CN104647935A - Optical anti-counterfeiting element and manufacturing method - Google Patents
Optical anti-counterfeiting element and manufacturing method Download PDFInfo
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Abstract
The invention discloses an optical anti-counterfeiting element and a manufacturing method. The method comprises the steps of forming a first fluctuant structure layer which comprises a region with a first microstructure on a supporting layer, forming a first reflecting layer on the region with the first microstructure of the first fluctuant structure layer, forming a second fluctuant structure layer which comprises a region with a second microstructure and a flat region without fluctuant structure beyond the second microstructure on the first reflecting layer or the other side of the supporting layer, and forming a second reflecting layer on the second fluctuant structure.
Description
Technical field
The present invention relates to a kind of optical anti-counterfeit element and manufacture method thereof.
Background technology
In order to prevent the forgery utilizing the means such as scanning and duplicating to produce, being widely used Techniques of Optical Security in all kinds of high safety such as banknote, marketable securities or high added value printed matter, and achieving extraordinary effect.Techniques of Optical Security generally by the safety line of film-form, the Security element such as label or wide bar as carrier, realize false proof object.
In order to increase brightness, the anti-counterfeiting image on optical anti-counterfeit element generally adopts metallic reflector.Carry out local to this metallic reflector to remove, thus during translumination observation, form specific pierced pattern, the visual effect of optical anti-counterfeit element and anti-forgery ability can be increased substantially.The technology of the coat of metal being carried out to hollow out generally has two kinds, and namely washing goes metal and alkali cleaning to remove metal.Washing goes smithcraft to be needing the position of hollow out to be first coated with washing glue-line, then evaporation metal coating, then through wetting, washing, make washing glue-line soluble in water, the coat of metal that washing glue-line covers also is peeled off thereupon, reaches the object of hollow out.Alkali cleaning goes smithcraft to utilize the chemical attack effect of alkali lye to aluminium lamination to reach the object of hollow out; i.e. first evaporation metal coating; then do not needing the position coat protective layer of hollow out, then immersing the coat of metal that alkali lye covers to erode non-protected seam, thus form hollow picture and text.
Sometimes, be improve antifalse effect, the Security element in high safety or high added value printed matter all has visual part in the both sides of printed matter, wide bar as false proof in the form on the banknote of some country or double window safety line.At this moment, if the different images of Security element both sides all has hollow out effect, especially the profile of hollow out image is completely on time, then can improve visual effect and the anti-counterfeit capability of optical anti-counterfeit element further.
Summary of the invention
The object of this invention is to provide and a kind ofly can improve the visual effect of optical anti-counterfeit element and the optical anti-counterfeit element of anti-counterfeit capability and manufacture method thereof.
To achieve these goals, one aspect of the present invention provides a kind of optical anti-counterfeit element, and this Security element comprises: supporting layer; Be positioned at the first fluctuating structure sheaf on described supporting layer, this first fluctuating structure sheaf comprises the region with the first micro-structural; Be positioned at the first reflecting layer on the region with the first micro-structural of described first fluctuating structure sheaf; Be positioned at the second relief fabric layer on the region on described first reflecting layer and beyond the region with the first micro-structural of described first fluctuating structure sheaf, this second relief fabric layer comprises the region with second micro-structural corresponding with the region with the first micro-structural of described first fluctuating structure sheaf and this has the flat site not having relief fabric beyond the second microstructure area; And the second reflecting layer be positioned on described second relief fabric layer.
Another aspect of the present invention provides a kind of optical anti-counterfeit element, and this Security element comprises: supporting layer; Be positioned at the first fluctuating structure sheaf on described supporting layer side, this first fluctuating structure sheaf comprises the region with the first micro-structural; Be positioned at the first reflecting layer on the region with the first micro-structural of described first fluctuating structure sheaf; Be positioned at the second relief fabric layer on described supporting layer opposite side, this second relief fabric layer comprises the region with second micro-structural corresponding with the region with the first micro-structural of described first fluctuating structure sheaf and this has the flat site not having relief fabric beyond the second microstructure area; And the second reflecting layer be positioned on described second relief fabric layer.
