CN110850111A - Rotary array device based on bionic resonance hair sensor - Google Patents
Rotary array device based on bionic resonance hair sensor Download PDFInfo
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Abstract
The invention discloses a rotary array device based on bionic resonance hair sensors, wherein the four-sensor rotary array device is formed by rotationally and adjacently arranging four bionic resonance hair sensors, the whole structure is shaped like a Chinese character tian, and the sensitivity of the flow velocity and the direction of fluid in any direction in a plane can be realized by measuring the change of the inherent frequency of the four bionic resonance hair sensors. The four-sensor rotary array device has very good direction measuring force, high signal gain, strong anti-interference capability and high spatial resolution capability.
Description
Technical Field
The invention belongs to the technical field of micro-electromechanical systems and micro-inertia measurement, and particularly relates to a rotary array device based on a bionic resonance hair sensor.
Background
The initial research inspiration of the bionic hair sensor comes from the hair sensor on the insect body, and the bionic hair sensor has strong functions and extremely high sensitivity and can provide extremely high sensitivity and dynamic range. The bionic hair sensor can realize the detection of various physical signals, such as flow velocity, temperature, vibration, environment identification and the like by utilizing the biological characteristics.
A single bionic resonance hair sensor can only measure single-axis physical quantity, and cannot measure multi-axis physical quantity at the same time, and a plurality of sensors can be arranged at different positions in space to form a sensor array by utilizing array signal processing, so that information of each angle of a space signal field is received and processed, and multi-axis measurement is realized.
In recent years, in order to exert the characteristics of the bionic hair sensor to a greater extent, a plurality of domestic and foreign research institutions research the array arrangement of the sensor. A Najafi professor team of Anneaberg university of Michigan university in America researches and manufactures a hair flow velocity micro-sensor array based on a micro-hydraulic amplification principle, the array consists of 4 hairs and can measure the flow velocity in a 2-dimensional direction, and an external circuit obtains the magnitude of the external flow velocity through measuring capacitance change. However, most research institutions focus on the application of a single hair sensor, and the functions are single, so that the characteristics of the hair sensor are not fully developed.
Disclosure of Invention
The purpose of the invention is as follows: in order to overcome the problems and the defects in the prior art, the invention provides a rotary array device based on a bionic resonance hair sensor, which has the advantages of very good direction measuring force, high signal gain, strong anti-interference capability, high spatial resolution capability and the like.
The technical scheme is as follows: in order to achieve the above object, the present invention provides a rotary array device based on a bionic resonant hair sensor.
A rotary array device based on a bionic resonance hair sensor is formed by rotationally and adjacently arranging a first bionic resonance hair sensor, a second bionic resonance hair sensor, a third bionic resonance hair sensor and a fourth bionic resonance hair sensor, and the whole structure is in a shape like a Chinese character 'tian';
the first bionic resonance hair sensor consists of an upper first hair structure and a lower first silicon microsensor structure, the second bionic resonance hair sensor consists of an upper second hair structure and a lower second silicon microsensor structure, the third bionic resonance hair sensor consists of an upper third hair structure and a lower third silicon microsensor structure, and the fourth bionic resonance hair sensor consists of an upper fourth hair structure and a lower fourth silicon microsensor structure;
the first bionic resonance hair sensor is positioned at the lower left corner of the rotary array device, is parallel to the fourth bionic resonance hair sensor along the positive direction of the X axis and is parallel to the second bionic resonance hair sensor along the positive direction of the Y axis; the second bionic resonance hair sensor is positioned at the upper left corner of the rotary array device, is parallel to the third bionic resonance hair sensor along the positive direction of the X axis and is parallel to the first bionic resonance hair sensor along the negative direction of the Y axis; the third bionic resonance hair sensor is positioned at the upper right corner of the rotary array device, is parallel to the second bionic resonance hair sensor along the X-axis negative direction and is parallel to the fourth bionic resonance hair sensor along the Y-axis negative direction; the fourth bionic resonance hair sensor is positioned at the lower right corner of the rotary array device, is parallel to the first bionic resonance hair sensor along the X-axis negative direction and is parallel to the third bionic resonance hair sensor along the Y-axis positive direction; the third hair structure and the first hair structure are respectively positioned at the upper edge and the lower edge of the rotating array device and are sensitive to the flow velocity along the X-axis direction; the second hair structure and the fourth hair structure are respectively positioned at the left edge and the right edge of the rotating array device and are sensitive to the flow velocity along the Y-axis direction.
