CN110605467B

CN110605467B - Ion cutting calibration device, calibration method and ion cutting device

Info

Publication number: CN110605467B
Application number: CN201910894177.3A
Authority: CN
Inventors: 杜忠明; 杨继进; 周飞; 陈卫
Original assignee: Institute of Geology and Geophysics of CAS
Current assignee: Institute of Geology and Geophysics of CAS
Priority date: 2019-09-20
Filing date: 2019-09-20
Publication date: 2020-08-04
Anticipated expiration: 2039-09-20
Also published as: CN110605467A

Abstract

The invention provides an ion cutting calibration device, a calibration method and an ion cutting device. The ion cutting calibration device comprises a first calibration component and a second calibration component, wherein the first calibration component is provided with a first calibration surface, and the second calibration component is provided with a second calibration surface; the sample to be calibrated and the sample supporting plate are arranged on the first calibration surface so as to adjust the position of the sample to be calibrated on the sample supporting plate and form an initial calibration sample; the initial calibration sample is arranged on the second calibration surface, and the second calibration surface is arranged opposite to the baffle of the ion cutting device so as to adjust the relative position of the initial calibration sample and the baffle of the ion cutting device and form a calibration sample. The ion cutting device comprises an ion generator, a baffle plate and the ion cutting calibration device. The invention improves the accuracy of the calibration sample loading, reduces the ion scratches on the surface of the calibration sample, and shortens the time of ion cutting, thereby improving the efficiency of the ion cutting.

Description

Ion cutting calibration device, calibration method and ion cutting device

Technical Field

The invention relates to a sample surface treatment technology, in particular to an ion cutting calibration device, a calibration method and an ion cutting device.

Background

Sample calibration plays an extremely important role in many scenarios. For example, before ion cutting, a part of the sample which is not to be cut needs to be shielded by a baffle plate, a part which needs to be subjected to ion cutting is exposed, a part of the sample which is higher than the baffle plate is a part to be cut of the sample, and then the part to be cut is bombarded by ions so as to obtain a flat sample cutting surface. Therefore, accurate sample loading has great influence on the cutting effect of the ions.

In the prior art, the bottom surface of a sample is usually adhered to a sample holder by double-sided adhesive, so that one side surface of the sample is aligned with a reference backup plate, then the sample holder is transferred to a three-axis translation table, and the vertical, front, rear, left and right positions of the sample are adjusted by the three-axis translation table, so that the sample is tightly attached to a baffle plate and a part needing ion cutting is exposed.

However, the calibration sample loading is not accurate enough by the method, ion scratches are easily generated on the surface of the calibration sample, and the ion cutting time is too long, so that the efficiency is low.

Disclosure of Invention

In order to solve the technical problems, the invention provides an ion cutting calibration device, a calibration method and an ion cutting device, which can effectively avoid the problem that the calibration sample loading of the ion cutting calibration device is not accurate enough, reduce ion scratches on the surface of a calibration sample, shorten the ion cutting time and improve the ion cutting efficiency.

In order to achieve the above technical effects, in a first aspect, the present invention provides an ion cutting calibration apparatus for sample calibration of an ion cutting apparatus, including a first calibration component and a second calibration component, where the first calibration component has a first calibration surface, and the second calibration component has a second calibration surface.

And arranging a sample to be calibrated and a sample supporting plate on the first calibration surface so as to adjust the position of the sample to be calibrated on the sample supporting plate and form an initial calibration sample.

The primary calibration sample is arranged on the second calibration surface, and the second calibration surface is arranged opposite to the baffle of the ion cutting device so as to adjust the relative position of the primary calibration sample and the baffle of the ion cutting device and form a calibration sample.

Optionally, the first calibration assembly comprises a base plate and a reference backup plate arranged on the base plate, wherein the side surface of the reference backup plate is provided with two reference surfaces with different surface heights;

the reference surface with the lower surface height is a first reference surface, the reference surface with the higher surface height is a second reference surface, the first reference surface and the second reference surface are connected through a connecting surface between the first reference surface and the second reference surface, and the first reference surface and the second reference surface form the first calibration surface together;

and the sample to be calibrated and the sample supporting plate are respectively abutted against the first reference surface and the second reference surface so as to adjust the position of the sample to be calibrated on the sample supporting plate and form an initial calibration sample.

Optionally, the surface of the base plate has a first plane and a second plane with different heights, the first plane and the second plane being connected by a side face located therebetween;

when the reference backup plate is arranged on the bottom plate, the reference backup plate is positioned on the first plane with lower height, and the first reference surface abuts against the side surface;

the sample supporting plate is located on a second plane with a higher height, the end portion, close to one side of the reference backup plate, of the sample supporting plate abuts against the first reference surface, and the end portion, close to one side of the reference backup plate, of the sample to be calibrated abuts against the second reference surface.

Optionally, the second calibration assembly comprises a first reference table and a second reference table connected to the first reference table, the second calibration surface being located on the first reference table.

Optionally, the first reference table and the second reference table are connected through a clamping assembly, the clamping assembly comprises a clamping head located on one of the first reference table and the second reference table and a clamping groove located on the other of the first reference table and the second reference table, and when the first reference table and the second reference table are connected, the clamping head is clamped in the clamping groove.

Optionally, the first reference stage comprises a base.

