CN110883625B - A marble carving surface polishing integrated machine - Google Patents
A marble carving surface polishing integrated machine Download PDFInfo
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- CN110883625B CN110883625B CN201911217789.5A CN201911217789A CN110883625B CN 110883625 B CN110883625 B CN 110883625B CN 201911217789 A CN201911217789 A CN 201911217789A CN 110883625 B CN110883625 B CN 110883625B
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- 238000005498 polishing Methods 0.000 title claims abstract description 143
- 239000004579 marble Substances 0.000 title claims abstract description 40
- 239000007788 liquid Substances 0.000 claims abstract description 103
- 238000003756 stirring Methods 0.000 claims abstract description 55
- 238000007789 sealing Methods 0.000 claims abstract description 30
- 239000002245 particle Substances 0.000 claims description 48
- 239000000843 powder Substances 0.000 claims description 15
- 239000000758 substrate Substances 0.000 claims description 7
- 230000005389 magnetism Effects 0.000 claims description 3
- 230000036316 preload Effects 0.000 abstract description 13
- 238000002347 injection Methods 0.000 description 15
- 239000007924 injection Substances 0.000 description 15
- 239000000693 micelle Substances 0.000 description 13
- 238000000034 method Methods 0.000 description 12
- 238000007517 polishing process Methods 0.000 description 8
- 230000007423 decrease Effects 0.000 description 6
- 230000014759 maintenance of location Effects 0.000 description 6
- 239000000126 substance Substances 0.000 description 6
- 230000003746 surface roughness Effects 0.000 description 6
- 239000012530 fluid Substances 0.000 description 5
- 238000009434 installation Methods 0.000 description 5
- 239000000428 dust Substances 0.000 description 3
- 230000000694 effects Effects 0.000 description 3
- 239000010419 fine particle Substances 0.000 description 3
- 239000000463 material Substances 0.000 description 3
- 239000000243 solution Substances 0.000 description 3
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 3
- 238000005260 corrosion Methods 0.000 description 2
- 230000007797 corrosion Effects 0.000 description 2
- 230000001965 increasing effect Effects 0.000 description 2
- 238000005457 optimization Methods 0.000 description 2
- 239000004575 stone Substances 0.000 description 2
- 239000002928 artificial marble Substances 0.000 description 1
- 230000009286 beneficial effect Effects 0.000 description 1
- 239000003795 chemical substances by application Substances 0.000 description 1
- 238000011109 contamination Methods 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 230000002708 enhancing effect Effects 0.000 description 1
- 239000011159 matrix material Substances 0.000 description 1
- 238000009991 scouring Methods 0.000 description 1
- 238000000926 separation method Methods 0.000 description 1
- 238000005507 spraying Methods 0.000 description 1
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Classifications
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B29/00—Machines or devices for polishing surfaces on work by means of tools made of soft or flexible material with or without the application of solid or liquid polishing agents
- B24B29/02—Machines or devices for polishing surfaces on work by means of tools made of soft or flexible material with or without the application of solid or liquid polishing agents designed for particular workpieces
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B41/00—Component parts such as frames, beds, carriages, headstocks
- B24B41/04—Headstocks; Working-spindles; Features relating thereto
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B47/00—Drives or gearings; Equipment therefor
- B24B47/10—Drives or gearings; Equipment therefor for rotating or reciprocating working-spindles carrying grinding wheels or workpieces
- B24B47/12—Drives or gearings; Equipment therefor for rotating or reciprocating working-spindles carrying grinding wheels or workpieces by mechanical gearing or electric power
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B57/00—Devices for feeding, applying, grading or recovering grinding, polishing or lapping agents
- B24B57/02—Devices for feeding, applying, grading or recovering grinding, polishing or lapping agents for feeding of fluid, sprayed, pulverised, or liquefied grinding, polishing or lapping agents
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- Engineering & Computer Science (AREA)
- Mechanical Engineering (AREA)
- Finish Polishing, Edge Sharpening, And Grinding By Specific Grinding Devices (AREA)
Abstract
本发明公开了一种大理石雕表面抛光一体机,包括内筒、电机、搅拌组件、抛光液、基板、外筒,基板通过机架找正安装在大理石雕的待抛光平面上,基板上表面安装电机,基板下表面通过连接杆连接开口朝下的内筒,搅拌组件包括轴和搅拌叶片,搅拌叶片位于内筒中,搅拌叶片朝上通过轴连接至电机,内筒包括筒体和密封支撑件,筒体内充满抛光液,轴穿过筒体的位置处设置密封支撑件,外筒开口朝下,套设于内筒外,外筒包括若干拼接板,拼接板的侧面设有榫槽,若干拼接板通过榫槽嵌合在一起且可相互独立地沿竖直方向平移,拼接板下端设置密封条,密封条贴紧待抛光平面,拼接板向上设置预紧柱,预紧柱的上端插入基板内并抵置于基板内的紧预紧弹簧。
The invention discloses an integrated machine for polishing the surface of marble carvings, comprising an inner cylinder, a motor, a stirring component, a polishing liquid, a base plate and an outer cylinder. The motor, the lower surface of the base plate is connected to the inner cylinder with the opening facing downward through the connecting rod, the stirring assembly includes a shaft and a stirring blade, the stirring blade is located in the inner cylinder, and the stirring blade is upwardly connected to the motor through the shaft, and the inner cylinder includes a cylinder body and a sealing support, The cylinder is filled with polishing liquid, and a sealing support is arranged at the position where the shaft passes through the cylinder. The opening of the outer cylinder faces downward and is sleeved outside the inner cylinder. The outer cylinder includes a number of splicing plates. The plates are fitted together by tongue and groove and can be translated in the vertical direction independently of each other. The lower end of the splicing plate is provided with a sealing strip, and the sealing strip is close to the surface to be polished. And abut against the tight preload spring in the base plate.
