CN115229317B

CN115229317B - Multi-shaft ion cutting sample loading device

Info

Publication number: CN115229317B
Application number: CN202211149002.8A
Authority: CN
Inventors: 杜忠明; 杨继进
Original assignee: Beiguang Technology Suzhou Co ltd
Current assignee: Beiguang Technology Suzhou Co ltd
Priority date: 2022-09-21
Filing date: 2022-09-21
Publication date: 2022-12-23
Anticipated expiration: 2042-09-21
Also published as: CN115229317A

Abstract

The invention relates to the technical field of polishing, in particular to a multi-axis ion cutting sample loading device, and aims to solve the problems of poor calibration sample loading precision and low efficiency. The ion cutting table comprises a sample support, an ion beam shielding mechanism, a first rotating mechanism, a vertical moving mechanism, a second rotating mechanism and a horizontal moving mechanism; the sample holder is used for bearing a sample; the ion beam shielding mechanism comprises an ion beam shielding plate, the ion beam shielding plate and the sample support are arranged oppositely, the first rotating mechanism comprises a first rotating table, and the sample support is clamped on the first rotating table; the axis of the first rotating platform is horizontally arranged and is configured to rotate around the axis of the first rotating platform; the vertical moving mechanism comprises a vertical moving slide block; the second rotating mechanism comprises a second rotating table; the horizontal movement mechanism includes a horizontal movement slider. The invention realizes the angle and position adjustment of the sample by the matching of each rotating mechanism and each moving mechanism, and each mechanism is convenient and fast to adjust and compact in structure, thereby greatly improving the efficiency and the precision of calibration.

Description

Multi-shaft ion cutting sample loading device

Technical Field

The invention relates to the technical field of polishing, in particular to a multi-axis ion cutting sample loading device.

Background

The argon ion polishing system is a surface treatment device for section preparation and plane polishing of a sample, is widely applied to sample surface treatment in the early stage of analysis and test of the surfaces of materials, semiconductor devices, rocks and minerals, provides a sample without foreign matter intervention, with a real structure and a flat surface for analysis and test, and the flat sample surface is favorable for observation and analysis, so that the accuracy and the efficiency of the surface analysis and test are improved; the surface analysis test includes, but is not limited to, analysis tests such as scanning electron microscope, electron probe, ion probe, EBSD, and the like. The ion polishing comprises the ion cutting of an ion beam baffle plate, wherein the ion beam baffle plate is positioned in front of the bearing surface of the sample table during the cutting and is used for covering the sample, so that the covered part of the sample is not cut by the argon ion beam. The part of the sample slightly higher than the ion beam baffle plate is the cut part of the sample, and the surface of the cut part of the sample, which is in contact with the argon ions, is an ion bombardment surface. The argon ion beam continuously bombards the ion bombarding surface of the sample, so that the sample positioned on the ion bombarding surface is continuously removed, and then the ion bombarding surface continuously sinks from the side surface of the sample until the top surface of the sample forms a flat sample cutting surface. Therefore, accurate sample loading has great influence on the cutting effect of the ions.

In the prior art, the bottom surface of a sample is usually adhered to a sample holder by double-sided adhesive, so that one side surface of the sample is aligned with a reference backup plate, then the sample holder is transferred to a three-axis translation table, and the vertical, front, rear, left and right positions of the sample are adjusted by the three-axis translation table, so that the sample is tightly attached to a baffle plate and a part needing ion cutting is exposed. The multiaxial ion cutting sample loading device provided by the patent with the publication number of CN110605467B provides up-and-down, left-and-right displacement and angular rotation to a sample, but a push plate directly contacts with a sample holder, so that the position of the sample holder is easy to change. The method has the advantages that the calibration sample loading is not accurate enough, the calibration efficiency is low, and the sample support can be contacted in the adjustment process, so that the position of the sample is changed, and the calibration precision is influenced.

Disclosure of Invention

The invention aims to provide a multi-axis ion cutting sample loading device to solve the problems of poor calibration sample loading precision and low efficiency.

In order to solve the technical problems, the technical scheme provided by the invention is as follows:

a multi-axis ion cutting sample loading device comprises an ion cutting table, wherein the ion cutting table comprises a sample holder, an ion beam shielding mechanism, a first rotating mechanism, a vertical moving mechanism, a second rotating mechanism, a horizontal moving mechanism and a base; the ion beam shielding mechanism comprises an ion beam shielding plate, the ion beam shielding plate is arranged opposite to the sample support, and the sample is arranged on one side of the sample support close to the ion beam shielding plate; the first rotating mechanism comprises a first rotating table, and the sample support is clamped on the first rotating table; the first rotating platform rotates around a first axis, and the first axis is horizontal; the vertical moving mechanism comprises a vertical moving sliding block, and the vertical moving sliding block is connected to the first rotating table and used for driving the first rotating table to move in the vertical direction; the second rotating mechanism comprises a second rotating platform, and the vertical moving sliding block is arranged on the second rotating platform and is in sliding connection with the second rotating platform; the second rotating table rotates around a second axis, and the second axis is vertical; the horizontal moving mechanism comprises a horizontal moving sliding block, and the second rotating table is installed on the horizontal moving sliding block; the horizontal moving slide block is used for driving the second rotating table to move towards the direction close to or far away from the ion beam shielding plate in the horizontal plane; the ion beam shielding mechanism and the horizontal moving sliding block are arranged on the base.

Further, the vertical moving mechanism further comprises a vertical rotating knob; the vertical rotating knob is connected with the vertical moving sliding block and abutted against the first rotating table and is configured to push the first rotating table to rotate around the axis of the first rotating table; the horizontal moving mechanism also comprises a second rotating knob; the second rotary knob is connected with the horizontal moving slide block and abutted against the second rotary table and is configured to push the second rotary table to rotate around the axis of the second rotary table.