The base is provided with a first cavity, a first rotating piece is arranged in the first cavity, and a rotating shaft of the first rotating piece is positioned in a first direction; the first rotating part is internally provided with a first cavity, the first cavity is internally provided with a first rotating part, a rotating shaft of the first rotating part is positioned in a first direction, and the first direction are perpendicular to each other in space.

The second rotating part is provided with a sliding groove extending along the first direction, a notch of the sliding groove is opposite to the baffle, the sample supporting plate is located in the sliding groove, the initial calibration sample connected with the sample supporting plate is exposed outside the sliding groove through the notch, and the initial calibration sample and the baffle are opposite to each other along the second direction.

Optionally, the second reference table includes a base and a fixed seat disposed opposite to the base, and the first reference table is connected to the fixed seat.

The base is provided with a push plate on one side close to the fixed seat, the base is provided with a first adjusting piece for adjusting the position of the push plate in the first direction and a second adjusting piece for adjusting the position of the push plate in the second direction.

When the first reference platform is connected to the second reference platform, the end part of the push plate is positioned at the first end of the sliding groove and abuts against the sample supporting plate in the sliding groove so as to push the sample supporting plate to slide between the first end and the second end of the sliding groove in a reciprocating manner.

Optionally, a plurality of locking pieces are arranged on the base; at least one first locking piece for locking the rotating position of the first rotating piece in the base is arranged between the base and the first rotating piece; at least one second locking piece used for locking the rotating position of the second rotating piece in the first rotating piece is arranged between the first rotating piece and the second rotating piece.

An elastic part is arranged between the sliding groove and the sample supporting plate, and the sample supporting plate slides in the sliding groove in a reciprocating manner under the combined action of the pushing force of the pushing plate and the elastic restoring force of the elastic part; at least one third locking piece for locking the moving position of the sample supporting plate in the sliding groove is arranged between the sample supporting plate and the sliding groove.

In a second aspect, the present invention provides an ion cutting calibration method, applied to the ion cutting calibration apparatus described above, including:

and mounting the sample to be calibrated and the sample supporting plate on a first calibration surface of a first calibration assembly, adjusting the position of the sample to be calibrated on the sample supporting plate, and forming an initial calibration sample.

And arranging the primary calibration sample on a second calibration surface of a second calibration component, wherein the second calibration surface is arranged opposite to the baffle plate of the ion cutting device, adjusting the relative position of the primary calibration sample and the baffle plate of the ion cutting device, and forming a calibration sample.

In a third aspect, the present invention also provides an ion cutting device, comprising an ion generator, a baffle plate and the ion cutting calibration device as described above.

The sample to be calibrated and the sample supporting plate are arranged on the ion cutting calibration device, the baffle is positioned between the sample to be calibrated and the ion generator, and the ion emitting end of the ion generator faces to the baffle and the sample to be calibrated.

The invention provides an ion cutting calibration device, a calibration method and an ion cutting device. Adjusting the position of the sample to be calibrated on the sample supporting plate by arranging the sample to be calibrated and the sample supporting plate on the first calibration surface to form an initial calibration sample; through setting up the initial calibration sample on the face is calibrated to the second, the face is calibrated to the second and the baffle of ion cutting device sets up relatively to the relative position of adjustment initial calibration sample and ion cutting device's baffle, with form calibration sample, improved the accuracy of calibration dress appearance, reduced the ion mar on calibration sample surface, also reduced the dress appearance degree of difficulty of ion cutting simultaneously. The ion cutting device comprises an ion generator, a baffle and the ion cutting calibrating device, wherein a sample to be calibrated and a sample supporting plate are arranged on the ion cutting calibrating device, the baffle is positioned between the sample to be calibrated and the ion generator, and an ion emitting end of the ion generator faces the baffle and the sample to be calibrated, so that the ion cutting time is shortened, and the ion cutting efficiency is improved.

The construction of the present invention and other objects and advantages thereof will be more apparent from the following description of the preferred embodiments taken in conjunction with the accompanying drawings.

Drawings

In order to more clearly illustrate the embodiments of the present invention or the technical solutions in the prior art, the drawings needed to be used in the description of the embodiments or the prior art will be briefly introduced below, and it is obvious that the drawings in the following description are some embodiments of the present invention, and for those skilled in the art, other drawings can be obtained according to these drawings without creative efforts.

Fig. 1 is a schematic structural diagram of a first calibration assembly of an ion cutting calibration apparatus according to an embodiment of the present invention;

FIG. 2 is a schematic structural diagram illustrating a second calibration assembly of the ion cutting calibration apparatus according to an embodiment of the present invention;

FIG. 3 is a schematic structural diagram illustrating a first reference stage in a second calibration assembly of the ion cutting calibration apparatus according to an embodiment of the present invention;

FIG. 4 is a schematic structural diagram illustrating a second reference stage in a second calibration assembly of the ion cutting calibration apparatus according to an embodiment of the present invention;

fig. 5 is a schematic structural diagram of a base and a first rotating member of a first reference stage in a second calibration assembly of the ion cutting calibration apparatus according to an embodiment of the present invention;

fig. 6 is a schematic structural diagram of a first rotating member and a second rotating member of a first reference stage in a second calibration assembly of the ion cutting calibration apparatus according to an embodiment of the present invention;

fig. 7 is a schematic structural diagram of a second rotating member and a sliding chute of a first reference stage in a second calibration assembly of the ion cutting calibration apparatus according to an embodiment of the present invention;

fig. 8 is a schematic structural diagram of a sample tray of an ion cutting calibration apparatus according to an embodiment of the present invention;

fig. 9 is a schematic flow chart of an ion cutting calibration method according to a second embodiment of the present invention.

