CN104647935B - Optical anti-counterfeit element and manufacture method thereof - Google Patents
Optical anti-counterfeit element and manufacture method thereof Download PDFInfo
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Abstract
The invention discloses a kind of optical anti-counterfeit element and manufacture method thereof, the method includes: form the first fluctuating structure sheaf on supporting layer, and this first fluctuating structure sheaf includes the region with the first micro structure；The region with the first micro structure of described first fluctuating structure sheaf forms the first reflecting layer；Forming the second relief fabric layer on described first reflecting layer or on the opposite side of described supporting layer, this second relief fabric layer includes that the region with the second micro structure has the flat site not having relief fabric beyond the second microstructure area with this；And form the second reflecting layer on described second relief fabric layer.
Description
Technical field
The present invention relates to a kind of optical anti-counterfeit element and manufacture method thereof.
Background technology
In order to prevent the forgery utilizing the means such as scanning and duplicating to produce, all kinds of height such as banknote, marketable securities
Safety or high added value leaflet are widely used Techniques of Optical Security, and achieve extraordinary effect
Really.Techniques of Optical Security is typically by Security element conducts such as the safety line of film like, label or wide bars
Carrier, it is achieved false proof purpose.
In order to increase brightness, the anti-counterfeiting image on optical anti-counterfeit element typically uses metallic reflector.To this
Metallic reflector carries out local and removes, thus forms specific pierced pattern during translumination observation, it is possible to significantly
Improve the visual effect of optical anti-counterfeit element and anti-forgery ability.The coat of metal is carried out the technology one of hollow out
As have two kinds, i.e. washing go metal and alkali cleaning to remove metal.It is in the position needing hollow out that smithcraft is gone in washing
Put first coating washing glue-line, then evaporation metal coating, then through moistening, washing so that washing glue-line
Soluble in water, the coat of metal that washing glue-line covers is peeled off the most therewith, reaches the purpose of hollow out.Alkali cleaning
Smithcraft is gone to utilize alkali liquor that the chemical attack effect of aluminium lamination reaches the purpose of hollow out, i.e. first evaporation metal
Coating, then need not the position coat protective layer of hollow out, is then immersed in alkali liquor and is not protected to erode
The coat of metal that sheath covers, thus form hollow picture and text.
Sometimes, for improving antifalse effect, the Security element in high safety or high added value leaflet exists
The both sides of leaflet are respectively provided with visual part, wide bar as false proof in the form on the banknote of some country or
Double window safety line.At this moment, if the different images of Security element both sides is respectively provided with hollow out effect, especially
When the profile of its hollow out image is fully aligned, then can improve the visual effect of optical anti-counterfeit element further
And anti-counterfeit capability.
Summary of the invention
It is an object of the invention to provide a kind of visual effect that can improve optical anti-counterfeit element and false proof energy
The optical anti-counterfeit element of power and manufacture method thereof.
To achieve these goals, one aspect of the present invention provides a kind of optical anti-counterfeit element, and this is false proof
Element includes: supporting layer；The the first fluctuating structure sheaf being positioned on described supporting layer, this first relief fabric
Layer includes the region with the first micro structure；Be positioned at described first fluctuating structure sheaf has the first micro structure
Region on the first reflecting layer；It is positioned on described first reflecting layer and described first fluctuating structure sheaf
There is the second relief fabric layer on the region beyond the region of the first micro structure, this second relief fabric layer
Including corresponding with the region with the first micro structure of described first fluctuating structure sheaf, there is second micro-knot
The region of structure has the flat site not having relief fabric beyond the second microstructure area with this；And position
The second reflecting layer on described second relief fabric layer.
Another aspect of the present invention provides a kind of optical anti-counterfeit element, and this Security element includes: supporting layer；
The the first fluctuating structure sheaf being positioned on described supporting layer side, this first fluctuating structure sheaf includes having first
The region of micro structure；It is positioned at first on the region with the first micro structure of described first fluctuating structure sheaf
Reflecting layer；The the second relief fabric layer being positioned on described supporting layer opposite side, this second relief fabric layer bag
Include and corresponding with the region with the first micro structure of described first fluctuating structure sheaf there is the second micro structure
Region and this there is the flat site not having relief fabric beyond the second microstructure area；And be positioned at
The second reflecting layer on described second relief fabric layer.
