CN110000065A - A kind of piezoelectric ceramic vibrator movable plate hydrophilic treatment method for atomizer - Google Patents
A kind of piezoelectric ceramic vibrator movable plate hydrophilic treatment method for atomizer Download PDFInfo
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- CN110000065A CN110000065A CN201910335905.7A CN201910335905A CN110000065A CN 110000065 A CN110000065 A CN 110000065A CN 201910335905 A CN201910335905 A CN 201910335905A CN 110000065 A CN110000065 A CN 110000065A
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- movable plate
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- ceramic vibrator
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- vibrator movable
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D1/00—Processes for applying liquids or other fluent materials
- B05D1/62—Plasma-deposition of organic layers
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D3/00—Pretreatment of surfaces to which liquids or other fluent materials are to be applied; After-treatment of applied coatings, e.g. intermediate treating of an applied coating preparatory to subsequent applications of liquids or other fluent materials
- B05D3/02—Pretreatment of surfaces to which liquids or other fluent materials are to be applied; After-treatment of applied coatings, e.g. intermediate treating of an applied coating preparatory to subsequent applications of liquids or other fluent materials by baking
- B05D3/0218—Pretreatment, e.g. heating the substrate
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D3/00—Pretreatment of surfaces to which liquids or other fluent materials are to be applied; After-treatment of applied coatings, e.g. intermediate treating of an applied coating preparatory to subsequent applications of liquids or other fluent materials
- B05D3/04—Pretreatment of surfaces to which liquids or other fluent materials are to be applied; After-treatment of applied coatings, e.g. intermediate treating of an applied coating preparatory to subsequent applications of liquids or other fluent materials by exposure to gases
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D2203/00—Other substrates
- B05D2203/30—Other inorganic substrates, e.g. ceramics, silicon
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D2401/00—Form of the coating product, e.g. solution, water dispersion, powders or the like
- B05D2401/30—Form of the coating product, e.g. solution, water dispersion, powders or the like the coating being applied in other forms than involving eliminable solvent, diluent or dispersant
- B05D2401/33—Form of the coating product, e.g. solution, water dispersion, powders or the like the coating being applied in other forms than involving eliminable solvent, diluent or dispersant applied as vapours polymerising in situ
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Abstract
The invention discloses a kind of piezoelectric ceramic vibrator movable plate hydrophilic treatment methods for atomizer, method is the following steps are included: plate nano hydrophilic film on the surface of piezoelectric ceramic vibrator movable plate by plasma chemical vapor deposition process to the piezoelectric ceramic vibrator movable plate for atomizer, nano hydrophilic film is directly contacted with the liquid in atomizer.By plating nano hydrophilic film on piezoelectric ceramic vibrator movable plate surface, the hydrophily of piezoelectric ceramic vibrator movable plate can be improved, the surface for improving piezoelectric ceramic vibrator movable plate can, the surface tension of its surface liquid is improved, carries out hydrophilic treated, water is in piezoelectric ceramic vibrator movable plate surface spreading, without will form round bead shape, the probability for forming air buffer between vibrating reed surface and water is reduced, inhibits the generation of bubble, improves the efficiency of ultrasonic atomization.Nano hydrophilic film is plated by the method for plasma chemical vapor deposition, has the advantages that quality of forming film is good.
Description
Technical field
The present invention relates to nebulizer technologies field more particularly to a kind of hydrophilic places of piezoelectric ceramic vibrator movable plate for atomizer
Reason method.
Background technique
Ultrasonic ultrasonic delay line memory utilizes electronics high frequency oscillation, by the high-frequency resonant of ceramic vibrating reed, by liquid water molecules knot
Structure is broken up and generates the elegant water mist of nature.In vibration processes, the frequency of ultrasonic wave is flexible to spray water, and occurs in moment
Cavitation forms cloud and mist, simultaneously as liquid internal or liquid, which are consolidated on interface, forms steam when local pressure reduces in liquid
Or the hole of gas.