Description of reference numerals:

1-a first calibration assembly;

2-a second calibration assembly;

3-a sample to be calibrated;

4-sample pallet;

41-a first fin;

42-a second fin;

5-primary calibration sample;

6-a baffle plate;

11-a base plate;

111-a first plane;

112-a second plane;

113-side;

12-a reference backup plate;

121-a first reference plane;

122-a second datum plane;

21-a first reference stage;

211-a bayonet joint;

212-a base;

2121-a first card slot;

213-a first rotating member;

2131-a second card slot;

2132-a rotating shaft of the first rotating member;

214-a second rotating member;

2141-a third card slot;

2142-a rotating shaft of the second rotating member;

2143-fasteners;

215-a chute;

2151-first end;

2152-second end;

216 — a first locking member;

217-a second locking element;

218-a guide post;

22-a second reference stage;

221-a clamping groove;

222-a base;

2221-a first adjustment member;

2222-a second adjustment member;

223-a fixed seat;

224-push plate.

Detailed Description

In order to make the objects, technical solutions and advantages of the present invention clearer, the technical solutions in the embodiments of the present invention will be described in more detail below with reference to the accompanying drawings in the preferred embodiments of the present invention. In the drawings, the same or similar reference numerals denote the same or similar components or components having the same or similar functions throughout. The described embodiments are only some, but not all embodiments of the invention. The embodiments described below with reference to the drawings are illustrative and intended to be illustrative of the invention and are not to be construed as limiting the invention. All other embodiments, which can be derived by a person skilled in the art from the embodiments given herein without making any creative effort, shall fall within the protection scope of the present invention. Embodiments of the present invention will be described in detail below with reference to the accompanying drawings.

In the present invention, unless otherwise explicitly specified or limited, terms such as "mounted," "connected," "fixed," and the like are to be construed broadly, and may for example be fixedly connected, detachably connected, or integrally formed; it can be mechanically coupled, directly coupled, indirectly coupled through intervening media, coupled between two elements, or coupled between two elements in a mutual relationship, unless expressly stated otherwise. The specific meanings of the above terms in the present invention can be understood by those skilled in the art according to specific situations.

Example one

Fig. 1 is a schematic structural diagram of a first calibration assembly of an ion cutting calibration apparatus according to an embodiment of the present invention. Fig. 2 is a schematic structural diagram of a second calibration assembly of the ion cutting calibration apparatus according to an embodiment of the present invention. Fig. 3 is a schematic structural diagram of a first reference stage in a second calibration assembly of an ion cutting calibration apparatus according to an embodiment of the present invention. Fig. 4 is a schematic structural diagram of a second reference stage in a second calibration assembly of the ion cutting calibration apparatus according to an embodiment of the present invention. Fig. 5 is a schematic structural diagram of a base and a first rotating member of a first reference stage in a second calibration assembly of the ion cutting calibration apparatus according to an embodiment of the present invention. Fig. 6 is a schematic structural diagram of a first rotating member and a second rotating member of a first reference stage in a second calibration assembly of an ion cutting calibration apparatus according to an embodiment of the present invention. Fig. 7 is a schematic structural diagram of a second rotating member and a sliding chute of a first reference stage in a second calibration assembly of an ion cutting calibration apparatus according to an embodiment of the present invention. Fig. 8 is a schematic structural diagram of a sample tray of an ion cutting calibration apparatus according to an embodiment of the present invention.

Referring to fig. 1 to 8, an embodiment of the present invention provides an ion cutting calibration apparatus for calibrating a sample loading of an ion cutting apparatus, including a first calibration component 1 and a second calibration component 2, where the first calibration component 1 has a first calibration surface, and the second calibration component 2 has a second calibration surface.

In actual use, the sample 3 to be calibrated and the sample pallet 4 are arranged on the first calibration face to adjust the position of the sample 3 to be calibrated on the sample pallet 4 and form an initial calibration sample 5.

Specifically, the sample support plate 4 is used for fixing the sample 3 to be calibrated, and the sample 3 to be calibrated is fixed on the bearing surface of the sample support plate 4 through a double-sided adhesive tape. The double-sided adhesive tape can be a conductive adhesive tape, and is beneficial to subsequent surface analysis tests, such as the scanning electron microscope.

Specifically, the sample support plate 4 is detachably connected to the first calibration surface of the first calibration assembly 1, and may be clamped, screwed, and the like, which is not limited by the present invention.

The structure of the first calibration assembly 1 includes, but is not limited to, the following two possible implementations: one possible implementation is: the first calibration assembly 1 comprises a base plate 11 and a reference backup plate 12 arranged on the base plate 11, wherein the side surface of the reference backup plate 12 is provided with two reference surfaces with different surface heights; the reference plane with the lower surface height is a first reference plane 121, the reference plane with the higher surface height is a second reference plane 122, the first reference plane 121 and the second reference plane 122 are connected through a connecting plane between the first reference plane 121 and the second reference plane 122, and the first reference plane 121 and the second reference plane 122 jointly form the first calibration plane;

in actual use, the sample 3 to be calibrated and the sample pallet 4 abut against the first reference surface 121 and the second reference surface 122, respectively, to adjust the position of the sample 3 to be calibrated on the sample pallet 4 and form the primary calibration sample 5.

