CN110534463A - A kind of efficient silicon/crystalline silicon heterojunction solar battery silicon chip cleaning device and method - Google Patents
A kind of efficient silicon/crystalline silicon heterojunction solar battery silicon chip cleaning device and method Download PDFInfo
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- CN110534463A CN110534463A CN201910873976.2A CN201910873976A CN110534463A CN 110534463 A CN110534463 A CN 110534463A CN 201910873976 A CN201910873976 A CN 201910873976A CN 110534463 A CN110534463 A CN 110534463A
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- pure water
- solar battery
- spray
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- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 title claims abstract description 67
- 229910052710 silicon Inorganic materials 0.000 title claims abstract description 67
- 239000010703 silicon Substances 0.000 title claims abstract description 67
- 238000004140 cleaning Methods 0.000 title claims abstract description 45
- 238000000034 method Methods 0.000 title claims abstract description 20
- 229910021419 crystalline silicon Inorganic materials 0.000 title claims abstract description 18
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims abstract description 77
- 239000007921 spray Substances 0.000 claims abstract description 40
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 claims abstract description 38
- 229910052757 nitrogen Inorganic materials 0.000 claims abstract description 19
- 239000007788 liquid Substances 0.000 claims description 22
- 239000003344 environmental pollutant Substances 0.000 claims description 6
- 231100000719 pollutant Toxicity 0.000 claims description 6
- 239000000126 substance Substances 0.000 claims description 6
- 230000005587 bubbling Effects 0.000 claims description 3
- 210000002421 cell wall Anatomy 0.000 claims description 3
- 239000012530 fluid Substances 0.000 claims description 3
- 230000002459 sustained effect Effects 0.000 claims description 3
- 238000005406 washing Methods 0.000 abstract description 12
- 238000004519 manufacturing process Methods 0.000 abstract description 8
- 238000006243 chemical reaction Methods 0.000 abstract description 4
- 230000002000 scavenging effect Effects 0.000 description 9
- 229910021417 amorphous silicon Inorganic materials 0.000 description 7
- 235000008216 herbs Nutrition 0.000 description 6
- 210000002268 wool Anatomy 0.000 description 6
- 230000000052 comparative effect Effects 0.000 description 5
- 238000000151 deposition Methods 0.000 description 3
- 230000008021 deposition Effects 0.000 description 3
- 238000000623 plasma-assisted chemical vapour deposition Methods 0.000 description 3
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 description 2
- 210000004027 cell Anatomy 0.000 description 2
- 238000005554 pickling Methods 0.000 description 2
- 239000002351 wastewater Substances 0.000 description 2
- 239000003513 alkali Substances 0.000 description 1
- 230000009286 beneficial effect Effects 0.000 description 1
- 238000012512 characterization method Methods 0.000 description 1
- 238000005229 chemical vapour deposition Methods 0.000 description 1
- 230000003749 cleanliness Effects 0.000 description 1
- 239000013078 crystal Substances 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 238000007599 discharging Methods 0.000 description 1
- 238000009826 distribution Methods 0.000 description 1
- 238000001035 drying Methods 0.000 description 1
- 230000005611 electricity Effects 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 229910021421 monocrystalline silicon Inorganic materials 0.000 description 1
- 238000002161 passivation Methods 0.000 description 1
- 238000005498 polishing Methods 0.000 description 1
- 238000002360 preparation method Methods 0.000 description 1
- 238000007650 screen-printing Methods 0.000 description 1
- 229910052709 silver Inorganic materials 0.000 description 1
- 239000004332 silver Substances 0.000 description 1
- 238000007711 solidification Methods 0.000 description 1
- 230000008023 solidification Effects 0.000 description 1
- 230000009466 transformation Effects 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/02041—Cleaning
- H01L21/02043—Cleaning before device manufacture, i.e. Begin-Of-Line process
- H01L21/02052—Wet cleaning only
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/02041—Cleaning
- H01L21/02057—Cleaning during device manufacture
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/02041—Cleaning
- H01L21/02082—Cleaning product to be cleaned
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67017—Apparatus for fluid treatment
- H01L21/67023—Apparatus for fluid treatment for general liquid treatment, e.g. etching followed by cleaning
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67017—Apparatus for fluid treatment
- H01L21/67028—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like
- H01L21/6704—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for wet cleaning or washing
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67017—Apparatus for fluid treatment
- H01L21/67028—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like
- H01L21/6704—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for wet cleaning or washing
- H01L21/67051—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for wet cleaning or washing using mainly spraying means, e.g. nozzles
Abstract
The present invention relates to a kind of efficient silicon/crystalline silicon heterojunction solar battery silicon chip cleaning device and methods, including overflow launder, upper slot and lower slot setting up and down, the lower part of the upper slot is equipped with inlet tube and air inlet pipe, top is sprayed equipped with pure water, pure water enters overflow passage and spray pipeline, nitrogen enters nitrogen pipeline, the nitrogen pipeline is connect with air inlet pipe, the overflow passage is connect with inlet tube, the spray pipeline and pure water spray connect, fast exhaust casing is equipped in the lower slot, the fast row's lid of the piston rod connection of the fast exhaust casing, the corresponding fast row of upper slot is covered with fast row's mouth.Present invention washing is divided into two steps of pure water overflow and spray, the water for contacting silicon wafer finally is clean new pure water, it solves the problems, such as that silicon wafer surface cleaning is sordid in HJT battery, improves the photoelectric conversion efficiency of HJT solar battery, while stable technique is more suitable for applying to volume production.