Description
技术领域technical field
本发明涉及抛光设备领域,具体是一种大理石雕表面抛光一体机。The invention relates to the field of polishing equipment, in particular to an integrated machine for polishing the surface of marble carvings.
背景技术Background technique
大理石是一种常用的石材,装饰材料行业使用越来越广泛。Marble is a commonly used stone, and the decorative material industry is more and more widely used.
所有的人造大理石以及很多天然大理石表面并不光洁,表面粗糙度太低的话容易藏污纳垢且被磕碰时更容易发生表面损伤,所以,绝大多数的大理石在末道使用环节需要进行抛光处理,美观且极其耐污染。The surface of all artificial marble and many natural marbles is not smooth. If the surface roughness is too low, it is easy to hide dirt and surface damage when it is bumped. Therefore, most marbles need to be polished at the end of use. , beautiful and extremely resistant to contamination.
传统上,大理石的抛光几乎都是通过机械式的方式进行的,磨砂轮高速旋转掠过待加工平面,降低表面粗糙度,但是,磨轮形式的抛光方式,其表面粗糙度的提升有限,Ra0.8的粗糙度几乎是极限了,当有更高精度需求时就无能为力了,而且,抛光过程产生的大量粉尘污染周围环境。Traditionally, the polishing of marble is almost always carried out mechanically. The grinding wheel rotates at a high speed and sweeps the surface to be processed to reduce the surface roughness. However, the polishing method in the form of grinding wheel has a limited improvement in surface roughness, Ra0. The roughness of 8 is almost the limit, when there is a need for higher precision, there is nothing that can be done, and a large amount of dust generated during the polishing process pollutes the surrounding environment.
现有技术出现了一些消除粉尘污染的抛光装置,通过吸尘或洒水的方式,还没有出现进一步提高抛光精度的设备。In the prior art, there are some polishing devices for eliminating dust pollution, and there is no device for further improving polishing accuracy by means of dust suction or water spraying.
发明内容SUMMARY OF THE INVENTION
本发明的目的在于提供一种大理石雕表面抛光一体机,以解决现有技术中的问题。The purpose of the present invention is to provide a marble carving surface polishing integrated machine to solve the problems in the prior art.
为实现上述目的,本发明提供如下技术方案:To achieve the above object, the present invention provides the following technical solutions:
一种大理石雕表面抛光一体机,包括内筒、电机、搅拌组件、抛光液和基板,基板通过机架找正安装在大理石雕的待抛光平面上,基板上表面安装电机,基板下表面通过连接杆连接开口朝下的内筒,搅拌组件包括轴和搅拌叶片,搅拌叶片位于内筒中,搅拌叶片朝上通过轴连接至电机,内筒包括筒体和密封支撑件,筒体内充满抛光液,轴穿过筒体的位置处设置密封支撑件。An integrated machine for polishing the surface of marble carvings, comprising an inner cylinder, a motor, a stirring component, a polishing liquid and a base plate, the base plate is aligned and installed on the surface to be polished of the marble carving through a frame, a motor is installed on the upper surface of the base plate, and the lower surface of the base plate is connected by connecting The rod is connected to the inner cylinder with the opening facing down. The stirring assembly includes a shaft and a stirring blade. The stirring blade is located in the inner cylinder. The stirring blade is connected to the motor through the shaft. The inner cylinder includes a cylinder body and a sealing support. A sealing support is provided at a position passing through the barrel.
本发明使用抛光液进行抛光,抛光液中含有一定含量的抛光颗粒物,颗粒物存留在抛光液中,随着搅拌组件搅动抛光液,抛光液与待抛光平面相接触,颗粒物不断冲刷待抛光平面的过程中,将待抛光平面上的毛刺、表面粗糙度微观尺度上的凸起磨平,从而达到降低粗糙度,提高表面光洁度的目的,抛光液中颗粒物粒径选取得越小,可以不断提高待抛光表面的光滑程度,相比于机械式砂轮等抛光物件,精度等级上不受限制,而不同与酸碱腐蚀等化学手段,使用带细碎颗粒物的抛光液进行抛光仍然是纯物理手段,首先不会损害大理石表面的化学性质,而且不会产生二次化学污染等问题。In the present invention, polishing liquid is used for polishing. The polishing liquid contains a certain content of polishing particles, and the particles remain in the polishing liquid. As the stirring component stirs the polishing liquid, the polishing liquid contacts the plane to be polished, and the particles continuously wash the plane to be polished. In the polishing process, the burrs on the surface to be polished and the bumps on the microscopic scale of the surface roughness are smoothed, so as to reduce the roughness and improve the surface finish. The smaller the particle size of the particles in the polishing solution, the more Compared with polishing objects such as mechanical grinding wheels, the degree of smoothness of the surface is not limited in terms of accuracy level. Unlike chemical methods such as acid-base corrosion, polishing using polishing liquid with finely divided particles is still purely physical. It will damage the chemical properties of the marble surface, and will not cause problems such as secondary chemical pollution.