Further, the vertical moving mechanism further comprises a vertical rotating return spring; the vertical rotation reset spring is connected with the vertical moving slide block and abutted against the first rotating table, and is configured to push the first rotating table to rotate around the axis of the first rotating table, and the rotating direction is opposite to the pushing direction of the vertical rotation knob; the horizontal moving mechanism also comprises a second rotary return spring; the second rotary reset spring is connected with the horizontal moving sliding block and abutted against the second rotary table, and is configured to push the second rotary table to rotate around the axis of the second rotary table, and the rotating direction is opposite to the pushing direction of the second rotary knob.

Further, the vertical moving mechanism further comprises a vertical moving guide rail and a vertical moving return spring; the vertical moving slide block is sleeved on the vertical moving guide rail and moves along the vertical moving guide rail; the vertical moving reset spring is sleeved on the vertical moving guide rail, one end of the vertical moving reset spring abuts against the vertical moving sliding block, and the other end of the vertical moving reset spring abuts against the second rotating table and is configured to apply thrust to the vertical moving sliding block; the horizontal moving mechanism also comprises a horizontal moving guide rail and a horizontal moving return spring; the horizontal moving slide block is sleeved on the horizontal moving guide rail and moves along the horizontal moving guide rail; the horizontal movement return spring is sleeved on the horizontal movement guide rail, one end of the horizontal movement return spring is abutted to the base, the other end of the horizontal movement return spring is abutted to the horizontal movement sliding block, and the horizontal movement return spring is configured to apply thrust to the horizontal movement sliding block.

Further, the vertical moving mechanism also comprises a vertical moving screw rod, the vertical moving screw rod is parallel to the vertical moving guide rail and is in threaded connection with the vertical moving slide block, and the vertical moving screw rod is inserted into the second rotating table; the horizontal movement mechanism further includes a horizontal movement screw parallel to the horizontal movement guide rail and abutting against the horizontal movement slider, and configured to apply a thrust to the horizontal movement slider in a direction opposite to a thrust applied to the horizontal movement slider by the horizontal movement return spring.

Further, the first rotating mechanism further comprises a spring plunger; the spring plunger is inserted in the first rotating platform and is parallel to the axis of the first rotating platform; the spring plunger is configured to be insertable into the sample holder.

Furthermore, the multi-shaft ion cutting sample loading device also comprises a turnover table; the overturning platform comprises an overturning plate, and the base is arranged on the overturning plate; the turnover plate is configured to drive the ion cutting table to swing from a horizontal state to a vertical state; in the vertical state, the ion beam shielding plate is positioned above the sample support.

Furthermore, the overturning platform also comprises two adapter pieces positioned on two sides of the overturning plate, and each adapter piece comprises a bearing seat and a rotating shaft; one end of the rotating shaft is connected with the turnover plate, and the other end of the rotating shaft is inserted in the bearing seat and is rotationally connected with the bearing seat.

Furthermore, the overturning platform further comprises a telescopic arm, the telescopic arm is located between the two adapter pieces, and the telescopic end of the telescopic arm is hinged to the overturning plate.

Further, a first boss is arranged on the base, and a first clamping groove is formed in the turnover plate; the first boss is clamped in the first clamping groove.

By combining the technical scheme, the invention has the technical effects that:

1. the ion cutting table carries out the omnidirectional adjustment through first rotary mechanism, vertical moving mechanism, second rotary mechanism and horizontal migration mechanism to the sample, the relative position relation of adjustment sample that can be nimble quick and ion beam shielding plate, the top surface of guaranteeing the sample is parallel to each other with the top surface of ion beam shielding plate in horizontal plane and vertical face, and it is reasonable to ensure that the sample exceeds the size of ion beam shielding plate in vertical plane, level and smooth in order to guarantee the cutting plane, the cutting volume is appropriate, calibration efficiency and calibration accuracy have been promoted.

2. The ion cutting table makes the first revolving stage atress and drives the sample support and accomplish the adjustment of angle and position through holding in the palm the joint with the sample on first revolving stage, has avoided directly holding in the palm the application of force to the sample, prevents that the sample from holding in the palm and taking place to warp or the skew in position because of the atress, has further guaranteed the calibration accuracy. Particularly, when the horizontal distance and the vertical height between the sample holder and the ion beam shielding plate are adjusted, if a pushing force is directly applied to the sample holder, the sample holder is more likely to be displaced, a gap is generated between the sample holder and the first rotating table, and the calibration accuracy is reduced. Meanwhile, the integrated design of the ion cutting table shortens the distance between each moving mechanism, reduces the deformation and the error caused by factors such as the structural length, the cantilever and the like, and further improves the precision.

3. The position relation between the sample and the ion beam shielding plate in the vertical plane and the horizontal plane can be observed by only one microscope through the overturning platform. Setting the microscope to be downward for observation, and observing whether the projection lines of the sample and the ion beam shielding plate in the horizontal plane are parallel and whether the distance is proper when the ion cutting table is horizontal, and adjusting the projection lines through a corresponding second rotating mechanism and a corresponding horizontal moving mechanism; when the ion cutting table is vertically arranged, whether the projection of the sample and the ion beam shielding plate in a vertical plane is parallel or not and whether the size of the sample higher than the ion beam shielding plate is proper or not can be observed, and the adjustment is carried out through the corresponding first rotating mechanism and the corresponding vertical moving mechanism. The microscope can observe two mutually perpendicular directions by arranging the overturning platform, so that the arrangement of the microscope is reduced, the equipment cost is reduced, refocusing in the direction changing process can be avoided, and the calibration efficiency is improved.

4. The ion cutting table is compact in structure through the integrated design of the first rotating mechanism, the vertical moving mechanism, the second rotating mechanism and the horizontal moving mechanism, the space occupation is reduced, the ion cutting table is convenient to be matched with the overturning table, the connection between all movable components is tighter, the influence of factors such as vibration and the like on the device is smaller, and the precision is favorably improved.

Drawings

In order to more clearly illustrate the embodiments of the present invention or the technical solutions in the prior art, the drawings used in the description of the embodiments or the prior art will be briefly described below, and it is obvious that the drawings in the following description are some embodiments of the present invention, and other drawings can be obtained by those skilled in the art without creative efforts.

