CN110941132A - Light source structure, optical projection module, sensing device and equipment - Google Patents

Light source structure, optical projection module, sensing device and equipment Download PDF

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CN110941132A
CN110941132A CN201811107492.9A CN201811107492A CN110941132A CN 110941132 A CN110941132 A CN 110941132A CN 201811107492 A CN201811107492 A CN 201811107492A CN 110941132 A CN110941132 A CN 110941132A
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light
light emitting
pattern
source structure
emitting
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CN110941132B (en
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田浦延
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Shenzhen Fushi Technology Co Ltd
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Shenzhen Fushi Technology Co Ltd
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    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03BAPPARATUS OR ARRANGEMENTS FOR TAKING PHOTOGRAPHS OR FOR PROJECTING OR VIEWING THEM; APPARATUS OR ARRANGEMENTS EMPLOYING ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ACCESSORIES THEREFOR
    • G03B21/00Projectors or projection-type viewers; Accessories therefor
    • G03B21/14Details
    • G03B21/20Lamp housings
    • G03B21/2006Lamp housings characterised by the light source
    • G03B21/2033LED or laser light sources
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01BMEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B11/00Measuring arrangements characterised by the use of optical techniques
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03BAPPARATUS OR ARRANGEMENTS FOR TAKING PHOTOGRAPHS OR FOR PROJECTING OR VIEWING THEM; APPARATUS OR ARRANGEMENTS EMPLOYING ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ACCESSORIES THEREFOR
    • G03B21/00Projectors or projection-type viewers; Accessories therefor
    • G03B21/14Details
    • G03B21/20Lamp housings
    • G03B21/2006Lamp housings characterised by the light source
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03BAPPARATUS OR ARRANGEMENTS FOR TAKING PHOTOGRAPHS OR FOR PROJECTING OR VIEWING THEM; APPARATUS OR ARRANGEMENTS EMPLOYING ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ACCESSORIES THEREFOR
    • G03B21/00Projectors or projection-type viewers; Accessories therefor
    • G03B21/14Details
    • G03B21/20Lamp housings
    • G03B21/2006Lamp housings characterised by the light source
    • G03B21/2013Plural light sources

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Length Measuring Devices By Optical Means (AREA)

Abstract

The application is applicable to the technical field of optics and electronics, and provides a light source structure for emitting irregularly distributed light spot patterns. The light source structure comprises a semiconductor substrate and a plurality of irregularly distributed light emitting units formed on the semiconductor substrate. A pattern light emitting region is defined on the light emitting surface of the semiconductor substrate. The pattern light emitting area is rectangular. And taking the vertex of the lower left corner of the pattern light emitting area as an origin, and the extending directions of two right-angle sides intersected at the lower left corner are an abscissa axis and an ordinate axis respectively, wherein the coordinate unit is micrometer, and the plurality of light emitting units are distributed in the pattern light emitting area. The application also provides an optical projection module, a sensing device and equipment comprising the light source structure.

Description

Light source structure, optical projection module, sensing device and equipment
Technical Field
The application belongs to the technical field of optics, especially relates to a light source structure, optical projection module, biological identification device and equipment.
Background
The conventional Three-Dimensional (3D) sensing module uses a light source having light emitting units distributed irregularly to project light spot patterns distributed irregularly on a target object to sense Three-Dimensional information of the target object. When three-dimensional sensing is performed, the irregular light spot pattern projected onto the measured target object needs to be compared with the standard irregular light spot pattern projected onto the reference plane for analysis, and three-dimensional data of the position of the measured target object where the light spot is located is calculated according to the deformation of the corresponding light spot.
Therefore, the time taken to correspond the irregularly-distributed light spots projected onto the target object to be measured to the standard irregularly-distributed light spots projected onto the reference plane one by one becomes an important factor in determining the sensing speed. The corresponding method is to divide the irregular light spot pattern into a plurality of search areas according to a preset area for searching and comparing in sequence, so the arrangement positions of the irregularly distributed light-emitting units on the light source are reasonably designed to improve the uniqueness of the light spot distribution in different search areas, namely the Hamming distance of the light spot distribution in different search areas is improved, which becomes the key point for solving the problem. In order to obtain a higher hamming distance, the light-emitting area of the light source is generally increased to make the light-emitting units have more possible arrangement, but the cost is increased while the light-emitting area of the light source is increased, and the larger light source structure is not favorable for the miniaturization design of products.
Disclosure of Invention
The technical problem that this application will be solved lies in providing a light source structure, optics projection module, biological identification device and equipment, can highly integrate flood and light pattern projection function, reaches the beneficial effect of miniaturization and reduce cost.
The embodiment of the application provides a light source structure, which is used for emitting irregularly distributed light spot patterns. The light source structure comprises a semiconductor substrate and a plurality of irregularly distributed light emitting units formed on the semiconductor substrate. A pattern light emitting region is defined on the light emitting surface of the semiconductor substrate. The pattern light-emitting area is rectangular, the vertex of the lower left corner of the pattern light-emitting area is taken as an origin, the extending directions of two right-angle sides intersected at the lower left corner are an abscissa axis and an ordinate axis respectively, and a coordinate system is established by taking the coordinate unit as micrometer to describe the position of the light-emitting unit. The distribution pattern of the light emitting cells is selected from one of a plurality of kinds of first light emitting cell distribution patterns obtained by adding or subtracting one or more light emitting cells or changing the positions of one or more light emitting cells in a basic light emitting cell distribution pattern having one hundred light emitting cells whose coordinate values are: p1(170.55,157.95); p2(146.25,145.35); p3(189.45,177.75); p4(175.95, 91.35); p5(202.95, 89.55); p6(211.95,193.95); p7(230.85,174.15); p8(125.55,220.05); p9(213.75, 40.95); p10(186.75, 39.15); p11(10.35,153.45); p12(95.85, 94.05); p13(171.45, 61.65); p14(186.75, 12.15); p15(105.75,254.25); p16(120.15,152.55); p17(227.25,108.45); p18(71.55,107.55); p19(343.35,108.45); p20(247.05, 68.85); p21(46.35,119.25); p22(65.25, 80.55); p23(201.15,276.75); p24(254.25,113.85); p25(108.45,281.25); p26(192.15,250.65); p27(27.45,191.25); p28(40.05,166.95); p29(22.05, 94.95); p30(22.05, 67.95); p31(71.55,220.05); p32(262.35, 16.65); p33(49.05,235.35); p34(227.25,267.75); p35(112.05, 71.55); p36(5.85,274.95); p37(139.95, 67.05); p38(35.55, 43.65); p39(25.65,249.75); p40(76.95,134.55); p41(4.95,219.15); p42(280.35,106.65); p43(327.15,161.55); p44(93.15, 31.95); p45(52.65,262.35); p46(275.85,281.25); p47(8.55, 37.35); p48(60.75, 33.75); p49(42.75, 13.05); p50(87.75, 58.95); p51(175.05,130.05); p52(199.35,142.65); p53(156.15,110.25); p54(169.65,196.65); p55(142.65,198.45); p56(133.65, 94.05); p57(114.75,113.85); p58(220.05, 67.95); p59(131.85,247.05); p60(158.85,248.85); p61(335.25,134.55); p62(249.75,193.95); p63(174.15,226.35); p64(158.85,275.85); p65(239.85, 33.75); p66(225.45,135.45); p67(118.35,179.55); p68(274.05,180.45); p69(2.25,179.55); p70(98.55,219.15); p71(299.25,168.75); p72(280.35,207.45); p73(144.45, 11.25); p74(91.35,174.15); p75(237.15, 6.75); p76(153.45, 37.35); p77(318.15, 96.75); p78(305.55,121.05); p79(323.55,193.05); p80(323.55,220.05); p81(274.05, 67.95); p82(83.25,271.35); p83(296.55, 52.65); p84(118.35, 20.25); p85(233.55,216.45); p86(339.75, 13.05); p87(205.65,220.95); p88(310.05,244.35); p89(319.95, 38.25); p90(268.65,153.45); p91(340.65, 68.85); p92(65.25,181.35); p93(18.45,126.45); p94(252.45,256.05); p95(292.95, 25.65); p96(69.75, 6.75); p97(337.05,250.65); p98(284.85,254.25); p99(302.85,274.95); p100(257.85,229.05). The degree of similarity between the first light emitting cell distribution pattern and the base light emitting cell distribution pattern is equal to or exceeds a preset threshold. The similarity threshold is defined in such a manner that the first light emitting unit pattern is subjected to a limited number of graphic transformations without changing the correlation between the light emitting units to obtain a second light emitting unit pattern having the same orientation as the basic light emitting unit distribution pattern and the same size of light emitting units. The similarity value calculated by the second light-emitting unit pattern and the basic light-emitting unit distribution pattern by using a normalized correlation coefficient matching method is equal to or more than a preset threshold value of 0.25.
