CN111025617A - Laser microscope objective - Google Patents
Laser microscope objective Download PDFInfo
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- CN111025617A CN111025617A CN201911348961.0A CN201911348961A CN111025617A CN 111025617 A CN111025617 A CN 111025617A CN 201911348961 A CN201911348961 A CN 201911348961A CN 111025617 A CN111025617 A CN 111025617A
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- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B21/00—Microscopes
- G02B21/02—Objectives
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- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B15/00—Optical objectives with means for varying the magnification
- G02B15/14—Optical objectives with means for varying the magnification by axial movement of one or more lenses or groups of lenses relative to the image plane for continuously varying the equivalent focal length of the objective
- G02B15/16—Optical objectives with means for varying the magnification by axial movement of one or more lenses or groups of lenses relative to the image plane for continuously varying the equivalent focal length of the objective with interdependent non-linearly related movements between one lens or lens group, and another lens or lens group
- G02B15/163—Optical objectives with means for varying the magnification by axial movement of one or more lenses or groups of lenses relative to the image plane for continuously varying the equivalent focal length of the objective with interdependent non-linearly related movements between one lens or lens group, and another lens or lens group having a first movable lens or lens group and a second movable lens or lens group, both in front of a fixed lens or lens group
- G02B15/167—Optical objectives with means for varying the magnification by axial movement of one or more lenses or groups of lenses relative to the image plane for continuously varying the equivalent focal length of the objective with interdependent non-linearly related movements between one lens or lens group, and another lens or lens group having a first movable lens or lens group and a second movable lens or lens group, both in front of a fixed lens or lens group having an additional fixed front lens or group of lenses
- G02B15/173—Optical objectives with means for varying the magnification by axial movement of one or more lenses or groups of lenses relative to the image plane for continuously varying the equivalent focal length of the objective with interdependent non-linearly related movements between one lens or lens group, and another lens or lens group having a first movable lens or lens group and a second movable lens or lens group, both in front of a fixed lens or lens group having an additional fixed front lens or group of lenses arranged +-+
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- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B21/00—Microscopes
- G02B21/02—Objectives
- G02B21/025—Objectives with variable magnification
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- Optics & Photonics (AREA)
- Chemical & Material Sciences (AREA)
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- Microscoopes, Condenser (AREA)
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Abstract
The invention discloses a laser microscope objective, belongs to the technical field of optical lenses, and can solve the problem that the requirement of a customer on a large-area holographic product cannot be met due to the fact that the existing laser microscope objective is large in focal length. The laser microscope objective comprises a first positive lens group, a second negative lens group and a third positive lens group which are sequentially arranged along the laser incidence direction, and the focal length f of the third positive lens group3Satisfies the condition of f is not less than 2.5mm3Less than or equal to 4.0 mm. According to the invention, the three lens groups are arranged, and the focal length of the third lens group is within the range of 2.5mm-4.0mm, so that the focal length of the laser microscope objective is reduced, and the requirements of customers on large-area holographic products can be met.
Description
Technical Field
The invention relates to the technical field of optical lenses, in particular to a laser microscope objective.
Background
In a holographic lithography system, pinhole filtering and spatial beam expansion of laser light are required to obtain a large-area uniform coherent light field. As shown in fig. 1, a laser microscope objective is used to focus laser, a pinhole is used to spatially filter the laser, and a collimator lens is used to collimate the laser to achieve spatial beam expansion.
To increase the area of the coherent light field in a holographic lithography system, this can be achieved by increasing the focal length of the collimator lens or by decreasing the focal length of the microscope objective. In actual work, the cost of the collimating lens with a large focal length is very high, and the replacement of the collimating lens needs to readjust the position of the collimating lens and readjust the whole holographic lithography system, which is very troublesome. The most common way today is to replace the laser microscope objective with a smaller focal length.
At present, domestic laser microscope objectives are very few, and only products with focal lengths of more than 10mm are available. Internationally, the laser microscope objective lens from the company of japan horse adam (Sigma) has a minimum focal length of 4mm, the laser microscope objective lens from the company of japan NIKON (NIKON) also has a minimum focal length of 4mm, and the company of american physical wave (NEWPORT) has a product with a minimum focal length of 3.41mm, and they are very expensive. However, even this does not satisfy the customer's demand for larger area holographic products.
