CN110671981A - Smooth blasting method for vertical shaft tunneling in high stress environment - Google Patents
Smooth blasting method for vertical shaft tunneling in high stress environment Download PDFInfo
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- CN110671981A CN110671981A CN201910956835.7A CN201910956835A CN110671981A CN 110671981 A CN110671981 A CN 110671981A CN 201910956835 A CN201910956835 A CN 201910956835A CN 110671981 A CN110671981 A CN 110671981A
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- 238000005422 blasting Methods 0.000 title claims abstract description 73
- 238000000034 method Methods 0.000 title claims abstract description 23
- 230000005641 tunneling Effects 0.000 title claims abstract description 20
- 239000002360 explosive Substances 0.000 claims abstract description 87
- 230000008878 coupling Effects 0.000 claims abstract description 15
- 238000010168 coupling process Methods 0.000 claims abstract description 15
- 238000005859 coupling reaction Methods 0.000 claims abstract description 15
- 239000011435 rock Substances 0.000 claims abstract description 14
- 239000010410 layer Substances 0.000 claims description 43
- 239000011229 interlayer Substances 0.000 claims description 2
- 239000000843 powder Substances 0.000 claims 4
- 238000011161 development Methods 0.000 abstract description 2
- 238000005474 detonation Methods 0.000 description 12
- 238000010586 diagram Methods 0.000 description 3
- 230000000694 effects Effects 0.000 description 3
- 230000000977 initiatory effect Effects 0.000 description 3
- 238000005065 mining Methods 0.000 description 3
- 230000009286 beneficial effect Effects 0.000 description 2
- 238000013461 design Methods 0.000 description 2
- 230000001066 destructive effect Effects 0.000 description 2
- 238000003780 insertion Methods 0.000 description 2
- 230000037431 insertion Effects 0.000 description 2
- 238000012360 testing method Methods 0.000 description 2
- 238000009412 basement excavation Methods 0.000 description 1
- 238000010304 firing Methods 0.000 description 1
- 238000013467 fragmentation Methods 0.000 description 1
- 238000006062 fragmentation reaction Methods 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
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Classifications
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- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F42—AMMUNITION; BLASTING
- F42D—BLASTING
- F42D1/00—Blasting methods or apparatus, e.g. loading or tamping
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F42—AMMUNITION; BLASTING
- F42D—BLASTING
- F42D3/00—Particular applications of blasting techniques
- F42D3/04—Particular applications of blasting techniques for rock blasting
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- Engineering & Computer Science (AREA)
- General Engineering & Computer Science (AREA)
- Drilling And Exploitation, And Mining Machines And Methods (AREA)
Abstract
The invention relates to a smooth blasting method for vertical shaft tunneling in a high stress environment, and belongs to the technical field of mine development. The method comprises the steps of arranging a central hole in the central position of blast hole arrangement of the vertical shaft rock in a high stress environment, arranging a plurality of layers of annular main blast holes on the periphery of the central hole, arranging annular smooth-surface blast holes on the periphery of the main blast holes, arranging non-coupling explosive charging devices in the main blast holes, and arranging the non-coupling explosive charging devices in the smooth-surface blast holes at intervals; the uncoupled explosive devices in the main blast holes are controlled to detonate layer by layer from inside to outside in an accurate delay mode through the digital electronic detonators, the uncoupled explosive devices in each layer of main blast holes detonate simultaneously, and the uncoupled explosive devices in the annular smooth blast holes are controlled to detonate hole by hole in an accurate delay mode through the digital electronic detonators. The method can effectively carry out blasting operation in a high-stress environment and carry out blasting pressure relief work.
Description
Technical Field
The invention relates to a smooth blasting method for vertical shaft tunneling in a high stress environment, and belongs to the technical field of mine development.
Background
The excavation and mining depth of resources is continuously increased, and the problems are gradually increased along with the increase of the mining depth, for example, the high stress condition under the deep environment, and the mine original rock stress and the structural stress are continuously strengthened and linearly increased along with the increase of the mining depth. And blasting operation under high stress condition easily causes rock burst (rock burst) to appear, which is a potential threat to underground personnel and equipment.
Disclosure of Invention
The invention provides a smooth blasting method aiming at the condition of carrying out shaft tunneling blasting operation in the high stress environment, and the smooth blasting method can effectively carry out blasting pressure relief work and ensure the effectiveness of blasting operation and the safety of personnel and equipment in the high stress environment.