Further, the first silicon microsensor structure is located at the lower left corner of the rotating array device, the second silicon microsensor structure is located at the upper left corner of the rotating array device, the third silicon microsensor structure is located at the upper right corner of the rotating array device, and the fourth silicon microsensor structure is located at the lower right corner of the rotating array device.
Furthermore, a first rotating center on the first silicon microsensor structure is positioned at the top of the upper end of the first base mass block, a first lever mechanism, a second lever mechanism, a first double-end fixed tuning fork resonator substructure, a first swing suppression elastic structure, a second swing suppression elastic structure, a third swing suppression elastic structure and a fourth swing suppression elastic structure which are symmetrical to the left and the right are arranged inside the first base mass block and are respectively arranged at four top points of the first base mass block, namely the lower right, the upper left and the upper right;
a second rotation center of the second silicon microsensor structure is positioned at the top of the right end of the second base mass block, a third lever mechanism, a fourth lever mechanism, a third double-end fixed tuning fork resonator substructure and a fourth double-end fixed tuning fork resonator substructure which are symmetrical up and down are arranged in the second base mass block, and fifth, sixth, seventh and eighth swing suppression elastic structures are respectively arranged at four top points of the second base mass block, namely the right lower top, the left lower top and the right upper top;
a third rotation center of the third silicon microsensor structure is positioned at the bottom of the lower end of a third base mass block, a fifth and a sixth lever mechanisms which are symmetrical left and right and a fifth and a sixth double-end fixed tuning fork resonator substructure are arranged in the third base mass block, and ninth, tenth, eleventh and twelfth swing inhibiting elastic structures are respectively arranged at four top points of the lower right, the lower left, the upper left and the upper right of the third base mass block;
the fourth rotation center of the fourth silicon microsensor structure is positioned at the top of the left end of the fourth base mass block, seventh and eighth lever mechanisms and seventh and eighth double-end fixed tuning fork resonator substructures which are symmetrical up and down are arranged in the fourth base mass block, and thirteenth, fourteenth, fifteenth and sixteenth swing suppression elastic structures are respectively arranged at four top points of the fourth base mass block, namely the lower right, the lower left, the upper left and the upper right.
Further, the third and fourth swing-inhibiting elastic structures of the first silicon microsensor structure are adjacent to the fifth and sixth swing-inhibiting elastic structures of the second silicon microsensor structure, the fifth and eighth swing-inhibiting elastic structures of the second silicon microsensor structure are adjacent to the tenth and eleventh swing-inhibiting elastic structures of the third silicon microsensor structure, the ninth and tenth swing-inhibiting elastic structures of the third silicon microsensor structure are adjacent to the fifteenth and sixteenth swing-inhibiting elastic structures of the fourth silicon microsensor structure, and the fourteenth and fifteenth swing-inhibiting elastic structures of the fourth silicon microsensor structure are adjacent to the first and fourth swing-inhibiting elastic structures of the first silicon microsensor structure.
