CN110554570A - Pollution control device and method, objective system and photoetching machine equipment - Google Patents

Pollution control device and method, objective system and photoetching machine equipment Download PDF

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Publication number
CN110554570A
CN110554570A CN201810548633.4A CN201810548633A CN110554570A CN 110554570 A CN110554570 A CN 110554570A CN 201810548633 A CN201810548633 A CN 201810548633A CN 110554570 A CN110554570 A CN 110554570A
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China
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air
control device
pollution control
cavity
air outlet
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CN201810548633.4A
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CN110554570B (en
Inventor
李先明
郝保同
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Shanghai Micro Electronics Equipment Co Ltd
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Shanghai Micro Electronics Equipment Co Ltd
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    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70Microphotolithographic exposure; Apparatus therefor
    • G03F7/708Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70908Hygiene, e.g. preventing apparatus pollution, mitigating effect of pollution or removing pollutants from apparatus
    • G03F7/70916Pollution mitigation, i.e. mitigating effect of contamination or debris, e.g. foil traps

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  • Life Sciences & Earth Sciences (AREA)
  • Atmospheric Sciences (AREA)
  • Health & Medical Sciences (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Engineering & Computer Science (AREA)
  • Environmental & Geological Engineering (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)

Abstract

The invention discloses a pollution control device and method, an objective system and photoetching equipment. The pollution control device comprises at least one air cavity, wherein the air cavity is provided with at least one air inlet, at least two first air outlets and at least one group of second air outlets; each group of second air outlets comprises two second air outlets which are symmetrical relative to the central axis of the air cavity; the first air outlet is arranged on the outer ring of the second air outlet; the air outlet direction of the first air outlet faces back to the center of the at least one air cavity and forms a first included angle with the central axis of the at least one air cavity, and the air outlet direction of the second air outlet faces towards the center of the at least one air cavity and forms a second included angle with the central axis. According to the pollution control device provided by the embodiment of the invention, the at least two first air outlets and the at least one group of second air outlets are arranged, so that a semi-closed space can be formed when the pollution control device works, and pollutants are prevented from entering the semi-closed space.

Description

pollution control device and method, objective system and photoetching machine equipment
Technical Field
the embodiment of the invention relates to the technical field of photoetching equipment, in particular to a pollution control device and method, an objective system and photoetching equipment.
background
As a core component of the lithographic apparatus, the objective lens directly determines the imaging quality of the product. When the photoetching equipment works, light enters from the top of a projection objective lens and is subjected to exposure treatment on a product to be detected after being adjusted by an objective lens group. The top objective is the first objective or glass plate on the top of the projection objective, the top objective is usually directly exposed to the internal environment of the lithography equipment, and the light incident surface of the top objective is particularly susceptible to contamination by various contaminants, wherein the contaminants include foreign particles entering the lithography equipment from the external environment, chemical molecular contamination and particle contamination generated inside the equipment, and the like. A large amount of pollutants are adhered to the light incident surface of the top objective lens for a long time to form a pollution film, so that the light transmittance of the whole objective lens group is reduced, the imaging effect is reduced, and the quality of an exposed product is influenced.
in order to ensure the working efficiency of the objective lens assembly, the contaminants on the light incident surface of the top objective lens need to be periodically wiped and removed. When the pollutants are wiped, the top objective lens is inevitably damaged, so that the treatment mode is not suitable for frequent use; meanwhile, the contact type wiping is greatly influenced by factors such as the proficiency of operators, the wiping result of the top objective lens can be different from person to person, and the unified quantification standard is difficult to exist.
Therefore, it has been devised to prevent contaminants from adhering to the light incident surface of the top objective lens by providing a lens holder on the top objective lens and installing an extremely thin objective lens protection film on the lens holder. Although the method can effectively prevent the light incident surface of the top objective from being polluted, the protective film is very easy to break due to the influence of light transmission, has short service life and needs to be replaced regularly. Meanwhile, due to the existing technical level, the extremely thin protective film is not only difficult to install and operate, but also easily damaged by the influence of external air flow and the like (the damage rate is as high as 15%), and the use cost is increased due to frequent replacement of the objective protective film.
Disclosure of Invention
The invention provides a pollution control device and method, an objective lens system and photoetching machine equipment, which are used for preventing a light incident surface of a top objective lens from being polluted.
In a first aspect, an embodiment of the present invention provides a pollution control device, including at least one air cavity, where the air cavity has at least one air inlet, at least two first air outlets, and at least one group of second air outlets;
each group of the second air outlets comprises two second air outlets which are symmetrical relative to the central axis of the air cavity;
The first air outlet is arranged on the outer ring of the second air outlet;
the air outlet direction of the first air outlet is back to the center of the at least one air cavity, and a first included angle is formed between the air outlet direction of the first air outlet and the central axis of the at least one air cavity; the air outlet direction of the second air outlet faces to the center of the at least one air cavity, and a second included angle is formed between the air outlet direction of the second air outlet and the central axis; the included angle between the air outlet direction of the first air outlet and the air outlet direction of the second air outlet is smaller than 90 degrees.
Furthermore, the air cavity comprises a bottom plate end and a cover plate end, the bottom plate end and the cover plate end are arranged oppositely, and the bottom plate end and the cover plate end are both of an annular structure and are limited to form an annular air cavity.
further, the air cavity is an annular air cavity.
further, the first air outlet is arranged on the bottom plate at the bottom plate end; the second air outlet is arranged on the inner side surface of the annular air cavity.