The still another aspect of the present invention provides the manufacture method of a kind of optical anti-counterfeit element, and the method includes:
Forming the first fluctuating structure sheaf on supporting layer, this first fluctuating structure sheaf includes having the first micro structure
Region；The region with the first micro structure of described first fluctuating structure sheaf forms the first reflecting layer；
On described first reflecting layer and described first fluctuating structure sheaf the region with the first micro structure with
Forming the second relief fabric layer on outer region, this second relief fabric layer includes rising and falling with described first tying
The region with the second micro structure that the region with the first micro structure of structure layer is corresponding has second with this
The flat site not having relief fabric beyond microstructure area；And on described second relief fabric layer
Form the second reflecting layer.
Another aspect of the present invention provides the manufacture method of a kind of optical anti-counterfeit element, and the method includes:
Forming the first fluctuating structure sheaf on supporting layer side, this first fluctuating structure sheaf includes having the first micro structure
Region；The region with the first micro structure of described first fluctuating structure sheaf forms the first reflecting layer；
Forming the second relief fabric layer on described supporting layer opposite side, this second relief fabric layer includes with described
The region with the second micro structure that the region with the first micro structure of the first fluctuating structure sheaf is corresponding and
This has the flat site not having relief fabric beyond the second microstructure area；And at described second
The second reflecting layer is formed on volt structure sheaf.
Another aspect of the present invention provides the optical anti-counterfeit element manufactured according to above-mentioned manufacture method.
By technique scheme, visual effect and the anti-counterfeit capability of optical anti-counterfeit element can be improved
Optical anti-counterfeit element.
Other features and advantages of the present invention will be described in detail in detailed description of the invention part subsequently.
Accompanying drawing explanation
Accompanying drawing is used to provide a further understanding of the present invention, and constitutes the part of description, with
Detailed description below is used for explaining the present invention together, but is not intended that limitation of the present invention.?
In accompanying drawing:
Fig. 1 a illustrates the effect in unilateral observation of the optical anti-counterfeit element according to the embodiment of the present invention
Figure；
Fig. 1 b illustrates the effect that optical anti-counterfeit element according to the embodiment of the present invention is observed in the second side
Figure；
Fig. 2 is a kind of possible sectional view of the X-X line along the optical anti-counterfeit element shown in Fig. 1 a；
Fig. 3-Fig. 9 is that Security element manufacture method according to the embodiment of the present invention manufactures shown in Fig. 2
At the sectional view of different phase during optical anti-counterfeit element.
Detailed description of the invention
Below in conjunction with accompanying drawing, the detailed description of the invention of the present invention is described in detail.It should be appreciated that
Detailed description of the invention described herein is merely to illustrate and explains the present invention, is not limited to the present invention.
Certain layer mentioned when describing optical anti-counterfeit element structure herein be positioned at certain layer " on ", be not intended to
That in space is upper and lower, and refers to that certain layer is close to certain layer of processing." solidification " of radiation curing glue herein
The crosslinking degree referring to radiation curing glue is the highest or fully crosslinked, causes glue-line the most not
Can compression molding, it is the highest or entirely without crosslinking that " not solidifying " refers to the crosslinking degree of radiation curing glue,
Cause the glue-line can compression molding under corresponding conditions.
Fig. 1 a illustrates the effect in unilateral observation of the optical anti-counterfeit element according to the embodiment of the present invention
Figure.Fig. 1 b illustrates the effect that optical anti-counterfeit element according to the embodiment of the present invention is observed in the second side
Figure.Fig. 2 is a kind of possible sectional view of the X-X line along the optical element shown in Fig. 1 a.Such as figure
Shown in, in the first side it is observed that China ancient coins profile in holographic Flos Nelumbinis image, corresponding in Fig. 2
The first image m1 in a region, image peripheral is transparent void region, corresponding to the b in Fig. 2
Region.Observe from the second side, except it can be seen that the holographic Flos Nelumbinis of specular in China's ancient coins profile
Outside image, also see that equally with " OK " printed words of China's ancient coins periodic arrangement as profile, corresponding
The first image m2 in a region in Fig. 2.Such optical element have strong visual effect and
Powerful anti-counterfeit capability.It will be appreciated by those skilled in the art that the image shown in Fig. 1 a, Fig. 1 b is only
It is schematic, and unrestricted the scope of the present invention.
