CN111041446A - Air supply device of aluminizing machine - Google Patents
Air supply device of aluminizing machine Download PDFInfo
- Publication number
- CN111041446A CN111041446A CN201911409952.8A CN201911409952A CN111041446A CN 111041446 A CN111041446 A CN 111041446A CN 201911409952 A CN201911409952 A CN 201911409952A CN 111041446 A CN111041446 A CN 111041446A
- Authority
- CN
- China
- Prior art keywords
- gas
- air
- air supply
- pipeline
- evaporation tank
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Images
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/56—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
- C23C14/562—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks for coating elongated substrates
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/14—Metallic material, boron or silicon
- C23C14/20—Metallic material, boron or silicon on organic substrates
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/24—Vacuum evaporation
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/58—After-treatment
- C23C14/5846—Reactive treatment
- C23C14/5853—Oxidation
Abstract
The invention discloses an air supply device of an aluminum plating machine, wherein the aluminum plating machine comprises an evaporation tank and an evaporation boat arranged in the evaporation tank, the air supply device comprises a shielding mechanism and an air supply mechanism, the shielding mechanism is slidably arranged at the top of the evaporation tank, the air supply mechanism comprises an air homogenizing assembly and an air supply assembly, the air homogenizing assembly is fixedly arranged at the top of the evaporation tank and is positioned above the shielding mechanism, the air supply assembly is fixedly arranged in the aluminum plating machine and is connected with the air homogenizing assembly, and the air supply assembly comprises an oxygen conveying part; the air supply mechanism is arranged at the top of the evaporation tank, and oxygen conveyed by the oxygen conveying part reacts with evaporated aluminum steam before deposition to form transparent oxide layers on the upper and lower surfaces of the aluminum layer, so that the barrier property of the aluminum-plated film and the bonding force between the aluminum-plated layer and the film can be improved.
Description
Technical Field
The invention relates to the technical field of aluminum plating equipment, in particular to an air supply device of an aluminum plating machine.
Background
The vacuum aluminizing film is formed by evaporating an aluminum layer with a certain thickness on the surfaces of PET, BOPP, CPP and PE to achieve a certain barrier property; after the existing aluminum plating machine is used for plating aluminum on a product, the bonding force between the aluminum plating layer of the product and a base material is poor, and the adhesive force of the aluminum layer can only reach 0.2N/15mm-0.5N/15mm for BOPP and CPP; when the aluminum-plated product is applied to flexible package compounding, the aluminum layer is transferred, and the barrier effect is reduced.
In the existing production mode, the problem of aluminum layer transfer is solved by adopting a mode of coating a base coat by a film, but the production cost is higher and the effect is not ideal enough.
It is seen that improvements and enhancements to the prior art are needed.
Disclosure of Invention
In view of the above-mentioned disadvantages of the prior art, an object of the present invention is to provide an air supply device for an aluminum plating machine, which can form transparent oxide layers on the upper and lower surfaces of an aluminum layer, thereby improving the barrier property of an aluminum plating film and the bonding force between the aluminum plating layer and the film.
In order to achieve the purpose, the invention adopts the following technical scheme:
the utility model provides an air supply unit of quick-witted aluminizing, the quick-witted of aluminizing includes the evaporation tank and sets up the evaporation boat in the evaporation tank, air supply unit is including sheltering from the mechanism and supplying air the mechanism, shelter from the mechanism slidable and set up in the top of evaporation tank, supply air the mechanism and include even gas subassembly and air feed subassembly, even gas subassembly sets firmly in the top of evaporation tank, and even gas subassembly is located the top of sheltering from the mechanism, the air feed subassembly sets firmly in the quick-witted of aluminizing, and the air feed subassembly is connected with even gas subassembly, the air feed subassembly includes the oxygen conveying part.
Among the air supply device of machine of aluminizing, the air feed subassembly still includes gas mixing portion, argon gas conveying part, first pipeline, second pipeline and third pipeline, oxygen conveying part passes through first pipeline and is connected with gas mixing portion, argon gas conveying part passes through the second pipeline and is connected with gas mixing portion, gas mixing portion passes through the third pipeline and is connected with even gas subassembly.
