CN110577823B - Nano abrasive, polishing solution, preparation method and application - Google Patents
Nano abrasive, polishing solution, preparation method and application Download PDFInfo
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- CN110577823B CN110577823B CN201810948926.1A CN201810948926A CN110577823B CN 110577823 B CN110577823 B CN 110577823B CN 201810948926 A CN201810948926 A CN 201810948926A CN 110577823 B CN110577823 B CN 110577823B
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- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09G—POLISHING COMPOSITIONS; SKI WAXES
- C09G1/00—Polishing compositions
- C09G1/02—Polishing compositions containing abrasives or grinding agents
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- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09K—MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
- C09K3/00—Materials not provided for elsewhere
- C09K3/14—Anti-slip materials; Abrasives
- C09K3/1436—Composite particles, e.g. coated particles
Abstract
The invention provides a nano abrasive, a polishing solution, a preparation method and application thereof, relating to the technical field of abrasives, the nano abrasive comprises a first abrasive, the first abrasive comprises nano aluminum oxide, the outer surface of the nano aluminum oxide is coated with a first polymer, the technical problems that the polishing solution obtained by taking the existing nano aluminum oxide as the abrasive can cause the surface of a processed medium to generate micro defects, the strength of the processed medium is reduced, and the polishing requirements of optical glass and optical instruments cannot be met are solved, the polymer is coated on the outer surface of the nano aluminum oxide, so that the polymer can play a role of buffering in the polishing process, the micro defects on the surface of a processed medium caused by the grinding materials are effectively reduced, thereby ensuring the apparent quality and the strength of the processed medium and meeting the polishing requirements of optical glass and optical instruments.
Description
Technical Field
The invention relates to the technical field of abrasives, in particular to a nano abrasive, a polishing solution, a preparation method and an application.
Background
Chemical Mechanical Polishing (CMP) is a combined technique of Mechanical grinding and Chemical etching, which removes a very thin layer of material on the surface of a medium to be polished in an alternating process of Chemical action and Mechanical action by means of the grinding action of ultrafine particles and the Chemical etching action of a Polishing slurry, thereby achieving ultra-precise planar surface processing. CMP is considered to be the only global planarization technique that is best suited for surface processing. The abrasive in the CMP polishing solution has both a mechanical impact effect on the surface of a workpiece and a catalytic effect on a chemical reaction during the polishing process, and is an important factor influencing the polishing quality.
The abrasive in the existing commonly used polishing solution is nano-alumina, but the nano-alumina polishing solution directly impacts the surface of the processed medium, which causes hard impact on the surface of the processed medium, so that the processed medium has micro defects such as large scratches and pits, the strength of the processed medium is reduced, and the polishing requirements of optical glass and optical instruments cannot be met.
In view of the above, the present invention is particularly proposed.
Disclosure of Invention
The invention aims to provide a nano abrasive to solve the technical problems that the polishing solution obtained by using the existing nano alumina as the abrasive can cause the surface of a processed medium to generate larger micro defects such as scratches, pits and the like, the strength of the processed medium is reduced, and the polishing requirements of optical glass and optical instruments cannot be met.
The invention provides a nano abrasive, which comprises a first abrasive, wherein the first abrasive comprises nano alumina, and the outer surface of the nano alumina is coated with a first polymer;
preferably, the particle size of the nano alumina is 80-350 nm.
Further, the nano abrasive also comprises a second abrasive, the second abrasive comprises nano cerium oxide, and the outer surface of the nano cerium oxide is coated with a second polymer;
preferably, the particle size of the nano cerium oxide is 300-800 nm.
Further, the mass ratio of the first abrasive to the second abrasive is (10-26): (8-31), preferably (15-20): (12-16).
Preferably, the first polymer and the second polymer are each independently an organic polymer;
preferably, the organic polymer is selected from at least one of methoxy polyethylene glycol methacrylate, 4-carboxybenzotriazole methyl ester, methacrylate, ethyl acrylate, 4-hydroxybenzotriazole butyl ester and ethoxy polyethylene glycol methacrylate.
The second purpose of the invention is to provide a polishing solution, which comprises the nano abrasive and water provided by the invention;
preferably, the content of the nano abrasive is 18 to 57 wt%, preferably 27 to 36 wt%.
Further, the polishing solution also comprises a pH value regulator and/or a dispersant;
preferably, the pH value of the polishing solution is 7-9, preferably 8-9;
preferably, the pH adjuster comprises an organic base and/or an inorganic base;
preferably, the organic base is selected from at least one of hexahydroxyethylethylenediamine, diethanolamine, triethanolamine, tetrabutylammonium hydroxide, trimethylhydroxyethylammonium hydroxide, butylsultone, and tetramethylammonium hydroxide;
preferably, the inorganic base is selected from at least one of ammonia, sodium hydroxide and potassium hydroxide.