From structure, as in figure 2 it is shown, according to an embodiment of the invention, it is provided that Yi Zhongguang
Learning Security element, described optical anti-counterfeit element generally comprises supporting layer 1, and this supporting layer 1 is typically flexibility
, the first fluctuating structure sheaf 2, it has the micro structure of fluctuating at first area a, at second area b
There is no micro structure；It is positioned on the first fluctuating structure sheaf 2 the first reflecting layer 3 He corresponding to first area a
Protective layer 4, this first reflecting layer is that " similar shape covering " is on the first fluctuating structure sheaf 2；In the firstth district
Territory a the first reflecting layer 3 has the micro structure identical with the first fluctuating structure sheaf 2；Corresponding to first area
A has the micro structure of fluctuating and corresponds to the second relief fabric of the micro structure that second area b does not rise and fall
Layer 5, this second relief fabric layer can e.g. radiation curing glue-line 5, the second reflecting layer 6, this is second years old
Reflecting layer 6 is that similar shape covers on the second relief fabric layer 5, i.e. has and second at first area a
The micro structure that volt structure sheaf 5 is identical, does not has micro structure at second area b；And in the second reflecting layer 6
On protective layer or/and other functional coatings 7.First fluctuating structure sheaf 2 forms first at first area a
Image m1, the second relief fabric layer i.e. radiation curing glue-line 5 forms the first image m2 at first area a.
In the replaceable embodiment of the present invention, the first fluctuating structure sheaf 2 and the first reflecting layer 3(
One protective layer 4) may be located at the side of supporting layer 1, the second relief fabric layer 5 and the second reflecting layer 6
(the second protective layer 7) may be located at the opposite side of supporting layer 1.
Another embodiment of the invention provides the manufacturer that can manufacture above-mentioned optical anti-counterfeit element
Method.
Manufacture method manufacture figure according to the embodiment of the present invention is described in detail below in conjunction with Fig. 3 to Fig. 9
The manufacture process of the optical anti-counterfeit element shown in 2.The most for sake of convenience, artificial manufacture process is divided
It is two big processes, i.e. manufactures the optical anti-counterfeit element semi-finished product with the first hollow out image m1, with
And manufacture the optical anti-counterfeit element finished product that both sides have the different images (m1, m2) of same profile.The
The technique that one process is well known to those skilled in the art, the second process then embodies the core side of the present invention
Method.
1, manufacture has the optical anti-counterfeit element semi-finished product of the first hollow out image (m1)
The manufacture method of these optical anti-counterfeit element semi-finished product has a lot, and the structure of last molding is the most different.
Being in the purpose of explanation, the most classical most common one detailed herein, i.e. alkali cleaning print dealuminzation, its
Corresponding molding structure is as shown in Figure 3.
First the first fluctuating structure sheaf 2 can be formed in flexible support layers 1.Flexible support layers 1 has
Support the effect of whole Security element.Sometimes, flexible support layers also has protective effect concurrently.Flexible support layers
1 is selected generally from the thin-film material that resistance to physical and chemical performance is good and mechanical strength is high.As this film substrate, can
To use polyethylene terephthalate (PET) thin film, PEN (PEN)
The plastic sheetings, preferably PET material such as thin film and polypropylene (PP) thin film.
Bonding enhancement layer is typically contained, to strengthen flexible support layers and the first fluctuating knot in flexible support layers 1
The bonding of structure layer 2.
The micro structure of the first fluctuating structure sheaf 2 carries the optical information of the first image m1.Relief fabric
The degree of depth be positioned in the range of 20nm～1500nm, width is positioned in the range of 100nm～3000nm.
For the pattern of micro structure, can be sinusoidal grating structure, or blazed grating structure, or rectangle
Optical grating construction, or the combination of said structure.Certainly, this usually to select according to concrete anti-counterfeiting design
Select.The optical effect of the performance of the first fluctuating structure sheaf 2 can be that holography, schemochrome, optics are black etc..
First fluctuating structure sheaf 2 can be formed by mould pressing process by thermoplastic resin, is i.e. pre-coated with
Thermoplastic resin on supporting layer 1 is at the metal matrix through high temperature, and be heated softening transform, forms spy
Fixed relief fabric, cools down molding afterwards.First fluctuating structure sheaf 2 can also use radiation curing teemer
Skill is formed, and i.e. by being coated on by radiation curing resin on supporting layer 1, is pushed thereon by master,
The lonizing radiation such as irradiation ultraviolet radiation or electron beam on one side, make above-mentioned material solidify, the method then taking off master
Formed.Second method is suitable for manufacturing the relief fabric of bigger depth-to-width ratio.