Another possible implementation is: on the basis of the above embodiment, as shown in fig. 1, the surface of the bottom plate 11 may further have a first plane 111 and a second plane 112 having different heights, and the first plane 111 and the second plane 112 are connected by a side surface 113 therebetween.

When the reference back plate 12 is disposed on the base plate 11, the reference back plate 12 is located on the first plane 111 having a low height, and the first reference surface 121 abuts against the side surface 113. The sample pallet 4 is located on the second plane 112 with a high height, and the end of the sample pallet 4 on the side close to the reference backup plate 12 abuts against the first reference surface 121, and the end of the sample 3 to be calibrated on the side close to the reference backup plate 12 abuts against the second reference surface 122.

The two reference surfaces of the reference backup plate 12 are formed on the side surfaces on the side close to the second plane 112 based on the reference backup plate 12 being located on the first plane 111. Referring to fig. 1, the difference in surface height between the first reference surface 121 and the second reference surface 122 can be understood as the difference in distance between the first reference surface 121 and the second reference surface 112, i.e. the surface height of the first reference surface 121 is lower and the distance between the first reference surface and the second reference surface is smaller; the second reference plane 122 has a higher surface height and is spaced apart from the second plane 112 by a larger distance.

The connection plane between the first reference plane 121 and the second reference plane 122 may be in a horizontal plane, parallel to the first plane 111 and the second plane 112, to increase the accuracy of the position alignment of the sample 3 to be calibrated on the sample pallet 4.

It should be noted that, when the surface of the base plate 11 has the first plane 111 and the second plane 112 with different heights, the abutment of the sample 3 to be calibrated and the sample pallet 4 on the first reference plane 121 and the second reference plane 122 of the reference backup plate 12 is more stable, and the relative position adjustment of the primary calibration sample 5 and the baffle 6 of the ion cutting device is more accurate.

On the basis of the above embodiment, the sample 3 to be calibrated may also be measured by using a leveling instrument, such as a level, a total station, a theodolite, etc., and the specific type may be set according to the need, which is not limited in this embodiment.

In actual use, the primary calibration sample 5 is arranged on the second calibration surface, and the second calibration surface is arranged opposite to the baffle 6 of the ion cutting device, so as to adjust the relative position of the primary calibration sample 5 and the baffle 6 of the ion cutting device and form a calibration sample.

As shown in fig. 2, the second calibration assembly 2 includes a first reference table 21 and a second reference table 22 connected to the first reference table 21, and the second calibration surface is located on the first reference table 21.

Here, the first reference table 21 and the second reference table 22 may be detachably connected by a snap-in assembly, including but not limited to the following two possible implementations:

one possible implementation is: as shown in fig. 3 and 4, the engaging member includes a first engaging portion 211 located on the first reference table 21 and a second engaging groove 221 located on the second reference table 22, and when the first reference table 21 and the second reference table 22 are connected, the first engaging portion 211 on the first reference table 21 is engaged with the second engaging groove 221 on the second reference table 22.

Another possible implementation is: (not shown in the figures) the clamping assembly comprises a clamping head 211 positioned on the second reference table 22 and a clamping groove 221 positioned on the first reference table 21, and when the first reference table 21 and the second reference table 22 are connected, the clamping head 211 on the second reference table 22 is clamped in the clamping groove 221 on the first reference table 21.

It should be noted that the first reference table 21 and the second reference table 22 may be connected to the clamping head 211 or the clamping groove 221 of the clamping assembly by clamping, screwing, or welding, or may be connected by other detachable or non-detachable connection methods, which is not described herein again. When the detachable connection mode is used, the installation and maintenance of the components are facilitated, when one component is damaged, only the damaged component needs to be replaced, and other components do not need to be replaced. For example, when the card connector 211 is damaged, only the card connector 211 needs to be replaced, and the first reference table 21 or the second reference table 22 does not need to be replaced.

In addition, as shown in fig. 3, the first reference table 21 includes a base 212, the base 212 has a first cavity, a first rotating member 213 is disposed in the first cavity, a rotating shaft 2132 of the first rotating member is disposed in a first direction L1, a second cavity is disposed in the first rotating member 213, a second rotating member 214 is disposed in the second cavity, a rotating shaft 2142 of the second rotating member is disposed in a second direction L2, the first direction L1 and the second direction L2 are two directions perpendicular to each other in space, as shown in fig. 5, the first rotating member 213 rotates in a direction of a double-headed arrow marked by a dotted line, and as shown in fig. 6, the second rotating member 213 rotates in a direction of a double-headed arrow marked by a dotted line.

It should be noted that the upper surfaces of the base 212, the first rotating member 213 and the second rotating member 214 may be in the same horizontal plane, or may not be in the same horizontal plane, which is not limited in the present invention. For example, when the second rotating member 214 is in the initial state, the upper surface thereof may be flush with the upper surface of the first rotating member 213, or may be slightly lower or higher than the upper surface of the first rotating member 213. When the upper surface of the second rotating member 214 is slightly lower than the upper surface of the first rotating member 213, the space is saved.