Further, the pH value regulator is a composite alkali of organic alkali and inorganic alkali;
preferably, in the composite alkali, the mass ratio of the organic alkali to the inorganic alkali is (1-2): (1-2).
Preferably, the content of the dispersant is 1.0 to 5.2wt%, preferably 2.0 to 3.5 wt%;
preferably, the dispersant is at least one selected from polyvinyl alcohol, polyethylene glycol, polyethyleneimine, polyvinylpyrrolidone, isothiazolinone, nonylphenol polyoxyethylene ether, fatty alcohol polyoxyethylene polyoxypropylene ether block polyether, and alkylphenol polyoxyethylene ether.
The invention also aims to provide a preparation method of the polishing solution, which comprises the following steps: dissolving the nano abrasive, the optional pH value regulator and the optional dispersing agent provided by the invention into water, and uniformly dispersing to obtain the polishing solution;
preferably, the method specifically comprises the following steps:
a. stirring deionized water at 600-800rpm, adding a dispersing agent, and stirring until the mixture is uniformly mixed;
b. slowly adding the nano abrasive provided by the invention into the solution, and stirring until the nano abrasive is uniformly mixed;
c. adding a pH value regulator, regulating the pH value to 7-9, and stirring until the pH value is uniformly mixed to obtain the polishing solution.
Preferably, in step (a), the dispersant is added at a rate of 0.6 to 1.8L/min;
preferably, in step (c), the pH adjusting agent is added at a rate of 0.6-1.8L/min.
The fourth purpose of the invention is to provide the application of the nano abrasive or the polishing solution in glass polishing;
preferably, the glass is 3D glass.
The fifth purpose of the invention is to provide 3D glass which is obtained by polishing the 3D glass by using the nano abrasive provided by the invention.
The invention also provides electronic equipment comprising the 3D glass.
According to the nano abrasive, the first polymer is coated on the outer surface of the nano alumina, so that the first polymer can play a buffering role in the polishing process, and the micro defects of scratches, pits and the like on the surface of a processed medium caused by the direct hard impact of the nano alumina and the surface of the processed medium are effectively reduced, so that the apparent quality and the strength of the processed medium are ensured, and the polishing requirements of optical glass and optical instruments are met.
The polishing solution provided by the invention adopts the nano abrasive as the abrasive, so that the micro defects of scratches, pits and the like on the surface of the processed medium caused by the abrasive can be effectively avoided, the apparent quality and the strength of the processed medium are ensured, and the polishing requirements of optical glass and optical instruments can be met.
The preparation method of the polishing solution provided by the invention is simple in process and convenient to operate, and can be suitable for industrial production, so that the production efficiency is improved, and the production cost is reduced.
Detailed Description
Embodiments of the present invention will be described in detail below with reference to examples, but it will be understood by those skilled in the art that the following examples are only illustrative of the present invention and should not be construed as limiting the scope of the present invention. The examples, in which specific conditions are not specified, were conducted under conventional conditions or conditions recommended by the manufacturer. The reagents or instruments used are not indicated by the manufacturer, and are all conventional products available commercially.
According to one aspect of the present invention, there is provided a nanoabrasive comprising a first abrasive comprising nanoalumina, the outer surface of which is coated with a first polymer.
According to the nano abrasive, the first polymer is coated on the outer surface of the nano alumina, so that the first polymer can play a buffering role in the polishing process, the direct hard impact between the nano alumina and the surface of a processed medium is effectively reduced, and the micro defects such as scratches and pits appear on the surface of the processed medium, so that the apparent quality and strength of the processed medium are ensured, and the polishing requirements of optical glass and optical instruments can be met.
In a preferred embodiment of the present invention, the nano alumina has a particle size of 80 to 350 nm.
When the particle size of the nano alumina exceeds 350nm, the polishing speed of the first abrasive is high, but scratches and pits on the surface of the processing medium are obviously increased, so that the apparent quality and strength of the processing medium are influenced; when the grain diameter of the nano alumina is less than 80nm, the cost of the nano alumina is higher, and the polishing rate of the first abrasive is slow; therefore, the first grinding material is prepared by selecting the nano aluminum oxide with the grain diameter of 80-350nm, and the purposes of ensuring the polishing rate and the apparent quality and strength of the processing medium can be achieved.
In this preferred embodiment of the invention, the nano-alumina has a typical but non-limiting particle size of, for example, 80, 100, 120, 150, 180, 200, 220, 250, 280, 300, 320 or 350 nm.
In a further preferred embodiment of the invention, the first abrasive has a particle size of 100-400 nm.
The first abrasive taking the nano-alumina as a core and the first polymer as a shell layer is formed by coating the first polymer outside the nano-alumina, wherein the thickness of the first polymer layer is 20-50 nm.
In this preferred embodiment of the invention, the first abrasive has a typical, but not limiting, particle size of, for example, 100, 150, 200, 250, 300, 350 or 400 nm.