After first fluctuating structure sheaf 2 is formed, it is deposited with reflector material with uniform area density thereon,
Form the first reflecting layer 3.First reflecting layer 3 is used for strengthening the micro structure of the first image m1 and reflects
The brightness of optical effect.First reflecting layer 3 can be single-layer metal coating, selected from aluminum, silver, copper,
Stannum, chromium, nickel, titanium or their alloy.Aluminum is with low cost, and brightness is high, the most preferably aluminum.
The amount of reflecting layer evaporation is with optical density (OD) as standard, and the optical density (OD) in reflecting layer should be greater than 1.5, less than 5,
Preferably greater than 2.0, less than 3.5.Such optical density (OD) combines material cost and reflectance.
Alternatively, the first reflecting layer 3 can also be multi-coated interference membrane structure.As such, it is possible to formed dry
Relate to optically variable effect, i.e. observe or under the light source irradiation of different angles in different angles, Security element tool
There are different colors or color background.Multi-coated interference film may is that (1) is by absorbed layer, low-refraction
Dielectric layer and specular layer stack gradually the coating of formation, wherein this specular layer and the first fluctuating structure sheaf 2 phase
Contact；(2) stacked gradually by high refractive index medium layer, low refractive index dielectric layer and high refractive index medium layer
The multi-medium-layer coating formed, wherein, this reflecting layer or absorbed layer contact with described relief fabric layer 2.
According to the embodiment of the present invention, high refractive index medium layer refers to refractive index and is more than or equal to 1.7
Dielectric layer, its material can be ZnS, TiN, TiO2、TiO、Ti2O3、Ti3O5、Ta2O5、Nb2O5、
CeO2、Bi2O3、Cr2O3、Fe2O3、HfO2, ZnO etc., low refractive index dielectric layer refers to refraction
The rate dielectric layer less than 1.7, its material can be MgF2、SiO2Deng.The material in reflecting layer can be
The metals such as Al, Cu, Ni, Cr, Ag, Fe, Sn, Au, Pt or its mixture and alloy, due to aluminum
With low cost and brightness is high, the most preferably aluminum.Absorbed layer material can be Cr, Ni, Cu, Co,
The metals such as Ti, V, W, Sn, Si, Ge or its mixture and alloy.
After being deposited with the first reflecting layer 3, in the region of image to be retained, (i.e. first area a's) is anti-
Penetrate on layer 3 chromatography as the protection glue of protective layer 4.The thickness of protection glue is generally higher than 100nm, is less than
2um.This protective layer 4 can protect the reflecting layer of first area a.
After printing protective layer 4, carrying out reflecting layer operation, will immerse at goods can be with reflecting layer
In the solution of reaction, after a period of time, reflecting layer corresponding for second area b is complete by solution corrosion, and
The reflecting layer of first area a is retained because of the protection of protective layer 4.This solution is selected generally from alkali liquor, this
Smithcraft is gone in i.e. alkali cleaning.So far there is the optical anti-counterfeit element semi-finished product manufacture of the first hollow out image m1
Complete.
The method going to reflecting layer except the alkali cleaning of above-mentioned employing, it is also possible to use washing to go reflecting layer technique, i.e.
Washing glue-line, then evaporation metal coating first it is coated with in the position needing hollow out, then through moistening, washing,
Making to wash glue-line soluble in water, the coat of metal that washing glue-line covers is peeled off the most therewith, reaches hollow out
Purpose.In the structure of the optical anti-counterfeit element semi-finished product so with the first hollow out image m1, reflection
Layer is exposed outside, and washes glue between the first fluctuating structure sheaf and reflecting layer.Can also use in recent years
Grow up is accurately positioned smithcraft, i.e. by the difference of the relief fabric of image reach retain or
Person removes the purpose in reflecting layer, such as patent application CN200680006666.1, CN201080026768.6,
And the technique that CN201310034614.7 etc. mentions.Here, we quote these patent application conducts
Reference.