In some embodiments, the pattern transformation that does not change the correlation between the light emitting units includes translation, rotation, left-right mirroring, up-down mirroring, and 180 degree flipping.
In some embodiments, the light emitting unit is a vertical cavity surface emitting laser.
In some embodiments, the light source structure further comprises one or more flood light emitting areas symmetrically distributed around the pattern light emitting area, the flood light emitting areas emitting light beams for forming a flood light beam with uniform light intensity distribution, each of the flood light emitting areas having one or more luminous bodies formed therein, the luminous bodies being formed on the same semiconductor substrate as the light emitting units in the pattern light emitting areas and being independently controllable to emit light.
In some embodiments, a single light emitter is formed in each of the flood light emitting regions, and the single light emitter can be a single aperture broad area vertical cavity surface emitting laser.
In some embodiments, a plurality of light emitters are formed in each floodlight emitting region, the light emitters are uniformly arranged in the floodlight emitting region at preset same intervals, and the light emitters are vertical cavity surface emitting lasers.
In some embodiments, the floodlight emitting area is a box surrounding the pattern light emitting area by one turn outside the pattern light emitting area, and the minimum distance D between the floodlight emitting area and the pattern light emitting area satisfies the condition
Figure BDA0001808251220000041
Where H is a distance between the light emitting surface of the light source structure and a first optical element arranged in order above the light source structure, and θ is a maximum divergence angle of light beams emitted from the floodlight emitting area and the pattern light emitting area.
In some embodiments, the light emitting device further includes a floodlight emitting portion, the floodlight emitting portion includes a light emitting body and a light guide plate formed on a floodlight emitting semiconductor substrate, the light guide plate includes a light incident surface and a light emergent surface, the floodlight emitting semiconductor substrate is disposed corresponding to the light incident surface of the light guide plate, the light emitting body emits a light beam toward the light incident surface of the light guide plate, the light beam emitted by the light emitting body is incident into the light guide plate from the light incident surface and is uniformly mixed, and then a light beam with uniform light intensity is projected from the light emergent surface, and the semiconductor substrate formed with a plurality of irregularly distributed light emitting units is disposed in the middle of the light emergent surface of the light guide plate to.
In some embodiments, the light emitter is a vertical cavity surface emitting laser.
The embodiment of the present application further provides an optical projection module for projecting a predetermined pattern onto a target object to be detected for sensing, which includes a light beam modulation element and the light source structure according to the above embodiment. The light beam modulating element modulates the light beam emitted by the light source structure to form a pattern light beam capable of projecting irregularly distributed light spot patterns on a measured target object.
In some embodiments, the beam modulating element comprises a collimating lens and/or a beam expanding element and a diffractive optical element. The collimating lens and/or the beam expanding element and the patterning element are arranged on a light emergent path of the light source structure. The collimating lens and/or the beam expanding element adjust the light beam emitted by the light source structure to keep the light beam substantially collimated and meet the requirement of a preset light-emitting aperture. The patterning element rearranges the light beam cluster with a plurality of irregularly distributed sub-light beams emitted by the light source structure to form a pattern light beam capable of projecting more irregularly distributed light spot patterns on the measured target object.
In some embodiments, the light beam modulation element includes a diffusion portion and a patterning portion, the diffusion portion is disposed corresponding to the flood light emitting area or the flood light emitting portion of the light source structure and is used for diffusing the light beam emitted by the flood light emitting area or the flood light emitting portion to form a flood light beam with uniform light intensity distribution, and the patterning portion is disposed corresponding to the pattern light emitting area of the light source structure and is used for rearranging the light field of the light beam emitted by the pattern light emitting area to form a pattern light beam capable of projecting irregular distribution light spot patterns on the target object to be measured.
In some embodiments, the patterned portion and the diffusion portion of the light beam modulation element are formed on the same transparent substrate; or
The diffusion portion and the patterned portion of the light beam modulation element are formed on different transparent substrates, respectively, the transparent substrate on which the patterned portion is formed is defined as a patterned substrate, a region of the diffusion substrate corresponding to the patterned portion is kept transparent, and a region of the patterned substrate corresponding to the diffusion portion is kept transparent.
In some embodiments, the function of the patterning part is realized by forming a specific patterned optical texture on the corresponding position of the transparent substrate, wherein the patterned optical texture is selected from one of a diffraction optical texture, an optical micro-lens array, a grating and a combination thereof.
In some embodiments, the optical projection module further includes an optical path guiding element disposed between the light source structure and the light beam modulation element at a position corresponding to the light exit surface of the first emission portion of the light source structure, and configured to guide the first light beam emitted by the first emission portion in a divergent manner to irradiate the diffusion portion of the light beam modulation element.
The embodiment of the present application further provides a sensing device for sensing three-dimensional information of a target object, which includes the optical projection module and the sensing module according to the above embodiments. The sensing module is used for sensing a preset pattern projected by the optical module on a measured target object and acquiring three-dimensional information of the measured target object by analyzing an image of the preset pattern.
Embodiments of the present application also provide an apparatus including a sensing device as described in the above embodiments. The equipment executes corresponding functions according to the three-dimensional information of the detected target object sensed by the sensing device.
The light source structure, the optical projection module, the sensing device and the equipment provided by the embodiment of the application are simulated and screened by a computer to determine that the irrelevance between local areas of different light-emitting units can be improved to the maximum degree in a smaller light-emitting area range, so that irregularly-distributed light spots projected on a measured target can be more quickly positioned to the only corresponding light spots on a standard irregularly-distributed light spot pattern, and the three-dimensional sensing efficiency is improved.
Additional aspects and advantages of embodiments of the present application will be set forth in part in the description which follows and, in part, will be obvious from the description, or may be learned by practice of embodiments of the present application.
Drawings
Fig. 1 is a plan view of a light source structure according to a first embodiment of the present application.
Fig. 2 is a schematic diagram of the coordinate positions of the irregular light-emitting units shown in fig. 1.
Fig. 3 is a top view of a light source structure provided in a second embodiment of the present application.
Fig. 4 is a schematic view of another arrangement of a flood light emitting area according to a second embodiment of the present application.
Fig. 5 is a top view of a light source structure according to a third embodiment of the present application.
Fig. 6 is a cross-sectional view of the light source structure of fig. 5 taken along line VI-VI.
Fig. 7 is a top view of a light source structure according to a fourth embodiment of the present application.