The glass glazings on piezoelectric ceramic vibrator movable plate surface reduce the surface tension of silver coating surface liquid, intermolecular beam
Binding force decline, bubble is declined by the power of " pulling ", and liquid internal point and atm difference are constant at this time, and bubble is easy to produce out
Come.Blibbing can gather after generating, more and more, make to generate one layer of gas interlayer between its surface and liquid, ultrasound
Wave vibration processes can generate invalid vibration, seriously affect ultrasonic atomization efficiency.
Summary of the invention
It is an object of the invention to propose a kind of piezoelectric ceramic vibrator movable plate hydrophilic treatment method for atomizer, has and mention
The characteristics of high pressure electroceramics vibrating reed hydrophilicity.
To achieve this purpose, the present invention adopts the following technical scheme:
A kind of piezoelectric ceramic vibrator movable plate hydrophilic treatment method for atomizer, the described method comprises the following steps: to
It is plated and is received on the surface of piezoelectric ceramic vibrator movable plate by plasma chemical vapor deposition process in the piezoelectric ceramic vibrator movable plate of atomizer
Rice hydrophilic film, the nano hydrophilic film are directly contacted with the liquid in atomizer.
Further, nano hydrophilic film is to be obtained by water wetted material by plasma reinforced chemical vapour deposition method；
The water wetted material is floride-free water wetted material, chemical general formula are as follows: R-Si- (ORX)3；Wherein ,-R is the long alkane of more carbon
Base, amount of carbon atom 3-16 ,-RXFor-Cl ,-CH3、-C2H5It is one of or a variety of.
Further, plasma chemical vapor deposition process comprises the following steps that:
(1) plasma activation is handled, and piezoelectric ceramic vibrator movable plate is placed in gas stream and is activated；
(2) water wetted material vaporizes；
(3) power is provided by radio-frequency power supply, the water wetted material of plasma gas carrier gas and vaporization carries out in equipment cavity
Crash response, make water wetted material piezoelectric ceramic vibrator movable plate surface carry out attachment and deposition form nano-hydrophilic film layer；
(4) cleansing phase: vacuum breaker.
Further, in step (1), gas flow: 1000-2500ul/s, vacuum degree are maintained at 0.04-0.2mbar model
In enclosing, activation time 1-5min.The time of activation is related with gas flow, and gas flow is bigger, and activation time is shorter.Work as gas
When flow is less than 1000ul/s, reaction rate is slower, and activation time is too long；When gas flow is greater than 1700ul/s, gas stream
Speed is excessive, be easy to cause equipment intracavity gas uneven, influences activation effect.
Further, in step (2), water wetted material vaporizes in Heating Cup, and the flow that water wetted material instills Heating Cup is
0.5-5ul/s, heating temperature are 75-150 DEG C.
Further, in step (3), the power that radio-frequency power supply provides is impulse wave 200-800W or continuous wave 200-
800W, equipment cavity body temperature are controlled at 40-60 DEG C, and vacuum degree is maintained within the scope of 0.01-0.2mbar.
Further, in step (3), reaction time 10-60min, the nano-hydrophilic thicknesses of layers of formation is 60-
200nm。
Further, in step (4), the clarification time of cleansing phase is 1-5min.Slow vacuum breaker makes piezoelectric ceramic vibrator
Movable plate nano surface hydrophilic film can be carried out effectively attachment and closs packing.
Further, the above method further includes pre-treatment step；
The method of pre-treatment are as follows: piezoelectric ceramic vibrator movable plate is put into temperature 45 C, humidity 5% before plating nano hydrophilic film
Constant-temperature constant-humidity environment in dry, drying time 20-45min.
Further, the above method further includes post-processing step；
The method of post-processing are as follows: by the sample sealed package after plating hydrophilic film, be placed on temperature 45 C, humidity 5%
Constant temperature and humidity environment in 20-45min.
