CN111085491A - Subassembly is retrieved in splashproof - Google Patents
Subassembly is retrieved in splashproof Download PDFInfo
- Publication number
- CN111085491A CN111085491A CN201911381172.7A CN201911381172A CN111085491A CN 111085491 A CN111085491 A CN 111085491A CN 201911381172 A CN201911381172 A CN 201911381172A CN 111085491 A CN111085491 A CN 111085491A
- Authority
- CN
- China
- Prior art keywords
- recovery
- splash
- plate
- ring
- recycling
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Images
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B08—CLEANING
- B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
- B08B3/00—Cleaning by methods involving the use or presence of liquid or steam
- B08B3/02—Cleaning by the force of jets or sprays
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B08—CLEANING
- B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
- B08B13/00—Accessories or details of general applicability for machines or apparatus for cleaning
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67017—Apparatus for fluid treatment
- H01L21/67028—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like
- H01L21/6704—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for wet cleaning or washing
- H01L21/67051—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for wet cleaning or washing using mainly spraying means, e.g. nozzles
Landscapes
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Physical Vapour Deposition (AREA)
Abstract
The invention discloses a splash-proof recovery assembly, which comprises a plurality of lifting mechanisms, wherein the lifting end of each lifting mechanism is provided with a plurality of recovery rings, a splash guard is correspondingly arranged above each recovery ring, and a drainage channel is formed between every two adjacent splash guards; and the controller receives the cleaning instruction and controls the corresponding lifting mechanism to lift so as to enable the corresponding splash shield to be level with the cleaning disc. When the splash-proof recovery assembly is adopted, the controller receives a cleaning instruction, controls the corresponding lifting mechanism to adjust the corresponding splash-proof plate to be level with the cleaning disc, and recovers cleaning liquid into the corresponding recovery ring. The splash-proof recovery assembly can select the corresponding splash-proof plate and the recovery ring according to different cleaning liquids, so that cross contamination can be effectively prevented.
Description
Technical Field
The invention relates to the technical field of semiconductor processing, in particular to a splash-proof recycling assembly.
Background
The surface of the single wafer needs to be cleaned in order to effectively remove residues, micro-dust and dirt of the surface structure of the single wafer. At present, a single wafer is cleaned by using a semiconductor cleaning device, when the single wafer is cleaned, the single wafer is placed in a cavity of the semiconductor cleaning device, the single wafer is rapidly rotated, and the upper surface and the lower surface of the single wafer are cleaned by gas jet, however, when the gas jet is carried out, cleaning liquid such as acid, alkali, organic solution and the like or residual liquid carrying dirt is sputtered inside the cavity of the semiconductor cleaning device by shearing force of a rotating mechanism, and a relative position area of sputtering cannot be expected. Therefore, the cleaning of the single crystal wafer is liable to cause cross contamination.
Therefore, how to reduce the cross contamination during the cleaning of the single wafer is a problem to be solved by those skilled in the art.
Disclosure of Invention
In view of the above, the present invention provides an anti-splash recycling assembly for reducing cross contamination during cleaning a single wafer.
In order to achieve the purpose, the invention provides the following technical scheme:
a splash recovery assembly, comprising:
the lifting end of each lifting mechanism is provided with a plurality of recovery rings, a splash guard is correspondingly arranged above each recovery ring, and a drainage channel is formed between every two adjacent splash guards;
and the controller receives the cleaning instruction and controls the corresponding lifting mechanism to lift so as to enable the corresponding splash shield to be level with the cleaning disc.
In one embodiment of the present invention, the lifting mechanism includes a first lifting mechanism and a second lifting mechanism.
In one embodiment of the present invention, the lifting end of the first lifting mechanism is provided with a first recycling ring, a second recycling ring and a third recycling ring, wherein the third recycling ring is fixed on the lifting end of the first lifting mechanism, the second recycling ring is located in a recycling cavity of the third recycling ring, and the first recycling ring is fixed on the third recycling ring.
In one embodiment of the present invention, the first recycling loop comprises: the first recovery plate is used for being fixed on the third recovery ring, the splash guard extends from the first recovery plate to the direction close to the cleaning disc, and the first splash guard extends from the first recovery plate or the splash guard to the direction close to the cleaning disc.
In one embodiment of the present invention, a surface of the first splash plate is provided with a first isolation ring.
In one embodiment of the present invention, the third recycling ring includes a lifting lug, a third outer recycling plate, a third inner recycling plate and a third splash plate, wherein the lifting lug is fixed to the lifting end of the first lifting mechanism; the third outer layer recovery plate extends downwards along the axial direction from the lifting lug, the third inner layer recovery plate extends upwards along the axial direction from the third outer layer recovery plate, a recovery cavity is formed between the third outer layer recovery plate and the third outer layer recovery plate, and the third splash plate extends towards the direction close to the cleaning disc from the third inner layer recovery plate.
