CN110687620B - Scratch-resistant optical film and production method thereof - Google Patents
Scratch-resistant optical film and production method thereof Download PDFInfo
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- CN110687620B CN110687620B CN201910972342.2A CN201910972342A CN110687620B CN 110687620 B CN110687620 B CN 110687620B CN 201910972342 A CN201910972342 A CN 201910972342A CN 110687620 B CN110687620 B CN 110687620B
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- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
- G02B1/10—Optical coatings produced by application to, or surface treatment of, optical elements
- G02B1/11—Anti-reflection coatings
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- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
- G02B1/10—Optical coatings produced by application to, or surface treatment of, optical elements
- G02B1/14—Protective coatings, e.g. hard coatings
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Abstract
The invention discloses an anti-scratch optical film and a production method thereof, wherein the anti-scratch optical film comprises a substrate, and an anti-reflection film layer, an inner chemical hard coating layer, an outer chemical hard coating layer and a physical hard coating layer which are sequentially distributed on the surface of the substrate from inside to outside; the antireflection film layer is a multi-layer antireflection film; the inner chemical hardening film layer is a UV curing film which takes vinyl triethoxysilane and 3-thiol propyl triethoxysilane as monomers; the outer chemical hardening film layer is a wear-resistant film layer which is prepared by mixing methacryloxy propyl trimethoxy silane as a monomer with epoxy resin; the physical hard coating layer is a diamond film layer. The anti-reflection film layer is externally provided with three protective layers, and the design of the inner chemical hard coating layer, the outer chemical hard coating layer and the physical hard coating layer ensures that the surface hardness of the prepared optical film is high, and the anti-scratch effect can be effectively realized.
Description
Technical Field
The invention relates to the technical field of optical films, in particular to an anti-scratch optical film and a production method thereof.
Background
The optical film is widely used in the technical field of optics and photoelectrons, the antireflection film is a common one in the optical film, the structure of the antireflection film in the prior art generally comprises a substrate and an antireflection film layer arranged on the surface of the substrate, the substrate is made of Ge, Si, ZnS, ZnSe or chalcogenide glass and the like, the antireflection film layer is made of magnesium fluoride, silicon dioxide and the like, and the surface of the antireflection film is not subjected to hardening treatment and is not scratch-resistant.
Disclosure of Invention
In view of the above-mentioned drawbacks of the prior art, an object of the present invention is to: an anti-scratch optical film is provided.
In order to solve the problems, the technical solution of the invention is as follows: the scratch-resistant optical film comprises a substrate, and also comprises an antireflection film layer, an inner chemical hard coating layer, an outer chemical hard coating layer and a physical hard coating layer which are sequentially distributed on the surface of the substrate from inside to outside;
the antireflection film layer is a multi-layer antireflection film;
the inner chemical hardening film layer is a UV curing film taking vinyl triethoxysilane and 3-thiol propyl triethoxysilane as monomers;
the outer chemical hardening film layer is a wear-resistant film layer which is prepared by mixing methacryloxypropyl trimethoxy silane serving as a monomer with epoxy resin;
the physical hardened film layer is a diamond film layer.
Furthermore, the antireflection film layer is of a three-layer structure, the outer layer is a porous silicon dioxide film layer, the middle layer is a silicon nitride film layer, and the inner layer is a titanium dioxide film layer.