Furthermore, the number of the first air outlets is equal to that of the second air outlets, and the first air outlets and the second air outlets are respectively arranged in a one-to-one correspondence manner. Further, the second air outlet includes parallel arrangement's first section and second section, first section with the second sliced stiff end all with the medial surface in annular wind chamber is connected, follows first section with the second sliced stiff end does to the direction of free end the air-out direction of second air outlet.
Furthermore, the cover plate end and the bottom plate end are assembled by two independent structures, and the second air outlet is formed in the joint of the bottom plate end and the cover plate end;
the first slice is fixed at the cover plate end, and the second slice is fixed at the bottom plate end; or the first slice is fixed at the bottom plate end, and the second slice is fixed at the cover plate end.
Further, the cover plate end and the bottom plate end are integrally formed.
Further, the first included angle is 30-60 degrees.
further, the second included angle is 0-15 °.
Furthermore, the annular air cavity is a circular air cavity.
Further, the at least two first air outlets are symmetrically arranged relative to a circular mandrel of the circular air cavity;
The at least two first air outlets are positioned on the bottom plate at the bottom plate end and close to one side of the circle center of the circular air cavity.
Furthermore, the projection of the graph formed by the centers of the second air outlets and the circular ring-shaped air cavity along the circular mandrel of the circular ring-shaped air cavity is completely covered by the projection of the graph formed by the centers of the first air outlets and the circular ring-shaped air cavity corresponding to the second air outlets along the circular mandrel of the circular ring-shaped air cavity.
Further, the length of the at least two first air outlets accounts for 60% -85% of the circumference of the annular air cavity;
The length of the at least two second air outlets accounts for 55% -80% of the circumference of the annular air cavity.
Further, the air inlet is arranged on the outer side face of the air cavity.
In a second aspect, an embodiment of the present invention further provides an objective lens system, including the pollution control device according to the first aspect and an objective lens group;
the objective lens group comprises at least one objective lens, wherein the objective lens close to the contamination control device is a first objective lens, and the objective lens system can allow the light path to pass through the contamination control device to reach the first objective lens;
The cover plate end and the bottom plate end are arranged in parallel with the first objective lens, and the cover plate end is positioned on one side of the bottom plate end far away from the first objective lens; the contamination control device is for protecting the first objective lens from contamination.
Further, the surface of the first objective lens close to the pollution control device is a concave mirror surface.
In a third aspect, an embodiment of the present invention further provides a lithographic apparatus including the objective lens system according to the second aspect.
in a fourth aspect, an embodiment of the present invention further provides a pollution control method, including at least one air cavity, where the air cavity has at least one air inlet, at least two first air outlets, and at least one group of second air outlets; the method comprises the following steps:
introducing wind into the at least one wind cavity from the at least one wind inlet;
Wind passes through the at least two first air outlets to form a first air curtain; the wind passes through the at least one group of second air outlets to form a second air curtain; wherein each set of the second air curtains comprises two second air curtains which are symmetrical relative to the central axis of the air cavity; the extending direction of the first air curtain is far away from the center of the at least one air cavity, and a third included angle is formed between the extending direction of the first air curtain and the central axis of the at least one air cavity; each group of second air curtains forms a junction line after the second air curtains are joined, the junction line is intersected with the central axis of the at least one air cavity, and a fourth included angle is formed between the junction line and the central axis; the included angle between the first air curtain and the second air curtain is less than 90 degrees;
The first air curtain and the second air curtain are matched for use, so that the surface to be protected is not polluted.
further, the third included angle is 0-15 °.
further, the fourth included angle is 30-60 °.
further, the second air curtain is positioned between the air cavity and the surface to be protected;
And each group of second air curtains is intersected between the surface to be protected and the air cavity and forms upward whirling airflow.
Further, the surface to be protected is a concave surface.
In a fifth aspect, embodiments of the present invention further provide a lithographic method of a lithographic apparatus, including the contamination control method of any one of claims 19 to 23; the photoetching machine equipment comprises a pollution control device and an objective lens group, wherein the pollution control device is used for protecting the mirror surface of the objective lens group, which is closest to the pollution control device, from being polluted;
The photoetching method comprises the following steps:
Starting the photoetching machine equipment;
Providing wind to the pollution control device;
Starting exposure work;
Stopping supplying air to the pollution control device after the exposure operation is finished;
and closing the photoetching machine equipment.
The pollution control device that this embodiment provided, through setting up two at least first air outlets and a set of at least second air outlets, every group second air outlet includes two second air outlets for the axis symmetry of wind chamber, and when pollution control put the work, the wind that gets into annular wind chamber from the income wind gap can form a semi-enclosed space after flowing out from first air outlet and second air outlet, and the existence of wind can prevent the pollutant to get into in the semi-enclosed space.
Drawings
FIG. 1 is a top cross-sectional view of a pollution control device provided by an embodiment of the present invention;
FIG. 2 is an exploded side view of a pollution control device provided by an embodiment of the present invention;
FIG. 3 is a schematic view of the first and second air curtains formed by the pollution control device of the present invention during operation;
FIG. 4 is a schematic structural diagram of a pollution control device provided by an embodiment of the present invention;
FIG. 5 is an exploded view of the pollution control device of FIG. 4 provided by an embodiment of the present invention;
FIG. 6 is an exploded view of yet another pollution control device of FIG. 4 according to an embodiment of the present invention;
FIG. 7 is a schematic view of a tangential air curtain formed by a pollution control device provided by an embodiment of the present invention;
FIG. 8 is a schematic structural diagram of an objective lens system provided by an embodiment of the present invention;
FIG. 9 is a block diagram of a lithographic apparatus according to an embodiment of the present invention;
FIG. 10 is a flow chart of a pollution control method provided by an embodiment of the present invention;
FIG. 11 is a flow chart of a lithographic method of a lithographic apparatus provided by an embodiment of the invention.
