CN110923648A - 一种高硅超硬pvd涂层制备工艺 - Google Patents
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- 229910052786 argon Inorganic materials 0.000 claims description 8
- 238000000034 method Methods 0.000 claims description 6
- 239000000243 solution Substances 0.000 claims description 5
- -1 argon ions Chemical class 0.000 claims description 4
- JEIPFZHSYJVQDO-UHFFFAOYSA-N iron(III) oxide Inorganic materials O=[Fe]O[Fe]=O JEIPFZHSYJVQDO-UHFFFAOYSA-N 0.000 claims description 4
- 239000003921 oil Substances 0.000 claims description 4
- 238000005868 electrolysis reaction Methods 0.000 claims description 3
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 claims 7
- 238000004519 manufacturing process Methods 0.000 claims 1
- 238000004544 sputter deposition Methods 0.000 abstract description 3
- 239000007789 gas Substances 0.000 abstract description 2
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- 239000012466 permeate Substances 0.000 description 3
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- 239000002184 metal Substances 0.000 description 2
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- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
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- C23C14/35—Sputtering by application of a magnetic field, e.g. magnetron sputtering
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
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- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/02—Pretreatment of the material to be coated
- C23C14/021—Cleaning or etching treatments
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- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25F—PROCESSES FOR THE ELECTROLYTIC REMOVAL OF MATERIALS FROM OBJECTS; APPARATUS THEREFOR
- C25F1/00—Electrolytic cleaning, degreasing, pickling or descaling
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Abstract
本发明提供一种高硅超硬PVD涂层制备工艺,包括待涂工件和高硅PVD涂层,其制备工艺为:首先将待涂工件用磨砂盘进行磨砂、抛光;将磨砂、抛光后的待涂工件放入电解质溶液中,对待涂工件进行电解;将电解后的待涂工件放入碱性溶液中,利用超声波对待涂工件进行清洗,清洗后放入干燥室对待涂工件进行干燥处理;将干燥处理后的待涂工件放入真空室内,向真空室内通入惰性气体,用磁控溅射技术镀上高硅PVD涂层。本发明利用磁控溅射技术在负高压下进行高速溅射,有效地提高了气体的离化率,提高了涂层与待涂工件的结合强度。
Description
技术领域
本发明属于高硅超硬PVD涂层制备工艺领域,尤其涉及一种高硅超硬PVD涂层制备工艺。
背景技术
磁控溅射是物理气相沉积的一种。一般的溅射法可被用于制备金属、半导体、绝缘体等多材料,且具有设备简单、易于控制、镀膜面积大和附着力强等优点。上世纪 70 年代发展起来的磁控溅射法更是实现了高速、低温、低损伤。
自磁控溅射技术问世以来,在各领域得到了广泛应用。各种功能性薄膜:如具有吸收、透射、反射、折射、偏光等作用的薄膜;装饰领域的应用,如各种全反射膜及半透明膜等,如手机外壳,鼠标等;在微电子领域作为一种非热式镀膜技术;在光学领域中频闭合场非平衡磁控溅射技术也已在光学薄膜(如增透膜)、低辐射玻璃和透明导电玻璃等方面得到应用,特别是透明导电玻璃目前广泛应用于平板显示器件、太阳能电池、微波与射频屏蔽装置与器件、传感器;在机械加工行业中,表面功能膜、超硬膜,自润滑薄膜的表面沉积技术自问世以来得到长足发展,能有效的提高表面硬度、复合韧性、耐磨损性和抗高温化学稳定性能,从而大幅度地提高涂层产品的使用寿命;磁控溅射除上述已被大量应用的领域,还在高温超导薄膜、铁电体薄膜、巨磁阻薄膜、薄膜发光材料、太阳能电池、记忆合金薄膜研究方面发挥重要作用。
