CN110824861B - Reticle box positioning device and photoetching equipment - Google Patents
Reticle box positioning device and photoetching equipment Download PDFInfo
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- CN110824861B CN110824861B CN201911175700.3A CN201911175700A CN110824861B CN 110824861 B CN110824861 B CN 110824861B CN 201911175700 A CN201911175700 A CN 201911175700A CN 110824861 B CN110824861 B CN 110824861B
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- reticle pod
- reticle
- box
- mask box
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70691—Handling of masks or workpieces
- G03F7/70716—Stages
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70691—Handling of masks or workpieces
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- General Physics & Mathematics (AREA)
- Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
- Preparing Plates And Mask In Photomechanical Process (AREA)
Abstract
The invention provides a mask box positioning device and a photoetching device, wherein the mask box positioning device is used for ensuring that a mask box is kept horizontal when the mask box is placed on a photoetching machine table and/or taken from the photoetching machine table, and the mask box positioning device comprises: the guide rail structure is arranged on the photoetching machine table and is provided with at least one baffle plate used for limiting the motion trail of the photomask box; and the level measurement structure is used for measuring whether the photomask box is kept level or not when the photomask box is placed on the photoetching machine table and/or taken from the photoetching machine table. According to the technical scheme, the mask box can be kept horizontal when being placed on the photoetching machine table and/or taken from the photoetching machine table, and further the photoetching process can be smoothly carried out.
Description
Technical Field
The invention relates to the field of semiconductor manufacturing, in particular to a mask box positioning device and a photoetching device.
Background
In the manufacturing process of semiconductor devices, a reticle pod is a pod used to load a reticle in a photolithography process. In the actual production process, most factories manually place and take the reticle boxes on and off the photolithography tools. However, placing and taking the reticle pod manually has the following problems:
1. when the mask box is taken from the photoetching machine, if the taking angle is not right (namely the mask box is taken in a non-vertical direction), the mask box can be clamped on the photoetching machine. As shown in FIG. 1a, when taking the mask box 12, the mask box 12 is not kept horizontal, i.e. inclined, because the angle of taking the mask box upwards is not right, then some pins for fixing the mask box 12 on the photolithography machine 11 will hook the base (not shown) of the mask box 12, and if the pins 14 in FIG. 1a are already disengaged from the base of the mask box 12, the pins 13 will still hook the base of the mask box 12, so that the mask box 12 cannot be taken out from the photolithography machine 11 smoothly.
2. When the mask box is placed on the photolithography machine, because the angle at which the mask box is placed is not opposite (i.e. the mask box is placed in a non-vertical direction), the mask box does not keep horizontal when contacting the table top of the photolithography machine, so that the mask box does not adhere to the table top of the photolithography machine, as shown in fig. 1b, the part of the mask box 12 above the pin 13 already adheres to the photolithography machine 11, but the parts of the mask box 12 above the pin 14 and the pin 15 do not adhere to the photolithography machine 11, so that the mask box 12 cannot be firmly fixed on the photolithography machine 11; when the cover (not shown) of the mask box 12 is opened, the mask box 12 is lifted, so that the base of the mask box 12 is unhooked from the photolithography machine 11, and the photolithography machine 11 alarms to stop working.
Therefore, how to ensure that the mask box can be kept horizontal when the mask box is placed and taken so that the photolithography process can be performed normally is a problem to be solved.
Disclosure of Invention
The invention aims to provide a mask box positioning device and photoetching equipment, which can ensure that a mask box is kept horizontal when the mask box is placed on a photoetching machine table and/or taken from the photoetching machine table, so that a photoetching process can be smoothly carried out.
To achieve the above object, the present invention provides a reticle pod positioning apparatus for ensuring that a reticle pod remains horizontal when the reticle pod is placed on and/or removed from a photolithography tool, comprising:
the guide rail structure is arranged on the photoetching machine table and is provided with at least one baffle plate used for limiting the motion trail of the photomask box; and the number of the first and second groups,
the level measurement structure is used for measuring whether the mask box is kept level when the mask box is placed on the photoetching machine table and/or taken from the photoetching machine table.