Also aspect of the present invention provides a kind of manufacture method of optical anti-counterfeit element, and the method comprises: on supporting layer, form the first fluctuating structure sheaf, and this first fluctuating structure sheaf comprises the region with the first micro-structural; The region with the first micro-structural of described first fluctuating structure sheaf forms the first reflecting layer; Region on described first reflecting layer and beyond the region with the first micro-structural of described first fluctuating structure sheaf forms the second relief fabric layer, and this second relief fabric layer comprises the region with second micro-structural corresponding with the region with the first micro-structural of described first fluctuating structure sheaf and this has the flat site not having relief fabric beyond the second microstructure area; And the second reflecting layer is formed on described second relief fabric layer.
Another aspect of the present invention provides a kind of manufacture method of optical anti-counterfeit element, and the method comprises: on supporting layer side, form the first fluctuating structure sheaf, and this first fluctuating structure sheaf comprises the region with the first micro-structural; The region with the first micro-structural of described first fluctuating structure sheaf forms the first reflecting layer; Described supporting layer opposite side is formed the second relief fabric layer, and this second relief fabric layer comprises the region with second micro-structural corresponding with the region with the first micro-structural of described first fluctuating structure sheaf and this has the flat site not having relief fabric beyond the second microstructure area; And the second reflecting layer is formed on described second relief fabric layer.
Another aspect of the present invention provides the optical anti-counterfeit element manufactured according to above-mentioned manufacture method.
By technique scheme, the visual effect of optical anti-counterfeit element that can be improved and the optical anti-counterfeit element of anti-counterfeit capability.
Other features and advantages of the present invention are described in detail in detailed description of the invention part subsequently.
Accompanying drawing explanation
Accompanying drawing is used to provide a further understanding of the present invention, and forms a part for description, is used from explanation the present invention, but is not construed as limiting the invention with detailed description of the invention one below.In the accompanying drawings:
Fig. 1 a illustrates the design sketch of optical anti-counterfeit element according to the embodiment of the present invention in unilateral observation;
Fig. 1 b illustrates the design sketch that optical anti-counterfeit element is according to the embodiment of the present invention observed in the second side;
Fig. 2 is a kind of possible sectional view of the X-X line along the optical anti-counterfeit element shown in Fig. 1 a;
Fig. 3-Fig. 9 is the sectional view in different phase in the optical anti-counterfeit element process shown in Security element manufacture method shop drawings 2 according to the embodiment of the present invention.
Detailed description of the invention
Below in conjunction with accompanying drawing, the specific embodiment of the present invention is described in detail.Should be understood that, detailed description of the invention described herein, only for instruction and explanation of the present invention, is not limited to the present invention.
Certain layer mentioned when describing optical anti-counterfeit element structure be herein positioned at certain layer " on ", and it is upper and lower not mean that in space, and refers to that certain layer is close to certain layer of processing.Herein " solidification " of radiation curing glue to refer to the crosslinking degree of radiation curing glue very high or completely crosslinked, cause glue-line can not compression molding under certain condition, " do not solidify " crosslinking degree referring to radiation curing glue high or be not cross-linked completely, cause glue-line can compression molding under corresponding conditions.
Fig. 1 a illustrates the design sketch of optical anti-counterfeit element according to the embodiment of the present invention in unilateral observation.Fig. 1 b illustrates the design sketch that optical anti-counterfeit element is according to the embodiment of the present invention observed in the second side.Fig. 2 is a kind of possible sectional view of the X-X line along the optical element shown in Fig. 1 a.As shown in the figure, can observe the holographic lotus flower image in Chinese ancient coins profile in the first side, corresponding to the first image m1 in a region in Fig. 2, image peripheral is transparent void region, corresponding to the b region in Fig. 2.Observe from the second side, except can seeing the holographic lotus flower image of the specular in Chinese ancient coins profile, also see equally with " OK " printed words of the Chinese ancient coins periodic arrangement that is profile, corresponding to the first image m2 in a region in Fig. 2.Such optical element has strong visual effect and powerful anti-counterfeit capability.It will be appreciated by those skilled in the art that the image shown in Fig. 1 a, Fig. 1 b just schematically, but not limit the scope of the invention.