Detailed Description
The present invention will be described in further detail with reference to the accompanying drawings and examples. It is to be understood that the specific embodiments described herein are merely illustrative of the invention and are not limiting of the invention. It should be further noted that, for the convenience of description, only some of the structures related to the present invention are shown in the drawings, not all of the structures.
FIG. 1 is a top cross-sectional view of a pollution control device provided by an embodiment of the present invention; FIG. 2 is a cross-sectional side view of a pollution control device provided by an embodiment of the present invention; FIG. 3 is a schematic view of the first and second air curtains formed by the pollution control device of the present invention during operation. Specifically, referring to fig. 1-3, the pollution control device includes at least one air chamber 22, the air chamber 22 has at least one air inlet 21, at least two first air outlets 23 and at least one set of second air outlets 24; each set of the second air outlets 24 includes two second air outlets 24 symmetrical with respect to the central axis of the air cavity 22; the first air outlet 23 is arranged at the outer ring of the second air outlet 24; the air outlet direction of the first air outlet 23 is back to the center of the at least one air cavity 22, and forms a first included angle α with the central axis of the at least one air cavity 22; the air outlet direction of the second air outlet 24 faces the center of the at least one air cavity 22, and forms a second included angle beta with the central axis; the included angle between the air outlet direction of the first air outlet 23 and the air outlet direction of the second air outlet 24 is smaller than 90 degrees.
specifically, the air cavity 22 is a hollow structure, and air can enter the air cavity 22 through at least one air inlet 21 and flow out of the air cavity 22 through the first air outlet 23 and the second air outlet 24. The central axis of the air cavity 22 is parallel to the straight line along the X-direction, and at least one set of the second air outlets 24 is symmetrically disposed with respect to the central axis of the air cavity 22. The included angles between the first air outlet 23 and the second air outlet 24 and the ray in the opposite direction of the X direction are acute angles, and the included angle between the air outlet direction of the first air outlet 23 and the air outlet direction of the second air outlet 24 is smaller than 90 °.
For convenience of description, the air curtain formed by the air flowing out from the first air outlet 23 is defined as a first air curtain, and the air curtain formed by the air flowing out from the second air outlet 24 is defined as a second air curtain. The wind flowing out from the first outlet 23 faces away from the center of the wind chamber 22, and thus, the wind flowing out from the first outlet 23 does not meet. Because the wind that flows out from every group second air outlet 24 all draws close to the axis of wind chamber 22, consequently, the wind that flows out from every group second air outlet 24 can intersect near the axis of wind chamber 22, and the wind after the intersection can continue along the direction motion that deviates from the axis, consequently, the second air curtain is including the part air curtain before the intersection and the part air curtain after the intersection.
When the pollution control device works, the first air outlet 23 is arranged on the outer ring of the second air outlet 24, and the plurality of first air outlets 23 and the plurality of second air outlets 24 are discontinuous structures, so that air flowing out of the second air outlets 23 can flow out of the discontinuous parts of at least two adjacent first air curtains after meeting. Through the position of rationally setting up first air outlet 23 and second air outlet 24, can form first air curtain and second air curtain at pollution control device, and keep away from one side of air cavity 22 at first air curtain and second air curtain and form half confined space 30 to block the pollutant and get into half confined space 30 from one side that first air curtain and second air curtain are close to air cavity 22. When a product to be protected exists on one side of the semi-closed space 30, which is far away from the air cavity 22, the surface of the product to be protected, which is close to the air cavity 22, and the semi-closed space 30 form a closed space together, so that pollutants can be prevented from entering the closed space, and the surface of the product to be protected, which is close to the air cavity 22, is protected. The contaminants may include, among other things, chemical molecules and particulate matter.
The pollution control device that this embodiment provided, through setting up two at least first air outlets and a set of at least second air outlets, every group second air outlet includes two second air outlets for the axis symmetry of wind chamber, and when pollution control device worked, the wind that gets into the wind chamber from the income wind gap can form a semi-enclosed space after flowing out from first air outlet and second air outlet, and the existence of wind can prevent the pollutant to get into in the semi-enclosed space.
FIG. 4 is a schematic structural diagram of a pollution control device provided by an embodiment of the present invention; FIG. 5 is an exploded view of the pollution control device of FIG. 4 provided by an embodiment of the present invention; fig. 6 is an exploded view of yet another pollution control device of fig. 4 according to an embodiment of the present invention. Alternatively, referring to fig. 4-6, the wind cavity 22 includes a bottom plate end 20 and a cover plate end 10, the bottom plate end 20 is disposed opposite to the cover plate end 10, and both the bottom plate end 20 and the cover plate end 10 are annular structures and define the wind cavity 22. Alternatively, since the wind chamber 22 is a hollow structure, the wind chamber 22 may be formed between the cover end 10 and the base end 20 by providing the cover end 10 and the base end 20 with a hollow structure. Although the present embodiment exemplarily employs the cover plate end 10 and the base plate end 20 to jointly define the wind cavity 22, it is understood that the wind cavity 22 may be defined by other structures, and the present embodiment is not particularly limited.
