CN1106275C - 激光照排光学调谐腔膜片以及采用该膜片的印版 - Google Patents
激光照排光学调谐腔膜片以及采用该膜片的印版 Download PDFInfo
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Abstract
一种用于以某一激光波长产生激光照排的激光成像光学调谐腔膜片(11),含有一个起膜片底片作用并有第一和第二表面(13和14)的塑料柔性片。在膜片底片上沉积有一个薄膜堆层(16),它含有一个由第一表面承载的第一真空沉积金属层,还有一个沉积在第一金属层上的绝缘层18,以及一个真空沉积在绝缘层上的第二半不透明金属层。该薄膜堆层调谐至在激光波长上具有最高吸收率。
Description
现有技术
本发明涉及一种激光照排光学调谐腔膜片(laser imageable tunedoptical cavity thin film)以及采用该膜片的印版,来提高数字化激光照排的书写性能。
背景技术
传统的速印平版印刷正在经受飞速的技术变革。这种变革开始于台式出版软件取代照像制备纸型而应用到印刷工作的排版时。印刷厂家一旦开始用数据的方式而不是照像件的方式收受主要活计,他们就购买了那些可以兼用数字化信息的设备。这种新式设备有助于提高整个印刷工艺的速度和效率。因为不再需要照像底片或光敏聚合物的显影,还可以显著地减少印刷工业中化学溶剂的用量。最早购买的数字化设备是校阅系统,它可以让用户很快地校阅数字化排版的硬拷贝版样,然后再去付印。尽管现在还在使用数字校阅系统,日益普遍的是直接在计算机屏幕上校阅,接着就用数字化制备的印版付印。
当前的激光照排印版技术受到现有材质的激光灵敏度限制。使用中,印版可以直接在印压机中照排,也可以在一个平台扫描仪上照排,不管哪一种方式,激光能量密度都需要达到400mj/cm2或以上,才能对印版进行蚀刻。由于印版表面和表面安装架的不精准,焦点深度会发生变化。要克服这些变化的影响就要提高印版成像系统的工作范围。在1995年5月8日提交的08/436,119待批的专利申请中公开了一种激光照排直写膜片和采用该膜片的印刷件,这种激光照排直写膜片应用单层的真空沉积激光蚀刻涂层,涂层材料可选取钛、锆、铝和铪以及其合金等金属。尽管这种膜片和印刷件具有出色的性能,还是需要提高膜片和印刷件的吸收性能。
发明内容
总的来说,本发明的首要目的是提供一种提高对红外激光束灵敏度的光学调谐腔膜片以及采用该膜片的印版。
本发明的另一个目的是提供一种具有以上特性的膜片和印版,它的工作聚焦深度增加了,而且尽管在激光器至成像点距离有波动,在整个印版上的成像照排清晰度不变。
本发明的又一个目的是提供一种具有以上性能的膜片和印版,由于其激光吸收层的激光灵敏度提高了,附着层厚度变化的影响降至最低。
本发明的再一个目的是提供一种膜片和采用该膜片的印版,它在蚀刻的激光波长上调谐至最大吸收率。
本发明还有一个目的是提供一种具有以上特性而且易于生产的膜片和印刷件。
为了实现本发明的首要目的,现提供一种用于以某一激光波长产生激光照排的激光成像光学调谐腔膜片,具有一个带第一和第二表面且起底片作用的有机塑料柔性片和一个沉积在该底片第一表面上的光学腔薄膜堆层,所述薄膜堆层具有一个由第一表面承载的第一真空沉积金属层、一个沉积在第一金属层上的绝缘层、以及一个沉积在绝缘层上的第二真空沉积半不透光金属层,所述薄膜堆层调谐至在激光器波长上具有最高吸收率。
附图简介
下面参照附图详述本发明的优选实施方案,并进一步说明本发明的另外目的和特性。附图中:
图1为本发明的一个膜片的截面图,所示薄膜堆层位于聚合物底片上。
图2为本发明的印版的截面图,具有图1所示的光学调谐腔激光蚀刻膜片。
图3为本发明的印版的另一个实施方案的截面图。
图4为单层金属钛的光学性能曲线,其中金属的厚度已经调节至在红外线半导体二极管激光器的波长上达到最大吸收。
图5所示为图1所示膜片的光学性能曲线。
图6为本发明的另一种印版的截面图。
优选实施方案
一般地说,激光光学调谐腔膜片用于受激光器发出的激光照射,它具有一个起底片作用的且具有第一表面和第二表面的塑料片。在底片的第一表面上沉积有一光学调谐腔薄膜堆层。该薄膜堆层含有由第一表面承载的第一真空沉积金属层。在第一金属层上沉积有一个绝缘层,厚度为激光额定波长四分之一的奇数倍。在绝缘层上沉积有一个第二真空沉积金属层。在第二金属层上有一个有机的或者硅酮表面涂层。通过设计不同的层厚,把薄膜堆层调谐在激光的波长下有最大吸收率。