The delay time of the detonators in the holes is required to be set in advance for the digital electronic detonators, and when accurate short-delay detonation is carried out layer by layer or hole by hole, the edge stress distribution of the edges of the blast holes is changed through time difference, so that the stress of the blast holes is concentrated, cracks are expanded and communicated in the direction of the connecting line of the blast holes, and the vibration is effectively reduced compared with the simultaneous firing surface blasting.
The technical scheme adopted by the invention for solving the technical problem is as follows:
a smooth blasting method for vertical shaft tunneling in a high stress environment is characterized in that a central hole is formed in the central position of arrangement of blast holes of vertical shaft rock in the high stress environment, a plurality of layers of annular main blast holes are formed in the periphery of the central hole, annular smooth blasting holes are formed in the periphery of the main blast holes, uncoupled explosive charging devices are arranged in the main blast holes, and uncoupled explosive charging devices are arranged in the smooth blasting holes at intervals; the uncoupled explosive devices in the main blast holes are controlled to detonate layer by layer from inside to outside in an accurate delay mode through the digital electronic detonators, the uncoupled explosive devices in each layer of main blast holes detonate simultaneously, and the uncoupled explosive devices in the annular smooth blast holes are controlled to detonate hole by hole in an accurate delay mode through the digital electronic detonators.
The interlayer spacing of the main blast holes of the adjacent layers is 60 ~ 80cm, the hole spacing of the main blast holes of each layer is 8 ~ 12 times of the aperture of the main blast holes, the spacing of the smooth blasting holes is 8 ~ 12 times of the aperture of the blasting holes, and the delay time of the digital electronic detonator is 9 ~ 12 ms.
Preferably, the uncoupled explosive loading device for smooth blasting comprises a cartridge fixing arc-shaped plate 3, an explosive cartridge 2, an explosive cartridge 1 and a digital electronic detonator 4, wherein the explosive cartridge 2 is fixedly arranged on the cartridge fixing arc-shaped plate 3, the explosive cartridge 2 is sequentially connected with the explosive cartridge 1, the digital electronic detonator 4 is arranged at the end of the cartridge fixing arc-shaped plate 3, the digital electronic detonator 4 is close to the orifice end of the smooth blasting hole, stemming 5 is filled in the orifice of the smooth blasting hole, and a leg wire 6 of the digital electronic detonator 4 penetrates through the stemming 5 and is externally connected with an electronic detonator through a wire.
Furthermore, the explosive charge decoupling coefficient of the explosive cartridge 2 is 1.8 ~ 2.3.3, the top end of the cartridge fixing arc plate 3 is close to the orifice end of the smooth blasting hole, the 1/3 ~ 2/5 of the cartridge fixing arc plate 3 is the bottom, the explosive charge distance of the bottom of the cartridge fixing arc plate 3 is d1, the 1/3 ~ 2/5 of the cartridge fixing arc plate 3 is the middle, the explosive charge distance of the middle of the cartridge fixing arc plate 3 is d2, the 1/3 ~ 1/5 of the cartridge fixing arc plate 3 is the top, the explosive charge distance of the top of the cartridge fixing arc plate 3 is d3, d1 is larger than 3cm and smaller than d2 and smaller than d3 and smaller than 5 cm.
The smooth blasting method for vertical shaft tunneling in the high stress environment comprises the following specific steps:
(1) selecting explosive cartridges with gap distances of more than or equal to 3 cm;
(2) selecting a cartridge fixing arc plate with the length of an explosive cartridge matched with the length of a smooth-surface blasting hole, binding and fixedly arranging the explosive cartridge on the cartridge fixing arc plate, ensuring that adjacent explosive cartridges have uncoupled intervals and the coefficient of explosive-charging uncoupled is 1.8 ~ 2.3.3, sequentially binding and connecting a detonating cord with the explosive cartridge, arranging a digital electronic detonator at the top end of an explosive binding device and inserting the digital electronic detonator into the explosive cartridge, wherein the insertion depth of the digital electronic detonator is not less than 2/3 of the length of the digital electronic detonator;
(3) arranging a central hole in the central position of the arrangement of blast holes of the vertical shaft rock in the high-stress environment, arranging a plurality of layers of annular main blast holes on the periphery of the central hole, arranging annular smooth-surface blast holes on the periphery of the main blast holes, and feeding the explosive binding device filled with the explosive cartridge in the step (2) into the blast holes from the top of the blast holes; wherein the main blast hole is internally provided with non-coupling explosive charging devices, and the smooth blast hole is internally provided with non-coupling explosive charging devices at intervals;
(4) extending the leg wire of the digital electronic detonator upwards along the blasting hole and connecting the leg wire with the electronic detonator through a conducting wire, and filling the stemming into the blasting hole above the digital electronic detonator;
(5) the electronic detonator is adopted to control the digital electronic detonator to detonate, so that the digital electronic detonator can accurately delay to detonate the uncoupled charge devices in the main blast holes layer by layer from inside to outside, the uncoupled charge devices in each layer of the main blast holes detonate simultaneously, and the uncoupled charge devices in the annular smooth blast holes are detonated hole by hole in an accurate delay manner.