Disclosure of Invention
In view of this, the present invention provides a laser microscope objective, which can solve the problem that the existing laser microscope objective has a large focal length and cannot meet the requirement of a customer on a large-area holographic product.
In order to achieve the purpose, the invention provides the following technical scheme:
the laser microscope objective lens comprises a first positive lens group, a second negative lens group and a third positive lens group which are sequentially arranged along the laser incidence direction, wherein the focal length f of the third positive lens group3The following conditions are satisfied:
2.5mm≤f3≤4.0mm。
as a still further scheme of the invention: the first positive lens group includes at least one positive lensFocal length f of the first positive lens group1The following conditions are satisfied:
6mm≤f1≤13mm。
as a still further scheme of the invention: the second negative lens group comprises at least one negative lens, and the focal length f of the second negative lens group2The following conditions are satisfied:
-15mm≤f2≤-9mm。
as a still further scheme of the invention: the third positive lens group comprises a positive lens O3 and a positive lens O4, and the focal length f of the positive lens O3o3Focal length f of positive lens O4o4The following conditions are respectively satisfied:
6mm≤fo3≤9mm;
5mm≤fo4≤7mm。
as a still further scheme of the invention: the total optical length TTHI of the microscope objective meets the following conditions:
7mm≤TTHI≤10mm。
as a still further scheme of the invention: the optical back focal length BFL of the microobjective meets the following conditions:
2mm≤BFL≤3mm。
as a still further scheme of the invention: the first positive lens group, the second negative lens group and the third positive lens group are made of quartz glass.
As a still further scheme of the invention: the first positive lens group includes one convex lens.
As a still further scheme of the invention: the second negative lens group includes a concave lens.
The beneficial effects of the invention include but are not limited to:
(1) the invention provides a laser microscope objective lens, which comprises a first positive lens group, a second negative lens group and a third positive lens group which are arranged in sequence along the incidence direction of laser, wherein the focal length f of the third positive lens group3Satisfies the condition of f is not less than 2.5mm3Less than or equal to 4.0 mm. The invention leads the focus of the laser microscope objective lens to be in the range of 2.5mm-4.0mm by arranging three lens groups and the focal length of the third lens groupThe distance is reduced, and the requirement of a customer on a large-area holographic product can be met.
(2) The invention further reduces the focal length of the laser microscope objective lens by further limiting the focal length ranges of the second lens group and the third lens group; furthermore, the optical back focal length of the invention is 2mm-3mm, the light transmission diameter is 2.0mm, and 250 times of light beam amplification and spatial filtering can be realized by matching with a collimating lens of 800mm and a pinhole of 5 mu m.
(3) The laser microscope objective provided by the invention is suitable for laser beam with the diameter less than or equal to 2mm and laser wavelength: 325.0 nm-441.6 nm, laser power: a holographic lithography system with the weight less than or equal to 1.0 w. Compared with the prior art, the holographic laser beam expander can realize larger holographic working area, can expand the laser beam with the beam waist of 0.7mm into the laser beam with the beam waist of 175mm, and the diameter of the expanded beam from the strongest center to the power reduction range of 10% is larger than 80 mm. In addition, the image quality of the laser microscope objective lens is close to the diffraction limit, and the image quality is high.
Drawings
FIG. 1 is a diagram of a laser beam expansion and pinhole filtering system for holographic lithography;
FIG. 2 is an optical system diagram of a laser microscope objective lens provided in embodiment 1 of the present invention;
FIG. 3 is a diagram showing an optical transfer function of a laser microscope objective lens provided in example 1 of the present invention;
FIG. 4 is a wavefront aberration diagram of a laser microscope objective lens provided in example 1 of the present invention;
fig. 5 is a light intensity distribution diagram of a laser microscope objective lens provided in embodiment 1 of the present invention, where 5(a) shows a light intensity distribution of an initial gaussian light beam, 5(b) shows a light intensity distribution of a light beam at a focal point after the light beam is focused by the microscope objective lens, and 5(c) shows a light intensity distribution of a light beam after the light beam passes through a collimator objective lens;
in the figure, 1-laser focusing objective; 2-pinhole; 3-denotes a collimator objective.
Detailed Description
The present invention will be described in detail with reference to examples, but the present invention is not limited to these examples.
The invention provides a laser microscope objective, comprisingA first positive lens group, a second negative lens group and a third positive lens group arranged in sequence along the incidence direction of the laser, and the focal length f of the third positive lens group3The following conditions are satisfied:
2.5mm≤f3≤4.0mm。
further, the first positive lens group comprises at least one positive lens, and the focal length f of the first positive lens group1The following conditions are satisfied:
6mm≤f1≤13mm。
further, the first positive lens group includes a convex lens.
