CN111020535B - Preparation method of plasma chemical vapor deposition nano-film of cell counting plate - Google Patents
Preparation method of plasma chemical vapor deposition nano-film of cell counting plate Download PDFInfo
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- CN111020535B CN111020535B CN202010028125.0A CN202010028125A CN111020535B CN 111020535 B CN111020535 B CN 111020535B CN 202010028125 A CN202010028125 A CN 202010028125A CN 111020535 B CN111020535 B CN 111020535B
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/50—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges
- C23C16/513—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges using plasma jets
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/02—Pretreatment of the material to be coated
- C23C16/0227—Pretreatment of the material to be coated by cleaning or etching
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Abstract
The invention discloses a preparation method of a cell counting plate plasma chemical vapor deposition nano film, which comprises the following steps: (1) pretreating a cell counting plate; (2) plasma gas activation treatment, namely treating the cleaned cell counting plate by using plasma activated gas in a reaction cavity; (3) static coating, namely introducing vaporized coating materials into the reaction cavity, wherein the coating materials are hydrophobic materials or hydrophilic materials, closing the inlet and the outlet of the reaction cavity after continuously introducing for 10s, starting a static coating process, maintaining the static process for 1-3min, then introducing the vaporized coating materials again, and repeating the operation for 3-5 times; (4) purifying, and breaking vacuum in the reaction cavity; (5) and post-processing, namely taking out the cell counting plate plated with the nano film in the reaction cavity, and carrying out sealing and packaging treatment. The invention has the advantages of good film quality, low energy consumption, high production efficiency and coating material saving.
Description
Technical Field
The invention relates to the technical field of plasma chemical vapor deposition coating, in particular to a preparation method of a plasma chemical vapor deposition nano-film of a cell counting plate.
Background
The cell counting plate is commonly used in the field of biological medicine and is used for measuring and calculating the number of cells in unit volume, the cell counting plate is usually subjected to hydrophobic or hydrophilic treatment on the inner surface of a counting cell, and the specific selectivity of cell screening can be improved after the cell counting plate is subjected to hydrophobic treatment; after the cell counting plate is subjected to hydrophilic treatment, the rapid spreading of water-soluble liquid in the counting cell can be improved, and the cell measurement is facilitated.
In order to enable the cell counting plate to realize the functions, coating treatment is needed in the counting cell, a hydrophobic or hydrophilic nano-film is applied to the surface of the cell counting plate by a plasma chemical vapor deposition method, and the traditional plasma chemical vapor deposition method is carried out in a dynamic coating mode. The coating process has the following defects:
(1) in the dynamic coating process, the coating materials in the reaction cavity continuously enter and exit the reaction cavity to keep a dynamic balance state, and a large amount of coating materials are consumed to maintain the dynamic process.
(2) In the reaction cavity, the movement process of the plasma is a disordered and directionless coating process, the plasma can not collide with the surface of the product in order, the excessive polymerization condition is easy to generate, the surface of the produced product is uneven, and the attractiveness of the product is influenced.
(3) The dynamic coating process needs a long time, often 40-60min, so that the production efficiency of the product is low.
(4) The power required by the dynamic coating is larger, the power required for generating the nano film with a certain thickness is usually larger, the energy consumption of equipment is higher, and the production cost is increased.
Therefore, a production process method which has good film quality, low energy consumption, high production efficiency and coating material saving is urgently needed to be obtained.
Disclosure of Invention
Aiming at the defects, the invention aims to provide a preparation method of a cell counting plate plasma chemical vapor deposition nano-film, which has the characteristics of good film quality, low energy consumption, high production efficiency and coating material saving.
In order to achieve the purpose, the invention adopts the following technical scheme:
a preparation method of a cell counting plate plasma chemical vapor deposition nano-film comprises the following steps:
(1) pretreating a cell counting plate;
(2) plasma gas activation treatment, namely treating the cleaned cell counting plate by using plasma activated gas in a reaction cavity;
(3) static coating, namely introducing vaporized coating materials into the reaction cavity, wherein the coating materials are hydrophobic materials or hydrophilic materials, closing the inlet and the outlet of the reaction cavity after continuously introducing for 10s, starting a static coating process, maintaining the static process for 1-3min, then introducing the vaporized coating materials again, and repeating the operation for 3-5 times;
(4) purifying, and breaking vacuum in the reaction cavity;
(5) and post-processing, namely taking out the cell counting plate plated with the nano film in the reaction cavity, and carrying out sealing and packaging treatment.