In one embodiment of the present invention, the second recovery ring includes a second recovery plate and a second splash shield, wherein the second recovery plate is provided with a first guide hole, the first guide hole extends along an axial direction, and the third inner layer recovery plate passes through the first guide hole and can slide in the first guide hole along the axial direction;
the second splash guard extends from the second recovery plate in the direction of the cleaning disc; and a first drainage channel is formed between the second splash guard and the first splash guard, and a second drainage channel is formed between the second splash guard and the third splash guard.
In one embodiment of the present invention, a surface of the second splash plate is provided with a second isolation ring.
In one embodiment of the invention, a first liquid spray conduit is embedded in the second splash guard, and a first nozzle communicated with the first liquid spray conduit is arranged on the upper surface of the second splash guard.
In one embodiment of the present invention, a third isolation ring is disposed on a surface of the third sputtering plate.
In one embodiment of the invention, a second liquid spraying conduit is embedded in the third splash plate, and a second nozzle communicated with the second liquid spraying conduit is arranged on the upper surface of the third splash plate.
In one embodiment of the present invention, the lifting end of the second lifting mechanism is provided with a housing, a fourth recovery ring, a fifth recovery ring and a sixth recovery ring, wherein the housing is fixed on the lifting end of the second lifting mechanism, the fourth recovery ring and the fifth recovery ring are fixed on the housing, and the sixth recovery ring is arranged on the fifth recovery ring.
In one embodiment of the present invention, the fourth recycling ring includes a fourth inner recycling plate, a fourth outer recycling plate, a fourth splash plate, and a fifth splash plate, the fourth splash plate extends from the fourth outer recycling plate to the direction of the cleaning tray, the fifth splash plate extends from the fourth inner recycling plate to the direction of the cleaning tray, a third drainage channel is formed between the fourth splash plate and the third splash plate, a fourth drainage channel is formed between the fourth splash plate and the fifth splash plate, and a recycling cavity is formed between the fourth inner recycling plate and the fourth outer recycling plate;
the fifth recycling ring comprises a fifth recycling plate extending axially from the fourth inner recycling plate, and a recycling cavity is formed between the fifth recycling plate and the fourth inner recycling plate.
In one embodiment of the present invention, a surface of the fourth splash plate is provided with a fourth isolation ring;
and a fifth isolation ring is arranged on the surface of the fifth splash guard.
In one embodiment of the invention, a third liquid spraying conduit is embedded in the fourth splash guard, and a third nozzle communicated with the third liquid spraying conduit is arranged on the upper surface of the third splash guard;
a fourth liquid spraying conduit is embedded in the fifth anti-splash plate, and a fourth nozzle communicated with the fourth liquid spraying conduit is arranged on the upper surface of the fifth anti-splash plate.
In one embodiment of the present invention, the sixth recycling ring includes a sixth outer recycling plate and a sixth inner recycling plate, the sixth inner recycling plate is fixed on the fifth recycling plate, and a recycling cavity is formed between the sixth outer recycling plate and the sixth inner recycling plate.
In one embodiment of the present invention, the recycling device further comprises a seventh recycling ring disposed at the bottom, the seventh recycling ring comprises a seventh outer recycling plate and a seventh inner recycling plate, the seventh outer recycling plate is sleeved on the sixth outer recycling plate, the seventh inner recycling plate extends from the seventh outer recycling plate in the radial direction, and an end surface of the first inner recycling plate forms a recycling cavity.
According to the technical scheme, when the splash-proof recovery assembly is adopted, the controller receives a cleaning instruction, controls the corresponding lifting mechanism to adjust the corresponding splash-proof plate to be level with the cleaning disc, and recovers cleaning liquid into the corresponding recovery ring. The splash-proof recovery assembly can select the corresponding splash-proof plate and the recovery ring according to different cleaning liquids, so that cross contamination can be effectively prevented.
Drawings
In order to more clearly illustrate the embodiments of the present invention or the technical solutions in the prior art, the drawings used in the description of the embodiments or the prior art will be briefly described below, it is obvious that the drawings in the following description are only some embodiments of the present invention, and for those skilled in the art, other drawings can be obtained according to the drawings without creative efforts.
Fig. 1 is a schematic front view of a splash recovery assembly according to the present invention;
fig. 2 is a schematic perspective view of a splash recovery assembly according to the present invention;
fig. 3 is a schematic perspective view of a splash recovery assembly according to the present invention;
FIG. 4 is a schematic cross-sectional view of a splash recovery assembly of the present invention;
fig. 5 and 6 are schematic cross-sectional views of the splash recovery assembly provided by the present invention in two states.