The digital electronic detonator is an electric detonator which controls the detonation process by adopting an electronic control module, wherein the electronic control module is a special circuit module which is arranged in the digital electronic detonator, has the functions of controlling the detonation delay time and the detonation energy of the detonator, is internally provided with a detonator identity information code and a detonation password, can test the self function and performance and the electrical performance of a detonator ignition element, and can communicate with a detonation controller and other external control equipment.
The digital electronic detonator is a commercially available product;
the electronic detonator can be selected from a strong detonator MFB-50, a CZQBQ-50, a 90, a 150, a 200 type and the like.
The central hollow hole can reduce the influence between the blast holes when the first circle of blast holes are detonated, improve the blasting fragmentation degree and play a role in guiding.
The blasting sequence can be that after the inner layer is completely blasted, the final blasting smooth surface blasting group can meet the requirement that the contour line meets the design after blasting, and the blank surface is smooth.
Stress superposition between blast holes is minimum when the delay time is 9 ~ 12ms, and the influence on the vibration effect and the destructive effect of surrounding rocks is minimum.
And the aperture of the main blast hole and the aperture of the smooth blast hole are determined according to the actual situation on site.
The invention has the beneficial effects that:
(1) the smooth blasting method for vertical shaft tunneling in high stress environment realizes non-coupled charging and adopts digital electronic detonators to perform accurate short-time delay blasting layer by layer or hole by hole; by setting the optimal delay time of the electronic detonator, the energy generated by the explosive detonated first enables the adjacent blast holes to be in a prestressed state, and when the explosive detonated later explodes, stress waves generated by the two groups of explosives are superposed, so that good blasting acting force coupling is generated; so as to improve the destructive effect in the cutting direction and be beneficial to forming cracks on the center connecting line of the blast hole;
(2) the smooth blasting method for vertical shaft tunneling in the high stress environment effectively prevents and treats rock burst caused by natural occurrence or blasting operation under the high stress condition;
(3) the smooth blasting method for vertical shaft tunneling in the high stress environment effectively reduces the vibration influence on the surrounding rock of the shaft wall during detonation, and ensures the safety of underground personnel and equipment;
(4) the smooth blasting method for vertical shaft tunneling in high stress environment can ensure that the contour line can meet the design requirement after blasting and the blank surface is smooth.
Drawings
FIG. 1 is a smooth blasting hole diagram (front view) of vertical shaft tunneling in a high stress environment;
FIG. 2 is a smooth blasting hole diagram (side sectional view) for vertical shaft tunneling in a high stress environment;
FIG. 3 is a diagram of a non-coupled charge configuration;
in the figure: 1-detonating cord, 2-explosive cartridge, 3-cartridge fixing arc plate, 4-digital electronic detonator, 5-stemming and 6-leg wire.
Detailed Description
The present invention will be further described with reference to the following embodiments.