In a preferred embodiment of the present invention, the first polymer is selected from at least one of methoxypolyethylene glycol methacrylate, 4-carboxybenzotriazole methyl ester, methacrylate, ethyl acrylate, 4-hydroxybenzotriazole butyl ester and ethoxypolyethylene glycol methacrylate.
In the preferred embodiment of the invention, the water-soluble polymer is selected to coat the nano-alumina, so that the pollution of an organic solvent to the environment is avoided, and the preparation method of the first abrasive is more green and environment-friendly.
In a preferred embodiment of the present invention, the method for preparing the first abrasive comprises the steps of: dissolving the first polymer in water, dispersing uniformly to obtain a polymer solution, adding the nano-alumina into the polymer solution, stirring uniformly, and drying to obtain the first abrasive.
In a preferred embodiment of the present invention, the nano-abrasive further comprises a second abrasive comprising nano-cerium oxide, the outer surface of which is coated with a second polymer.
The nano cerium oxide can be used as a polishing abrasive, but when the nano cerium oxide is used as a polishing material to be made into a polishing solution to polish a processed medium, the nano cerium oxide has the defects of long polishing time and low polishing efficiency.
The second polymer is coated on the outer surface of the nano cerium oxide, so that the damage of the nano cerium oxide to a processed medium in a polishing process can be reduced, the apparent quality of the processed medium can be more effectively improved, and the strength of the processed medium can be more effectively ensured.
In the preferred embodiment of the invention, the first abrasive and the second abrasive cooperate with each other, so that the apparent quality of the processed medium can be further improved, the strength of the processed medium can be more effectively ensured, and the polishing requirements of optical glass and optical instruments can be more effectively met.
In a preferred embodiment of the present invention, the particle size of the nano cerium oxide is 300-800 nm.
The second abrasive is prepared by selecting the nano cerium oxide with the particle size of 300-800nm, so that the first abrasive and the second abrasive are mutually cooperated, and the apparent quality and the strength of a processing medium can be ensured while the polishing efficiency is improved.
In this preferred embodiment of the invention, the nano-ceria has a typical but non-limiting particle size such as 300, 350, 400, 450, 500, 550, 600, 650, 700, 750 or 800 nm.
In a further preferred embodiment of the invention, the particle size of the second abrasive is 320-850 nm.
And coating a second polymer outside the nano cerium oxide to form a second abrasive taking the nano cerium oxide as a core and the second polymer as a shell, wherein the thickness of the second polymer layer is 20-50 nm.
In this preferred embodiment of the invention, the second abrasive has a typical, but not limiting, particle size of, for example, 320, 380, 400, 420, 450, 480, 500, 550, 600, 650, 700, 750, 800, or 850 nm. In a preferred embodiment of the present invention, the second polymer is at least one selected from the group consisting of methoxypolyethylene glycol methacrylate, 4-carboxybenzotriazole methyl ester, methacrylate, ethyl acrylate, 4-hydroxybenzotriazole butyl ester and ethoxypolyethylene glycol methacrylate.
In the preferred embodiment of the invention, the water-soluble polymer is selected to coat the nano-alumina, so that the organic solvent is prevented from polluting the environment, and the preparation method of the second abrasive is more environment-friendly.
In a preferred embodiment of the present invention, the method for preparing the second abrasive comprises the steps of: dissolving the first polymer in water, dispersing uniformly to obtain a polymer solution, adding the nano cerium oxide into the polymer solution, stirring uniformly, and drying to obtain the first abrasive.
In a further preferred embodiment of the present invention, the mass ratio of the first abrasive to the second abrasive is (10-26): (8-31).
Typical but non-limiting masses of the first abrasive and the second abrasive in this preferred embodiment of the invention are, for example, 5:4, 3:2, 15:8, 9:4, 5:2, 25:8, 26:8, 2:3, 4:5, 1:1, 6:5, 5:3, 26:15, 1:2, 3:4, 13:10, 2:5, 3:5, 6:5, 31:25, 1:3, 1:2, 5:6, 13:15, 10:31, 15:31, 20:31, 25:31 or 26: 31.
The first abrasive and the second abrasive in a specific mass ratio are cooperated with each other, so that the processed medium has better apparent mass and higher strength.
According to a second aspect of the present invention, there is provided a polishing liquid comprising the nanoabrasive provided by the present invention and water.
The polishing solution provided by the invention adopts the nano abrasive as the abrasive, so that the polishing solution can effectively avoid the direct hard impact of nano aluminum oxide on the surface of the processed medium to cause the micro defects of scratches, pits and the like on the surface of the processed medium, thereby ensuring the apparent quality and strength of the processed medium and meeting the polishing requirements of optical glass and optical instruments.
In a further preferred embodiment of the present invention, the content of the nano-abrasive is 18 to 57 wt%.
