CN110923649A - 一种pvd涂层刀片及其制备方法 - Google Patents
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- 238000005240 physical vapour deposition Methods 0.000 title claims abstract description 44
- 238000002360 preparation method Methods 0.000 title claims abstract description 10
- 239000000463 material Substances 0.000 claims abstract description 40
- 229910045601 alloy Inorganic materials 0.000 claims abstract description 39
- 239000000956 alloy Substances 0.000 claims abstract description 39
- 238000000576 coating method Methods 0.000 claims abstract description 33
- 239000011248 coating agent Substances 0.000 claims abstract description 32
- 238000001755 magnetron sputter deposition Methods 0.000 claims abstract description 14
- 238000004140 cleaning Methods 0.000 claims abstract description 13
- 238000004544 sputter deposition Methods 0.000 claims abstract description 13
- 238000005516 engineering process Methods 0.000 claims abstract description 12
- 238000000227 grinding Methods 0.000 claims abstract description 8
- 239000011261 inert gas Substances 0.000 claims abstract description 7
- 150000007522 mineralic acids Chemical class 0.000 claims abstract description 7
- 238000001035 drying Methods 0.000 claims abstract description 6
- 239000012459 cleaning agent Substances 0.000 claims abstract description 5
- 238000007747 plating Methods 0.000 claims abstract description 5
- 238000009210 therapy by ultrasound Methods 0.000 claims abstract description 5
- 239000000203 mixture Substances 0.000 claims abstract 2
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 claims description 12
- 238000000034 method Methods 0.000 claims description 9
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 claims description 8
- 229910052786 argon Inorganic materials 0.000 claims description 8
- NBIIXXVUZAFLBC-UHFFFAOYSA-N Phosphoric acid Chemical compound OP(O)(O)=O NBIIXXVUZAFLBC-UHFFFAOYSA-N 0.000 claims description 6
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 claims description 6
- 238000004519 manufacturing process Methods 0.000 claims description 6
- -1 argon ions Chemical class 0.000 claims description 5
- 239000000758 substrate Substances 0.000 claims description 4
- 229910000147 aluminium phosphate Inorganic materials 0.000 claims description 3
- 238000005498 polishing Methods 0.000 claims description 3
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 claims 3
- 229910052757 nitrogen Inorganic materials 0.000 claims 2
- 239000007789 gas Substances 0.000 abstract description 3
- 239000011159 matrix material Substances 0.000 abstract description 3
- 239000010408 film Substances 0.000 description 13
- 239000007888 film coating Substances 0.000 description 2
- 238000009501 film coating Methods 0.000 description 2
- 239000011521 glass Substances 0.000 description 2
- 241000699670 Mus sp. Species 0.000 description 1
- 239000000853 adhesive Substances 0.000 description 1
- 230000001070 adhesive effect Effects 0.000 description 1