2, the optical anti-counterfeit element finished product that both sides have the different images (m1, m2) of same profile is manufactured
First on the optical anti-counterfeit element semi-finished product with the first hollow out image m1, it is coated with radiation curing glue
Layer 5, can be coated with, it is also possible at flexible support layers 1 opposite side on the first reflecting layer 3/ protective layer 4
Coating, depending on product needed.Fig. 4 show on protective layer 4 coating.The radiation curing used
The basic characteristics of glue are that solvent is evaporated completely, it is possible to form the softening point dry film higher than room temperature.If do not carry out
During uv-exposure or when exposure dose is the lowest, glue-line is uncrosslinked or the degree of cross linking is the highest, at certain condition
Under (temperature is less than 200 degrees Celsius, and pressure is less than 6bar) can relief fabric needed for compression molding；
If after carrying out uv-exposure with certain intensity, the glue-line degree of cross linking is high or fully crosslinked, then at above-mentioned bar
Under part, (temperature is less than 200 degrees Celsius, and pressure is less than 6bar) can not compression molding.Realize above-mentioned performance
Radiation curing glue, its representative formula generally comprises initiator, prepolymer, solvent and other auxiliary agents.
Prepolymer is usually the acrylic resin that molecular weight is bigger, and molecular weight is generally higher than 20000.Representative formula
In typically do not contain monomer, this is because dry out solvent needs to form dry film so that rolling.The thickness of coating
Generally higher than 100nm is less than 3um.
After coated radiation curing glue-line 5, at the purple of the back side illuminaton some strength of radiation curing glue-line 5
Outer light or electron beam (as shown in " UV " in figure), as shown in Figure 5.Such first image m1's is anti-
Penetrate layer as mask so that and the radiation curing glue of first area a is unexposed or low dose exposure is not solid
Change, and the exposure of the radiation curing glue heavy dose of second area b or exposure solidify completely.
It follows that radiation curing glue-line 5 is molded, as shown in Figure 6.Radiation due to first area a
Solidification glue 5 is uncured, thus can be formed and mold out the second image m2, and the radiation of second area b
Solidification adhesive curing fails to mold formation image.So far, just obtain exactitude position the first image m1 and
Second image m2.
After radiation curing glue-line 5 is molded, at the front illuminated some strength of radiation curing glue-line 5
Ultraviolet light or electron beam so that the radiation curing adhesive curing of first area a, as shown in Figure 7.So,
Whole radiation curing glue-line 5 is solidified, and materialization patience is improved, and is conducive to next step construction and
The quality of finished product.
Further, for increasing the brightness of the second image m2, after mold pressing, need to be at radiation curing glue-line
The second transparent or semitransparent reflecting layer 6 it is deposited with, as shown in Figure 8 on 5.Transparent material is typically chosen
The inorganic compound bigger with organic coating refractive index difference, the most both can guarantee that second area b was
Bright, can ensure that again the second image m2 has higher brightness.Second reflecting layer 6 can be ZnS, TiN,
TiO2、TiO、Ti2O3、Ti3O5、Ta2O5、Nb2O5、CeO2、Bi2O3、Cr2O3、Fe2O3、HfO2、
The mixture of one or more in ZnO.Owing to zinc sulphide materials evaporation temperature is relatively low, and its folding
Rate of penetrating is higher, therefore the second preferred zinc sulfide in reflecting layer 6.Second reflecting layer 6 can also select translucent
Inorganic compound or as aluminum, silver, copper, stannum, chromium, nickel, titanium or their alloy constitute gold
Belonging to, preferably aluminum, the optical density (OD) of its coating is more than 1.0, less than 1.8.Such optical density (OD) both may be used
So that the second image m2 has higher reflectance, the second area of final Security element can be made again
B presents hollow out effect when fluoroscopic observation.
After being deposited with the second reflecting layer 6, coat protective layer/other function materials on the second reflecting layer 6
The bed of material 7, as shown in Figure 9.This coating can be monolayer, it is also possible to be multilamellar.Coating typically has guarantor
Protect effect, protection reflecting layer is not corroded by external environment, the most also has and bonds with other base materials
Effect, such as paper.
The optical anti-counterfeit element of the embodiment of the present invention may be produced that as label, wide bar or safety line, product
Application includes banknote, marketable securities, passport, tax reciept etc..
The preferred embodiment of the present invention is described in detail above in association with accompanying drawing, but, the present invention does not limit
Detail in above-mentioned embodiment, in the technology concept of the present invention, can be to the present invention
Technical scheme carry out multiple simple variant, these simple variant belong to protection scope of the present invention.