as shown in FIG. 3, the uncoupled explosive charging device for smooth blasting comprises an explosive cartridge fixing arc-shaped plate 3, an explosive cartridge 2, an explosive fuse 1 and a digital electronic detonator 4, wherein the explosive cartridge 2 is fixedly arranged on the explosive cartridge fixing arc-shaped plate 3, the explosive fuse 1 is sequentially connected with the explosive cartridge 2, the digital electronic detonator 4 is arranged at the end of the explosive cartridge fixing arc-shaped plate 3, the digital electronic detonator 4 is close to the orifice end of a smooth blasting hole, stemming 5 is filled in the smooth blasting orifice, a leg wire 6 of the digital electronic detonator 4 penetrates through the stemming 5 and is externally connected with an electronic detonator through a lead, the explosive uncoupled coefficient of the explosive cartridge 2 is 1.8 ~.3, the top end of the explosive cartridge fixing arc-shaped plate 3 is close to the orifice end of the smooth blasting hole, the explosive cartridge fixing arc-shaped plate 3 is bottom, the explosive charging distance of the bottom of the explosive cartridge fixing arc-shaped plate 3 is d1, the explosive cartridge fixing arc-shaped plate 3 is 1/3 ~ 2/5 as middle part, the explosive cartridge fixing arc-shaped plate 3 middle part is d2, the explosive cartridge fixing arc-shaped plate 3 is 393, the top part is 355648 d3, and the explosive cartridge fixing arc-367 d is less than 3 d3 and less than 3645;
the smooth blasting method for vertical shaft tunneling in the high stress environment comprises the following specific steps:
(1) selecting explosive cartridges with gap distances of 3 cm;
(2) selecting a cartridge fixing arc plate with the length of an explosive cartridge matched with the length of a smooth-surface blasting hole, binding and fixedly arranging the explosive cartridge on the cartridge fixing arc plate, ensuring that adjacent explosive cartridges have uncoupled intervals and the coefficient of explosive-charging uncoupled is 1.8 ~ 2.3.3, sequentially binding and connecting a detonating cord with the explosive cartridge, arranging a digital electronic detonator at the top end of an explosive binding device and inserting the digital electronic detonator into the explosive cartridge, wherein the insertion depth of the digital electronic detonator is not less than 2/3 of the length of the digital electronic detonator;
(3) arranging a central hole in the central position of the arrangement of blast holes of the vertical shaft rock in the high-stress environment, arranging a plurality of layers of annular main blast holes on the periphery of the central hole, arranging annular smooth-surface blast holes on the periphery of the main blast holes, and feeding the explosive binding device filled with the explosive cartridge in the step (2) into the blast holes from the top of the blast holes; wherein the main blast hole is internally provided with non-coupling explosive charging devices, and the smooth blast hole is internally provided with non-coupling explosive charging devices at intervals;
(4) extending the leg wire of the digital electronic detonator upwards along the blasting hole and connecting the leg wire with the electronic detonator through a conducting wire, and filling the stemming into the blasting hole above the digital electronic detonator;
(5) an electronic detonator is adopted to control the digital electronic detonator to detonate, so that the digital electronic detonator can accurately delay to detonate the uncoupled charge devices in the main blast holes layer by layer from inside to outside, the uncoupled charge devices in each layer of main blast holes can detonate simultaneously, and the uncoupled charge devices in the annular smooth blast holes can detonate hole by hole in an accurate delay manner;
the digital electronic detonator is an electric detonator which controls the detonation process by adopting an electronic control module, wherein the electronic control module is a special circuit module which is arranged in the digital electronic detonator, has the functions of controlling the detonation delay time and the detonation energy of the detonator, is internally provided with a detonator identity information code and a detonation password, can test the self function and performance and the electrical performance of a detonator ignition element, and can communicate with a detonation controller and other external control equipment;
the electronic detonator can be a strong detonator MFB-50, CZQBQ-50, 90, 150, 200 and the like;
the blasting sequence can be that after the inner layer is completely blasted, the final blasting smooth surface blasting group can meet the requirement of contour line after blasting and the blank surface is smooth, the stress superposition among the blast holes is minimum when the delay time is 9 ~ 12ms, and the influence on the vibration effect and the damage effect of the surrounding rock is minimum.
While the present invention has been described in detail with reference to the embodiments shown in the drawings, the present invention is not limited to the embodiments, and various changes and modifications can be made within the knowledge of those skilled in the art without departing from the spirit of the present invention.
Claims (4)
1. A smooth blasting method for vertical shaft tunneling in a high stress environment is characterized in that: arranging a central hole in the central position of the blast hole arrangement of the vertical shaft rock in the high-stress environment, arranging a plurality of layers of annular main blast holes on the periphery of the central hole, arranging annular smooth blasting holes on the periphery of the main blast holes, arranging non-coupling explosive devices in the main blast holes, and arranging the non-coupling explosive devices in the smooth blasting holes at intervals; the uncoupled explosive devices in the main blast holes are controlled to detonate layer by layer from inside to outside in an accurate delay mode through the digital electronic detonators, the uncoupled explosive devices in each layer of main blast holes detonate simultaneously, and the uncoupled explosive devices in the annular smooth blast holes are controlled to detonate hole by hole in an accurate delay mode through the digital electronic detonators.
2. The smooth blasting method for vertical shaft tunneling in high stress environment according to claim 1, wherein the interlayer spacing of main blastholes in adjacent layers is 60 ~ 80cm, the hole spacing of the main blastholes in each layer is 8 ~ 12 times of the hole diameter of the main blastholes, the interval of the smooth blastholes is 8 ~ 12 times of the hole diameter of the blastholes, and the delay time of the digital electronic detonator is 9 ~ 12 ms.