The invention has the benefit that pressure can be improved by plating nano hydrophilic film on piezoelectric ceramic vibrator movable plate surface
The hydrophily of electroceramics vibrating reed improves the surface energy of piezoelectric ceramic vibrator movable plate, improves the surface tension of its surface liquid, carry out
Hydrophilic treated, water is in piezoelectric ceramic vibrator movable plate surface spreading, without will form round bead shape, reduces shape between vibrating reed surface and water
At the probability of air buffer, inhibit the generation of bubble, improves the efficiency of ultrasonic atomization.Pass through plasma chemical vapor deposition
Method plates nano hydrophilic film, has the advantages that quality of forming film is good.
Using not fluorine-containing water wetted material, fluorine-containing exhaust gas is not generated in production process, product is not also fluorine-containing, meets environmental protection
Requirement.
There are corresponding preceding processing and post-processing step before and after plated film, before guaranteeing plated film, substrate surface clean dried,
Be conducive to improve film quality；Post-processing then guarantees oxygen and moisture in sample isolation air, avoids film layer contaminated.In plated film
In the process, the film coating environment for keeping a continuous-stable is conducive to the effective attachment and closs packing of film layer, improves film quality,
Film layer is stronger in piezoelectric ceramic vibrator movable plate surface adventitious deposit, and hydrophilicity is more longlasting.
Specific embodiment
Technical solution of the present invention is further illustrated With reference to embodiment.
A kind of piezoelectric ceramic vibrator movable plate hydrophilic treatment method for atomizer, the described method comprises the following steps: to
It is plated and is received on the surface of piezoelectric ceramic vibrator movable plate by plasma chemical vapor deposition process in the piezoelectric ceramic vibrator movable plate of atomizer
Rice hydrophilic film, the nano hydrophilic film are directly contacted with the liquid in atomizer.
The normal charity in the surface of piezoelectric ceramic vibrator movable plate is coated with glaze layer, and glaze layer can reduce the surface tension of vibrating reed liquid, point
Binding force decline between son, bubble is declined by the power of " pulling ", and liquid internal point and atm difference are constant, therefore are being atomized
In the device course of work, the surface of piezoelectric ceramic vibrator movable plate can gather more and more bubbles, make to generate between its surface and liquid
One layer of gas interlayer, seriously affects ultrasonic atomization efficiency.The present invention is being atomized by the method for plasma chemical vapor deposition
Device piezoelectric ceramic vibrator movable plate surface plates nano hydrophilic film, and the surface energy of piezoelectric ceramic vibrator movable plate can be improved, improve its surface
The surface tension of liquid carries out hydrophilic treated, and water is in piezoelectric ceramic vibrator movable plate surface spreading, without will form round bead shape, reduces
The probability that air buffer is formed between vibrating reed surface and water, inhibits the generation of bubble, improves the hydrophilic of piezoelectric ceramic vibrator movable plate
Property, improve the efficiency of ultrasonic atomization.
Further, nano hydrophilic film is to be obtained by water wetted material by plasma reinforced chemical vapour deposition method；
The water wetted material is floride-free water wetted material, chemical general formula are as follows: R-Si- (ORX)3；Wherein ,-R is the long alkane of more carbon
Base, amount of carbon atom 3-16 ,-RXFor-Cl ,-CH3、-C2H5It is one of or a variety of.
Nano hydrophilic film is plated to piezoelectric ceramic vibrator movable plate by plasma reinforced chemical vapour deposition method, there is film forming
High-quality advantage.Using floride-free water wetted material, fluorine-containing exhaust gas is not generated in production, product is not also fluorine-containing, more meets ring
Protect nontoxic requirement.Water wetted material molecular structure is R-Si- (ORX) 3, both ends respectively to organic matter and inorganic matter have compared with
Good chemical bonded refractory resultant force, plays the role of bridge joint, the end-R can be in conjunction with organic matter ,-(ORX)3End can be in conjunction with inorganic matter.Piezoelectricity
The surface of ceramic vibrating reed is glass glaze, and main component is inorganic matter, so the hydrophilic film formed has piezoelectric ceramic vibrator movable plate
Preferable attachment combines effect.