In the drawings, 100 is a lifting mechanism, 200 is a recovery ring, 201 is a first recovery ring, 202 is a second recovery ring, 203 is a third recovery ring, 204 is a fourth recovery ring, 205 is a fifth recovery ring, 206 is a sixth recovery ring, 207 is a seventh recovery ring, 2011 is a first recovery plate, 2012 is a splash guard, 2013 is a first splash guard, 2014 is a first isolation ring, 2021 is a second recovery plate, 2022 is a second splash guard, 2023 is a second isolation ring, 2024 is a first spray conduit, 2031 is a lifting lug, 2032 is a third outer layer recovery plate, 2033 is a third inner layer recovery plate, 2034 is a third splash guard, 2035 is a third isolation ring, 2036 is a second spray conduit, 2041 is a fourth outer layer recovery plate, 2042 is a fourth outer layer recovery plate, 2043 is a fifth splash guard, 2044 is a fifth spray guard, 2045 is a fourth isolation ring, 2046 is a fifth isolation ring, 2041 is a fifth outer layer recovery plate, 2042 is a fifth outer layer recovery plate, 2043 is a fifth spray guard, 2044 is a fifth recovery plate, and 2045 is a fifth recovery plate, 2062 is a sixth inner recovery plate.
Detailed Description
The core of the invention is to provide an anti-splash recovery assembly to reduce cross contamination during cleaning of a single wafer.
The embodiments described below do not limit the contents of the invention described in the claims. The entire contents of the configurations shown in the following embodiments are not limited to those required as solutions of the inventions described in the claims.
Referring to fig. 1 to 6, in an embodiment of the present invention, an anti-splash recycling assembly includes:
the lifting mechanism comprises a plurality of lifting mechanisms 100, a plurality of recovery rings 200 are arranged at the lifting end of each lifting mechanism 100, splash shields are correspondingly arranged above each recovery ring 200, and a drainage channel is formed between every two adjacent splash shields;
and the controller receives the cleaning instruction and controls the corresponding lifting mechanism to lift so as to enable the corresponding splash shield to be level with the cleaning disc.
When the splash-proof recovery assembly is adopted, the controller receives a cleaning instruction, controls the corresponding lifting mechanism to adjust the corresponding splash-proof plate to be level with the cleaning disc, and recovers cleaning liquid into the corresponding recovery ring 200. Due to the fact that the splash-proof recovery assembly can select the corresponding splash-proof plate and the recovery ring 200 according to different cleaning liquids, cross contamination can be effectively prevented.
There are at least two recovery rings 200 for each elevator mechanism, each recovery ring 200 being capable of recovering one type of cleaning fluid. And in the cleaning process, acid cleaning solution, alkaline cleaning solution or purified water is selected according to the type of an object to be cleaned. The corresponding lifting mechanism is lifted under the control of the controller to adjust the splash guard to be level with the cleaning disc so that the cleaning solution flows into the corresponding recovery ring 200 along the drainage channel, for example, when the cleaning solution is an acidic cleaning solution, the lifting mechanism is executed to enable the splash guard corresponding to the acidic cleaning solution to be level with the cleaning disc to be introduced into the recovery ring 200 for recovering the acidic cleaning solution under the action of the drainage channel; when the cleaning solution is alkaline cleaning solution, the lifting mechanism is executed to enable the splash guard corresponding to the alkaline cleaning solution to be kept level with the cleaning disc and to be led into the recovery ring 200 for recovering the alkaline cleaning solution under the action of the drainage channel; when the cleaning liquid is pure water, the lifting mechanism is executed to enable the splash guard corresponding to the pure water to be kept flat with the cleaning disc and to be led into the recovery ring 200 for recovering the pure water under the action of the drainage channel.
The controller is stored with cleaning instructions of the cleaning steps in advance, the type of the cleaning liquid applied in each cleaning step is used, when a certain step is executed, the controller calls the type of the cleaning liquid corresponding to the cleaning step in the cleaning instruction, and controls the corresponding lifting mechanism to operate. Or a cleaning instruction is input manually, and the controller calls the corresponding cleaning liquid type according to the cleaning instruction and controls the corresponding lifting mechanism to operate.
In one embodiment of the present invention, the lifting mechanism includes a first lifting mechanism and a second lifting mechanism. Of course, other numbers of lifting mechanisms are possible. For example, three, four, etc., and two lifting mechanisms are preferably considered in the invention for the sake of simplifying the structure.
In one embodiment of the present invention, the lifting end of the first lifting mechanism is provided with at least two recycling rings 200, for example, in the embodiment of the present invention, the lifting end of the first lifting mechanism is provided with a first recycling ring 201, a second recycling ring 202 and a third recycling ring 203, wherein the third recycling ring 203 is fixed on the lifting end of the first lifting mechanism, the second recycling ring 202 is located in a recycling cavity of the third recycling ring 203, and the first recycling ring 201 is fixed on the third recycling ring 203.
The first recovery ring 201, the second recovery ring 202 and the third recovery ring 203 are arranged layer by layer, wherein the third recovery ring 203 is located at the lowest layer, and the first recovery ring 201 is located at the uppermost layer. Wherein the second recovery ring 202 is directly fixed to the first recovery ring 201 or the third recovery ring 203, or other structures.
