CN110695079B - 利用电动修复耦合植物萃取技术去除底层汞污染土壤中汞的方法 - Google Patents
利用电动修复耦合植物萃取技术去除底层汞污染土壤中汞的方法 Download PDFInfo
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B09—DISPOSAL OF SOLID WASTE; RECLAMATION OF CONTAMINATED SOIL
- B09C—RECLAMATION OF CONTAMINATED SOIL
- B09C1/00—Reclamation of contaminated soil
- B09C1/08—Reclamation of contaminated soil chemically
- B09C1/085—Reclamation of contaminated soil chemically electrochemically, e.g. by electrokinetics
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B09—DISPOSAL OF SOLID WASTE; RECLAMATION OF CONTAMINATED SOIL
- B09C—RECLAMATION OF CONTAMINATED SOIL
- B09C2101/00—In situ
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- Life Sciences & Earth Sciences (AREA)
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- Engineering & Computer Science (AREA)
- Environmental & Geological Engineering (AREA)
- Processing Of Solid Wastes (AREA)
Abstract
Description
电压梯度 | 汞去除率 | 误差百分比 | 富集系数 | 误差百分比 |
0.25V/cm | 53.06% | ±0.1% | 1.58 | ±0.2% |
0.35V/cm | 61.92% | ±0.2% | 1.90 | ±0.2% |
0.45V/cm | 70.45% | ±0.1% | 2.23 | ±0.1% |
0.5V/cm | 82.17% | ±0.1% | 2.81 | ±0.1% |
0.75V/cm | 87.19% | ±0.1% | 2.97 | ±0.1% |
1V/cm | 90.32% | ±0.1% | 3.08 | ±0.1% |
1.05V/cm | 80.57% | ±0.2% | 2.73 | ±0.2% |
1.15V/cm | 72.74% | ±0.1% | 2.36 | ±0.1% |
1.25V/cm | 61.05% | ±0.1% | 1.89 | ±0.1% |
Claims (5)
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CN111687203A (zh) * | 2020-07-16 | 2020-09-22 | 常州大学 | 光能-垂直电动修复重金属污染土壤的装置及方法 |
CN112642854B (zh) * | 2020-12-03 | 2021-12-21 | 浙江大学 | 电动-曝气-注液联合修复重金属有机复合污染土的方法 |
US11759836B2 (en) | 2020-12-03 | 2023-09-19 | Zhejiang University | Electrokinetic-aeration-liquid injection combined remediation method for compound contaminated soil containing heavy metals and organic substances |
CN115446100B (zh) * | 2022-08-17 | 2024-03-22 | 武汉大学 | 原位回流化学淋洗与隔膜电渗析耦合绿色修复方法及装置 |
CN116060436B (zh) * | 2023-03-23 | 2023-08-15 | 哈尔滨工业大学 | 重金属污染土壤的电渗-芯吸织物-植物联合治理系统及方法 |
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Effective date of registration: 20230606 Address after: No. 162-7, Nanyang Lake Street, Yuhong District, Shenyang City, Liaoning Province 110000 (Gate 5) Patentee after: SHENYANG REALFUL AGRICULTURAL TECHNOLOGY DEVELOPMENT Co.,Ltd. Address before: No. 3510, floor 35, building 1, No. 500, middle section of Tianfu Avenue, Chengdu hi tech Zone, China (Sichuan) pilot Free Trade Zone, Chengdu, Sichuan 610000 Patentee before: Sichuan qianyiding Technology Co.,Ltd. Effective date of registration: 20230606 Address after: No. 3510, floor 35, building 1, No. 500, middle section of Tianfu Avenue, Chengdu hi tech Zone, China (Sichuan) pilot Free Trade Zone, Chengdu, Sichuan 610000 Patentee after: Sichuan qianyiding Technology Co.,Ltd. Address before: 215500 Changshou City South Three Ring Road No. 99, Suzhou, Jiangsu Patentee before: CHANGSHU INSTITUTE OF TECHNOLOGY |
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