Optionally, the guide rail structure has four baffles, the four baffles are connected with each other to define a cavity with two ends communicated, and the photomask box moves in the cavity.
Optionally, the height of the cavity is greater than the height of the mask box to ensure that the mask box runs a distance completely in the cavity.
Optionally, a slope protrusion is arranged at the bottom of the guide rail structure, and the slope protrusion is matched with a slope of a platform on the lithography machine table, where the platform is used for placing the reticle box, so that the reticle box positioning device can accurately place the reticle box on the platform.
Optionally, the leveling structure includes at least one laser level, the laser level is disposed on the guide rail structure, and the laser level is configured to detect whether a bottom surface and/or a top surface of the reticle box is horizontal when the reticle box is placed on and/or taken from the photolithography machine; or, the leveling structure comprises at least two height sensors, the height sensors are at least arranged on opposite edges or opposite corners of the reticle pod and/or the guide rail structure to detect whether the bottom surface and/or the top surface of the reticle pod is kept level when the reticle pod is placed on the photoetching machine table and/or taken from the photoetching machine table; or, the horizontal measuring structure comprises at least two laser range finders, the laser range finders are horizontally kept, the laser range finders are installed at least one of the bottom end, the top end and the side face of the guide rail structure, and whether the photomask box is horizontally kept or not is judged by measuring the distance from laser emitted by each laser range finder to the top face and/or the bottom face of the photomask box.
Optionally, the mask box is the cuboid, the level survey structure includes four height sensor, and four height sensor corresponds to four lateral edge settings between the top surface of mask box and the bottom surface, will the mask box is placed on the photoetching board and/or is followed take on the photoetching board during the mask box, four height sensor is right the top surface of mask box and/or the reading of bottom surface are unanimous, then indicate the mask box keeps the level.
Optionally, the guide rail structure has four baffles, the four baffles are connected with each other to define a cavity with two ends communicated with each other, the level measurement structure includes four height sensors, the four height sensors are arranged corresponding to four side edges between the top surface and the bottom surface of the guide rail structure, when the mask box is placed on the lithography machine and/or the mask box is taken from the lithography machine, readings of the four height sensors on the top surface and/or the bottom surface of the mask box are consistent, and it indicates that the mask box is kept level.
Optionally, the positioning device for the mask box further includes an alarm disposed on the sidewall and/or the top end of the baffle, and the alarm is in signal connection with the leveling structure, so as to send an alarm signal when the leveling structure detects that the mask box is not kept horizontal.
Optionally, the warning indicator includes at least one of an audible alarm, an indicator light and a display screen.
Optionally, the warning indicator is a plurality of indicator lights, and the indicator lights display a color different from other positions at a position where the light shade box is inclined most.
The invention also provides a lithographic apparatus comprising: the mask box positioning device is arranged corresponding to the platform so as to ensure that the mask box is kept horizontal when the mask box is placed on the platform of the photoetching machine and/or taken from the platform of the photoetching machine.
Optionally, the mask box positioning device and the photolithography machine are integrally formed, or the mask box positioning device is detachably mounted on the photolithography machine.
Optionally, a plurality of pins are arranged on a platform of the photolithography machine, and the mask box is connected with the platform through the pins; and/or a plurality of screw holes are arranged on a platform of the photoetching machine table, and the photomask box is screwed into the screw holes through screws and is connected with the platform.
Compared with the prior art, the technical scheme of the invention has the following beneficial effects:
1. the mask box positioning device provided by the invention is provided with the guide rail structure arranged on the photoetching machine table, and the guide rail structure is provided with at least one baffle plate used for limiting the motion trail of the mask box; and the horizontal measuring structure is used for measuring whether the mask box is kept horizontal or not when the mask box is placed on the photoetching machine table and/or taken from the photoetching machine table, so that the mask box can be kept horizontal when the mask box is placed on the photoetching machine table and/or taken from the photoetching machine table, and further the photoetching process can be smoothly carried out.