Further, plasma chemical vapor deposition process comprises the following steps that:
(1) plasma activation is handled, and piezoelectric ceramic vibrator movable plate is placed in gas stream and is activated；
(2) water wetted material vaporizes；
(3) power is provided by radio-frequency power supply, the water wetted material of plasma gas carrier gas and vaporization carries out in equipment cavity
Crash response, make water wetted material piezoelectric ceramic vibrator movable plate surface carry out attachment and deposition form nano-hydrophilic film layer；
(4) cleansing phase: vacuum breaker.
(after the conductive sheet for packaging piezoelectric ceramic vibration on piece, piezoelectric ceramic vibrator movable plate is put into gas stream.Gas can
To be He, Ar, N2Or O2One of or multiple combinations.Corresponding plasma is generated by electric discharge, to piezoelectric ceramic vibrator movable plate
Surface, which carries out activation and function, to improve, and the surface property of piezoelectric ceramic vibrator movable plate can be improved, increase the jail of subsequent nano-coating
Solidity.By radio frequency discharge, power is provided in equipment cavity, makes the hydrophilic of plasma gas carrier gas and vaporization in equipment cavity
Material carries out crash response, generates a large amount of reactive substance, and whole system keeps at a lower temperature, to save
Energy saves the energy.By slow vacuum breaker, the nano hydrophilic film on piezoelectric ceramic vibrator movable plate surface is made to be unlikely to crack etc. occur
Phenomenon adheres to piezoelectric ceramic vibrator movable plate nano surface water wetted material effectively and closs packing.
Further, in step (1), gas flow: 1000-2500ul/s, vacuum degree are maintained at 0.04-0.2mbar model
In enclosing, activation time 1-5min.The time of activation is related with gas flow, and gas flow is bigger, and activation time is shorter.Work as gas
When flow is less than 1000ul/s, reaction rate is slower, and activation time is too long；When gas flow is greater than 1700ul/s, gas stream
Speed is excessive, be easy to cause equipment intracavity gas uneven, influences activation effect.
Further, in step (2), water wetted material vaporizes in Heating Cup, and the flow that water wetted material instills Heating Cup is
0.5-5ul/s, heating temperature are 75-150 DEG C.It is controlled by controlling additional amount and the heating temperature of water wetted material into equipment
The vapour amount of the water wetted material of chamber can guarantee that water wetted material is sufficiently sent out with plasma gas and answer, saves the dosage of water wetted material.Work as parent
When the instillation flow of water material is less than 0.5ul/s, reaction rate is too slow；When the instillation flow of water wetted material is greater than 5ul/s, entrance
The vapour amount of the water wetted material of equipment cavity is too big, can not sufficiently send out and answer with plasma gas, waste of energy.
Further, in step (3), the power that radio-frequency power supply provides is impulse wave 200-800W or continuous wave 200-
800W, equipment cavity body temperature are controlled at 40-60 DEG C, and vacuum degree is maintained within the scope of 0.01-0.2mbar.By radio frequency discharge,
Power is provided in equipment cavity, the water wetted material of plasma gas carrier gas and vaporization in equipment cavity is made to carry out crash response,
Generate a large amount of reactive substance.When power is lower than 200W, the reactive substance of generation is very little, and the rate of reaction is too
Slowly；When power is higher than 800W, the reactive substance of generation is too many, can not sufficiently react, cause energy waste.
Further, in step (3), reaction time 10-60min, the nano-hydrophilic thicknesses of layers of formation is 60-
200nm.In coating process, it is maintained to send out in a stable film coating environment and answers, be conducive to film layer is conducive to having for film layer
Effect attachment and closs packing, improve film quality, film layer is stronger in piezoelectric ceramic vibrator movable plate surface adventitious deposit, ensure that hydrophilic
The persistence of performance.Reaction time is related with the thickness requirements of nano hydrophilic film, and the reaction time is longer, the thickness of nano hydrophilic film
It is bigger.