From structure, as shown in Figure 2, according to an embodiment of the invention, provide a kind of optical anti-counterfeit element, described optical anti-counterfeit element generally comprises supporting layer 1, and this supporting layer 1 is normally flexible, the first fluctuating structure sheaf 2, it has the micro-structural of fluctuating at first area a, does not have micro-structural at second area b; Be positioned at the first reflecting layer 3 and protective layer 4 that the first fluctuating structure sheaf 2 correspond to first area a, this first reflecting layer is that " similar shape covering " is on the first fluctuating structure sheaf 2; In first area a first reflecting layer 3, there is the micro-structural identical with the first fluctuating structure sheaf 2; The second relief fabric layer 5 of micro-structural that second area b do not rise and fall is corresponded to corresponding to first area a has the micro-structural of fluctuating, this the second relief fabric layer can be such as radiation curing glue-line 5, second reflecting layer 6, this second reflecting layer 6 is that similar shape covers on the second relief fabric layer 5, namely at first area a, there is the micro-structural identical with the second relief fabric layer 5, there is no micro-structural at second area b; And the protective layer on the second reflecting layer 6 is or/and other functional coatings 7.First fluctuating structure sheaf 2 forms the first image m1 at first area a, and the second relief fabric layer and radiation curing glue-line 5 form the first image m2 at first area a.
In replaceable embodiment of the present invention; first fluctuating structure sheaf 2 and the first reflecting layer 3(first protective layer 4) side of supporting layer 1, the second relief fabric layer 5 and the second reflecting layer 6(second protective layer 7 can be positioned at) opposite side of supporting layer 1 can be positioned at.
Another embodiment of the invention provides the manufacture method that can manufacture above-mentioned optical anti-counterfeit element.
The manufacture process of the optical anti-counterfeit element shown in manufacture method shop drawings 2 is according to the embodiment of the present invention described in detail below in conjunction with Fig. 3 to Fig. 9.Here, artificial manufacture process is divided into two large processes for sake of convenience, namely manufactures the optical anti-counterfeit element semi-finished product with the first hollow out image m1, and manufacture the optical anti-counterfeit element finished product that both sides have the different images (m1, m2) of same profile.The technique that first process is well known to those skilled in the art, the second process then embodies core methed of the present invention.
1, the optical anti-counterfeit element semi-finished product with the first hollow out image (m1) are manufactured
The half-finished manufacture method of this optical anti-counterfeit element has a lot, and finally shaping structure is also different.Be in the object of explanation, introduce the most classical the most common one in detail here, be i.e. alkali cleaning printing dealuminzation, the molding structure of its correspondence as shown in Figure 3.
First the first fluctuating structure sheaf 2 can be formed in flexible support layers 1.Flexible support layers 1 has the effect supporting whole Security element.Sometimes, flexible support layers also has protective effect concurrently.Flexible support layers 1 is generally selected from the good and thin-film material that mechanical strength is high of resistance to physical and chemical performance.As this film substrate, the plastic sheetings such as PETG (PET) film, PEN (PEN) film and polypropylene (PP) film can be used, preferred PET material.
General containing bonding enhancement layer in flexible support layers 1, to strengthen the bonding of flexible support layers and the first fluctuating structure sheaf 2.
The micro-structural of the first fluctuating structure sheaf 2 carries the optical information of the first image m1.The degree of depth of relief fabric is positioned at the scope of 20nm ~ 1500nm, and width is positioned at the scope of 100nm ~ 3000nm.From the pattern of micro-structural, can be sinusoidal grating structure, or blazed grating structure, or rectangular raster structure, or the combination of said structure.Certainly, this will usually will select according to concrete anti-counterfeiting design.The optical effect of the performance of the first fluctuating structure sheaf 2 can be that holography, schemochrome, optics are black etc.
First fluctuating structure sheaf 2 can be formed by mould pressing process by thermoplastic resin, and be namely coated on thermoplastic resin on supporting layer 1 in advance at the metal matrix through high temperature, be heated softening transform, forms specific relief fabric, rear cooling forming.First fluctuating structure sheaf 2 also can adopt radiation curing casting process to be formed, namely by radiation curing resin being coated on supporting layer 1, by master pushing thereon, the radioactive ray such as irradiation ultraviolet radiation or electron beam on one side, above-mentioned material is solidified, and the method for then taking off master is formed.Second method is applicable to the relief fabric manufacturing larger depth-to-width ratio.