2. According to the photoetching equipment provided by the invention, the photoetching machine platform and the photomask box positioning device are included, the platform for placing the photomask box is arranged on the photoetching machine platform, and the photomask box positioning device is arranged corresponding to the platform, so that the photomask box is kept horizontal when the photomask box is placed on the platform of the photoetching machine platform and/or taken from the platform of the photoetching machine platform, and a photoetching process in the photoetching equipment can be smoothly carried out.
Drawings
FIG. 1a is a schematic view of a reticle pod access;
FIG. 1b is a schematic illustration of a reticle pod placement;
FIG. 2 is a schematic view of a reticle pod positioning apparatus according to an embodiment of the present invention;
FIG. 3 is a schematic top view of the reticle pod positioning apparatus shown in FIG. 2;
FIG. 4 is a schematic view of an alarm on the reticle pod positioning apparatus shown in FIG. 2;
FIG. 5 is a schematic diagram of an apparatus for placing a mask box on a photolithography tool according to an embodiment of the present invention.
Wherein the reference numerals of figures 1 to 5 are as follows:
11-a lithography machine; 12-a reticle pod; 13. 14, 15-pins; 21-a guide rail structure; 211-baffles; 212-ramp projection; 213-screw hole; 22-a level measurement structure; 23-an alarm; 31-a lithography machine; 32-a platform; 321-a bottom wall; 322-a ramp; 33-dowel.
Detailed Description
To make the objects, advantages and features of the present invention more clear, the reticle pod positioning apparatus and the lithographic apparatus according to the present invention are further described in detail with reference to FIGS. 2 to 5. It is to be noted that the drawings are in a very simplified form and are not to precise scale, which is merely for the purpose of facilitating and distinctly claiming the embodiments of the present invention.
An embodiment of the present invention provides a mask box positioning device, which is used to ensure that a mask box is kept horizontal when the mask box is placed on or taken from a photolithography machine, or the mask box is kept horizontal when the mask box is placed on or taken from the photolithography machine. Referring to fig. 2, fig. 2 is a schematic diagram of a reticle pod positioning apparatus according to an embodiment of the present invention, and as can be seen from fig. 2, the reticle pod positioning apparatus includes a guide rail structure 21 and a leveling structure 22, the guide rail structure 21 is disposed on the photolithography machine, and the guide rail structure 21 has at least one baffle 211 for defining a motion trajectory of the reticle pod; the level measurement structure 22 is used to measure whether the reticle pod is level while the reticle pod is placed on and/or removed from the lithography tool.
The mask box positioning device is described in detail with reference to fig. 2 to 5:
the guide rail structure 21 is disposed on the photolithography machine 31, the guide rail structure 21 has at least one baffle 211 for limiting a movement track of the mask box, and during the process of placing the mask box on the photolithography machine 31 and/or taking the mask box from the photolithography machine 31, a side surface of the mask box may contact with the baffle 211, so that the mask box can move downward (i.e., placing the mask box on the photolithography machine 31) and upward (i.e., taking the mask box from the photolithography machine 31) along the baffle 211, thereby enabling the mask box to be kept horizontal during the movement.
If the guide rail structure 21 has four baffles 211, as shown in fig. 2, the four baffles 211 may be connected to each other to form a cavity (not shown) with two ends connected to each other, the mask box moves in the cavity, and the side surface of the mask box may contact the four baffles 211, so that the movement locus of the four side surfaces of the mask box is defined. Alternatively, the number of baffles 211 of the rail structure 21 may also match the number of sides of the reticle pod, such that each side of the reticle pod is defined by a baffle 211. Moreover, the height of the cavity is greater than that of the mask box, so as to ensure that the mask box can completely run for a certain distance in the cavity, and further the horizontal condition of the mask box can be adjusted in the process of moving in the cavity, and further the mask box can be kept horizontal when being placed on the photoetching machine table 31 and taken away from the photoetching machine table 31. Of course, the height of the cavity may also be less than or equal to the height of the mask box, so that the height of the cavity can ensure that the mask box runs stably for a certain distance, and further the levelness of the mask box can be maintained.