Alternatively, the wind chamber 22 may be an annular wind chamber 22. Specifically, in practical applications, the wind cavity 22 may be circular, rectangular, or any other shape; the wind cavity 22 may also be annular, or a plurality of partition structures may be disposed in the annular cavity, so as to form a structure of a plurality of wind cavities 22, and the specific shape of the wind cavity is not limited in this embodiment. For example, when the air cavity 22 is an annular air cavity, only one air inlet 21 needs to be arranged to meet the air inlet requirement; when the air chamber 22 includes a plurality of independent air chambers 22, each air chamber 22 needs to be communicated with at least one air inlet 21 and at least one first air outlet 23 or second air outlet 24.
Referring to fig. 1-6, alternatively, the first air outlet 23 may be disposed on the bottom plate of the bottom plate end 20; the second air outlet 24 may be provided on the inner side of the annular air chamber. Specifically, in order to enable the wind flowing out from the first air outlet 23 and the second air outlet 24 to form the semi-closed space 30, the first air outlet 23 needs to be arranged at the outer ring of the second air outlet 24, so that the first air outlet 23 can be arranged on the bottom plate of the bottom plate end 20, and the second air outlet 24 can be arranged on the inner side surface of the annular air cavity, and the design is beneficial to forming the semi-closed space 30. However, it should be noted that the first air outlet 23 and the second air outlet 24 may also be disposed at other positions of the air cavity 22, and this embodiment is not limited thereto.
Optionally, the number of the first air outlets 23 is equal to that of the second air outlets 24, and the first air outlets 23 and the second air outlets 24 are respectively arranged in a one-to-one correspondence. Specifically, in order to obtain the semi-closed space 30, when the first air outlet 23 and the second air outlet 24 are provided, the positions and the sizes of the first air outlet 23 and the second air outlet 24 need to be determined in a simulation mode. When the existing simulation technology is used, if the number of the first air outlet 23 and the second air outlet 24 is equal, the simulation process is relatively simple, and the arrangement of the first air outlet 23 and the second air outlet 24 is also relatively simple. However, it is understood that the number of the first air outlet 23 and the second air outlet 24 may also be unequal, and this embodiment does not limit this.
Exemplarily, when the number of the first air outlets 23 and the number of the second air outlets 24 are 2, the wind flowing out from the two second air outlets 24 may form an upward-rotating air path after meeting near the central axis of the air cavity 22, and respectively flow in a direction away from the central axis, and finally flow out from an area between the at least two first air outlets 23.
The first air outlets 23 and the second air outlets 24 are respectively arranged in a one-to-one correspondence manner, that is, a projection of a graph formed by the centers of the second air outlets 24 and the annular air cavity 22 along the central axis direction of the air cavity 22 is completely covered by a projection of a graph formed by the centers of the first air outlets 23 and the air cavity 22 corresponding to the second air outlets 24 along the central axis of the air cavity 22. That is, the proportion of the first outlet 23 to the circumference of the air cavity 22 is greater than the proportion of the second outlet 24 to the circumference of the air cavity 22. The purpose that first air outlet 23 and second air outlet 24 respectively one-to-one set up is, make the part after the second air curtain that second air outlet 24 formed intersects intersect with the marginal portion of first air curtain to ensure the formation of semi-enclosed space 30, and then prevent that the pollutant from getting into semi-enclosed space 30 through first air curtain and second air curtain. Optionally, the number of the first air outlet 23 and the second air outlet 24 may also be different, which is not specifically limited in this embodiment.
Optionally, the second air outlet 24 includes a first slice 241 and a second slice 242 that are arranged in parallel, fixed ends of the first slice 241 and the second slice 242 are both connected to an inner side surface of the annular air cavity, and a direction from the fixed end to a free end of the first slice 241 and the second slice 242 is an air outlet direction of the second air outlet 24. Specifically, when the pollution control device is in operation, the air flows out from between the first slice 241 and the second slice 242 of the second air outlet 24 and forms a second air curtain; when first section 241 and second section 242 were parallel arrangement, can guarantee that the second air curtain is parallel state on its extending direction, avoided the second air curtain to disperse or assemble on extending direction to form the comparatively even second air curtain of thickness. It can be understood that the first slice 241 or the second slice 242 points to the free end along the fixed end, which is the air outlet direction of the second air outlet 24. In order to ensure the formation of the upper air rotating path, the air outlet direction of the second air outlet 24 may be set according to actual needs, and a specific setting method will be described in the following embodiments.
Optionally, the cover plate end 10 and the base plate end 20 are assembled as two separate structures, and the second air outlet 24 is disposed at the joint of the base plate end 20 and the cover plate end 10; the first slice 241 is fixed to the cover plate end 10 and the second slice 242 is fixed to the base plate end 20; alternatively, the first cut 241 is secured to the base end 20 and the second cut 242 is secured to the cover end 10. Specifically, if the cover end 10 and the base end 20 are two separate structures, the first cut piece 241 and the cover end 10 may be a unitary structure, and the second cut piece 242 and the base end 20 may be a unitary structure. The first and second cut-outs 241, 242 form the second outlet 24 when the cover and base plate ends 10, 20 are brought together to form the annular air chamber. Alternatively, the first slice 241 may be disposed separately from the cover end 10, and the second slice 242 may be disposed separately from the base end 20, which is not particularly limited in this embodiment
Alternatively, the cover end 10 and the base end 20 may be integrally formed. Specifically, when the cover plate end 10 and the base plate end 20 are integrally formed, a 3D printing technology may be selected to integrally print the whole pollution control device, or another integrally forming method may be selected, and the embodiment is not particularly limited.
