CN110536534B - 一种匹配箱的阻抗调节方法、装置及射频电源系统 - Google Patents
一种匹配箱的阻抗调节方法、装置及射频电源系统 Download PDFInfo
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- CN110536534B CN110536534B CN201910844116.6A CN201910844116A CN110536534B CN 110536534 B CN110536534 B CN 110536534B CN 201910844116 A CN201910844116 A CN 201910844116A CN 110536534 B CN110536534 B CN 110536534B
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- capacitor
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- inductance
- inductor
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- 238000000034 method Methods 0.000 title claims abstract description 48
- 239000003990 capacitor Substances 0.000 claims abstract description 174
- 238000005259 measurement Methods 0.000 claims description 35
- 238000004590 computer program Methods 0.000 claims description 3
- 238000010586 diagram Methods 0.000 description 8
- 238000005457 optimization Methods 0.000 description 7
- 238000004422 calculation algorithm Methods 0.000 description 3
- 230000009286 beneficial effect Effects 0.000 description 1
- FFBHFFJDDLITSX-UHFFFAOYSA-N benzyl N-[2-hydroxy-4-(3-oxomorpholin-4-yl)phenyl]carbamate Chemical compound OC1=C(NC(=O)OCC2=CC=CC=C2)C=CC(=C1)N1CCOCC1=O FFBHFFJDDLITSX-UHFFFAOYSA-N 0.000 description 1
- 230000005540 biological transmission Effects 0.000 description 1
- 238000004364 calculation method Methods 0.000 description 1
- 238000005229 chemical vapour deposition Methods 0.000 description 1
- 238000010276 construction Methods 0.000 description 1
- 230000005611 electricity Effects 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 230000006698 induction Effects 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 238000001020 plasma etching Methods 0.000 description 1
- 238000000623 plasma-assisted chemical vapour deposition Methods 0.000 description 1
- 238000004544 sputter deposition Methods 0.000 description 1
Classifications
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
- H01J37/32082—Radio frequency generated discharge
- H01J37/32174—Circuits specially adapted for controlling the RF discharge
- H01J37/32183—Matching circuits
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
- H05H1/00—Generating plasma; Handling plasma
- H05H1/24—Generating plasma
- H05H1/46—Generating plasma using applied electromagnetic fields, e.g. high frequency or microwave energy
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
- H05H2242/00—Auxiliary systems
- H05H2242/20—Power circuits
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- Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Plasma & Fusion (AREA)
- Electromagnetism (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Chemical & Material Sciences (AREA)
- Analytical Chemistry (AREA)
- Measurement Of Resistance Or Impedance (AREA)
- Transmitters (AREA)
Abstract
Description
Claims (9)
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CN201910844116.6A CN110536534B (zh) | 2019-09-06 | 2019-09-06 | 一种匹配箱的阻抗调节方法、装置及射频电源系统 |
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CN201910844116.6A CN110536534B (zh) | 2019-09-06 | 2019-09-06 | 一种匹配箱的阻抗调节方法、装置及射频电源系统 |
Publications (2)
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CN110536534A CN110536534A (zh) | 2019-12-03 |
CN110536534B true CN110536534B (zh) | 2024-03-26 |
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CN201910844116.6A Active CN110536534B (zh) | 2019-09-06 | 2019-09-06 | 一种匹配箱的阻抗调节方法、装置及射频电源系统 |
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Families Citing this family (2)