Fig. 1 is a schematic structural diagram of a multi-axis ion cutting and sample loading device according to an embodiment of the present invention;

FIG. 2 is a schematic diagram of an ion cutting table;

FIG. 3 is a schematic view of a base structure;

FIG. 4 is a schematic view of a first rotating mechanism;

FIG. 5 is a schematic view of a vertical movement mechanism and a second rotation mechanism;

FIG. 6 is a schematic view of a horizontal movement mechanism;

FIG. 7 is a schematic view of an ion beam shielding mechanism;

FIG. 8 is a schematic view of a sample holder structure;

FIG. 9 is a schematic structural view of the flipping table;

FIG. 10 is another schematic view of the flipping table;

FIG. 11 is a schematic structural view of an adapter;

fig. 12 is a cross-sectional view of the flipping panel.

Icon: 10-an ion cutting table; 20-overturning the platform; 100-sample holder; a 110-T shaped projection; 120-positioning holes; 200-an ion beam shielding mechanism; 210-ion beam shutter; 220-shutter limit bracket; 300-a first rotation mechanism; 310-a first rotating table; 320-a spring plunger; 311-T-shaped grooves; 312-a first rotational reset projection; 313 — a first rotating flange; 400-a vertical movement mechanism; 410-vertically moving the slider; 420-vertical rotation knob; 430-vertical rotation return spring; 440-a first rotating fixed plate; 450-a vertical movement guide; 460-vertically moving the return spring; 411 — first rotary chute; 412-vertical movement knob mounting hole; 510-a second rotating table; 511-a second rotary reset protrusion; 512-a second rotating flange; 610-horizontally moving the slider; 620-a second rotation knob; 630-a second rotary return spring; 640-a second rotating fixed plate; 650-horizontal movement guide; 660-horizontally moving a return spring; 611-a second rotary chute; 612-horizontal rail connection protrusions; 700-a base; 710-a first boss; 720-guide rail support columns; 730-a limit pressure plate; 740-supporting a vertical plate; 750-horizontally moving knob mounting holes; 21-turning over the board; 22-a support frame; 23-a telescopic arm; 24-an adaptor; 25-a locking nut; 26-a locking screw; 21 a-a first card slot; 21 b-positioning bosses; 21 c-avoiding grooves; 22 a-horizontal limiting plate; 22 b-vertical limiting plate; 22 c-upright post; 22 d-a bottom plate; 22 e-a transverse plate; 24 a-a bearing seat; 24 b-a rotation axis; 24 c-connecting arm.

Detailed Description

In order to make the objects, technical solutions and advantages of the embodiments of the present invention clearer, the technical solutions in the embodiments of the present invention will be clearly and completely described below with reference to the drawings in the embodiments of the present invention, and it is obvious that the described embodiments are some, but not all, embodiments of the present invention. The components of embodiments of the present invention generally described and illustrated in the figures herein may be arranged and designed in a wide variety of different configurations.

Thus, the following detailed description of the embodiments of the present invention, presented in the figures, is not intended to limit the scope of the invention, as claimed, but is merely representative of selected embodiments of the invention. All other embodiments, which can be obtained by a person skilled in the art without inventive step based on the embodiments of the present invention, are within the scope of protection of the present invention.

Some embodiments of the invention are described in detail below with reference to the accompanying drawings. The embodiments described below and the features of the embodiments can be combined with each other without conflict.

The existing calibration sample loading method is not accurate enough, the relative position relation between a sample and an ion beam baffle plate is not convenient to observe during use, the calibration efficiency is low, and the sample support can be contacted in the adjustment process, so that the position of the sample is changed, and the calibration precision is influenced.

In view of this, the present invention provides a multi-axis ion cutting sample loading apparatus, which includes an ion cutting table 10 and a flipping table 20, wherein the ion cutting table 10 includes a sample holder 100, an ion beam shielding mechanism 200, a first rotating mechanism 300, a vertical moving mechanism 400, a second rotating mechanism, a horizontal moving mechanism, and a base 700, so as to improve the observation effect and improve the accuracy and efficiency of calibration.

The structure and shape of the multi-axis ion cutting sample loading device provided in this embodiment are described in detail below with reference to fig. 1 to 11:

in an alternative of the present embodiment, the ion beam blocking mechanism 200 includes an ion beam blocking plate 210 and a blocking plate stopper holder 220. As shown in fig. 2 and 7, the ion beam shielding plate 210 is inserted into the shielding plate limiting bracket 220 and is disposed obliquely, and the top surface of the ion beam shielding plate 210 is disposed horizontally to shield the ion beam, so as to protect the part of the sample that does not need to be cut. Specifically, a dovetail groove is formed in the shielding plate limiting bracket 220, and the ion beam shielding plate 210 is inserted into the dovetail groove to ensure that the ion beam shielding plate 210 is firmly positioned on the shielding plate limiting bracket 220.

Further, the ion beam shielding plate 210 and the shielding plate limiting bracket 220 are connected by a countersunk screw, so that the ion beam shielding plate 210 is prevented from moving along the length direction of the dovetail groove.

In an alternative embodiment, the sample holder 100 is vertically disposed, and the sample is adhered to a side of the sample holder 100 close to the ion beam shielding plate 210.

In this embodiment, the first rotation mechanism 300 includes a first rotation stage 310 and a spring plunger 320. As shown in fig. 2 and 4, the first rotating platform 310 is fan-shaped, and has a shaft hole at the center of the circle, and is configured to rotate around the axis of the shaft hole, and the axis of the shaft hole is horizontally arranged, so as to drive the sample to swing in the vertical plane, and adjust the parallel state of the projection lines of the sample and the ion beam shielding plate 210 in the vertical plane. The spring plunger 320 is inserted into the first rotating platform 310 and the axis of the spring plunger 320 is parallel to the axis of the shaft hole.