更具体地,如附图中图1所示,激光照排光学调谐腔膜片11具有一个有机塑料制的柔性片或者说底片12,底片有第一和第二表面13和14,其厚度范围为0.2至10密耳,优选7密耳。底片由纯对苯二甲酸乙二醇聚酯、硫酸钡充填对二苯二甲酸乙二醇聚酯(PET)、PEN(polyethylene napthalate)之类的适宜材料制造的,也可以采用铝等柔性金属材料。在采用金属材料时,要蒸发上一个对苯二甲酸乙二醇聚酯或其它适当的聚合物以模拟第一优选例中的聚合物底片。这种结构取消了分层的需要。杜邦公司供应的MYLAR膜片、ICI 422、Hoescht 3930,ICI 329,ICI Kaladex都可以采用。
在第一表面13上承加一个薄膜堆层16,堆层上可安设露光(leaky)或不露光(non-leaky)的光学调谐腔。
如果安设露光光学腔,堆层16上有一第一个部分透射且反射的金属层17,它是真空沉积到第一表面13的。第一金属层可以用铝等亮金属、也可以用铬、镍或钛等灰色金属形成,它在本发明的设计中既起吸收层的作用也起反射层的作用。第一金属层17沉积的厚度范围是60至500埃,从而在选定的最佳厚度下,部分地吸收、透射并反射,在热容量、热传导性和吸收性等方面得出最高的效益。在第一金属层采用钛时,最佳厚度是220埃。
如果薄膜堆层16要采用不露光腔,就在第一表面13上沉积厚度范围500-2000埃的铝、镍、钛或铬之类的不透光反射金属层,而形成第一金属层17。
在第一金属层17上沉积一个厚度为激光波长的三分之一至五分之一之间的绝缘层18,最优厚度为激光波长的四分之一。绝缘层18的材料可以选自氟酸镁、氧化铝、二氧化硅、高价氧化物、金属氟化物、金属硫化物、热蒸发聚合物、以及真空沉积聚合体等,可以通过热、电子束、或者放射工艺等在真空中沉积的聚合物,也可以是通过化学蒸发沉积法沉积的多聚体。氟酸镁是首选的材料,而挥发性化合物要更好些。
在绝缘层18上真空沉积一个第二金属层19,厚度范围在25埃至100埃之间,65埃为最佳厚度。第二金属层19所用的金属材料可以与第一金属层17所选材料相同。
在第二金属层19上沉积一个厚度为0.5至4微米的有机表面涂层21,可以用硅酮作无水印版结构的涂层材料,用聚乙烯醇作使用含水溶液印版的涂层材料,但涂层材料并不仅受上述两种的限制。
可以利用辊式涂层器来生产激光蚀刻膜片11,其中要用辊子把底片12输进一个真空室。金属层17和19以及绝缘层18,还有最表面的有机层21可以按照要求的顺序一次完成沉积。相反,这三层还可以多次通过辊式涂层器不间断真空地进行沉积。
另外,还可以把带有层17、18和19的膜片底片12从辊式涂层器中取出来,然后在大气压下用常规湿式工艺涂布有机表面涂层21。这一涂层在辊式涂层作业中膜片底片是呈卷形进行的,可以用同样方法,也可以用不同方法。这样涂布薄有机涂层21的方式是掌握湿式涂布工艺的人员所熟悉的。然后湿的涂层可以用紫外线照射或加热处理,使该表面涂层附着在最外层金属层19上并使之固结。
视本发明的激光照排膜片要用的印刷墨材而定,表层涂层21可以分别制备成具有亲水性或疏水性、亲油性或者疏油性。举例来说,该有机涂层可以是排斥墨材的硅酮聚合物之类的疏油材料,也可以是吸水的聚乙烯醇之类的亲水材料。该有机表面涂层21还可以制成这样一种特质,它对所选的墨材以及墨材粘合液中所选出的至少一种印刷液表现出与膜片底片12不同的亲合性。
按以上所述制备好腔激光蚀刻片11后,可以放在一个支持基片或说印版26上,该印版具有一个上表面即第一表面27以形成激光照排直写印刷件31,如图2所示。膜片11粘附在基板即印版26上,印版26典型地是铝制的,厚度为5-12密耳且具有柔性,从而可以附着在滚筒上,前述粘附手段可以是涂布在表面14或表面27上的胶(图中未示),这样可以按大小适当的格局固定在基板即印板26的表面上成为覆盖层。基板也就是说印版26最好是尺寸稳定,使得在50°F至100°F的正常工作温度范围中,整个20英寸长度上最大的走形不超过5密耳。
图3所示为本发明的另一个实施例,它不需要进行分层。图3所示的印版36有一个铝等适当材料制的、适当厚度为5-12密耳的柔性金属底片37,它有一个表面38,在表面38上加有一个厚度为0.25-2密耳的聚合物绝缘层39。该层39可以是对苯二甲酸乙二醇(PET)蒸发层,其作用是模拟图1和图2所示实例的底片12的功能。在层39之上沉积有一个薄膜堆层41,后者与前述薄膜堆层16类似或者相同。
图1、2和3所示的复合印版或者说印刷件11、31和36可以直接使用并装入印压机进行照排,也可以在照排机中照排,在其中由红外线半导体二极管激光器在激光蚀刻膜片11上进行照排成像。产生成像的原因是蚀刻机制,受到红外线激光束照射后,有机膜片底片12的第一表面13分解或者气化,造成底片12与图2中的第一金属层之间的界面剥落、或者图3中的层39和金属层17之间的界面剥落。用异丙醇之类的溶剂擦拭印版去除掉从印版上成像的部分层17、18、19和21残留部分。