Optionally, the first included angle α is 0-15 °. Specifically, the wind flowing out of the first wind outlet 23 may be parallel to the central axis of the wind cavity 22, or may form a certain included angle with the central axis of the wind cavity 22, and the flow direction is away from the central axis. For example, when the included angle α between the first air outlet 23 and the central axis of the air cavity 22 is 10 °, if there is a product to be protected on the side where the first air curtain and the second air curtain of the pollution control device are located, the first air curtain can be prevented from contacting the product to be protected as much as possible, and the pollutant carried in the first air curtain is prevented from polluting the product to be protected.
alternatively, second included angle β may be 30 ° -60 °. Specifically, the first air curtain and the second air curtain are relatively easy to cooperate to form the semi-enclosed space 30 only after the upper swirling path is formed. Therefore, if the value of the second included angle β is too large, the difficulty in forming the upward-spinning gas path is large, which results in a large difficulty in forming the semi-closed space 30; if the value of the second included angle β is too small, the distance between the intersection of the two second air curtains and the transverse tangent plane of the annular air cavity is large, and when the pollution control device is used together with other equipment, a large distance needs to be set between the pollution control device and the other equipment, so that the total occupied space of the pollution control device and the other equipment is large. Thus, second included angle β may alternatively range from 30 ° to 60 °.
Optionally, the annular wind cavity may also be a circular ring wind cavity. It should be noted that the contamination control device provided in this embodiment is usually disposed on one side of the optical lens, and is used to protect the mirror surface on the side of the optical lens close to the contamination control device from contamination. It can be understood that most common optical lenses are circular, and therefore, in order to better protect the optical lenses, the annular air cavity can be set to be an annular air cavity. It will be appreciated that the optical lens may also be of other shapes, such as rectangular, trapezoidal or other irregular shapes, in which case the annular wind chamber may also be provided in the same shape as the optical lens to enhance the pollution control capability of the pollution control device, in existing or future technologies.
FIG. 7 is a schematic view of a tangential air curtain formed by a pollution control device provided by an embodiment of the present invention. Optionally, referring to fig. 7, the at least two first air outlets 23 are symmetrically disposed with respect to a circular central axis of the circular air cavity 25; the at least two first air outlets 23 are located on the bottom plate of the bottom plate end 20 and close to one side of the circle center of the circular air cavity 25. Specifically, when the annular air chamber is circular, if the first air outlet 23 is arranged to be symmetrical with respect to the circular mandrel 32 of the annular air chamber 25 (it should be noted that the annular air chamber 25 has numerous circular mandrels, and the circular mandrel 32 is only one of them), the width of each first air curtain and the width of each second air curtain at the junction 33 can be the same, and a symmetrical and stable air curtain structure is formed around the whole pollution control device. It will be appreciated that figure 7 is a top view of the pollution control device, from figure 7 the second curtain can be seen, whereas when the second included angle is 0, the first curtain cannot be seen from figure 7. For convenience of description of the first air curtain and the second air curtain, the first air curtain may be regarded as being formed of a plurality of air curtain lines 31, and similarly, the second air curtain may be regarded as being formed of a plurality of air curtain lines 31. It should be noted that, when the annular air cavity is a regular pattern with a symmetry axis, such as a rectangle, the first air outlets 23 may also be symmetrically disposed.
It will be appreciated that when the pollution control device is used to prevent the optical lens from being polluted, the first air curtain formed by the first air outlet 23 needs to be near the edge of the outer side of the optical lens; meanwhile, in order to ensure the smoothness of the optical path, the diameter of the circular air cavity 25 close to the circle center needs to be set to be larger as much as possible. When the diameter of the circular air cavity 25 is large, the first air outlet 23 is disposed at a side close to the center of the circular air cavity 25, and the first air curtain formed by the first air outlet 23 can be located at a position close to the edge of the optical lens.
optionally, a projection of a graph formed by the centers of the second air outlets 24 and the circular annular air cavity 25 along the circular central axis of the circular annular air cavity 25 is completely covered by a projection of a graph formed by the centers of the first air outlets 24 and the circular annular air cavity 25 corresponding to the second air outlets 23 along the circular central axis of the circular annular air cavity 25. Specifically, the graph formed by the centers of the second air outlet 24 and the circular air cavity 25 is a sector which forms a certain angle with the cross section of the circular air cavity 25, and according to the geometric projection relationship, the projection of the graph formed by the centers of the second air outlet 24 and the circular air cavity 25 along the circular central axis of the circular air cavity 25 is still a sector; similarly, the projection of the graph formed by the centers of the first air outlet 24 and the circular air cavity 25 along the circular central axis of the circular air cavity 25 is also fan-shaped. Therefore, the extension of each second air outlet 24 in the radial direction of the circular air cavity 25 is smaller than the extension of the first air outlet 23 corresponding to the second air outlet 24 in the radial direction of the circular air cavity 25.
