CN111020530A - Chemical vapor deposition furnace with air inlet at two ends - Google Patents
Chemical vapor deposition furnace with air inlet at two ends Download PDFInfo
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- CN111020530A CN111020530A CN201911363720.3A CN201911363720A CN111020530A CN 111020530 A CN111020530 A CN 111020530A CN 201911363720 A CN201911363720 A CN 201911363720A CN 111020530 A CN111020530 A CN 111020530A
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- air inlet
- furnace
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/455—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for introducing gases into reaction chamber or for modifying gas flows in reaction chamber
- C23C16/45523—Pulsed gas flow or change of composition over time
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/52—Controlling or regulating the coating process
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- Chemical & Material Sciences (AREA)
- General Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Physical Vapour Deposition (AREA)
Abstract
The invention discloses a chemical vapor deposition furnace with air inlet at two ends, which comprises an air inlet system, a deposition furnace, an air exhaust system and a control device, wherein the deposition furnace comprises a steel body shell and a graphite crucible for accommodating a workpiece to be subjected to vapor deposition, the steel body shell is covered outside the graphite crucible, the two ends of the deposition furnace are respectively provided with an air inlet and an air outlet which are communicated with the graphite crucible, the two air inlets are connected with the air inlet system, and the two air outlets are connected with the air exhaust system; the control device controls the opening and closing of the air inlet and the air outlet, so that only one group of air inlet and air outlet are opened at the same time. The chemical vapor deposition furnace with air inlet at two ends has the advantages of simplicity, practicability, capability of improving the uniformity of the concentration of internal gas and the uniformity of the thickness of a coating of a product and the like.
Description
Technical Field
The invention relates to the field of vapor deposition, in particular to a chemical vapor deposition furnace with air entering from two ends.
Background
The existing chemical vapor deposition furnace is a furnace body with one end provided with a gas inlet and the other end provided with a gas outlet, the ventilation direction is single, the gas concentration near the gas inlet is often higher than that near the gas outlet, the thickness of the coating of the product is uneven, and the quality of the product is reduced.
Disclosure of Invention
The invention aims to overcome the defects of the prior art and provide the chemical vapor deposition furnace which is simple and practical and can improve the uniformity of the concentration of the internal gas and the uniformity of the thickness of a coating of a product.
In order to solve the technical problems, the technical scheme provided by the invention is as follows:
a chemical vapor deposition furnace with air inlet at two ends comprises an air inlet system, a deposition furnace, an air exhaust system and a control device, wherein the deposition furnace comprises a steel body shell and a graphite crucible for accommodating a workpiece to be subjected to vapor deposition, the steel body shell is covered outside the graphite crucible, air inlets and air outlets which are communicated with the graphite crucible are arranged at two ends of the deposition furnace, the two air inlets are connected with the air inlet system, and the two air outlets are connected with the air exhaust system; the control device controls the opening and closing of the air inlet and the air outlet, so that only one group of air inlet and air outlet are opened at the same time.
As a further improvement of the above technical solution:
the deposition furnace also comprises an air inlet pipe communicated with the air inlet and the air inlet system and an air outlet pipe communicated with the air outlet and the air exhaust system, the control device comprises valve bodies respectively arranged on the air inlet pipe and the air outlet pipe, and the valve bodies control the flow direction of air in the air inlet pipe and the air outlet pipe so as to control the opening and closing of each air inlet and each air outlet.
The air inlet pipe connecting the two air inlets and the air inlet system is a three-way pipe; the air outlet pipe connecting the two air outlets and the air pumping system is a three-way pipe; the valve body is arranged at each air inlet and each air outlet.
The interior of the deposition furnace is provided with splitter plates at two ends, one end face of each splitter plate is connected with the air inlet, and a plurality of through holes which are uniformly distributed are formed in the other end face of each splitter plate.