The bottom of the guide rail structure 21 may have a slope protrusion 212, as shown in fig. 2, fig. 3 and fig. 5, the slope protrusion 212 is connected to the bottom end of the baffle 211, the slope protrusion 212 is engaged with a slope 322 of a platform 32 on the photolithography machine 31 for placing the reticle box, so that the reticle box positioning device can accurately place the reticle box on a bottom wall 321 of the platform 32, and the slope 322 is disposed to surround the bottom wall 321, that is, the guide rail structure 21 is disposed on the platform 32 at the periphery of a region for placing the reticle box, and does not occupy the region for placing the reticle box. The bottom of the rail structure 21 may be other structures that fit into the platform 32, depending on the positioning structure on the platform 32. The guide rail structure 21 may be provided with at least one screw hole 213, so that the guide rail structure 21 is fixed on the photolithography machine 31 by screwing a screw into the screw hole 213, or the guide rail structure 21 may also be fixed on the photolithography machine 31 by welding or the like, or the guide rail structure 21 may also be integrally formed with the photolithography machine 31.
The level measurement structure 22 is used for measuring whether the mask box is kept level when the mask box is placed on the photoetching machine table 31 and/or taken from the photoetching machine table 31; if the fact that the photomask box is not kept horizontal is measured, the photomask box is adjusted until the fact that the photomask box is kept horizontal is measured by the horizontal measuring structure 22. The leveling mechanism 22 may be disposed on the rail structure 21, the photolithography tool 31, or the reticle pod. The leveling structure 22 can display the measured level of the reticle box in a height value manner for the operator to view.
The leveling structure 22 may include at least one laser level, which may be disposed on the rail structure 21, and is configured to emit laser light to scan the bottom surface and/or the top surface of the reticle box when the reticle box is placed on the photolithography machine 31 and/or taken from the photolithography machine 31, so as to detect whether the bottom surface and/or the top surface of the reticle box is kept level. The laser level may be disposed at the bottom end of the guide rail structure 21, and the disposed position does not occupy the movement track of the mask box on the guide rail structure 21, for example, when the guide rail structure 21 is a cavity formed by connecting four baffles 211, and a distance exists between a side surface of the mask box and a connection portion of the adjacent baffle 211, the laser level may be disposed at the bottom end of the connection portion of the adjacent baffle 211, so that the laser level may scan the bottom surface of the mask box without affecting the movement of the mask box. The laser level may also be disposed at the top end of the guide rail structure 21, for example, when the height of the guide rail structure 21 is greater than the height of the reticle box, the laser level may emit laser to scan the top surface of the reticle box to detect whether the top surface of the reticle box is kept horizontal. The laser level may also be disposed at a side surface of the rail structure 21, for example, when the height of the rail structure 21 is greater than the height of the reticle box, the laser level may be disposed at a position of the side surface of the rail structure 21 near the top surface of the reticle box to be able to detect whether the top surface of the reticle box is kept horizontal. Of course, the laser levels may be disposed at least two of the bottom end, the top end and the side of the guide rail structure 21. And, when the number of the laser levels is set to be larger, especially when the laser levels are set to correspond to each side surface or each corner of the reticle pod, the more accurate the detection result as to whether the bottom surface and/or the top surface of the reticle pod is kept horizontal. In addition, the laser level may also be disposed at an edge of the platform 32 of the photolithography machine 31, and when the mask box is placed on the photolithography machine 31 and/or taken out from the photolithography machine 31, laser is emitted to scan the bottom surface of the mask box, so as to detect whether the bottom surface of the mask box is kept horizontal.
