CN110846625B - Rectangular high vacuum cathode arc target device - Google Patents
Rectangular high vacuum cathode arc target device Download PDFInfo
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- CN110846625B CN110846625B CN201911253460.4A CN201911253460A CN110846625B CN 110846625 B CN110846625 B CN 110846625B CN 201911253460 A CN201911253460 A CN 201911253460A CN 110846625 B CN110846625 B CN 110846625B
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- 239000013077 target material Substances 0.000 claims abstract description 11
- -1 polytetrafluoroethylene Polymers 0.000 claims description 10
- 229920001343 polytetrafluoroethylene Polymers 0.000 claims description 10
- 239000004810 polytetrafluoroethylene Substances 0.000 claims description 10
- 238000001816 cooling Methods 0.000 claims description 9
- 229920000642 polymer Polymers 0.000 claims description 9
- 239000000110 cooling liquid Substances 0.000 claims description 3
- 239000002245 particle Substances 0.000 abstract description 9
- 238000010891 electric arc Methods 0.000 abstract description 5
- 238000002347 injection Methods 0.000 abstract description 3
- 239000007924 injection Substances 0.000 abstract description 3
- 238000005516 engineering process Methods 0.000 description 17
- 238000000151 deposition Methods 0.000 description 14
- 230000008021 deposition Effects 0.000 description 12
- 239000000243 solution Substances 0.000 description 9
- 230000000694 effects Effects 0.000 description 8
- 238000012986 modification Methods 0.000 description 6
- 230000004048 modification Effects 0.000 description 6
- 238000013461 design Methods 0.000 description 4
- 238000001914 filtration Methods 0.000 description 4
- 238000007733 ion plating Methods 0.000 description 4
- 238000000034 method Methods 0.000 description 4
- 239000011248 coating agent Substances 0.000 description 3
- 238000000576 coating method Methods 0.000 description 3
- 239000002131 composite material Substances 0.000 description 3
- 229910052751 metal Inorganic materials 0.000 description 3
- 239000002184 metal Substances 0.000 description 3
- 230000007547 defect Effects 0.000 description 2
- 238000011161 development Methods 0.000 description 2
- 230000005684 electric field Effects 0.000 description 2
- 238000000605 extraction Methods 0.000 description 2
- 150000002500 ions Chemical class 0.000 description 2
- 238000001755 magnetron sputter deposition Methods 0.000 description 2
- 239000000758 substrate Substances 0.000 description 2
- 238000002679 ablation Methods 0.000 description 1
- 230000009286 beneficial effect Effects 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 239000000919 ceramic Substances 0.000 description 1
- 230000005284 excitation Effects 0.000 description 1
- 238000000265 homogenisation Methods 0.000 description 1
- 238000009776 industrial production Methods 0.000 description 1
- 230000010354 integration Effects 0.000 description 1
- 238000010884 ion-beam technique Methods 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 239000011159 matrix material Substances 0.000 description 1
- 150000002739 metals Chemical class 0.000 description 1
- 230000007935 neutral effect Effects 0.000 description 1
- 238000013021 overheating Methods 0.000 description 1
- 231100000572 poisoning Toxicity 0.000 description 1
- 230000000607 poisoning effect Effects 0.000 description 1
- 238000002360 preparation method Methods 0.000 description 1
- 238000012545 processing Methods 0.000 description 1
- 230000000750 progressive effect Effects 0.000 description 1
- 239000007921 spray Substances 0.000 description 1
- 238000003786 synthesis reaction Methods 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/24—Vacuum evaporation
- C23C14/32—Vacuum evaporation by explosion; by evaporation and subsequent ionisation of the vapours, e.g. ion-plating
- C23C14/325—Electric arc evaporation
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- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Physical Vapour Deposition (AREA)
Abstract
The invention discloses a strip high vacuum cathode arc target device, a vacuum chamber is used for placing the strip high vacuum cathode arc target device, and the device comprises: the device comprises a main support frame, an anode, a cathode target, a shielding electrode, a first shielding ring, a permanent magnet, a triggering electrode and a rotating component; the main support frame is provided with the rotating component; the rotating component is fixedly connected with the cathode target material and performs rotating action; the anode is connected with the main support frame; the first shielding ring is fixed on the anode and shields the cathode target and the vacuum chamber; the shielding electrode wraps the cathode target, and a permanent magnet is arranged in the cathode target; the trigger electrode is mounted on the shielding electrode and is electrically connected with the trigger power supply. The invention provides a strip high-vacuum cathode arc target device, which can realize stable and reliable arc discharge under high vacuum, greatly reduce particle injection caused by overhigh temperature during arcing and improve the service life of a cathode.