As an alternative embodiment, the base 212 may be composed of two mechanisms connected by the guiding column 218, the mechanism near the baffle 6 in the base 212 is fixed relative to the baffle 6, the mechanism far from the baffle 6 in the base 212 moves along the guiding column 218 in the direction near the baffle 6, and the guiding column 218 functions as a translational sliding rail.

It should be noted that a first locking slot 2121 is correspondingly disposed between the base 212 and the first rotating member 213, the first locking slot 2121 is used for limiting a direction moving range of the first rotating member 213 in the first cavity of the base 212, the first locking slot 2121 limits that the first rotating member 213 can only rotate along the rotating shaft 2132 of the first rotating member in the first direction L1 in the first cavity of the base 212, a second locking slot 2131 is correspondingly disposed between the first rotating member 213 and the second rotating member 214, the second locking slot 2131 is used for limiting a direction moving range of the second rotating member 214 in the second cavity of the first rotating member 213, and the second locking slot 2131 limits that the second rotating member 214 can only rotate along the rotating shaft 2142 of the second rotating member in the second direction L2 in the second cavity of the first rotating member 213.

As shown in fig. 6, the second rotating member 214 has a slide groove 215 extending in the first direction L1, a notch of the slide groove 215 is disposed opposite to the blocking plate 6, the sample holder 4 is located in the slide groove 215, and the preliminary calibration sample 5 connected to the sample holder 4 is exposed to the outside of the slide groove 215 through the notch and is disposed opposite to the blocking plate 6 in the second direction L2.

It should be noted that the sliding groove 215 may be a U-shaped long circular hole-shaped groove, or may be a sliding groove with other shapes, which is not limited in the present invention.

It should be noted that a third card slot 2141 is correspondingly arranged between the second rotating member 214 and the sample holding plate 4, the sample holding plate 4 has a first fin 41 and a second fin 42 which are oppositely arranged, the first fin 41 is used for matching with the sliding slot 215, the second fin 42 is used for matching with the third card slot 2141, the first fin 41 and the second fin 42 are used for limiting the direction moving range of the sample holding plate 4 in the second rotating member 214, and limiting the sample holding plate 4 to only slide along the extending direction of the sliding slot 215, that is, the sample holding plate 4 only can slide in the first direction L1 relative to the second rotating member 214, which plays a role of preventing sliding displacement, thereby ensuring the stability of relative sliding.

Specifically, the primary calibration sample 5 is arranged on the first reference table 21 of the second calibration assembly, the sample support plate 4 is detachably connected with the second reference surface on the first reference table 21 through the fastener 2143, the pre-calibration sample 5 can be reciprocated towards the direction close to the baffle 6 or away from the baffle 6 by the adjusting base 212, in practical use, the base 212 is adjusted to make the front surface of the pre-calibration sample 5 close to the baffle 6, the pre-calibration sample 5 is rotated by the first rotating member 213 along the rotating shaft 2132 of the first rotating member located in the first direction L1 to make the front surface of the pre-calibration sample 5 parallel to the baffle 6, and the pre-calibration sample 5 is rotated by the second rotating member 214 along the rotating shaft 2142 of the second rotating member located in the second direction L2 to make the upper surface of the pre-calibration sample 5 parallel to the upper edge of the baffle 6 close to the pre-calibration sample 5, so that the accuracy of the calibration sample loading is improved.

In addition to the above-described embodiment, as shown in fig. 4, the second reference table 22 includes a base 222 and a fixing base 223 disposed opposite to the base 222, and the first reference table 21 is connected to the fixing base 223.

Wherein, a push plate 224 is disposed on one side of the base 222 close to the fixing seat 223, a first adjusting member 2221 for adjusting the position of the push plate 224 in the first direction L1 and a second adjusting member 2222 for adjusting the position of the push plate 224 in the second direction L2 are disposed on the base 222.

When the first reference table 21 is attached to the second reference table 22, the end of the push plate 224 is located at the first end 2151 of the slide slot 215 and abuts the sample pallet 4 within the slide slot 215 to urge the sample pallet 4 to slide back and forth between the oppositely located first and

second ends

2151 and 2152 of the slide slot 215.

It should be noted that, as shown in fig. 7, the first end 2151 and the second end 2152 of the sliding chute 215 are ends of two opposite positions in the extending direction of the sliding chute 215, and the extending direction of the sliding chute 215 is the second direction L2, i.e., the horizontal direction shown in fig. 2.

Specifically, the second regulating member 2222 is regulated so that the position of the push plate 224 in the second direction L2 is adjusted to maintain the same height of the push plate 224 as the sample blade 4, and the first regulating member 2221 is regulated so that the position of the push plate 224 in the first direction L1 is adjusted so that the push plate 224 just contacts the sample blade 4.

It should be noted that, just after the adjustment push plate 224 is in contact with the sample pad 4, the fastening member 2143 between the sample pad 4 and the second reference surface on the first reference stage needs to be loosened, so that when the first adjustment member 2222 is adjusted again, the position of the push plate 224 in the first direction L1 is adjusted to push the sample pad 4 to move in the first direction L1, so that the pre-calibration sample 5 is exposed to the minimum height of the baffle 6 in the first direction L1, thereby forming the calibration sample.