The aluminum plating machine comprises an aluminum plating machine body, and is characterized in that the air distributing assembly comprises a plurality of air distributing pieces which are uniformly arranged, each air distributing piece comprises an air outlet channel and a plurality of air outlet pipes, the air outlet pipes are uniformly arranged at the top of the air outlet channel, the air outlet channels are fixedly arranged at the top of the evaporation tank, and the air outlet channels are connected with the air mixing part through third pipelines.
In the air supply device of the aluminum plating machine, the shielding mechanism comprises a baffle plate, sliding grooves are fixedly arranged on two sides of the top of the evaporation groove, and the baffle plate is slidably arranged in the sliding grooves.
In the air supply device of the aluminum plating machine, a first gas flow controller is arranged on the first pipeline, a second gas flow controller is arranged on the second pipeline, and a third gas flow controller is arranged on the third pipeline.
Has the advantages that:
the invention provides a gas supply device of an aluminum plating machine, wherein a gas supply mechanism is arranged at the top of an evaporation tank, oxygen reacts with evaporated aluminum steam before deposition, a formed plating layer comprises an aluminum layer and oxide layers respectively positioned on the upper surface and the lower surface of the aluminum layer, and the plating layer structure can improve the barrier property of an aluminum plating film and the bonding force between the plating layer and the film; in addition, the decay period of the corona value of the coating is prolonged.
Drawings
FIG. 1 is a schematic structural view of an air supply device according to the present invention;
FIG. 2 is a schematic structural view of a gas uniformizing member provided by the present invention;
FIG. 3 is a schematic structural view of an evaporation tank provided by the present invention;
FIG. 4 is a schematic structural diagram of a plating layer provided by the present invention.
Description of the main element symbols: 11-aluminum layer, 12-oxide layer, 2-evaporation tank, 21-sliding tank, 22-evaporation boat, 3-main roller, 4-gas homogenizing piece, 41-gas outlet pipe, 42-gas outlet channel, 5-gas mixing part, 6-oxygen conveying part, 7-argon conveying part, 81-first pipeline, 82-second pipeline, 83-third pipeline, 91-first gas flow control valve, 92-second gas flow control valve, 93-third gas flow control valve.
Detailed Description
The present invention provides an air supply device of an aluminum plating machine, and in order to make the purpose, technical scheme and effect of the present invention clearer and clearer, the present invention is further described in detail below by referring to the attached drawings and embodiments. It should be understood that the specific embodiments described herein are merely illustrative of the invention and do not limit the scope of the invention.
In the description of the present invention, it is to be understood that the terms "top", "upper", and the like indicate orientations or positional relationships based on those shown in the drawings, which are merely for convenience in describing the present invention and simplifying the description, and thus, are not to be construed as limiting the present invention; furthermore, unless otherwise expressly stated or limited, the terms "mounted," "connected," and the like are to be construed broadly and to include the specific meanings of the terms in the context of the invention as set forth in the specification as understood by one of ordinary skill in the art.
Referring to fig. 1 to 3, the present invention provides an air supply device of an aluminum plating machine, the aluminum plating machine includes an evaporation tank 2 and an evaporation boat 22 disposed in the evaporation tank 2, the air supply device includes a shielding mechanism and an air supply mechanism, the shielding mechanism is slidably disposed at the top of the evaporation tank 2, the air supply mechanism includes an air homogenizing assembly and an air supply assembly, the air homogenizing assembly is fixedly disposed at the top of the evaporation tank 2, the air homogenizing assembly is located above the shielding mechanism, the air supply assembly is fixedly disposed in the aluminum plating machine, the air supply assembly is connected with the air homogenizing assembly, and the air supply assembly includes an oxygen delivery part 6; in this embodiment, the gas homogenizing assembly is fixedly arranged at the top of the evaporation tank 2 through a mounting plate.
Referring to fig. 1, in the actual use process, the evaporation tank 2 is disposed right below the main roller 3, the evaporation boat 22 in the evaporation tank 2 is used for heating and melting the aluminum wire, and the aluminum vapor is deposited on the surface of the film passing through the main roller 3; the top of the evaporation tank 2 is provided with an air feeding mechanism, the oxygen feeding part 6 feeds oxygen into the gas homogenizing assembly, the gas homogenizing assembly outputs oxygen, the oxygen reacts with evaporated aluminum vapor before deposition, so that the formed coating comprises an aluminum layer 11 and oxide layers 12 respectively positioned on the upper surface and the lower surface of the aluminum layer 11, the structure of the coating is shown in fig. 4, and the thickness of the oxide layers 12 is controlled within the range of 3-4 nanometers; the air supply device provided by the invention is adopted to carry out an aluminizing process on the film, so that the barrier property of the aluminized film and the bonding force between a plating layer and the film can be improved; in addition, the decay period of the corona value of the coating is prolonged.