搅拌叶片搅动抛光液的动力来自于上方的电机,下悬臂结构为了提供轴的旋转稳定性,设置密封支撑件提供径向支撑,同时为防止抛光液从轴穿过筒体的位置处溅出以及溅入密封支撑件内的轴承,抛光液内的细碎颗粒毫无疑问会损伤轴承,所以密封支撑件同时具备朝向抛光液的密封功能。The power of the stirring blade to stir the polishing liquid comes from the motor above. In order to provide the rotation stability of the shaft, the lower cantilever structure is provided with a sealing support to provide radial support, and at the same time, to prevent the polishing liquid from splashing from the position where the shaft passes through the cylinder, and The bearing splashed into the sealing support, the fine particles in the polishing liquid will undoubtedly damage the bearing, so the sealing support also has the sealing function towards the polishing liquid.
进一步的,抛光一体机还包括外筒,外筒也是开口朝下,外筒套设于内筒外,外筒包括若干拼接板,拼接板的侧面设有榫槽,若干拼接板通过榫槽嵌合在一起且可相互独立地沿竖直方向平移,拼接板下端设置密封条,密封条贴紧待抛光平面,拼接板向上设置预紧柱,预紧柱的上端插入基板内并抵置于基板内的紧预紧弹簧。Further, the all-in-one polishing machine also includes an outer cylinder, which also has an opening facing downward, the outer cylinder is sleeved outside the inner cylinder, and the outer cylinder includes a plurality of splicing plates, the sides of the splicing plates are provided with tongue grooves, and the plurality of splicing plates are embedded through the tongue and groove. They can be combined together and can be translated in the vertical direction independently of each other. The lower end of the splicing plate is provided with a sealing strip, and the sealing strip is close to the surface to be polished. The splicing plate is upwardly set with a pre-tightening column, and the upper end of the pre-tightening column is inserted into the base plate and abuts against the base plate. inner preload spring.
设置外筒的目的是为了为抛光液提供一个具有完善密封的工作区域,外筒底部的一圈环体与大理石表面接触上后框出待抛光平面,而在此一圈上,可能存在若干凸起,如果外筒底部的一圈是刚性的或只是薄薄的一层橡胶垫,那么这些凸起会造成间隙,使得筒体内的抛光液流出影响使用。外筒被扇形分割为若干片拼接板,就像传统木桶的侧板一样,但是本发明的拼接板相互之间通过榫槽嵌合起来形成环形,而在竖直方向上相互独立,某一处位置存在凸起,那么这一位置处的拼接板可以向上退让一定的距离而不影响周围的拼接板,所有的拼接板都被基板内的预紧弹簧向下压紧,使得拼接板底部的密封条均贴合在大理石表面上,形成一圈环状密封圈,阻止装置内的抛光液泄露。The purpose of setting the outer cylinder is to provide a working area with a perfect seal for the polishing liquid. A ring body at the bottom of the outer cylinder is in contact with the marble surface to frame the surface to be polished. On this ring, there may be several convexities. If the bottom ring of the outer cylinder is rigid or just a thin layer of rubber pad, then these protrusions will cause gaps, which will cause the polishing liquid in the cylinder to flow out and affect the use. The outer cylinder is fan-shaped and divided into several splicing panels, just like the side panels of traditional wooden barrels, but the splicing panels of the present invention are fitted with each other to form a ring shape, and are independent of each other in the vertical direction. If there is a bulge at this position, the splicing plate at this position can retreat upward for a certain distance without affecting the surrounding splicing plates. All the splicing plates are pressed down by the preload springs in the base plate, so that the The sealing strips are all attached to the marble surface to form a ring-shaped sealing ring to prevent the leakage of the polishing liquid in the device.
进一步的,搅拌叶片为在一段杆体上设置的若干搅流板,搅拌叶片的大小沿径向逐渐减小。抛光液与待抛光表面的相互摩擦作为抛光过程,而接触面上的相对速度大小决定着抛光力的大小,如果搅拌叶片将抛光液均匀地搅拌起来使其发生同心旋转,即旋转角速度沿径向近似相等,那么位于外圈的抛光液与待抛光表面的接触线速度大于位于内圈的位置处,造成抛光速度不一致的问题,在相同时间下进行抛光,外圈处的磨损大,内圈处的磨损小、抛光不到位;Further, the stirring blades are several stirring plates arranged on a section of the rod body, and the size of the stirring blades gradually decreases along the radial direction. The mutual friction between the polishing liquid and the surface to be polished is used as the polishing process, and the relative velocity on the contact surface determines the polishing force. If they are approximately equal, then the contact linear velocity between the polishing liquid on the outer ring and the surface to be polished is greater than that on the inner ring, resulting in the problem of inconsistent polishing speeds. Polishing at the same time will cause large wear at the outer ring and greater wear at the inner ring. The wear is small and the polishing is not in place;
为了避免这一情况,通过设置不同大小的搅拌叶片,靠近轴线处的搅拌叶片较大,而远离轴线的搅拌叶片较小,大叶片传递给水体的动力多于小叶片,所以,尽管搅拌叶片是同心旋转角速度相一致的,但是不同叶片传递往抛光液的动力比例是沿径向下降的,所以,抛光液在俯视方向上,沿其旋转轴线的径向具有不同的角速度,考察两个处于不同半径上的运动微团,其各自的旋转半径为R1和R2,位于外侧微团的角速度为w1,位于内侧的角速度为w2,通过相应搅拌叶片径向布置的大小调整,使得w1*R1=w2*R2,让整个抛光平面上与抛光液的接触线速度尽可能相同,由于搅拌叶片的叶片数必然是个有限值,此种平衡线速度的方式只能做到近似均匀。另外,由于不同半径上的流体微团旋转速度不同,那么速度分界上存在扰动,再全流场范围内将用于抛光的颗粒物分布均匀。In order to avoid this situation, by setting stirring blades of different sizes, the stirring blades near the axis are larger, and the stirring blades far away from the axis are smaller, and the large blades transmit more power to the water body than the small blades. Therefore, although the stirring blades are The angular velocity of concentric rotation is the same, but the proportion of power transmitted by different blades to the polishing liquid decreases in the radial direction. Therefore, the polishing liquid has different angular velocities along the radial direction of its rotation axis in the top view direction. The moving micelles on the radius have their respective rotation radii R1 and R2, the angular velocity of the micelles located on the outer side is w1, and the angular velocity of the micelle located on the inner side is w2, through the size adjustment of the radial arrangement of the corresponding stirring blades, so that w1*R1=w2 *R2, make the contact linear velocity with the polishing liquid on the entire polishing plane as the same as possible. Since the number of blades of the stirring blade must be a limited value, this method of balancing the linear velocity can only be approximately uniform. In addition, due to the different rotational speeds of fluid micelles on different radii, there is a disturbance on the speed boundary, and the particles used for polishing are uniformly distributed in the entire flow field.
