CN111103638A - Optical film with protective layer, nano-structure color crystal and preparation method - Google Patents
Optical film with protective layer, nano-structure color crystal and preparation method Download PDFInfo
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- CN111103638A CN111103638A CN201811259814.1A CN201811259814A CN111103638A CN 111103638 A CN111103638 A CN 111103638A CN 201811259814 A CN201811259814 A CN 201811259814A CN 111103638 A CN111103638 A CN 111103638A
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- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
- G02B1/10—Optical coatings produced by application to, or surface treatment of, optical elements
- G02B1/14—Protective coatings, e.g. hard coatings
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- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
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- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
- G02B1/10—Optical coatings produced by application to, or surface treatment of, optical elements
- G02B1/11—Anti-reflection coatings
- G02B1/113—Anti-reflection coatings using inorganic layer materials only
- G02B1/115—Multilayers
Abstract
The application discloses an optical film with a protective layer, a nano-structure color crystal and a preparation method thereof, wherein the optical film with the protective layer comprises a multi-layer optical medium layer, a first protective layer and a second protective layer, wherein the first protective layer and the second protective layer are arranged on two sides of the multi-layer optical medium layer; when the optical film is crushed, the first protective layer and the second protective layer are used for protecting the multilayer optical medium layer; wherein the optical thickness of the first passivation layer ranges from one thirty to one half of the incident wavelength, the optical thickness of the second passivation layer ranges from one thirty to one half of the incident wavelength, and the range of the incident wavelength is 380-780 nm. Through the mode, the optical coating can protect the multiple optical medium layers, avoids surface damage of optical film fragments caused by the existing crushing method, and further improves brightness of the optical coating.
Description
Technical Field
The application relates to the technical field of reflective coatings, in particular to an optical film with a protective layer, a nano-structure color crystal and a preparation method thereof.
Background
The optical film is a nano-scale film with optical characteristics prepared by PVD coating. In the prior art, optical thin films are typically comminuted to produce nanostructured color crystals, which can be used to prepare optical coatings. At present, the crushing method of the optical film mainly comprises the following two methods: ultrasonic pulverizing method and jet mill pulverizing method.
In the long-term research and development process, the inventor of the present application finds that the two crushing methods easily cause surface damage of the optical film fragments, and the brightness of the optical coating is reduced, thereby affecting the optical coating effect.
Disclosure of Invention
The technical problem mainly solved by the application is to provide an optical film with a protective layer, a nano-structure color crystal and a preparation method thereof, which can protect a plurality of optical medium layers, avoid the surface damage of optical film fragments caused by the existing crushing method and further improve the brightness of the optical coating.
In order to solve the technical problem, the application adopts a technical scheme that: providing an optical film with a protective layer, which comprises a plurality of optical medium layers, a first protective layer and a second protective layer, wherein the first protective layer and the second protective layer are arranged on two sides of the optical medium layers; when the optical film with the protective layer is crushed, the first protective layer and the second protective layer are used for protecting the multilayer optical medium layer; wherein the optical thickness of the first passivation layer ranges from one thirty to one half of the incident wavelength, the optical thickness of the second passivation layer ranges from one thirty to one half of the incident wavelength, and the range of the incident wavelength is 380-780 nm.
The optical medium layers are arranged on the surfaces of the two sides of the multilayer optical medium layer, and the material of the optical medium layers comprises at least one of polymer, organic metal material, organic-inorganic hybrid material or metal oxide; the optical thickness of the first protective layer ranges from one thirty to one twentieth of the incident wavelength, and the optical thickness of the second protective layer ranges from one thirty to one twentieth of the incident wavelength.
The material of the optical medium layer comprises at least one of titanium dioxide, tantalum pentoxide, niobium pentoxide, zinc sulfide, zirconium dioxide, silicon monoxide, silicon dioxide or magnesium fluoride.
The material of the optical medium layer comprises at least one of elemental metal and metal alloy; the optical thickness of the first protective layer ranges from one quarter to one half of the incident wavelength, and the optical thickness of the second protective layer ranges from one quarter to one half of the incident wavelength.