The first recycling ring 201 includes a first recycling plate 2011, a splash guard 2012 and a first splash guard 2013, wherein the first recycling plate 2011 is configured to be fixed to the third recycling ring 203, the splash guard 2012 extends from the first recycling plate 2011 to a direction close to the cleaning tray, and the first splash guard 2013 extends from the first recycling plate 2011 or the splash guard 2012 to a direction close to the cleaning tray. The first splash guard 2013 and the splash guard 2012 both have a splash guard function, and the first recovery plate 2011 has a two-layer room function, so that splashing of cleaning liquid is reduced.
The surface of the first splash plate 2013 is provided with a first isolation ring 2014. The first isolation ring 2014 is made of a material with high surface tension, so that the cleaning solution sputtered on the upper surface by rotation can be quickly separated from the surface of the first isolation ring 2014 due to the surface tension and then fall into the drainage channel.
The third recycling ring 203 comprises lifting lugs 2031, a third outer recycling plate 2032, a third inner recycling plate 2033 and a third splash plate 2034, wherein the lifting lugs 2031 are fixed with the lifting ends of the first lifting mechanism; the third outer recovery plate 2032 extends axially downward from the lifting lug 2031, the third inner recovery plate 2033 extends axially upward from the third outer recovery plate 2032, and a recovery cavity is formed between the third outer recovery plate 2032, and the third splash plate 2034 extends from the third inner recovery plate 2033 toward the direction close to the cleaning tray.
When the first lifting mechanism moves upward, the lifting end of the first lifting mechanism drives the lifting lug 2031 to move upward, so as to drive the third outer-layer recovery plate 2032, the third inner-layer recovery plate 2033 and the third splash plate 2034 to move upward; since the first recovery ring 201 is fixed to the third recovery ring 203, the first recovery ring 201 moves upward together with the third recovery ring 203; when the first lifting mechanism moves upward, the lifting end of the first lifting mechanism drives the lifting lug 2031 to descend, so as to drive the third outer-layer recovery plate 2032, the third inner-layer recovery plate 2033 and the third splash plate 2034 to move downward; since the first recovery ring 201 is fixed to the third recovery ring 203, the first recovery ring 201 moves downward together with the third recovery ring 203.
In one embodiment of the present invention, the second recycling ring 202 includes a second recycling plate 2021 and a second splash plate 2022, wherein the second recycling plate 2021 is provided with a first guiding hole, the first guiding hole extends along the axial direction, and the third inner recycling plate 2033 passes through the first guiding hole and can slide along the axial direction in the first guiding hole;
the second splash shield 2022 extends from the second recovery plate 2021 in the direction of the cleaning disk; a first drainage channel is formed between the second splash guard 2022 and the first splash guard 2013, and a second drainage channel is formed between the second splash guard 2022 and the third splash guard 2034.
The surface of the second splash plate 2022 is provided with a second isolation ring 2023. The second isolation ring 2023 is made of a material with high surface tension, so that the cleaning solution that is spun and sputtered onto the upper surface can be quickly separated from the surface of the second isolation ring 2023 due to the surface tension and then dropped into the second drainage channel.
For convenience of cleaning, the first liquid spray conduit 2024 is embedded inside the second splash guard 2022, and the first nozzle communicated with the first liquid spray conduit 2024 is arranged on the upper surface of the second splash guard 2022. The corresponding cleaning liquid enters the first nozzle through the first liquid spray conduit 2024 and is sprayed into the first drainage channel, and the cleaning liquid adhered to the lower surface of the first splash guard 2013 is washed into the first drainage channel and finally flows into the recovery cavity.
In one embodiment of the present invention, the surface of the third splash plate 2034 is provided with a third isolation ring 2035. The third isolation ring 2035 is made of a material with high surface tension, so that the cleaning solution that is spun onto the upper surface can quickly drop off the surface of the third isolation ring 2035 and then drop into the second drainage channel due to the surface tension.
In one embodiment of the present invention, the second liquid spray conduit 2036 is embedded inside the third splash plate 2034, and the upper surface of the third splash plate 2034 is provided with a second nozzle communicating with the second liquid spray conduit 2036. The corresponding cleaning liquid enters the second nozzle through the second liquid spray conduit 2036 and is sprayed into the second diversion channel, and washes the cleaning liquid adhered to the lower surface of the second splash guard 2022 into the second diversion channel, and finally flows into the recovery chamber.
The lifting end of the second lifting mechanism is provided with at least two recovery rings 200, for example, the lifting end of the second lifting mechanism is provided with a housing, a fourth recovery ring 204, a fifth recovery ring 205 and a sixth recovery ring 206 in the embodiment of the present invention, wherein the housing is fixed on the lifting end of the second lifting mechanism, the fourth recovery ring 204 and the fifth recovery ring 205 are fixed on the housing, and the sixth recovery ring 206 is arranged on the fifth recovery ring 205. The fourth recovery ring 204, the fifth recovery ring 205 and the sixth recovery ring 206 are arranged layer by layer or in the axial direction, wherein the fourth recovery ring 204 and the fifth recovery ring 205 are arranged in the axial direction, the fifth recovery ring 205 is located at the lowermost layer, and the sixth recovery ring 206 is located at the outermost layer. The second lifting mechanism drives the housing to move and drives the fourth recycling ring 204, the fifth recycling ring 205 and the sixth recycling ring 206 to move together.