In this preferred embodiment of the invention, typical but non-limiting amounts of the nano-abrasive are, for example, 18 wt%, 20 wt%, 22 wt%, 25 wt%, 28 wt%, 30 wt%, 32 wt%, 35 wt%, 40 wt%, 42 wt%, 45 wt%, 50 wt%, 52 wt%, 55 wt% or 57 wt%.
In a preferred embodiment of the present invention, the polishing liquid further comprises a pH adjuster.
The pH value of the polishing solution is adjusted by adding the pH value polishing solution into the polishing solution, so that the stability and the polishing effect of the polishing solution are improved.
In a further preferred embodiment of the present invention, the content of the pH adjustor is 1 to 3% by weight.
In this preferred embodiment of the invention, typical but non-limiting amounts of pH adjusting agents are e.g. 1 wt%, 1.2 wt%, 1.5 wt%, 1.8 wt%, 2wt%, 2.2 wt%, 2.5 wt%, 2.8 wt% or 3 wt%.
In a preferred embodiment of the present invention, the pH adjusting agent comprises an organic base and/or an inorganic base.
In the preferred embodiment of the present invention, the organic base is selected from one or more of hexahydroxyethylethylenediamine, diethanolamine, triethanolamine, tetrabutylammonium hydroxide, trimethylhydroxyethylammonium hydroxide, butylsultone and tetramethylammonium hydroxide.
In the preferred embodiment of the present invention, the inorganic base is selected from one or more of ammonia, sodium hydroxide and potassium hydroxide.
In a preferred embodiment of the present invention, the pH adjuster is a composite base of an organic base and an inorganic base.
The pH value of the polishing solution is more stable by selecting the composite alkali of organic alkali and inorganic alkali as the pH value regulator.
In a preferred embodiment of the present invention, the pH of the polishing liquid is 7 to 9.
The pH value of the polishing solution is controlled to be 7-9 so as to improve the polishing efficiency and ensure the stability of the polishing solution.
In the preferred embodiment of the invention, the polishing solution typically has, but not limited to, a pH of 7, 7.5, 8, 8.5, or 9, for example.
In the preferred embodiment of the invention, the inorganic base can not only react with the processed medium to accelerate the polishing process and improve the polishing efficiency, but also enhance the electrostatic interaction between the nano-abrasive particles and avoid agglomeration between the nano-abrasive particles to influence the polishing quality.
In the preferred embodiment of the invention, the organic base and the polymer are adsorbed on the surface of the nano abrasive, so that the stability of the nano abrasive can be further improved, the agglomeration phenomenon can be avoided, and the polishing quality can be further improved.
In a preferred embodiment of the present invention, in the composite base, the mass ratio of the organic base to the inorganic base is (1-2): (1-2).
In this preferred embodiment of the invention, typical but non-limiting masses of organic and inorganic bases in the complex base are, for example, 1:1, 2:3, 1:2, 3:2, 2:3, 2:1 or 4: 3.
In a preferred embodiment of the present invention, the complex base is a complex base of diethanolamine and sodium hydroxide, a complex base of trimethylhydroxyethylammonium hydroxide and potassium hydroxide, or a complex base of triethanolamine and sodium hydroxide.
In a preferred embodiment of the present invention, the polishing solution further comprises a dispersant.
By adding the dispersing agent into the polishing solution, agglomeration among the nano-abrasive materials can be further avoided, so that the nano-abrasive materials in the polishing solution are dispersed more uniformly and stably.
In a preferred embodiment of the present invention, the content of the dispersant in the polishing solution is 1.0 to 5.2 wt%.
In the preferred embodiment of the present invention, the dispersant is typically, but not limited to, contained in the polishing solution in an amount of, for example, 1 wt%, 1.2 wt%, 1.5 wt%, 1.8 wt%, 2wt%, 2.2 wt%, 2.5 wt%, 2.8 wt%, 3 wt%, 3.2 wt%, 3.5wt%, 3.8 wt%, 4 wt%, 4.2 wt%, 4.5 wt%, 4.8 wt%, 5wt%, or 5.2 wt%.
In a preferred embodiment of the present invention, the dispersant is one or more selected from polyvinyl alcohol, polyethylene glycol, polyethyleneimine, polyvinylpyrrolidone, isothiazolinone, polyoxyethylene nonylphenol, polyoxyethylene fatty alcohol-polyoxypropylene ether block polyether, and polyoxyethylene alkylphenol.
According to a third aspect of the present invention, there is provided a method for preparing the above polishing liquid, comprising the steps of:
dissolving the nano abrasive, the optional pH value regulator and the optional dispersant in water, and uniformly dispersing to obtain the polishing solution.
The preparation method of the polishing solution provided by the invention is simple in process and convenient to operate, and can be suitable for industrial production, so that the production efficiency is improved, and the production cost is reduced.