Further, in step (4), the clarification time of cleansing phase is 1-5min.Slow vacuum breaker makes piezoelectric ceramic vibrator
Movable plate nano surface hydrophilic film can be carried out effectively attachment and closs packing.The time of vacuum breaker has with plated film vacuum degree and plated film time
It closes, plated film vacuum degree is bigger, and the vacuum breaker time is longer, and plated film time is longer, and the vacuum breaker time is longer.
Further, the above method further includes pre-treatment step；
The method of pre-treatment are as follows: piezoelectric ceramic vibrator movable plate is put into temperature 45 C, humidity 5% before plating nano hydrophilic film
Constant-temperature constant-humidity environment in dry, drying time 20-45min.Corresponding pre-treatment step is carried out before plated film, it is ensured that
Before plated film, the clean surface of piezoelectric ceramic vibrator movable plate is dry, is conducive to improve film quality.
Further, the above method further includes post-processing step；
The method of post-processing are as follows: by the sample sealed package after plating hydrophilic film, be placed on temperature 45 C, humidity 5%
Constant temperature and humidity environment in 20-45min.It is post-processed after plating nano-hydrophilic membrane process, guarantees that sample isolation is empty
It is contaminated to avoid film layer well for oxygen and moisture in gas.
The present invention is further illustrated by the following examples.
The piezoelectric ceramic vibrator movable plate hydrophilic treatment method for atomizer in embodiment 1-5, the following steps are included:
(1) plasma activation is handled, and piezoelectric ceramic vibrator movable plate is placed in gas stream and is activated；
(2) water wetted material vaporizes；
(3) power is provided by radio-frequency power supply, the water wetted material of plasma gas carrier gas and vaporization carries out in equipment cavity
Crash response, make water wetted material piezoelectric ceramic vibrator movable plate surface carry out attachment and deposition form nano-hydrophilic film layer；
(4) cleansing phase: vacuum breaker
Before step (1), processing before piezoelectric ceramic vibrator movable plate is carried out in constant-temperature constant-humidity environment.Step (4) it
Afterwards to plating hydrophilic film piezoelectric ceramic vibrator movable plate post-process: by through plate hydrophilic film piezoelectric ceramic vibrator movable plate sealed package,
It is placed in constant-temperature constant-humidity environment.
The chemical general formula of water wetted material in embodiment 1-6 is R-Si- (ORX)3；Wherein, R is more carbon chain alkyls, and carbon is former
Subnumber amount 3-16；-RXFor-Cl ,-CH3、-C2H5It is one of or a variety of.
Each step parameter is as shown in the table in embodiment 1-6.
To embodiment 1-6 obtain the piezoelectric ceramic vibrator movable plate for being coated with hydrophilic film and non-plated film piezoelectric ceramic vibrator movable plate into
Row test, test result is as follows shown in table.
| Sample serial number | Embodiment 1 | Embodiment 2 | Embodiment 3 | Embodiment 4 | Embodiment 5 | Embodiment 6 | Membrane sample is not plated |
| 1 | 32.0° | 30.0° | 28.0° | 17.6° | 29.1° | 12.0° | 73.1° |
| 2 | 28.5° | 29.5° | 26.0° | 17.1° | 27.8° | 10.5° | 69.5° |
| 3 | 27.6° | 25.6° | 26.2° | 13.8° | 29.6° | 13.8° | 69.9° |
| 4 | 30.2° | 26.2° | 28.2° | 17.8° | 28.4° | 15.6° | 68.8° |
| 5 | 29.5° | 31.5° | 24.2° | 19.3° | 25.7° | 11.5° | 72.7° |
| 6 | 30.2 | 28.2 | 27.6 | 16.2 | 27.9 | 10.2 | 71.5° |
The piezoelectric ceramic vibrator movable plate and non-plated film piezoelectric ceramic vibrator movable plate that embodiment 1-5 is obtained are separately mounted to atomizer
On, atomizer continues working whether observation piezoelectric ceramic vibrator movable plate surface bubble occurs, as a result as shown in the table.
