and each auxiliary gas supply area are provided with a gas circuit device for supplying gas, and the gas circuit devices quantitatively control the flow through a mass flow meter.
Furthermore, the gas circuit device comprises a main gas inlet pipe, at least one secondary branched pipe and a gas outlet pipe, wherein the secondary branched pipe is used for symmetrically and equally dividing 1-10 levels of gas in the main gas inlet pipe and then is connected with the gas outlet pipe, the gas outlet pipe is parallel to the glow area, two ends of the gas outlet pipe are sealed, gas outlet holes with equal diameters are uniformly distributed on the gas outlet pipe in the direction parallel to the glow area, and the gas outlet pipes on all the gas circuit devices are coaxially arranged.
Furthermore, the air outlets on the air outlet pipe face to the same direction, the aperture of the air outlets is 0.1-5mm, the distance between the air outlets is not less than the aperture of the air outlets, and each secondary branch pipe on the air outlet pipe supplies air to 1-5 air outlets on the left and the right of the air outlet pipe respectively.
Furthermore, the air outlet hole on the air outlet pipe faces the vacuum cavity wall or the target glow area.
A glow area gas circuit device for improving the uniformity of vacuum coating atmosphere comprises a gas inlet pipe, at least one secondary branch pipe and a gas outlet pipe, wherein the gas outlet pipe is an independent tubular structure which is parallel to a glow area and has two closed ends, and the gas flow of the gas outlet pipe is controlled by a mass flow meter; after passing through the mass flow meter, the gas is symmetrically and equally divided by 1-10 stages, the distance between each stage is 0.1-100mm, and the gas is finally discharged from gas outlets uniformly distributed on a gas outlet pipe into a vacuum cavity after passing through at least one secondary branch pipe; each secondary branch pipe supplies air to 1-5 air outlets on the left and the right of the secondary branch pipe; the air outlet holes face to the same direction and face to the wall of the vacuum cavity or the glow area of the target, and the aperture of the air outlet holes is equal and is 0.1-5 mm.
The technical scheme of the invention has the following beneficial effects: compared with the conventional gas circuit device, the gas circuit device has the advantages that the provided atmosphere is more uniform, the controllability is higher, the atmosphere adjusting speed is high, the working gas (such as Ar gas) and the reaction gas (such as O2, N2, NH3 or CO 2) can be supplied separately, namely, no gas mixing is needed before the working gas and the reaction gas enter the vacuum cavity, and the uniformity and the controllability of the mixed atmosphere are further improved.
Drawings
FIG. 1 is a schematic view of the structure of a glow zone according to an embodiment of the present invention;
FIG. 2 is a layout diagram of a gas circuit device according to an embodiment of the present invention;
FIG. 3 is a side view of FIG. 2 (first configuration);
FIG. 4 is a side view of FIG. 2 (second configuration);
FIG. 5 is a schematic structural diagram of an air channel device according to an embodiment of the present invention;
FIG. 6 is a top view of an outlet tube according to an embodiment of the present invention;
FIG. 7 is an enlarged view of a portion of FIG. 6 at A;
FIG. 8 is a schematic diagram of a sub-air supply area air path device in accordance with an embodiment of the present invention;
fig. 9 is a schematic structural diagram of an auxiliary air supply area air path device in an embodiment of the invention.
Detailed Description
The embodiments of the present invention will be described in further detail with reference to the drawings and examples. The following examples are intended to illustrate the invention but are not intended to limit the scope of the invention.
In the description of the present invention, "a plurality" means two or more unless otherwise specified; the terms "upper", "lower", "left", "right", "inner", "outer", "front", "rear", "head", "tail", and the like, indicate orientations or positional relationships based on the orientations or positional relationships shown in the drawings, are only for convenience in describing and simplifying the description, and do not indicate or imply that the device or element referred to must have a particular orientation, be constructed in a particular orientation, and be operated, and thus, should not be construed as limiting the invention. In the description of the present invention, it is to be noted that, unless otherwise explicitly specified or limited, the terms "connected" and "connected" are to be interpreted broadly, e.g., as being fixed or detachable or integrally connected; can be mechanically or electrically connected; may be directly connected or indirectly connected through an intermediate. The specific meanings of the above terms in the present invention can be understood in specific cases to those skilled in the art.