Furthermore, four paths of output signals of the first, second, third and fourth bionic resonance hair sensors are measured by the control system and processed by a maximum likelihood estimation method, so that the size and the direction of any flow velocity in a plane can be sensed;
the solving process of the maximum likelihood estimation method comprises two parts: a front-end operation process and a back-end demodulation process; the front-end operation process consists of a difference process, an accumulation process and an average value process;
the difference process is as follows: four-path frequency signal two-phase and two-phase output by control systemSubtracting the first output signal xi1And a third output signal xi3Subtracting, the second output signal xi2And a fourth output signal xi4Subtracting; the accumulation process is as follows: performing accumulation operation on the two groups of obtained differential signals, wherein the accumulation times are set by a control system; the mean process is as follows: dividing the accumulated value by two times of accumulated times;
the rear-end demodulation process consists of a flow velocity demodulation process and an incident angle demodulation process; the flow velocity size demodulation process comprises the following steps: the two groups of numerical values obtained in the front-end operation process are respectively squared and then summed, and then the root number is opened, so that the current flow velocity can be obtained
The flow velocity direction demodulation process comprises the following steps: two groups of values obtained in the front-end operation process and the current flow velocity obtained in the flow velocity demodulation process
Demodulating to obtain the incident angle
Has the advantages that: compared with the prior art, the invention has the following advantages:
(1) for the four-sensor rotary array device, the X-axis and Y-axis direction flow velocity measurement can be realized, the accuracy, the sensitivity and the signal to noise ratio of the measured signals can be improved by processing the sensor array signals and fusing data, and the orientation of a fluid source is realized.
(2) Compared with a single bionic resonance hair sensor for measuring signals, the sensor array has better direction measuring force, high signal gain, strong anti-interference capability and high spatial resolution capability.
(3) For the four-sensor rotary array device, when hairs are acted by external fluid in the X-axis direction (or the Y-axis direction), the two groups of hair structures in the X-axis direction (or the Y-axis direction) can drive the base mass block to deflect a certain angle around the rotating center and the Y-axis (or the X-axis), and at the moment, the tuning fork resonator of the bionic resonant hair sensor in the sensitive axis direction is acted by axial force, and the natural frequency of the tuning fork resonator changes. When the external force to which the frequency is subjected is larger, the corresponding change of the natural frequency is larger.
(4) When the natural frequency of the double-end fixed tuning fork changes due to the action of external acceleration or fluid in the X direction (or Y direction), the measurement of the current natural frequency of the resonant beam can be realized by externally connecting a measuring circuit with a fixed electrode on the structure of the silicon micro-sensor, and then four paths of output frequency signals are calculated and demodulated by utilizing a maximum likelihood estimation method, so that the sensitivity to the flow speed and the direction of the fluid in any direction in a plane can be realized.
Drawings
Fig. 1 is a schematic overall structure diagram of a rotating array device based on a bionic resonant hair sensor in the invention.
Fig. 2 is a schematic bottom structure diagram of a rotating array device based on a bionic resonant hair sensor of the present invention.
Fig. 3 is a block flow diagram of a maximum likelihood estimation algorithm.
Detailed Description
The present invention is further described with reference to the accompanying drawings and specific examples, which are intended to be illustrative only and not to be limiting of the scope of the invention, and various equivalent modifications of the invention will occur to those skilled in the art upon reading the present invention and fall within the scope of the appended claims.
As shown in fig. 1, the present invention provides a rotating array device based on a bionic resonant hair sensor, which is characterized in that: the bionic resonance hair sensor is formed by rotationally and adjacently arranging a first bionic resonance hair sensor 1-1, a second bionic resonance hair sensor 1-2, a third bionic resonance hair sensor 1-3 and a fourth bionic resonance hair sensor 1-4, and the whole structure is shaped like a Chinese character 'tian';
the first bionic resonant hair sensor 1-1 consists of an upper first hair structure 2-1 and a lower first silicon microsensor structure 3-1, the second bionic resonant hair sensor 1-2 consists of an upper second hair structure 2-2 and a lower second silicon microsensor structure 3-2, the third bionic resonant hair sensor 1-3 consists of an upper third hair structure 2-3 and a lower third silicon microsensor structure 3-3, and the fourth bionic resonant hair sensor 1-4 consists of an upper fourth hair structure 2-4 and a lower fourth silicon microsensor structure 3-4;
wherein the first bionic resonance hair sensor 1-1 is positioned at the lower left corner of the rotary array device, is parallel to the fourth bionic resonance hair sensor 1-4 along the positive direction of the X axis and is parallel to the second bionic resonance hair sensor 1-2 along the positive direction of the Y axis; the second bionic resonance hair sensor 1-2 is positioned at the upper left corner of the rotary array device, is parallel to the third bionic resonance hair sensor 1-3 along the positive direction of the X axis and is parallel to the first bionic resonance hair sensor 1-1 along the negative direction of the Y axis; the third bionic resonant hair sensor 1-3 is positioned at the upper right corner of the rotary array device, is parallel to the second bionic resonant hair sensor 1-2 along the X-axis negative direction and is parallel to the fourth bionic resonant hair sensor 1-4 along the Y-axis negative direction; the fourth bionic resonance hair sensor 1-4 is positioned at the lower right corner of the rotary array device, is parallel to the first bionic resonance hair sensor 1-1 along the negative direction of the X axis and is parallel to the third bionic resonance hair sensor 1-3 along the positive direction of the Y axis; the third hair structure 2-3 and the first hair structure 2-1 are respectively positioned at the upper edge and the lower edge of the rotating array device and are sensitive to the flow velocity along the X-axis direction; the second hair structure 2-2 and the fourth hair structure 2-4 are located at the left and right edges of the rotating array device, respectively, while being sensitive to the flow velocity in the Y-axis direction.