3. The smooth blasting method for vertical shaft tunneling in high stress environment according to claim 1 or 2, characterized in that: the uncoupled explosive charging device for smooth blasting comprises a cartridge fixing arc-shaped plate (3), an explosive cartridge (2), an explosive fuse (1) and a digital electronic detonator (4), wherein the explosive cartridge (2) is fixedly arranged on the cartridge fixing arc-shaped plate (3), the explosive fuse (1) is sequentially connected with the explosive cartridge (2), the digital electronic detonator (4) is arranged at the end of the cartridge fixing arc-shaped plate (3) and the orifice end of the digital electronic detonator (4) close to a smooth blasting hole, stemming (5) is filled in the smooth blasting orifice, and a foot line (6) of the digital electronic detonator (4) penetrates through the stemming (5) and is externally connected with an electronic detonator through a lead.
4. The smooth blasting method for vertical shaft tunneling in the high stress environment according to claim 3, wherein the powder charge decoupling coefficient of the explosive cartridge (2) is 1.8 ~ 2.3.3, the top end of the cartridge fixing arc plate (3) is close to the orifice end of the smooth blasting hole, 1/3 ~ 2/5 of the cartridge fixing arc plate (3) is the bottom, the powder charge distance of the bottom of the cartridge fixing arc plate (3) is d1, 1/3 ~ 2/5 of the cartridge fixing arc plate (3) is the middle, the powder charge distance of the middle of the cartridge fixing arc plate (3) is d2, 1/3 ~ 1/5 of the cartridge fixing arc plate (3) is the top, the powder charge distance of the top of the cartridge fixing arc plate (3) is d3, d1 is more than 3cm and d2 is more than d3 and is less than 5 cm.
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| CN201910956835.7A CN110671981B (en) | 2019-10-10 | 2019-10-10 | Smooth blasting method for vertical shaft tunneling in high stress environment |
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Cited By (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN111578802A (en) * | 2020-05-28 | 2020-08-25 | 广州市顺兴石场有限公司 | High-acquisition-degree mine smooth blasting mining method |
| CN112696997A (en) * | 2020-12-22 | 2021-04-23 | 北京科技大学 | Efficient blasting and tunneling method for vertical shaft |
| CN113188394A (en) * | 2021-04-20 | 2021-07-30 | 中海石油(中国)有限公司 | Operation method for driving pile shoe of self-elevating platform into mud by underwater blasting of hard stratum |
| CN114001605A (en) * | 2021-11-24 | 2022-02-01 | 昆明理工大学 | Smooth blasting method for tunneling |
| CN114812309A (en) * | 2022-03-18 | 2022-07-29 | 淄博圣世达爆破工程有限公司 | Pre-splitting blasting engineering method for digital electronic detonator |
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| CN107131806A (en) * | 2017-05-09 | 2017-09-05 | 深圳市中金岭南有色金属股份有限公司 | Service shaft is disposable into well blasting method |
| CN108036684A (en) * | 2017-12-12 | 2018-05-15 | 中交公局第二工程有限公司 | A kind of Pile Diameter is the bridge cylinder pile foundation blasting method of 1.7-1.9m |
| CN108917507A (en) * | 2018-07-06 | 2018-11-30 | 安徽理工大学 | A kind of variable diameters are radially uniform not to couple continuous charging structure and its loading method |
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2019
- 2019-10-10 CN CN201910956835.7A patent/CN110671981B/en active Active
Patent Citations (5)
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| CN1434191A (en) * | 2002-01-25 | 2003-08-06 | 中国人民解放军工程兵第四十一旅 | Bore construction method by bore explosion |
| CN102401616A (en) * | 2011-10-11 | 2012-04-04 | 中国矿业大学(北京) | Blasting excavation method of vertical shaft |
| CN107131806A (en) * | 2017-05-09 | 2017-09-05 | 深圳市中金岭南有色金属股份有限公司 | Service shaft is disposable into well blasting method |
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Cited By (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN111578802A (en) * | 2020-05-28 | 2020-08-25 | 广州市顺兴石场有限公司 | High-acquisition-degree mine smooth blasting mining method |
| CN112696997A (en) * | 2020-12-22 | 2021-04-23 | 北京科技大学 | Efficient blasting and tunneling method for vertical shaft |
| CN113188394A (en) * | 2021-04-20 | 2021-07-30 | 中海石油(中国)有限公司 | Operation method for driving pile shoe of self-elevating platform into mud by underwater blasting of hard stratum |
| CN114001605A (en) * | 2021-11-24 | 2022-02-01 | 昆明理工大学 | Smooth blasting method for tunneling |
| CN114812309A (en) * | 2022-03-18 | 2022-07-29 | 淄博圣世达爆破工程有限公司 | Pre-splitting blasting engineering method for digital electronic detonator |
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