It should be noted that the difference in hardness between the sample components and the difference in morphology of the initial face are the main factors that cause ion scratches. For example, when the sample is a porous heterogeneous sample, ion scratches are easily generated, which may be due to the fact that the ion beam is not blocked as it passes through the aperture, as if it passes through a vacuum space. The ion beam directly acts on the hole wall of the hole, the cutting depth of the back side of the hole is larger relative to the periphery of the hole, the depth is different, obvious ion scratches are generated on the back side of the hole, and the accuracy of subsequent surface analysis and test can be influenced by the ion scratches.

In this embodiment, the front surface of the pre-calibration sample 5 is parallel to the baffle 6 by adjusting the first rotating member 213, and then the base is adjusted to move towards the direction close to the baffle 6, so that the front surface of the pre-calibration sample 5 can be tightly attached to the baffle 6, and therefore the generation of ion scratches on the cutting surface in the subsequent cutting process is avoided.

In addition, in the present embodiment, the second rotating member 214 is adjusted to make the upper surface of the pre-calibration sample 5 parallel to the upper edge of the baffle 6 close to the pre-calibration sample 5, and the first adjusting member 2222 is adjusted to make the pre-calibration sample 5 exposed to the minimum height of the baffle 6 in the first direction L1, so that the ion cutting time is greatly shortened, and the ion cutting efficiency is greatly improved.

As an alternative embodiment, a plurality of locking members are further provided on the base 212; as shown in fig. 5, at least one first locking member 216 for locking the rotational position of the first rotating member 213 in the base 212 is disposed between the base 212 and the first rotating member 213; at least one second locking member 217 for locking the rotational position of the second rotating member 214 in the first rotating member 213 is disposed between the first rotating member 213 and the second rotating member 214.

Specifically, as shown in fig. 5, the base 212 has at least one recessed area (for example, one area) adjacent to the first rotating member 213 for correspondingly disposing the first locking member 216, wherein the first rotating member has a thin edge extending to the base 212 in the recessed area, and the first locking member 216 is used for locking the thin edge in the recessed area, thereby locking the rotating position of the first rotating member 213 in the base 212.

As shown in fig. 6, the first rotating member 213 has at least one concave area (two are shown as an example) adjacent to the second rotating member 214 for correspondingly disposing the second locking member 217, wherein the second rotating member has a thin edge extending to the first rotating member 213 in the concave area, and the second locking member 217 is used for locking the thin edge in the concave area, thereby locking the rotating position of the second rotating member 214 in the first rotating member 213.

In order to achieve independent up-and-down movement of the sample pallet 4 in the extending direction of the sliding groove 215, an elastic member (not shown in the figure) may be correspondingly disposed between each sliding groove 215 and the sample pallet 4, and the elastic member is used to provide an elastic force for the corresponding sample pallet 4 to move in the direction of the push plate 224. Thus, the sample pallet 4 can slide back and forth in the slide groove 215 under the combined action of the pushing force of the push plate 224 and the elastic restoring force of the elastic member. When the push plate 224 is removed, the sample pallet 4 is ejected in the direction of the push plate 224 by the elastic force of the elastic member and returns to the original position.

For example, after the fastening member 2143 between the sample pallet 4 and the second reference surface on the first reference table 21 is loosened, the pushing plate 224 pushes the sample pallet 4 to move up and down along the extending direction of the sliding slot 215, and when the pushing plate 224 pushes the sample pallet 4 to slide in the direction from the first end 2151 to the second end 2152 of the opposite position of the sliding slot 215, the elastic member will be compressed to be in a compressed state, if the position of the sample pallet 4 is adjusted excessively, only the first adjusting member 2221 on the base 222 of the second reference table 22 needs to be adjusted, so that the pushing plate 224 moves in the direction away from the sample pallet 4, and the sample pallet 4 can be automatically reset under the action of the elastic member without manual adjustment or adjustment of a corresponding adjusting member.

Alternatively, the resilient member may be generally a compression spring that is compressed as the sample holder 4 moves in the first direction L1 from the first end 2151 of the chute 215 to the second end 2152 of the chute, such that the resilient member exerts a spring force against the first end 2151 of the chute under the urging of the push plate 224 to return the sample holder 4 to the initial position.

Furthermore, at least one third locking member (not shown in the drawings) for locking the moving position of the sample pallet 4 within the slide groove 215 may be provided between the sample pallet 4 and the slide groove 215.

The number of the first locking member 216, the second locking member 217, and the third locking member may be one, two, or more, and the structures of the locking members may also be threaded members, etc., and the present embodiment does not limit the number of the locking members and the specific structures of the locking members, and is not limited to the above examples.

The ion cutting calibration device is used for sample calibration of the ion cutting device and comprises a first calibration assembly with a first calibration surface and a second calibration assembly with a second calibration surface. Adjusting the position of the sample to be calibrated on the sample supporting plate by arranging the sample to be calibrated and the sample supporting plate on the first calibration surface to form an initial calibration sample; through setting up the initial calibration sample on the face is calibrated to the second, the face is calibrated to the second sets up with ion cutting device's baffle relatively to the relative position of adjustment initial calibration sample and ion cutting device's baffle, with form calibration sample, improved the accuracy of calibration dress appearance, reduced the ion mar on calibration sample surface.