Description
Technical field
The present invention relates to photovoltaic industry high-efficiency battery manufacturing technology fields, and in particular to a kind of efficient silicon/crystalline silicon heterojunction sun
It can cell silicon chip cleaning device and method.
Background technique
In HJT solar cell preparation process, making herbs into wool cleaning is the first procedure, prepares good amorphous silicon layer for PECVD
Clean crystal silicon surface is provided, so making herbs into wool cleaning has tremendous influence for the transfer efficiency of HJT battery, wherein water-washing method
It is most important for the height and stability of the efficiency of battery.
For HJT solar battery, making herbs into wool cleaning process is as follows at present: charging → prerinse → rough polishing → washing → making herbs into wool
→ washing → alkali cleaning → washing → amendment → washing → pickling → washing → pickling → washing → drying → discharging, every step function trough
Can all there be a rinsing bowl afterwards, function is cleaned up to the chemicals and pollutant that remain in silicon chip surface in function trough,
Rinsing bowl processing step is that slot can fill water, is then put into slot equipped with the gaily decorated basket of silicon wafer, and then opens and is bubbled and into pure water
Valve carries out being bubbled the movement with pure water overflow, is bubbled after cleaning 1-2 minutes and pure water overflow stops, under gaily decorated basket proposition enters
One slot.
Although this method has fresh pure water to enter, be that can not replace in slot to clean completely in 1-2 minutes
Water, the water in slot has chemicals and pollutant always, so silicon wafer proposes that silicon chip surface still has chemistry when rinsing bowl
Product and pollutant residual, with the increase of cleaning batch, chemicals and pollution concentration in slot increase, and are unfavorable for the cleaning of silicon wafer
Degree if extending scavenging period, and will increase the dosage of pure water, increase manufacturing cost.
Summary of the invention
The purpose of the present invention is to overcome the above shortcomings and to provide a kind of efficient silicon/crystalline silicon heterojunction solar battery silicon wafer is clear
Cleaning device and method, washing are divided into two steps of pure water overflow and spray, and the water for contacting silicon wafer finally is clean new pure water.Not
Increase water consumption and scavenging period, the silicon chip surface after cleaning under the premise of not increasing manufacturing cost is cleaner, solves HJT electricity
The sordid problem of silicon wafer surface cleaning in pond improves the photoelectric conversion efficiency of HJT solar battery, while stable technique is more
It is suitble to apply to volume production.
The object of the present invention is achieved like this:
A kind of efficient silicon/crystalline silicon heterojunction solar battery silicon chip cleaning device, including overflow launder, upper slot setting up and down and lower slot,
The lower part of the upper slot is equipped with inlet tube and air inlet pipe, and top is sprayed equipped with pure water, and pure water enters overflow passage and spray pipeline,
Nitrogen enters nitrogen pipeline, and the nitrogen pipeline is connect with air inlet pipe, and the overflow passage is connect with inlet tube, the spray tube
Road and pure water spray connect, and are equipped with fast exhaust casing in the lower slot, the fast row's lid of the piston rod connection of the fast exhaust casing, it is described on
The corresponding fast row of slot is covered with fast row's mouth.
Preferably, the lower slot is equipped with liquid outlet, and the liquid outlet is connect by water pump with overflow passage.
Preferably, aperture is evenly distributed in the inlet tube and air inlet pipe.
Preferably, the inlet tube and air inlet pipe are arranged in parallel and are located at sustained height.
Preferably, the inlet tube is equipped with multiple, and the air inlet pipe is equipped with multiple.
Preferably, even flow plate is equipped in the upper slot, the even flow plate is correspondingly arranged at the top of inlet tube, air inlet pipe.