Further, in the step (3), an electrode plate for generating directional voltage is arranged in the reaction cavity, and after the vaporized coating material enters the reaction cavity, under the action of the electrode plate, plasma gas carrier gas is emitted in a directional manner towards the cell counting plate, so that the coating material is deposited on the surface of the cell counting plate to form a nano film.
Further, in the step (3), when the thickness of the generated nano film is between 60nm and 200nm, the power required by the film coating process is 150-350W, and the reaction is maintained for 10-15 min.
Further, in the step (2), the activation time is 1-5min, the power provided by the radio frequency power supply is 200-.
Further, the coating material is vaporized in the heating cup, the adding amount of the coating material in the heating cup is 5.0-8.0ul/s, and the heating temperature of the heating cup is 80-100 ℃.
Further, the hydrophobic film is a fluorine-free material, and the chemical general formula of the coating material is R-Si- (ORX)3(ii) a Wherein R is a long-chain alkyl group with multiple carbon atoms, and the number of carbon atoms is 3-16; -RX is-Cl, -CH3、-C2H5One or more of them.
Further, in the step (4), the time for breaking vacuum in the reaction cavity is 1-3 min.
Further, in the step (1), the following substeps are sequentially performed;
(81) cleaning the cell counting plate with ultrasonic absolute ethyl alcohol;
(82) cleaning the cell counting plate with ultrasonic acetone;
(83) washing the cell counting plate for 2-5 times by using deionized water;
(84) and drying at 45 deg.C and 5% humidity for 20-45 min.
Further, in the step (5), the cell counting plate packaged in a sealing manner is placed in a constant temperature and humidity environment for 20-45min, wherein the temperature of the environment is 45 ℃ and the humidity is 5%.
The invention has the beneficial effects that:
1. after the coating material enters the reaction cavity, the inlet and the outlet of the reaction cavity are closed, at the moment, the cavity is in a static gas state, and the coating material has enough time to perform plasma reaction in the cavity.
2. The reaction chamber is internally provided with the electrode plate, the plasma gas moves towards the cell counting plate under the directional action of the electrode plate, and the nano film is formed on the surface of the cell counting plate through deposition.
3. Under the condition of generating the nano film with the same thickness, the power required by the static coating method is far less than that of the dynamic coating method, so that the operation energy consumption can be reduced, and under the condition of generating the nano film with the same thickness, the time used by the static coating method is less than that of the dynamic coating method, so that the production time can be shortened, and the production efficiency can be improved.
4. The cell counting plate is clean and dry before film coating, the quality of the film layer is improved, the cell counting plate is isolated from oxygen and moisture in the air after the cell counting plate is subjected to post-treatment, and the film layer is prevented from being polluted.
Drawings
FIG. 1 is a test photograph of one embodiment of the present invention;
Detailed Description
The technical scheme of the invention is further explained by the specific implementation mode in combination with the attached drawings.
A preparation method of a cell counting plate plasma chemical vapor deposition nano-film comprises the following steps:
(1) pretreating a cell counting plate;
(2) plasma gas activation treatment, namely treating the cleaned cell counting plate by using plasma activated gas in a reaction cavity;
(3) static coating, namely introducing vaporized coating materials into the reaction cavity, wherein the coating materials are hydrophobic materials or hydrophilic materials, closing the inlet and the outlet of the reaction cavity after continuously introducing for 10s, starting a static coating process, maintaining the static process for 1-3min, then introducing the vaporized coating materials again, and repeating the operation for 3-5 times;
(4) purifying, and breaking vacuum in the reaction cavity;
(5) and post-processing, namely taking out the cell counting plate plated with the nano film in the reaction cavity, and carrying out sealing and packaging treatment.