Description
Technical Field
The invention relates to the technical field of coating, in particular to a strip high-vacuum cathode arc target device.
Background
With the rapid development of scientific technology, the requirements on the material surface modification technology are higher and higher, and the traditional single surface modification technology is more and more difficult to meet the technical requirements on industrial production; synthesis, integration, and multifunctionality are trends in technology development.
In recent years, some surface modification composite technologies are continuously developed and are successively put into industry, and play an important role. For example, the composite technology of the magnetron sputtering technology and the electric arc ion plating technology is compatible with the advantages that the magnetron sputtering technology can deposit a film with large area and high uniformity and the advantages that the ion plating technology can prepare a film with high binding force, so that the process practicability is improved. And the multiple arc sources are combined under the action of the multi-arc ion plating, so that the multi-element composite film deposition is realized, the deposition efficiency is obviously improved, and the technology is widely applied to the cutter and part processing industry at present. Multi-arc ion plating is a very important modification in current surface deposition technology. However, the method has the important defects of low compactness of a deposited film layer, micron-sized large particles, limited size of a processed workpiece, inapplicability of a temperature sensitive matrix and the like. The magnetic filtration cathode vacuum arc deposition technology is a novel ion beam film preparation method developed in recent years, large particles and neutral atoms generated by an arc source are filtered through the magnetic filtration technology, a pure plasma beam without large particles is obtained, the problem caused by the existence of large particles in a common arc source deposition method is effectively solved, the prepared film has excellent performance, but the important defect of the direct current magnetic filtration deposition technology is that the effective area is limited when a film layer is deposited, the effective area is within 160mm in diameter, and the surface uniform coating can not be realized on the surface of a workpiece with large size.
Therefore, it is a need for a coating apparatus that is stable and reliable in high vacuum and that greatly reduces particle spray due to excessive temperatures during arcing and improves cathode life.
Disclosure of Invention
In view of the above, the present invention provides a long-strip high-vacuum cathode arc target device, which can realize stable and reliable arc discharge under high vacuum, and simultaneously greatly reduce particle injection caused by overhigh temperature during arcing and improve the service life of a cathode.
In order to achieve the above object, the present invention provides the following technical solutions:
A long strip high vacuum cathode arc target apparatus, a vacuum chamber for mounting the long strip high vacuum cathode arc target apparatus, comprising: the device comprises a main support frame, a cathode target, a shielding electrode, a first shielding ring, a permanent magnet, a triggering electrode and a rotating part; the main support frame is provided with the rotating component; the rotating component is fixedly connected with the cathode target and performs rotating action; the vacuum chamber is used as an anode, and the anode is connected with the main support frame; the first shielding ring is fixed on the anode through a ceramic screw and shields the cathode target and the vacuum chamber; the shielding electrode wraps the cathode target, and a permanent magnet is arranged in the cathode target; the trigger electrode is arranged on the shielding electrode and is electrically connected with a trigger power supply.