Further, the second negative lens group comprises at least one negative lens, and the focal length f of the second negative lens group2The following conditions are satisfied:
-15mm≤f2≤-9mm。
further, the second negative lens group includes a concave lens.
Further, the third positive lens group includes a positive lens O3 and a positive lens O4, the positive lens O3 and the positive lens O4 are both convex lenses, and the focal length f of the positive lens O3o3Focal length f of positive lens O4o4The following conditions are respectively satisfied:
6mm≤fo3≤9mm;
5mm≤fo4≤7mm。
further, the total optical length TTHI of the microscope objective satisfies the following condition:
7mm≤TTHI≤10mm。
further, the optical back focal length BFL of the microscope objective satisfies the following condition:
2mm≤BFL≤3mm。
further, the materials of the first positive lens group, the second negative lens group and the third positive lens group are quartz glass.
Specifically, the performance of the microscope objective determines the focusing effect of the laser, and further determines the performance of spatial filtering and beam expanding. It is often required that the imaging performance of such objectives needs to be diffraction limited to achieve the best focusing performance. Because the invention is applied to an ultraviolet laser system, the transmittance of a common glass material is reduced after the common glass material is subjected to ultraviolet radiation, and the power density of laser is very high, the optical system needs to adopt a quartz glass material which is resistant to radiation and laser damage, and can be Corning7980KrF, Corning7980 ArF or Corning8655 ArF. The refractive indices and dispersion coefficients of these three grades of materials are the same, but they have different radioresistant ions added to them.
The invention provides a laser microscope objective lens, which comprises a first positive lens group, a second negative lens group and a third positive lens group which are arranged in sequence along the incidence direction of laser, wherein the focal length f of the third positive lens group3Satisfies the condition of f is not less than 2.5mm3Less than or equal to 4.0 mm. According to the invention, the three lens groups are arranged, and the focal length of the third lens group is within the range of 2.5mm-4.0mm, so that the focal length of the laser microscope objective is reduced, and the requirements of customers on large-area holographic products can be met.
Example 1:
as shown in fig. 2, the first positive lens group in this embodiment includes one positive lens O1, the second negative lens group includes one negative lens O2, and the third positive lens group includes a positive lens O3 and a positive lens O4. All the lenses are made of radiation-resistant and laser damage-resistant quartz glass, and the model is Corning7980 KrF. The positive lens O1 is a convex lens with a focal length fO18.90 mm; the negative lens O2 is a concave lens with focal length fO2-12.02 mm; the positive lens O3 is a convex lens with a focal length fO37.55 mm; the positive lens O4 is a convex lens with a focal length fO46.00 mm. The total optical length TTHI of the whole microscope objective is 8.59mm, and the optical back focal length BFL of the whole microscope objective is 2.06 mm.
In the present embodiment, the air interval between the positive lens O1 and the negative lens O2 is 0.33 mm; the air space between the negative lens O2 and the positive lens O3 was 0.10 mm; the air space between the positive lens O3 and the positive lens O4 was 0.10 mm.
The parameters of each lens of the optical system of the present embodiment are shown in table 1 below:
table 1 parameters of each lens of the optical system of example 1
As shown in fig. 3, which is an optical transfer function diagram of the present embodiment, it can be seen that the transfer function line of the laser microscope objective lens coincides with the transfer function line of the diffraction limit, which indicates that the image quality of the laser microscope objective lens is close to the diffraction limit.
As shown in fig. 4, which is a wavefront aberration diagram of the present embodiment, it can be seen that the wavefront aberration is within the range of 0.1 wavelength, and it is verified again that the image quality of the laser microscope objective lens of the present embodiment approaches the diffraction limit.
In the holographic lithography system of the present embodiment, the laser parameters are: the laser model IK4171I-G has a wavelength of 441.6nm and a power of 180mW, and the laser mode is a basal membrane Gaussian beam with a spot diameter of 1.4mm and a spot divergence angle of 0.5 mrad. As shown in FIG. 5(a), the initial intensity distribution of the laser beam was such that the intensity decreased to 1/e of the central intensity at a radius of 0.7mm2. After the light beam is focused by the laser microscope objective lens of this embodiment, the light intensity distribution at the focal point is as shown in fig. 5(b), and it can be seen that the size of the light spot is about 2 μm. The light beam is filtered by a pinhole of 5 μm to obtain divergent laser, and is collimated by a collimating lens with a focal length of 800mm to obtain parallel light beams, the light intensity distribution of which is shown in fig. 5(c), and it can be seen that the light intensity is reduced by less than 10% in the range of 80mm in diameter, which satisfies most holographic lithography applications.