According to the invention, the membrane is coated on the cell counting plate, and the cell counting plate is pretreated, so that the surface of the base material is clean and dry, the quality of the membrane layer is improved, and the binding force between the nano membrane and the cell counting plate is improved; plasma gas activation treatment is carried out, so that the gas used when the coating material enters the reaction plasma cavity has enough energy to react with the coating material; after the coating material enters the reaction chamber, the inlet and the outlet of the reaction chamber are closed, the chamber is in a static gas state, the coating material has sufficient time to perform plasma reaction in the chamber, and the surface of the cell counting plate is coated under the action of the electrode plate.
Furthermore, in the step (3), an electrode plate for generating directional voltage is arranged in the reaction chamber, and after the vaporized coating material enters the reaction chamber, under the action of the electrode plate, the plasma gas carrier gas is emitted directionally towards the cell counting plate, so that the coating material is deposited on the surface of the cell counting plate to form a nano film.
The dynamic coating, the gas business turn over is in a dynamic balance process in the equipment cavity, the plasma is unordered to release, the energy ratio is bigger, excessive reaction appears easily, the phenomenon of excessive polymerization, influence the product quality that finally plates out is inhomogeneous and bad phenomena such as outward appearance yellow, this technology is different from traditional dynamic coating, in the coating stage, install the plate electrode in the reaction chamber, under the directional action of plate electrode, plasma gas moves towards the cell counting board, at cell counting board surface deposit formation nanometer membrane, this kind of plasma reaction that has the direction in order, make product coating in-process more pointed, can be at the local pertinence coating that the product needs, simultaneously, also make the surface of coating film product more level and more even, the texture is more even.
Furthermore, in step (3), when the thickness of the formed nano-film is between 60-200nm, the power required by the plating process is 150-350W, and the reaction is maintained for 10-15 min.
When the thickness of the generated nano film is between 60 and 200nm, the power required by the static coating is 400-450W, the energy effect generated in the static process is maintained to be equivalent to the energy effect provided by the dynamic coating of 1000W, the energy consumption required by the coating process is greatly reduced, and the running cost of the required configuration is reduced.
When the thickness of the generated nano film is between 60 and 200nm, the reaction time is between 10 and 15min, and the thickness of the nano film is between 60 and 200nm, compared with the traditional dynamic coating method, the thickness of the nano film needs 40 to 60min, the static coating method is adopted, the coating time is greatly reduced, and the production efficiency is improved.
Furthermore, in the step (2), the activation time is 1-5min, the power provided by the radio frequency power supply is 200-800w, and the vacuum degree of the reaction chamber is maintained within the range of 0.06-0.1 mbar.
Preferably, the gas flow rate is 80-160 sccm.
Activating plasma gas before a coating step, ensuring that the gas has enough energy to react with the coating material when the coating material enters a reaction plasma cavity, and improving the quality of a deposited film layer in a three-dimensional way under a proper vacuum degree, but causing unstable glow and poor film layer quality due to too low vacuum degree.
Further, the coating material is vaporized in the heating cup, the adding amount of the coating material in the heating cup is 6.0-8.0ul/s, and the heating temperature of the heating cup is 80-100 ℃.
The steam quantity of the coating material entering the reaction cavity is controlled by controlling the adding quantity and the heating temperature of the coating material, the coating material can be ensured to fully react with plasma gas, the using quantity of the coating material can be saved, the reaction stability can be ensured, and the coating quality is ensured.
Furthermore, the hydrophobic film is a fluorine-free material, and the chemical general formula of the coating material is R-Si- (ORX)3(ii) a Wherein R is a long-chain alkyl group with multiple carbon atoms, and the number of carbon atoms is 3-16; -RX is-Cl, -CH3、-C2H5One or more of them.
The hydrophobic membrane material has good chemical bond binding force to organic and inorganic substances at two ends, respectively, and has bridging effect, and the-R end can be bound with organic substance (ORX)3The hydrophobic membrane material can be n-butyl triethoxysilane, isobutyl triethoxysilane, 3-aminopropyl triethoxysilane, hexadecyl trimethoxysilane or octadecyl trichloro alkane.
Further, in the step (4), the vacuum breaking time in the reaction chamber is 1-3 min.