The fourth recovery ring 204 and the fifth recovery ring 205 are of an integrated structure or a split structure, preferably, the fourth recovery ring 204 and the fifth recovery ring 205 are of an integrated structure, specifically, the fourth recovery ring 204 includes a fourth inner recovery plate 2042, a fourth outer recovery plate 2041, a fourth splash plate 2043 and a fifth splash plate 2044, the fourth splash plate 2043 extends from the fourth outer recovery plate 2041 to the direction of the cleaning disc, the fifth splash plate 2044 extends from the fourth inner recovery plate 2042 to the direction of the cleaning disc, a third drainage channel is formed between the fourth splash plate 2043 and the third splash plate 2034, a fourth drainage channel is formed between the fourth splash plate 2043 and the fifth splash plate 2044, and a recovery cavity is formed between the fourth inner recovery plate 2042 and the fourth outer recovery plate 2041;
the fifth recovery ring 205 includes a fifth recovery plate 2051 extending axially from the fourth inner recovery plate 2042, and a recovery cavity is formed between the fifth recovery plate 2051 and the fourth inner recovery plate 2042.
In one embodiment of the present invention, a surface of the fourth splash plate 2043 is provided with a fourth isolation ring 2045; a surface of the fifth splash plate 2044 is provided with a fifth isolation ring 2046. The fourth isolation ring 2045 and the fifth isolation ring 2046 are made of a material with high surface tension, so that the cleaning solution that is rotatably sputtered onto the surface can quickly separate from the surfaces of the fourth isolation ring 2045 and the fifth isolation ring 2046 due to the surface tension and then drop into the third drainage channel and the fourth drainage channel.
In one embodiment of the present invention, a third liquid spraying conduit is embedded in the fourth splash plate 2043, and a third nozzle communicated with the third liquid spraying conduit is arranged on the upper surface of the third splash plate 2034; a fourth liquid spraying conduit is embedded in the fifth anti-splash plate 2044, and a fourth nozzle communicated with the fourth liquid spraying conduit is arranged on the upper surface of the fifth anti-splash plate 2044. The corresponding cleaning liquid enters the third nozzle through the third liquid spray conduit, is sprayed into the third drainage channel, and washes the cleaning liquid adhered to the lower surface of the third splash plate 2034 into the third drainage channel, and finally flows into the recovery cavity. The corresponding cleaning solution enters the fourth nozzle through the fourth liquid spraying conduit, is sprayed into the fourth drainage channel, and washes the cleaning solution adhered to the lower surface of the fourth splash guard 2043 into the fourth drainage channel, and finally flows into the recovery cavity.
The sixth recovery ring 206 includes a sixth outer recovery plate 2061 and a sixth inner recovery plate 2062, the sixth inner recovery plate 2062 is fixed to the fifth recovery plate 2051, and a recovery cavity is formed between the sixth outer recovery plate 2061 and the sixth inner recovery plate 2062.
The recycling device further comprises a seventh recycling ring 207 arranged at the bottom, the seventh recycling ring 207 comprises a seventh outer recycling plate and a seventh inner recycling plate, the seventh outer recycling plate is sleeved on the sixth outer recycling plate 2061, the seventh inner recycling plate extends along the radial direction from the seventh outer recycling plate, and the end face of the first inner recycling plate forms a recycling cavity.
In the description of the present application, it should be noted that the terms "center", "upper", "lower", "left", "right", "vertical", "horizontal", "inner", "outer", and the like indicate orientations or positional relationships based on the orientations or positional relationships shown in the drawings, and are only for convenience of description and simplicity of description, and do not indicate or imply that the device or element being referred to must have a particular orientation, be constructed and operated in a particular orientation, and thus, should not be construed as limiting the present application. Furthermore, the terms "first," "second," and "third" are used for descriptive purposes only and are not to be construed as indicating or implying relative importance.
Unless expressly stated or limited otherwise, the terms "mounted," "connected," and "connected" are intended to be inclusive and mean, for example, that they may be fixedly connected, detachably connected, or integrally connected; can be mechanically or electrically connected; they may be connected directly or indirectly through intervening media, or they may be interconnected between two elements. The specific meaning of the above terms in the present application can be understood in a specific case by those of ordinary skill in the art.
The previous description of the disclosed embodiments is provided to enable any person skilled in the art to make or use the present invention. Various modifications to these embodiments will be readily apparent to those skilled in the art, and the generic principles defined herein may be applied to other embodiments without departing from the spirit or scope of the invention. Thus, the present invention is not intended to be limited to the embodiments shown herein but is to be accorded the widest scope consistent with the principles and novel features disclosed herein.