Wherein the first silicon microsensor structure 3-1 is located at the lower left corner of the rotating array device, the second silicon microsensor structure 3-2 is located at the upper left corner of the rotating array device, the third silicon microsensor structure 3-3 is located at the upper right corner of the rotating array device, and the fourth silicon microsensor structure 3-4 is located at the lower right corner of the rotating array device.
The first rotation center 7-1 on the first silicon microsensor structure 3-1 is positioned at the top of the upper end of the first base mass block 8-1, the first and second lever mechanisms 5-1a and 5-1b and the first and second double-end fixed tuning fork resonator substructure 4-1a and 4-1b which are symmetrical left and right are arranged inside the first base mass block 8-1, and the first, second, third and fourth swing inhibiting elastic structures 6-1a, 6-1b, 6-1c and 6-1d are respectively arranged at four top points of the first base mass block 8-1, namely the lower right, the lower left, the upper left and the upper right;
a second rotation center 7-2 of the second silicon microsensor structure 3-2 is positioned at the top of the right end of the second base mass block 8-2, a third and a fourth lever mechanisms 5-2a and 5-2b and a third and a fourth double-end fixed tuning fork resonator substructure 4-2a and 4-2b which are symmetrical up and down are arranged in the second base mass block 8-2, and a fifth, a sixth, a seventh and an eighth swing suppression elastic structure 6-2a, 6-2b, 6-2c and 6-2d are respectively arranged at four top points of the second base mass block 8-2, namely the right lower, the left upper and the right upper;
a third rotation center 7-3 of the third silicon microsensor structure 3-3 is positioned at the bottom of the lower end of a third base mass block 8-3, a fifth and a sixth lever mechanisms 5-3a and 5-3b and a fifth and a sixth double-end fixed tuning fork resonator substructure 4-3a and 4-3b which are symmetrical to the left and the right are arranged inside the third base mass block 8-3, and ninth, tenth, eleventh and twelfth swing inhibiting elastic structures 6-3a, 6-3b, 6-3c and 6-3d are respectively arranged at four top points of the third base mass block 8-3, namely the lower right, the lower left, the upper left and the upper right;
the fourth rotation center 7-4 of the fourth silicon microsensor structure 3-4 is located at the top of the left end of the fourth base mass block 8-4, and the seventh and eighth lever mechanisms 5-4a and 5-4b and the seventh and eighth double-end fixed tuning fork resonator substructures 4-4a and 4-4b, which are symmetrical up and down, are placed inside the fourth base mass block 8-4, and the thirteenth, fourteenth, fifteenth and sixteenth swing inhibiting elastic structures 6-4a, 6-4b, 6-4c and 6-4d are respectively arranged at four top points of the fourth base mass block 8-4, namely the lower right, the lower left, the upper left and the upper right.