In order to lock the sample holder 100 on the first rotating platform 310, the first rotating platform 310 is provided with a T-shaped groove 311, and the sample holder 100 is correspondingly provided with a T-shaped protrusion 110, as shown in fig. 8, in a normal state, the T-shaped groove 311 is vertically arranged, and when in use, the angle adjustment is performed according to the state of the sample. The T-shaped protrusion 110 is inserted into the T-shaped groove 311 to realize positioning, meanwhile, the sample holder 100 is provided with the positioning hole 120, and the end of the spring plunger 320 is inserted into the positioning hole 120, so that the T-shaped protrusion 110 is prevented from moving along the T-shaped groove 311. It will be apparent that the end of the spring plunger 320 protrudes beyond the mating surface of the T-shaped recess 311 and the T-shaped projection 110.

In this embodiment, the vertical moving mechanism 400 includes a vertical moving slider 410, a vertical rotating knob 420, a vertical rotating return spring 430, and a first rotation fixing plate 440. As shown in fig. 2 and 5, a semicircular groove is formed on the vertical moving slider 410, the first rotating platform 310 is disposed in the semicircular groove, and the vertical moving slider 410 drives the first rotating platform 310 to move in the vertical direction. The shaft hole of the first rotating platform 310 is inserted with a rotating shaft, and the rotating shaft is inserted in the vertically moving sliding block 410 at the same time. The vertical moving block 410 is provided with a first rotating chute 411, the first rotating chute 411 is coaxial with the semicircular groove and communicated with the semicircular groove, correspondingly, as shown in fig. 4, the outer edge of the first rotating platform 310 is provided with a first rotating flange 313, and the first rotating flange 313 is inserted into the first rotating chute 411 to guide and limit the rotation of the first rotating platform 310, so as to prevent the first rotating platform 310 from shaking and ensure the adjustment precision.

Further, the first rotation fixing plate 440 is connected to the vertical movement sliding block 410, the vertical rotation knob 420 is installed on the first rotation fixing plate 440, an axis of the vertical rotation knob 420 is vertically disposed, and one end of the vertical rotation knob 420 abuts against the first rotation stage 310, so that the first rotation stage 310 is pushed to rotate by adjusting the vertical rotation knob 420. Specifically, the vertical rotation knob 420 is screw-coupled to the first rotation fixing plate 440.

A vertical rotation reset groove is formed in the vertical moving slider 410, a vertical rotation reset spring 430 is arranged in the vertical rotation reset groove, and correspondingly, a first rotation reset protrusion 312 is arranged on the first rotating platform 310. The vertical rotation return spring 430 has an axis parallel to an axis of the vertical rotation knob 420, and one end of the vertical rotation return spring 430 abuts against the vertical moving slider 410 and the other end abuts against the first rotation return protrusion 312, so that the vertical rotation return spring 430 applies a pushing force opposite to that of the vertical rotation knob 420 to the first rotation stage 310.

When the vertical rotary knob 420 is adjusted to enable the vertical rotary knob 420 to push the first rotary table 310 to rotate around the axis of the vertical rotary knob 420, the vertical rotary return spring 430 is pressed to provide opposite thrust, so that the position of the first rotary table 310 is stable, the shaking is avoided, the gap between parts is reduced, and the calibration precision is improved. When the reverse rotation is required, the vertical rotation knob 420 is reversely adjusted, and the first rotation stage 310 reversely rotates and maintains the abutment with the vertical rotation knob 420 by the urging force of the vertical rotation return spring 430.

In this embodiment, the second rotating mechanism includes a second rotating platform 510, the second rotating platform 510 is a fan-shaped whole, a shaft hole is formed in the center of the second rotating platform, and the second rotating platform is configured to rotate around the axis of the shaft hole, and the axis of the shaft hole is vertically arranged, so as to drive the sample to swing in the horizontal plane, and adjust the parallel state of the projection lines of the sample and the ion beam shielding plate 210 in the horizontal plane, as shown in fig. 5.

The vertical moving mechanism 400 further includes a vertical moving guide 450 and a vertical moving return spring 460, as shown in fig. 5. Specifically, the vertical moving guide 450 is vertically inserted into the vertical moving block 410 and the second rotating table 510; vertical removal reset spring 460 suit is in vertical removal guide 450, the upper end butt is in vertical removal slider 410, the lower extreme butt is in second revolving stage 510, specifically speaking, vertical guide hole has been seted up on vertical removal slider 410, vertical guide hole is the shoulder hole, the lower part aperture is greater than the upper portion aperture, shoulder hole upper portion and vertical removal guide 450 contact, the lower part is used for installing vertical removal reset spring 460, thereby guarantee vertical removal guide 450 and vertical removal reset spring 460 motion stability, the thrust of spring can keep corresponding contact surface closely to laminate, reduce the clearance, guarantee the precision. Further, vertical removal knob mounting hole 412 has been seted up on vertical removal slider 410, and vertical removal knob mounting hole 412 is screw hole and vertical setting for install vertical removal screw rod, and vertical removal screw rod lower extreme is the polished rod and inserts and adorn in second revolving stage 510, and then drives vertical removal slider 410 through rotatory vertical removal screw rod and move in vertical direction along vertical removal guide rail 450, realizes the regulation to the sample height, in order to guarantee that the sample appears ion beam shielding plate 210's size on vertical direction.

In an alternative of this embodiment, the horizontal movement mechanism includes a horizontal movement slider 610, a second rotation knob 620, a second rotation return spring 630, and a second rotation fixing plate 640.

As shown in fig. 2 and 6, a semicircular groove is formed on the horizontal moving slider 610, the second rotating platform 510 and the vertical moving slider 410 are disposed in the semicircular groove, and the horizontal moving slider 610 drives the second rotating platform 510 and the vertical moving slider 410 to move in the horizontal direction. The second rotating platform 510 has a rotating shaft inserted in the shaft hole, and the rotating shaft is inserted in the horizontal moving block 610. The horizontal moving block 610 has a second rotating chute 611, the second rotating chute 611 is coaxial with the semicircular groove and is communicated with the semicircular groove, accordingly, as shown in fig. 5, a second rotating flange 512 is disposed on the outer edge of the second rotating platform 510, and the second rotating flange 512 is inserted into the second rotating chute 611 to guide and limit the rotation of the second rotating platform 510 and prevent the second rotating platform 510 from shaking.