Fig. 8 is a cross-sectional view of the light source structure of fig. 7 taken along line VIII-VIII.
Fig. 9 is a schematic structural diagram of an optical projection module according to a fifth embodiment of the present application.
Fig. 10 is a schematic structural diagram of an optical projection module according to a sixth embodiment of the present application.
Fig. 11 is a schematic structural diagram of an optical projection module according to a seventh embodiment of the present application.
Fig. 12 is a schematic structural diagram of an optical projection module according to an eighth embodiment of the present application.
Fig. 13 is a schematic structural diagram of a sensing device according to a ninth embodiment of the present application.
Fig. 14 is a schematic structural diagram of an apparatus provided in a tenth embodiment of the present application.
Detailed Description
Reference will now be made in detail to embodiments of the present application, examples of which are illustrated in the accompanying drawings, wherein like or similar reference numerals refer to the same or similar elements or elements having the same or similar function throughout. The embodiments described below with reference to the accompanying drawings are illustrative and are only for the purpose of explaining the present application and are not to be construed as limiting the present application. In the description of the present application, it is to be understood that the terms "first" and "second" are used for descriptive purposes only and are not to be construed as indicating or implying relative importance or implying any order or number of technical features indicated. Thus, features defined as "first" and "second" may explicitly or implicitly include one or more of the described features. In the description of the present application, "a plurality" means two or more unless specifically limited otherwise.
In the description of the present application, it should be noted that, unless explicitly stated or limited otherwise, the terms "mounted," "connected," and "connected" are to be construed broadly, e.g., as meaning either a fixed connection, a removable connection, or an integral connection; either mechanically or electrically or in communication with each other; either directly or indirectly through intervening media, either internally or in any other relationship or combination of two or more elements. The specific meaning of the above terms in the present application can be understood by those of ordinary skill in the art as appropriate.
The following disclosure provides many different embodiments or examples for implementing different structures of the application. In order to simplify the disclosure of the present application, only the components and settings of a specific example are described below. Of course, they are merely examples and are not intended to limit the present application. Moreover, the present application may repeat reference numerals and/or letters in the various examples, such repeat use is intended to provide a simplified and clear description of the present application and is not intended to suggest any particular relationship between the various embodiments and/or arrangements discussed. In addition, the various specific processes and materials provided in the following description of the present application are only examples of implementing the technical solutions of the present application, but one of ordinary skill in the art should recognize that the technical solutions of the present application can also be implemented by other processes and/or other materials not described below.
Further, the described features, structures, or characteristics may be combined in any suitable manner in one or more embodiments. In the following description, numerous specific details are provided to provide a thorough understanding of embodiments of the application. One skilled in the relevant art will recognize, however, that the subject technology can be practiced without one or more of the specific details, or with other structures, components, and so forth. In other instances, well-known structures or operations are not shown or described in detail to avoid obscuring the focus of the application.
As shown in fig. 1, a first embodiment of the present application provides a light source structure 1 for emitting a light beam with a plurality of irregularly distributed sub-light beams to a target object to be measured to form a corresponding irregularly distributed light spot pattern for sensing and identification. The light beam may be a light beam having a specific wavelength according to sensing principles and application scenarios. In this embodiment, the light beam is used for face recognition, and may be an infrared or near-infrared wavelength light beam, and the wavelength range is 750 nanometers (nm) to 1650 nm.
The light source structure 1 includes a semiconductor substrate 10 and a plurality of light emitting units 12 irregularly distributed on the semiconductor substrate 10. The light emitting unit 12 is formed on the semiconductor substrate 10 by photolithography, etching, and/or metal organic chemical vapor deposition. A pattern light emitting region 14 is defined on the light emitting surface of the semiconductor substrate 10. The light emitting units 12 are distributed within the pattern light emitting area 14. The distribution positions of the light-emitting units 12 in the pattern light-emitting area 14 enable the irrelevance between the light-emitting units 12 at different positions in the pattern light-emitting area 14 to be as high as possible under the condition of meeting the limited light-emitting area, light-emitting unit aperture and light-emitting unit pitch, so that the calculation efficiency of searching and positioning irregularly distributed light spots is improved.
The position of the light emitting unit 12 in the pattern light emitting area 14 is determined by setting a screening condition and screening a plurality of simulated light emitting unit 12 position pattern templates with irregular distribution by a computer. According to the principle of improving the irrelevancy between the light emitting units 12 as much as possible when the above preset conditions are satisfied, the set screening conditions include:
1. and randomly assigning a search block in the irregularly-distributed light-emitting unit 12 position patterns according to a preset area, wherein the search block moves a preset search range from the original position in a large image formed by a plurality of repeatedly spliced irregularly-distributed light-emitting unit 12 position patterns to search out the unique light-emitting unit 12 distribution patterns under the condition of meeting a preset pixel missing rate. The preset search ranges are along the same direction, such as: and moving the range covered by the preset distance along the connecting line of the central points of the position patterns of the adjacent irregularly distributed light-emitting units 12. The preset distance is smaller than or equal to the distance between the center points of the position patterns of the adjacent irregularly-distributed light-emitting units 12. The preset area of the search block may be in units of pixel units on a sensor for imaging the irregularly-distributed light spot pattern projected by the irregularly-distributed light-emitting units 12, such as: the search block may be 30 pixel units by 30 pixel units in size.
2. For each candidate irregular distribution light-emitting unit 12 position pattern, traversing the irregular distribution light-emitting unit 12 position pattern by taking the pixel unit as a unit according to the search block arbitrarily specified by a preset area to obtain a plurality of light-emitting unit 12 distribution patterns with preset area sizes.
Excluding the distribution patterns of the light emitting units 12 obtained in the area of the search block itself and in the preset exclusion range moved around the search block itself, and comparing the obtained distribution patterns of the other light emitting units 12 with the distribution patterns of the light emitting units 12 in the area of the search block itself one by one to obtain the corresponding hamming distance. The exclusion range is a range over which the search block itself moves by a distance of one light emitting unit 12 in each direction. The hamming distance is a parameter expressing the degree of similarity of the distribution patterns of the two light-emitting units 12. Each difference between the two distribution patterns of the light emitting units 12 is a hamming distance value added to the position of one light emitting unit 12, that is, the distribution pattern of one light emitting unit 12 changes the positions of the corresponding number of light emitting units 12 with the hamming distance value, so as to obtain the distribution pattern of the other light emitting unit 12.
And comparing the respective minimum Hamming distances obtained after the searching and comparing of the position patterns of the light-emitting units 12 distributed irregularly for each candidate, and preferentially selecting the position pattern of the light-emitting unit 12 distributed irregularly, which corresponds to the maximum value.
3. While satisfying the above-described preferred selection condition based on the minimum hamming distance, the preferred selection of the distribution pattern with relatively high distribution density of the light-emitting units 12 allows the size of the semiconductor substrate 10 to be minimized, thereby reducing the manufacturing cost.
4. The preferred distribution density of the light-emitting units 12 also needs to satisfy the minimum pitch of the adjacent light-emitting units 12 that can be manufactured by the manufacturing process.