Alternatively, the leveling structure 22 may include at least two laser range finders, and the laser range finders are kept horizontal, and the laser range finders may also be installed at least one of the bottom end, the top end and the side surface of the guide rail structure 21, and the laser range finders may be used to measure the distance from the laser emitted by each laser range finder to the top surface and/or the bottom surface of the reticle box to determine whether the reticle box is kept horizontal. For example, when at least two laser range finders are installed on any two sides of the guide rail structure 21, the top surface of the reticle box can be irradiated by obliquely emitting laser, and whether the reticle box is kept horizontal or not can be judged by measuring the distance from the laser emitted by each laser range finder to the top surface of the reticle box.
Alternatively, the leveling structure 22 may comprise at least two height sensors, and at least two of the height sensors may be disposed on any two sides or two corners of the reticle box, preferably on opposite sides or opposite corners, to detect whether the bottom surface and/or the top surface of the reticle box is level when the reticle box is placed on the photolithography tool 31 and/or taken from the photolithography tool 31. Wherein the height sensor may have a row of sensor heads capable of continuously or intermittently measuring the height of the bottom surface and/or the top surface of the reticle cassette at different positions, starting from the movement of the bottom surface of the reticle cassette in the direction of the stop plate 211 towards the stage 32 of the lithography stage 31 during the process of placing the reticle cassette on the lithography stage 31; and in the process of taking the mask box from the photoetching machine table 31, the heights of the bottom surface and/or the top surface of the mask box at different positions can be continuously or discontinuously measured from the bottom surface of the mask box along the direction of the baffle 211 back to the platform 32 of the photoetching machine table 31, and then the horizontal condition of the mask box is adjusted according to the height information fed back by the height sensor, so that the mask box is ensured to be kept horizontal, and the photoetching process can be smoothly carried out. At least two height sensors may also be disposed on the guide rail structure 21, i.e. at least on any two sides or two corners of the guide rail structure 21, preferably on opposite sides or opposite corners, to detect whether the bottom surface and/or the top surface of the reticle box is horizontal when the reticle box is placed on the photolithography machine 31 and/or taken from the photolithography machine 31; for example, when the guide structure 21 is the cavity defined by the four baffles 211, at least two of the height sensors may be disposed on opposite lateral edges of the cavity, and a row of sensor heads of the height sensors may be disposed on the lateral edges of the cavity in an upward-downward arrangement to measure a horizontal condition of the reticle pod during movement in the cavity, so as to adjust the reticle pod at any time. Of course, the height sensor may also be provided on both the reticle pod and the rail structure 21 to detect the level of the bottom and/or top surface of the reticle pod more accurately.
The laser level meter with height sensor's quantity and set up the position can with the shape of photomask box matches the setting, just the quantity of baffle 211 and connected mode between the baffle 211 also can with the shape of photomask box matches the setting to can measure fast accurately the level condition of photomask box, for example can be according to the shape of photomask box sets up four, five, six and above quantity's baffle 211, certainly also can set up an annular baffle 211. For example, if the mask box is a rectangular parallelepiped, the leveling structure 22 may include four of the height sensors, four of the height sensors may be disposed on the mask box, and four of the height sensors are disposed corresponding to four side edges between the top surface and the bottom surface of the mask box; alternatively, four height sensors may be disposed on the guide rail structure 21, the guide rail structure 21 has four baffles 211, the four baffles 211 are connected to each other to form a cavity with two ends connected, the four height sensors may be disposed corresponding to four side edges between the top surface and the bottom surface of the guide rail structure 21, and the four height sensors correspond to four side edges of the photomask box. Then, when the mask box is placed on the photolithography machine 31 and/or taken from the photolithography machine 31, the four height sensors read the top surface or the bottom surface of the mask box uniformly, or the top surface and the bottom surface of the mask box uniformly, it indicates that the mask box is kept horizontal. And, in the course of the movement of the light cover box, can also adjust the said light cover box according to the result that the said height sensor on the side edge measures, so that the said light cover box keeps the level.