The deposition furnace is divided into an upper part and a lower part along a plane vertical to the axis, furnace bodies of the two parts of the deposition furnace are detachably connected, and workpieces are taken and placed when the two parts of the furnace bodies are separated.
One part of the furnace body of the deposition furnace is fixed, and the other part of the furnace body moves along the axis direction under the driving of the driving piece so as to be close to the fixed furnace body and connected with the fixed furnace body to form the deposition furnace, or leave the fixed furnace body to form an opening for taking and placing workpieces.
The outside of graphite crucible encloses and is equipped with the graphite heat-generating body, steel body shell, graphite crucible and graphite heat-generating body are the two parts of connecting with dismantling that correspond with the furnace body, controlling means control graphite heat-generating body's calorific capacity makes the partial furnace body internal temperature that the air inlet was opened be less than the partial furnace body internal temperature that the gas outlet was opened.
The graphite heating body is provided with a heat-insulating layer on the periphery, and the heat-insulating layer is also two parts which correspond to the furnace body and are detachably connected.
The edge homoenergetic that can dismantle the connection in steel body shell, graphite crucible, graphite heat-generating body and the heat preservation can closely laminate, and has the sealing washer to seal in the edge of the connection of dismantling of steel body shell.
Compared with the prior art, the invention has the advantages that:
the invention discloses a chemical vapor deposition furnace with air inlet at two ends, which comprises an air inlet system, a deposition furnace, an air exhaust system and a control device. The both ends of sedimentation stove all are equipped with air inlet and the gas outlet of intercommunication graphite crucible, wherein distribute in an air inlet and a gas outlet at sedimentation stove both ends and be a set of, controlling means controls opening and close of air inlet and gas outlet, make in the same time have and only a set of air inlet and gas outlet open, two sets of air inlets and gas outlet replace to open and close promptly, let the gaseous flow direction in the stove take place periodic change, effectively avoided the gaseous concentration in the stove that the gas flow direction is single to cause uneven, the uneven scheduling problem of work piece coating thickness. Under the regulation and control of the control device, when the gas concentration near the gas outlet is reduced compared with the gas concentration near the gas inlet in the starting process of one group, the other group is switched, and the gas inlet direction and the gas outlet direction are exchanged at the moment, so that the regulating effect is achieved, the gas concentration in the furnace is always kept in a uniform and stable state, the uniformity of the thickness of a deposited coating of a workpiece is favorably improved, and the stability and the reliability of the deposition process are favorably improved. In addition, the regulation and control time interval of the control device can be adjusted according to the specific working condition of the vapor deposition process, so that the processing quality of the workpiece is better improved.
Drawings
FIG. 1 is a schematic view of a double-inlet CVD furnace according to the present invention.
Illustration of the drawings: 1. an air intake system; 2. a deposition furnace; 21. a steel body shell; 22. a graphite crucible; 221. a graphite heating element; 222. a heat-insulating layer; 23. an air inlet; 24. an air outlet; 25. an air inlet pipe; 26. an air outlet pipe; 27. a flow distribution plate; 3. an air extraction system; 4. a valve body.
Detailed Description
In order to facilitate an understanding of the invention, the invention will be described more fully and in detail below with reference to the accompanying drawings and preferred embodiments, but the scope of the invention is not limited to the specific embodiments below.
Example (b):
as shown in fig. 1, the chemical vapor deposition furnace with two ends for air intake of the embodiment includes an air intake system 1, a deposition furnace 2, an air exhaust system 3 and a control device, wherein the deposition furnace 2 includes a steel body housing 21 and a graphite crucible 22 for accommodating a workpiece to be vapor deposited, the steel body housing 21 is covered outside the graphite crucible 22, two ends of the deposition furnace 2 are respectively provided with an air inlet 23 and an air outlet 24 which are communicated with the graphite crucible 22, the two air inlets 23 are connected with the air intake system 1, and the two air outlets 24 are connected with the air exhaust system 3; an air inlet 23 and an air outlet 24 distributed at two ends of the deposition furnace 2 are in a group, and the control device controls the opening and closing of the air inlet 23 and the air outlet 24, so that only one group of air inlet 23 and air outlet 24 are opened at the same time.