Optionally, the length of the at least two first air outlets 23 accounts for 60% -85% of the circumference of the annular air cavity 25; the length of the at least one group of second air outlets 24 accounts for 55-80% of the circumference of the annular air cavity 25. Specifically, when the number of the first air outlets 23 and the number of the second air outlets 24 are 2, the number of the intersections 33 of the vertical air curtain and the tangential air curtain is only 4, and therefore, the ratio of the lengths of the two first air outlets 23 to the circumference of the circular air cavity 25 and the ratio of the lengths of the two second air outlets 24 to the circumference of the circular air cavity 25 can both take relatively small values. For example, when the number of the first air outlets 23 and the number of the second air outlets 24 are both 2, the ratio of the lengths of the two first air outlets 23 to the circumference of the circular air cavity 25 may be 75%; the length of the two second air outlets 24 accounts for 60% of the circumference of the circular air cavity 25. When the number of the first air outlets 23 and the number of the second air outlets 24 are greater than 2, more intersections 33 of the first air curtain and the second air curtain may appear, and therefore, in order to ensure that the first air curtain and the second air curtain can form the semi-closed space 30, the proportion of the sum of the lengths of all the first air outlets 23 to the circumference of the circular air cavity 25 and the proportion of the sum of the lengths of all the second air outlets 24 to the circumference of the circular air cavity 25 need to be increased appropriately.
optionally, the air inlet 21 is arranged on the outer side of the annular air chamber. Specifically, when the region between the inner side of the annular air cavity and the center of the annular air cavity needs to be transparent, the air inlet 21 needs to be arranged on the outer side surface of the annular air cavity. When the region between the inner side of the annular air cavity and the center of the annular air cavity does not need to consider light transmission, the air inlet 21 may be disposed on the inner side surface or the outer side surface of the annular air cavity as required, which is not specifically limited in this embodiment.
the embodiment also provides an objective lens system. Fig. 8 is a schematic structural diagram of an objective lens system according to an embodiment of the present invention. Alternatively, referring to fig. 1 to 8, the objective lens system provided in this embodiment includes the contamination control device and the objective lens group provided in any embodiment; the objective lens group comprises at least one objective lens, wherein the objective lens close to the contamination control device is a first objective lens 40, and the objective lens system is capable of allowing the optical path to pass through the contamination control device to reach the first objective lens 40; the cover plate end 10 and the base plate end 20 are arranged in parallel with the first objective lens 40, and the cover plate end 10 is positioned on one side of the base plate end 20 far away from the first objective lens 40; the contamination control means serves to protect the first objective lens 40 from contamination.
In particular, if the first objective lens 40 is circular, the wind chamber 22 also needs to be correspondingly arranged in a circular shape. The first outlet 23 and the second outlet 24 may form a first air curtain and a second air curtain, respectively. The first air curtain, the second air curtain and the first objective lens 40 can jointly form the closed space 34, and the mirror surface of the first objective lens 40 on the side close to the pollution control device is positioned in the closed space 34, so that the contact with pollutants from the upper part of the mirror surface of the first objective lens 40 on the side close to the pollution control device can be avoided, and the mirror surface of the first objective lens 40 on the side close to the pollution control device is protected from being polluted.
the objective system that this embodiment provided, through set up pollution control device in one side of first objective, pollution control device is last to set up two at least first air outlets and a set of at least second air outlet, every group second air outlet includes two second air outlets symmetrical for the axis of wind chamber, when objective system during operation, the wind that gets into the wind chamber from the income wind gap, can form the enclosure space with first objective together after flowing out from first air outlet and second air outlet, can prevent the pollutant from getting into the enclosed area, thereby the mirror surface that the protection is arranged in one side of first objective in the enclosure space and is close to pollution control device is not contaminated.
Alternatively, the face of the first objective lens 40 adjacent to the pollution control device may be a concave mirror face. Specifically, compared with other structures, the second air curtain is easier to form an upward-rotating air path on the concave mirror surface, and the upward-rotating air path can cooperate with the first air curtain and the first objective lens 40 to form the enclosed space 34, so that pollutants are prevented from entering the enclosed space 34. It should be noted that the mirror surface of the first objective lens 40 provided in this embodiment on the side close to the pollution control device may also be a planar structure or a convex structure.
The embodiment also provides a photoetching machine device. Fig. 9 is a block diagram of a lithographic apparatus according to an embodiment of the present invention, and referring to fig. 9, the lithographic apparatus 40 includes an objective system 41 according to any embodiment.
the photoetching machine equipment provided by the embodiment is characterized in that a pollution control device is arranged on one side of a first objective lens of an objective lens system, at least two first air outlets and at least one group of second air outlets are arranged on the pollution control device, each group of second air outlets comprises two second air outlets which are symmetrical relative to the central axis of an air cavity, when the photoetching machine equipment works, air entering the air cavity from an air inlet can form a closed space together with the first objective lens after flowing out from the first air outlets and the second air outlets, pollutants can be prevented from entering the closed area, and therefore the mirror surface of one side, close to the pollution control device, of the first objective lens in the closed space is protected from being polluted.
Based on the same inventive concept, the present embodiment further provides a pollution control method, and reference may be made to the pollution control device provided in the embodiment of the present invention for technical details not described in detail in the present embodiment. Fig. 10 is a flow chart of a pollution control method provided in the present embodiment of the invention, which can be performed by using the pollution control device provided in any one of the above embodiments. The pollution control device comprises at least one air cavity, wherein the air cavity is provided with at least one air inlet, at least two first air outlets and at least one group of second air outlets. As shown in fig. 10, the pollution control method includes:
Step 101, introducing wind into at least one wind cavity from at least one wind inlet.
specifically, when the pollution control device is required to protect the surface to be protected of the product to be protected, the air source device matched with the pollution control device can be used for introducing air into the air cavity through the air inlet of the pollution control device. It should be noted that each wind chamber needs to include at least one wind inlet for allowing wind to enter the wind chamber.