Through the technical scheme, the invention has the technical effects that: under the control of a trigger power supply, the trigger electrode contacts the cathode target material to strike an arc, the cathode target generates arc discharge, and the arc starts to work normally; the arc spots periodically move around the outer long axis direction of the cathode target material under the action of the permanent magnets; the cathode target material performs circular motion under the drive of a motor, and the arc spots always perform circular motion in the outer long axis direction under the action of three shielding electrodes; the plasma generated by the arc spots moves to the vacuum chamber under the traction of the initial speed to reach the surface of the workpiece for deposition; when the deposition is completed, the power supply is turned off, and the arc spot is automatically extinguished under the condition of no auxiliary voltage (cathode-anode voltage).
Preferably, in the long-strip high-vacuum cathode arc target device, the rotating member includes: the device comprises a motor, a driving gear, a first driven wheel and a rotating shaft; the first driven wheel is arranged on the rotating shaft, the driving gear is arranged on the output shaft of the motor, and the driving gear is meshed with the first driven wheel; the rotating shaft is fixedly connected with the cathode target.
Through the technical scheme, the invention has the technical effects that: ensuring uniformity of the film layer.
Preferably, in the long-strip high-vacuum cathode arc target device, the shielding electrode comprises a first shielding electrode, a second shielding electrode and a third shielding electrode; the first shielding electrode is connected with the current limiting resistor and grounded, and the second shielding electrode and the third shielding electrode shield the first shielding electrode and the anode.
Through the technical scheme, the invention has the technical effects that: the magnetic field intensity at the back and the side of the arc spot is basically not influenced by the movement of the arc spot of the arc target under the coordination of the three shielding electrode systems, so that a stable and controllable arc spot arcing state can be realized. The shielding mode is mainly shielding of an electric field and a magnetic field; the metal itself has shielding effect on the electric field; the magnetic conductive metals such as Fe, co, ni and the like have shielding effect on magnetic fields.
Preferably, in the long-strip high-vacuum cathode arc target device, the long-strip high-vacuum cathode arc target device further comprises a polytetrafluoroethylene shielding ring polymer shielding electrode; the polytetrafluoroethylene shielding ring is arranged between the main support frame and the polymer shielding electrode; the polymer shielding electrode shields the anode and the cathode target, and is arranged on the strip arc metal flange surface and used for being insulated from the vacuum chamber when being connected with the vacuum chamber.
Preferably, in the long-strip high-vacuum cathode arc target device, a polytetrafluoroethylene shielding base is mounted at the tail end of the cathode target, a second driven gear is mounted on the polytetrafluoroethylene shielding base, and the second driven gear is matched with the cathode target.
Through the technical scheme, the invention has the technical effects that: ensuring the normal rotation of the cathode target.
Preferably, in the long-strip high-vacuum cathode arc target device, the trigger electrode is connected with a current-limiting resistor and grounded.
Preferably, in the long-strip high-vacuum cathode arc target device, the trigger electrode contacts with the cathode target material to strike an arc under the control of the trigger power supply, and the cathode arc spots discharge.
Preferably, in the long-strip high-vacuum cathode arc target device, the cathode arc spot moves periodically under the action of the permanent magnet and moves circumferentially around the outer long axis direction of the cathode target.
Through the technical scheme, the invention has the technical effects that: the arc spot can be ensured to circularly reciprocate through the magnetic field control in the cathode target material, and meanwhile, the high stability and the high reliability are maintained; the problem of uneven deposition caused by the limited movement speed of the arc spot can be avoided; under the cooperation of the subsequent magnetic field, the system can enable the target material to realize ion excitation with higher valence state, namely the average charge state of the extracted ions in the plasma is higher, thereby being beneficial to the deposition of a film layer, meanwhile, the service life of the cathode arc target is higher, is basically more than 200 hours and is more than 25 times of the service life of the existing direct current magnetic filtration deposition, the labor cost of changing the target material is saved, and the large-scale industrialization is easier to realize.
Preferably, in the long-strip high-vacuum cathode arc target device, the device further comprises a cooling pipeline; the cooling pipeline penetrates through the cathode target material, and cooling liquid is introduced into the cooling pipeline.