As shown in fig. 2, the value range of the position coordinates of each irregularly distributed light-emitting unit 12 in the pattern light-emitting area 14 can be determined through computer simulation and screening. In the present embodiment, the pattern light emission region 14 has a rectangular shape. The number of the light emitting units 12 is, for example, one hundred. Now, taking the lower left vertex of the pattern light emitting region 14 as an origin O, the extending directions of two perpendicular sides intersecting the lower left corner are an abscissa axis X and an ordinate axis Y, respectively, the length unit is Micrometer (μm), and the coordinate values of the center points of the one hundred light emitting units 12 are in the following ranges: p1([165.84,175.26], [153.24,162.66 ]); p2([141.54,150.96], [140.64,150.06 ]); p3([184.74,194.16], [173.04,182.46 ]); p4([171.24,180.66], [86.64,96.06 ]); p5([198.24,207.66], [84.84,94.26 ]); p6([207.24,216.66], [189.24,198.66 ]); p7([226.14,235.56], [169.44,178.86 ]); p8([120.84,130.26], [215.34,224.76 ]); p9([209.04,218.46], [36.24,45.66 ]); p10([182.04,191.46], [34.44,43.86 ]); p11([5.64,15.06], [148.74,158.16 ]); p12([91.14,100.56], [89.34,98.76 ]); p13([166.74,176.16], [56.94,66.36 ]); p14([182.04,191.46], [7.44,16.86 ]); p15([101.04,110.46], [249.54,258.96 ]); p16([115.44,124.86], [147.84,157.26 ]); p17([222.54,231.96], [103.74,113.16 ]); p18([66.84,76.26], [102.84,112.26 ]); p19([338.64,348.06], [103.74,113.16 ]); p20([242.34,251.76], [64.14,73.56 ]); p21([41.64,51.06], [114.54,123.96 ]); p22([60.54,69.96], [75.84,85.26 ]); p23([196.44,205.86], [272.04,281.46 ]); p24([249.54,258.96], [109.14,118.56 ]); p25([103.74,113.16], [276.54,285.96 ]); p26([187.44,196.86], [245.94,255.36 ]); p27([22.74,32.16], [186.54,195.96 ]); p28([35.34,44.76], [162.24,171.66 ]); p29([17.34,26.76], [90.24,99.66 ]); p30([17.34,26.76], [63.24,72.66 ]); p31([66.84,76.26], [215.34,224.76 ]); p32([257.64,267.06], [11.94,21.36 ]); p33([44.34,53.76], [230.64,240.06 ]); p34([222.54,231.96], [263.04,272.46 ]); p35([107.34,116.76], [66.84,76.26 ]); p36([1.14,10.56], [270.24,279.66 ]); p37([135.24,144.66], [62.34,71.76 ]); p38([30.84,40.26], [38.94,48.36 ]); p39([20.94,30.36], [245.04,254.46 ]); p40([72.24,81.66], [129.84,139.26 ]); p41([0.24,9.66], [214.44,223.86 ]); p42([275.64,285.06], [101.94,111.36 ]); p43([322.44,331.86], [156.84,166.26 ]); p44([88.44,97.86], [27.24,36.66 ]); p45([47.94,57.36], [257.64,267.06 ]); p46([271.14,280.56], [276.54,285.96 ]); p47([3.84,13.26], [32.64,42.06 ]); p48([56.04,65.46], [29.04,38.46 ]); p49([38.04,47.46], [8.34,17.76 ]); p50([83.04,92.46], [54.24,63.66 ]); p51([170.34,179.76], [125.34,134.76 ]); p52([194.64,204.06], [137.94,147.36 ]); p53([151.44,160.86], [105.54,114.96 ]); p54([164.94,174.36], [191.94,201.36 ]); p55([137.94,147.36], [193.74,203.16 ]); p56([128.94,138.36], [89.34,98.76 ]); p57([110.04,119.46], [109.14,118.56 ]); p58([215.34,224.76], [63.24,72.66 ]); p59([127.14,136.56], [242.34,251.76 ]); p60([154.14,163.56], [244.14,253.56 ]); p61([330.54,339.96], [129.84,139.26 ]); p62([245.04,254.46], [189.24,198.66 ]); p63([169.44,178.86], [221.64,231.06 ]); p64([154.14,163.56], [271.14,280.56 ]); p65([235.14,244.56], [29.04,38.46 ]); p66([220.74,230.16], [130.74,140.16 ]); p67([113.64,123.06], [174.84,184.26 ]); p68([269.34,278.76], [175.74,185.16 ]); p69([0,6.96], [174.84,184.26 ]); p70([93.84,103.26], [214.44,223.86 ]); p71([294.54,303.96], [164.04,173.46 ]); p72([275.64,285.06], [202.74,212.16 ]); p73([139.74,149.16], [6.54,15.96 ]); p74([86.64,96.06], [169.44,178.86 ]); p75([232.44,241.86], [2.04,11.46 ]); p76([148.74,158.16], [32.64,42.06 ]); p77([313.44,322.86], [92.04,101.46 ]); p78([300.84,310.26], [116.34,125.76 ]); p79([318.84,328.26], [188.34,197.76 ]); p80([318.84,328.26], [215.34,224.76 ]); p81([269.34,278.76], [63.24,72.66 ]); p82([78.54,87.96], [266.64,276.06 ]); p83([291.84,301.26], [47.94,57.36 ]); p84([113.64,123.06], [15.54,24.96 ]); p85([228.84,238.26], [211.74,221.16 ]); p86([335.04,344.46], [8.34,17.76 ]); p87([200.94,210.36], [216.24,225.66 ]); p88([305.34,314.76], [239.64,249.06 ]); p89([315.24,324.66], [33.54,42.96 ]); p90([263.94,273.36], [148.74,158.16 ]); p91([335.94,345.36], [64.14,73.56 ]); p92([60.54,69.96], [176.64,186.06 ]); p93([13.74,23.16], [121.74,131.16 ]); p94([247.74,257.16], [251.34,260.76 ]); p95([288.24,297.66], [20.94,30.36 ]); p96([65.04,74.46], [2.04,11.46 ]); p97([332.34,341.76], [245.94,255.36 ]); p98([280.14,289.56], [249.54,258.96 ]); p99([298.14,307.56], [270.24,279.66 ]); p100([253.14,262.56], [224.34,233.76 ]).
Preferably, the coordinate values of the center points of the one hundred light emitting cells 12 are: p1(170.55,157.95); p2(146.25,145.35); p3(189.45,177.75); p4(175.95, 91.35); p5(202.95, 89.55); p6(211.95,193.95); p7(230.85,174.15); p8(125.55,220.05); p9(213.75, 40.95); p10(186.75, 39.15); p11(10.35,153.45); p12(95.85, 94.05); p13(171.45, 61.65); p14(186.75, 12.15); p15(105.75,254.25); p16(120.15,152.55); p17(227.25,108.45); p18(71.55,107.55); p19(343.35,108.45); p20(247.05, 68.85); p21(46.35,119.25); p22(65.25, 80.55); p23(201.15,276.75); p24(254.25,113.85); p25(108.45,281.25); p26(192.15,250.65); p27(27.45,191.25); p28(40.05,166.95); p29(22.05, 94.95); p30(22.05, 67.95); p31(71.55,220.05); p32(262.35, 16.65); p33(49.05,235.35); p34(227.25,267.75); p35(112.05, 71.55); p36(5.85,274.95); p37(139.95, 67.05); p38(35.55, 43.65); p39(25.65,249.75); p40(76.95,134.55); p41(4.95,219.15); p42(280.35,106.65); p43(327.15,161.55); p44(93.15, 31.95); p45(52.65,262.35); p46(275.85,281.25); p47(8.55, 37.35); p48(60.75, 33.75); p49(42.75, 13.05); p50(87.75, 58.95); p51(175.05,130.05); p52(199.35,142.65); p53(156.15,110.25); p54(169.65,196.65); p55(142.65,198.45); p56(133.65, 94.05); p57(114.75,113.85); p58(220.05, 67.95); p59(131.85,247.05); p60(158.85,248.85); p61(335.25,134.55); p62(249.75,193.95); p63(174.15,226.35); p64(158.85,275.85); p65(239.85, 33.75); p66(225.45,135.45); p67(118.35,179.55); p68(274.05,180.45); p69(2.25,179.55); p70(98.55,219.15); p71(299.25,168.75); p72(280.35,207.45); p73(144.45, 11.25); p74(91.35,174.15); p75(237.15, 6.75); p76(153.45, 37.35); p77(318.15, 96.75); p78(305.55,121.05); p79(323.55,193.05); p80(323.55,220.05); p81(274.05, 67.95); p82(83.25,271.35); p83(296.55, 52.65); p84(118.35, 20.25); p85(233.55,216.45); p86(339.75, 13.05); p87(205.65,220.95); p88(310.05,244.35); p89(319.95, 38.25); p90(268.65,153.45); p91(340.65, 68.85); p92(65.25,181.35); p93(18.45,126.45); p94(252.45,256.05); p95(292.95, 25.65); p96(69.75, 6.75); p97(337.05,250.65); p98(284.85,254.25); p99(302.85,274.95); p100(257.85,229.05).