In the arrangement mode, the two groups of air inlets 23 and the two groups of air outlets 24 are opened and closed alternately, so that the flow direction of gas in the furnace is changed periodically, and the problems of uneven gas concentration in the furnace, uneven thickness of a workpiece coating and the like caused by single gas flow direction are effectively avoided. Under the regulation and control of the control device, when the gas concentration near the gas outlet 24 is reduced compared with the gas concentration near the gas inlet 23 in the starting process of one group, the other group is switched, and the gas inlet direction and the gas outlet direction are exchanged at the moment, so that the regulation effect is realized, the gas concentration in the furnace is always kept in a uniform and stable state, the uniformity of the thickness of the deposited coating of the workpiece is favorably improved, and the stability and the reliability of the deposition process are favorably improved. In addition, the regulation and control time interval of the control device can be adjusted according to the specific working condition of the vapor deposition process, so that the processing quality of the workpiece is better improved.
In this embodiment, the deposition furnace 2 further includes an air inlet pipe 25 communicating the air inlet 23 with the air inlet system 1, and an air outlet pipe 26 communicating the air outlet 24 with the air pumping system 3, the control device includes a valve body 4 respectively disposed on the air inlet pipe 25 and the air outlet pipe 26, and the valve body 4 controls the flow direction of the air in the air inlet pipe 25 and the air outlet pipe 26 to control the opening and closing of each air inlet 23 and each air outlet 24. The air inlet pipe 25 connecting the two air inlets 23 and the air inlet system 1 is a three-way pipe; the air outlet pipe 26 connecting the two air outlets 24 and the air pumping system 3 is a three-way pipe; the valve bodies 4 are arranged at the air inlets 23 and the air outlets 24, and the control device regulates and controls the flow direction of the gas by adjusting the on-off of the valve bodies 4. In other embodiments, the valve body 4 may be a three-way valve at the junction of the three-way pipe, which is not described herein.
In this embodiment, the interior of the deposition furnace 2 is provided with the splitter plate 27 at two ends, one end face of the splitter plate 27 is connected with the air inlet 23, and the other end face is provided with a plurality of through holes which are uniformly distributed. The gas introduced by the gas inlet 23 is dispersed by the plurality of through holes, so that the dispersion speed and the uniformity of the gas in the deposition furnace 2 are further improved, the working efficiency of the chemical vapor deposition furnace is improved, and the processing quality of the chemical vapor deposition furnace is ensured. The splitter plate 27 is provided with a clearance hole which is not communicated with the inside of the splitter plate 27, and the air outlet 24 passes through the clearance hole of the splitter plate 27 to be communicated with the inside of the graphite crucible 22, so that the air outlet 24 and the splitter plate 27 are not interfered with each other.
In this embodiment, the deposition furnace 2 is divided into an upper part and a lower part along a plane perpendicular to the axis, the two furnace bodies of the deposition furnace 2 are detachably connected, a workpiece to be vapor-deposited is fed into the graphite crucible 22 when the two furnace bodies are separated, and the workpiece is taken out when the two furnace bodies are separated after vapor deposition. The general deposition furnace 2 is a high-column furnace body arranged along the axis direction, the existing deposition furnace 2 is used for taking and placing workpieces from the bottom or the top, time and labor are consumed, the workpieces cannot reach expected positions possibly after penetrating deeply, the problem is solved by the arrangement mode of the embodiment, the workpieces are easy to take and place, the positions of the workpieces are convenient to observe, and the workpieces can be placed exactly at proper positions.