The material of the optical medium layer comprises at least one of silver, copper, rhodium, ruthenium, chromium, aluminum, gold, palladium, platinum, nickel or zinc.
Wherein the refractive index of the first protective layer and the refractive index of the second protective layer are less than or equal to 1.7.
Wherein the material of the first protective layer and the second protective layer comprises at least one of silicon dioxide, magnesium fluoride or aluminum oxide.
In order to solve the above technical problem, another technical solution adopted by the present application is: the nanostructured color crystals are fragments of an optical film with a protective layer, the total number of layers of each nanostructured color crystal is the same as that of the optical film with the protective layer, and the optical properties of the multilayer optical medium layer of each nanostructured color crystal are the same as those of the multilayer optical medium layer of the optical film with the protective layer.
In order to solve the above technical problem, the present application adopts another technical solution: there is provided a method for preparing a nanostructured color crystal, the method comprising: providing a base layer; coating a release agent on the surface of the base layer to form a sacrificial layer; arranging a first protective layer on the sacrificial layer; arranging a plurality of optical medium layers on the first protective layer; arranging a second protective layer on the multilayer optical medium layer; removing the sacrificial layer to form an optical film with a protective layer; fragmenting the optical film having the protective layer; and screening to obtain the nano-structure color crystal.
Wherein the step of fragmenting the optical film having the protective layer comprises: the solution mixed with the optical film having the protective layer is put into an ultrasonic solution, and ultrasonic treatment is performed to crush the optical film having the protective layer.
The beneficial effect of this application is: be different from prior art's condition, the multilayer optical medium layer both sides of this application are provided with first protective layer and second protective layer, and when optical film smashed, first protective layer and second protective layer were used for protecting multilayer optical medium layer, avoided the optical film piece surface damage that current crushing method caused, were favorable to increasing the reflection effect of visible light, and then improved optical coating's luminance.
Drawings
In order to more clearly illustrate the technical solutions in the embodiments of the present application, the drawings needed to be used in the description of the embodiments are briefly introduced below, and it is obvious that the drawings in the following description are only some embodiments of the present application, and it is obvious for those skilled in the art to obtain other drawings based on these drawings without creative efforts. Wherein:
FIG. 1 is a schematic diagram of a structure of an embodiment of an optical film with a protective layer according to the present disclosure;
FIG. 2 is a schematic diagram of another embodiment of an optical film having a protective layer according to the present disclosure;
FIG. 3 is a schematic diagram of a structure of another embodiment of an optical film having a protective layer according to the present disclosure;
FIG. 4 is a schematic flow chart diagram illustrating one embodiment of a method for preparing nanostructured color crystals according to the present disclosure;
FIG. 5 is a schematic structural diagram of another embodiment of an optical film with a protective layer according to the present disclosure.
Detailed Description
The technical solutions in the embodiments of the present application will be clearly and completely described below with reference to the drawings in the embodiments of the present application, and it is obvious that the described embodiments are only a part of the embodiments of the present application, and not all the embodiments. All other embodiments, which can be derived by a person skilled in the art from the embodiments given herein without making any creative effort, shall fall within the protection scope of the present application.
See fig. 1 and 2. The application provides an optical film 10 with a protective layer, wherein the optical film 10 with the protective layer comprises a multilayer optical medium layer 12, a first protective layer 11 and a second protective layer 13, wherein the first protective layer and the second protective layer are arranged on two sides of the multilayer optical medium layer 12; the first protective layer 11 and the second protective layer 13 serve to protect the multilayer optical medium layer 12 when the optical film 10 having the protective layers is crushed; wherein, the optical thickness of the first passivation layer 11 ranges from one thirty to one half of the incident wavelength, the optical thickness of the second passivation layer 13 ranges from one thirty to one half of the incident wavelength, and the range of the incident wavelength is 380-780 nm.