The light emitting unit 12 may be a semiconductor laser. Preferably, in the present embodiment, the light Emitting unit 12 is a Vertical Cavity Surface Emitting Laser (VCSEL).
After the arrangement positions of the irregular light-emitting units 12 on the light source structure 1 are simulated, screened and determined by a computer according to the screening principle, the irrelevance between local areas of different light-emitting units 12 can be improved to the maximum extent in a smaller light-emitting area range, so that irregularly-distributed light spots projected on a measured target can be more quickly positioned to light spots uniquely corresponding to a standard irregularly-distributed light spot pattern, and the three-dimensional sensing efficiency is improved.
It is understood that in other embodiments, a light emitting unit distribution pattern may be further based on one hundred irregularly arranged light emitting units defining coordinate positions in the pattern light emitting region, one or more light emitting units may be added or subtracted in the pattern light emitting region, or a plurality of different first light emitting unit distribution patterns of the light source structure may be formed by changing the positions of one or more light emitting units. It is also within the scope of the present application that the same advantageous effects can be achieved as long as the above-described degree of similarity between the first light emitting unit distribution pattern formed by adding or subtracting light emitting units and changing the current light emitting unit position and the base light emitting unit distribution pattern is equal to or exceeds a preset threshold.
The similarity is evaluated by performing a limited number of graphic transformations without changing the correlation between the light-emitting units on the first light-emitting unit pattern obtained by adding or subtracting one or more light-emitting units or changing the positions of one or more light-emitting units in the basic light-emitting unit distribution pattern to obtain a second light-emitting unit pattern which is consistent in orientation with the basic light-emitting unit distribution pattern and has the same size as the light-emitting units. The graphical transformations include, but are not limited to, translation, rotation, left-right mirroring, up-down mirroring, 180 degree flipping, and the like. And calculating the similarity of the second light-emitting unit pattern and the basic light-emitting unit distribution pattern by using a normalized correlation coefficient matching method, and judging the similarity of the first pattern and the basic light-emitting unit distribution pattern according to the similarity value, wherein the similarity value is 1 corresponding to the condition that the patterns are completely the same, and the similarity value is 0 corresponding to the condition that the patterns are completely different. In this embodiment, when the similarity degree value is equal to or greater than 0.25, the similarity degree between the corresponding first light-emitting unit distribution pattern and the basic light-emitting unit distribution pattern may enable the light source structure using the first light-emitting unit distribution pattern to obtain the same beneficial effect, and therefore the preset threshold value of the similarity degree is the similarity degree value of 0.25 calculated by using the normalized correlation coefficient matching method.
As shown in fig. 3, the second embodiment of the present application provides a light source structure 2, which is substantially the same as the light source structure 1 of the first embodiment, except that the light source structure 2 further comprises one or more flood light emitting areas 21. The flood light emission areas 21 are symmetrically distributed around the pattern light emission area 24. Each of the flood light emitting areas 21 comprises one or more lights 26. The light emitters 26 in the floodlight emitting region 21 and the light emitting units 22 in the pattern light emitting region 24 are formed on the same semiconductor substrate 20 and can be controlled to emit light independently. The floodlight emitting area 21 is used for emitting a floodlight beam with uniform light intensity distribution. The floodlight beams are projected onto the measured target object for sensing the floodlight image of the measured target object. For example, the flood light beam can be used for sensing whether the detected target object is a human face.
As shown in fig. 4, a single light emitter 26 may be formed in each of the flood light emitting areas 21. The single emitter 26 may be a single aperture broad area VCSEL. The single-hole wide-area VCSEL is provided with only one light emitting hole, but the light emitting aperture is larger and is tens of times larger than that of a common VCSEL. The light emitting effect of the single-hole wide-surface VCSEL is equal to that of a surface light source with uniform light emitting intensity. The light emitting surface shape of the single-hole broad-area VCSEL can be a regular shape, such as a rectangle, and can also be an irregular other shape. In the present embodiment, the floodlight emitting areas 21 are respectively disposed at corners of the pattern light emitting area 24. The shape of the floodlight emitting area 21 is a right-angled frame strip shape surrounding the corner of the pattern light emitting area 24 from the outside. The light emitting surface shape of the single-hole wide VCSEL can also be the corresponding rectangular frame strip shape.
As shown in fig. 3, a plurality of lights can be formed in each of the flood light emitting areas. The luminous bodies are uniformly distributed in the floodlight emitting area at the same preset interval. The plurality of light emitters may be VCSELs.
The floodlight emitting area 21 emits light beams with uniform light intensity, which are diffused and mixed by the optical element arranged on the light path of the light source structure 2 to form floodlight beams covering the whole emission angle.
Referring to fig. 5 and 6 together, a third embodiment of the present application provides a light source structure 3, which is substantially the same as the light source structure 1 of the first embodiment, except that the floodlight emitting region 31 is a frame-shaped region surrounding the pattern light emitting region 34 by one turn around the pattern light emitting region 34. The minimum distance D between the floodlight emitting area 31 and the pattern light emitting area 34 is such that the light beams emitted from the pattern light emitting area 34 and the light beams emitted from the floodlight emitting area 32 do not meet each other before reaching the first optical element 33 arranged in sequence above the light source structure 3.
Due to some errors in the manufacturing process, the divergence angles of the light beams emitted by the light emitters 36 in the floodlight emitting area 31 and the light emitting units 32 in the pattern light emitting area 34 cannot be the same, but are within a preset divergence angle range. Since the divergence angle of the light beams emitted by the light emitting unit 32 and the light emitting body 36 is larger, the distance D between the pattern light emitting region 34 and the floodlight emitting region 31 is required to be larger in order to avoid the intersection of the light beams emitted by the floodlight emitting region 31 under the premise that the distance between the light source structure 3 and the first optical element 33 sequentially arranged above is kept unchanged. Assuming that the maximum divergence angle of the light beams emitted from the pattern light emitting region 34 and the floodlight emitting region 31 is θ and the distance between the light emitting surface of the light source structure 3 and the first optical element 33 arranged in sequence thereabove is H, the minimum distance between the pattern light emitting region 34 and the floodlight emitting region 31 in the critical condition where the light beam emitted from the pattern light emitting region 34 and the light beam emitted from the floodlight emitting region 31 just intersect each other is determined according to the trigonometric function relationshipD satisfies the formula
Figure BDA0001808251220000151
So as to ensure that the light beams emitted from the pattern light-emitting area 34 and the flood light-emitting area 31 do not intersect with each other before reaching the first optical element 33 arranged above the light source structure 3, the minimum distance D between the pattern light-emitting area 34 and the flood light-emitting area 31 should be satisfied
Figure BDA0001808251220000152
Figure BDA0001808251220000153
When the above conditions are satisfied, the light beams emitted from the pattern light emission region 34 and the floodlight emission region 31 do not intersect with each other until reaching the first optical element 33 provided above the light source structure 3, and therefore, it is not necessary to provide another element for adjusting the light beam direction on the light exit side of the pattern light emission region 34 or the floodlight emission region 31.