Claims (17)
1. An anti-splash recovery assembly, comprising:
the lifting end of each lifting mechanism is provided with a plurality of recovery rings, a splash guard is correspondingly arranged above each recovery ring, and a drainage channel is formed between every two adjacent splash guards;
and the controller receives the cleaning instruction and controls the corresponding lifting mechanism to lift so as to enable the corresponding splash shield to be level with the cleaning disc.
2. The anti-splash recovery assembly of claim 1, wherein the lift mechanism comprises a first lift mechanism and a second lift mechanism.
3. The splash guard recovery assembly of claim 2, wherein the lifting end of the first lifting mechanism is provided with a first recovery ring, a second recovery ring and a third recovery ring, wherein the third recovery ring is fixed to the lifting end of the first lifting mechanism, the second recovery ring is located in a recovery cavity of the third recovery ring, and the first recovery ring is fixed to the third recovery ring.
4. The anti-splash recovery assembly of claim 3, wherein the first recovery ring comprises: the first recovery plate is used for being fixed on the third recovery ring, the splash guard extends from the first recovery plate to the direction close to the cleaning disc, and the first splash guard extends from the first recovery plate or the splash guard to the direction close to the cleaning disc.
5. The anti-splash recovery assembly of claim 4, wherein the surface of the first anti-splash plate is provided with a first isolation collar.
6. The anti-splash recovery assembly of claim 4, wherein the third recovery ring comprises a lifting lug, a third outer recovery panel, a third inner recovery panel, and a third anti-splash panel, wherein the lifting lug is fixed to a lifting end of the first lifting mechanism; the third outer layer recovery plate extends downwards along the axial direction from the lifting lug, the third inner layer recovery plate extends upwards along the axial direction from the third outer layer recovery plate, a recovery cavity is formed between the third outer layer recovery plate and the third outer layer recovery plate, and the third splash plate extends towards the direction close to the cleaning disc from the third inner layer recovery plate.
7. The anti-splash recovery assembly of claim 6, wherein the second recovery ring comprises a second recovery plate and a second anti-splash plate, wherein the second recovery plate is provided with a first guide hole extending in an axial direction, and the third inner recovery plate passes through the first guide hole and is capable of sliding in the axial direction in the first guide hole;
the second splash guard extends from the second recovery plate in the direction of the cleaning disc; and a first drainage channel is formed between the second splash guard and the first splash guard, and a second drainage channel is formed between the second splash guard and the third splash guard.
8. The anti-splash recovery assembly of claim 7, wherein the surface of the second anti-splash plate is provided with a second isolation collar.
9. The anti-splash recovery assembly of claim 8, wherein the second anti-splash plate has a first spray conduit embedded therein, and wherein the second anti-splash plate has a first spray nozzle disposed on an upper surface thereof in communication with the first spray conduit.
10. The anti-splash recovery assembly of claim 9, wherein a surface of the third anti-splash panel is provided with a third isolation collar.
11. The anti-splash recovery assembly of claim 10, wherein the third splash plate has a second spray conduit embedded therein, and wherein the upper surface of the third splash plate has a second spray nozzle in communication with the second spray conduit.
12. The splash guard recovery assembly of claim 7, wherein the lift end of the second lift mechanism is provided with a housing, a fourth recovery ring, a fifth recovery ring, and a sixth recovery ring, wherein the housing is secured to the lift end of the second lift mechanism, the fourth and fifth recovery rings are secured to the housing, and the sixth recovery ring is disposed on the fifth recovery ring.
13. The anti-splash recovery assembly of claim 12, wherein the fourth recovery ring comprises a fourth inner recovery panel, a fourth outer recovery panel, a fourth splash shield, and a fifth splash shield, the fourth splash shield extending from the fourth outer recovery panel in a direction toward the wash plate, the fifth splash shield extending from the fourth inner recovery panel in a direction toward the wash plate, the fourth splash shield and the third splash shield forming a third drainage channel therebetween, the fourth splash shield and the fifth splash shield forming a fourth drainage channel therebetween, the fourth inner recovery panel and the fourth outer recovery panel forming a recovery cavity therebetween;
the fifth recycling ring comprises a fifth recycling plate extending axially from the fourth inner recycling plate, and a recycling cavity is formed between the fifth recycling plate and the fourth inner recycling plate.
14. The anti-splash recovery assembly of claim 13, wherein a surface of the fourth anti-splash plate is provided with a fourth isolation ring;
and a fifth isolation ring is arranged on the surface of the fifth splash guard.
15. The anti-splash recovery assembly of claim 13, wherein a third spray conduit is embedded within the fourth anti-splash plate, and wherein a third spray nozzle is provided on the upper surface of the third anti-splash plate in communication with the third spray conduit;
a fourth liquid spraying conduit is embedded in the fifth anti-splash plate, and a fourth nozzle communicated with the fourth liquid spraying conduit is arranged on the upper surface of the fifth anti-splash plate.