Specifically, the optical film 10 having the protective layer may be used to make a paint. The multilayer optical medium layer 12 may be a structure having first refractive index optical film layers L1, L2 and second refractive index optical film layers H1, H2, H3 alternately deposited, wherein the first refractive index is different from the second refractive index. For example, the material of the first refractive index optical film layers L1, L2 may be an optical material having a refractive index of less than or equal to 1.6, and the material of the second refractive index optical film layers H1, H2, H3 may be an optical material having a refractive index of greater than or equal to 2.3. The total number of layers of the multilayer optical medium layer 12 is 5 or more, and the total number of layers is an odd number, for example, 5, 9, 13 layers.
The optical thicknesses of the second refractive index optical film layers H1, H2, and H3 and the optical thicknesses of the first refractive index optical film layers L1 and L2 may be integral multiples of a quarter of the wavelength of incident light, and the wavelength range of the incident light is 380-780 nm. In other embodiments, the optical thicknesses of the second refractive index optical film layers H1, H2, H3 and the optical thicknesses of the first refractive index optical film layers L1, L2 are not limited to optical thicknesses that are integer multiples of a quarter of the wavelength of the incident light. It should be noted that the optical thickness of each of the second refractive index optical film layers H1, H2, H3 and the optical thickness of the first refractive index optical film layers L1, L2 can be set according to the actual situation.
It should be noted that the parameters, such as the number of the specific film layers included in the multilayer optical medium layer 12, the specific material and refractive index of each film layer, and the thickness of each film layer, can be set according to the actual situation, so as to sufficiently improve the adaptability and application versatility of the multilayer optical medium layer 12 of this embodiment. In this embodiment, the refractive index and the thickness of each film layer of the multilayer optical medium layer 12 may be different, and the thickness of each film layer of the multilayer optical medium layer 12 may also be the same, and specifically, the calculation process may be derived according to the optical admittance and the optical characteristic matrix, which is not described in detail in this embodiment.
In order to avoid affecting the brightness of the multilayer optical medium layer 12, the optical thickness of the first protective layer 11 of the present application needs to be controlled in a range from thirty-one to one-half (for example, thirty-one, twenty-one, one-fourth or one-half) of the incident wavelength, and the optical thickness of the second protective layer 13 needs to be controlled in a range from thirty-one to one-half (for example, thirty-one, twenty-one, one-fourth or one-half) of the incident wavelength, which is 380 nm and 780 nm. For example, the optical thickness of the first protection layer 11 is 12.7 nm, 19 nm, 26 nm, 39 nm, 95 nm, 190 nm, 390 nm, etc., which is not limited herein. It should be understood that the lower the refractive index of the first protective layer 11 and the second protective layer 13, the less the optical brightness of the multilayer optical medium layer 12 is affected.
Be different from prior art's condition, multilayer optical medium layer 12 both sides of this application are provided with first protective layer 11 and second protective layer 13, and when optical film 10 with the protective layer was smashed, first protective layer 11 and second protective layer 13 were used for protecting multilayer optical medium layer 12, avoided the optical film piece surface damage that current crushing method caused, are favorable to increasing the reflection effect of visible light, and then improve optical coating's luminance.
Referring to fig. 3, in an embodiment, optical medium layers 14 are disposed on two side surfaces of the multilayer optical medium layer 12, and the material of the optical medium layers 14 includes at least one of a polymer, an organic metal material, an organic-inorganic hybrid material, or a metal oxide. The optical thickness of the first protective layer 11 ranges from one-thirtieth to one-twentieth of the incident wavelength, and the optical thickness of the second protective layer 13 ranges from one-thirtieth to one-twentieth of the incident wavelength.