In the present embodiment, the light emitting units 32 are distributed irregularly within the pattern light emitting region 34 of the semiconductor substrate 30. The luminous bodies 36 are uniformly arranged in the floodlight emitting region 31 at the same preset interval.
Referring to fig. 7 and 8 together, a fourth embodiment of the present application provides a light source structure 4 for emitting a light beam to a target object to be detected for sensing and identification. The light beam may be a light beam having a specific wavelength according to sensing principles and application scenarios. In this embodiment, the light beam is used for face recognition, and may be an infrared or near-infrared wavelength light beam, and the wavelength range is 750 nanometers (nm) to 1650 nm.
The light source structure 4 includes a floodlight emitting portion 40 and a pattern light emitting portion 42. The floodlight emitting portion 40 emits a light beam for forming a floodlight beam having a uniform light intensity distribution. The floodlight beams are projected onto a measured target object to identify whether the measured target object is a specific object meeting preset characteristics. For example, the floodlight beam can be used for identifying whether the detected target object is a human face. The light beam emitted from the pattern light emitting unit 42 is used to form a pattern light beam capable of projecting a predetermined pattern on the target object to be measured. The preset pattern is used for sensing three-dimensional information of the surface of the measured target object.
The floodlight emitting portion 40 includes a light emitter 400 and a light guide plate 402 formed on a floodlight emitting semiconductor substrate 401. The light guide plate 402 includes a light incident surface 4020 and a light emitting surface 4022. In this embodiment, the light guide plate 402 is substantially rectangular, and the light incident surface 4020 is perpendicular to the light emitting surface 4022. The light emitter 400 is disposed corresponding to the light incident surface 4020 of the light guide plate 402, so that the light beams emitted by the light emitter 400 are incident into the light guide plate 402 from the light incident surface 4020 and are uniformly mixed, and then the floodlight beams are projected from the light emergent surface 4022.
The pattern light emitting portion 42 is disposed in the middle of the light emitting surface 4022 of the light guide plate 402. The pattern light emitting portion 42 includes a semiconductor substrate 421 as described in the first embodiment and a plurality of light emitting cells 420 formed on the semiconductor substrate 421. The light emitting units 420 are irregularly arranged on the semiconductor substrate 421 according to the same distribution rule as that in the first embodiment. The light emitting unit 420 emits a light beam and a patterning element, such as: a Diffraction Optical Element (DOE) is used to project a pattern of irregularly distributed spots on an object to be measured.
In this embodiment, the light emitter 400 and the light emitting unit 420 may be semiconductor lasers, for example: VCSELs. In contrast, the light emitter 400 and the light emitting unit 420 need to be formed on different flood light emitting semiconductor substrates 401 and 421, respectively, because they are located at different positions. The shape of the floodlight semiconductor substrate 401 corresponds to the shape of the light incident surface 4020.
As shown in fig. 9, a fifth embodiment of the present application provides an optical projection module 5 for projecting a specific light beam onto a target object to be detected for sensing and identifying. The optical projection module 5 includes a light beam modulation element 51 and the light source structure 1 in the first embodiment.
The beam modulating element 51 includes, but is not limited to, a collimating lens 510 and/or a beam expanding element and a patterning element 512. The collimating lens 510 and/or the beam expanding element and the patterning element 512 are disposed on the light-emitting path of the light source structure 1. The collimating lens 510 and/or the beam expanding element adjust the light beam emitted from the light source structure 1 to substantially maintain collimation and meet the preset light exit aperture requirement. The patterning device 512 rearranges the light beam clusters of the sub-beams with irregular distribution emitted from the light source structure 1 to form a pattern light beam capable of projecting a larger number of irregular distribution spot patterns on the target object to be measured.
The patterning element 512 includes, but is not limited to, a DOE, a microlens array, a grating, and the like. In this embodiment, the patterning element 512 is a DOE, and the DOE duplicates a plurality of beam clusters having a plurality of irregularly-distributed sub-beams emitted from the light source structure 1 and spreads the beam clusters within a preset expansion angle range to form a pattern beam capable of projecting a larger number of irregularly-distributed spot patterns on the target object to be measured.
As shown in fig. 10, a sixth embodiment of the present application provides an optical projection module 6 for projecting a specific light beam onto a target object to be detected for sensing and identifying. The optical projection module 6 includes a light beam modulation element 61 and the light source structure 2 in the second to fourth embodiments.
The light beam modulation element 61 includes a diffusion portion 610 and a patterned portion 612. The diffusion part 610 is disposed corresponding to the floodlight emitting area 21 of the light source structure 1, and is configured to diffuse the light beam emitted by the light emitter 26 in the floodlight emitting area 21 to form a floodlight beam with a uniformly distributed light intensity. The patterning unit 612 is disposed corresponding to the pattern light emitting area 24 of the light source structure 1, and is used for forming the light beam emitted by the light emitting unit 22 in the pattern light emitting area 24 into a pattern light beam capable of projecting a preset pattern on the object to be measured for sensing three-dimensional information of the object to be measured.
In the present embodiment, the patterning unit 612 is provided at an intermediate position of the light flux modulating element 61 corresponding to the pattern light emission region 24 of the light source structure 1. The diffuser portion 610 is provided symmetrically around the periphery of the patterned portion 612 in correspondence with the floodlight emitting area 21 of the light source structure 1.
The functions of the patterned portion 612 and the diffusion portion 610 are realized by forming specific optical textures at corresponding positions of the transparent substrate 613. In this embodiment, the patterned part 112 and the diffusion part 111 of the light beam modulation element 110 are provided on the same transparent substrate 613. That is, a patterned optical texture 6120 for rearranging an optical field is formed at the middle position of the transparent substrate 613 as the patterned portion 612. The transparent substrate 613 forms a diffusion optical texture 6100 with a light diffusion function at a position corresponding to the floodlight emitting region 21 of the light source structure 1 at the periphery of the patterned optical texture 6120 as the diffusion part 610.
As shown in fig. 11, the seventh embodiment of the present application provides an optical projection module 7, which is substantially the same as the optical projection module 6 of the sixth embodiment, except that the optical projection module 7 further includes an optical path guiding element 76.
The light path guiding element 76 is disposed between the light source structure 1 and the light beam modulation element 71, and at a position corresponding to the light emitting surface of the floodlight emitting area 21 of the light source structure 1. The light path guide member 76 guides the light beam emitted in a divergent manner from the luminous bodies 26 in the floodlight emitting area 21 to the diffuser portion 710 on the light beam modulation member 71. The light path guiding element 76 is disposed to avoid that, in the technical solution that the floodlight emitting area 21 of the light source structure 1 is closer to the pattern light emitting area 24, a part of the light beam emitted from the floodlight emitting area 21 will form a diffracted light beam with non-uniform intensity after passing through the patterning part 712 of the light beam modulating element 71, thereby affecting the uniformity of the floodlight beam. The optical path directing elements 76 include, but are not limited to, prisms, microlenses, and gratings. The light path directing member 76 is disposed in a region corresponding to the floodlight emitting region 21 of the light source structure 1.
As shown in fig. 12, the eighth embodiment of the present application provides an optical projection module 8 which is substantially the same as the optical projection module 6 of the sixth embodiment except that a diffusion portion 810 and a patterned portion 812 of the light beam modulation element 81 are formed on different transparent substrates, respectively.