And slowly breaking vacuum to enable the nano coating materials in the micro-channel to be effectively adhered and densely stacked, wherein the breaking vacuum time is related to the coating vacuum degree and the coating time, and the greater the coating vacuum degree is, the longer the breaking vacuum time is, and the longer the coating time is, the longer the breaking vacuum time is. Breaking vacuum means that the pressure of a closed space with a certain vacuum degree is recovered until the pressure is the same as the external pressure.
Further, in the step (1), the following substeps are sequentially performed;
(81) cleaning the cell counting plate with ultrasonic absolute ethyl alcohol;
(82) cleaning the cell counting plate with ultrasonic acetone;
(83) washing the cell counting plate for 2-5 times by using deionized water;
(84) and drying at 45 deg.C and 5% humidity for 20-45 min.
The cell counting plate is pretreated, so that the surface of the substrate is clean and dry, and the quality of the film layer is improved. Meanwhile, the adoption of the pretreatment parameters can ensure that all the microchannels on the device are cleaned.
In the step (5), the cell counting plate after the post-treatment is sealed and packaged in a constant temperature and humidity environment for 20-45min, wherein the temperature of the environment is 45 ℃ and the humidity is 5%.
The post-processing step can ensure that the sample can isolate oxygen and moisture in the air, the pollution of the film layer is well avoided, and the film can be further stabilized in the post-processing step.
The invention is further illustrated by the following examples.
The preparation method of the plasma chemical vapor deposition nano-film of the cell counting plate in the embodiments 1 to 6 comprises the following steps:
(1) pretreating a cell counting plate;
(2) plasma gas activation treatment, namely treating the cleaned cell counting plate by using plasma activated gas in a reaction cavity;
(3) static coating, namely introducing vaporized coating materials into the reaction cavity, wherein the coating materials are hydrophobic materials or hydrophilic materials, closing the inlet and the outlet of the reaction cavity after continuously introducing for 10s, starting a static coating process, maintaining the static process for 1-3min, then introducing the vaporized coating materials again, and repeating the operation for 3-5 times;
(4) purifying, and breaking vacuum in the reaction cavity;
(5) and post-processing, namely taking out the cell counting plate plated with the nano film in the reaction cavity, and carrying out sealing and packaging treatment.
The coating material is a hydrophobic material, and the chemical general formula of the coating material is R-Si- (ORX)3(ii) a Wherein R is a long-chain alkyl group with multiple carbon atoms, and the number of carbon atoms is 3-16; -RX is-Cl, -CH3、-C2H5One or more of them.
The parameters of each step in examples 1-6 are shown in the following table.
Specifically, the devices coated in examples 1-6 were cell counting plates. When the hydrophobic membranes obtained by the methods of examples 1 to 6 are tested, the static contact hydrophobic angle of the hydrophobic membranes is 120 to 150 degrees, and the hydrophobic membranes have good hydrophobic effect. The cell counting plates of examples 1-6 were tested and the results were essentially the same, but the hydrophobic membrane of example 6 was the best quality. The hydrophobic films obtained in examples 1 to 6 were subjected to abrasion resistance test with a sand test eraser, the hydrophobic films of examples 3 to 6 were not scratched, the hydrophobic films of examples 1 and 2 were slightly scratched, the hydrophobic films of examples 3 to 6 were more abrasion resistant than the hydrophobic films of examples 1 and 2, and it was found that the hydrophobic films of examples 3 to 6 were more adhesive to a cell counting plate than the hydrophobic films of examples 1 and 2.
The hydrophobic membranes obtained in examples 1 to 6 were subjected to a durability test and a hydrophobic angle test at intervals of time on the hydrophobic membranes previously packed in a cell counting plate, and the test results are shown in the following table.
| Time | Example 1 | Example 2 | Example 3 | Example 4 | Example 5 | Example 6 |
| Initial | 125° | 132° | 138° | 126° | 130° | 148° |
| Month 2 | 128° | 130° | 136° | 124° | 130° | 146° |
| Month 4 | 122° | 131° | 136° | 125° | 128° | 145° |
| Month 6 | 120° | 128° | 135° | 122° | 126° | 146° |
| Month 8 | 122° | 128° | 134° | 120° | 125° | 144° |
| Month 10 | 124° | 130° | 130° | 122° | 126° | 142° |
| Month 12 | 122° | 127° | 130° | 121° | 124° | 141° |
The hydrophobic membranes obtained from examples 1-6 were subjected to durability testing with essentially the same results, but the hydrophobic membrane of example 6 was of the best quality.