In this embodiment, a part of the deposition furnace 2 is fixed, and the other part of the deposition furnace is driven by the driving member to move up and down along the axis direction so as to be close to the fixed furnace and connected with the fixed furnace to form the deposition furnace 2, or leave the fixed furnace to form an opening for taking and placing a workpiece.
In this embodiment, the graphite heating element 221 is disposed around the graphite crucible 22, the steel body housing 21, the graphite crucible 22 and the graphite heating element 221 are detachably connected to the furnace body, and the control device controls the heating value of the graphite heating element 221 so that the temperature in the furnace body in which the air inlet 23 is opened is lower than the temperature in the furnace body in which the air outlet 24 is opened. According to the chemical vapor deposition law, the higher the gas concentration is, the faster the deposition rate is, and the higher the temperature is, the faster the deposition rate is, in this embodiment, the lower the temperature is set at the gas inlet 23 with the higher gas concentration, and the higher the temperature is set at the gas outlet 24 with the lower gas concentration, so that the rapid deposition caused by the high gas concentration in a part of the furnace body opened by the gas inlet 23 can be counteracted to a certain extent, and thus, the upper and lower deposition rates in the furnace are further balanced, and the two deposition rates are more approximate to be consistent.
In this embodiment, the heat insulating layer 222 is disposed on the periphery of the graphite heating element 221, so as to prevent energy waste caused by heat dissipation, and ensure continuous and stable working temperature, and the heat insulating layer 222 is also detachably connected to the furnace body.
In this embodiment, the edge homoenergetic that can dismantle the connection in steel body shell 21, graphite crucible 22, graphite heat-generating body 221 and the heat preservation 222 closely laminates, and has the sealing washer to seal in the edge of the connection of dismantling of steel body shell 21, can avoid the outside air to get into when closing the stove.
The above description is only a preferred embodiment of the present invention, and the protection scope of the present invention is not limited to the above-described embodiments. It should be apparent to those skilled in the art that modifications and variations can be made without departing from the technical spirit of the present invention.
Claims (9)
1. The utility model provides a chemical vapor deposition furnace that both ends were admitted air, includes air intake system (1), deposition furnace (2), air exhaust system (3) and controlling means, deposition furnace (2) include steel body shell (21) and be used for holding graphite crucible (22) of treating vapor deposition's work piece, and the outside of graphite crucible (22) is located in steel body shell (21) cover, its characterized in that: both ends of the deposition furnace (2) are provided with an air inlet (23) and an air outlet (24) which are communicated with the graphite crucible (22), the two air inlets (23) are connected with the air inlet system (1), and the two air outlets (24) are connected with the air exhaust system (3); an air inlet (23) and an air outlet (24) which are distributed at two ends of the deposition furnace (2) form a group, and the control device controls the opening and closing of the air inlet (23) and the air outlet (24) to ensure that only one group of air inlet (23) and one group of air outlet (24) are opened at the same time.
2. The double-end-feed chemical vapor deposition furnace of claim 1, wherein: the deposition furnace (2) further comprises an air inlet pipe (25) communicated with the air inlet (23) and the air inlet system (1) and an air outlet pipe (26) communicated with the air outlet (24) and the air exhaust system (3), the control device comprises a valve body (4) respectively arranged on the air inlet pipe (25) and the air outlet pipe (26), and the valve body (4) controls the flow direction of air in the air inlet pipe (25) and the air outlet pipe (26) so as to control the opening and closing of each air inlet (23) and each air outlet (24).
3. The double-end-feed chemical vapor deposition furnace of claim 2, wherein: the air inlet pipe (25) connecting the two air inlets (23) and the air inlet system (1) is a three-way pipe; the air outlet pipe (26) connecting the two air outlets (24) and the air pumping system (3) is a three-way pipe; the valve body (4) is arranged at each air inlet (23) and each air outlet (24).
4. The double-end-feed chemical vapor deposition furnace of claim 1, wherein: the interior of the deposition furnace (2) is provided with splitter plates (27) at two ends, one end face of each splitter plate (27) is connected with the air inlet (23), and a plurality of through holes which are uniformly distributed are formed in the other end face.