Compared with the prior art, the technical scheme has the following technical effects:
1. The invention provides a large-size long-strip cathode arc target, the maximum extraction size can be any length, the limitation of the extraction area of a circular cathode target is avoided, the target design can be carried out according to the size of a sample, and the industrial application is greatly facilitated;
2. Compared with the existing design of a cathode structural target with the diameter of 100mm, the beam current density of the device can be 1/5 or lower than the original density, and the heat productivity of the cathode arc target per unit area is smaller under the condition of the same arcing current, so that micron-sized particles generated by overheating can be obviously inhibited, and the film forming quality is greatly improved;
3. Compared with the existing circular target design, the device can control the temperature of the substrate to be below 40 ℃ when depositing a film layer, and is very suitable for large-area surface modification of the substrate extremely sensitive to temperature;
4. Compared with the existing cylindrical target design, the problem of lower surface of the cathode target is easier to avoid arc breakage caused by target poisoning, and the deposition of the oxide film layer is more convenient to realize;
5. Compared with the existing cylindrical arc technology, the arc starting of the patent is stable under high vacuum (the vacuum degree is less than 3 multiplied by 10 -3 Pa), and the circular reciprocating motion of the arc spots can be ensured through the magnetic field control in the cathode target material, and meanwhile, the high stability and reliability are maintained; the patent can avoid the problem of uneven deposition caused by the limited movement speed of the arc spot; meanwhile, the prior cylindrical arc technology is easy to ablate preferentially at the input end of current, so that the uniformity of a film layer is seriously influenced, and the ablation homogenization at two ends is realized through the intensity control of magnetic fields at two ends, so that the industrialized mass production of the cylindrical arc is further promoted.
Drawings
In order to more clearly illustrate the embodiments of the present invention or the technical solutions in the prior art, the drawings that are required to be used in the embodiments or the description of the prior art will be briefly described below, and it is obvious that the drawings in the following description are only embodiments of the present invention, and that other drawings can be obtained according to the provided drawings without inventive effort for a person skilled in the art.
FIG. 1 is a schematic view of the structure of the present invention;
Fig. 2 is a schematic view of the structure of the shielding electrode of the present invention.
Detailed Description
The following description of the embodiments of the present invention will be made clearly and completely with reference to the accompanying drawings, in which it is apparent that the embodiments described are only some embodiments of the present invention, but not all embodiments. All other embodiments, which can be made by those skilled in the art based on the embodiments of the invention without making any inventive effort, are intended to be within the scope of the invention.
The embodiment of the invention discloses a strip high-vacuum cathode arc target device, which can realize stable and reliable arc discharge under high vacuum, greatly reduce particle injection caused by overhigh temperature during arcing and improve the service life of a cathode.
A long strip high vacuum cathode arc target apparatus, a vacuum chamber for mounting the long strip high vacuum cathode arc target apparatus, comprising: a main support 111, a cathode target 107, a shielding electrode, a first shielding ring 102, a permanent magnet 106, a triggering electrode 116, and a rotating member; the main support 111 is mounted with a rotating member; the rotating component is fixedly connected with the cathode target 107 and performs rotating action; the vacuum chamber serves as an anode, which is connected to the main support 111; the first shielding ring 102 is fixed on the anode, shields the cathode target 107 and the vacuum chamber; the shielding electrode wraps the cathode target 107, and a permanent magnet 106 is arranged inside the cathode target 107; the trigger electrode 116 is mounted on the shield electrode, and the trigger electrode 116 is electrically connected to a trigger power supply.
In order to further optimize the above technical solution, the rotating member comprises: a motor 112, a driving gear 113, a first driven wheel 110, and a rotation shaft 109; the first driven wheel 110 is mounted on the rotary shaft 109, the driving gear 113 is mounted on the output shaft of the motor 112, and the driving gear 113 is meshed with the first driven wheel 110; the rotation shaft 109 is fixedly connected to the cathode target 107.
In order to further optimize the above technical solution, the shielding electrode comprises a first shielding electrode 101, a second shielding electrode 105 and a third shielding electrode 108; the first shielding electrode 101 is connected to the current limiting resistor and grounded, and the second shielding electrode 105 and the third shielding electrode 108 shield the first shielding electrode 101 and the anode.