Examples 7 to 12 were conducted in the same manner as in examples 1 to 6 except that the coating material was changed from a hydrophobic material to a hydrophilic material, and the hydrophilic films obtained in examples 7 to 12 were subjected to the durability test, the results of which are shown in the following table.
| Time | Example 7 | Example 8 | Example 9 | Example 10 | Example 11 | Example 12 |
| Initial | 15° | 16° | 16° | 17° | 15° | 13° |
| Month 2 | 16° | 18° | 17° | 17° | 17° | 13° |
| Month 4 | 16° | 18° | 17° | 19° | 18° | 14° |
| Month 6 | 19° | 19° | 18° | 19° | 18° | 15° |
| Month 8 | 24° | 21° | 22° | 23° | 24° | 20° |
| Month 10 | 26° | 26° | 25° | 27° | 27° | 23° |
| Month 12 | 28° | 30° | 29° | 29° | 28° | 25° |
The hydrophilic membranes obtained in examples 7 to 12 were subjected to the durability test, and the test results were substantially the same, but the hydrophilic membrane of example 12 was the best in quality.
Examples 13 to 14 were static coating methods, and comparative examples 1 to 3 were dynamic coating methods;
examples 13-14 the procedure and conditions were as in example 6 except that the power was different from that of example 6;
comparative examples 1 to 3 the steps and conditions were the same as those in example 6 except that the plating method and the power were different from those in example 6, and the following were differences between the methods of comparative examples 1 to 3:
dynamic coating in comparative examples 1 to 3: the vaporized coating material enters the reaction cavity, and the vaporized coating material is discharged from the outlet of the reaction cavity and continuously introduced into the reaction cavity to keep a dynamic process of one inlet and one outlet.
| Parameter(s) | Example 13 | Example 14 | Comparative example 1 | Comparative example 2 | Comparative example 3 |
| Power W | 350 | 300 | 600 | 400 | 800 |
| Reaction min | 15 | 15 | 15 | 15 | 15 |
| Film thickness nm | 60 | 58 | 59 | 54 | 63 |
| Whether the film layer is uniform or not | Uniformity | Uniformity | Unevenness of | Unevenness of | Unevenness of |
| Appearance of the product | Good effect | Good effect | Slightly yellow | Slightly yellow | Slightly yellow |
The thickness of the hydrophobic films obtained by adopting the static coating method in the examples 13 to 14 is equivalent to that of the hydrophobic film obtained by adopting the dynamic coating method in the comparative example 1, the thickness of the hydrophobic films obtained by adopting the static coating method in the examples 13 to 14 is larger than that of the hydrophobic films obtained by adopting the dynamic coating method in the comparative example 2, and the thickness of the hydrophobic films obtained by adopting the static coating method in the examples 13 to 14 is smaller than that of the hydrophobic films obtained by adopting the dynamic coating method in the comparative example 3, which indicates that the thickness of the hydrophobic films obtained by adopting the static coating method under the power of 300 and 350W is equivalent to that of the hydrophobic films obtained by adopting the dynamic coating method under the power of 600W.
The hydrophobic films obtained in examples 13 to 14 had uniform texture, the hydrophobic films obtained in comparative examples 1 to 3 had non-uniform texture, the hydrophobic films obtained in examples 13 to 14 had no noticeable discoloration, and the hydrophobic films obtained in comparative examples 1 to 3 had slightly yellow appearance.
The hydrophobic films obtained in examples 13 to 14 and comparative examples 1 to 3 were subjected to abrasion resistance test with a sand test eraser, the hydrophobic films of examples 13 to 14 were not scratched, the hydrophobic films of comparative examples 1 to 3 were slightly scratched, the hydrophobic films of examples 13 to 14 were more abrasion resistant than the hydrophobic films of comparative examples 1 to 3, and it was found that the binding strength of the hydrophobic films of examples 13 to 14 to the cell counting plate was more excellent than that of comparative examples 1 to 3.