The technical principle of the invention is described above in combination with a specific embodiment.These descriptions are intended merely to explain of the invention
Principle, and shall not be construed in any way as a limitation of the scope of protection of the invention.Based on the explanation herein, the technology of this field
Personnel can associate with other specific embodiments of the invention without creative labor, these modes are fallen within
Within protection scope of the present invention.
Claims (10)
1. a kind of piezoelectric ceramic vibrator movable plate hydrophilic treatment method for atomizer, which is characterized in that the method includes following
Step: to the piezoelectric ceramic vibrator movable plate for atomizer by plasma chemical vapor deposition process in piezoelectric ceramic vibrator movable plate
Nano hydrophilic film is plated on surface, and the nano hydrophilic film is directly contacted with the liquid in atomizer.
2. the piezoelectric ceramic vibrator movable plate hydrophilic treatment method according to claim 1 for atomizer, which is characterized in that institute
Stating nano hydrophilic film is to be obtained by water wetted material by plasma reinforced chemical vapour deposition method；
The water wetted material is floride-free water wetted material, chemical general formula are as follows: R-Si- (ORX)3；Wherein, R is more carbon chain alkyls, carbon
Atomic quantity 3-16 ,-RXFor-Cl ,-CH3、-C2H5It is one of or a variety of.
3. the piezoelectric ceramic vibrator movable plate hydrophilic treatment method according to claim 1 for atomizer, which is characterized in that institute
Plasma chemical vapor deposition process is stated to comprise the following steps that:
(1) plasma activation is handled, and piezoelectric ceramic vibrator movable plate is placed in gas stream and is activated；
(2) water wetted material vaporizes；
(3) power is provided by radio-frequency power supply, the water wetted material of plasma gas carrier gas and vaporization is collided in equipment cavity
Reaction, make water wetted material piezoelectric ceramic vibrator movable plate surface carry out attachment and deposition form nano-hydrophilic film layer；
(4) cleansing phase: vacuum breaker.
4. the piezoelectric ceramic vibrator movable plate hydrophilic treatment method according to claim 3 for atomizer, which is characterized in that institute
State in step (1), gas flow: 1000-2500ul/s, vacuum degree are maintained within the scope of 0.04-0.2mbar, activation time 1-
5min。
5. the piezoelectric ceramic vibrator movable plate hydrophilic treatment method according to claim 3 for atomizer, which is characterized in that institute
It states in step (2), water wetted material vaporizes in Heating Cup, and the flow that water wetted material instills Heating Cup is 0.5-5ul/s, heating temperature
Degree is 75-150 DEG C.
6. the piezoelectric ceramic vibrator movable plate hydrophilic treatment method according to claim 3 for atomizer, which is characterized in that institute
It states in step (3), the power that radio-frequency power supply provides is impulse wave 200-800W or continuous wave 200-800W, equipment cavity body temperature
At 40-60 DEG C, vacuum degree is maintained within the scope of 0.01-0.2mbar for control.
7. the piezoelectric ceramic vibrator movable plate hydrophilic treatment method according to claim 3 for atomizer, which is characterized in that institute
It states in step (3), reaction time 10-60min, the nano-hydrophilic thicknesses of layers of formation is 60-200nm.
8. the piezoelectric ceramic vibrator movable plate hydrophilic treatment method according to claim 3 for atomizer, which is characterized in that institute
It states in step (4), the clarification time of cleansing phase is 1-5min.
9. the piezoelectric ceramic vibrator movable plate hydrophilic treatment method according to claim 1-8 for atomizer, special
Sign is, further includes pre-treatment step；
The method of pre-treatment are as follows: piezoelectric ceramic vibrator movable plate is put into temperature 45 C, the perseverance of humidity 5% before plating nano hydrophilic film
It is dried in constant temperature and humidity environment, drying time 20-45min.
10. the piezoelectric ceramic vibrator movable plate hydrophilic treatment method according to claim 1-8 for atomizer, special
Sign is, further includes post-processing step；
The method of post-processing are as follows: by the sample sealed package after plating hydrophilic film, be placed on temperature 45 C, the perseverance of humidity 5%
20-45min in the environment of constant temperature and humidity.
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