Wherein the third and fourth oscillation suppressing elastic structures 6-1c, 6-1d of the first silicon microsensor structure 3-1 are adjacent to the fifth and sixth oscillation suppressing elastic structures 6-2a, 6-2b) of the second silicon microsensor structure 3-2, the fifth and eighth oscillation suppressing elastic structures 6-2a, 6-2d of the second silicon microsensor structure 3-2 are adjacent to the tenth and eleventh oscillation suppressing elastic structures 6-3b, 6-3c of the third silicon microsensor structure 3-3, the ninth and tenth oscillation suppressing elastic structures 6-3a, 6-3b of the third silicon microsensor structure 3-3 are adjacent to the fifteenth and sixteenth oscillation suppressing elastic structures 6-4c, 6-4d of the fourth silicon microsensor structure 3-4, the fourteenth and fifteenth oscillation suppressing elastic structures 6-4b, 6-4c of the fourth silicon microsensor structure 3-4 are adjacent to the first and fourth oscillation suppressing elastic structures 6-1a, 6-1d of the first silicon microsensor structure 3-1.
Four paths of output signals of the first, second, third and fourth bionic resonance hair sensors 1-1, 1-2, 1-3 and 1-4 are measured by a control system and processed by a maximum likelihood estimation method, so that the size and the direction of any flow velocity in a plane can be sensed;
four paths of output signals of the four-sensor rotary array device are measured by a control system and processed by a maximum likelihood estimation method, and the size and the direction of any flow velocity in a plane can be sensed. The solving method of the maximum likelihood estimation method comprises the following steps: and listing a likelihood function L (theta) of the parameter theta, and solving the offset derivative by taking the logarithm to obtain a pole, wherein the pole value is the maximum likelihood estimation value of the parameter theta.
The solving process of the maximum likelihood estimation method comprises two parts: a front-end operation process 9 and a back-end demodulation process 10; the front-end operation process consists of a difference process 11, an accumulation process 12 and an average value process 13;
the difference process 11 is: four paths of frequency signals output by the control system are subtracted in pairs, and the first path of output signal xi1And a third output signal xi3Subtracting, the second output signal xi2And a fourth output signal xi4Subtracting; the accumulation process 12 is: performing accumulation operation on the two groups of obtained differential signals, wherein the accumulation times are set by a control system; the averaging process 13 is: dividing the accumulated value by two times of accumulated times;
the rear-end demodulation process 10 consists of a flow velocity demodulation process 14 and an incident angle demodulation process 15; the flow rate size demodulation process 14 is as follows: the two groups of numerical values obtained in the front-end operation process 9 are respectively squared and then summed, and then the root number is opened, so that the current flow velocity can be obtained
The flow velocity direction demodulation process 15 is: two groups of values obtained in the front-end operation process 9 and the current flow velocity obtained in the flow velocity demodulation processDemodulating to obtain the incident angle
When the hair structure of the four-sensor rotary array device is subjected to an external flow field, if white noise of the hair structure in the external flow field conforms to Gaussian distribution, a relational expression of flow rate information and a control system output signal can be obtained through deduction:
wherein the content of the first and second substances,
information on the magnitude and direction of the external air flow is contained,
means the flow rate of air, in m/s,indicating the angle of the direction of the external air flow rate with the X-axis. According to the above expression, the flow rate demodulation process 14 is: the two groups of numerical values obtained in the front-end operation process 9 are respectively squared and then summed, and then the root number is opened, so that the current flow velocity can be obtained
The flow velocity direction demodulation process 15 is: two groups of values obtained in the front end operation process 9 and the current flow velocity obtained in the flow velocity demodulation process 14Demodulating to obtain the incident angle
Generally, if the hair is exposed in an external flow fieldThe obtained noise conforms to other distributions, and for the array sensors in other arrangement modes, the sensitive axes of the array sensors are in different directions (not limited to the positive and negative directions of the x and y axes), parameters can be obtained through the method
And further obtaining the estimated flow speed and the incident angle.
While the invention has been described in connection with specific embodiments thereof, it will be understood that these should not be construed as limiting the scope of the invention, which is defined in the following claims, and any variations which fall within the scope of the claims are intended to be embraced thereby.