另外,由于为了平衡不同半径处的接触线速度而使得流体微团具有不同的角速度,又由于抛光液无增无减,即流场中不存在速度奇点、物质吸入点/喷吐点,所以,相邻微团之间必然存在液体内部摩擦,摩擦生热,提高抛光液温度,流动性大大增强,抛光液内的颗粒物抛光性能更佳。In addition, in order to balance the contact linear velocities at different radii, the fluid micelles have different angular velocities, and because the polishing liquid does not increase or decrease, that is, there are no velocity singularities, material suction points/ejection points in the flow field, so, There must be internal friction of the liquid between adjacent micelles, and the friction generates heat, increasing the temperature of the polishing liquid, greatly enhancing the fluidity, and the polishing performance of the particles in the polishing liquid is better.
进一步的,轴内部设置磁体,抛光液中含有细粉颗粒,细粉颗粒带有永磁性,细粉颗粒的粒径低于抛光面目标粗糙度至少一个数量级。Further, a magnet is arranged inside the shaft, the polishing liquid contains fine powder particles, the fine powder particles have permanent magnetism, and the particle size of the fine powder particles is at least one order of magnitude lower than the target roughness of the polishing surface.
抛光液旋转过程实现抛光,虽然细粉颗粒会被液体搅动趋向均匀,但是由于离心力的作用,也会存在颗粒往外环汇集的趋势,所以使用磁性提供一个向心力,平衡掉运作所存在的离心作用,让颗粒能够自由的散布开来并进行抛光过程。被抛光平面上被颗粒撞击下来的大理石混入抛光液内,从表面上掉落下来后可能又会划伤已经抛光的平面,而大理石不被轴吸引,所以只要在抛光液内旋转一定时间后,就会被甩往外环,待抛光平面的目标粗糙度决定着掉落下来的大理石颗粒粒径平均值,大理石颗粒与用于抛光的细粉颗粒粒径相差较大可以帮助快速分离,使其贴紧外围。Polishing is achieved during the rotation of the polishing liquid. Although the fine powder particles will be agitated by the liquid and tend to be uniform, but due to the centrifugal force, the particles will also tend to collect in the outer ring. Therefore, a magnetic force is used to provide a centripetal force to balance the centrifugal effect existing in the operation. , allowing the particles to spread freely and carry out the polishing process. The marble hit by the particles on the polishing plane is mixed into the polishing liquid, and it may scratch the polished plane after falling from the surface, and the marble is not attracted by the shaft, so as long as it is rotated in the polishing liquid for a certain period of time, It will be thrown to the outer ring. The target roughness of the surface to be polished determines the average particle size of the falling marble particles. The large difference in particle size between the marble particles and the fine powder particles used for polishing can help to separate them quickly and make them Stick to the periphery.
作为优化,筒体侧内壁底部设有环形的滞留槽,滞留槽的上部倾斜往上,滞留槽的下部水平或朝向筒体壁面方向下凹。As an optimization, the bottom of the inner wall of the cylinder side is provided with an annular retention groove, the upper part of the retention groove is inclined upward, and the lower part of the retention groove is horizontal or concave toward the cylinder wall.
滞留槽容纳前述的抛光过程从待加工平面上掉落下来的大理石颗粒。The retention tank contains the marble particles that have fallen from the surface to be machined during the aforementioned polishing process.
进一步的,抛光一体机还包括注液管,内筒还包括设置于筒体顶面的注液孔和放气阀,注液孔连接注液管。注液管从内筒上部往装置内添加抛光液,即抛光液的加入是在所有其他部件安装到位后再添加的。放气阀可以再添加抛光液的过程中排出筒体内的空气。Further, the all-in-one polishing machine further includes a liquid injection pipe, the inner cylinder further includes a liquid injection hole and a gas release valve arranged on the top surface of the cylinder body, and the liquid injection hole is connected to the liquid injection pipe. The liquid injection pipe adds polishing liquid into the device from the upper part of the inner cylinder, that is, the polishing liquid is added after all other components are installed in place. The air release valve can discharge the air in the cylinder during the process of adding polishing liquid.