在露光腔吸收系统中,第一金属层17是部分透射的,热量从吸收激光能量的表层金属层19穿过绝缘层18再穿过第一金属层17,与直接由第一金属层17吸收的能量相结合而传入聚合体层12,把聚合体层12加热到其分解温度。例如,PET的分解温度是265℃(538°K),低于激光吸收层17、18和19的熔化或蒸发温度。在不露光腔吸收系统中,激光的大部分被第一金属层17反射,而层18中所用的绝缘层是聚合物。与露光腔类似产生成像的原因是蚀刻机制,不同的是气体分解发生在聚合物绝缘层18中来去掉表层金属层19。如果聚合物绝缘层是亲油的,在去掉表层金属层19以后,留下一些聚合物绝缘层,印版起到的作用就像整个堆层中层17、18和19都被去掉一样。如果聚合物绝缘层18随表层金属层19一起去掉而暴露出下面的反射层,反射层17就可以起亲水层的作用来吸附含水溶液,而表层的有机物层21可以是亲油的聚合物。最好激光吸收层不熔化或蒸发,因为这种蒸发过程消耗激光能量却不会相应地升高温度,于是要降低蚀刻灵敏度。这是一个非常重要的因素,因为用于此处的激光半导体二极管一般以小输出功率工作。
激光蚀刻膜片11相对于单金属或碳阵列吸收层提高了激光蚀刻灵敏度,在激光器的波长上有更高的吸收性。这种吸收性是通过适当地选择绝缘层18、金属层17和19的厚度,把薄膜堆层16在激光器频率上调制为具有最低反射和最高的吸收。
图4为由210埃厚的单层金属钛计算得到的吸收性能曲线。
图5是采用本发明改进的特定激光蚀刻膜片11的光学特性,该膜片包括有220埃厚的镍形成的第一金属层17,1812埃厚的氟化镁形成的绝缘层18以及65埃厚的镍形成的第二金属层19,由图可见,这种腔激光蚀刻膜片可以达到高吸收率,在800至1,100毫微米波长范围吸收率达90%以上。
图6所示为体现本发明的印版的另一个实施例的截面图。可以去掉在图2中用于把膜片结构11附在基片支持结构26上的胶层,而把PE底片和金属层17以及层18、19和21直接沉积在基片支持结构26上。变通地,如图6所示,印版46由一个柔性金属底片47组成,例如,适当厚度为譬如5-12密耳的铝。底片47有一个表面48,在表面48上沉积一个厚度为但并不限于激光波长的三分之一到五分之一间的蒸发性聚合物绝缘层49,如同前述本发明实施例。但是它的沉积厚度范围应在50至400埃之间。绝缘层49上覆盖一个25至100埃厚的吸收金属层51。在本发明的该实施例中,金属底片47起薄膜堆层的不透明金属层作用。一个表面涂层52覆盖着金属层51以最后做成印版46的薄膜涂层。有机或者硅酮材料形成的层52可以用真空沉积也可以用常规湿式化学沉积工艺沉积。该层52可以按前文所述的方式起疏油或者亲水层的作用。
综上所述,通过把蚀刻涂层调谐至所用激光频率,激光照排直写腔激光蚀刻膜片能够具有很低的蚀刻阈值。
Claims (16)
1.一种用于以某一激光波长产生激光照排的激光成像光学调谐腔膜片,具有一个带第一和第二表面且起底片作用的有机塑料柔性片和一个沉积在该底片第一表面上的光学腔薄膜堆层,所述薄膜堆层具有一个由第一表面承载的第一真空沉积金属层、一个沉积在第一金属层上的绝缘层、以及一个沉积在绝缘层上的第二真空沉积半不透光金属层,所述薄膜堆层调谐至在激光器波长上具有最高吸收率。
2.根据权利要求1所述的膜片,其特征为,所述绝缘层的厚度为激光波长四分之一的奇数倍。
3.根据权利要求1所述的膜片,其特征为,所述光学调谐腔是露光的,而且所述第一金属层是部分吸收、透射和反射的。
4.根据权利要求1所述的膜片,其特征为,所述光学调谐腔是不露光的,而且所述第一金属层是不透明而且反射的。
5.根据权利要求1所述的膜片,其特征为,该薄膜堆层上有一个有机的表面涂层。
6.根据权利要求1所述的膜片,其特征为,所述第一和第二金属层的金属选自铝、铬、镍、钛、锆、铪或其合金。
7.根据权利要求1所述的膜片,其特征为,所述第一金属层的厚度范围为65至2000埃。
8.根据权利要求7所述的膜片,其特征为,所述第二金属层厚度范围为25至100埃。
9.根据权利要求1所述的膜片,其特征为,所述绝缘层由可以在真空中靠热、电了束或放射技术处理的氟化镁、氧化铝、二氧化硅、高价氧化物、金属氟化物、金属硫化物、热蒸发聚合物、真空沉积聚合物制成,也可以由化学蒸发沉积的聚合物制成。
10.根据权利要求1所述的膜片,其特征为,所述绝缘层厚度在激光器波长的三分之一波长和五分之一波长之间。
11.根据权利要求4所述的膜片,其特征为,所述绝缘层由聚合物材料制成。
12.根据权利要求1所述的膜片,其特征为,有机塑料柔性片为充填硫酸钡的白色膜片。
13.根据权利要求1所述的膜片,其特征为,所述膜片底片厚度范围为0.2至10密耳。