To further optimize the solution described above, the solution further comprises a polytetrafluoroethylene shielding ring 114, a polymer shielding pole 115; a polytetrafluoroethylene shield ring 114 is disposed between the main support 111 and the polymer shield pole 115; the polymer shield 115 shields the anode and cathode targets 107.
In order to further optimize the technical scheme, the tail end of the cathode target 107 is provided with the polytetrafluoroethylene shielding base 104, the polytetrafluoroethylene shielding base 104 is provided with the second driven gear 103, and the second driven gear 103 is matched with the cathode target 107.
To further optimize the solution described above, the trigger electrode 116 is connected to a current limiting resistor and to ground.
In order to further optimize the technical scheme, under the control of the trigger power supply, the trigger electrode 116 contacts the cathode target 107 to strike an arc, and the cathode arc spots discharge.
To further optimize the above technical solution, the cathode arc spot moves periodically under the action of the permanent magnet 106, and moves circumferentially around the outer long axis of the cathode target 107.
To further optimize the solution described above, a cooling duct 117 is also included; the cooling pipe 117 penetrates the cathode target 107, and a cooling liquid is introduced into the cooling pipe.
In the present specification, each embodiment is described in a progressive manner, and each embodiment is mainly described in a different point from other embodiments, and identical and similar parts between the embodiments are all enough to refer to each other. For the device disclosed in the embodiment, since it corresponds to the method disclosed in the embodiment, the description is relatively simple, and the relevant points refer to the description of the method section.
The previous description of the disclosed embodiments is provided to enable any person skilled in the art to make or use the present invention. Various modifications to these embodiments will be readily apparent to those skilled in the art, and the generic principles defined herein may be applied to other embodiments without departing from the spirit or scope of the invention. Thus, the present invention is not intended to be limited to the embodiments shown herein but is to be accorded the widest scope consistent with the principles and novel features disclosed herein.
Claims (7)
1.A long strip high vacuum cathode arc target device, a vacuum chamber for mounting the long strip high vacuum cathode arc target device, comprising: the device comprises a main support frame, a cathode target, a shielding electrode, a first shielding ring, a permanent magnet, a triggering electrode and a rotating part; the main support frame is provided with the rotating component; the rotating component is fixedly connected with the cathode target and performs rotating action; the rotating member includes: the device comprises a motor, a driving gear, a first driven wheel and a rotating shaft; the first driven wheel is arranged on the rotating shaft, the driving gear is arranged on the output shaft of the motor, and the driving gear is meshed with the first driven wheel; the rotating shaft is fixedly connected with the cathode target; the vacuum chamber is used as an anode, and the anode is connected with the main support frame; the first shielding ring is fixed on the anode and shields the cathode target and the vacuum chamber; the shielding electrode wraps the cathode target, and a permanent magnet is arranged in the cathode target; the trigger electrode is arranged on the shielding electrode and is electrically connected with a trigger power supply; the shielding electrode comprises a first shielding electrode, a second shielding electrode and a third shielding electrode; the first shielding electrode is connected with the current limiting resistor and grounded, and the second shielding electrode and the third shielding electrode shield the first shielding electrode and the anode.
2. The elongated high vacuum cathode arc target assembly of claim 1, further comprising a polytetrafluoroethylene shield ring, a polymer shield; the polytetrafluoroethylene shielding ring is arranged between the main support frame and the polymer shielding electrode; the polymer shield shields the anode and the cathode target.
3. The elongated high vacuum cathode arc target device of claim 1, wherein a polytetrafluoro shielding base is mounted at the end of the cathode target, a second driven gear is mounted on the polytetrafluoro shielding base, and the second driven gear is matched with the cathode target.
4. The elongated high vacuum cathode arc target apparatus of claim 1, wherein said trigger electrode is connected to a current limiting resistor and to ground.