It is further to note that each the concrete technical characteristic described in above-mentioned detailed description of the invention,
In the case of reconcilable, can be combined by any suitable means.In order to avoid unnecessary
Repeating, various possible compound modes are illustrated by the present invention the most separately.
Additionally, combination in any can also be carried out between the various different embodiment of the present invention, as long as its
Without prejudice to the thought of the present invention, it should be considered as content disclosed in this invention equally.
Claims (22)
1. an optical anti-counterfeit element, it is characterised in that this Security element includes:
Supporting layer；
The the first fluctuating structure sheaf being positioned on described supporting layer, this first fluctuating structure sheaf includes having first
The region of micro structure；
It is positioned at the first reflecting layer on the region with the first micro structure of described first fluctuating structure sheaf；
Be positioned on described first reflecting layer and described first fluctuating structure sheaf there is the first micro structure
The second relief fabric layer on region beyond region, this second relief fabric layer includes and described the first
The region with the second micro structure that the region with the first micro structure of volt structure sheaf is corresponding has with this
The flat site not having relief fabric beyond second microstructure area；And
It is positioned at the second reflecting layer on described second relief fabric layer.
Security element the most according to claim 1, wherein this Security element also includes being positioned at described
The tool corresponding to described first fluctuating structure sheaf between first reflecting layer and described second relief fabric layer
There is first protective layer in the region of the first micro structure.
Security element the most according to claim 1, wherein, this Security element also includes:
It is positioned at the second protective layer on described second reflecting layer and/or functional coating.
Security element the most according to claim 1, wherein, described second relief fabric layer is spoke
Penetrate solidification glue-line.
5. an optical anti-counterfeit element, it is characterised in that this Security element includes:
Supporting layer；
The the first fluctuating structure sheaf being positioned on described supporting layer side, this first fluctuating structure sheaf includes having
The region of the first micro structure；
It is positioned at the first reflecting layer on the region with the first micro structure of described first fluctuating structure sheaf；
The the second relief fabric layer being positioned on described supporting layer opposite side, this second relief fabric layer include with
The district with the second micro structure that the region with the first micro structure of described first fluctuating structure sheaf is corresponding
Territory has the flat site not having relief fabric beyond the second microstructure area with this；And
It is positioned at the second reflecting layer on described second relief fabric layer.
Security element the most according to claim 5, wherein this Security element also includes being positioned at described
The first protective layer on first reflecting layer.
Security element the most according to claim 5, wherein, this Security element also includes:
It is positioned at the second protective layer on described second reflecting layer and/or functional coating.
Security element the most according to claim 5, wherein, described second relief fabric layer is spoke
Penetrate solidification glue-line.
9. a manufacture method for optical anti-counterfeit element, the method includes:
Forming the first fluctuating structure sheaf on supporting layer, this first fluctuating structure sheaf includes having first micro-knot
The region of structure；
The region with the first micro structure of described first fluctuating structure sheaf forms the first reflecting layer；
On described first reflecting layer and the district with the first micro structure of described first fluctuating structure sheaf
Forming the second relief fabric layer on region beyond territory, this second relief fabric layer includes and described the first
The region with the second micro structure that the region with the first micro structure of volt structure sheaf is corresponding has with this
The flat site not having relief fabric beyond second microstructure area；And
Described second relief fabric layer forms the second reflecting layer.
Method the most according to claim 9, the method also includes:
Before described first reflecting layer is formed the second relief fabric layer, first on described first reflecting layer
Form the first protective layer.
11. methods according to claim 9, the method also includes:
Described second reflecting layer forms the second protective layer.
12. methods according to claim 9, wherein, described supporting layer comprises bonding enhancement layer.
13. methods according to claim 10, wherein, at the tool of described first fluctuating structure sheaf
Have on the region of the first micro structure and form the first reflecting layer and include:
Described first fluctuating structure sheaf is deposited with reflector material to form a reflecting layer；And
Remove in this reflecting layer with the having beyond the first microstructure area of described first fluctuating structure sheaf
Part corresponding to region is to form the first reflecting layer.
14. methods according to claim 13, wherein, form the on described first reflecting layer
Two relief fabric layers include:
On described first reflecting layer and the district with the first micro structure of described first fluctuating structure sheaf
Radiation curing glue-line it is coated with on region beyond territory；
Back side illuminaton ultraviolet light or electron beam at described radiation curing glue-line；
Described radiation curing glue-line is molded, to form the region with the second micro structure；And
To front illuminated ultraviolet light or the electron beam of described radiation curing glue-line so that described in have second micro-
Structure regions curing.