In a further preferred embodiment of the present invention, the method for preparing the polishing solution comprises the steps of:
(a) adding a dispersant into water, and uniformly mixing to obtain a dispersant solution;
(b) adding a nano abrasive into the dispersing agent solution, and uniformly mixing to obtain a mixture solution;
(c) adding the pH value regulator into the mixture solution, uniformly mixing, and regulating the pH value to 7-9 to obtain the polishing solution.
In a preferred embodiment of the present invention, in step (a), after the dispersant is added into water, the dispersant is uniformly dispersed in water by stirring at 600-800 rpm.
According to a fourth aspect of the present invention, there is provided the use of the above-described nanoabrasive or polishing liquid for polishing glass.
In a preferred embodiment of the invention, the glass is a 3D glass.
The 3D glass is also called 3D curved glass, which is light, thin, transparent, clean, fingerprint-resistant, anti-glare, hard, scratch-resistant, and weather-resistant, is a preferred glass in intelligent electronic devices, and is more popular with consumers.
According to a fifth aspect of the invention, the invention provides 3D glass, and the 3D glass is obtained by polishing the 3D glass by using the nano-abrasive provided by the invention.
The polishing solution provided by the invention is used for polishing the 3D glass, so that the micro defects of scratches, pits and the like on the surface of a processed medium caused by the direct hard impact of nano aluminum oxide on the surface of the processed medium are effectively reduced, the apparent quality and the strength of the processed medium are ensured, and the polishing requirements of optical glass and optical instruments are met.
According to a sixth aspect of the invention, the invention provides an electronic device comprising the 3D glass provided by the invention.
In the present invention, electronic devices include, but are not limited to, smart phones and tablet computers.
The technical solution provided by the present invention is further described below with reference to examples and comparative examples.
Example 1
The embodiment provides a nano abrasive which comprises a first abrasive, wherein the first abrasive is nano alumina coated with a first polymer, the particle size of the nano alumina is 200nm, and the first polymer is methacrylate.
Example 2
The embodiment provides a nano abrasive, which comprises a first abrasive and a second abrasive, wherein the mass ratio of the first abrasive to the second abrasive is 1:3, the first abrasive is nano aluminum oxide coated with a first polymer, the second abrasive is nano cerium oxide coated with a second polymer, the particle size of the nano aluminum oxide is 80nm, the particle size of the nano cerium oxide is 300nm, and the first polymer and the second polymer are both ethyl acrylate.
Example 3
The embodiment provides a nano abrasive, which comprises a first abrasive and a second abrasive, wherein the mass ratio of the first abrasive to the second abrasive is 3:1, the first abrasive is nano aluminum oxide coated with a first polymer, the second abrasive is nano cerium oxide coated with a second polymer, the particle size of the nano aluminum oxide is 350nm, the particle size of the nano cerium oxide is 800nm, and the first polymer and the second polymer are both methacrylate.
Example 4
The embodiment provides a nano abrasive, which comprises a first abrasive and a second abrasive, wherein the mass ratio of the first abrasive to the second abrasive is 1:1, the first abrasive is nano aluminum oxide coated with a first polymer, the second abrasive is nano cerium oxide coated with a second polymer, the particle size of the nano aluminum oxide is 300nm, the particle size of the nano cerium oxide is 800nm, and the first polymer and the second polymer are both methacrylate.
Example 5
The embodiment provides a nano abrasive, which comprises a first abrasive and a second abrasive, wherein the mass ratio of the first abrasive to the second abrasive is 5:3, the first abrasive is nano aluminum oxide coated with a first polymer, the second abrasive is nano cerium oxide coated with a second polymer, the particle size of the nano aluminum oxide is 200nm, the particle size of the nano cerium oxide is 500nm, and the first polymer and the second polymer are both methacrylate.
Example 6
This example provides a nano abrasive, and differs from example 5 in that the mass ratio of the first abrasive to the second abrasive is 10: 1.
Example 7
This example provides a nano abrasive, and differs from example 5 in that the mass ratio of the first abrasive to the second abrasive is 1: 10.
Example 8
The embodiment provides a nano abrasive, which is nano alumina coated with methacrylate, and the particle size of the nano alumina is 50 nm.
Example 9
The embodiment provides a nano abrasive, which is nano alumina coated with methacrylate, and the particle size of the nano alumina is 500 nm.
Comparative example 1
The comparative example provides a nano abrasive, which is nano alumina, and the particle size of the nano alumina is 200 nm.
Comparative example 2
The comparative example provides a nano abrasive, which is nano cerium oxide coated with methacrylate, and the particle size of the nano cerium oxide is 500 nm.
Comparative example 3
The comparative example provides a nano abrasive, which is nano cerium oxide, and the particle size of the nano cerium oxide is 500 nm.
Comparative example 4
The comparative example provides a nano abrasive which is prepared from nano aluminum oxide and nano cerium oxide in a mass ratio of 2:1, wherein the particle size of the nano aluminum oxide is 200nm, and the particle size of the nano cerium oxide is 500 nm.