5. The elongated high vacuum cathode arc target device of claim 1, wherein said trigger electrode contacts the cathode target to strike an arc under control of said trigger power source, and the cathode arc spot discharges.
6. The elongated high vacuum cathode arc target assembly of claim 5, wherein said cathode arc spot is periodically moved by said permanent magnet to move circumferentially about said cathode target in an outer longitudinal direction.
7. The elongated high vacuum cathode arc target apparatus of any one of claims 1-6, further comprising a cooling conduit; the cooling pipeline penetrates through the cathode target material, and cooling liquid is introduced into the cooling pipeline.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
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| CN201911253460.4A CN110846625B (en) | 2019-12-09 | 2019-12-09 | Rectangular high vacuum cathode arc target device |
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| Application Number | Priority Date | Filing Date | Title |
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| CN201911253460.4A CN110846625B (en) | 2019-12-09 | 2019-12-09 | Rectangular high vacuum cathode arc target device |
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| CN110846625A CN110846625A (en) | 2020-02-28 |
| CN110846625B true CN110846625B (en) | 2024-07-05 |
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| CN115074678B (en) * | 2022-06-20 | 2023-05-16 | 肇庆市科润真空设备有限公司 | Multi-arc target mechanism for continuous coating of stainless steel sheet and PVD coating device |
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| Publication number | Priority date | Publication date | Assignee | Title |
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| CN211814630U (en) * | 2019-12-09 | 2020-10-30 | 北京师范大学 | Long-strip high-vacuum cathode arc target device |
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| DE69226725T2 (en) * | 1991-05-29 | 1999-02-18 | Kobe Steel Ltd | Coating plant using cathode sputtering and method for controlling the same |
| KR100329632B1 (en) * | 2000-01-24 | 2002-03-21 | 한전건 | Planar typed arc ion plating apparatus using cathodic arc discharge |
| US6495002B1 (en) * | 2000-04-07 | 2002-12-17 | Hy-Tech Research Corporation | Method and apparatus for depositing ceramic films by vacuum arc deposition |
| CN202022974U (en) * | 2011-01-12 | 2011-11-02 | 超晶科技有限公司 | Cathode arc ion plating device with filtering screen |
| RU2016117814A (en) * | 2015-05-07 | 2017-11-14 | Вейпор Текнолоджиз Инк. | PROCESSES USING REMOTE ARC PLASMA |
| WO2019058587A1 (en) * | 2017-09-20 | 2019-03-28 | 日本アイ・ティ・エフ株式会社 | Arc-based film formation device and film formation method |
| CN108165935B (en) * | 2017-12-21 | 2019-10-18 | 陕西理工大学 | Contactless arc automatic starting system and striking method |
| CN108193174B (en) * | 2018-01-04 | 2019-09-24 | 陕西理工大学 | The high vacuum electric arc arc stabilizer and sputtering method of heavy caliber truncated cone-shaped target |
| CN109338310A (en) * | 2018-11-26 | 2019-02-15 | 上海子创镀膜技术有限公司 | One kind being used for multi-arc ion plating equipment circular flat multi sphere target assembly |
| CN209323003U (en) * | 2018-12-05 | 2019-08-30 | 苏州艾钛科纳米科技有限公司 | A kind of screening arrangement for cathodic arc discharge |
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Inventor after: Liao Bin Inventor after: Yingminju Inventor after: Hua Qingsong Inventor after: OuYang Xiaoping Inventor after: Luo Jun Inventor after: Chen Lin Inventor after: Zhang Xu Inventor after: Wu Xianying Inventor after: Pang Pan Inventor after: Han Ran Inventor before: Liao Bin Inventor before: Han Ran Inventor before: Yingminju Inventor before: Hua Qingsong Inventor before: He Guangyu Inventor before: OuYang Xiaoping Inventor before: Luo Jun Inventor before: Chen Lin Inventor before: Zhang Xu Inventor before: Wu Xianying Inventor before: Pang Pan |
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