First fluctuating structure sheaf 2 thereon with uniform superficial density evaporation reflector material, forms the first reflecting layer 3 after being formed.The brightness of the optical effect that the micro-structural that the first reflecting layer 3 is used for enhancing first image m1 reflects.First reflecting layer 3 can be single-layer metal coating, is selected from aluminium, silver, copper, tin, chromium, nickel, titanium or their alloy.Aluminium is with low cost, and brightness is high, is therefore preferably aluminium.The amount of reflecting layer evaporation take optical density (OD) as standard, and the optical density (OD) in reflecting layer should be greater than 1.5, is less than 5, is preferably greater than 2.0, be less than 3.5.Such optical density (OD) combines material cost and reflectivity.
Alternatively, the first reflecting layer 3 also can be multi-coated interference membrane structure.Like this, can form interference light and become effect, namely under the light source irradiation of different angle views or different angles, Security element has different colors or color background.Multi-coated interference film can be: (1) stacks gradually by absorbed layer, low refractive index dielectric layer and specular layer the coating formed, and wherein this specular layer contacts with the first fluctuating structure sheaf 2; (2) stacked gradually the multi-medium-layer coating formed by high refractive index medium layer, low refractive index dielectric layer and high refractive index medium layer, wherein, this reflecting layer or absorbed layer contact with described relief fabric layer 2.According to the embodiment of the present invention, high refractive index medium layer refers to the dielectric layer that refractive index is more than or equal to 1.7, and its material can be ZnS, TiN, TiO
2, TiO, Ti
2o
3, Ti
3o
5, Ta
2o
5, Nb
2o
5, CeO
2, Bi
2o
3, Cr
2o
3, Fe
2o
3, HfO
2, ZnO etc., low refractive index dielectric layer refers to the dielectric layer that refractive index is less than 1.7, and its material can be MgF
2, SiO
2deng.The material in reflecting layer can be the metals such as Al, Cu, Ni, Cr, Ag, Fe, Sn, Au, Pt or its mixture and alloy, due to the with low cost of aluminium and brightness is high, is therefore preferably aluminium.Absorbed layer material can be the metals such as Cr, Ni, Cu, Co, Ti, V, W, Sn, Si, Ge or its mixture and alloy.
After complete first reflecting layer 3 of evaporation, to retain image region (namely on reflecting layer 3 a), first area chromatography as the protecting glue of protective layer 4.The thickness of protecting glue is generally greater than 100nm, is less than 2um.This protective layer 4 can protect the reflecting layer of first area a.
After printing protective layer 4; carry out reflecting layer operation, be about to immerse in the solution that can react with reflecting layer, after a period of time at goods; the reflecting layer that second area b is corresponding is complete by solution corrosion, and the reflecting layer of first area a is retained because of the protection of protective layer 4.This solution is generally selected from alkali lye, and this is that smithcraft is gone in alkali cleaning.The optical anti-counterfeit element semi-finished product so far with the first hollow out image m1 manufacture complete.
The method in reflecting layer is gone in alkali cleaning except above-mentioned employing, washing can also be adopted to go reflecting layer technique, namely the position of hollow out is being needed first to be coated with washing glue-line, then evaporation metal coating, again through wetting, washing, make washing glue-line soluble in water, the coat of metal that washing glue-line covers also is peeled off thereupon, reaches the object of hollow out.Have like this in the half-finished structure of optical anti-counterfeit element of the first hollow out image m1, reflecting layer is outside exposed, and washes glue between the first fluctuating structure sheaf and reflecting layer.The accurate location grown up in recent years can also be adopted to go smithcraft, namely the object retaining or remove reflecting layer is reached by the difference of the relief fabric of image, as patent application CN200680006666.1, CN201080026768.6, and the technique that CN201310034614.7 etc. mentions.Here, we quote these patent applications as a reference.