Further, the second rotation fixing plate 640 is connected to the horizontal movement slider 610, the second rotation knob 620 is installed on the second rotation fixing plate 640, an axis of the second rotation knob 620 is horizontally disposed, and one end of the second rotation knob 620 abuts against the second rotation stage 510, so that the second rotation stage 510 is pushed to rotate by adjusting the second rotation knob 620. Specifically, the second rotary knob 620 is screw-coupled to the second rotary fixing plate 640.

The horizontal movement sliding block 610 is provided with a horizontal rotation reset groove, the horizontal rotation reset groove is provided with a second rotation reset spring 630, and correspondingly, the second rotating platform 510 is provided with a second rotation reset protrusion 511. The axis of the second rotary return spring 630 is parallel to the axis of the second rotary knob 620, one end of the second rotary return spring 630 abuts against the horizontal moving slider 610, and the other end abuts against the second rotary return protrusion 511, so that the second rotary return spring 630 applies a pushing force to the second rotary table 510 opposite to the second rotary knob 620.

When the second rotary knob 620 is adjusted to make the second rotary knob 620 push the second rotary table 510 to rotate around the axis of the second rotary knob 620, the second rotary return spring 630 is pressed to provide opposite pushing force, so that the second rotary table 510 is stable in position, the shaking is avoided, the gap between parts is reduced, and the adjustment precision is improved. When the reverse rotation is required, the second rotation knob 620 is reversely adjusted, and the second rotation stage 510 reversely rotates by the urging force of the second rotation return spring 630 and maintains the abutment with the second rotation knob 620.

In this embodiment, the shielding plate limiting bracket 220 and the horizontal movement sliding block 610 are both installed on the base 700. The lower side of the baffle plate limiting support 220 is provided with a groove with a downward opening, the base 700 is provided with a corresponding bulge, the baffle plate limiting support 220 and the base 700 are limited through the matching of the groove and the bulge, and the baffle plate limiting support 220 and the base 700 are fixed through bolts to ensure position locking.

In this embodiment, the horizontal movement mechanism further includes a horizontal movement guide 650 and a horizontal movement return spring 660, as shown in fig. 2 and 3. Specifically, the horizontal moving guide rail 650 is horizontally inserted into the horizontal moving slider 610; both ends of the horizontal moving guide 650 are mounted to the base 700. The horizontal movement return spring 660 is installed on the horizontal movement guide 650 in a sleeved manner, and has one end abutting against the horizontal movement slider 610 and the other end abutting against the base 700. Specifically, the horizontal moving slider 610 is provided with a horizontal guide rail connecting protrusion 612, the horizontal guide rail connecting protrusion 612 is provided with a through hole, and the horizontal moving guide rail 650 is inserted into the through hole. The horizontal movement return spring 660 abuts against the horizontal guide coupling protrusion 612 to maintain the position of the horizontal movement slider 610 stable. Further, set up horizontal migration knob mounting hole 750 on base 700, horizontal migration knob mounting hole 750 is screw hole and level setting, be used for installing the horizontal migration screw rod, horizontal migration screw rod one end butt in horizontal migration slider 610, and then exert thrust to horizontal migration slider 610 through rotatory horizontal migration screw rod, make the horizontal migration slider 610 shelter from the mechanism 200 to the ion beam and be close to, horizontal migration reset spring 660 then provides opposite thrust in order to avoid rocking and reduce the clearance between the part, guarantee that the operation is stable and improve the adjustment precision. Meanwhile, when reverse movement is required, the horizontal movement screw is rotated reversely, the horizontal movement screw is far away from the horizontal movement slider 610, and the horizontal movement slider 610 moves in a direction far away from the ion beam shielding mechanism 200 under the thrust action of the horizontal movement return spring 660 and abuts against the horizontal movement screw, so that adjustment of the horizontal distance between the sample and the ion beam shielding plate 210 is realized. Obviously, the horizontal moving screw may also be inserted into the horizontal moving slider 610 and be in threaded connection with the horizontal moving slider 610, and the horizontal moving screw is installed on the base 700 and directly drives the horizontal moving slider 610 to move by rotating the horizontal moving screw.

The base 700 further comprises a guide rail support column 720, a limiting pressure plate 730 and a supporting vertical plate 740; as shown in fig. 3, the rail support column 720 and the supporting vertical plate 740 are vertically disposed, two ends of the horizontal movement rail 650 are respectively inserted into the rail support column 720 and the supporting vertical plate 740, one end of the horizontal movement return spring 660 abuts against the rail support column 720, and the other end abuts against the horizontal rail connecting protrusion 612. The limiting pressure plate 730 is connected to the upper ends of the guide rail support columns 720 and the supporting vertical plate 740, the lower surface of the limiting pressure plate is in contact with the upper surface of the horizontal moving sliding block 610, the horizontal moving sliding block 610 is limited, and the position degree of the horizontal moving sliding block is guaranteed.

In an alternative of this embodiment, the flipping table 20 comprises a flipping panel 21, a support frame 22, a telescopic arm 23 and an adaptor 24.

In this embodiment, as shown in fig. 1, fig. 2, fig. 9, and fig. 10, the flip plate 21 is connected to the base 700, a first boss 710 is disposed at a lower end of the base 700, a corresponding first slot 21a is disposed on the flip plate 21, the first boss 710 is clamped to the first slot 21a for positioning, and is sequentially inserted into the flip plate 21 and the base 700 through bolts for connection, a through hole is disposed at the first slot 21a, a corresponding threaded hole is disposed at the first boss 710, the threaded hole is located at a center of the first boss 710, and an axis of the threaded hole passes through a midpoint of a top surface of the ion beam shielding plate 210 near a side of the sample holder 100. Specifically, the first engaging groove 21a is a U-shaped groove, and the first boss 710 is a corresponding U-shaped boss, so that the positioning is realized, the relative rotation between the flipping board 21 and the base 700 is prevented, and the base 700 and the mechanism thereof can be driven to flip through the flipping board 21.