15. 1 kinds of optical anti-counterfeiting units manufactured according to the method described in any one in claim 9-14
Part.
The manufacture method of 16. 1 kinds of optical anti-counterfeit elements, the method includes:
Forming the first fluctuating structure sheaf on supporting layer side, this first fluctuating structure sheaf includes having first
The region of micro structure；
The region with the first micro structure of described first fluctuating structure sheaf forms the first reflecting layer；
Described supporting layer opposite side is formed the second relief fabric layer, this second relief fabric layer include with
The district with the second micro structure that the region with the first micro structure of described first fluctuating structure sheaf is corresponding
Territory has the flat site not having relief fabric beyond the second microstructure area with this；And
Described second relief fabric layer forms the second reflecting layer.
17. methods according to claim 16, the method also includes:
Described first reflecting layer forms the first protective layer.
18. methods according to claim 16, the method also includes:
Described second reflecting layer forms the second protective layer.
19. methods according to claim 16, wherein, described supporting layer comprises bonding enhancement layer.
20. methods according to claim 17, wherein, at the tool of described first fluctuating structure sheaf
Have on the region of the first micro structure and form the first reflecting layer and include:
Described first fluctuating structure sheaf is deposited with reflector material to form a reflecting layer；And
Remove in this reflecting layer with the having beyond the first microstructure area of described first fluctuating structure sheaf
The part that region is corresponding.
21. methods according to claim 20, wherein, are formed on described supporting layer opposite side
Second relief fabric layer includes:
Described supporting layer opposite side is coated with radiation curing glue-line；
Back side illuminaton ultraviolet light or electron beam at described radiation curing glue-line；
Described radiation curing glue-line is molded, to form the region with the second micro structure；And
To front illuminated ultraviolet light or the electron beam of described radiation curing glue-line so that described in have second micro-
Structure regions curing.
22. 1 kinds of optical anti-counterfeiting units manufactured according to the method described in any one in claim 16-21
Part.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201310596788.2A CN104647935B (en) | 2013-11-22 | 2013-11-22 | Optical anti-counterfeit element and manufacture method thereof |
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| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201310596788.2A CN104647935B (en) | 2013-11-22 | 2013-11-22 | Optical anti-counterfeit element and manufacture method thereof |
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| Publication Number | Publication Date |
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| CN104647935A CN104647935A (en) | 2015-05-27 |
| CN104647935B true CN104647935B (en) | 2016-08-17 |
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Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN111098620A (en) * | 2018-10-29 | 2020-05-05 | 中钞特种防伪科技有限公司 | Optical anti-counterfeiting element, preparation method of optical anti-counterfeiting element and optical anti-counterfeiting product |
Families Citing this family (8)
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| DE102016014662A1 (en) * | 2016-12-09 | 2018-06-14 | Giesecke+Devrient Currency Technology Gmbh | value document |
| CN108790469B (en) * | 2017-04-27 | 2020-06-30 | 中钞特种防伪科技有限公司 | Optical anti-counterfeiting element and anti-counterfeiting product |
| CN109895526B (en) * | 2017-12-08 | 2021-06-22 | 中钞特种防伪科技有限公司 | Optical anti-counterfeiting element and manufacturing method thereof |
| CN108682284B (en) * | 2018-05-24 | 2021-02-09 | 武汉华工图像技术开发有限公司 | Optical anti-counterfeiting film for accurately washing aluminum and preparation method thereof |
| CN112014914A (en) * | 2019-05-30 | 2020-12-01 | 苏州迈塔光电科技有限公司 | Optical film |
| CN112572017B (en) * | 2019-09-29 | 2022-05-20 | 中钞特种防伪科技有限公司 | Optical anti-fake element capable of being observed from two sides |
| CN114905881B (en) * | 2021-02-10 | 2023-08-22 | 中钞特种防伪科技有限公司 | Security element, method for producing the same, and security product |
| CN114654917B (en) * | 2022-03-02 | 2023-03-24 | 武汉华工图像技术开发有限公司 | Holographic multicolor optically variable anti-counterfeiting film, preparation method thereof and anti-counterfeiting product |
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| CN104647935A (en) | 2015-05-27 |
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