进一步的,放气阀包括阀球和安装板,筒体上表面设置放气孔,放气孔为一个带斜面的沉孔且沉头在下,安装板与放气孔底端螺纹连接,安装板表面设有若干通孔,阀球置于安装板和放气孔斜面之间。放气阀用于排出注液过程中的筒体内空气,但在排出结束后需要及时关闭,使用一密度小于抛光液的阀球用于通断部件,在尚存留空气时留出空气通道,在筒体内抛光液注满后上升至阀球时,通过浮力托举起阀球从而封闭排气通道。Further, the air release valve includes a valve ball and an installation plate, a air release hole is arranged on the upper surface of the cylinder, the air release hole is a countersunk hole with a slope and the countersunk head is at the bottom, the installation plate is screwed with the bottom end of the air release hole, and the surface of the installation plate is provided with Several through holes, the valve ball is placed between the mounting plate and the inclined surface of the vent hole. The air release valve is used to discharge the air in the cylinder during the liquid injection process, but it needs to be closed in time after the discharge is completed. A valve ball with a density less than that of the polishing liquid is used to switch the parts, and an air channel is left when there is still air. When the polishing liquid in the cylinder is filled and rises to the valve ball, the valve ball is lifted by the buoyancy support to close the exhaust passage.
作为优化,预紧弹簧为发条弹簧。发条弹簧的弹力不随作用行程而发生变化,初始化后,只要预紧弹簧都是压缩状态,那么,所有的预紧柱均受到一个相同的向下的抵紧力,从而让外筒底部与大理石面接触的一圈均有同等的密封力。As an optimization, the preload spring is a clockwork spring. The elastic force of the mainspring does not change with the action stroke. After initialization, as long as the preload springs are in a compressed state, all the preload columns are subjected to the same downward pressing force, so that the bottom of the outer cylinder and the marble are in a compressed state. One ring in contact with each other has the same sealing force.
进一步的,轴中的磁体为电磁体,电磁体与外部电性连接。电磁体可以通过电信号改变磁力大小,以便为抛光液中细粉颗粒不同的旋转速度提供相匹配的向心力。Further, the magnet in the shaft is an electromagnet, and the electromagnet is electrically connected to the outside. The electromagnet can change the size of the magnetic force through the electrical signal, so as to provide the matching centripetal force for the different rotational speeds of the fine powder particles in the polishing liquid.
与现有技术相比,本发明的有益效果是:本发明使用微米级别以下的颗粒物作为抛光剂,混合在液体中成为抛光液,高速旋转后与待抛光平面相接触,磨平大理石平面上的微观凸起,达到抛光作用;叶片大小渐变的搅拌叶片发生旋转时,可以传动不同的力道给周遭抛光液,从而使其具备不同的角速度,配合半径差异,使得抛光液具有近似相等的旋转线速度,从而均匀地接触大理石表面进行抛光,不易出现一处抛光过度而损失部分基体、一处抛光不足而光泽不够;角速度差异使得抛光液旋转时产生热量,不仅提升流动性,还能一定程度上软化待抛光平面上的微观凸起。Compared with the prior art, the beneficial effects of the present invention are as follows: the present invention uses particles below the micron level as a polishing agent, which is mixed in a liquid to become a polishing liquid, and is in contact with the plane to be polished after high-speed rotation, and smoothes the marble plane. The micro-bulges can achieve polishing effect; when the stirring blade with changing blade size rotates, it can transmit different forces to the surrounding polishing liquid, so that it has different angular velocities, and with the difference in radius, the polishing liquid has approximately the same rotational linear speed , so as to uniformly contact the marble surface for polishing, and it is not easy to lose part of the matrix due to excessive polishing, and insufficient polishing to cause insufficient gloss; the difference in angular velocity makes the polishing liquid generate heat when it rotates, which not only improves fluidity, but also softens to a certain extent. Microscopic protrusions on the surface to be polished.
附图说明Description of drawings
为了使本发明的内容更容易被清楚地理解,下面根据具体实施例并结合附图,对本发明作进一步详细的说明。In order to make the content of the present invention easier to understand clearly, the present invention will be described in further detail below according to specific embodiments and in conjunction with the accompanying drawings.
图1为本发明的结构示意图;Fig. 1 is the structural representation of the present invention;
图2为图1中的视图A;Fig. 2 is view A in Fig. 1;
图3为本发明外筒、基板的外形侧视图;Fig. 3 is the profile side view of the outer cylinder and the base plate of the present invention;
图4为图3中的视图B-B;Fig. 4 is view B-B in Fig. 3;
图5为图3中的局部视图C;Fig. 5 is the partial view C in Fig. 3;
图6为本发明搅拌组件的立体示意图;6 is a schematic perspective view of a stirring assembly of the present invention;
图7为本发明搅拌叶片附近抛光液流体微团的运动分析图。FIG. 7 is a motion analysis diagram of the polishing liquid fluid micelle near the stirring blade of the present invention.
图中:1-内筒、11-筒体、111-放气孔、112-滞留槽、12-密封支撑件、13-注液孔、14-放气阀、141-阀球、142-安装板、2-外筒、21-拼接板、211-榫槽、22-密封条、23-预紧柱、3-电机、4-搅拌组件、41-轴、42-搅拌叶片、5-抛光液、6-注液管、7-基板、8-预紧弹簧。In the figure: 1-Inner cylinder, 11-Cylinder body, 111-Bleed hole, 112-Retention groove, 12-Sealing support, 13-Liquid injection hole, 14-Bleed valve, 141-Valve ball, 142-Installation plate , 2-outer cylinder, 21-splice plate, 211-mortise and groove, 22-sealing strip, 23-preload column, 3-motor, 4-stirring component, 41-shaft, 42-stirring blade, 5-polishing liquid, 6- Liquid injection tube, 7- Base plate, 8- Preload spring.