Preferably, there are two the pure water spray is set, two pure water sprays are correspondingly arranged at the inside of slot.
Preferably, the lower trench bottom is equipped with drain valve, and the cell wall of the lower slot corresponds to drain valve and incudes equipped with high liquid level
Device and low liquid level inductor.
A kind of efficient silicon/crystalline silicon heterojunction solar battery silicon wafer cleaning method, using above-mentioned apparatus, steps are as follows:
Step 1: being put into upper slot and open nitrogen and be bubbled the gaily decorated basket equipped with silicon wafer makes uniform fluid flow stream with pure water overflow, even flow plate
Into entire slot, the most chemicals in lower silicon slice surface and pollutant are washed；
Step 2: stopping nitrogen bubbling and pure water overflow, while opening fast exhaust casing and the water in upper slot is drained into lower slot fastly；
Step 3: opening pure water spray, with clean pure water cleaning silicon chip surface, fast exhaust casing, which is not related to, makes spray to silicon chip surface
The water flowed down flows directly into lower slot, and the liquid level of lower slot water is sensed that lower section drain valve is opened to certain position by high liquid level inductor
It opens, drains into plant chimney stalk station；Drain valve is closed when aqueous potential drop to low liquid level inductor；
Step 4: stopping pure water spray, the gaily decorated basket is proposed, closes fast exhaust casing, and lower slot water pump is beaten supreme slot, beats slot water
It is full, it is used to next basket Wafer Cleaning.
The beneficial effects of the present invention are:
Present invention washing is divided into two steps of pure water overflow and spray, and the water for contacting silicon wafer finally is clean new pure water.Do not increasing
Add water consumption and scavenging period, the silicon chip surface after cleaning under the premise of not increasing manufacturing cost is cleaner, solves HJT battery
The middle sordid problem of silicon wafer surface cleaning improves the photoelectric conversion efficiency of HJT solar battery, while stable technique is more suitable
Conjunction applies to volume production.
Detailed description of the invention
Fig. 1 is the structural diagram of the present invention.
Fig. 2 is the vertical view distribution map of Fig. 1 air inlet pipe and inlet tube.
Wherein: overflow launder 1；Upper slot 2；Lower slot 3；Inlet tube 4；Pure water spray 5；Overflow passage 6；Spray pipeline 7；Nitrogen tube
Road 8；Fast exhaust casing 9；Piston rod 9.1；Fast row's lid 10；Air inlet pipe 11；Water pump 12；Even flow plate 13；High liquid level inductor 14；Low liquid
Position inductor 15.
Specific embodiment
Referring to Fig. 1 and Fig. 2, a kind of efficient silicon/crystalline silicon heterojunction solar battery silicon chip cleaning device, including overflow launder 1, on
The upper slot 2 of lower setting and lower slot 3, the overflow in upper slot 2 flow into overflow launder 1, the discharge of wastewater in overflow launder 1 to waste water station, institute
The lower part for stating slot 2 is equipped with inlet tube 4 and air inlet pipe 11, and top is equipped with pure water spray 5, and pure water enters overflow passage 6 and spray
Pipeline 7, nitrogen enter nitrogen pipeline 8, and the nitrogen pipeline 8 is connect with air inlet pipe 11, and the overflow passage 6 connects with inlet tube 4
It connects, the spray pipeline 7 is connect with pure water spray 5, is equipped with fast exhaust casing 9, the piston of the fast exhaust casing 9 in the lower slot 3
Bar 9.1 connects fast row's lid 10, and the corresponding fast row's lid 10 of upper slot 2 is equipped with fast row's mouth, when row's lid 10 covers fast row's mouth fastly, upper slot
Water in 2 may not flow into lower slot 3.Valve control switch is equipped on each pipeline.
The lower slot is equipped with liquid outlet, and the liquid outlet is connect by water pump 12 with overflow passage 6.
Aperture is evenly distributed in the inlet tube 4 and air inlet pipe 11.
The inlet tube 4 and air inlet pipe 11 are arranged in parallel and are located at sustained height.
The inlet tube 4 is equipped with 2, and the air inlet pipe 11 is equipped with 2.
It is equipped with even flow plate 13 in the upper slot 2, the even flow plate 13 is correspondingly arranged at the top of inlet tube 4, air inlet pipe 11.
There are two the pure water spray 5 is set, two pure water sprays 5 are correspondingly arranged at the inside of slot 2.
3 bottom of lower slot is equipped with drain valve, and the cell wall of the lower slot 3 corresponds to drain valve equipped with 14 He of high liquid level inductor
Low liquid level inductor 15.