Specifically, the optical medium layer 14 may be the first refractive index optical film layer or the second refractive index optical film layer in the above embodiments. For example, the optical medium layer 14 may be one of a cross-linked polymer, a metal oxide, a metal nitride, a metal carbide, a metal boride, a metal oxynitride, a metal oxycarbide, or a metal oxyboride. The material of the optical medium layer 14 may include at least one of titanium dioxide, tantalum pentoxide, niobium pentoxide, zinc sulfide, zirconium dioxide, silicon monoxide, silicon dioxide, or magnesium fluoride. At this time, the optical thickness of the first protective layer 11 ranges from one thirty to one twentieth (e.g., one thirty, one twenty-fourth, or one twentieth) of the incident wavelength, and the optical thickness of the second protective layer 13 ranges from one thirty to one twentieth (e.g., one thirty, one twenty-fourth, or one twentieth) of the incident wavelength.
In one embodiment, the material of the optical medium layer 14 includes at least one of an elemental metal and a metal alloy; the optical thickness of the first protective layer 11 ranges from one quarter to one half of the incident wavelength, and the optical thickness of the second protective layer 13 ranges from one quarter to one half of the incident wavelength.
Specifically, the optical medium layer 14 may be the first refractive index optical film layer or the second refractive index optical film layer in the above embodiments. For example, the material of the optical medium layer 14 includes at least one of an elemental metal and a metal alloy. The optical thickness of the first protective layer 11 ranges from one quarter to one half (e.g., one quarter, one third, or one half) of the incident wavelength, and the optical thickness of the second protective layer 13 ranges from one quarter to one half (e.g., one quarter, one third, or one half) of the incident wavelength. The material of the optical medium layer 14 may include at least one of silver, copper, rhodium, ruthenium, chromium, aluminum, gold, palladium, platinum, nickel, or zinc.
In one embodiment, the refractive index of the first protective layer 11 and the refractive index of the second protective layer 13 are less than or equal to 1.7. The material of the first protective layer 11 and the second protective layer 13 includes at least one of silicon dioxide, magnesium fluoride, or aluminum oxide.
The present application also provides a nanostructured color crystal, which is a fragment of the optical film 10 with the protective layer in the above embodiments, the total number of layers of each nanostructured color crystal is the same as the total number of layers of the optical film 10 with the protective layer, and the optical property of the multilayer optical medium layer 12 of each nanostructured color crystal is the same as the optical property of the multilayer optical medium layer 12 of the optical film 10 with the protective layer.
Specifically, the optical film 10 having the protective layer in the above embodiment may be pulverized into fragments to obtain the nanostructure color crystals, and this process is not particularly limited and may be performed by using an ultrasonic pulverizer or a jet mill in the prior art. The total number of layers of each nanostructured color crystal is the same as the total number of layers of the optical film 10 with the protective layer, and the optical properties of the multilayer optical medium layer 12 of each nanostructured color crystal are the same as the optical properties of the multilayer optical medium layer 12 of the optical film 10 with the protective layer.
Further, the nano-structure color crystal can be physically mixed with the viscous solution according to a preset mass ratio and uniformly stirred, so that the coating containing the nano-structure color crystal can be obtained, and the nano-structure color crystal has the characteristic of shape-following attachment on any curved surface because the nano-structure color crystal is changed into the form of the coating.
It is noted that the coating may be a color changing coating or a non-color changing coating. The color shifting characteristics of the coating can be controlled by appropriate design of the multilayer optical media layer 12 used to make the coating. The color change at a certain angle depends on the combined refractive index at the optical film layer. By varying relevant parameters, such as the thickness of each layer of the multilayer optical media layer 12 and the refractive index of each layer, the desired effect can be achieved. The color change that occurs at different viewing or incidence angles is a result of the combination of selective absorption and wavelength dependent interference effects of the materials of the layers. The interference effect resulting from the superposition of multiple reflected light waves is a major factor in the occurrence of color changes at different angles.
Referring to fig. 4 and 5, the present application also provides a method for preparing a nanostructured color crystal, the method comprising the steps of:
s101: a base layer 15 is provided.
Specifically, in order to better detect the refractive index of each optical medium layer 14, the base layer 15 needs to transmit light, and therefore, the base layer 15 may be a transparent substrate, such as a transparent glass substrate, a polyethylene hard plastic, or the like. Preferably, the base layer 15 may be a colorless transparent synthetic resin. And are not limited herein.