14.一种采用某一激光波长产生激光能量的激光成像印版,具有一个带有一个第一表面且厚度范围5至20密耳的基底支持基片,一个层迭在第一表面上的蚀刻膜片,所述激光蚀刻膜片含有一个有第一和第二表面的且起薄膜底片作用的有机塑料柔性片和一个沉积在薄膜底片的第一表面上的光学腔薄膜堆层,所述光学腔堆层含有一个承载在第一表面上的第一真空沉积金属、一个沉积在第一金属层上的绝缘层和一个沉积在绝缘层上的第二真空沉积金属层,所述薄膜光学腔堆层调谐至在激光器波长上具有最大吸收率。
15.根据权利要求14所述的印版,其特征为,所述绝缘层厚度为激光器波长四分之一的奇数倍。
16.根据权利要求14所述的印版,其特征为,基底支持基片的表面起薄膜堆层的不透明金属层作用而提供一个不露光印版。
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US08/608,645 | 1996-02-29 | ||
US08/608,645 US5691063A (en) | 1996-02-29 | 1996-02-29 | Laser imageable tuned optical cavity thin film and printing plate incorporating the same |
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CN1106275C true CN1106275C (zh) | 2003-04-23 |
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US (1) | US5691063A (zh) |
EP (1) | EP0938409B1 (zh) |
JP (1) | JP3103601B2 (zh) |
CN (1) | CN1106275C (zh) |
AT (1) | ATE284784T1 (zh) |
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CA2221922C (en) * | 1996-08-20 | 2004-01-27 | Presstek, Inc. | Self-cleaning, abrasion-resistant, laser-imageable lithographic printing constructions |
US5783364A (en) * | 1996-08-20 | 1998-07-21 | Presstek, Inc. | Thin-film imaging recording constructions incorporating metallic inorganic layers and optical interference structures |
GB2334727A (en) * | 1998-02-28 | 1999-09-01 | Horsell Graphic Ind Ltd | Planographic printing member |
US5996498A (en) * | 1998-03-12 | 1999-12-07 | Presstek, Inc. | Method of lithographic imaging with reduced debris-generated performance degradation and related constructions |
US6105501A (en) * | 1998-06-10 | 2000-08-22 | Flex Products, Inc. | High resolution lithographic printing plate suitable for imaging with laser-discharge article and method |
PT978373E (pt) | 1998-08-06 | 2011-11-17 | Sicpa Holding Sa | Folha inorgânica para o fabrico de pigmentos |
CN1205053C (zh) * | 1998-09-21 | 2005-06-08 | 压缩技术公司 | 激光成象装置用的平版印刷版 |
CN100354727C (zh) * | 1999-05-14 | 2007-12-12 | 3M创新有限公司 | 腐蚀增强层 |