具体实施方式Detailed ways
下面将结合本发明实施例中的附图,对本发明实施例中的技术方案进行清楚、完整地描述,显然,所描述的实施例仅仅是本发明一部分实施例,而不是全部的实施例。基于本发明中的实施例,本领域普通技术人员在没有做出创造性劳动前提下所获得的所有其他实施例,都属于本发明保护的范围。The technical solutions in the embodiments of the present invention will be clearly and completely described below with reference to the accompanying drawings in the embodiments of the present invention. Obviously, the described embodiments are only a part of the embodiments of the present invention, but not all of the embodiments. Based on the embodiments of the present invention, all other embodiments obtained by those of ordinary skill in the art without creative efforts shall fall within the protection scope of the present invention.
如图1所示,一种大理石雕表面抛光一体机,包括内筒1、电机3、搅拌组件4、抛光液5和基板7,基板7通过机架找正安装在大理石雕的待抛光平面上,基板7上表面安装电机3,基板7下表面通过连接杆连接开口朝下的内筒1,搅拌组件4包括轴41和搅拌叶片42,搅拌叶片42位于内筒1中,搅拌叶片42朝上通过轴41连接至电机3,内筒1包括筒体11和密封支撑件12,筒体11内充满抛光液5,轴41穿过筒体11的位置处设置密封支撑件12。As shown in Figure 1, an integrated machine for polishing the surface of marble carvings includes an
本发明使用抛光液5进行抛光,抛光液5中含有一定含量的抛光颗粒物,颗粒物存留在抛光液5中,随着搅拌组件4搅动抛光液5,抛光液5与待抛光平面相接触,颗粒物不断冲刷待抛光平面的过程中,将待抛光平面上的毛刺、表面粗糙度微观尺度上的凸起磨平,从而达到降低粗糙度,提高表面光洁度的目的,抛光液5中颗粒物粒径选取得越小,可以不断提高待抛光表面的光滑程度,相比于机械式砂轮等抛光物件,精度等级上不受限制,而不同与酸碱腐蚀等化学手段,使用带细碎颗粒物的抛光液进行抛光仍然是纯物理手段,首先不会损害大理石表面的化学性质,而且不会产生二次化学污染等问题。应当注意的是,粗糙度不能跨越太多的等级提高,例如,不方便将一个表面粗糙度为6.3的石块而直接抛光至0.8乃至0.4,应当一级级地提高粗糙度精度等级。In the present invention, polishing
搅拌叶片42搅动抛光液5的动力来自于上方的电机3,下悬臂结构为了提供轴41的旋转稳定性,设置密封支撑件12提供径向支撑,同时为防止抛光液5从轴41穿过筒体11的位置处溅出以及溅入密封支撑件12内的轴承,抛光液5内的细碎颗粒毫无疑问会损伤轴承,所以密封支撑件12同时具备朝向抛光液5的密封功能。The power of the
如图1、3、4所示,抛光一体机还包括外筒2,外筒2也是开口朝下,外筒2套设于内筒1外,外筒2包括若干拼接板21,拼接板21的侧面设有榫槽211,若干拼接板21通过榫槽211嵌合在一起且可相互独立地沿竖直方向平移,拼接板21下端设置密封条22,密封条22贴紧待抛光平面,拼接板21向上设置预紧柱23,预紧柱23的上端插入基板7内并抵置于基板7内的紧预紧弹簧8。As shown in Figures 1, 3, and 4, the integrated polishing machine further includes an
设置外筒2的目的是为了为抛光液5提供一个具有完善密封的工作区域,外筒2底部的一圈环体与大理石表面接触上后框出待抛光平面,而在此一圈上,可能存在若干凸起,如果外筒2底部的一圈是刚性的或只是薄薄的一层橡胶垫,那么这些凸起会造成间隙,使得筒体11内的抛光液5流出影响使用。外筒2被扇形分割为若干片拼接板21,就像传统木桶的侧板一样,但是本发明的拼接板21相互之间通过榫槽211嵌合起来形成环形,而在竖直方向上相互独立,如图3所示,某一处位置存在凸起,那么这一位置处的拼接板21可以向上退让一定的距离而不影响周围的拼接板21,所有的拼接板21都被基板7内的预紧弹簧向下压紧,使得拼接板21底部的密封条22均贴合在大理石表面上,形成一圈环状密封圈,阻止装置内的抛光液5泄露。The purpose of setting the
如图6所示,搅拌叶片42为在一段杆体上设置的若干搅流板,搅拌叶片42的大小沿径向逐渐减小。抛光液5与待抛光表面的相互摩擦作为抛光过程,而接触面上的相对速度大小决定着抛光力的大小,如果搅拌叶片42将抛光液5均匀地搅拌起来使其发生同心旋转,即旋转角速度沿径向近似相等,那么位于外圈的抛光液5与待抛光表面的接触线速度大于位于内圈的位置处,造成抛光速度不一致的问题,在相同时间下进行抛光,外圈处的磨损大,内圈处的磨损小、抛光不到位;As shown in FIG. 6 , the stirring
为了避免这一情况,通过设置不同大小的搅拌叶片42,靠近轴线处的搅拌叶片较大,而远离轴线的搅拌叶片较小,大叶片传递给水体的动力多于小叶片,所以,尽管搅拌叶片42是同心旋转角速度相一致的,但是不同叶片传递往抛光液5的动力比例是沿径向下降的,所以,抛光液5在俯视方向上,沿其旋转轴线的径向具有不同的角速度,如图7所示,考察两个处于不同半径上的运动微团,其各自的旋转半径为R1和R2,位于外侧微团的角速度为w2,位于内侧的角速度为w1,通过相应搅拌叶片42径向布置的大小调整,使得w1*R1=w2*R2,让整个抛光平面上与抛光液5的接触速度尽可能相同,由于搅拌叶片42的叶片数必然是个有限值,此种平衡线速度的方式只能做到近似均匀。另外,由于不同半径上的流体微团旋转速度不同,那么速度分界上存在扰动,再全流场范围内将用于抛光的颗粒物分布均匀。In order to avoid this situation, by setting the