Example two

Fig. 9 is a schematic flow chart of an ion cutting calibration method according to a second embodiment of the present invention. As shown in fig. 9, on the basis of the first embodiment, a second embodiment of the present invention further provides an ion cutting calibration method, which is applied to the ion cutting calibration apparatus of the first embodiment, and includes:

s101: mounting a sample to be calibrated and a sample supporting plate on a first calibration surface of a first calibration assembly, adjusting the position of the sample to be calibrated on the sample supporting plate, and forming an initial calibration sample;

s102: and arranging the primary calibration sample on a second calibration surface of a second calibration component, wherein the second calibration surface is arranged opposite to the baffle plate of the ion cutting device, adjusting the relative position of the primary calibration sample and the baffle plate of the ion cutting device, and forming a calibration sample.

Wherein, step S101 specifically includes:

step S1011: the end part of the sample supporting plate, close to one side of the reference backup plate, is aligned with the first reference surface, and the sample supporting plate is detachably fixed on the bottom plate;

step S1012: and aligning the end part of the sample to be calibrated, which is close to one side of the reference backup plate, with the second reference surface, and fixing the sample to be calibrated on the sample supporting plate to form an initial calibration sample.

Wherein, step S102 specifically includes:

step S1021: after the primary calibration sample is taken down from the bottom plate, the primary calibration sample is installed on a second calibration surface of the second calibration component through a fastener, and the top surface of the primary calibration sample is basically flush with the top surface of the baffle;

step S1022: adjusting the base on the first reference table to enable the front surface of the primary calibration sample to be close to the baffle;

step S1023: adjusting a first rotating piece on the first reference table to enable the front surface of the primary calibration sample to be relatively parallel to the baffle, and then adjusting a first locking piece to lock the first rotating piece in the base so that the first rotating piece cannot rotate relatively;

step S1024: adjusting the base on the first reference table again to enable the front surface of the primary calibration sample to be aligned with the baffle;

step S1025: adjusting a second rotating part on the first reference platform to enable the upper surface of the primary calibration sample to be parallel to the upper edge of the contact between the baffle and the primary calibration sample, and then adjusting a second locking part to lock the second rotating part in the first rotating part so that the second rotating part cannot rotate relatively;

step S1026: adjusting a second adjusting piece on a base of a second reference table to enable the push plate and the sample supporting plate to be at the same height;

step S1027: adjusting a first adjusting piece on a base of the second reference table to enable the sample supporting plate to be contacted with the push plate, and then loosening a fastening piece between the sample supporting plate and a second reference surface on the first reference table;

step S1028: and adjusting the first adjusting piece on the base of the second reference table to expose the initial calibration sample to the minimum height relative to the baffle, and locking the relative positions of the sample supporting plate and the sliding groove by using a third locking piece to form the calibration sample.

It should be noted that at least part of the steps included in the above step S102 need to be completed by means of the high-ploidy view mirror. Specifically, the scope may be a scope having a magnification of 60 times or more.

The ion cutting calibration method provided by the embodiment of the invention comprises the steps of installing a sample to be calibrated and a sample supporting plate on a first calibration surface of a first calibration assembly, adjusting the position of the sample to be calibrated on the sample supporting plate, and forming an initial calibration sample; the primary calibration sample is arranged on the second calibration surface of the second calibration component, the second calibration surface is arranged opposite to the baffle of the ion cutting device, the relative position of the primary calibration sample and the baffle of the ion cutting device is adjusted, the calibration sample is formed, the accuracy of the calibration sample loading is improved, and the ion scratches on the surface of the calibration sample are reduced.

EXAMPLE III

On the basis of the first embodiment and the second embodiment, a third embodiment of the present invention further provides an ion cutting device, which includes an ion generator, a baffle 6, and the ion cutting calibration device in the first embodiment;

the sample 3 to be calibrated and the sample supporting plate 4 are arranged on the ion cutting calibration device, the baffle 6 is positioned between the sample 3 to be calibrated and the ionizer, and the ion emitting end of the ionizer faces the baffle 6 and the sample 3 to be calibrated.

The ion generator generates an ion beam for cutting, the ion cutting calibration device is used for fixing a calibrated sample, and the baffle 6 is used for shielding the ion beam emitted by the ion generator to the sample, so that a sample cutting surface formed after the ion beam is cut is a plane.

The baffle 6 may be disposed vertically or obliquely relative to the second calibration surface of the ion cutting calibration device. When the baffle 6 sets up when inclining relatively, when baffle 6 and calibration sample 5 laminating, only need with baffle 6 be close to treat calibration sample 5 the leading edge with treat calibration sample 5 laminate completely can, need not to guarantee that whole front surface and treat calibration sample 5 laminate completely, reduced the calibration error because of treating the surface unevenness and lead to of calibration sample 5.

In addition, the ion generator in the ion cutting apparatus provided in the present embodiment may be any type of ion generator, and for example, may be an argon ion generator or the like. The present embodiment does not impose any limitation on the type of ionizer, nor is it limited to the above examples.

It should be noted that the cutting device may include all of the ion cutting calibration device in the first embodiment, or may include only the first reference stage in the second calibration component of the ion cutting calibration device, and is used in cooperation with the ion cutting calibration device, which is not limited in this respect.

The related technical features of the ion cutting calibration apparatus are the same as those of the first embodiment or the second embodiment, and the same technical effects can be achieved, which are not described in detail herein.