Furthermore, the turnover plate 21 is further provided with a positioning boss 21b, and the positioning boss 21b abuts against the side surface of the base 700 and cooperates with the first clamping groove 21a to reliably fix the base 700 on the turnover plate 21.

In an alternative of this embodiment, the turning plate 21 can be switched between the horizontal state and the vertical state, so as to drive the ion cutting table 10 to be switched between the horizontal state and the vertical state. Under the vertical state, the ion beam shielding plate 210 is located above the sample holder 100, so that the ion beam shielding plate 210 is not shielded when the observation is performed from top to bottom, and the observation effect is ensured.

One end of the telescopic arm 23 is hinged to the support frame 22, the other end of the telescopic arm is hinged to the turnover plate 21, and the turnover plate 21 swings through the extension and contraction of the telescopic arm 23.

The supporting frame 22 comprises a horizontal limiting plate 22a, a vertical limiting plate 22b, a stand column 22c, a bottom plate 22d and a transverse plate 22e. As shown in fig. 9, two upright posts 22c are vertically mounted on the bottom plate 22d and are parallel to each other, and two transverse plates 22e are respectively connected with the two upright posts 22 c; the vertical limiting plate 22b is connected to the end parts of the two transverse plates 22e, and when the turnover plate 21 is in a vertical state, the vertical limiting plate 22b abuts against the turnover plate 21 so as to ensure that the turnover plate 21 is in a vertical state; the two horizontal limiting plates 22a are respectively connected to the two transverse plates 22e, and when the turnover plate 21 is in a horizontal state, the lower surface of the horizontal limiting plate 22a abuts against the upper surface of the turnover plate 21, so that the horizontal state is ensured, as shown in fig. 10.

The adaptor 24 includes a bearing seat 24a, a rotary shaft 24b, and a connecting arm 24c, as shown in fig. 11. The lower end of the connecting arm 24c is connected with the turnover plate 21 and is fastened through a screw, and the rotating shaft 24b is inserted at the upper end of the connecting arm 24 c; the bearing housing 24a is fitted around the rotary shaft 24b and is rotatably connected to the rotary shaft 24b, and a bearing is provided between the bearing housing 24a and the rotary shaft 24 b. The end of the bearing block 24a facing away from the connecting arm 24c is connected to the upright 22 c. Specifically, as shown in fig. 9, the roll-over plate 21 is connected to the support frame 22 via an adaptor 24, and the roll-over plate 21 is rotated by the rotational connection of the bearing seat 24a to the rotation shaft 24 b.

In order to avoid refocusing of the microscope due to the change of the observation surface before and after the turnover, the top surface of the ion beam shielding plate 210 and the axis of the rotating shaft 24b are in the same horizontal plane in the horizontal state of the turnover plate 21; in the vertical state of the turning plate 21, the top surface of the ion beam shielding plate 210 and the axis of the rotating shaft 24b are in the same vertical plane, so that the position of the top surface of the ion beam shielding plate 210 observed in the two states is unchanged, refocusing is not needed, and the calibration efficiency is improved. That is, the top surface of the ion beam shutter 210 is coaxial with the rotation shaft 24b on the side close to the sample holder 100, the axis of the rotation shaft 24b is the swing axis of the flip plate 21, and the microscope is focused on the axis of the rotation shaft 24b in the horizontal state and the vertical state of the flip plate 21. That is, the swing axis of the flipping plate 21 is collinear with the side of the top surface of the ion beam shutter 210 near the sample.

To facilitate the removable attachment of the roll-over panel 21 to the base 700, the roll-over stand 20 further includes a locking nut 25 and a locking screw 26, as shown in FIG. 12. The locking screw 26 includes a nut, a polish rod and a threaded rod, both ends of the polish rod are respectively connected with the nut and the threaded rod, and the diameter of the polish rod is larger than the diameter of the threaded rod and smaller than the diameter of the nut. Correspondingly, an avoiding groove 21c is formed in the turnover plate 21, the upper end of the avoiding groove 21c is communicated with the bottom of the first clamping groove 21a, and the lower end of the avoiding groove 21c is connected with a circular through hole. The threaded rod is inserted into the avoidance groove 21c, the polished rod is inserted into the circular through hole, the diameter of the nut is larger than that of the circular through hole, the locking nut 25 is arranged in the avoidance groove 21c and is in threaded connection with the threaded rod, and meanwhile the locking nut 25 abuts against the end face of the polished rod. Specifically, the length of the threaded rod is smaller than the depth of the avoidance groove 21c, and meanwhile, the length of the threaded rod is larger than the length of the polished rod minus the circular through hole. As shown in fig. 12, in a state where the turning plate 21 and the base 700 are detached, the screw rod does not protrude from the bottom of the first engaging groove 21a, that is, the screw rod is completely located in the avoiding groove 21c, and the locking nut 25 prevents the locking screw 26 from being disengaged from the turning plate 21; when connecting returning face plate 21 and base 700, because the length of threaded rod is less than the degree of depth of dodging recess 21c, first boss 710 and first draw-in groove 21a can directly the joint, can not interfered by the threaded rod, rotatory locking screw 26 is in order to lock returning face plate 21 and base 700 afterwards, because the length of threaded rod is greater than the length that the polished rod subtracts circular through-hole this moment, can guarantee the nut butt in returning face plate 21 to prevent that locking screw 26 is not hard up. In short, by providing the locking screw 26 on the flipping panel 21, the locking screw 26 is prevented from being lost, the connection of the flipping panel 21 and the base 700 is facilitated, and by the corresponding length setting, the occurrence of interference at the time of installation is prevented and the locking effect is ensured.

The working process of the multi-axis ion cutting sample loading device provided by the embodiment is as follows:

a microscope is disposed above the multi-axis ion cutting loading device for observation, the sample is adhered to the sample holder 100, and then the sample holder 100 is clamped into the first rotating stage 310.

The top faces of the sample and ion beam shutter 210 refer to the respective upper end faces when the flip plate 21 is in the horizontal state.