另外,由于为了平衡不同半径处的接触线速度而使得流体微团具有不同的角速度,又由于抛光液5无增无减,即流场中不存在速度奇点、物质吸入点/喷吐点,所以,相邻微团之间必然存在液体内部摩擦,摩擦生热,提高抛光液5温度,流动性大大增强,抛光液5内的颗粒物抛光性能更佳。In addition, because the fluid micelles have different angular velocities in order to balance the contact linear velocities at different radii, and because the polishing
轴41内部设置磁体,抛光液5中含有细粉颗粒,细粉颗粒带有永磁性,细粉颗粒的粒径低于抛光面目标粗糙度至少一个数量级。A magnet is arranged inside the
抛光液5旋转过程实现抛光,虽然细粉颗粒会被液体搅动趋向均匀,但是由于离心力的作用,也会存在颗粒往外环汇集的趋势,所以使用磁性提供一个向心力,平衡掉运作所存在的离心作用,让颗粒能够自由的散布开来并进行抛光过程。被抛光平面上被颗粒撞击下来的大理石混入抛光液5内,从表面上掉落下来后可能又会划伤已经抛光的平面,而大理石不被轴41吸引,所以只要在抛光液5内旋转一定时间后,就会被甩往外环,待抛光平面的目标粗糙度决定着掉落下来的大理石颗粒粒径平均值,大理石颗粒与用于抛光的细粉颗粒粒径相差较大可以帮助快速分离,使其贴紧外围。
如图1所示,筒体11侧内壁底部设有环形的滞留槽112,滞留槽112的上部倾斜往上,滞留槽112的下部水平或朝向筒体11壁面方向下凹。As shown in FIG. 1 , the bottom of the inner wall of the
滞留槽112容纳前述的抛光过程从待加工平面上掉落下来的大理石颗粒。The
如图1所示,抛光一体机还包括注液管6,内筒1还包括设置于筒体11顶面的注液孔13和放气阀14,注液孔13连接注液管6。注液管6从内筒1上部往装置内添加抛光液5,即抛光液5的加入是在所有其他部件安装到位后再添加的。放气阀14可以再添加抛光液5的过程中排出筒体11内的空气。As shown in FIG. 1 , the all-in-one polishing machine further includes a liquid injection pipe 6 , and the
如图2所示,放气阀14包括阀球141和安装板142,筒体11上表面设置放气孔111,放气孔111为一个带斜面的沉孔且沉头在下,安装板142与放气孔111底端螺纹连接,安装板142表面设有若干通孔,阀球141置于安装板142和放气孔111斜面之间。放气阀14用于排出注液过程中的筒体11内空气,但在排出结束后需要及时关闭,使用一密度小于抛光液5的阀球141用于通断部件,如图2所示,在尚存留空气时留出空气通道,在筒体11内抛光液5注满后上升至阀球141时,通过浮力托举起阀球141从而封闭排气通道。As shown in FIG. 2 , the
如图5所示,预紧弹簧8为发条弹簧。发条弹簧的弹力不随作用行程而发生变化,初始化后,只要预紧弹簧8都是压缩状态,那么,所有的预紧柱23均受到一个相同的向下的抵紧力,从而让外筒2底部与大理石面接触的一圈均有同等的密封力。As shown in FIG. 5 , the
轴41中的磁体为电磁体,电磁体与外部电性连接。电磁体可以通过电信号改变磁力大小,以便为抛光液5中细粉颗粒不同的旋转速度提供相匹配的向心力。The magnet in the
本发明的主要使用过程是:将装置置于大理石的待抛光平面上,找平并安装好后,通过注液管6往内筒1内注入抛光液5,然后启动电机3,带动搅拌叶片42旋转,位于筒体11内,贴近待抛光平面的抛光液5成等线速度的旋转运动,均匀地对表面进行抛光,由于抛光液5旋转角速度不同,液体摩擦导致抛光液5温度上升,流动性更好,温润待抛光表面。The main use process of the present invention is as follows: the device is placed on the marble surface to be polished, leveled and installed, and the polishing
对于本领域技术人员而言,显然本发明不限于上述示范性实施例的细节,而且在不背离本发明的精神或基本特征的情况下,能够以其他的具体形式实现本发明。因此,无论从哪一点来看,均应将实施例看作是示范性的,而且是非限制性的,本发明的范围由所附权利要求而不是上述说明限定,因此旨在将落在权利要求的等同要件的含义和范围内的所有变化囊括在本发明内。不应将权利要求中的任何附图标记视为限制所涉及的权利要求。It will be apparent to those skilled in the art that the present invention is not limited to the details of the above-described exemplary embodiments, but that the present invention may be embodied in other specific forms without departing from the spirit or essential characteristics of the invention. Therefore, the embodiments are to be regarded in all respects as illustrative and not restrictive, and the scope of the invention is defined by the appended claims rather than the foregoing description, which are therefore intended to fall within the scope of the appended claims. All changes within the meaning and range of the equivalents of , are included in the present invention. Any reference signs in the claims shall not be construed as limiting the involved claim.