According to the glow area gas circuit arrangement method for improving the uniformity of the vacuum coating atmosphere, the glow area is equally divided into 1-20 sections of sub gas supply areas according to the structure of a coating vacuum cavity and the length of the glow area, each sub gas supply area is independently supplied with gas respectively, the area with the length of 200-plus-500 mm extending from the two ends of the glow area is used as an auxiliary gas supply area, each auxiliary gas supply area is also independently supplied with gas respectively, each sub gas supply area and each auxiliary gas supply area are provided with a gas circuit device for supplying gas, and the gas circuit devices quantitatively control the flow through mass flow meters.
The above technical features are explained in detail with reference to fig. 1, wherein the structure 100 represents a vacuum chamber, a target 200 is fixedly disposed in the vacuum chamber 100 along an axial direction parallel to the vacuum chamber 100 (in the present embodiment, the inner cavity of the vacuum chamber is cylindrical), a glow area 300 is disposed beside the target, and generally, in order to ensure the uniformity of the coating, two ends of the target 200 extend out of the glow area for a distance, and two ends of the glow area extend out of the object to be coated for a distance, as shown in fig. 2, in the embodiment, the glow area 300 is uniformly divided into 4 segments of sub-gas supply areas 301 by taking the length of the glow area as a reference, the air supply is completed in each segment of sub-air supply area through an independently controlled air path device 400, in order to ensure the uniformity of the atmosphere around the glow area 300, the auxiliary gas supply areas 302 at both ends need to be supplied with gas by the gas path device 400.
As shown in fig. 3-4, the gas circuit device 400 supplies gas to the glow areas 300 corresponding to the targets 200 on two sides, and the atmosphere is uniformly distributed in the glow areas 300 on two sides under the action of the bottom vacuum pumping device, wherein fig. 3 and 4 are layout diagrams of two gas circuit devices 400, respectively.
As shown in fig. 5-7, the gas path device 400 includes a main gas inlet pipe 401, at least one secondary branch pipe 402 and a gas outlet pipe 403, the secondary branch pipe 402 symmetrically divides 1-10 stages of gas in the main gas inlet pipe 401 into equal parts and then connects with the gas outlet pipe 403, as shown in fig. 5, in the illustrated state, the gas outlet pipe 403 is symmetrically divided into equal parts by 2 stages, the two ends of the gas outlet pipe 403 are closed, the gas outlet pipes 403 are uniformly distributed with equal-diameter gas outlet holes 404 in a direction parallel to the glow area 300, the gas outlet pipes 403 on all the gas path devices 400 are coaxially arranged, the diameter of the gas outlet holes 404 on all the gas path devices 400 are the same, and the distance between the gas outlet holes 404 on the gas path devices 400 is.
The air outlets 404 on the air outlet pipe 403 are arranged in the same direction, the aperture of the air outlets is 0.1-5mm, the distance between the air outlets is larger than or equal to the aperture of the air outlet, each secondary branch pipe on the air outlet pipe supplies air to 1-5 air outlets 404 on the left and right of the secondary branch pipe, as shown in fig. 5, in the state shown in the figure, each secondary branch pipe 402 supplies air to 2 air outlets 404 on the left and right of the secondary branch pipe, that is, the secondary branch pipes 402 connected with the air outlet pipe 403 supply air to 4 air outlets 404 in total.
The gas outlet 404 on the gas outlet pipe 403 faces the vacuum cavity wall or the glow area of the target, as shown in fig. 3, in the state shown in the figure, the gas outlet 404 is vertically arranged upwards, so that the atmosphere can be uniformly distributed in the glow areas 300 on both sides under the action of the bottom vacuum pumping device, and the uniformity of the coating atmosphere is improved; in addition, the air outlet holes 404 can be arranged on two sides of the bottom of the air outlet pipe 403, so that the air outlet holes 404 directly face the glow area; as shown in fig. 4, in the state shown in the figure, the glow areas on both sides are correspondingly provided with the gas circuit devices, wherein the gas outlets are both arranged perpendicular to the inner wall of the vacuum cavity.