When the turning plate 21 is in the horizontal state, as shown in fig. 1 and 10, the projections of the sample and the ion beam shielding plate 210 in the horizontal plane are observed to confirm whether the projection lines of the top surfaces of the two are parallel and whether the distance between the two is proper.

Firstly, the parallel state is adjusted, and when the adjustment is needed, the second rotation knob 620 is rotated to push the second rotation stage 510 to rotate, so as to drive the vertically moving slider 410 and the first rotation stage 310 to rotate simultaneously in the horizontal plane, and finally drive the sample to rotate until the projection line of the sample and the top surface of the ion beam shielding plate 210 in the horizontal plane is parallel.

After the parallelism is adjusted, the horizontal moving screw is rotated to drive the horizontal moving slider 610 to move along the horizontal moving guide 650, so as to drive the second rotating stage 510, the vertical moving slider 410 and the first rotating stage 310 to move, and the distance between the sample and the projection line of the top surface of the ion beam shutter 210 in the horizontal plane is adjusted.

Then the telescopic arm 23 is contracted to enable the telescopic arm 23 to drive the turnover plate 21 to swing downwards, and then the telescopic arm 23 is extended out to push the turnover plate 21 to continuously swing until the turnover plate 21 abuts against the vertical limiting plate 22b. The beam shutter 210 is now positioned above the sample.

Then, the microscope is used to observe the projections of the sample and the ion beam shutter 210 in the horizontal plane, and whether the projection lines of the two are parallel and the distance between the projection lines is proper is determined. Namely, the projection of the sample and the ion beam shielding plate 210 in the vertical plane when the turning plate 21 is in the horizontal state is observed through the overall 90-degree swing, and a microscope does not need to be additionally arranged in the horizontal direction for observation.

Firstly, the parallel state is adjusted, and when the adjustment is needed, the vertical rotation knob 420 is rotated to push the first rotation stage 310 to rotate, so as to drive the sample to rotate in the current horizontal plane until the top surface of the sample is parallel to the projection line of the top surface of the ion beam shutter 210 in the current horizontal plane.

After the parallelism is adjusted, the vertical moving screw is rotated to adjust the position of the vertical moving slider 410, so as to drive the first rotating stage 310 to move, and the distance between the whole sample and the projection line of the top surface of the ion beam shielding plate 210 in the horizontal plane is adjusted to ensure the proper cutting amount.

According to the invention, the sample is adjusted in all directions through the first rotating mechanism 300, the vertical moving mechanism 400, the second rotating mechanism and the horizontal moving mechanism, so that the relative position relation between the sample and the ion beam shielding plate 210 can be adjusted flexibly and rapidly, the projections of the top surface of the sample and the top surface of the ion beam shielding plate 210 in the horizontal plane and the vertical plane are ensured to be parallel to each other, the size of the sample higher than the ion beam shielding plate 210 in the vertical plane is ensured to be reasonable, the cutting surface is ensured to be flat, the cutting amount is proper, and the calibration efficiency and the calibration accuracy are improved.

According to the invention, the sample holder 100 is clamped on the first rotating platform 310, so that the first rotating platform 310 is stressed and drives the sample holder 100 to complete the adjustment of the angle and the position, the direct force application to the sample holder 100 is avoided, the sample holder 100 is prevented from deforming or deviating in position due to stress, and the calibration precision is further ensured. Particularly, when the horizontal distance and the vertical height between the sample holder 100 and the ion beam shutter 210 are adjusted, if a pushing force is directly applied to the sample holder 100, the sample holder 100 is more likely to be displaced, and a gap is generated between the sample holder 100 and the first rotation stage 310, which reduces the accuracy of calibration. Meanwhile, the integrated design of the ion cutting table 10 shortens the distance between each moving mechanism, reduces the deformation and errors caused by factors such as the structural length and the cantilever and further improves the precision.

The invention realizes that the position relation between the sample and the ion beam baffle 210 in the vertical plane and the horizontal plane can be observed by only one microscope through the overturning platform 20. The microscope is set to be observed downwards, when the turnover plate 21 is horizontal, whether the projection lines of the sample and the ion beam shielding plate 210 in the horizontal plane are parallel and whether the distance is proper can be observed, and the adjustment is carried out through the corresponding second rotating mechanism and the horizontal moving mechanism; when the turning plate 21 is vertically disposed, it can be observed whether the projection of the sample and the ion beam shielding plate 210 in the vertical plane is parallel and the size of the sample higher than the ion beam shielding plate 210 is proper, and the adjustment is performed by the corresponding first rotating mechanism 300 and the vertical moving mechanism 400. The arrangement of the overturning platform 20 realizes the observation of one microscope in two mutually perpendicular directions, reduces the arrangement of the microscope, reduces the equipment cost, can avoid refocusing in the direction changing process, and improves the calibration efficiency.

The ion cutting table 10 has the advantages that through the integrated design of the first rotating mechanism 300, the vertical moving mechanism 400, the second rotating mechanism and the horizontal moving mechanism, the structure is compact, the space occupation is reduced, the ion cutting table is convenient to be matched with the overturning table 20, the connection among all movable parts is tighter, the influence of factors such as vibration on the device is smaller, and the precision is favorably improved.

Finally, it should be noted that: the above embodiments are only used to illustrate the technical solution of the present invention, and not to limit the same; while the invention has been described in detail and with reference to the foregoing embodiments, it will be understood by those skilled in the art that: the technical solutions described in the foregoing embodiments may still be modified, or some or all of the technical features may be equivalently replaced; and these modifications or substitutions do not depart from the spirit of the corresponding technical solutions of the embodiments of the present invention.