The transparent substrate on which the patterned part 812 is formed is defined as a patterned substrate 8123. A patterned optical texture 8120 for rearranging the optical field of the light beam is formed on the patterned substrate 8123 at a position corresponding to the patterned light-emitting region 24 of the light source structure 1. In this embodiment, corresponding to the case that the pattern light emitting region 24 is disposed in the middle of the light source structure 1, the patterned optical texture 8120 is formed in the middle of the patterned substrate 8123.
The transparent substrate on which the diffusion portion 810 is formed is defined as a diffusion substrate 8103. A diffusion optical texture 8100 playing a role in light diffusion is formed on the diffusion substrate 8103 at a position corresponding to the floodlight emitting area 21 of the light source structure 1. The diffusion substrate 8103 and the region corresponding to the patterned optical texture 8120 on the patterned substrate 8123 keep light transmission, and the region corresponding to the diffusion optical texture 8100 on the patterned substrate 8123 and the diffusion substrate 8103 keeps light transmission and is defined as a light transmission region 8102. In the present embodiment, the diffusion substrate 8103 has the diffusion optical texture 8100 formed on the periphery of the light transmission region 8102 at a position corresponding to the floodlight light emitting region 21 of the light source structure 1, corresponding to the light source structure 1 in which the floodlight emitting region 21 is disposed around the pattern light emitting region 24.
The patterned substrate 8123 and the diffusion substrate 8103 may be stacked together, or may be independently disposed at different positions on the optical path along the projection optical path of the optical projection module 8. It can be understood that there is no particular requirement on the arrangement sequence of the diffusion substrate 8103 and the patterned substrate 8123 along the projection light path, as long as the positions of the corresponding optical lines on the diffusion substrate 8103 and the patterned substrate 8123 are aligned with each other.
As shown in fig. 13, a ninth embodiment of the present application provides a sensing device 9 for sensing spatial information of an object to be measured. The spatial information includes, but is not limited to, three-dimensional information of the surface of the measured object, position information of the measured object in space, size information of the measured object, and other three-dimensional information related to the measured object. The sensed spatial information of the measured object can be used to identify the measured object or to construct a three-dimensional model of the measured object.
The sensing device 9 includes the optical projection module 5 and the sensing module 90 provided in the fifth to eighth embodiments. The optical projection module 5 is used for projecting a specific light beam to a detected target object for sensing and identifying. The sensing module 90 is used for sensing a specific image projected by the optical projection module 5 on the measured object and acquiring related spatial information of the measured object by analyzing the specific image.
In this embodiment, the sensing device 9 is a 3D face recognition device that senses three-dimensional information of the surface of the measured object and recognizes the identity of the measured object according to the three-dimensional information.
The specific light beam comprises a floodlight beam with uniform intensity and/or a pattern light beam capable of projecting a preset pattern on the measured object. The sensing module 90 identifies whether the detected object is a face according to the image formed by the sensed flood light beam on the detected object. The sensing module 90 analyzes the three-dimensional information of the surface of the object to be measured according to the shape change of the preset pattern projected on the object to be measured by the sensed pattern beam, and performs face recognition on the object to be measured accordingly.
As shown in fig. 14, a tenth embodiment of the present invention provides an apparatus 100, such as a mobile phone, a laptop, a tablet, a touch interactive screen, a door, a vehicle, a robot, an automatic numerical control machine, etc. The apparatus 100 comprises at least one sensing device 9 as provided in the ninth embodiment above. The device 100 is used for correspondingly executing corresponding functions according to the sensing result of the sensing device 9. The corresponding functions include but are not limited to unlocking after identifying the identity of the user, paying, starting a preset application program, avoiding obstacles, and judging any one or more of the emotion and the health condition of the user by utilizing a deep learning technology after identifying the facial expression of the user.
In this embodiment, the sensing device 9 is a 3D face recognition device that senses three-dimensional information of the surface of the measured object and recognizes the identity of the measured object according to the three-dimensional information. The device 100 is a device 100 which is equipped with the 3D face recognition device and relates to access rights, such as an electronic terminal, a door, a vehicle, security check, entry and exit, and the like, such as a mobile phone, a notebook computer, a tablet computer, a touch interactive screen, and the like.
Compared with the prior art, the light source structure 1, the optical projection module 5, the sensing device 9 and the equipment 100 provided by the application can furthest improve the irrelevance between the local areas of different light-emitting units in a smaller light-emitting area range after being simulated, screened and determined by a computer according to the screening principle, so that the irregularly-distributed light spots projected on a measured target can be more quickly positioned to the uniquely-corresponding light spots on a standard irregularly-distributed light spot pattern, and the three-dimensional sensing efficiency is improved.
In the description herein, references to the description of the terms "one embodiment," "certain embodiments," "an illustrative embodiment," "an example," "a specific example," or "some examples" or the like mean that a particular feature, structure, material, or characteristic described in connection with the embodiment or example is included in at least one embodiment or example of the present application. In this specification, schematic representations of the above terms do not necessarily refer to the same embodiment or example. Furthermore, the particular features, structures, materials, or characteristics described may be combined in any suitable manner in any one or more embodiments or examples.
The above description is only for the purpose of illustrating the preferred embodiments of the present application and is not to be construed as limiting the present application, and any modifications, equivalents and improvements made within the spirit and principle of the present application are intended to be included within the scope of the present application.

Claims (17)

1. A light source structure for emitting irregularly distributed light spot patterns, the light source structure comprising a semiconductor substrate and a plurality of irregularly distributed light emitting units formed on the semiconductor substrate, a pattern light emitting area is defined on the light emitting surface of the semiconductor substrate, the pattern light emitting area is rectangular, two right-angle sides intersecting at the lower left corner are taken as an origin, the extending directions of the two right-angle sides are respectively an abscissa axis and an ordinate axis, and a coordinate unit is micrometer to establish a coordinate system to describe the positions of the light emitting units, the distribution pattern of the light emitting units is selected from one of a plurality of first light emitting unit distribution patterns obtained by adding or subtracting one or more light emitting units or changing the positions of one or more light emitting units in a basic light emitting unit distribution pattern having one hundred light emitting units, the coordinate values of one hundred light emitting units of the basic light emitting unit distribution pattern are as follows: p1(170.55,157.95); p2(146.25,145.35); p3(189.45,177.75); p4(175.95, 91.35); p5(202.95, 89.55); p6(211.95,193.95); p7(230.85,174.15); p8(125.55,220.05); p9(213.75, 40.95); p10(186.75, 39.15); p11(10.35,153.45); p12(95.85, 94.05); p13(171.45, 61.65); p14(186.75, 12.15); p15(105.75,254.25); p16(120.15,152.55); p17(227.25,108.45); p18(71.55,107.55); p19(343.35,108.45); p20(247.05, 68.85); p21(46.35,119.25); p22(65.25, 80.55); p23(201.15,276.75); p24(254.25,113.85); p25(108.45,281.25); p26(192.15,250.65); p27(27.45,191.25); p28(40.05,166.95); p29(22.05, 94.95); p30(22.05, 67.95); p31(71.55,220.05); p32(262.35, 16.65); p33(49.05,235.35); p34(227.25,267.75); p35(112.05, 71.55); p36(5.85,274.95); p37(139.95, 67.05); p38(35.55, 43.65); p39(25.65,249.75); p40(76.95,134.55); p41(4.95,219.15); p42(280.35,106.65); p43(327.15,161.55); p44(93.15, 31.95); p45(52.65,262.35); p46(275.85,281.25); p47(8.55, 37.35); p48(60.75, 33.75); p49(42.75, 13.05); p50(87.75, 58.95); p51(175.05,130.05); p52(199.35,142.65); p53(156.15,110.25); p54(169.65,196.65); p55(142.65,198.45); p56(133.65, 94.05); p57(114.75,113.85); p58(220.05, 67.95); p59(131.85,247.05); p60(158.85,248.85); p61(335.25,134.55); p62(249.75,193.95); p63(174.15,226.35); p64(158.85,275.85); p65(239.85, 33.75); p66(225.45,135.45); p67(118.35,179.55); p68(274.05,180.45); p69(2.25,179.55); p70(98.55,219.15); p71(299.25,168.75); p72(280.35,207.45); p73(144.45, 11.25); p74(91.35,174.15); p75(237.15, 6.75); p76(153.45, 37.35); p77(318.15, 96.75); p78(305.55,121.05); p79(323.55,193.05); p80(323.55,220.05); p81(274.05, 67.95); p82(83.25,271.35); p83(296.55, 52.65); p84(118.35, 20.25); p85(233.55,216.45); p86(339.75, 13.05); p87(205.65,220.95); p88(310.05,244.35); p89(319.95, 38.25); p90(268.65,153.45); p91(340.65, 68.85); p92(65.25,181.35); p93(18.45,126.45); p94(252.45,256.05); p95(292.95, 25.65); p96(69.75, 6.75); p97(337.05,250.65); p98(284.85,254.25); p99(302.85,274.95); p100(257.85,229.05), a similarity degree between the first light-emitting unit distribution pattern and the basic light-emitting unit distribution pattern being equal to or exceeding a preset threshold, the similarity degree threshold being defined in such a way that a second light-emitting unit pattern having the same orientation as the basic light-emitting unit distribution pattern and the same size of light-emitting units is obtained after the first light-emitting unit pattern is subjected to a finite number of graphic transformations without changing the correlation between light-emitting units, and a similarity degree value calculated by the second light-emitting unit pattern and the basic light-emitting unit distribution pattern using a normalized correlation coefficient matching method being equal to or exceeding a preset threshold of 0.25.