The invention also provides a preparation method of the scratch-resistant optical film, which comprises the following steps:
(1) carrying out surface treatment on the substrate, wherein the surface treatment sequentially comprises four steps of polishing, manual wiping, ultrasonic cleaning and ion bombardment;
(2) after the surface of the substrate is treated, depositing a titanium dioxide film layer on the surface of the substrate;
(3) depositing a silicon nitride film on the surface of the titanium dioxide film to ensure that the refractive index of the silicon nitride film is less than that of the titanium dioxide film;
(4) depositing a porous silicon dioxide film layer on the surface of the silicon nitride film layer, so that the refractive index of the porous silicon dioxide film layer is smaller than that of the silicon nitride film layer;
(5) preparing UV curing film hardening liquid by taking vinyl triethoxysilane and 3-thiol propyl triethoxysilane as monomers, and spraying the hardening liquid on the surface of the porous silicon dioxide film layer to form an inner chemical hardening film layer;
(6) mixing methacryloxypropyl trimethoxy silane as a monomer with epoxy resin to prepare a wear-resistant film hardening liquid, and spraying the hardening liquid on the surface of an inner chemically hardened film to form an outer chemically hardened film;
(7) plating a diamond film layer on the surface of the external chemical hardening film layer to prepare the scratch-resistant optical film;
(8) the scratch-resistant optical film is subjected to an aging treatment.
Further, in the step (1), the substrate is manually wiped by dipping a mixture of ethanol and diethyl ether on absorbent gauze.
Further, in the step (1), the voltage of ion bombardment is 5 kilovolts, the current is 80 milliamperes, the bombardment time is 5 minutes, and a titanium dioxide film layer is deposited on the surface of the substrate within 3 minutes after the bombardment is finished.
Further, in the step (8), the aging treatment means: and (3) carrying out baking annealing treatment on the scratch-resistant optical film in air, wherein the baking temperature is 250-400 ℃, and the baking time is 6-8 hours.
The invention has the beneficial effects that: the anti-reflection film layer, the internal chemical hard coating layer, the external chemical hard coating layer and the physical hard coating layer are sequentially distributed on the surface of the substrate from inside to outside, three protective layers are arranged outside the anti-reflection film layer, and the optical film prepared through the design of the internal chemical hard coating layer, the external chemical hard coating layer and the physical hard coating layer is high in surface hardness and can effectively play a scratch-resistant role.
Drawings
FIG. 1 is a schematic structural diagram of a scratch-resistant optical film of the present invention.
Shown in the figure: the manufacturing method comprises the following steps of 1-a substrate, 2-an antireflection film layer, 21-a porous silicon dioxide film layer, 22-a silicon nitride film layer, 23-a titanium dioxide film layer, 3-an inner chemical hardening film layer, 4-an outer chemical hardening film layer and 5-a physical hardening film layer.
Detailed Description
For a more intuitive and complete understanding of the technical solution of the present invention, the following non-limiting features are described in conjunction with the accompanying drawings of the present invention:
as shown in fig. 1, the scratch-resistant optical film includes a substrate 1, and further includes an anti-reflection film layer 2, an inner chemical hard coating layer 3, an outer chemical hard coating layer 4 and a physical hard coating layer 5, which are sequentially distributed on the surface of the substrate 1 from inside to outside;
the antireflection film layer 2 is a multi-layer antireflection film, the antireflection film layer 2 is of a three-layer structure, the outer layer is a porous silicon dioxide film layer 21, the middle layer is a silicon nitride film layer 22, and the inner layer is a titanium dioxide film layer 23;
the inner chemical hardening film layer 3 is a UV curing film which takes vinyl triethoxysilane and 3-thiol propyl triethoxysilane as monomers;
the outer chemical hardening film layer 4 is a wear-resistant film layer which is prepared by mixing methacryloxypropyl trimethoxy silane as a monomer with epoxy resin;
the physical hard coating layer 5 is a diamond film layer.