- 230000004075 alteration Effects 0.000 description 1
- 230000009286 beneficial effect Effects 0.000 description 1
- 239000002131 composite material Substances 0.000 description 1
- 238000005520 cutting process Methods 0.000 description 1
- 238000005034 decoration Methods 0.000 description 1
- 238000000151 deposition Methods 0.000 description 1
- 230000008021 deposition Effects 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 239000012212 insulator Substances 0.000 description 1
- 239000005344 low-emissivity glass Substances 0.000 description 1
- 238000003754 machining Methods 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 238000004377 microelectronic Methods 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 230000003287 optical effect Effects 0.000 description 1
- 239000012788 optical film Substances 0.000 description 1
- 230000002035 prolonged effect Effects 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- 229910001285 shape-memory alloy Inorganic materials 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 238000006467 substitution reaction Methods 0.000 description 1
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/34—Sputtering
- C23C14/35—Sputtering by application of a magnetic field, e.g. magnetron sputtering
-
- C—CHEMISTRY; METALLURGY
- C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
- C22C—ALLOYS
- C22C29/00—Alloys based on carbides, oxides, nitrides, borides, or silicides, e.g. cermets, or other metal compounds, e.g. oxynitrides, sulfides
- C22C29/02—Alloys based on carbides, oxides, nitrides, borides, or silicides, e.g. cermets, or other metal compounds, e.g. oxynitrides, sulfides based on carbides or carbonitrides
- C22C29/06—Alloys based on carbides, oxides, nitrides, borides, or silicides, e.g. cermets, or other metal compounds, e.g. oxynitrides, sulfides based on carbides or carbonitrides based on carbides, but not containing other metal compounds
- C22C29/08—Alloys based on carbides, oxides, nitrides, borides, or silicides, e.g. cermets, or other metal compounds, e.g. oxynitrides, sulfides based on carbides or carbonitrides based on carbides, but not containing other metal compounds based on tungsten carbide
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/02—Pretreatment of the material to be coated
- C23C14/021—Cleaning or etching treatments
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/02—Pretreatment of the material to be coated
- C23C14/028—Physical treatment to alter the texture of the substrate surface, e.g. grinding, polishing
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Abstract
本发明提供一种PVD涂层刀片及其制备方法,所述PVD涂层刀片包括硬质合金基体材料和PVD涂层,其制备方法为:将硬质合金基体材料用磨砂盘进行磨砂、抛光,然后用清洗剂进行初步清洁;再放入无机酸溶液中,进行超声波处理,进行深度清洁,深度清洁后进行干燥处理;干燥处理后放入溅射室内,向溅射室内通入惰性气体,用磁控溅射技术镀上PVD涂层。本发明利用磁控溅射技术在低气压下进行高速溅射,有效地提高了气体的离化率,提高了涂层与硬质合金基体材料的结合强度,从而提高刀片的强度和硬度。
Description
技术领域
本发明属于PVD涂层刀片及其制备方法领域,尤其涉及一种PVD涂层刀片及其制备方法。
背景技术