The mask box positioning device further comprises an alarm 23, which may be disposed on a side wall or a top end (as shown in fig. 4) of the baffle 211, or both the side wall and the top end of the baffle 211 are disposed with the alarm 23, and the alarm 23 is in signal connection with the leveling structure 22, so as to send out an alarm signal when the leveling structure 22 detects that the mask box is not kept at a horizontal level. The position of the alarm 23 is not limited to the above position, and may be, for example, the photolithography machine 31. The alarm 23 may include at least one of an audible alarm, an indicator light, and a display screen. The indicator light may display a different color when the mask box is not held level and is held level, for example red when the mask box is not held level and green when the mask box is held level; when the warning device 23 is a plurality of indicator lights, the plurality of indicator lights may also display a different color at the position where the inclination of the light cover box is the greatest, for example, red at the position where the inclination is the greatest, and green at other positions. The display screen may display a position where the tilt of the mask box is maximum when the mask box is not held horizontally, so that an operator can quickly adjust the mask box to a horizontal state.
The mask box positioning device is powered by a battery jar (not shown) arranged on the guide rail structure 21 and a battery (not shown) mounted thereon, or by directly taking electricity from the photolithography machine 31, and the alarm 23 may also be powered by the battery or the photolithography machine 31.
In summary, the present invention provides a reticle pod positioning apparatus for ensuring that a reticle pod remains horizontal when the reticle pod is placed on and/or removed from a photolithography tool, comprising: the guide rail structure is arranged on the photoetching machine table and is provided with at least one baffle plate used for limiting the motion trail of the photomask box; and the horizontal measuring structure is used for measuring whether the photomask box is kept horizontal when the photomask box is placed on the photoetching machine table and/or taken from the photoetching machine table. The mask box positioning device provided by the invention can ensure that the mask box is kept horizontal when the mask box is placed on the photoetching machine table and/or taken from the photoetching machine table, so that the photoetching process can be smoothly carried out.
An embodiment of the invention provides a lithographic apparatus comprising: the mask box positioning device is arranged corresponding to the platform, so that the mask box is kept horizontal when the mask box is placed on the platform of the photoetching machine and/or taken from the platform of the photoetching machine, and further, a photoetching process in photoetching equipment can be smoothly carried out.
The mask box positioning device may be integrally formed with the photolithography machine, for example, a guide rail structure of the mask box positioning device may be integrally formed with the photolithography machine, so that the mask box positioning device is directly disposed on the photolithography machine; or, the mask box positioning device can be fixed on the photoetching machine table by welding and other modes; or, the mask box positioning device may be detachably mounted on the photolithography machine, for example, a plurality of screw holes may be provided on the photolithography machine, and the mask box positioning device is fixed on the photolithography machine by screwing screws into the screw holes.
A plurality of pins may be disposed on the platform of the photolithography tool, and the mask box is connected to the platform through the pins, as shown in fig. 5, the platform 32 includes a bottom wall 321 and a slope 322 surrounding the bottom wall 321, the pins 33 are disposed on the bottom wall 321, and the slope 322 is engaged with the slope protrusions 212 on the rail structure 21 in the mask box positioning device; or a plurality of screw holes are formed in a platform of the photoetching machine platform, and the photomask box is connected with the platform in a manner that screws are screwed into the screw holes; alternatively, the mask box may be connected to the platform by screwing the pin and the screw into the screw hole at the same time.
In summary, the present invention provides a lithographic apparatus comprising: the mask box positioning device is arranged corresponding to the platform so as to ensure that the mask box is kept horizontal when the mask box is placed on the platform of the photoetching machine station and/or taken from the platform of the photoetching machine station. The photoetching equipment provided by the invention enables the photoetching process in the photoetching equipment to be smoothly carried out.
The above description is only for the purpose of describing the preferred embodiments of the present invention, and is not intended to limit the scope of the present invention, and any variations and modifications made by those skilled in the art based on the above disclosure are within the scope of the appended claims.