Examples 10 to 18
Examples 10 to 18 respectively provide polishing solutions, which respectively include the nano-abrasive, the dispersant, the pH adjuster, and water provided in examples 1 to 9, wherein the nano-abrasive is 32 wt%, the dispersant is 2.5 wt%, and the pH is 8.5, the dispersant is polyvinylpyrrolidone, the pH adjuster is a composite alkali of tetramethylammonium hydroxide and potassium hydroxide, and a mass ratio of the tetramethylammonium hydroxide to the potassium hydroxide is 2: 1.
Example 19
The embodiment provides a polishing solution, which comprises the nano-abrasive provided in embodiment 5, a dispersing agent, a pH value regulator and water, wherein the content of the nano-abrasive is 27%.
Example 20
The embodiment provides a polishing solution, which comprises the nano-abrasive provided in embodiment 5, a dispersing agent, a pH value regulator and water, wherein the content of the nano-abrasive is 36%.
Example 21
The embodiment provides a polishing solution, which comprises the nano-abrasive provided in embodiment 5, a dispersing agent, a pH value regulator and water, wherein the content of the nano-abrasive is 18%.
Example 22
The present example provides a polishing solution, including the nano-abrasive provided in example 5, a dispersant, a pH adjuster, and water, wherein the content of the nano-abrasive is 57%.
Example 23
The embodiment provides a polishing solution, which comprises the nano-abrasive provided in embodiment 5, a dispersing agent, a pH value regulator and water, wherein the content of the nano-abrasive is 7%.
Example 24
The embodiment provides a polishing solution, which comprises the nano-abrasive provided in embodiment 5, a dispersing agent, a pH value regulator and water, wherein the content of the nano-abrasive is 87%.
Example 25
The embodiment provides a polishing solution, which comprises the nano abrasive provided in embodiment 5, a dispersing agent, a pH adjusting agent and water, wherein the pH adjusting agent is a composite alkali of tetramethylammonium hydroxide and potassium hydroxide, and the mass ratio of the tetramethylammonium hydroxide to the potassium hydroxide is 20: 1.
Example 26
The embodiment provides a polishing solution, which comprises the nano abrasive provided in embodiment 5, a dispersing agent, a pH adjusting agent and water, wherein the pH adjusting agent is a composite alkali of tetramethylammonium hydroxide and potassium hydroxide, and the mass ratio of the tetramethylammonium hydroxide to the potassium hydroxide is 1: 20.
Example 27
The embodiment provides a polishing solution, which comprises the nano abrasive provided in embodiment 5, a dispersing agent, a pH adjusting agent and water, wherein the pH adjusting agent is tetramethylammonium hydroxide.
Example 28
The embodiment provides a polishing solution, which comprises the nano abrasive provided in embodiment 5, a dispersing agent, a pH value regulator and water, wherein the pH value regulator is potassium hydroxide.
Example 29
Embodiment 29 provides a method for preparing a polishing solution, and the polishing solutions provided in embodiments 10 to 28 are prepared according to the method, which specifically includes the steps of:
(a) adding a dispersant into water, and uniformly mixing to obtain a dispersant solution;
(b) adding a nano abrasive into the dispersing agent solution, and uniformly mixing to obtain a mixture solution;
(c) adding the pH value regulator into the mixture solution, uniformly mixing, and regulating the pH value to 8.5 to obtain the polishing solution.
Comparative examples 5 to 8
Comparative examples 5 to 8, respectively, provide a polishing solution different from example 14 in that the nano-abrasive provided in comparative examples 1 to 4 was used instead of the nano-abrasive provided in example 5, respectively.
Comparative examples 5 to 8 provide polishing solutions prepared in the same manner as in example 14, and will not be described in detail. Test example 1
The polishing liquids provided in examples 10 to 28 and comparative examples 5 to 8 were each subjected to a polishing test under the following polishing conditions: processing a machine table: 1135B polishing machine; processing a product: a 3D glass sheet; concave polishing material: a nylon wire brush with the diameter of 0.3 mm; convex polishing material: polishing leather mixing brush; processing pressure: 250-350N; rotating speed of a lower disc: 55rpm, polishing time: and (5) 60 min.
After polishing, carrying out ultrasonic cleaning on the polished 3D glass, drying, and detecting the apparent state of the glass; measuring the thickness difference of the 3D glass by using a thickness gauge to calculate the polishing rate, measuring all the polished 3D glass, and averaging to obtain the polishing rate; all the polished 3D glass was measured with a roughness tester, and the 3D glass surface roughness was obtained by averaging, and the test results are shown in Table 1.