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CN202010943757.XA Active CN112264904B (en) | 2019-12-03 | 2019-12-03 | Marble carving surface finish all-in-one |
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Citations (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH04210374A (en) * | 1990-12-14 | 1992-07-31 | Seiko Electronic Components Ltd | Automatic feeding device for abrasive |
CN203679973U (en) * | 2013-12-02 | 2014-07-02 | 天津市利雅得工贸有限公司 | Bicycle frame polishing equipment |
CN204816703U (en) * | 2015-04-29 | 2015-12-02 | 李明顺 | Superfine powder grinder of high -purity silica |
CN204843815U (en) * | 2015-07-31 | 2015-12-09 | 东北工业集团有限公司吉林江机公司 | Surface finish machine in barrel |
CN205097012U (en) * | 2015-09-28 | 2016-03-23 | 天津鸿鑫晨科技发展有限公司 | Novel magnetic force burnishing machine |
CN106077659A (en) * | 2016-07-25 | 2016-11-09 | 北京工业大学 | A method for surface polishing of 3D printed metal parts |
CN206509900U (en) * | 2016-11-04 | 2017-09-22 | 肖桂金 | A kind of stable marble polisher of performance |
CN105881185B (en) * | 2016-04-08 | 2018-04-17 | 广东工业大学 | A kind of supercharging high speed abrasive particle magnetic current internal surface of hole polishing method and device certainly |
Family Cites Families (14)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2007021660A (en) * | 2005-07-15 | 2007-02-01 | Fdk Corp | Mirror polishing method and mirror polishing apparatus for complex shaped body |
CN201175873Y (en) * | 2008-03-10 | 2009-01-07 | 浙江工业大学 | Abrasive particle flow circulation system for grinding and polishing built-in special stirring separator |
US20140220869A1 (en) * | 2013-02-01 | 2014-08-07 | Southern Taiwan University Of Science And Technology | Subtle vortex polishing apparatus |
CN203459394U (en) * | 2013-02-09 | 2014-03-05 | 山东华绿餐处科技股份有限公司 | Kitchen waste pretreatment equipment |
CN104209034A (en) * | 2014-09-19 | 2014-12-17 | 镇江宝纳电磁新材料有限公司 | Device for dispersing and stirring metal soft magnetic powder particles |
CN205888862U (en) * | 2016-08-11 | 2017-01-18 | 广州陆宝机电科技有限公司 | Omnidirectional magnetic grinding machine |
CN106926140A (en) * | 2017-04-24 | 2017-07-07 | 南华大学 | A kind of Magnetorheologicai polishing liquid electrochemistry preserving device and method |
CN107443176B (en) * | 2017-08-04 | 2020-01-10 | 北京交通大学 | Super-smooth plane polishing method based on magnetorheological foam |
CN108687669A (en) * | 2018-05-10 | 2018-10-23 | 太原理工大学 | A kind of liquid circulating apparatus of ultrasonic cavitation auxiliary stirring Magnetorheologicai polishing liquid |
CN208523326U (en) * | 2018-06-22 | 2019-02-22 | 万源生态股份有限公司 | A kind of sliceable environmentally friendly planting groove |
CN208744530U (en) * | 2018-09-25 | 2019-04-16 | 云南汇恒光电技术有限公司 | A kind of optical lens convexity polishing bucket |
CN209422971U (en) * | 2019-01-08 | 2019-09-24 | 浙江师范大学杭州校区 | Honeycomb type Multifunctional splicing children swim tool |
CN109531431B (en) * | 2019-01-14 | 2024-04-16 | 中国工程物理研究院机械制造工艺研究所 | Circulation device of magnetorheological polishing liquid |
CN110238708B (en) * | 2019-06-20 | 2024-01-23 | 中国工程物理研究院激光聚变研究中心 | Magnetorheological fluid circulating system of magnetorheological polishing machine tool |
-
2019
- 2019-12-03 CN CN202010943756.5A patent/CN112276779B/en active Active
- 2019-12-03 CN CN202010943757.XA patent/CN112264904B/en active Active
- 2019-12-03 CN CN201911217789.5A patent/CN110883625B/en not_active Expired - Fee Related
Patent Citations (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH04210374A (en) * | 1990-12-14 | 1992-07-31 | Seiko Electronic Components Ltd | Automatic feeding device for abrasive |
CN203679973U (en) * | 2013-12-02 | 2014-07-02 | 天津市利雅得工贸有限公司 | Bicycle frame polishing equipment |
CN204816703U (en) * | 2015-04-29 | 2015-12-02 | 李明顺 | Superfine powder grinder of high -purity silica |
CN204843815U (en) * | 2015-07-31 | 2015-12-09 | 东北工业集团有限公司吉林江机公司 | Surface finish machine in barrel |
CN205097012U (en) * | 2015-09-28 | 2016-03-23 | 天津鸿鑫晨科技发展有限公司 | Novel magnetic force burnishing machine |
CN105881185B (en) * | 2016-04-08 | 2018-04-17 | 广东工业大学 | A kind of supercharging high speed abrasive particle magnetic current internal surface of hole polishing method and device certainly |
CN106077659A (en) * | 2016-07-25 | 2016-11-09 | 北京工业大学 | A method for surface polishing of 3D printed metal parts |
CN206509900U (en) * | 2016-11-04 | 2017-09-22 | 肖桂金 | A kind of stable marble polisher of performance |
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CN112276779A (en) | 2021-01-29 |
CN112264904B (en) | 2022-11-18 |
CN112264904A (en) | 2021-01-26 |
CN112276779B (en) | 2022-11-25 |
CN110883625A (en) | 2020-03-17 |
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