Further, referring to fig. 1, the gas supply assembly further includes a gas mixing portion 5, an argon gas delivery portion 7, a first pipeline 81, a second pipeline 82 and a third pipeline 83, the oxygen gas delivery portion 6 is connected to the gas mixing portion 5 through the first pipeline 81, the argon gas delivery portion 7 is connected to the gas mixing portion 5 through the second pipeline 82, and the gas mixing portion 5 is connected to the gas homogenizing assembly through the third pipeline 83; because oxygen and vapor deposition aluminum steam can emit a large amount of heat when reacting, mix argon gas in the oxygen, be convenient for cool film, avoid the film damage.
Further, referring to fig. 2, the gas homogenizing assembly includes a plurality of gas homogenizing members 4 uniformly arranged, the gas homogenizing members 4 include gas outlet channels 41 and a plurality of gas outlet pipes 42, the plurality of gas outlet pipes 42 are uniformly arranged on the top of the gas outlet channels 41, the gas outlet channels 41 are fixedly arranged on the top of the evaporation tank 2, and the gas outlet channels 42 are connected with the gas mixing portion 5 through a third pipeline 83; the gas supply uniformity of the whole gas supply breadth is improved by adopting the gas homogenizing mode of a large gas outlet channel and a small gas outlet pipe, namely the contact effect of mixed gas and aluminum steam is improved, the structure of a formed coating is ensured, and the coating effect is improved.
Further, referring to fig. 3, the shielding mechanism includes a baffle, sliding grooves 21 are fixedly disposed on two sides of the top of the evaporation groove 2, and the baffle is slidably disposed in the sliding grooves 21; when the film coating work is carried out, the baffle is removed, and the air supply mechanism starts to supply air.
Further, referring to fig. 1, a first gas flow controller 91 is disposed on the first pipeline 81, a second gas flow controller 92 is disposed on the second pipeline 82, and a third gas flow controller 93 is disposed on the third pipeline 83; the first gas flow controller 91 is used for controlling the flow of oxygen entering the gas mixing part 5, the second gas flow controller 92 is used for controlling the flow of argon entering the gas mixing part 5, the first gas flow controller 91 is matched with the second gas flow controller 92 to adjust the mixing proportion of oxygen and oxygen, and when the mixing proportion of oxygen and argon is oxygen: argon gas 4: 1, the effect of the formed plating layer is best; the second gas flow controller 92 is used for controlling the flow of the mixed gas entering the gas outlet channel 41, in this embodiment, the flow control range of the mixed gas is 100slm to 500slm, and the mixed gas flow is controlled within this range, so that the mixing effect of the mixed gas and the aluminum vapor can be improved, and further the barrier performance of the coating film is improved.
The air supply device of the aluminum plating machine provided by the embodiment is used in the aluminum plating process of PET and CPP, and the product after aluminum plating is the embodiment; meanwhile, the PET and the CPP are aluminized by using the existing aluminizing machine, and the aluminized product is used as a comparative example; the thickness of the aluminum layer is detected according to GB/T15717-; the oxygen permeability is detected according to GB/T1038-; the moisture permeability is detected according to GB 1037-1988, and the moisture permeability represents the water vapor transmission capacity; the corona value of the aluminizer after being placed for 72 hours is detected by a corona pen; the detection method of the corona value to 40 dynes is as follows: placing the aluminum-plated film in an oven at 50 ℃ for continuous baking, and detecting the time required by the corona value of the plating layer to 40 dynes; the method for detecting the adhesion of the aluminum layer comprises the following steps: at the temperature of 105 ℃, taking an EAA film with the thickness of 100 microns and an aluminized layer of an aluminizer for heat sealing, and then taking a heat sealing sample film with the thickness of 15mm for testing on a tensile testing machine; the performance test results after the PET is aluminized are shown in Table 1, and the performance test results after the CPP is aluminized are shown in Table 2.