TABLE 1 polishing solution polishing test data sheet
As can be seen from table 1, the average apparent yield of the 3D glass polished by the polishing solutions provided in examples 10 to 28 is significantly higher than that of comparative example 5, and the roughness is significantly lower than that of comparative example 5, which indicates that the nano abrasive prepared by coating the nano alumina with the polymer can play a role in buffering during polishing by coating a layer of polymer chain polymer with low hardness and viscoelasticity outside the nano alumina with higher hardness, so as to avoid scratches and surface damage, thereby significantly improving the average apparent yield of the 3D glass, reducing the roughness, and meeting the polishing requirements of optical instruments and optical glass.
As can be seen from the comparison between examples 11 to 14 and example 10, the first abrasive and the second abrasive cooperate with each other to significantly improve the average apparent yield of the polished 3D glass and significantly reduce the roughness, which indicates that the first abrasive coated with the first polymer and the second abrasive coated with the second polymer and coated with the nano-cerium oxide cooperate with each other to wrap a layer of polymer chain polymer with low hardness and viscoelasticity outside the nano-aluminum oxide with higher hardness, so as to play a role in buffering during polishing and avoid scratches and surface damages, and the nano-cerium oxide wrapped with the second polymer is used to perform chemical decomposition and mechanical friction polishing simultaneously, so that the polishing effect is better, the average apparent yield of the polished 3D glass with higher polishing efficiency is higher, and the roughness is lower.
As can be seen from the comparison of examples 10 to 14 with examples 15 to 16, when the mass ratio of the first abrasive to the second abrasive is (10 to 26): (8-31), the polishing effect of the prepared polishing solution is better, and the polished 3D glass has higher average apparent yield and lower roughness.
As can be seen from the comparison between example 1 and examples 17-18, when the particle size of the nano alumina is 80-300nm, the polishing effect of the prepared polishing solution is better, and the polished 3D glass has higher average apparent yield and lower roughness.
As can be seen from the comparison between examples 10-14 and examples 19-22 with examples 23-24, when the content of the nano abrasive in the polishing solution is 18-57 wt%, the polishing effect of the polishing solution is better, and the average apparent yield of the polished 3D glass is higher and the roughness is lower.
As can be seen from the comparison between examples 10 to 14 and examples 25 to 28, when the pH adjustor in the polishing solution is a composite base of an organic base and an inorganic base, and the mass ratio of the organic base to the inorganic base is (1-2): and (1-2), the prepared polishing solution is more stable in dispersion and better in polishing effect, and the polished 3D glass is higher in average apparent yield and lower in roughness.
As can be seen from the comparison between examples 10-14 and comparative example 6, when the polymer-coated nano cerium oxide is used as the abrasive, the polishing effect on the 3D glass is good, but the polishing rate is low, the polishing time is long, the polishing efficiency cannot be effectively improved, and the requirement of industrial production cannot be met.
As can be seen from the comparison of examples 10 to 14 with comparative example 7, when the abrasive is nano cerium oxide, although the polishing effect is good, the polishing rate is lower and the polishing time is longer, which cannot meet the requirement of industrial production.
As can be seen from the comparison of examples 10-14 with comparative example 8, when the polymer-uncoated nano alumina and the polymer-uncoated nano ceria are used in cooperation with each other as the nano abrasive, the product fraction defective and the roughness are high, and the polishing requirements of optical instruments and optical glass cannot be met.
Test example 2
The 3D glasses polished by the polishing solutions provided in examples 10 to 28 and comparative examples 5 to 8 were subjected to ball drop test, four-point bending test, and static pressure test, respectively, and the results are shown in table 2 below.
TABLE 2 data sheet of 3D glass reliability test results after polishing
As can be seen from Table 1, the 3D glass strength of the polishing solutions provided in examples 10-28 after polishing is significantly higher than that of comparative example 5, which shows that the nano abrasive prepared by using polymer coated nano alumina can significantly improve the strength of the 3D glass and meet the polishing requirements of optical instruments and optical glass.
As can be seen from the comparison between examples 11-14 and example 10, the strength of the 3D glass polished by the polishing solution prepared by the first abrasive and the second abrasive cooperating with each other is significantly improved, which indicates that the polishing solution prepared by the first abrasive and the second abrasive cooperating with each other as the nano-abrasive has better polishing effect.
As can be seen from the comparison of examples 10 to 14 with examples 15 to 16, when the mass ratio of the first abrasive to the second abrasive is (10 to 26): (8-31), the polishing effect of the prepared polishing solution is better, the strength of the polished 3D glass is higher, and the requirements of high-grade optical glass and precise optical instruments can be met.
As can be seen from the comparison between example 1 and examples 17-18, when the particle size of the nano-alumina is 80-300nm, the polishing effect of the prepared polishing solution is better, and the strength of the polished 3D glass is higher.
As can be seen from the comparison between examples 10-14 and examples 19-22 with examples 23-24, when the content of the nano abrasive in the polishing solution is 18-57 wt%, the polishing effect of the polishing solution is better, and the strength of the polished 3D glass is higher, so that the requirements of high-grade optical glass and precision optical instruments can be met.