2. The light source structure according to claim 1, wherein the pattern transformation that does not change the correlation between the light emitting units includes translation, rotation, left-right mirroring, up-down mirroring, and 180 degree flipping.
3. The light source structure of claim 1, wherein the light emitting cells are vertical cavity surface emitting lasers.
4. The light source structure of claim 1, further comprising one or more flood light emitting areas symmetrically distributed around the pattern light emitting area, the flood light emitting areas emitting light beams for forming a flood light beam with uniform intensity distribution, each of the flood light emitting areas having one or more luminous bodies formed therein, the luminous bodies being formed on the same semiconductor substrate as the light emitting units in the pattern light emitting areas and being independently controllable to emit light.
5. The light source structure of claim 4, wherein a single light emitter is formed in each of the flood light emitting regions, and wherein the single light emitter is a single aperture broad area VCSEL.
6. The light source structure of claim 4, wherein a plurality of light emitters are formed in each of the flood light emitting areas, the light emitters are uniformly arranged in the flood light emitting areas at predetermined intervals, and the light emitters are VCSELs.
7. The light source structure of claim 4, wherein the floodlight emitting area is a box surrounding the pattern light emitting area by one turn outside the pattern light emitting area, and the minimum distance D between the floodlight emitting area and the pattern light emitting area satisfies the condition
Figure FDA0001808251210000031
Where H is a distance between the light emitting surface of the light source structure and a first optical element arranged in order above the light source structure, and θ is a maximum divergence angle of light beams emitted from the floodlight emitting area and the pattern light emitting area.
8. The light source structure of claim 1, further comprising a flood light emitting unit, wherein the flood light emitting unit comprises a light emitter and a light guide plate formed on a flood light emitting semiconductor substrate, the light guide plate comprises a light incident surface and a light emergent surface, the flood light emitting semiconductor substrate is disposed corresponding to the light incident surface of the light guide plate, the light emitter emits a light beam toward the light incident surface of the light guide plate, the light beam emitted from the light emitter is incident into the light guide plate from the light incident surface and is uniformly mixed, and then a light beam with uniform intensity is projected from the light emergent surface, and the semiconductor substrate formed with the plurality of irregularly distributed light emitting units is disposed at a middle position of the light emergent surface of the light guide plate to emit a light beam cluster having a plurality of.
9. The light source structure of claim 8, wherein the light emitter is a vertical cavity surface emitting laser.
10. An optical projection module for projecting a predetermined pattern onto an object to be measured for sensing, comprising a light beam modulating element and the light source structure as claimed in any one of claims 1 to 9, wherein the light beam modulating element modulates the light beam emitted from the light source structure to form a pattern light beam capable of projecting an irregularly distributed light spot pattern on the object to be measured.
11. The optical projection module as claimed in claim 10, wherein the beam modulation element includes a collimating lens and/or a beam expanding element and a diffractive optical element, the light source structure is as claimed in claims 1 to 3, the collimating lens and/or the beam expanding element and the patterning element are disposed on an outgoing light path of the light source structure, the collimating lens and/or the beam expanding element adjusts the light beam emitted from the light source structure to substantially maintain collimation and meet a predetermined outgoing light aperture requirement, and the patterning element rearranges a light beam cluster of a plurality of irregularly distributed sub-light beams emitted from the light source structure to form a pattern light beam capable of projecting a greater number of irregularly distributed light spot patterns on an object to be measured.
12. The optical projection module as claimed in claim 10, wherein the light source structure is as claimed in claims 4 to 9, the light beam modulation element includes a diffusion portion and a patterning portion, the diffusion portion is disposed corresponding to the flood light emitting region or the flood light emitting portion of the light source structure and is configured to diffuse the light beam emitted by the flood light emitting region or the flood light emitting portion to form a flood light beam with a uniform light intensity distribution, and the patterning portion is disposed corresponding to the pattern light emitting region of the light source structure and is configured to rearrange the light field of the light beam emitted by the pattern light emitting region to form a pattern light beam capable of projecting an irregular spot pattern on the target object to be measured.
13. The optical projection module of claim 12, wherein the patterned portion and the diffusing portion of the light beam modulating element are formed on the same transparent substrate; or
The diffusion portion and the patterned portion of the light beam modulation element are formed on different transparent substrates, respectively, the transparent substrate on which the patterned portion is formed is defined as a patterned substrate, a region of the diffusion substrate corresponding to the patterned portion is kept transparent, and a region of the patterned substrate corresponding to the diffusion portion is kept transparent.
14. The optical projection module as claimed in claim 12, wherein the patterning portion is implemented by forming a specific patterned optical texture on the transparent substrate at a corresponding position, and the patterned optical texture is selected from one of a diffractive optical texture, an optical micro-lens array, a grating, and a combination thereof.
15. The optical projection module of claim 12, further comprising an optical path directing member disposed between the light source structure and the light beam modulating member at a position corresponding to the light exit surface of the first emitting portion of the light source structure, the optical path directing member being configured to direct the first light beam emitted in a divergent manner from the first emitting portion toward the diffusing portion of the light beam modulating member.
16. A sensing device for sensing three-dimensional information of an object to be measured, comprising the optical projection module and the sensing module according to any one of claims 10 to 15, wherein the sensing module is used for sensing a predetermined pattern projected on the object to be measured by the optical module and acquiring the three-dimensional information of the object to be measured by analyzing an image of the predetermined pattern.
17. An apparatus comprising the sensing device of claim 16, the apparatus performing a corresponding function according to three-dimensional information of an object under test sensed by the sensing device.
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