磁控溅射是物理气相沉积的一种。一般的溅射法可被用于制备金属、半导体、绝缘体等多材料,且具有设备简单、易于控制、镀膜面积大和附着力强等优点。上世纪 70 年代发展起来的磁控溅射法更是实现了高速、低温、低损伤。
自磁控溅射技术问世以来,在各领域得到了广泛应用。各种功能性薄膜:如具有吸收、透射、反射、折射、偏光等作用的薄膜;装饰领域的应用,如各种全反射膜及半透明膜等,如手机外壳,鼠标等;在微电子领域作为一种非热式镀膜技术;在光学领域中频闭合场非平衡磁控溅射技术也已在光学薄膜(如增透膜)、低辐射玻璃和透明导电玻璃等方面得到应用,特别是透明导电玻璃目前广泛应用于平板显示器件、太阳能电池、微波与射频屏蔽装置与器件、传感器;在机械加工行业中,表面功能膜、超硬膜,自润滑薄膜的表面沉积技术自问世以来得到长足发展,能有效的提高表面硬度、复合韧性、耐磨损性和抗高温化学稳定性能,从而大幅度地提高涂层产品的使用寿命;磁控溅射除上述已被大量应用的领域,还在高温超导薄膜、铁电体薄膜、巨磁阻薄膜、薄膜发光材料、太阳能电池、记忆合金薄膜研究方面发挥重要作用。
PVD涂层工艺温度低,不会降低硬质合金刀片自身的强度,刀具刃口可磨的十分锋利,从而可大大降低机床的功率消耗。但是PVD技术也存在着一些缺陷,PVD涂层与基体的结合强度较低,所以这就要求PVD涂层的厚度不能太高,否则涂层易从基体上剥落。
发明内容
为了解决上述技术问题,本发明提供一种PVD涂层刀片及其制备方法,所述PVD涂层刀片包括硬质合金基体材料和PVD涂层,其制备方法为:
S1:将硬质合金基体材料用磨砂盘进行磨砂、抛光;
S2:将磨砂、抛光后的硬质合金基体材料用清洗剂进行初步清洁;
S3:将初步清洁后的硬质合金基体材料加入无机酸溶液中,并对硬质合金基体材料进行超声波处理,进行深度清洁,深度清洁后进行干燥处理 ;
S4:将干燥处理后的硬质合金基体材料放入溅射室内,向溅射室内通入惰性气体,用磁控溅射技术镀上PVD涂层。
优选的,所述硬质合金基体材料为WC-CO硬质合金。
优选的,所述硬质合金基体材料的组成成分的百分比为:Co:10-15%、WC:85%-90%。
优选的,所述无机酸溶液可以为盐酸、硫酸、磷酸其中一种。
优选的,所述惰性气体为氩气,所述磁控溅射技术是以PVD涂层作为阴极靶,在1-3KV直流负高压下产生辉光放电,电离出氩离子轰击阴极靶表面,使得靶原子溅出并沉积在硬质合金基体材料上,从而将硬质合金基体材料镀上PVD涂层。
优选的,所述PVD涂层的厚度为2-6μm。
与现有技术相比,本发明的有益效果是:利用磁控溅射技术在低气压下进行高速溅射,有效地提高了气体的离化率,提高了涂层与硬质合金基体材料的结合强度,从而提高刀片的强度和硬度。
具体实施方式
下面将结合本发明实施例,对本发明实施例中的技术方案进行清楚、完整地描述,显然,所描述的实施例仅仅是本发明一部分实施例,而不是全部的实施例。基于本发明中的实施例,本领域普通技术人员在没有做出创造性劳动前提下所获得的所有其他实施例,都属于本发明保护的范围。
以下对本发明做进一步描述:
实施例:
一种PVD涂层刀片及其制备方法,所述PVD涂层刀片包括硬质合金基体材料和PVD涂层,其制备方法为:
S1:将硬质合金基体材料用磨砂盘进行磨砂、抛光;
S2:将磨砂、抛光后的硬质合金基体材料用清洗剂进行初步清洁;
S3:将初步清洁后的硬质合金基体材料加入无机酸溶液中,并对硬质合金基体材料进行超声波处理,进行深度清洁,深度清洁后进行干燥处理 ;
S4:将干燥处理后的硬质合金基体材料放入溅射室内,向溅射室内通入惰性气体,用磁控溅射技术镀上PVD涂层。
具体的,所述硬质合金基体材料为WC-CO硬质合金。
具体的,所述硬质合金基体材料的组成成分的百分比为:Co:10-15%、WC:85%-90%。
具体的,所述无机酸溶液可以为盐酸、硫酸、磷酸其中一种。
具体的,所述惰性气体为氩气,所述磁控溅射技术是以PVD涂层作为阴极靶,在1-3KV直流负高压下产生辉光放电,电离出氩离子轰击阴极靶表面,使得靶原子溅出并沉积在硬质合金基体材料上,从而将硬质合金基体材料镀上PVD涂层。
具体的,所述PVD涂层的厚度为2-6μm。
实施例1
首先将组成成分的百分比为:Co:10-15%、WC:85%-90%的WC-CO硬质合金基体材料用磨砂盘进行磨砂、抛光,然后用清洗剂对磨砂、抛光后的硬质合金基体材料进行初步清洁;将初步清洁后的硬质合金基体材料加入盐酸溶液中,在20Hz-20KHz的频率、温度为15℃-300℃的条件下进行超声波处理,对硬质合金基体材料进行深度清洁,深度清洁后进行干燥处理;将干燥处理后的硬质合金基体材料放入溅射室内,向溅射室内通入氩气气体,以PVD涂层作为阴极靶,在1-3KV直流负高压下产生辉光放电,电离出氩离子轰击阴极靶表面,使得靶原子溅出并沉积在硬质合金基体材料上,从而将硬质合金基体材料镀上厚度为2-6μm 的PVD涂层。
需要说明的是,在本文中,而且,术语“包括”、“包含”或者其任何其他变体意在涵盖非排他性的包含,从而使得包括一系列要素的过程、方法、物品或者设备不仅包括那些要素,而且还包括没有明确列出的其他要素,或者是还包括为这种过程、方法、物品或者设备所固有的要素。
尽管已经示出和描述了本发明的实施例,对于本领域的普通技术人员而言,可以理解在不脱离本发明的原理和精神的情况下可以对这些实施例进行多种变化、修改、替换和变型,本发明的范围由所附权利要求及其等同物限定。
Claims (6)
1.一种PVD涂层刀片及其制备方法,其特征在于,所述PVD涂层刀片包括硬质合金基体材料和PVD涂层,其制备方法为:
S1:将硬质合金基体材料用磨砂盘进行磨砂、抛光;
S2:将磨砂、抛光后的硬质合金基体材料用清洗剂进行初步清洁;
S3:将初步清洁后的硬质合金基体材料加入无机酸溶液中,并对硬质合金基体材料进行超声波处理,进行深度清洁,深度清洁后进行干燥处理 ;
S4:将干燥处理后的硬质合金基体材料放入溅射室内,向溅射室内通入惰性气体,用磁控溅射技术镀上PVD涂层。
2.根据权利要求1所述的一种PVD涂层刀片及其制备方法,其特征在于,所述硬质合金基体材料为WC-CO硬质合金。
3.根据权利要求1所述的一种PVD涂层刀片及其制备方法,其特征在于,所述硬质合金基体材料的组成成分的百分比为:Co:10-15%、WC:85%-90%。
4.根据权利要求1所述的一种PVD涂层刀片及其制备方法,其特征在于,所述无机酸溶液可以为盐酸、硫酸、磷酸其中一种。
5.根据权利要求1所述的一种PVD涂层刀片及其制备方法,其特征在于,所述惰性气体为氩气或氮气其中一种,所述磁控溅射技术是以PVD涂层作为阴极靶,在1-3KV直流负高压下产生辉光放电,电离出氩离子或氮离子轰击阴极靶表面,使得靶原子溅出并沉积在硬质合金基体材料上,从而将硬质合金基体材料镀上PVD涂层。
6.根据权利要求1所述的一种PVD涂层刀片及其制备方法,其特征在于,所述PVD涂层的厚度为2-6μm。
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