102, forming a first air curtain by air through at least two first air outlets; the wind passes through at least one group of second air outlets to form a second air curtain; each group of second air curtains comprises two second air curtains which are symmetrical relative to the central axis of the air cavity; the extending direction of the first air curtain is far away from the center of the at least one air cavity, and a third included angle is formed between the extending direction of the first air curtain and the central axis of the at least one air cavity; an intersection line formed by the intersection of each group of second air curtains is intersected with the central axis of at least one air cavity and forms a fourth included angle with the central axis; the included angle between the first air curtain and the second air curtain is less than 90 degrees.
specifically, the air entering the air cavity from the air inlet can flow out through the at least two first air outlets or the at least one group of second air outlets, and forms at least two first air curtains and at least two second air curtains respectively.
and 103, the first air curtain and the second air curtain are matched to use, so that the surface to be protected is not polluted.
Specifically, the first air curtain, the second air curtain and the surface to be protected of the product to be protected can form a closed space, and then pollutants are prevented from polluting the surface to be protected through the first air curtain and the second air curtain.
According to the pollution control method provided by the embodiment, the air is introduced into the air cavity from the at least one air inlet, the air flows out from the at least two first air outlets or the at least one group of second air outlets and forms the first air curtain and the second air curtain respectively, and a semi-closed space can be formed by the air flowing out from the first air curtain and the second air curtain and the surface to be protected, so that pollutants are prevented from entering the semi-closed space.
Alternatively, the third included angle may be 0-15 °. Optionally, the third included angle is an included angle formed by the first air curtain formed by the air flowing out from the first air outlet and the central axis of the air cavity, so the third included angle should be equal to the first included angle, and the numerical value of the first included angle can refer to the embodiment corresponding to the pollution control device.
Alternatively, the fourth included angle may be 30-60 °. Optionally, the fourth included angle is an included angle formed by the second air curtain formed by the air flowing out of the second air outlet and the central axis of the air cavity, so the fourth included angle should be equal to the second included angle, and the numerical value of the second included angle can refer to the embodiment corresponding to the pollution control device.
Optionally, the second air curtain is located between the air cavity and the surface to be protected; each group of second air curtains are intersected between the surface to be protected and the air cavity and form upward whirling airflow. For example, referring to fig. 8, when the surface to be protected is the first objective lens 40, in order to enable the first air curtain, the second air curtain and the first objective lens 40 to form the enclosed space 34, it is necessary to ensure that at least one group of the second air curtains can meet and form the upward whirling airflow. To ensure that the upward vortex is formed, it is necessary to ensure that the wind exiting the second outlet 24 meets between the pollution control device and the first objective 40, i.e. the second curtain is located between the wind chamber and the surface to be protected.
Alternatively, the surface to be protected may be concave. Particularly, when the surface to be protected is a concave surface, the upward vortex flow is more easily formed by the wind flowing out of each group of second air outlets.
The embodiment also provides a photoetching method of the photoetching machine equipment. FIG. 11 is a flowchart of a lithographic method of a lithographic apparatus according to an embodiment of the invention, the lithographic method including a contamination control method and a contamination control device according to any of the embodiments described above. The lithographic apparatus includes a contamination control device for protecting a mirror surface of the objective lens group closest to the contamination control device from contamination, and an objective lens group.
As shown in fig. 11, the lithography method of the lithography apparatus includes:
Step 201, starting the photoetching machine equipment.
specifically, before starting the lithography, the lithography apparatus needs to be first turned on for preheating.
Step 202, providing wind for a pollution control device.
Specifically, in order to prevent the pollutants from polluting the objective lens group, before starting photoetching, air needs to be supplied to the pollution control device so that the pollution control device forms a first air curtain and a second air curtain; the first air curtain, the second air curtain and the objective lens group are matched to form a closed space, so that pollutants can be prevented from entering the closed space, and the condition that the mirror surface of the objective lens group closest to the pollution control device is not polluted is avoided.
Step 203, start exposure work.
Specifically, after the contamination prevention work is prepared, the exposure work is started.
And step 204, stopping supplying the wind for the pollution control device after the exposure work is finished.
Specifically, after the pollution control device finishes the photoetching work for a period of time, the air supply to the pollution control device is stopped.
Step 205, the lithography machine equipment is shut down.
specifically, after the supply of the wind to the pollution control device is stopped, the lithography apparatus may be turned off to stop the operation of the lithography apparatus.
It is to be noted that the foregoing is only illustrative of the preferred embodiments of the present invention and the technical principles employed. It will be understood by those skilled in the art that the present invention is not limited to the particular embodiments described herein, but is capable of various obvious changes, rearrangements and substitutions as will now become apparent to those skilled in the art without departing from the scope of the invention. Therefore, although the present invention has been described in greater detail by the above embodiments, the present invention is not limited to the above embodiments, and may include other equivalent embodiments without departing from the spirit of the present invention, and the scope of the present invention is determined by the scope of the appended claims.

Claims (24)

1. A pollution control device is characterized by comprising at least one air cavity, wherein the air cavity is provided with at least one air inlet, at least two first air outlets and at least one group of second air outlets;
Each group of the second air outlets comprises two second air outlets which are symmetrical relative to the central axis of the air cavity;
The first air outlet is arranged on the outer ring of the second air outlet;
the air outlet direction of the first air outlet is back to the center of the at least one air cavity, and a first included angle is formed between the air outlet direction of the first air outlet and the central axis of the at least one air cavity; the air outlet direction of the second air outlet faces to the center of the at least one air cavity, and a second included angle is formed between the air outlet direction of the second air outlet and the central axis; the included angle between the air outlet direction of the first air outlet and the air outlet direction of the second air outlet is smaller than 90 degrees.