S102: a release agent is applied to the surface of the base layer 15 to form a sacrificial layer 16.
Specifically, a release agent may be coated on the base layer 15 in step S101 to prepare a sacrificial layer 16, then the first protective layer 11, each of the multiple optical medium layers 12, and the second protective layer 13 are sequentially prepared on the sacrificial layer 16, and then the base layer 15 with the first protective layer 11, the multiple optical medium layers 12, and the second protective layer 13 is placed in a stripping solution, the sacrificial layer 16 is dissolved by the stripping solution, and the optical film 10 with the protective layer is stripped from the base layer 15. The material of the release agent is easily dissolved in the release solution, and the optical film 10 with the protective layer is not dissolved in the release solution.
S103: the first protective layer 11 is provided on the sacrificial layer 16.
Specifically, the first protective layer 11 may be formed on the sacrificial layer 16 by at least one of electron beam evaporation, thermal evaporation, and sputtering. Please refer to the first protective layer 11 of the optical film 10 with a protective layer in the above embodiment for the first protective layer 11. And will not be described in detail herein.
The operation process is as follows: the material of the first protection layer 11 is first filled in the deposition chamber in sequence, and the film material is at least one of the materials of the first protection layer 11 in the above embodiments. Then, the vacuum degree of the deposition chamber is pumped to a preset vacuum degree, the thickness of each layer of film is monitored by a photometric method, and the first protective layer 11 with the corresponding thickness is sequentially deposited on the base layer 15.
S104: a multilayer optical medium layer 12 is disposed on the first protective layer 11.
Specifically, the background refractive index of the film system design software may be modified to the refractive index of the viscous solution to be used, and the film system structure of the optical thin film may be designed by using the film system design software according to the design requirements. Wherein, the film system design software has no special requirement, and the optical design software commonly used in the field can be, for example, the Essential Macleod software. The viscous solution to be used is the viscous solution in the high brightness pigment embodiment described above.
The film system designed according to the design requirement may be formed on the base layer 15 sequentially by at least one of electron beam evaporation, thermal evaporation, and sputtering, which are well known to those skilled in the art and will not be described herein.
The multilayer optical medium layer 12 includes first and second refractive index optical film layers that are alternately stacked. The multilayer optical medium layer 12 is the multilayer optical medium layer 12 of the optical film 10 with the protective layer in the above embodiments, and details are not described herein.
The operation process is as follows: firstly, optical medium materials are sequentially filled in a deposition chamber, wherein the optical medium materials are at least one of the optical medium materials in the above embodiments, then the vacuum degree of the deposition chamber is pumped to a preset vacuum degree, the thickness of each layer of film is monitored by a photometric method, and a first refractive index optical film layer and a second refractive index optical film layer with corresponding thicknesses are sequentially deposited on the base layer 15.
S105: a second protective layer 13 is disposed on the multilayer optical medium layer 12.
Specifically, this step is similar to step S103, and is not described herein again.
After the plating is completed, the base layer 15 with the optical film 10 having the protective layer is taken out from the vacuum chamber.
Further, step S103-step S105 are a period, after the period is finished, a release agent may be evaporated on the second protection layer 13, so as to form a sacrificial layer 16 on the surface of the second protection layer 13, and then step S103-step S105 are repeated to obtain the multi-layered optical film with protection layers as shown in fig. 5. According to the production process level, the method can be overlapped for many times to obtain mass production.
S106: the sacrificial layer 16 is removed to form the optical film 10 with a protective layer.
Specifically, the base layer 15 plated with the multilayer optical medium layer 12 may be placed in a stripping solution for stripping. The material of the release agent is not limited, and can be selected according to the prior art, for example, the material of the release agent is sodium chloride, and the release solution is water, or the material of the release agent is an organic material, and the release solution is ethanol or toluene. The optical film layer is coated by the existing electron beam evaporation coating machine.