As can be seen from the comparison between examples 10 to 14 and examples 25 to 28, when the pH adjustor in the polishing solution is a composite base of an organic base and an inorganic base, and the mass ratio of the organic base to the inorganic base is (1-2): and (1-2), the prepared polishing solution has better stability, so that the polishing effect is better, and the requirements of high-grade optical glass and precise optical instruments can be met.
As can be seen from the comparison between examples 10-14 and comparative examples 6-8, after the 3D glass is polished by the polishing solution prepared by using the first abrasive and the second abrasive in cooperation as the nano-abrasive, the strength of the 3D glass is higher, and the requirements of high-grade optical glass and precision optical instruments can be met.
Finally, it should be noted that: the above embodiments are only used to illustrate the technical solution of the present invention, and not to limit the same; while the invention has been described in detail and with reference to the foregoing embodiments, it will be understood by those skilled in the art that: the technical solutions described in the foregoing embodiments may still be modified, or some or all of the technical features may be equivalently replaced; and the modifications or the substitutions do not make the essence of the corresponding technical solutions depart from the scope of the technical solutions of the embodiments of the present invention.
Claims (12)
1. The polishing solution is characterized by comprising a nano abrasive and water, wherein the content of the nano abrasive is 27-36 wt%;
the nano-abrasive comprises a first abrasive comprising nano-alumina, the outer surface of which is coated with a first polymer;
the particle size of the nano alumina is 80-350nm, the particle size of the first abrasive is 100-400nm, and the thickness of the first polymer layer is 20-50nm;
the nano abrasive also comprises a second abrasive, the second abrasive comprises nano cerium oxide, and the outer surface of the nano cerium oxide is coated with a second polymer;
the particle size of the nano cerium oxide is 300-800nm, the particle size of the second abrasive is 320-850nm, and the thickness of the second polymer layer is 20-50nm;
the mass ratio of the first abrasive to the second abrasive is (15-20): (12-16);
the first polymer and the second polymer are both independently selected from at least one of methoxy polyethylene glycol methacrylate, 4-carboxyl benzotriazole methyl ester, methacrylate, ethyl acrylate, 4-hydroxybenzotriazole butyl ester and ethoxy polyethylene glycol methacrylate;
the polishing solution also comprises a pH value regulator and a dispersant;
the pH value is 7-9;
the pH value regulator is a composite alkali of organic alkali and inorganic alkali, and the mass ratio of the organic alkali to the inorganic alkali in the composite alkali is (1-2): (1-2);
the organic alkali is at least one of hexahydroxyethyl ethylenediamine, diethanolamine, triethanolamine, tetrabutylammonium hydroxide, trimethyl hydroxyethyl ammonium hydroxide, butyl sultone and tetramethyl ammonium hydroxide;
the inorganic base is at least one of ammonia water, sodium hydroxide and potassium hydroxide;
the dispersant is selected from organic dispersants;
the organic dispersant is at least one selected from polyvinyl alcohol, polyethylene glycol, polyethyleneimine, vinyl pyrrolidone, isothiazolinone, nonylphenol polyoxyethylene ether, fatty alcohol polyoxyethylene polyoxypropylene ether block polyether and alkylphenol polyoxyethylene ether.
2. The polishing solution according to claim 1, wherein the pH is 8 to 9.
3. The polishing solution according to claim 1, wherein the content of the dispersant is 1.0 to 5.2 wt%.
4. The polishing solution according to claim 1, wherein the content of the dispersant is 2.0 to 3.5 wt%.
5. The method for preparing a polishing liquid according to any one of claims 1 to 4, comprising the steps of: dissolving the nano abrasive, the pH value regulator and the dispersant in water, and uniformly dispersing to obtain the polishing solution.
6. The method for preparing the polishing solution according to claim 5, comprising the steps of:
a. stirring deionized water at 600-800rpm, adding a dispersing agent, and stirring until the mixture is uniformly mixed;
b. slowly adding the nano abrasive material as described in any one of claims 1 to 4 into the solution, and stirring until the mixture is uniformly mixed;
c. adding a pH value regulator, regulating the pH value to 7-9, and stirring until the pH value is uniformly mixed to obtain the polishing solution.
7. The method according to claim 6, wherein in the step (a), the dispersant is added at a rate of 0.6 to 1.8L/min.
8. The method according to claim 6, wherein the pH adjustor is added at a rate of 0.6 to 1.8L/min in the step (c).
9. Use of the polishing solution according to any one of claims 1 to 4 for polishing glass.
10. Use according to claim 9, wherein the glass is a 3D glass.
11. A3D glass, which is obtained by polishing the 3D glass by using the polishing solution provided by any one of claims 1 to 4.
12. An electronic device comprising the 3D glass of claim 11.
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