TABLE 1 test data for PET post-aluminizing correlation properties
TABLE 2 CPP test data for the properties after aluminizing
As can be seen from tables 1 and 2, compared with the prior art, the gas supply device of the aluminum plating machine provided in the embodiment is used for plating the PET and the CPP, so that the corona value attenuation period of the plating layer is prolonged, the adhesion of the plating layer is improved, the oxygen permeability and the moisture permeability of the plating layer are reduced, that is, the oxygen permeability and the water vapor permeability of the plating layer are reduced, and the barrier property of the plating layer is improved.
It should be understood that equivalents and modifications of the technical solution and inventive concept thereof may occur to those skilled in the art, and all such modifications and alterations should fall within the protective scope of the present invention.
Claims (5)
1. The utility model provides an air supply unit of quick-witted aluminizing, the quick-witted including the evaporation tank with set up the evaporation boat in the evaporation tank, its characterized in that, air supply unit is including sheltering from mechanism and air supply mechanism, shelter from the mechanism slidable and set up in the top of evaporation tank, air supply mechanism includes even gas subassembly and air feed subassembly, even gas subassembly sets firmly in the top of evaporation tank, and even gas subassembly is located the top of sheltering from the mechanism, the air feed subassembly sets firmly in the quick-witted of aluminizing, and the air feed subassembly is connected with even gas subassembly, the air feed subassembly includes oxygen conveying part.
2. An air supply device of an aluminum plating machine as recited in claim 1, wherein the air supply assembly further comprises a gas mixing portion, an argon gas conveying portion, a first pipeline, a second pipeline and a third pipeline, the oxygen gas conveying portion is connected with the gas mixing portion through the first pipeline, the argon gas conveying portion is connected with the gas mixing portion through the second pipeline, and the gas mixing portion is connected with the gas homogenizing assembly through the third pipeline.
3. An air supply device of an aluminum plating machine according to claim 2, wherein the air homogenizing assembly comprises a plurality of air homogenizing members uniformly arranged, the air homogenizing members comprise an air outlet channel and a plurality of air outlet pipes, the air outlet pipes are uniformly arranged at the top of the air outlet channel, the air outlet channel is fixedly arranged at the top of the evaporation tank, and the air outlet channel is connected with the air mixing part through a third pipeline.
4. An air supply device of an aluminum plating machine as recited in claim 1, wherein the shielding mechanism includes a baffle plate, sliding grooves are fixedly provided at both sides of the top of the evaporation groove, and the baffle plate is slidably provided in the sliding grooves.
5. An aluminum plating machine gas supply device as recited in claim 2, wherein the first pipeline is provided with a first gas flow controller, the second pipeline is provided with a second gas flow controller, and the third pipeline is provided with a third gas flow controller.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201911409952.8A CN111041446A (en) | 2019-12-31 | 2019-12-31 | Air supply device of aluminizing machine |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201911409952.8A CN111041446A (en) | 2019-12-31 | 2019-12-31 | Air supply device of aluminizing machine |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN111041446A true CN111041446A (en) | 2020-04-21 |
Family
ID=70242345
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201911409952.8A Pending CN111041446A (en) | 2019-12-31 | 2019-12-31 | Air supply device of aluminizing machine |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN111041446A (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN113481469A (en) * | 2021-06-04 | 2021-10-08 | 广东铭丰包装材料有限公司 | Even gas mechanism and aluminizing machine |
Citations (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN102766843A (en) * | 2011-05-05 | 2012-11-07 | 锣洋科技股份有限公司 | Method of forming a partial deposition layer and apparatus of forming a partial deposition layer |
| JP2015071807A (en) * | 2013-10-03 | 2015-04-16 | 尾池工業株式会社 | Manufacturing method of ornament vapor-deposited film |