2, the optical anti-counterfeit element finished product that both sides have the different images (m1, m2) of same profile is manufactured
First on the optical anti-counterfeit element semi-finished product with the first hollow out image m1, be coated with radiation curing glue-line 5, can be coated with on the first reflecting layer 3/ protective layer 4, also can be coated with, depending on product needed at flexible support layers 1 opposite side.Figure 4 shows that coating on protective layer 4.The basic characteristics of the radiation curing glue adopted are that solvent is evaporated completely, and can form the dry film of softening point higher than room temperature.If when not carrying out uv-exposure or when exposure dose is very low, glue-line is uncrosslinked or the degree of cross linking is not high, and (lower than 200 degrees Celsius, pressure is less than 6bar to temperature) can relief fabric needed for compression molding under certain condition; If after carrying out uv-exposure with certain intensity, the glue-line degree of cross linking is high or completely crosslinked, then under these conditions (lower than 200 degrees Celsius, pressure is less than 6bar to temperature) can not compression molding.Realize the radiation curing glue of above-mentioned performance, its representative formula generally comprises initator, prepolymer, solvent and other auxiliary agents.Prepolymer is generally the acrylic resin that molecular weight is larger, and molecular weight is generally greater than 20000.General not containing monomer in representative formula, this is because dry out solvent needs to form dry film so that rolling.The thickness of coating is generally greater than 100nm and is less than 3um.
After coated radiation curing glue-line 5, at ultraviolet light or the electron beam (as Suo Shi " UV " in figure) of the back side illuminaton some strength of radiation curing glue-line 5, as shown in Figure 5.The reflecting layer of such first image m1, as mask, make the radiation curing glue of first area a unexposed or low dosage exposure and uncured, and the exposure of the radiation curing glue of second area b heavy dose or exposure is solidified completely.
Next, to radiation curing glue-line 5 mold pressing, as shown in Figure 6.Because the radiation curing glue 5 of first area a is uncured, thus can form mold pressing and go out the second image m2, and the radiation curing adhesive curing of second area b fail mold pressing formed image.So far, the first image m1 and the second image m2 of exactitude position is just obtained.
After radiation curing glue-line 5 mold pressing, at ultraviolet light or the electron beam of the front illuminated some strength of radiation curing glue-line 5, make the radiation curing adhesive curing of first area a, as shown in Figure 7.Like this, whole radiation curing glue-line 5 is solidified, and materialization patience is improved, and is conducive to the quality of next step construction and final products.
Further, for increasing the brightness of the second image m2, after mold pressing, need evaporation is transparent or semitransparent on radiation curing glue-line 5 the second reflecting layer 6, as shown in Figure 8.The inorganic compound larger with organic coating refractive index difference generally selected by transparent material, can ensure that second area b is transparent like this, can ensure that again the second image m2 has higher brightness.Second reflecting layer 6 can be ZnS, TiN, TiO
2, TiO, Ti
2o
3, Ti
3o
5, Ta
2o
5, Nb
2o
5, CeO
2, Bi
2o
3, Cr
2o
3, Fe
2o
3, HfO
2, one or more mixture in ZnO.Because zinc sulphide materials evaporation temperature is relatively low, and its refractive index is higher, therefore the second reflecting layer 6 preferably zinc sulphide.Translucent inorganic compound or the metal as aluminium, silver, copper, tin, chromium, nickel, titanium or their alloy formation also can be selected in second reflecting layer 6, and be preferably aluminium, the optical density (OD) of its coating is greater than 1.0, is less than 1.8.Such optical density (OD) both can make the second image m2 have higher reflectivity, and the second area b of final Security element can be made again to present hollow out effect when fluoroscopic observation.
After complete second reflecting layer 6 of evaporation, coat protective layer/other function material layer 7 on the second reflecting layer 6, as shown in Figure 9.This coating can be individual layer, also can be multilayer.Coating generally has protective effect, and protection reflecting layer is not corroded by external environment, generally also has the effect bonded with other base materials, such as paper simultaneously.
The optical anti-counterfeit element of the embodiment of the present invention can create label, wide bar or safety line, and products application comprises banknote, marketable securities, passport, tax reciept etc.
Below the preferred embodiment of the present invention is described in detail by reference to the accompanying drawings; but; the present invention is not limited to the detail in above-mentioned embodiment; within the scope of technical conceive of the present invention; can carry out multiple simple variant to technical scheme of the present invention, these simple variant all belong to protection scope of the present invention.
It should be noted that in addition, each the concrete technical characteristic described in above-mentioned detailed description of the invention, in reconcilable situation, can be combined by any suitable mode.In order to avoid unnecessary repetition, the present invention illustrates no longer separately to various possible combination.