US6378432B1 (en) | 2000-05-03 | 2002-04-30 | Presstek, Inc. | Lithographic imaging with metal-based, non-ablative wet printing members |
DE102008008685A1 (de) | 2008-02-12 | 2009-08-13 | Giesecke & Devrient Gmbh | Sicherheitselement und Verfahren zu seiner Herstellung |
US8389199B2 (en) * | 2009-03-17 | 2013-03-05 | Presstek, Inc. | Lithographic imaging with printing members having metal imaging bilayers |
US9679779B2 (en) | 2011-03-30 | 2017-06-13 | The Aerospace Corporation | Systems and methods for depositing materials on either side of a freestanding film using selective thermally-assisted chemical vapor deposition (STA-CVD), and structures formed using same |
US9583354B2 (en) | 2011-03-30 | 2017-02-28 | The Aerospace Corporation | Systems and methods for depositing materials on either side of a freestanding film using laser-assisted chemical vapor deposition (LA-CVD), and structures formed using same |
CN107206544A (zh) * | 2015-01-28 | 2017-09-26 | 西尔特克特拉有限责任公司 | 透明的并且高度稳定的显示屏保护件 |
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- 1996-02-29 US US08/608,645 patent/US5691063A/en not_active Expired - Lifetime
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1997
- 1997-01-15 EP EP97901979A patent/EP0938409B1/en not_active Expired - Lifetime
- 1997-01-15 CN CN97192587A patent/CN1106275C/zh not_active Expired - Fee Related
- 1997-01-15 WO PCT/US1997/000409 patent/WO1997031774A1/en active IP Right Grant
- 1997-01-15 DE DE69731969T patent/DE69731969T2/de not_active Expired - Fee Related
- 1997-01-15 AT AT97901979T patent/ATE284784T1/de not_active IP Right Cessation
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DE69731969T2 (de) | 2005-07-14 |
US5691063A (en) | 1997-11-25 |
DE69731969D1 (de) | 2005-01-20 |
ATE284784T1 (de) | 2005-01-15 |
EP0938409A1 (en) | 1999-09-01 |
EP0938409B1 (en) | 2004-12-15 |
JP3103601B2 (ja) | 2000-10-30 |
CN1211949A (zh) | 1999-03-24 |
WO1997031774A1 (en) | 1997-09-04 |
EP0938409A4 (en) | 2000-08-09 |
JP2000501669A (ja) | 2000-02-15 |
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