原始工艺制备的大多数涂层虽然具有较高的硬度、韧性和高温稳定性,也在刀具加工领域获得了一定应用,但涂层与刀具基体的结合力不能耐受强烈的冲击,在高温、高速、高硬切削加工领域效果不尽人意。
发明内容
为了解决上述技术问题,本发明提供一种高硅超硬PVD涂层制备工艺,包括待涂工件和高硅PVD涂层,其制备工艺为:
S1:将待涂工件用磨砂盘进行磨砂、抛光;
S2:将磨砂、抛光后的待涂工件放入电解质溶液中,对待涂工件进行电解;
S3:将电解后的待涂工件放入碱性溶液中,利用超声波对待涂工件进行清洗,清洗后放入干燥室对待涂工件进行干燥处理;
S4:将干燥处理后的待涂工件放入真空室内,向真空室内通入惰性气体,用磁控溅射技术镀上高硅PVD涂层。
优选的,所述电解的原理是将电解质溶液渗透到待涂工件表面的污物下面,产生大量的气泡,气泡聚集形成气流从污物与待涂工件的间隙中逸出,使污物从待涂工件表面上脱落,达到了对待涂工件除油除锈的目的。
优选的,所述碱性溶液为NaOH溶液,所述碱性溶液的质量分数为5%。
优选的,所述超声波的频率为20-50kHZ,所述超声波对待涂工件进行清洗的时间为1-5min。
优选的,所述惰性气体为氩气,所述磁控溅射技术是以高硅PVD涂层作为阴极靶,在0.01-0.06mbar的真空度、1-3KV的直流负高压下产生辉光放电,电离出氩离子轰击阴极靶表面,使得靶原子溅出并沉积在待涂工件上,从而将待涂工件镀上高硅PVD涂层。
优选的,所述高硅PVD涂层的厚度为0.2-0.7μm。
与现有技术相比,本发明的有益效果是:利用磁控溅射技术在负高压下进行高速溅射,有效地提高了气体的离化率,提高了涂层与待涂工件的结合强度。
具体实施方式
下面将结合本发明实施例,对本发明实施例中的技术方案进行清楚、完整地描述,显然,所描述的实施例仅仅是本发明一部分实施例,而不是全部的实施例。基于本发明中的实施例,本领域普通技术人员在没有做出创造性劳动前提下所获得的所有其他实施例,都属于本发明保护的范围。
以下对本发明做进一步描述:
实施例:
一种高硅超硬PVD涂层制备工艺,包括待涂工件和高硅PVD涂层,其制备工艺为:
S1:将待涂工件用磨砂盘进行磨砂、抛光;
S2:将磨砂、抛光后的待涂工件放入电解质溶液中,对待涂工件进行电解;
S3:将电解后的待涂工件放入碱性溶液中,利用超声波对待涂工件进行清洗,清洗后放入干燥室对待涂工件进行干燥处理;
S4:将干燥处理后的待涂工件放入真空室内,向真空室内通入惰性气体,用磁控溅射技术镀上高硅PVD涂层。
具体的,所述电解的原理是将电解质溶液渗透到待涂工件表面的污物下面,产生大量的气泡,气泡聚集形成气流从污物与待涂工件的间隙中逸出,使污物从待涂工件表面上脱落,达到了对待涂工件除油除锈的目的。
具体的,所述碱性溶液为NaOH溶液,所述碱性溶液的质量分数为5%。
具体的,所述超声波的频率为20-50kHZ,所述超声波对待涂工件进行清洗的时间为1-5min。
具体的,所述惰性气体为氩气,所述磁控溅射技术是以高硅PVD涂层作为阴极靶,在0.01-0.06mbar的真空度、1-3KV的直流负高压下产生辉光放电,电离出氩离子轰击阴极靶表面,使得靶原子溅出并沉积在待涂工件上,从而将待涂工件镀上高硅PVD涂层。
具体的,所述高硅PVD涂层的厚度为0.2-0.7μm。
实施例1
首先对待涂工件就行预处理,将待涂工件先用磨砂盘进行磨砂、抛光,磨砂、抛光后的待涂工件放入电解质溶液中,连接待涂工件的阴阳极,对待涂工件进行电解,使电解质溶液渗透到待涂工件表面的污物下面,产生大量的气泡,气泡聚集形成气流从污物与金属的间隙中逸出,使污物从待涂工件表面上脱落,从而对待涂工件表面除油、除锈、除杂;然后将电解后的待涂工件放入质量分数为5%的NaOH溶液中,利用超声波清洗机对待涂工件进行清洗,清洗后放入干燥室对待涂工件进行干燥处理;将干燥处理后的待涂工件放入真空室内,向真空室内通入氩气,将高硅PVD涂层作为阴极靶,在0.01-0.06mbar的真空度、1-3KV的直流负高压下产生辉光放电,电离出氩离子轰击阴极靶表面,使得靶原子溅出并沉积在待涂工件上,从而将待涂工件镀上高硅PVD涂层。
需要说明的是,在本文中,而且,术语“包括”、“包含”或者其任何其他变体意在涵盖非排他性的包含,从而使得包括一系列要素的过程、工艺、物品或者设备不仅包括那些要素,而且还包括没有明确列出的其他要素,或者是还包括为这种过程、工艺、物品或者设备所固有的要素。
尽管已经示出和描述了本发明的实施例,对于本领域的普通技术人员而言,可以理解在不脱离本发明的原理和精神的情况下可以对这些实施例进行多种变化、修改、替换和变型,本发明的范围由所附权利要求及其等同物限定。
Claims (6)
1.一种高硅超硬PVD涂层制备工艺,其特征在于,包括待涂工件和高硅PVD涂层,其制备工艺为:
S1:将待涂工件用磨砂盘进行磨砂、抛光;
S2:将磨砂、抛光后的待涂工件放入电解质溶液中,对待涂工件进行电解;
S3:将电解后的待涂工件放入碱性溶液中,利用超声波对待涂工件进行清洗,清洗后放入干燥室对待涂工件进行干燥处理;
S4:将干燥处理后的待涂工件放入真空室内,向真空室内通入惰性气体,用磁控溅射技术镀上高硅PVD涂层。
2.根据权利要求1所述的一种高硅超硬PVD涂层制备工艺,其特征在于,所述电解的原理是将电解质溶液渗透到待涂工件表面的污物下面,产生大量的气泡,气泡聚集形成气流从污物与待涂工件的间隙中逸出,使污物从待涂工件表面上脱落,达到了对待涂工件除油除锈的目的。
3.根据权利要求1所述的一种高硅超硬PVD涂层制备工艺,其特征在于,所述碱性溶液为NaOH溶液,所述碱性溶液的质量分数为5%。
4.根据权利要求1所述的一种高硅超硬PVD涂层制备工艺,其特征在于,所述超声波的频率为20-50kHZ,所述超声波对待涂工件进行清洗的时间为1-5min。
5.根据权利要求1所述的一种高硅超硬PVD涂层制备工艺,其特征在于,所述惰性气体为氩气,所述磁控溅射技术是以高硅PVD涂层作为阴极靶,在0.01-0.06mbar的真空度、1-3KV的直流负高压下产生辉光放电,电离出氩离子轰击阴极靶表面,使得靶原子溅出并沉积在待涂工件上,从而将待涂工件镀上高硅PVD涂层。
6.根据权利要求1所述的一种高硅超硬PVD涂层制备工艺,其特征在于,所述高硅PVD涂层的厚度为0.2-0.7μm。
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