S107: the optical film 10 having the protective layer is shredded.
S108: and screening to obtain the nano-structure color crystal.
Wherein, the step S107 further includes: the solution mixed with the optical film 10 having the protective layer is put into an ultrasonic solution, and ultrasonic treatment is performed to crush the optical film 10 having the protective layer.
Specifically, the solution in which the optical film 10 having the protective layer is mixed may be put into an ultrasonic solution and ultrasonically treated for about thirty minutes to crush the optical film 10 having the protective layer. Filtering and separating to obtain the nano-structure color crystal for manufacturing the application. The nanostructured color crystals are fragments of the optical film 10 with the protective layer, the total number of layers of each nanostructured color crystal is the same as the total number of layers of the optical film 10 with the protective layer, and the optical properties of the multilayer optical medium layer 12 of each nanostructured color crystal are the same as the optical properties of the multilayer optical medium layer 12 of the optical film 10 with the protective layer.
Be different from prior art's condition, multilayer optical medium layer 12 both sides of this application are provided with first protective layer 11 and second protective layer 13, and when optical film smashed, first protective layer 11 and second protective layer 13 were used for protecting multilayer optical medium layer 12, avoided the optical film piece surface damage that current crushing method caused, were favorable to increasing the reflection effect of visible light, and then improved optical coating's luminance.
Hereinafter, an optical thin film having a protective layer, a nano-structured color crystal and a method for preparing the same according to the present application will be described in further detail with reference to specific examples.
Example 1
For prior art multilayer optical films: cr 4L Cr 4L Cr;
wherein, the thicknesses are respectively 5 nanometers, 440 nanometers, 20 nanometers, 440 nanometers and 5 nanometers.
After improvement, the optical film with the protective layer is obtained:
first protective layer Cr 4L Cr 4L Cr second protective layer
Wherein, the thicknesses are respectively 110 nanometers, 5 nanometers, 440 nanometers, 20 nanometers, 440 nanometers, 5 nanometers and 110 nanometers. L is silicon dioxide, the first protective layer is silicon dioxide, and the second protective layer is silicon dioxide.
The preparation method comprises the following steps: firstly, sequentially filling a material of a first protective layer, an optical medium material and a material of a second protective layer in a deposition chamber, wherein the material of the first protective layer and the material of the second protective layer are silicon dioxide, then pumping the vacuum degree of the deposition chamber to a preset vacuum degree, monitoring the thickness of each layer by a photometric method, and sequentially depositing the first protective layer Cr 4L Cr 4L Cr second protective layer with corresponding thickness on a base layer coated with a release agent. And finishing the deposition of the optical film with the protective layer. And taking the substrate with the optical film with the protective layer out of the vacuum chamber after the plating is finished. And stripping and crushing the optical film with the protective layer, and sieving to obtain the nano-structure color crystal.
Example 2
For prior art multilayer optical films: H4L H4L H;
wherein, the thicknesses are respectively 65 nanometers, 440 nanometers, 65 nanometers, 440 nanometers and 65 nanometers, wherein L is magnesium fluoride, and H is zinc sulfide.
After the improvement, an optical film with a protective layer is obtained:
first protective layer H4L H4L H second protective layer
Wherein, the thicknesses are respectively 19 nanometers, 65 nanometers, 440 nanometers, 65 nanometers and 19 nanometers. L is magnesium fluoride, the first protective layer is magnesium fluoride, and the second protective layer is magnesium fluoride.
The preparation method comprises the following steps: firstly, a material of a first protective layer, an optical medium material and a material of a second protective layer are sequentially filled in a deposition chamber, the material of the first protective layer and the material of the second protective layer are magnesium fluoride, then the vacuum degree of the deposition chamber is pumped to a preset vacuum degree, the thickness of each layer of film is monitored by a photometric method, and the first protective layer H4L H4L H and the second protective layer with corresponding thickness are sequentially deposited on a base layer coated with a release agent. And finishing the deposition of the optical film with the protective layer. And taking the substrate with the optical film with the protective layer out of the vacuum chamber after the plating is finished. And stripping and crushing the optical film with the protective layer, and sieving to obtain the nano-structure color crystal.