In addition, also can be combined between various different embodiment of the present invention, as long as it is without prejudice to thought of the present invention, it should be considered as content disclosed in this invention equally.
Claims (22)
1. an optical anti-counterfeit element, is characterized in that, this Security element comprises:
Supporting layer;
Be positioned at the first fluctuating structure sheaf on described supporting layer, this first fluctuating structure sheaf comprises the region with the first micro-structural;
Be positioned at the first reflecting layer on the region with the first micro-structural of described first fluctuating structure sheaf;
Be positioned at the second relief fabric layer on the region on described first reflecting layer and beyond the region with the first micro-structural of described first fluctuating structure sheaf, this second relief fabric layer comprises the region with second micro-structural corresponding with the region with the first micro-structural of described first fluctuating structure sheaf and this has the flat site not having relief fabric beyond the second microstructure area; And
Be positioned at the second reflecting layer on described second relief fabric layer.
2. Security element according to claim 1, wherein this Security element also comprises first protective layer with the region of the first micro-structural corresponding to described first fluctuating structure sheaf between described first reflecting layer and described second relief fabric layer.
3. Security element according to claim 1, wherein, this Security element also comprises:
Be positioned at the second protective layer on described second reflecting layer and/or functional coating.
4. Security element according to claim 1, wherein, described second relief fabric layer is radiation curing glue-line.
5. an optical anti-counterfeit element, is characterized in that, this Security element comprises:
Supporting layer;
Be positioned at the first fluctuating structure sheaf on described supporting layer side, this first fluctuating structure sheaf comprises the region with the first micro-structural;
Be positioned at the first reflecting layer on the region with the first micro-structural of described first fluctuating structure sheaf;
Be positioned at the second relief fabric layer on described supporting layer opposite side, this second relief fabric layer comprises the region with second micro-structural corresponding with the region with the first micro-structural of described first fluctuating structure sheaf and this has the flat site not having relief fabric beyond the second microstructure area; And
Be positioned at the second reflecting layer on described second relief fabric layer.
6. Security element according to claim 5, wherein this Security element also comprises the first protective layer be positioned on described first reflecting layer.
7. Security element according to claim 5, wherein, this Security element also comprises:
Be positioned at the second protective layer on described second reflecting layer and/or functional coating.
8. Security element according to claim 5, wherein, described second relief fabric layer is radiation curing glue-line.
9. a manufacture method for optical anti-counterfeit element, the method comprises:
Supporting layer is formed the first fluctuating structure sheaf, and this first fluctuating structure sheaf comprises the region with the first micro-structural;
The region with the first micro-structural of described first fluctuating structure sheaf forms the first reflecting layer;
Region on described first reflecting layer and beyond the region with the first micro-structural of described first fluctuating structure sheaf forms the second relief fabric layer, and this second relief fabric layer comprises the region with second micro-structural corresponding with the region with the first micro-structural of described first fluctuating structure sheaf and this has the flat site not having relief fabric beyond the second microstructure area; And
Described second relief fabric layer forms the second reflecting layer.
10. method according to claim 9, the method also comprises:
Before described first reflecting layer is formed the second relief fabric layer, first on described first reflecting layer, form the first protective layer.
11. methods according to claim 9, the method also comprises:
Described second reflecting layer forms the second protective layer.
12. methods according to claim 9, wherein, described supporting layer comprises bonding enhancement layer.
13. methods according to claim 10, wherein, the region with the first micro-structural of described first fluctuating structure sheaf form the first reflecting layer and comprise:
On described first fluctuating structure sheaf, evaporation reflector material is to form a reflecting layer; And
Remove in this reflecting layer with described first fluctuating structure sheaf there is part corresponding to region beyond the first microstructure area to form the first reflecting layer.
14. methods according to claim 13, wherein, described first reflecting layer are formed the second relief fabric layer and comprise:
Region on described first reflecting layer and beyond the region with the first micro-structural of described first fluctuating structure sheaf is coated with radiation curing glue-line;
At back side illuminaton ultraviolet light or the electron beam of described radiation curing glue-line;
Mold pressing is carried out to described radiation curing glue-line, to form the region with the second micro-structural; And
Described in making, there is the regions curing of the second micro-structural to the front illuminated ultraviolet light of described radiation curing glue-line or electron beam.