5. The double-end-feed chemical vapor deposition furnace of claim 1, wherein: the deposition furnace (2) is divided into an upper part and a lower part along a plane vertical to the axis, the two parts of the furnace body of the deposition furnace (2) are detachably connected, and workpieces are taken and placed when the two parts of the furnace body are separated.
6. The double-end-feed chemical vapor deposition furnace of claim 5, wherein: one part of the furnace body of the deposition furnace (2) is fixed, and the other part of the furnace body moves along the axis direction under the driving of the driving piece so as to be close to the fixed furnace body and connected with the fixed furnace body to form the deposition furnace (2) or leave the fixed furnace body to form an opening for taking and placing workpieces.
7. The double-end-feed chemical vapor deposition furnace of claim 5, wherein: the outside of graphite crucible (22) is enclosed and is equipped with graphite heat-generating body (221), steel body shell (21), graphite crucible (22) and graphite heat-generating body (221) are the two parts of connecting with dismantling that the furnace body corresponds, controlling means control the calorific capacity of graphite heat-generating body (221), make the partial furnace body internal temperature that air inlet (23) was opened be less than the partial furnace body internal temperature that gas outlet (24) was opened.
8. The double-end-feed chemical vapor deposition furnace of claim 7, wherein: an insulating layer (222) is arranged on the periphery of the graphite heating body (221), and the insulating layer (222) is also two parts which correspond to the furnace body and are detachably connected.
9. The double-end-feed chemical vapor deposition furnace of claim 8, wherein: the edge homoenergetic that can dismantle the connection in steel body shell (21), graphite crucible (22), graphite heat-generating body (221) and heat preservation (222) closely laminates, and has the sealing washer to seal in the edge of the connection of dismantling of steel body shell (21).
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201911363720.3A CN111020530B (en) | 2019-12-26 | 2019-12-26 | Chemical vapor deposition furnace with air inlet at two ends |
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| Application Number | Priority Date | Filing Date | Title |
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| CN201911363720.3A CN111020530B (en) | 2019-12-26 | 2019-12-26 | Chemical vapor deposition furnace with air inlet at two ends |
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| CN111020530A true CN111020530A (en) | 2020-04-17 |
| CN111020530B CN111020530B (en) | 2022-08-05 |
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Cited By (5)
| Publication number | Priority date | Publication date | Assignee | Title |
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| CN111735304A (en) * | 2020-06-18 | 2020-10-02 | 北京北方华创微电子装备有限公司 | Semiconductor device |
| CN112663024A (en) * | 2020-12-11 | 2021-04-16 | 中材人工晶体研究院有限公司 | CVD equipment for preparing optical ZnS material |
| CN112921302A (en) * | 2021-01-22 | 2021-06-08 | 无锡松煜科技有限公司 | Bidirectional air intake passivation deposition device for photovoltaic cell |
| CN113680093A (en) * | 2021-09-01 | 2021-11-23 | 启东柯兰机电设备有限公司 | Low-temperature hydrogen purification device and control method |
| CN113718228A (en) * | 2020-05-26 | 2021-11-30 | 浙江上方电子装备有限公司 | Substrate coating system |
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| CN112663024A (en) * | 2020-12-11 | 2021-04-16 | 中材人工晶体研究院有限公司 | CVD equipment for preparing optical ZnS material |
| CN112921302A (en) * | 2021-01-22 | 2021-06-08 | 无锡松煜科技有限公司 | Bidirectional air intake passivation deposition device for photovoltaic cell |
| CN113680093A (en) * | 2021-09-01 | 2021-11-23 | 启东柯兰机电设备有限公司 | Low-temperature hydrogen purification device and control method |
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| Publication number | Publication date |
|---|---|
| CN111020530B (en) | 2022-08-05 |
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