The ion cutting device provided by the third embodiment of the invention comprises an ion generator, a baffle and the ion cutting calibrating device in the first embodiment, the sample to be calibrated and the sample supporting plate are arranged on the ion cutting calibrating device, the baffle is positioned between the sample to be calibrated and the ion generator, the ion emitting end of the ion generator faces the baffle and the sample to be calibrated, and the sample is calibrated by the ion cutting calibrating device, so that the accuracy of calibrating and loading the sample is improved, the ion scratches on the surface of the calibrated sample are reduced, the time for subsequently using the ion cutting device to cut ions is shortened, and the efficiency is improved.

In the description of the above embodiments, it is to be understood that the terms "center", "longitudinal", "lateral", "front", "rear", "left", "right", "vertical", "horizontal", "top", "bottom", "inner", "outer", etc. indicate orientations or positional relationships based on those shown in the drawings, and are only for convenience of describing the embodiments and simplifying the description, but do not indicate or imply that the referred devices or components must have a specific orientation, be constructed in a specific orientation, and be operated, and thus, should not be construed as limiting the scope of the present embodiments.

Furthermore, the terms "first" and "second" are used for descriptive purposes only and are not to be construed as indicating or implying relative importance or implicitly indicating the number of technical features indicated. Thus, a feature defined as "first" or "second" may explicitly or implicitly include at least one of the feature. In the description of the present invention, "a plurality" means at least two, e.g., two, three, etc., unless specifically limited otherwise.

In the description of the present invention, it is to be understood that the description of the terms "some embodiments" or the like is intended to mean that a particular feature, structure, material, or characteristic described in connection with the embodiments or examples is included in at least one embodiment or example of the invention. In this specification, the schematic representations of the terms used above are not necessarily intended to refer to the same embodiment or example. Furthermore, the particular features, structures, materials, or characteristics described may be combined in any suitable manner in any one or more embodiments or examples. Furthermore, various embodiments or examples described in this specification can be combined and combined by those skilled in the art.

Finally, it should be noted that: the above embodiments are only used to illustrate the technical solution of the present invention, and not to limit the same; while the invention has been described in detail and with reference to the foregoing embodiments, it will be understood by those skilled in the art that: the technical solutions described in the foregoing embodiments may still be modified, or some or all of the technical features may be equivalently replaced; and the modifications or the substitutions do not make the essence of the corresponding technical solutions depart from the scope of the technical solutions of the embodiments of the present invention.

Claims

1. An ion cutting calibration device is used for sample calibration of the ion cutting device and is characterized by comprising a first calibration component and a second calibration component, wherein the first calibration component is provided with a first calibration surface, and the second calibration component is provided with a second calibration surface;

a sample to be calibrated and a sample supporting plate are arranged on the first calibration surface so as to adjust the position of the sample to be calibrated on the sample supporting plate and form an initial calibration sample;

the primary calibration sample is arranged on the second calibration surface, and the second calibration surface is arranged opposite to the baffle plate of the ion cutting device so as to adjust the relative positions of the primary calibration sample and the baffle plate of the ion cutting device and form a calibration sample;

the first calibration assembly comprises a bottom plate and a reference backup plate arranged on the bottom plate, wherein the side surface of the reference backup plate is provided with two reference surfaces with different surface heights;

2. The ion cutting calibration device of claim 1, wherein the surface of the base plate has first and second planes of different heights, the first and second planes being connected by a side surface therebetween;

3. The ion cutting calibration apparatus of claim 2, wherein the second calibration assembly comprises a first reference stage and a second reference stage coupled to the first reference stage, the second calibration surface being located on the first reference stage.

4. The ion cutting calibration device of claim 3, wherein the first and second reference stages are connected by a snap assembly comprising a snap head on one of the first and second reference stages and a snap groove on the other of the first and second reference stages, the snap head snap fitting into the snap groove when the first and second reference stages are connected.

5. The ion cutting calibration device of claim 4, wherein the first reference stage comprises a base;

the base is provided with a first cavity, a first rotating piece is arranged in the first cavity, and a rotating shaft of the first rotating piece is positioned in a first direction; a second cavity is arranged in the first rotating part, a second rotating part is arranged in the second cavity, a rotating shaft of the second rotating part is positioned in a second direction, and the first direction and the second direction are two directions which are perpendicular to each other in space;

6. The ion cutting calibration device of claim 5, wherein the second reference stage comprises a base and a fixed base disposed opposite the base, the first reference stage being connected to the fixed base;

a push plate is arranged on one side, close to the fixed seat, of the base, and a first adjusting piece for adjusting the position of the push plate in the first direction and a second adjusting piece for adjusting the position of the push plate in the second direction are arranged on the base;

7. The ion cutting calibration device of claim 6, wherein a plurality of locking members are provided on the base; at least one first locking piece for locking the rotating position of the first rotating piece in the base is arranged between the base and the first rotating piece; at least one second locking piece for locking the rotating position of the second rotating piece in the first rotating piece is arranged between the first rotating piece and the second rotating piece;

8. An ion cutting calibration method applied to the ion cutting calibration device according to any one of claims 1 to 7, comprising:

mounting a sample to be calibrated and a sample supporting plate on a first calibration surface of a first calibration assembly, adjusting the position of the sample to be calibrated on the sample supporting plate, and forming an initial calibration sample;

9. An ion cutting device, comprising an ion generator, a baffle plate, and the ion cutting calibration device of any one of claims 1 to 7;