The invention provides a laser microscope objective lens, which comprises a first positive lens group, a second negative lens group and a third positive lens group which are arranged in sequence along the incidence direction of laser, wherein the focal length f of the third positive lens group3Satisfies the condition of f is not less than 2.5mm3Less than or equal to 4.0 mm. According to the invention, the three lens groups are arranged, and the focal length of the third lens group is within the range of 2.5mm-4.0mm, so that the focal length of the laser microscope objective is reduced, and the requirements of customers on large-area holographic products can be met.
Example 2:
the first positive lens group in this embodiment includes one positive lens O1, the second negative lens group includes one negative lens O2, and the third positive lens group includes a positive lens O3 and a positive lens O4. All the lenses are made of radiation-resistant and laser damage-resistant quartz glass, and the model of the lenses is Corning7980 ArF. Just throughMirror O1 being a convex lens, focal length fO16.25 mm; the negative lens O2 is a concave lens with focal length fO2-10.1 mm; the positive lens O3 is a convex lens with a focal length fO37.90 mm; the positive lens O4 is a convex lens with a focal length fO45.86 mm. The total optical length TTHI of the whole micro objective is 8.47mm, and the optical back focal length BFL of the whole micro objective is 2.00 mm.
In the present embodiment, the air interval between the positive lens O1 and the negative lens O2 is 0.27 mm; the air space between the negative lens O2 and the positive lens O3 was 0.10 mm; the air space between the positive lens O3 and the positive lens O4 was 0.10 mm.
The parameters of each lens of the optical system of the present embodiment are shown in table 2 below:
table 2 parameters of each lens of the optical system of example 2
The optical transfer function diagram of this embodiment is similar to that of fig. 3. The wavefront aberration diagram of the present embodiment is similar to that of fig. 4. The image quality of the microscope objective of this embodiment is therefore also close to the diffraction limit. The gaussian beam of fig. 5(a) is filtered and expanded to obtain a light intensity distribution consistent with that of fig. 5 (c).
The invention provides a laser microscope objective which comprises a positive lens O1, a negative lens O2, a positive lens O3 and a positive lens O4 which are arranged in sequence along the incidence direction of laser. The effective focal length of the laser microscope objective lens is 3.2mm, the optical back focal length is 2.00mm, and the light transmission diameter is 2.0 mm. By matching with a collimating lens of 800mm and a pinhole of 5 mu m, 250-time beam amplification and spatial filtering can be realized, and the requirements of customers on large-area holographic products can be met.
Example 3:
referring to fig. 2, the first positive lens group includes one positive lens O1, the second negative lens group includes one negative lens O2, and the third positive lens group includes one positive lens O3 and one positive lens O4 in this embodiment. All the lenses are made of radiation-resistant and laser damage-resistant quartz glass, and the model is Corning8655 ArF. The positive lens O1 is a convex lens with a focal length fO111.97 mm; negative lensO2 concave lens, focal length fO2-14.09 mm; the positive lens O3 is a convex lens with a focal length fO37.73 mm; the positive lens O4 is a convex lens with a focal length fO46.25 mm. The total optical length TTHI of the whole microscope objective is 8.77mm, and the optical back focal length BFL of the whole microscope objective is 2.22 mm.
In the present embodiment, the air interval between the positive lens O1 and the negative lens O2 is 0.35 mm; the air space between the negative lens O2 and the positive lens O3 was 0.10 mm; the air space between the positive lens O3 and the positive lens O4 was 0.10 mm.
The parameters of each lens of the optical system of the present embodiment are shown in table 3 below:
table 3 parameters of each lens of the optical system of example 3
The optical transfer function diagram of this embodiment is similar to that of fig. 3. The wavefront aberration diagram of the present embodiment is similar to that of fig. 4. I.e. the image quality of the microscope objective of the present embodiment is also diffraction limited. The gaussian beam of fig. 5(a) thus undergoes a filtering and beam expanding system to produce a light intensity distribution consistent with that of fig. 5 (c).