Claims (12)
1. A reticle pod positioning apparatus for ensuring that a reticle pod remains level when placing and/or taking a reticle pod on a lithography machine station, comprising:
the guide rail structure is arranged on the photoetching machine table and is provided with at least one baffle plate used for limiting the motion trail of the photomask box; and the number of the first and second groups,
a level measurement structure for measuring whether the reticle pod is kept level when the reticle pod is placed on and/or taken from the lithography machine; the level measurement structure comprises at least two height sensors or at least two laser rangefinders;
wherein the height sensors are arranged at least on opposite sides or opposite corners of the reticle pod and/or the guide track structure to detect whether a bottom surface and/or a top surface of the reticle pod remains level when the reticle pod is placed on and/or removed from the lithography machine station; the laser range finders are arranged at least one of the bottom end, the top end and the side face of the guide rail structure, and whether the photomask box is kept horizontal or not is judged by measuring the distance from laser emitted by each laser range finder to the top face and/or the bottom face of the photomask box.
2. The reticle pod positioning apparatus of claim 1 wherein the rail structure has four of the baffles interconnected to define a cavity communicating at both ends, the reticle pod moving within the cavity.
3. The reticle pod positioning apparatus of claim 2 wherein the height of the cavity is greater than the height of the reticle pod to ensure complete travel of the reticle pod a distance within the cavity.
4. The reticle pod positioning apparatus of any one of claims 1-3, wherein the bottom of the rail structure has a ramp protrusion, the ramp protrusion mating with a ramp of a platform on the lithography machine for placing the reticle pod, such that the reticle pod positioning apparatus can accurately place the reticle pod on the platform.
5. The reticle pod positioning apparatus of claim 1, wherein the reticle pod is a rectangular parallelepiped, the level measurement structure comprises four of the height sensors, and the four height sensors are disposed corresponding to four lateral edges between the top surface and the bottom surface of the reticle pod, and when the reticle pod is placed on and/or removed from the lithography machine, the four height sensors read the top surface and/or the bottom surface of the reticle pod in a consistent manner, indicating that the reticle pod is level.
6. The reticle pod positioning apparatus of claim 1, wherein the track structure comprises four of the baffles, the four baffles are connected to each other to define a cavity with two ends in communication, the level measurement structure comprises four of the height sensors, and the four height sensors are disposed corresponding to four lateral edges between the top surface and the bottom surface of the track structure, and when the reticle pod is placed on and/or removed from the photolithography tool, the four height sensors read the top surface and/or the bottom surface of the reticle pod consistently, indicating that the reticle pod is level.
7. The reticle pod positioning apparatus of claim 1, further comprising an alarm disposed on a side wall and/or a top end of the baffle, the alarm in signal communication with the leveling mechanism for signaling when the leveling mechanism detects that the reticle pod is not level.
8. The reticle pod positioning apparatus of claim 7, wherein the alarm comprises at least one of an audible alarm, an indicator light, and a display screen.
9. The reticle pod positioning apparatus of claim 8, wherein the warning device is a plurality of the indicator lights, the plurality of indicator lights displaying a different color at a position where the reticle pod is most tilted from other positions.
10. A lithographic apparatus, comprising: lithography machine table on which a platform for placing a reticle cassette is provided, and reticle cassette positioning device of any one of claims 1 to 9, arranged in correspondence to the platform to ensure that the reticle cassette remains level when placed on and/or taken from the platform of the lithography machine table.
11. The lithographic apparatus of claim 10, wherein the reticle pod positioning apparatus is integrally formed with the lithographic stage or the reticle pod positioning apparatus is removably mounted to the lithographic stage.
12. The lithographic apparatus of claim 11, wherein the stage of the lithographic apparatus is provided with a plurality of pins, the reticle pod being coupled to the stage by the pins; and/or a plurality of screw holes are formed in a platform of the photoetching machine table, and the photomask box is screwed into the screw holes through screws and is connected with the platform.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
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