The invention also provides a preparation method of the scratch-resistant optical film, which comprises the following steps:
(1) carrying out surface treatment on the substrate 1, wherein the surface treatment sequentially comprises four steps of polishing, manual wiping, ultrasonic cleaning and ion bombardment;
(2) after the surface of the substrate 1 is treated, depositing a titanium dioxide film layer 23 on the surface of the substrate 1;
(3) depositing a silicon nitride film layer 22 on the surface of the titanium dioxide film layer 23, so that the refractive index of the silicon nitride film layer 22 is smaller than that of the titanium dioxide film layer 23;
(4) depositing a porous silicon dioxide film layer 21 on the surface of the silicon nitride film layer 22, so that the refractive index of the porous silicon dioxide film layer 21 is smaller than that of the silicon nitride film layer 22;
(5) preparing UV curing film hardening liquid by taking vinyl triethoxysilane and 3-thiol propyl triethoxysilane as monomers, and spraying the hardening liquid on the surface of the porous silicon dioxide film layer 21 to form an inner chemical hardening film layer 3;
(6) mixing methacryloxypropyl trimethoxysilane serving as a monomer with epoxy resin to prepare a wear-resistant film hardening liquid, and spraying the hardening liquid on the surface of the inner chemical hardening film layer 3 to form an outer chemical hardening film layer 4;
(7) plating a diamond film layer on the surface of the external chemical hard film layer 4 to prepare the scratch-resistant optical film;
(8) the scratch-resistant optical film is subjected to an aging treatment.
In the step (1), since the surface roughness and defects of the substrate 1 are main sources of scattering, and the defects such as scratches, pits, bubbles, etc. on the surface of the substrate 1 also cause scattering, polishing may be used to eliminate the scattering of the substrate 1.
In the step (1), the substrate 1 is wiped by dipping a mixed solution of ethanol and diethyl ether on absorbent gauze by manual wiping, wherein the ratio of the ethanol to the diethyl ether is 85: 15.
in the step (1), the ultrasonic cleaning has the advantages of high cleaning speed and high quality, the ultrasonic frequency is 20-40kHZ, dirt on the substrate 1 is dissolved by chemical reaction with a chemical solvent, the substrate 1 is rinsed when moving up and down, and the substrate 1 can be cleaned by matching manual wiping with the ultrasonic cleaning.
In the step (1), the ion bombardment voltage is 5 kilovolts, the current is 80 milliamperes, the bombardment time is 5 minutes, and the titanium dioxide film layer 23 is deposited on the surface of the substrate 1 within 3 minutes after the bombardment. During ion bombardment, the electrons gain much more velocity than the ions, the substrate 1 is rapidly negatively charged due to the greater mobility of the electrons, and the positive ions bombard the substrate 1 under the attraction of the negative charges. The co-bombardment of electrons, ions, and also active atoms and molecules, decomposes the hydrogen compounds on the surface of the substrate 1 and provides an activated surface to facilitate film nucleation. After the ion bombardment is finished, the film deposition should be started as soon as possible, so that the deposition of the titanium oxide film layer 23 on the surface of the substrate 1 within 3 minutes is very strong.
In the step (8), the aging treatment means: and (3) baking and annealing the scratch-resistant optical film in air, wherein the baking temperature is 300 ℃, and the baking time is 8 hours. After the scratch-resistant optical film is manufactured, because the molecules of the film material are cooled from a gas phase to a solid phase very quickly in the deposition process, the properties of the film material can be changed gradually, various defects exist, after the film material is baked and annealed, the film has a recrystallization process and a re-reaction process, and the firmness and the moisture resistance of the baked film are greatly improved.
The anti-reflection film layer 2, the inner chemical hardening film layer 3, the outer chemical hardening film layer 4 and the physical hardening film layer 5 are sequentially distributed on the surface of the substrate 1 from inside to outside, the anti-reflection film layer 2 is externally provided with three protective layers, and the design of the inner chemical hardening film layer 3, the outer chemical hardening film layer 4 and the physical hardening film layer 5 enables the manufactured optical film to be high in surface hardness and can effectively play a scratch-resistant role.