The invention provides a laser microscope objective which comprises a positive lens O1, a negative lens O2, a positive lens O3 and a positive lens O4 which are arranged in sequence along the incidence direction of laser. The effective focal length of the laser microscope objective lens is 3.2mm, the optical back focal length is 2.22mm, and the light transmission diameter is 2.0 mm. By matching with a collimating lens of 800mm and a pinhole of 5 mu m, 250-time beam amplification and spatial filtering can be realized, and the requirements of customers on large-area holographic products can be met.
Example 4:
the first positive lens group in this embodiment includes a positive lens O1A and a positive lens O1B, the second negative lens group includes one negative lens O2, and the third positive lens group includes a positive lens O3 and a positive lens O4. All the lenses are made of radiation-resistant and laser damage-resistant quartz glass, and the model is Corning8655 ArF. The positive lens O1A and the positive lens O1B are both convex lenses, and have a focal length fO1A=14.17mm,fO1B27.26mm, combination of the first positive lens groupFocal length fO19.77 mm; the negative lens O2 is a concave lens with focal length fO2-12.72 mm; the positive lens O3 is a convex lens with a focal length fO38.63 mm; the positive lens O4 is a convex lens with a focal length fO46.43 mm. The total optical length TTHI of the whole microscope objective is 10.00mm, and the optical back focal length BFL of the whole microscope objective is 2.29 mm.
In the present embodiment, the air space between the positive lens O1A and the positive lens O1B is 0.31 mm; the air space between the positive lens O1B and the negative lens O2 was 0.22 mm; the air space between the negative lens O2 and the positive lens O3 was 0.09 mm; the air space between the positive lens O3 and the positive lens O4 was 0.10 mm. The parameters of each lens of the optical system of the present embodiment are shown in table 4 below:
table 4 parameters of each lens of the optical system of example 4
The optical transfer function diagram of this embodiment is similar to that of fig. 3. The wavefront aberration diagram of the present embodiment is similar to that of fig. 4. I.e. the image quality of the microscope objective of the present embodiment is also diffraction limited. The gaussian beam of fig. 5(a) thus undergoes a filtering and beam expanding system to produce a light intensity distribution consistent with that of fig. 5 (c).
The invention provides a laser micro-objective lens, which comprises a positive lens O1A, a positive lens O1B, a negative lens O2, a positive lens O3 and a positive lens O4 which are arranged in sequence along the incidence direction of laser. The effective focal length of the laser microscope objective lens is 3.2mm, the optical back focal length is 2.29mm, and the light transmission diameter is 2.0 mm. By matching with a collimating lens of 800mm and a pinhole of 5 mu m, 250-time beam amplification and spatial filtering can be realized, and the requirements of customers on large-area holographic products can be met.
Example 5:
in the present embodiment, the first positive lens group includes a positive lens O1, the second negative lens group includes a negative lens O2A and a positive lens O2B, and the third positive lens groupIncluding positive lens O3 and positive lens O4. All the lenses are made of radiation-resistant and laser damage-resistant quartz glass, and the model is Corning8655 ArF. The positive lens O1 is a convex lens with a focal length fO112.43 mm; focal length f of negative lens O2AO2AFocal length f of positive lens O2B ═ 9.69mmO2B36.19mm, focal length f of the second negative lens groupO2-14.72 mm; the positive lens O3 is a convex lens with a focal length fO37.73 mm; the positive lens O4 is a convex lens with a focal length fO46.25 mm. The total optical length TTHI of the whole micro objective is 9.92mm, and the optical back focal length BFL of the whole micro objective is 2.22 mm.
In the present embodiment, the air interval between the positive lens O1 and the negative lens O2A is 0.40 mm; the air space between the negative lens O2A and the positive lens O2B was 0.10 mm; the air space between the positive lens O2B and the positive lens O3 was 0.10 mm; the air space between the positive lens O3 and the positive lens O4 was 0.10 mm.
The parameters of each lens of the optical system of the present embodiment are shown in table 5 below:
TABLE 5 parameters for each lens of the optical system of example 5
The optical transfer function diagram of this embodiment is similar to that of fig. 3. The wavefront aberration diagram of the present embodiment is similar to that of fig. 4. I.e. the image quality of the microscope objective of the present embodiment is also diffraction limited. The gaussian beam of fig. 5(a) thus undergoes a filtering and beam expanding system to produce a light intensity distribution consistent with that of fig. 5 (c).