15. 1 kinds of optical anti-counterfeit elements manufactured according to the method in claim 9-14 described in any one.
The manufacture method of 16. 1 kinds of optical anti-counterfeit elements, the method comprises:
Supporting layer side is formed the first fluctuating structure sheaf, and this first fluctuating structure sheaf comprises the region with the first micro-structural;
The region with the first micro-structural of described first fluctuating structure sheaf forms the first reflecting layer;
Described supporting layer opposite side is formed the second relief fabric layer, and this second relief fabric layer comprises the region with second micro-structural corresponding with the region with the first micro-structural of described first fluctuating structure sheaf and this has the flat site not having relief fabric beyond the second microstructure area; And
Described second relief fabric layer forms the second reflecting layer.
17. methods according to claim 16, the method also comprises:
Described first reflecting layer forms the first protective layer.
18. methods according to claim 16, the method also comprises:
Described second reflecting layer forms the second protective layer.
19. methods according to claim 16, wherein, described supporting layer comprises bonding enhancement layer.
20. methods according to claim 17, wherein, the region with the first micro-structural of described first fluctuating structure sheaf form the first reflecting layer and comprise:
On described first fluctuating structure sheaf, evaporation reflector material is to form a reflecting layer; And
Remove in this reflecting layer with described first fluctuating structure sheaf there is part corresponding to region beyond the first microstructure area.
21. methods according to claim 20, wherein, described supporting layer opposite side are formed the second relief fabric layer and comprise:
Described supporting layer opposite side is coated with radiation curing glue-line;
At back side illuminaton ultraviolet light or the electron beam of described radiation curing glue-line;
Mold pressing is carried out to described radiation curing glue-line, to form the region with the second micro-structural; And
Described in making, there is the regions curing of the second micro-structural to the front illuminated ultraviolet light of described radiation curing glue-line or electron beam.
22. 1 kinds of optical anti-counterfeit elements manufactured according to the method in claim 16-21 described in any one.
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| CN109895526A (en) * | 2017-12-08 | 2019-06-18 | 中钞特种防伪科技有限公司 | Optical anti-counterfeit element and preparation method thereof |
| CN109895526B (en) * | 2017-12-08 | 2021-06-22 | 中钞特种防伪科技有限公司 | Optical anti-counterfeiting element and manufacturing method thereof |
| CN108682284A (en) * | 2018-05-24 | 2018-10-19 | 武汉华工图像技术开发有限公司 | It is a kind of accurately to wash optical anti-counterfeiting film of aluminium and preparation method thereof |
| CN108682284B (en) * | 2018-05-24 | 2021-02-09 | 武汉华工图像技术开发有限公司 | Optical anti-counterfeiting film for accurately washing aluminum and preparation method thereof |
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| CN112572017A (en) * | 2019-09-29 | 2021-03-30 | 中钞特种防伪科技有限公司 | Optical anti-counterfeiting element capable of being observed from two sides |
| CN112572017B (en) * | 2019-09-29 | 2022-05-20 | 中钞特种防伪科技有限公司 | Optical anti-fake element capable of being observed from two sides |
| WO2022170879A1 (en) * | 2021-02-10 | 2022-08-18 | 中钞特种防伪科技有限公司 | Anti-counterfeiting element and manufacturing method therefor, and anti-counterfeiting product |
| CN114654917A (en) * | 2022-03-02 | 2022-06-24 | 武汉华工图像技术开发有限公司 | Holographic multicolor optically variable anti-counterfeiting film, preparation method thereof and anti-counterfeiting product |
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Address after: 100070 No. 6 Spark Road, Science City, Beijing, Fengtai District Patentee after: ZHONGCHAO SPECIAL SECURITY TECHNOLOGY Co.,Ltd. Patentee after: China Banknote Printing and Minting Group Co.,Ltd. Address before: 100070 No. 6 Spark Road, Science City, Beijing, Fengtai District Patentee before: ZHONGCHAO SPECIAL SECURITY TECHNOLOGY Co.,Ltd. Patentee before: CHINA BANKNOTE PRINTING AND MINTING Corp. |