Claims

1. The multi-axis ion cutting sample loading device is characterized by comprising an ion cutting table (10) and a turnover table (20), wherein the ion cutting table (10) comprises a sample holder (100), an ion beam shielding mechanism (200), a first rotating mechanism (300), a vertical moving mechanism (400), a second rotating mechanism, a horizontal moving mechanism and a base (700);

the ion beam shielding mechanism (200) comprises an ion beam shielding plate (210), the ion beam shielding plate (210) is arranged opposite to the sample holder (100), and the sample is arranged on one side, close to the ion beam shielding plate (210), of the sample holder (100);

the first rotating mechanism (300) comprises a first rotating platform (310), and the sample holder (100) is clamped on the first rotating platform (310); -the first rotary table (310) rotates around a first axis, which is horizontal;

the vertical moving mechanism (400) comprises a vertical moving slide block (410), and the vertical moving slide block (410) is connected to the first rotating table (310) and used for driving the first rotating table (310) to move in the vertical direction;

the second rotating mechanism comprises a second rotating platform (510), and the vertical moving slide block (410) is mounted on the second rotating platform (510) and is in sliding connection with the second rotating platform (510); -the second rotating table (510) rotates around a second axis, which is vertical;

the horizontal moving mechanism comprises a horizontal moving slide block (610), and the second rotating table (510) is mounted on the horizontal moving slide block (610); the horizontal moving slide block (610) is used for driving the second rotating table (510) to move towards or away from the ion beam shielding plate (210) in the horizontal plane;

the ion beam shielding mechanism (200) and the horizontal moving slider (610) are mounted on the base (700);

the overturning platform (20) comprises an overturning plate (21), and the base (700) is installed on the overturning plate (21);

the turnover plate (21) is configured to drive the ion cutting table (10) to swing from a horizontal state to a vertical state;

in the vertical state, the ion beam shielding plate (210) is positioned above the sample holder (100);

the swing axis of the turnover plate (21) is collinear with the side edge of the top surface of the ion beam shielding plate (210) close to the sample.

2. The multi-axis ion cutting sample loading device according to claim 1, wherein the vertical movement mechanism (400) further comprises a vertical rotation knob (420);

the vertical rotation knob (420) is connected with the vertical moving slider (410) and abuts against the first rotating table (310), and is configured to push the first rotating table (310) to rotate around the first axis;

the horizontal movement mechanism further comprises a second rotation knob (620);

the second rotating knob (620) is connected with the horizontal moving slider (610) and abuts against the second rotating table (510), and is configured to push the second rotating table (510) to rotate around the second axis.

3. The multi-axis ion cutting loading apparatus as claimed in claim 2, wherein the vertical movement mechanism (400) further comprises a vertical rotation return spring (430);

the vertical rotation return spring (430) is connected with the vertical moving slider (410) and abutted against the first rotating table (310), and is configured to push the first rotating table (310) to rotate around the first axis, and the rotating direction is opposite to the pushing direction of the vertical rotation knob (420);

the horizontal movement mechanism further comprises a second rotary return spring (630);

the second rotary return spring (630) is connected with the horizontal moving slider (610) and abuts against the second rotary table (510), and is configured to push the second rotary table (510) to rotate around the second axis, and the rotating direction is opposite to the pushing direction of the second rotary knob (620).

4. The multi-axis ion cutting loading device as claimed in claim 3, wherein the vertical moving mechanism (400) further comprises a vertical moving guide (450) and a vertical moving return spring (460);

the vertical moving slide block (410) is sleeved on the vertical moving guide rail (450) and moves along the vertical moving guide rail (450);

the vertical moving return spring (460) is sleeved on the vertical moving guide rail (450), one end of the vertical moving return spring abuts against the vertical moving slide block (410), the other end of the vertical moving return spring abuts against the second rotating platform (510), and the vertical moving return spring is configured to apply thrust to the vertical moving slide block (410);

the horizontal moving mechanism further comprises a horizontal moving guide rail (650) and a horizontal moving return spring (660);

the horizontal moving sliding block (610) is sleeved on the horizontal moving guide rail (650) and moves along the horizontal moving guide rail (650);

the horizontal movement return spring (660) is sleeved on the horizontal movement guide rail (650), one end of the horizontal movement return spring abuts against the base (700), the other end of the horizontal movement return spring abuts against the horizontal movement sliding block (610), and the horizontal movement return spring is configured to apply thrust to the horizontal movement sliding block (610).

5. The multi-axial ion cutting and sample loading device according to claim 4, wherein the vertical moving mechanism (400) further comprises a vertical moving screw parallel to the vertical moving guide (450) and threadedly engaged with the vertical moving slider (410), the vertical moving screw being inserted into the second rotary table (510);

the horizontal movement mechanism further comprises a horizontal movement screw which is parallel to the horizontal movement guide rail (650) and abuts against the horizontal movement slider (610), and is configured to apply a pushing force to the horizontal movement slider (610) in a direction opposite to a pushing force applied to the horizontal movement slider (610) by the horizontal movement return spring (660).

6. The multi-axis ion cutting loading apparatus as recited in claim 5, wherein the first rotation mechanism (300) further comprises a spring plunger (320);

the spring plunger (320) is inserted into the first rotating platform (310), and the axis of the spring plunger (320) is parallel to the first axis;

the spring plunger (320) is configured to be insertable into the sample holder (100).

7. The multi-axis ion cutting loading apparatus as claimed in claim 6, wherein the flipping table (20) further comprises two adapters (24) located at both sides of the flipping plate (21), the adapters (24) comprising a bearing seat (24 a), a rotation shaft (24 b) and a connecting arm (24 c);

the connecting arm (24 c) is connected with the turnover plate (21);

one end of the rotating shaft (24 b) is connected with the connecting arm (24 c), and the other end of the rotating shaft is inserted into the bearing seat (24 a) and is rotationally connected with the bearing seat (24 a);

the turning plate (21) rotates around the axis of the rotating shaft (24 b).

8. The multi-axis ion cutting and sample loading device according to claim 7, wherein the flipping table (20) further comprises a telescopic arm (23), the telescopic arm (23) is located between the two adapters (24), and a telescopic end of the telescopic arm (23) is hinged to the flipping plate (21).

9. The multi-axis ion cutting and sample loading device according to claim 8, wherein the base (700) is provided with a first boss (710), and the turnover plate (21) is provided with a first clamping groove (21 a);

the first boss (710) is clamped in the first clamping groove (21 a).