16. The anti-splash recovery assembly of claim 13, wherein the sixth recovery ring comprises a sixth outer recovery plate and a sixth inner recovery plate, the sixth inner recovery plate being secured to the fifth recovery plate, and a recovery cavity being formed between the sixth outer recovery plate and the sixth inner recovery plate.
17. The anti-splash recovery assembly of claim 16, further comprising a seventh recovery ring disposed at the bottom, the seventh recovery ring comprising a seventh outer recovery plate and a seventh inner recovery plate, the seventh outer recovery plate being nested over the sixth outer recovery plate and the seventh inner recovery plate extending radially from the seventh outer recovery plate, the end face of the first inner recovery plate forming a recovery cavity.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201911381172.7A CN111085491B (en) | 2019-12-27 | 2019-12-27 | Subassembly is retrieved in splashproof |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201911381172.7A CN111085491B (en) | 2019-12-27 | 2019-12-27 | Subassembly is retrieved in splashproof |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN111085491A true CN111085491A (en) | 2020-05-01 |
| CN111085491B CN111085491B (en) | 2021-12-03 |
Family
ID=70398138
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201911381172.7A Active CN111085491B (en) | 2019-12-27 | 2019-12-27 | Subassembly is retrieved in splashproof |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN111085491B (en) |
Cited By (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN111890218A (en) * | 2020-07-04 | 2020-11-06 | 刘永 | Chemical mechanical polishing splash guard capable of rotating and lifting |
| CN112736018A (en) * | 2020-12-30 | 2021-04-30 | 上海至纯洁净系统科技股份有限公司 | Single wafer cleaning system |
| CN112736019A (en) * | 2020-12-30 | 2021-04-30 | 上海至纯洁净系统科技股份有限公司 | Device for improving cleanliness of back of single wafer |
| CN112735988A (en) * | 2020-12-31 | 2021-04-30 | 至微半导体(上海)有限公司 | Composite cavity ultrashort stroke staggered control method for wafer cleaning equipment |
| CN112808670A (en) * | 2020-12-30 | 2021-05-18 | 上海至纯洁净系统科技股份有限公司 | Semiconductor cleaning equipment with self-cleaning function |
| CN113467199A (en) * | 2021-09-06 | 2021-10-01 | 宁波润华全芯微电子设备有限公司 | Device convenient to dismantle and capable of preventing wafer from being polluted by splashing liquid |
| CN117086009A (en) * | 2023-10-18 | 2023-11-21 | 山东鑫义食品科技股份有限公司 | Food cleaning device based on spray formula is washd |
Citations (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2003282516A (en) * | 2002-03-27 | 2003-10-03 | Dainippon Screen Mfg Co Ltd | Substrate treatment equipment |
| KR20090029408A (en) * | 2007-09-18 | 2009-03-23 | 세메스 주식회사 | Apparatus and method for treating substrate |
| KR20140112299A (en) * | 2013-03-13 | 2014-09-23 | 세메스 주식회사 | Apparatus for treating substrate |
| CN104078389A (en) * | 2013-03-29 | 2014-10-01 | 细美事有限公司 | Recycling unit, substrate treating apparatus and recycling method using the recycling unit |
| CN105225987A (en) * | 2014-06-30 | 2016-01-06 | 细美事有限公司 | For the treatment of the equipment of substrate |
| JP2016042517A (en) * | 2014-08-15 | 2016-03-31 | 株式会社Ｓｃｒｅｅｎホールディングス | Substrate processing device |
| CN107634015A (en) * | 2016-07-19 | 2018-01-26 | 株式会社斯库林集团 | Substrate board treatment and processing cup cleaning method |
-
2019
- 2019-12-27 CN CN201911381172.7A patent/CN111085491B/en active Active
Patent Citations (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2003282516A (en) * | 2002-03-27 | 2003-10-03 | Dainippon Screen Mfg Co Ltd | Substrate treatment equipment |
| KR20090029408A (en) * | 2007-09-18 | 2009-03-23 | 세메스 주식회사 | Apparatus and method for treating substrate |
| KR20140112299A (en) * | 2013-03-13 | 2014-09-23 | 세메스 주식회사 | Apparatus for treating substrate |
| CN104078389A (en) * | 2013-03-29 | 2014-10-01 | 细美事有限公司 | Recycling unit, substrate treating apparatus and recycling method using the recycling unit |
| CN105225987A (en) * | 2014-06-30 | 2016-01-06 | 细美事有限公司 | For the treatment of the equipment of substrate |
| JP2016042517A (en) * | 2014-08-15 | 2016-03-31 | 株式会社Ｓｃｒｅｅｎホールディングス | Substrate processing device |
| CN107634015A (en) * | 2016-07-19 | 2018-01-26 | 株式会社斯库林集团 | Substrate board treatment and processing cup cleaning method |