As shown in fig. 5-7, a glow area gas circuit apparatus for improving the uniformity of vacuum coating atmosphere, the gas circuit apparatus 400 includes an air inlet tube 401, at least one secondary branch tube 402 and an air outlet tube 403, the air outlet tube 403 is an independent tubular structure parallel to the glow area 300 and with two closed ends, the air outlet tube 403 has a mass flow meter for controlling the gas flow, and the mass flow meter is installed on the air supply tube connected to the air inlet tube 401; after passing through the mass flow meter, the gas is symmetrically and equally divided into 1-10 stages with the interval of 0.1-100mm, and finally discharged from the gas outlet holes 404 uniformly distributed on the gas outlet pipe 403 into the vacuum cavity 100 after passing through at least one secondary branched pipe 402; each secondary branched pipe 402 supplies gas to 1-5 gas outlets 404 on the left and right of the secondary branched pipe; the gas outlets 404 face in the same direction and face the vacuum cavity wall or the target glow zone, and the diameters of the gas outlets are equal and are 0.1-5 mm.
By 1-10-level symmetrical equally dividing, it is meant that the way of dividing 1 into 2, 2 into 4, 4 into 8 … … (and so on) is finally ensured that uniform air outlet can be performed from each air outlet 404.
As shown in fig. 8-9, the following description is made with reference to a specific embodiment, and the glow area gas circuit device and the arrangement method for improving the uniformity of the vacuum coating atmosphere provided by the present invention are provided, in a vacuum chamber, the length of a glow area is 1600mm, the total length of a gas circuit parallel to the glow area is 2400mm (two ends of the glow area extend out of 400mm respectively), the glow area is equally divided into 2 segments of sub-gas supply areas for independent gas supply according to the length of the glow area, the areas extending out of 400mm at two ends of the glow area are used as auxiliary gas supply areas for independent gas supply, and a gas circuit device is provided for each segment of sub-gas supply area and each segment of auxiliary gas supply.
As shown in fig. 8, for the gas path device for supplying gas to the sub-gas supply area, after the gas enters from the main gas inlet pipe, after 2-level equal division, the gas enters into the gas outlet pipe after being divided by the secondary branch pipes in a grading equal division manner, each grade, namely, the distance between the secondary branch pipes is 50mm, the gas is discharged from the gas outlet pipe through the gas outlet holes which are uniformly distributed on the gas outlet pipe, face the cavity and have the same size, and enters into the vacuum cavity, the distance between the gas outlet holes is 50mm, and each of the final secondary branch pipes supplies gas to the left and right of each of the; as shown in fig. 9, for the gas circuit device for supplying gas to the auxiliary gas supply area, after the gas enters from the main gas inlet pipe and is divided into 1-level equal parts, the gas enters the gas outlet pipe after being divided into equal parts by the secondary branch pipes in a grading way, the distance between the secondary branch pipes in each grade is 50mm, the gas is discharged from the gas outlets which are uniformly distributed on the gas outlet pipe, face the cavity and have the same size and enter the vacuum cavity, the distance between the gas outlets is 50mm, each tail-end secondary branch pipe supplies gas to each of the left and right 2 gas outlets, and during film coating, the overall atmosphere uniformity is adjusted by adjusting the mass flow meter according to the relative position of the molecular pump or the gas extraction opening and the gas circuit or the.
The embodiments of the present invention have been presented for purposes of illustration and description, and are not intended to be exhaustive or limited to the invention in the form disclosed. Many modifications and variations will be apparent to those of ordinary skill in the art. The embodiment was chosen and described in order to best explain the principles of the invention and the practical application, and to enable others of ordinary skill in the art to understand the invention for various embodiments with various modifications as are suited to the particular use contemplated.
Claims (5)
1. A glow area gas circuit arrangement method for improving vacuum coating atmosphere uniformity is characterized in that: according to the length of the vacuum cavity structure and the glow area for coating, the glow area is equally divided into 1-20 sections of sub air supply areas, each sub air supply area is independently supplied with air, the area extending from the two ends of the glow area by 200-plus-500 mm is used as an auxiliary air supply area, each auxiliary air supply area is also independently supplied with air, each sub air supply area and each auxiliary air supply area are respectively provided with an air path device for supplying air, and the air path device quantitatively controls the flow through mass flow metering.
2. The glow area gas circuit arrangement method for improving the uniformity of the vacuum coating atmosphere according to claim 1, wherein: the gas path device comprises a main gas inlet pipe, at least one secondary branch pipe and a gas outlet pipe, wherein the secondary branch pipe divides gas in the main gas inlet pipe into 1-10 stages symmetrically and equally and then is connected with the gas outlet pipe, the gas outlet pipe is parallel to the glow area, two ends of the gas outlet pipe are sealed, gas outlet holes with equal diameters are uniformly distributed on the gas outlet pipe in the direction parallel to the glow area, and the gas outlet pipes on all the gas path devices are coaxially arranged.