Claims (4)
1. The scratch-resistant optical film comprises a substrate and is characterized by also comprising an antireflection film layer, an inner chemical hard coating layer, an outer chemical hard coating layer and a physical hard coating layer which are sequentially distributed on the surface of the substrate from inside to outside;
the antireflection film layer is a multi-layer antireflection film;
the inner chemical hardening film layer is a UV curing film taking vinyl triethoxysilane and 3-thiol propyl triethoxysilane as monomers;
the outer chemical hardening film layer is a wear-resistant film layer which is prepared by mixing methacryloxypropyl trimethoxy silane serving as a monomer with epoxy resin;
the physical hard coating layer is a diamond film layer;
the production method comprises the following steps:
(1) carrying out surface treatment on the substrate, wherein the surface treatment sequentially comprises four steps of polishing, manual wiping, ultrasonic cleaning and ion bombardment;
(2) after the surface of the substrate is treated, depositing a titanium dioxide film layer on the surface of the substrate;
(3) depositing a silicon nitride film on the surface of the titanium dioxide film to ensure that the refractive index of the silicon nitride film is less than that of the titanium dioxide film;
(4) depositing a porous silicon dioxide film layer on the surface of the silicon nitride film layer, so that the refractive index of the porous silicon dioxide film layer is smaller than that of the silicon nitride film layer;
(5) preparing UV curing film hardening liquid by taking vinyl triethoxysilane and 3-thiol propyl triethoxysilane as monomers, and spraying the hardening liquid on the surface of the porous silicon dioxide film layer to form an inner chemical hardening film layer;
(6) mixing methacryloxypropyl trimethoxy silane as a monomer with epoxy resin to prepare a wear-resistant film hardening liquid, and spraying the hardening liquid on the surface of an inner chemically hardened film to form an outer chemically hardened film;
(7) plating a diamond film layer on the surface of the external chemical hardening film layer to prepare the scratch-resistant optical film;
(8) carrying out aging treatment on the scratch-resistant optical film;
in the step (8), the aging treatment means: and (3) carrying out baking annealing treatment on the scratch-resistant optical film in air, wherein the baking temperature is 250-400 ℃, and the baking time is 6-8 hours.
2. The scratch-resistant optical film of claim 1, wherein: the antireflection film layer is of a three-layer structure, the outer layer is a porous silicon dioxide film layer, the middle layer is a silicon nitride film layer, and the inner layer is a titanium dioxide film layer.
3. The scratch-resistant optical film of claim 1, wherein: in the step (1), the substrate is manually wiped by dipping a mixed solution of ethanol and diethyl ether on absorbent gauze.
4. The scratch-resistant optical film of claim 1, wherein: in the step (1), the ion bombardment voltage is 5 kilovolts, the current is 80 milliamperes, the bombardment time is 5 minutes, and a titanium dioxide film layer is deposited on the surface of the substrate within 3 minutes after the bombardment is finished.
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| CN201910972342.2A CN110687620B (en) | 2019-10-14 | 2019-10-14 | Scratch-resistant optical film and production method thereof |
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| CN110687620B true CN110687620B (en) | 2021-08-17 |
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Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN105263967A (en) * | 2013-04-17 | 2016-01-20 | 日产化学工业株式会社 | Curable composition comprising siloxane oligomer and inorganic microparticles |
| CN110028242A (en) * | 2018-01-11 | 2019-07-19 | Ａｇｃ株式会社 | Glass, glass powder, electroconductive paste and solar battery |
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| Publication number | Priority date | Publication date | Assignee | Title |
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| CN100420961C (en) * | 2003-06-26 | 2008-09-24 | 日本瑞翁株式会社 | Optical multilayer film, polarizing plate and optical product |
| JP7064313B2 (en) * | 2016-11-25 | 2022-05-10 | リケンテクノス株式会社 | Hardcourt laminated film |
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| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN105263967A (en) * | 2013-04-17 | 2016-01-20 | 日产化学工业株式会社 | Curable composition comprising siloxane oligomer and inorganic microparticles |
| CN110028242A (en) * | 2018-01-11 | 2019-07-19 | Ａｇｃ株式会社 | Glass, glass powder, electroconductive paste and solar battery |
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