2. The pollution control device of claim 1, wherein the wind chamber includes a floor end and a cover end, the floor end being disposed opposite the cover end, the floor end and the cover end each being of an annular configuration and defining the wind chamber.
3. a pollution control device as claimed in claim 2, wherein said air chamber is an annular air chamber.
4. The pollution control device of claim 3, wherein the first outlet vent is disposed on the floor at the floor end; the second air outlet is arranged on the inner side surface of the annular air cavity.
5. the pollution control device according to claim 3, wherein the first air outlets and the second air outlets are equal in number and are arranged in a one-to-one correspondence with each other.
6. the pollution control device of claim 3, wherein the second air outlet comprises a first slice and a second slice which are arranged in parallel, fixed ends of the first slice and the second slice are both connected with an inner side surface of the annular air cavity, and a direction from the fixed ends to a free end of the first slice and the second slice is an air outlet direction of the second air outlet.
7. The pollution control device of claim 2, wherein the cover end and the base end are assembled as two separate structures, and the second outlet is disposed at a junction of the base end and the cover end;
the first slice is fixed at the cover plate end, and the second slice is fixed at the bottom plate end; or the first slice is fixed at the bottom plate end, and the second slice is fixed at the cover plate end.
8. The pollution control device of claim 2, wherein the cover end and the base end are integrally formed.
9. the pollution control device of claim 1, wherein the first included angle is 0-15 °.
10. The pollution control device of claim 1, wherein the second included angle is between 30 ° and 60 °.
11. The pollution control device of claim 3, wherein the annular wind chamber is a toroidal wind chamber.
12. The pollution control device according to claim 11, wherein the at least two first air outlets are symmetrically disposed with respect to a circular central axis of the annular air chamber;
the at least two first air outlets are positioned on the bottom plate at the bottom plate end and close to one side of the circle center of the circular air cavity.
13. The pollution control device according to claim 11, wherein a projection of a graph formed by each of the second air outlets and a center of the circular air cavity along a circular center axis of the circular air cavity is completely covered by a projection of a graph formed by each of the first air outlets corresponding to the second air outlets and a center of the circular air cavity along a circular center axis of the circular air cavity.
14. The pollution control device according to claim 11, wherein the length of the at least two first air outlets accounts for 60% -85% of the circumference of the annular air cavity;
The length of the at least one group of second air outlets accounts for 55-80% of the perimeter of the annular air cavity.
15. The pollution control device of claim 2, wherein the air inlet is disposed on an outer side of the air chamber.
16. An objective lens system comprising a contamination control device according to any one of claims 1 to 15, and an objective lens group;
The objective lens group comprises at least one objective lens, wherein the objective lens close to the contamination control device is a first objective lens, and the objective lens system can allow the light path to pass through the contamination control device to reach the first objective lens;
The cover plate end and the bottom plate end are arranged in parallel with the first objective lens, and the cover plate end is positioned on one side of the bottom plate end far away from the first objective lens; the contamination control device is for protecting the first objective lens from contamination.
17. The objective system of claim 16, wherein a face of the first objective lens near the contamination control device is a concave mirror face.
18. A lithographic apparatus comprising an objective system according to claim 16 or 17.
19. A pollution control method is characterized by comprising at least one air cavity, wherein the air cavity is provided with at least one air inlet, at least two first air outlets and at least one group of second air outlets; the method comprises the following steps:
introducing wind into the at least one wind cavity from the at least one wind inlet;
Wind passes through the at least two first air outlets to form a first air curtain; the wind passes through the at least one group of second air outlets to form a second air curtain; wherein each set of the second air curtains comprises two second air curtains which are symmetrical relative to the central axis of the air cavity; the extending direction of the first air curtain is far away from the center of the at least one air cavity, and a third included angle is formed between the extending direction of the first air curtain and the central axis of the at least one air cavity; each group of second air curtains forms a junction line after the second air curtains are joined, the junction line is intersected with the central axis of the at least one air cavity, and a fourth included angle is formed between the junction line and the central axis; the included angle between the first air curtain and the second air curtain is less than 90 degrees;
The first air curtain and the second air curtain are matched for use, so that the surface to be protected is not polluted.
20. The pollution control method of claim 19, wherein the third included angle is 0-15 °.
21. The pollution control method according to claim 19, wherein the fourth included angle is 30-60 °.
22. The pollution control method of claim 19, wherein the second air curtain is positioned between the air chamber and the surface to be protected;
and each group of second air curtains is intersected between the surface to be protected and the air cavity and forms upward whirling airflow.
23. The pollution control method according to claim 19, wherein the surface to be protected is a concave surface.
24. A lithographic method of a lithographic apparatus comprising the contamination control method of any one of claims 19 to 23; the photoetching machine equipment comprises a pollution control device and an objective lens group, wherein the pollution control device is used for protecting the mirror surface of the objective lens group, which is closest to the pollution control device, from being polluted;
The photoetching method comprises the following steps:
Starting the photoetching machine equipment;
Providing wind to the pollution control device;
starting exposure work;
stopping supplying air to the pollution control device after the exposure operation is finished;
And closing the photoetching machine equipment.
CN201810548633.4A 2018-05-31 2018-05-31 Pollution control device and method, objective system and photoetching machine equipment Active CN110554570B (en)

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US20160202474A1 (en) * 2013-07-31 2016-07-14 1317442 Alberta Ltd. Sensor guard for using internal lens cleaning bulb blower on digital reflex camera, and method of use thereof
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