3. The glow area gas circuit arrangement method for improving the uniformity of the vacuum coating atmosphere according to claim 2, wherein: the air outlet holes on the air outlet pipe face to the same direction, the aperture of the air outlet holes is 0.1-5mm, the distance between the air outlet holes is larger than or equal to the aperture of the air outlet holes, and each secondary branch pipe on the air outlet pipe supplies air to 1-5 air outlet holes on the left and the right of the air outlet pipe respectively.
4. The glow area gas circuit arrangement method for improving the uniformity of the vacuum coating atmosphere according to claim 3, wherein: and the air outlet hole on the air outlet pipe faces to the vacuum cavity wall or the target glow area.
5. The utility model provides an improve glow district gas circuit device of vacuum coating atmosphere homogeneity which characterized in that: the gas path device comprises a gas inlet pipe, at least one secondary branch pipe and a gas outlet pipe, wherein the gas outlet pipe is an independent tubular structure which is parallel to the glow area and has two closed ends, and the gas flow of the gas outlet pipe is controlled by a mass flow meter; after passing through the mass flow meter, the gas is symmetrically and equally divided by 1-10 stages, the distance between each stage is 0.1-100mm, and the gas is finally discharged from gas outlets uniformly distributed on a gas outlet pipe into a vacuum cavity after passing through at least one secondary branch pipe; each secondary branch pipe supplies air to 1-5 air outlets on the left and the right of the secondary branch pipe; the air outlet holes face to the same direction and face to the wall of the vacuum cavity or the glow area of the target, and the aperture of the air outlet holes is equal and is 0.1-5 mm.
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| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202010085998.5A CN111139456A (en) | 2020-02-11 | 2020-02-11 | Glow area gas circuit arrangement method and gas circuit device for improving vacuum coating atmosphere uniformity |
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| Application Number | Priority Date | Filing Date | Title |
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| CN202010085998.5A CN111139456A (en) | 2020-02-11 | 2020-02-11 | Glow area gas circuit arrangement method and gas circuit device for improving vacuum coating atmosphere uniformity |
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| CN111139456A true CN111139456A (en) | 2020-05-12 |
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| CN202010085998.5A Pending CN111139456A (en) | 2020-02-11 | 2020-02-11 | Glow area gas circuit arrangement method and gas circuit device for improving vacuum coating atmosphere uniformity |
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Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN115011933A (en) * | 2022-07-01 | 2022-09-06 | 上海宇泽机电设备有限公司 | Gas supply device and spray module |
| CN115323355A (en) * | 2022-08-15 | 2022-11-11 | 深圳市拉普拉斯能源技术有限公司 | Amorphous silicon layer, preparation method, preparation device and application thereof |
Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE2302174A1 (en) * | 1973-01-17 | 1974-07-25 | Siemens Ag | Continuously coating condenser film with polymer - by passing close to electrodes in gas polymerisation induced by AC discharge |
| CN203890437U (en) * | 2014-04-03 | 2014-10-22 | 江西沃格光电股份有限公司 | Coating gas filling device |
| CN106893988A (en) * | 2015-12-18 | 2017-06-27 | 北京有色金属研究总院 | A kind of gas-distributing system for vacuum coating |
-
2020
- 2020-02-11 CN CN202010085998.5A patent/CN111139456A/en active Pending
Patent Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE2302174A1 (en) * | 1973-01-17 | 1974-07-25 | Siemens Ag | Continuously coating condenser film with polymer - by passing close to electrodes in gas polymerisation induced by AC discharge |
| CN203890437U (en) * | 2014-04-03 | 2014-10-22 | 江西沃格光电股份有限公司 | Coating gas filling device |
| CN106893988A (en) * | 2015-12-18 | 2017-06-27 | 北京有色金属研究总院 | A kind of gas-distributing system for vacuum coating |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN115011933A (en) * | 2022-07-01 | 2022-09-06 | 上海宇泽机电设备有限公司 | Gas supply device and spray module |
| CN115323355A (en) * | 2022-08-15 | 2022-11-11 | 深圳市拉普拉斯能源技术有限公司 | Amorphous silicon layer, preparation method, preparation device and application thereof |
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