| CN205501407U (en) * | 2016-01-19 | 2016-08-24 | 天津涂冠科技有限公司 | Air supply plant that vacuum ion coating used |
| GB2536252A (en) * | 2015-03-10 | 2016-09-14 | Bobst Manchester Ltd | Improved vacuum coater |
| CN107058955A (en) * | 2017-04-24 | 2017-08-18 | 无锡市司马特贸易有限公司 | Aluminum oxide vacuum coating equipment |
| CN206635399U (en) * | 2017-04-10 | 2017-11-14 | 天津市大阳光大新材料股份有限公司 | A kind of vacuum film that can improve adhesive force is aluminized device |
| CN109207926A (en) * | 2018-11-15 | 2019-01-15 | 永新股份（黄山）包装有限公司 | A kind of enhanced aluminizer and its production technology |
-
2019
- 2019-12-31 CN CN201911409952.8A patent/CN111041446A/en active Pending
Patent Citations (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN102766843A (en) * | 2011-05-05 | 2012-11-07 | 锣洋科技股份有限公司 | Method of forming a partial deposition layer and apparatus of forming a partial deposition layer |
| JP2015071807A (en) * | 2013-10-03 | 2015-04-16 | 尾池工業株式会社 | Manufacturing method of ornament vapor-deposited film |
| GB2536252A (en) * | 2015-03-10 | 2016-09-14 | Bobst Manchester Ltd | Improved vacuum coater |
| CN205501407U (en) * | 2016-01-19 | 2016-08-24 | 天津涂冠科技有限公司 | Air supply plant that vacuum ion coating used |
| CN206635399U (en) * | 2017-04-10 | 2017-11-14 | 天津市大阳光大新材料股份有限公司 | A kind of vacuum film that can improve adhesive force is aluminized device |
| CN107058955A (en) * | 2017-04-24 | 2017-08-18 | 无锡市司马特贸易有限公司 | Aluminum oxide vacuum coating equipment |
| CN109207926A (en) * | 2018-11-15 | 2019-01-15 | 永新股份（黄山）包装有限公司 | A kind of enhanced aluminizer and its production technology |
Non-Patent Citations (1)
| Title |
|---|
| 金懋昌: "《真空技术》", 31 May 1995, 东南大学出版社 * |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN113481469A (en) * | 2021-06-04 | 2021-10-08 | 广东铭丰包装材料有限公司 | Even gas mechanism and aluminizing machine |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| US8142521B2 (en) | Large scale MOCVD system for thin film photovoltaic devices | |
| CN105925960B (en) | A kind of atomic layer deposition vacuum coater for solar battery sheet production | |
| TW201107503A (en) | Web substrate deposition system | |
| CN111041446A (en) | Air supply device of aluminizing machine | |
| TW201315825A (en) | Evaporation apparatus and method of forminf organic film | |
| WO2007072855A1 (en) | Apparatus for manufacturing semiconductor thin film | |
| TW201201305A (en) | Apparatus for processing substrate | |
| TW201105817A (en) | Roll-to-roll chemical vapor deposition system | |
| TWI564427B (en) | Method for forming parylene film | |
| CN106011798A (en) | Graphene thin film coating device and method based on PECVD | |
| US10053765B2 (en) | Apparatus and method for coating with solid-state powder | |
| KR20170026531A (en) | Device and method for generating vapor for a cvd- or pvd device from multiple liquid or solid source materials | |
| CN109898066B (en) | Apparatus and method for processing long substrate | |
| EP2062996A3 (en) | Metalorganic chemical vapor deposition reactor | |
| CN105378136B (en) | Vaporising device with gas supply | |
| CN103184434B (en) | Pallet apparatus, pallet and semiconductor processing equipment | |
| CN113862643A (en) | Atomic layer deposition device and flow uniformizing mechanism thereof | |
| JP2013163846A (en) | Film deposition apparatus and film deposition method | |
| CN105803425B (en) | The reaction pedestal of metal organic chemical compound vapor deposition reaction unit | |
| CN107058955A (en) | Aluminum oxide vacuum coating equipment | |
| CN205774792U (en) | A kind of ald vacuum coater produced for solar battery sheet | |
| CN204125524U (en) | A kind of coevaporation system depositing multicomponent membrane material | |
| CN206721353U (en) | Aluminum oxide vacuum coating equipment | |
| CN210657127U (en) | Gas distribution device of chemical vapor deposition coating equipment | |
| CN202116646U (en) | Multi-channel independent gas-supply plasma enhanced chemical vapor deposition (PECVD) gas supply deposition system |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| PB01 | Publication | ||
| PB01 | Publication | ||
| SE01 | Entry into force of request for substantive examination | ||
| SE01 | Entry into force of request for substantive examination | ||
| RJ01 | Rejection of invention patent application after publication | ||
| RJ01 | Rejection of invention patent application after publication |
Application publication date: 20200421 |