Comparative examples 4 to 5 the electrode plates in the reaction chamber were removed in step (3) by the static coating method, and the remaining steps and conditions were the same as in example 7, and the test results are shown in the following table:
| parameter(s) | Example 13 | Comparative example 4 | Comparative example 5 |
| Power W | 350 | 450 | 450 |
| Reaction min | 15 | 15 | 15 |
| Film thickness nm | 60 | 48 | 45 |
| Whether the film layer is uniform or not | Uniformity | Unevenness of | Unevenness of |
| Appearance of the product | Good effect | Slightly yellow | Slightly yellow |
The film thicknesses of the hydrophobic films obtained in comparative examples 4 to 5 were 45nm and 48nm, the film thickness of the hydrophobic film obtained in example 13 was 60nm, the film layer textures of the hydrophobic films obtained in comparative examples 4 to 5 were not uniform, the film layer textures of the hydrophobic film obtained in example 13 were uniform, the appearance of the hydrophobic film obtained in comparative examples 4 to 5 was slightly yellowish, and the appearance of the hydrophobic film obtained in example 13 was not significantly discolored. The quality of the hydrophobic film obtained in example 13 was the best.
Abrasion resistance test method:
1. reciprocating motion abrasion test method
Under the specified experimental conditions, a special sand test eraser with a load of 500g is used for applying force on the surface of the coating, a back-and-forth friction cycle is carried out at a certain speed and stroke, and after the test is finished, the bottom penetrating condition of the coating is observed for judging and evaluating the wear resistance of the coating.
2. Testing the tool: the special sand quality test eraser.
The test method comprises the following steps: a500 g load was applied to the eraser, and the eraser with the load was rubbed on the surface of the sample at a speed of 40 to 60 times/min with a stroke of about 20mm for 300 cycles.
3. And (4) evaluating the result: and (4) finishing the test, wherein the surface of the sample coating is not scratched or does not penetrate through the bottom, and the test is qualified, otherwise, the test is unqualified.
The technical principle of the present invention is described above in connection with specific embodiments. The description is made for the purpose of illustrating the principles of the invention and should not be construed in any way as limiting the scope of the invention. Based on the explanations herein, those skilled in the art will be able to conceive of other embodiments of the present invention without inventive effort, which would fall within the scope of the present invention.
Claims (7)
1. A preparation method of a cell counting plate plasma chemical vapor deposition nano-film is characterized by comprising the following steps:
(1) pretreating the cell counting plate to ensure that the cell counting plate is clean and dry before coating;
(2) plasma gas activation treatment, namely treating the cleaned cell counting plate by using plasma activated gas in a reaction cavity, and ensuring that the gas has enough energy to react with a coating material when the coating material enters the reaction cavity;
(3) the method comprises the following steps of (1) statically coating, introducing a vaporized coating material into a reaction cavity, wherein an electrode plate for generating directional voltage is arranged in the reaction cavity, and after the vaporized coating material enters the reaction cavity, under the action of the electrode plate, plasma gas carrier gas is emitted towards a cell counting plate in a directional mode, so that the coating material is deposited on the surface of the cell counting plate to form a nano film; the coating material is a hydrophobic material or a hydrophilic material, the inlet and the outlet of the reaction cavity are closed after continuously introducing the coating material for 10s, a static coating process is started, the static process is maintained for 1-3min, then the vaporized coating material is introduced again, and the operation is repeated for 3-5 times; the thickness of the generated nano film is 60-200nm, the power required by the film coating process is 150-350W, and the reaction is maintained for 10-15 min;
(4) purifying, and breaking vacuum in the reaction cavity;
(5) and the aftertreatment is used for taking out the cell counting plate plated with the nano film in the reaction cavity, and sealing and packaging are carried out to ensure that oxygen and moisture in the isolated air of the cell counting plate are prevented from being polluted.
2. The method as claimed in claim 1, wherein in step (2), the activation time is 1-5min, the power supplied by the RF power supply is 200-800W, and the vacuum degree of the reaction chamber is maintained within the range of 0.06-0.1 mbar.