Claims (5)
1. A rotary array device based on a bionic resonance hair sensor is characterized in that: the bionic resonance hair sensor is formed by rotationally and adjacently arranging a first bionic resonance hair sensor, a second bionic resonance hair sensor, a third bionic resonance hair sensor and a fourth bionic resonance hair sensor (1-1, 1-2, 1-3 and 1-4), and the whole structure is shaped like a Chinese character 'tian';
the first bionic resonant hair sensor (1-1) consists of an upper first hair structure (2-1) and a lower first silicon microsensor structure (3-1), the second bionic resonant hair sensor (1-2) consists of an upper second hair structure (2-2) and a lower second silicon microsensor structure (3-2), the third bionic resonant hair sensor (1-3) consists of an upper third hair structure (2-3) and a lower third silicon microsensor structure (3-3), and the fourth bionic resonant hair sensor (1-4) consists of an upper fourth hair structure (2-4) and a lower fourth silicon microsensor structure (3-4);
wherein the first bionic resonance hair sensor (1-1) is positioned at the lower left corner of the rotary array device, is parallel to the fourth bionic resonance hair sensor (1-4) along the positive direction of the X axis and is parallel to the second bionic resonance hair sensor (1-2) along the positive direction of the Y axis; the second bionic resonance hair sensor (1-2) is positioned at the upper left corner of the rotary array device, is parallel to the third bionic resonance hair sensor (1-3) along the positive direction of the X axis and is parallel to the first bionic resonance hair sensor (1-1) along the negative direction of the Y axis; the third bionic resonance hair sensor (1-3) is positioned at the upper right corner of the rotary array device, is parallel to the second bionic resonance hair sensor (1-2) along the X-axis negative direction and is parallel to the fourth bionic resonance hair sensor (1-4) along the Y-axis negative direction; the fourth bionic resonance hair sensor (1-4) is positioned at the lower right corner of the rotary array device, is parallel to the first bionic resonance hair sensor (1-1) along the negative direction of the X axis and is parallel to the third bionic resonance hair sensor (1-3) along the positive direction of the Y axis; the third hair structure (2-3) and the first hair structure (2-1) are respectively positioned at the upper edge and the lower edge of the rotating array device and are sensitive to the flow velocity along the X-axis direction; the second hair structure (2-2) and the fourth hair structure (2-4) are respectively positioned at the left edge and the right edge of the rotating array device and are sensitive to the flow velocity along the Y-axis direction.
2. The rotary array device based on the bionic resonant hair sensor, according to claim 1, is characterized in that the first silicon microsensor structure (3-1) is positioned at the lower left corner of the rotary array device, the second silicon microsensor structure (3-2) is positioned at the upper left corner of the rotary array device, the third silicon microsensor structure (3-3) is positioned at the upper right corner of the rotary array device, and the fourth silicon microsensor structure (3-4) is positioned at the lower right corner of the rotary array device.