The above description is only for the purpose of illustrating embodiments of the present application and is not intended to limit the scope of the present application, and all modifications of equivalent structures and equivalent processes, which are made by the contents of the specification and the drawings of the present application or are directly or indirectly applied to other related technical fields, are also included in the scope of the present application.
Claims (10)
1. An optical film with a protective layer is characterized by comprising a plurality of optical medium layers, a first protective layer and a second protective layer, wherein the first protective layer and the second protective layer are arranged on two sides of the optical medium layers;
when the optical film with the protective layer is crushed, the first protective layer and the second protective layer are used for protecting the multilayer optical medium layer;
the optical thickness of the first protection layer is in a range of one-thirtieth to one-half of the incident wavelength, the optical thickness of the second protection layer is in a range of one-thirtieth to one-half of the incident wavelength, and the range of the incident wavelength is 380-780 nm.
2. An optical film as recited in claim 1,
optical medium layers are arranged on the surfaces of the two sides of the multilayer optical medium layer, and the material of the optical medium layers comprises at least one of polymer, organic metal material, organic-inorganic hybrid material or metal oxide;
the optical thickness of the first protective layer ranges from one thirty to one twentieth of the incident wavelength, and the optical thickness of the second protective layer ranges from one thirty to one twentieth of the incident wavelength.
3. An optical film as recited in claim 2,
the material of the optical medium layer comprises at least one of titanium dioxide, tantalum pentoxide, niobium pentoxide, zinc sulfide, zirconium dioxide, silicon monoxide, silicon dioxide or magnesium fluoride.
4. An optical film as recited in claim 1,
the material of the optical medium layer comprises at least one of elemental metal and metal alloy;
the optical thickness of the first protective layer ranges from one quarter to one half of the incident wavelength, and the optical thickness of the second protective layer ranges from one quarter to one half of the incident wavelength.
5. An optical film as recited in claim 4,
the material of the optical medium layer comprises at least one of silver, copper, rhodium, ruthenium, chromium, aluminum, gold, palladium, platinum, nickel or zinc.
6. An optical film as recited in claim 1,
the refractive index of the first protective layer and the refractive index of the second protective layer are less than or equal to 1.7.
7. An optical film according to claim 2 or 4,
the material of the first protective layer and the second protective layer includes at least one of silicon dioxide, magnesium fluoride, or aluminum oxide.
8. A nanostructured color crystal which is a fragment of the optical film with a protective layer according to any one of claims 1 to 7, wherein the total number of layers of each of the nanostructured color crystals is the same as the total number of layers of the optical film with a protective layer, and wherein the optical properties of the multilayer optical medium layer of each of the nanostructured color crystals are the same as the optical properties of the multilayer optical medium layer of the optical film with a protective layer.
9. A method of preparing nanostructured color crystals, the method comprising:
providing a base layer;
coating a release agent on the surface of the base layer to form a sacrificial layer;
arranging a first protective layer on the sacrificial layer;
arranging a plurality of optical medium layers on the first protective layer;
arranging a second protective layer on the multilayer optical medium layer;
removing the sacrificial layer to form the optical film with the protective layer;
fragmenting the optical film with the protective layer;
and screening to obtain the nano-structure color crystal.
10. The method of claim 9, wherein the step of reducing the optical film having the protective layer comprises:
the solution mixed with the optical film with the protective layer is put into an ultrasonic solution and is subjected to ultrasonic treatment to crush the optical film with the protective layer.
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| CN102757669A (en) * | 2012-07-11 | 2012-10-31 | 珠海市群望科技有限公司 | Surface treatment sheet and preparation method thereof |
| CN103773083A (en) * | 2012-10-18 | 2014-05-07 | 上海纳米技术及应用国家工程研究中心有限公司 | Optical interference color change pigment and its preparation method and application |
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