3. The method of claim 1, wherein the coating material is vaporized in a heating cup, the amount of the coating material added in the heating cup is 6.0-8.0 μ L/s, and the heating temperature of the heating cup is 80-100 ℃.
4. The method of claim 1, wherein the hydrophobic material is a fluorine-free material; the chemical general formula of the coating material is R-Si- (ORX)3(ii) a Wherein R is a long-chain alkyl group with multiple carbon atoms, and the number of carbon atoms is 3-16; -RX is-Cl, -CH3、-C2H5One or more of.
5. The method of claim 1, wherein in step (4), the vacuum is broken in the reaction chamber for 1-3 min.
6. The method for preparing a plasma chemical vapor deposition nano-film for a cell counting plate according to claim 1, wherein in the step (1), the following substeps are sequentially performed;
(81) cleaning the cell counting plate with ultrasonic absolute ethyl alcohol;
(82) cleaning the cell counting plate with ultrasonic acetone;
(83) washing the cell counting plate for 2-5 times by using deionized water;
(84) and drying at 45 deg.C and 5% humidity for 20-45 min.
7. The method of claim 1, wherein in step (5), the cell counting plate is sealed and packaged in a constant temperature and humidity environment with a temperature of 45 ℃ and a humidity of 5% for 20-45 min.
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Citations (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN1308147A (en) * | 2000-12-15 | 2001-08-15 | 北京航空航天大学 | Plasma Chemical vapor deposition filing method and equipment |
| CN106560528A (en) * | 2015-10-06 | 2017-04-12 | 香港城市大学 | Homogeneous And Transparent Protective Coatings For Precious Metals And Copper Alloys And Preparation Method Thereof |
| CN107201511A (en) * | 2017-05-21 | 2017-09-26 | 无锡荣坚五金工具有限公司 | A kind of method that cycle period alternating discharge prepares multi-functional nano protecting coating |
| CN109913855A (en) * | 2019-04-24 | 2019-06-21 | 佛山市思博睿科技有限公司 | A kind of hydrophobic material and plate hydrophobic film method |
| CN110000065A (en) * | 2019-04-24 | 2019-07-12 | 佛山市思博睿科技有限公司 | A kind of piezoelectric ceramic vibrator movable plate hydrophilic treatment method for atomizer |
| CN110029327A (en) * | 2019-04-24 | 2019-07-19 | 佛山市思博睿科技有限公司 | A kind of hydrophobic film method of plasma chemical vapor deposition circulation plating |
| CN110306166A (en) * | 2019-08-15 | 2019-10-08 | 佛山市思博睿科技有限公司 | A kind of preparation method of plasma chemical vapor deposition metallic substrate surface nanometer film |
-
2020
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Patent Citations (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN1308147A (en) * | 2000-12-15 | 2001-08-15 | 北京航空航天大学 | Plasma Chemical vapor deposition filing method and equipment |
| CN106560528A (en) * | 2015-10-06 | 2017-04-12 | 香港城市大学 | Homogeneous And Transparent Protective Coatings For Precious Metals And Copper Alloys And Preparation Method Thereof |
| CN107201511A (en) * | 2017-05-21 | 2017-09-26 | 无锡荣坚五金工具有限公司 | A kind of method that cycle period alternating discharge prepares multi-functional nano protecting coating |
| CN109913855A (en) * | 2019-04-24 | 2019-06-21 | 佛山市思博睿科技有限公司 | A kind of hydrophobic material and plate hydrophobic film method |
| CN110000065A (en) * | 2019-04-24 | 2019-07-12 | 佛山市思博睿科技有限公司 | A kind of piezoelectric ceramic vibrator movable plate hydrophilic treatment method for atomizer |
| CN110029327A (en) * | 2019-04-24 | 2019-07-19 | 佛山市思博睿科技有限公司 | A kind of hydrophobic film method of plasma chemical vapor deposition circulation plating |
| CN110306166A (en) * | 2019-08-15 | 2019-10-08 | 佛山市思博睿科技有限公司 | A kind of preparation method of plasma chemical vapor deposition metallic substrate surface nanometer film |
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