CN110546310B - 金属电沉积用的阴极板及其制造方法 - Google Patents

金属电沉积用的阴极板及其制造方法 Download PDF

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Publication number
CN110546310B
CN110546310B CN201880026566.8A CN201880026566A CN110546310B CN 110546310 B CN110546310 B CN 110546310B CN 201880026566 A CN201880026566 A CN 201880026566A CN 110546310 B CN110546310 B CN 110546310B
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China
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conductive film
cathode plate
metal plate
plate
metal
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Chinese (zh)
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CN110546310A (zh
Inventor
渡边宽人
松冈逸见
仙波祐辅
小林宙
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Sumitomo Metal Mining Co Ltd
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Sumitomo Metal Mining Co Ltd
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    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D17/00—Constructional parts, or assemblies thereof, of cells for electrolytic coating
    • C25D17/16—Apparatus for electrolytic coating of small objects in bulk
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23F—NON-MECHANICAL REMOVAL OF METALLIC MATERIAL FROM SURFACE; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL; MULTI-STEP PROCESSES FOR SURFACE TREATMENT OF METALLIC MATERIAL INVOLVING AT LEAST ONE PROCESS PROVIDED FOR IN CLASS C23 AND AT LEAST ONE PROCESS COVERED BY SUBCLASS C21D OR C22F OR CLASS C25
    • C23F1/00—Etching metallic material by chemical means
    • C23F1/02—Local etching
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23F—NON-MECHANICAL REMOVAL OF METALLIC MATERIAL FROM SURFACE; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL; MULTI-STEP PROCESSES FOR SURFACE TREATMENT OF METALLIC MATERIAL INVOLVING AT LEAST ONE PROCESS PROVIDED FOR IN CLASS C23 AND AT LEAST ONE PROCESS COVERED BY SUBCLASS C21D OR C22F OR CLASS C25
    • C23F1/00—Etching metallic material by chemical means
    • C23F1/02—Local etching
    • C23F1/04—Chemical milling
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25C—PROCESSES FOR THE ELECTROLYTIC PRODUCTION, RECOVERY OR REFINING OF METALS; APPARATUS THEREFOR
    • C25C1/00—Electrolytic production, recovery or refining of metals by electrolysis of solutions
    • C25C1/06—Electrolytic production, recovery or refining of metals by electrolysis of solutions or iron group metals, refractory metals or manganese
    • C25C1/08—Electrolytic production, recovery or refining of metals by electrolysis of solutions or iron group metals, refractory metals or manganese of nickel or cobalt
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25C—PROCESSES FOR THE ELECTROLYTIC PRODUCTION, RECOVERY OR REFINING OF METALS; APPARATUS THEREFOR
    • C25C7/00—Constructional parts, or assemblies thereof, of cells; Servicing or operating of cells
    • C25C7/02—Electrodes; Connections thereof
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D1/00—Electroforming
    • C25D1/003—3D structures, e.g. superposed patterned layers
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D1/00—Electroforming
    • C25D1/20—Separation of the formed objects from the electrodes with no destruction of said electrodes
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D17/00—Constructional parts, or assemblies thereof, of cells for electrolytic coating
    • C25D17/10—Electrodes, e.g. composition, counter electrode
    • C25D17/12—Shape or form

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  • Chemical & Material Sciences (AREA)
  • Metallurgy (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Organic Chemistry (AREA)
  • Electrochemistry (AREA)
  • General Chemical & Material Sciences (AREA)
  • Mechanical Engineering (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Electrolytic Production Of Metals (AREA)
  • Milling Processes (AREA)
  • ing And Chemical Polishing (AREA)
CN201880026566.8A 2017-05-29 2018-03-29 金属电沉积用的阴极板及其制造方法 Active CN110546310B (zh)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2017105796A JP6500937B2 (ja) 2017-05-29 2017-05-29 金属電着用陰極板及びその製造方法
JP2017-105796 2017-05-29
PCT/JP2018/013187 WO2018220979A1 (ja) 2017-05-29 2018-03-29 金属電着用陰極板及びその製造方法

Publications (2)

Publication Number Publication Date
CN110546310A CN110546310A (zh) 2019-12-06
CN110546310B true CN110546310B (zh) 2020-09-15

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EP (1) EP3633074B1 (enExample)
JP (1) JP6500937B2 (enExample)
CN (1) CN110546310B (enExample)
CA (1) CA3064525C (enExample)
WO (1) WO2018220979A1 (enExample)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP7188216B2 (ja) * 2019-03-25 2022-12-13 住友金属鉱山株式会社 金属電着用の陰極板の製造方法
JP7238524B2 (ja) * 2019-03-25 2023-03-14 住友金属鉱山株式会社 金属電着用の陰極板
JP7188217B2 (ja) * 2019-03-25 2022-12-13 住友金属鉱山株式会社 金属電着用の陰極板の製造方法
JP7188219B2 (ja) * 2019-03-25 2022-12-13 住友金属鉱山株式会社 金属電着用の陰極板
JP7188218B2 (ja) * 2019-03-25 2022-12-13 住友金属鉱山株式会社 金属電着用の陰極板
JP2021095594A (ja) * 2019-12-13 2021-06-24 住友金属鉱山株式会社 ボタン型電気ニッケルの製造方法

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN1449457A (zh) * 2000-06-30 2003-10-15 霍尼韦尔国际公司 用于加工金属的方法和设备以及由此生产出的金属
CN102149854A (zh) * 2008-09-09 2011-08-10 斯提奥摩有限公司 阴极和阴极形成方法
CN106661745A (zh) * 2014-07-15 2017-05-10 迪诺拉永久电极股份有限公司 电解用阴极和电解用阴极的制造方法

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3668081A (en) * 1971-03-17 1972-06-06 Int Nickel Co Production of electrolytic metal
GB1573449A (en) * 1976-04-01 1980-08-20 Falconbridge Nickel Mines Ltd Reusable electrolysis cathode
US4040915A (en) * 1976-06-15 1977-08-09 The International Nickel Company, Inc. Method for producing regular electronickel or S nickel rounds from electroplating baths giving highly stressed deposits
JPS6038678Y2 (ja) * 1981-05-15 1985-11-19 住友金属鉱山株式会社 金属電着用母板
JPH10317197A (ja) * 1997-05-14 1998-12-02 Sumitomo Metal Mining Co Ltd メッキ用電気ニッケル、その製造用陰極板及び製造方法
KR101664540B1 (ko) * 2014-04-02 2016-10-25 오씨아이 주식회사 전해 도금용 전극 및 이를 포함하는 전해 도금 장치

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN1449457A (zh) * 2000-06-30 2003-10-15 霍尼韦尔国际公司 用于加工金属的方法和设备以及由此生产出的金属
CN102149854A (zh) * 2008-09-09 2011-08-10 斯提奥摩有限公司 阴极和阴极形成方法
CN106661745A (zh) * 2014-07-15 2017-05-10 迪诺拉永久电极股份有限公司 电解用阴极和电解用阴极的制造方法

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Publication number Publication date
JP2018199857A (ja) 2018-12-20
CA3064525A1 (en) 2018-12-06
CA3064525C (en) 2020-03-24
CN110546310A (zh) 2019-12-06
JP6500937B2 (ja) 2019-04-17
EP3633074A1 (en) 2020-04-08
EP3633074B1 (en) 2022-10-05
EP3633074A4 (en) 2021-03-10
WO2018220979A1 (ja) 2018-12-06

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