Cited By (11)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN111890218A (en) * | 2020-07-04 | 2020-11-06 | 刘永 | Chemical mechanical polishing splash guard capable of rotating and lifting |
| CN112736018A (en) * | 2020-12-30 | 2021-04-30 | 上海至纯洁净系统科技股份有限公司 | Single wafer cleaning system |
| CN112736019A (en) * | 2020-12-30 | 2021-04-30 | 上海至纯洁净系统科技股份有限公司 | Device for improving cleanliness of back of single wafer |
| CN112808670A (en) * | 2020-12-30 | 2021-05-18 | 上海至纯洁净系统科技股份有限公司 | Semiconductor cleaning equipment with self-cleaning function |
| CN112736018B (en) * | 2020-12-30 | 2023-03-14 | 上海至纯洁净系统科技股份有限公司 | Single wafer cleaning system |
| CN112735988A (en) * | 2020-12-31 | 2021-04-30 | 至微半导体(上海)有限公司 | Composite cavity ultrashort stroke staggered control method for wafer cleaning equipment |
| CN112735988B (en) * | 2020-12-31 | 2022-12-20 | 至微半导体(上海)有限公司 | Composite cavity ultrashort stroke staggered control method for wafer cleaning equipment |
| CN113467199A (en) * | 2021-09-06 | 2021-10-01 | 宁波润华全芯微电子设备有限公司 | Device convenient to dismantle and capable of preventing wafer from being polluted by splashing liquid |
| CN113467199B (en) * | 2021-09-06 | 2021-11-12 | 宁波润华全芯微电子设备有限公司 | Device convenient to dismantle and capable of preventing wafer from being polluted by splashing liquid |
| CN117086009A (en) * | 2023-10-18 | 2023-11-21 | 山东鑫义食品科技股份有限公司 | Food cleaning device based on spray formula is washd |
| CN117086009B (en) * | 2023-10-18 | 2024-03-15 | 山东鑫义食品科技股份有限公司 | Food cleaning device based on spray formula is washd |
Also Published As
| Publication number | Publication date |
|---|---|
| CN111085491B (en) | 2021-12-03 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| CN111085491B (en) | Subassembly is retrieved in splashproof | |
| CN111001606B (en) | Semiconductor cleaning equipment | |
| JP5844681B2 (en) | Substrate liquid processing apparatus and substrate liquid processing method | |
| TWI497628B (en) | Liquid treatment device, liquid treatment method, and computer readable memory medium stored with program | |
| KR101787197B1 (en) | Fluid process dealing device | |
| KR100979979B1 (en) | Liquid processing apparatus and liquid processing method | |
| US9768039B2 (en) | Substrate processing apparatus | |
| KR101592058B1 (en) | Liquid processing apparatus for substrate | |
| TWI396233B (en) | A rotation processing device and a rotation processing method | |
| JP4621038B2 (en) | Semiconductor wafer cleaning method and semiconductor wafer cleaning apparatus | |
| JP5242632B2 (en) | Substrate liquid processing equipment | |
| JP3837017B2 (en) | Substrate processing apparatus, substrate processing method, and substrate processing apparatus cleaning method | |
| KR101373325B1 (en) | Liquid processing apparatus for substrate | |
| JP6045840B2 (en) | Substrate processing equipment | |
| CN218101191U (en) | Wafer cleaning device | |
| JP6095750B2 (en) | Substrate liquid processing apparatus and substrate liquid processing method | |
| JP5390874B2 (en) | Substrate processing equipment | |
| JP4504859B2 (en) | Substrate processing equipment | |
| KR101121191B1 (en) | Apparatus for processing substrate | |
| CN112808670A (en) | Semiconductor cleaning equipment with self-cleaning function | |
| KR101280099B1 (en) | Single type cleaning apparatus for substrate | |
| KR20090131209A (en) | Single type cleaning apparatus for substrate | |
| KR101407389B1 (en) | Apparatus to clean substrate | |
| JP2018018854A (en) | Substrate processing apparatus | |
| KR20210027142A (en) | Coating apparatus |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| PB01 | Publication | ||
| PB01 | Publication | ||
| SE01 | Entry into force of request for substantive examination | ||
| SE01 | Entry into force of request for substantive examination | ||
| TA01 | Transfer of patent application right |
Effective date of registration: 20210621 Address after: No. 170 purple sea road, Minhang District, Shanghai Applicant after: PURE & CLEAN PROCESS SYSTEMS Co.,Ltd. Applicant after: ZHIWEI SEMICONDUCTOR (SHANGHAI) Co.,Ltd. Address before: No. 170 purple sea road, Minhang District, Shanghai Applicant before: PURE & CLEAN PROCESS SYSTEMS Co.,Ltd. |
|
| TA01 | Transfer of patent application right | ||
| GR01 | Patent grant | ||
| GR01 | Patent grant |