The invention provides a laser micro-objective lens, which comprises a positive lens O1, a negative lens O2A, a positive lens O2B, a positive lens O3 and a positive lens O4 which are sequentially arranged along the incidence direction of laser. The effective focal length of the laser microscope objective lens is 3.2mm, the optical back focal length is 2.22mm, and the light transmission diameter is 2.0 mm. By matching with a collimating lens of 800mm and a pinhole of 5 mu m, 250-time beam amplification and spatial filtering can be realized, and the requirements of customers on large-area holographic products can be met.
The above description is only for the purpose of illustrating the present invention and is not intended to limit the present invention in any way, and the present invention is not limited to the above description, but rather should be construed as being limited to the scope of the present invention.
Claims (9)
1. The laser microscope objective is characterized by comprising a first positive lens group, a second negative lens group and a third positive lens group which are sequentially arranged along the incidence direction of laser, wherein the focal length f of the third positive lens group3The following conditions are satisfied:
2.5mm≤f3≤4.0mm。
2. laser microscope objective according to claim 1, characterized in that the first positive lens group comprises at least one positive lens, the focal length f of the first positive lens group1The following conditions are satisfied:
6mm≤f1≤13mm。
3. laser microobjective according to claim 1, characterized in that the second negative lens group comprises at least one negative lens, the focal length f of the second negative lens group2The following conditions are satisfied:
-15mm≤f2≤-9mm。
4. the laser microscope objective lens of claim 1, wherein the third positive lens group comprises a positive lens O3 and a positive lens O4, and the focal length f of the positive lens O3o3Focal length f of positive lens O4o4The following conditions are respectively satisfied:
6mm≤fo3≤9mm;
5mm≤fo4≤7mm。
5. laser microscope objective according to claim 1, characterized in that the total optical length TTHI of the microscope objective satisfies the following condition:
7mm≤TTHI≤10mm。
6. laser microobjective according to claim 1, characterized in that the optical back focal length BFL of the microobjective satisfies the following condition:
2mm≤BFL≤3mm。
7. the laser microscope objective according to claim 1, characterized in that the material of the first positive lens group, the second negative lens group and the third positive lens group is quartz glass.
8. The laser microscope objective of claim 2, wherein the first positive lens group comprises one convex lens.
9. The laser microobjective of claim 3 wherein the second negative lens group comprises a concave lens.
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JPH1078543A (en) * | 1996-09-04 | 1998-03-24 | Olympus Optical Co Ltd | Optical system |
US6324015B1 (en) * | 1999-08-10 | 2001-11-27 | Sumitomo Electric Industries, Ltd. | fθ lens |
JP2004264685A (en) * | 2003-03-03 | 2004-09-24 | Mitsubishi Electric Corp | Variable power optical device |
CN1603876A (en) * | 2003-09-29 | 2005-04-06 | 株式会社尼康 | Zoom lens system |
JP2016224239A (en) * | 2015-05-29 | 2016-12-28 | 株式会社ニコン | Eyepiece lens, optical device including eyepiece lens, and eyepiece lens manufacturing method |
CN107664832A (en) * | 2016-07-27 | 2018-02-06 | 卡尔蔡司显微镜有限公司 | Telecentric opticses unit and digital zoom microscope |
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2019
- 2019-12-24 CN CN201911348961.0A patent/CN111025617B/en active Active
Patent Citations (6)
Publication number | Priority date | Publication date | Assignee | Title |
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JPH1078543A (en) * | 1996-09-04 | 1998-03-24 | Olympus Optical Co Ltd | Optical system |
US6324015B1 (en) * | 1999-08-10 | 2001-11-27 | Sumitomo Electric Industries, Ltd. | fθ lens |
JP2004264685A (en) * | 2003-03-03 | 2004-09-24 | Mitsubishi Electric Corp | Variable power optical device |
CN1603876A (en) * | 2003-09-29 | 2005-04-06 | 株式会社尼康 | Zoom lens system |
JP2016224239A (en) * | 2015-05-29 | 2016-12-28 | 株式会社ニコン | Eyepiece lens, optical device including eyepiece lens, and eyepiece lens manufacturing method |
CN107664832A (en) * | 2016-07-27 | 2018-02-06 | 卡尔蔡司显微镜有限公司 | Telecentric opticses unit and digital zoom microscope |
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