3. A rotating array device based on a bionic resonant hair sensor according to claim 1, the method is characterized in that: the first rotation center (7-1) on the first silicon microsensor structure (3-1) is positioned at the top of the upper end of the first base mass block (8-1), a first lever mechanism (5-1a, 5-1b) and a first double-end fixed tuning fork resonator substructure (4-1a, 4-1b) which are symmetrical left and right are arranged inside the first base mass block (8-1), and a first swing inhibiting elastic structure (6-1a, 6-1b, 6-1c, 6-1d) is arranged at four top points of the first base mass block (8-1), namely the lower right, the lower left, the upper left and the upper right;
a second rotation center (7-2) of the second silicon microsensor structure (3-2) is positioned at the top of the right end of the second base mass block (8-2), a third and a fourth lever mechanisms (5-2a, 5-2b) and a third and a fourth double-end fixed tuning fork resonator sub-structures (4-2a, 4-2b) which are symmetrical up and down are arranged inside the second base mass block (8-2), and fifth, sixth, seventh and eighth swing inhibiting elastic structures (6-2a, 6-2b, 6-2c and 6-2d) are respectively arranged at four top points of the second base mass block (8-2), namely the lower right, the lower left, the upper left and the upper right;
a third rotation center (7-3) of the third silicon microsensor structure (3-3) is positioned at the bottom of the lower end of a third base mass block (8-3), a fifth and a sixth lever mechanisms (5-3a, 5-3b) and a fifth and a sixth double-end fixed tuning fork resonator sub-structures (4-3a, 4-3b) which are symmetrical to the left and the right are arranged inside the third base mass block (8-3), and ninth, tenth, eleventh and twelfth swing inhibiting elastic structures (6-3a, 6-3b, 6-3c and 6-3d) are respectively arranged at four top points of the lower right, the lower left, the upper left and the upper right of the third base mass block (8-3);
the fourth rotation center (7-4) of the fourth silicon microsensor structure (3-4) is positioned at the top of the left end of the fourth base mass block (8-4), a seventh and an eight-lever mechanism (5-4a, 5-4b) and a seventh and an eight-double-end fixed tuning fork resonator substructure (4-4a, 4-4b) which are symmetrical up and down are arranged inside the fourth base mass block (8-4), and thirteenth, fourteenth, fifteenth and sixteenth swing suppression elastic structures (6-4a, 6-4b, 6-4c and 6-4d) are respectively arranged at four top points of the fourth base mass block (8-4), namely the lower right, the lower left, the upper left and the upper right.
4. A rotary array device based on biomimetic resonant hair sensors, according to claim 3, characterized in that the third and fourth swing-inhibiting elastic structures (6-1c, 6-1d) of the first silicon microsensor structure (3-1) are adjacent to the fifth and sixth swing-inhibiting elastic structures (6-2a, 6-2b) of the second silicon microsensor structure (3-2), the fifth and eighth swing-inhibiting elastic structures (6-2a, 6-2d) of the second silicon microsensor structure (3-2) are adjacent to the tenth and eleventh swing-inhibiting elastic structures (6-3b, 6-3c) of the third silicon microsensor structure (3-3), the ninth and tenth swing-inhibiting elastic structures (6-3a, 6-3c) of the third silicon microsensor structure (3-3), 6-3b) is adjacent to the fifteenth and sixteenth oscillation suppressing elastic structures (6-4c, 6-4d) of the fourth silicon microsensor structure (3-4), and the fourteenth and fifteenth oscillation suppressing elastic structures (6-4b, 6-4c) of the fourth silicon microsensor structure (3-4) is adjacent to the first and fourth oscillation suppressing elastic structures (6-1a, 6-1d) of the first silicon microsensor structure (3-1).
5. The rotating array device based on the bionic resonance hair sensor is characterized in that four paths of output signals of the first, second, third and fourth bionic resonance hair sensors (1-1, 1-2, 1-3 and 1-4) are measured by a control system and can sense the magnitude and direction of any flow velocity in a plane through the maximum likelihood estimation method;
the solving process of the maximum likelihood estimation method comprises two parts: a front-end operation process (9) and a back-end demodulation process (10); the front-end operation process consists of a difference process (11), an accumulation process (12) and an average value process (13);
the difference process (11) is as follows: four paths of frequency signals output by the control system are subtracted in pairs, and the first path of output signal xi1And a third output signal xi3Subtracting, the second output signal xi2And a fourth output signal xi4Subtracting; the accumulation process (12) is as follows: performing accumulation operation on the two groups of obtained differential signals, wherein the accumulation times are set by a control system; the averaging process (13) is: dividing the accumulated value by two times of accumulated times;
the rear-end demodulation process (10) consists of a flow velocity demodulation process (14) and an incident angle demodulation process (15); the flow velocity size demodulation process (14) comprises the following steps: the two groups of numerical values obtained in the front-end operation process (9) are respectively squared and then summed, and then the root number is formed, so that the current flow velocity can be obtained
The flow velocity direction demodulation process (15) comprises the following steps: two groups of values obtained in the front-end operation process (9) and the current flow velocity obtained in the flow velocity demodulation process
Demodulating to obtain the incident angle
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