A kind of efficient silicon/crystalline silicon heterojunction solar battery silicon wafer cleaning method, using above-mentioned apparatus, steps are as follows:
Step 1: being put into upper slot and open nitrogen and be bubbled the gaily decorated basket equipped with silicon wafer makes uniform fluid flow stream with pure water overflow, even flow plate
Into entire slot, the most chemicals in lower silicon slice surface and pollutant are washed；
Step 2: stopping nitrogen bubbling and pure water overflow, while opening fast exhaust casing and the water in upper slot is drained into lower slot fastly；
Step 3: opening pure water spray, with clean pure water cleaning silicon chip surface, fast exhaust casing, which is not related to, makes spray to silicon chip surface
The water flowed down flows directly into lower slot, and the liquid level of lower slot water is sensed that lower section drain valve is opened to certain position by high liquid level inductor
It opens, drains into plant chimney stalk station；Drain valve is closed when aqueous potential drop to low liquid level inductor；
Step 4: stopping pure water spray, the gaily decorated basket is proposed, closes fast exhaust casing, and lower slot water pump is beaten supreme slot, beats slot water
It is full, it is used to next basket Wafer Cleaning.
Wherein, the scavenging period of each basket silicon wafer is 1-2min.
Embodiment 1:
A. above-mentioned cleaning method is used, making herbs into wool, cleaning treatment are carried out to the n type single crystal silicon piece (180um) having a size of 156.75mm,
Scavenging period is overflow 50s, sprays 70s；
B. the intrinsic amorphous silicon layer that the back side is prepared by PECVD completes 7nm deposition using a step；
C. choosing N-shaped amorphous silicon film is light-receiving surface doped layer.N-shaped amorphous silicon is prepared using plasma enhanced chemical vapor deposition
Layer, with a thickness of 6nm；
D. p-type amorphous silicon layer, 10 nm of overall thickness are prepared using plasma activated chemical vapour deposition；
E. (RPD, PVD) method is used to deposit TCO conductive film, thickness 100nm；
F. positive back side silver metal electrodes are formed by silk-screen printing；
G. solidification is so that form good Ohmic contact between silver grating line and TCO；
H. the electrical property of test battery is carried out.
Embodiment 2:
It is same as Example 1, in addition to scavenging period is overflow 70s, spray 50s.
Embodiment 3:
It is same as Example 1, in addition to scavenging period is overflow 90s, spray 30s.
Comparative example 1:
It is same as Example 1, in addition to scavenging period is only overflow 120s.
The minority carrier life time characterization of embodiment 1-3 and comparative example 1 are compared: the silicon wafer double-sided deposition after making herbs into wool cleaning
7nm intrinsic amorphous silicon tests minority carrier life time using minority carrier lifetime tester, comparing result such as table 1:
1 minority carrier lifetime contrast table of table
As shown in Table 1, the minority carrier life time of embodiment 1-3 is higher than comparative example 1, the i.e. cleaning of same time, using overflow and spray
The minority carrier life time of two kinds of cleaning ways wants the high minority carrier life time with only progress overflow cleaning, using two kinds of cleaning sides of overflow and spray
Formula cleaning is cleaner.
Electrical property comparison to embodiment 1-3 and comparative example 1, as a result such as table 2:
2 electrical property contrast table of table
It being higher by comparative example 0.1% on transfer efficiency Eta absolute value from can see embodiment 1-3 in table 2, being mainly reflected in out
The gain of road voltage Voc and current density, J sc.
Good silicon chip surface cleanliness is more advantageous to the passivation of subsequent amorphous silicon deposition, promotes battery open circuit voltage
Voc and current density, J sc.
The innovative point of the present invention program is rinsing bowl using novel trough body structure, and washing process process, which increases, to be sprayed
Journey, washing are divided into two steps of pure water overflow and spray, and the water for contacting silicon wafer finally is clean new pure water.In this way not
Increase water consumption and scavenging period, the silicon chip surface after cleaning under the premise of not increasing manufacturing cost is cleaner, be based on more than
The characteristics of, HJT solar battery open-circuit voltage and short circuit current prepared by this method are obviously improved, to promote battery
Photoelectric conversion efficiency.
In addition to the implementation, all to use equivalent transformation or equivalent replacement the invention also includes there is an other embodiments
The technical solution that mode is formed should all be fallen within the scope of the hereto appended claims.