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CN112380797B (zh) * | 2020-11-05 | 2023-03-14 | 中国第一汽车股份有限公司 | 电机建模方法、装置、设备和介质 |
CN114448387B (zh) * | 2021-12-28 | 2022-12-27 | 深圳市恒运昌真空技术有限公司 | 阻抗匹配的调节的方法及阻抗匹配电路 |
Citations (10)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2010504042A (ja) * | 2006-09-13 | 2010-02-04 | アドバンスド エナジー インダストリーズ, インコーポレイテッド | 整合インピーダンス間の切り換えのための装置および方法 |
CN101795120A (zh) * | 2009-01-30 | 2010-08-04 | 株式会社Ntt都科摩 | 多频带匹配电路、以及多频带功率放大器 |
CN103377869A (zh) * | 2012-04-16 | 2013-10-30 | 北京北方微电子基地设备工艺研究中心有限责任公司 | 阻抗匹配方法、阻抗匹配系统及等离子体加工设备 |
CN103873102A (zh) * | 2012-12-10 | 2014-06-18 | 联想(北京)有限公司 | 射频芯片、射频电路以及电子设备 |
CN105069235A (zh) * | 2015-08-13 | 2015-11-18 | 西安电子科技大学 | 提取双频带频率选择表面等效电路参数的方法 |
CN105304444A (zh) * | 2014-07-25 | 2016-02-03 | 细美事有限公司 | 等离子体产生单元和包括该等离子体产生单元的基板处理装置 |
CN107305831A (zh) * | 2016-04-22 | 2017-10-31 | 北京北方华创微电子装备有限公司 | 一种阻抗匹配装置和等离子体处理设备 |
CN108012401A (zh) * | 2016-10-28 | 2018-05-08 | 北京北方华创微电子装备有限公司 | 射频阻抗匹配方法、匹配器和半导体处理装置 |
CN109148250A (zh) * | 2017-06-15 | 2019-01-04 | 北京北方华创微电子装备有限公司 | 阻抗匹配装置和阻抗匹配方法 |
CN109861654A (zh) * | 2017-12-20 | 2019-06-07 | 恩智浦美国有限公司 | 具有阻抗匹配电路的rf功率晶体管及其制造方法 |
Family Cites Families (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US9270248B2 (en) * | 2012-10-12 | 2016-02-23 | Infineon Technologies Ag | Impedance matching network with improved quality factor and method for matching an impedance |
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2019
- 2019-09-06 CN CN201910844116.6A patent/CN110536534B/zh active Active
Patent Citations (11)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2010504042A (ja) * | 2006-09-13 | 2010-02-04 | アドバンスド エナジー インダストリーズ, インコーポレイテッド | 整合インピーダンス間の切り換えのための装置および方法 |
CN101795120A (zh) * | 2009-01-30 | 2010-08-04 | 株式会社Ntt都科摩 | 多频带匹配电路、以及多频带功率放大器 |
CN103377869A (zh) * | 2012-04-16 | 2013-10-30 | 北京北方微电子基地设备工艺研究中心有限责任公司 | 阻抗匹配方法、阻抗匹配系统及等离子体加工设备 |
CN103873102A (zh) * | 2012-12-10 | 2014-06-18 | 联想(北京)有限公司 | 射频芯片、射频电路以及电子设备 |
CN105304444A (zh) * | 2014-07-25 | 2016-02-03 | 细美事有限公司 | 等离子体产生单元和包括该等离子体产生单元的基板处理装置 |
CN105069235A (zh) * | 2015-08-13 | 2015-11-18 | 西安电子科技大学 | 提取双频带频率选择表面等效电路参数的方法 |
CN107305831A (zh) * | 2016-04-22 | 2017-10-31 | 北京北方华创微电子装备有限公司 | 一种阻抗匹配装置和等离子体处理设备 |
CN108012401A (zh) * | 2016-10-28 | 2018-05-08 | 北京北方华创微电子装备有限公司 | 射频阻抗匹配方法、匹配器和半导体处理装置 |
CN109148250A (zh) * | 2017-06-15 | 2019-01-04 | 北京北方华创微电子装备有限公司 | 阻抗匹配装置和阻抗匹配方法 |
CN109861654A (zh) * | 2017-12-20 | 2019-06-07 | 恩智浦美国有限公司 | 具有阻抗匹配电路的rf功率晶体管及其制造方法 |
EP3503387A1 (en) * | 2017-12-20 | 2019-06-26 | NXP USA, Inc. | Rf power transistors with impedance matching circuits, and methods of manufacture thereof |
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Inventor after: Lin Weiqun Inventor after: Yue Weiping Inventor after: Yao Zhiyi Inventor before: Lin Weiqun Inventor before: Yue Weiping Inventor before: Zhang Guidong Inventor before: Yao Zhiyi |
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Country or region after: China Address after: 518102 Room 101, 201, 301, Building B, Functional Support Area, Taohuayuan Zhichuang Town, Tiegang Community, Xixiang Street, Baoan District, Shenzhen, Guangdong Province Applicant after: Shenzhen Hengyunchang Vacuum Technology Co.,Ltd. Address before: 518000 functional supporting area B, Taohuayuan Zhichuang Town, Tiegang community, Xixiang street, Bao'an District, Shenzhen, Guangdong 101201301 Applicant before: SHENZHEN HENGYUNCHANG VACUUM TECHNOLOGY CO.,LTD. Country or region before: China |
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