Claims (9)
1. a kind of efficient silicon/crystalline silicon heterojunction solar battery silicon chip cleaning device, it is characterised in that: including overflow launder (1), up and down
The upper slot (2) and lower slot (3) being arranged, the lower part of the upper slot (2) are equipped with inlet tube (4) and air inlet pipe (11), and top is equipped with pure
Water spray (5), pure water enter overflow passage (6) and spray pipeline (7), and nitrogen enters nitrogen pipeline (8), the nitrogen pipeline
(8) it is connect with air inlet pipe (11), the overflow passage (6) connect with inlet tube (4), and the spray pipeline (7) and pure water spray
(5) it connects, is equipped with fast exhaust casing (9) in the lower slot (3), the fast row's lid of piston rod (9.1) connection of the fast exhaust casing (9)
(10), the corresponding fast row's lid (10) of the upper slot (2) is equipped with fast row's mouth.
2. a kind of efficient silicon/crystalline silicon heterojunction solar battery silicon chip cleaning device according to claim 1, it is characterised in that:
The lower slot is equipped with liquid outlet, and the liquid outlet is connect by water pump (12) with overflow passage (6).
3. a kind of efficient silicon/crystalline silicon heterojunction solar battery silicon chip cleaning device according to claim 1, it is characterised in that:
Aperture is evenly distributed in the inlet tube (4) and air inlet pipe (11).
4. a kind of efficient silicon/crystalline silicon heterojunction solar battery silicon chip cleaning device according to claim 1, it is characterised in that:
The inlet tube (4) and air inlet pipe (11) are arranged in parallel and are located at sustained height.
5. a kind of efficient silicon/crystalline silicon heterojunction solar battery silicon chip cleaning device according to claim 1, it is characterised in that:
The inlet tube (4) be equipped with it is multiple, the air inlet pipe (11) be equipped with it is multiple.
6. a kind of efficient silicon/crystalline silicon heterojunction solar battery silicon chip cleaning device according to claim 4, it is characterised in that:
Even flow plate (13) are equipped in the upper slot (2), the even flow plate (13) be correspondingly arranged at inlet tube (4), air inlet pipe (11) it is upper
Side.
7. a kind of efficient silicon/crystalline silicon heterojunction solar battery silicon chip cleaning device according to claim 1, it is characterised in that:
There are two the pure water spray (5) sets, two pure water sprays (5) are correspondingly arranged at the inside of slot (2).
8. a kind of efficient silicon/crystalline silicon heterojunction solar battery silicon chip cleaning device according to claim 1, it is characterised in that:
Lower slot (3) bottom is equipped with drain valve, and the cell wall of the lower slot (3) corresponds to drain valve equipped with high liquid level inductor (14) and low
Level sensor (15).
9. a kind of efficient silicon/crystalline silicon heterojunction solar battery silicon wafer cleaning method, it is characterised in that: using one of claim 1-8
The device, steps are as follows:
Step 1: being put into upper slot and open nitrogen and be bubbled the gaily decorated basket equipped with silicon wafer makes uniform fluid flow stream with pure water overflow, even flow plate
Into entire slot, the most chemicals in lower silicon slice surface and pollutant are washed；
Step 2: stopping nitrogen bubbling and pure water overflow, while opening fast exhaust casing and the water in upper slot is drained into lower slot fastly；
Step 3: opening pure water spray, with clean pure water cleaning silicon chip surface, fast exhaust casing, which is not related to, makes spray to silicon chip surface
The water flowed down flows directly into lower slot, and the liquid level of lower slot water is sensed that lower section drain valve is opened to certain position by high liquid level inductor
It opens, drains into plant chimney stalk station；Drain valve is closed when aqueous potential drop to low liquid level inductor；
Step 4: stopping pure water spray, the gaily decorated basket is proposed, closes fast exhaust casing, and lower slot water pump is beaten supreme slot, beats slot water
It is full, it is used to next basket Wafer Cleaning.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201910873976.2A CN110534463A (en) | 2019-09-17 | 2019-09-17 | A kind of efficient silicon/crystalline silicon heterojunction solar battery silicon chip cleaning device and method |
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| CN201910873976.2A CN110534463A (en) | 2019-09-17 | 2019-09-17 | A kind of efficient silicon/crystalline silicon heterojunction solar battery silicon chip cleaning device and method |
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Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN111151489A (en) * | 2019-12-31 | 2020-05-15 | 中威新能源(成都)有限公司 | Method for cleaning silicon wafer in spraying mode through ozone |
Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN202595795U (en) * | 2012-06-15 | 2012-12-12 | 苏州晶樱光电科技有限公司 | Water recycle device for solar silicon chip production |
| JP2018171679A (en) * | 2017-03-31 | 2018-11-08 | 株式会社荏原製作所 | Substrate holding device, substrate treatment apparatus, substrate treatment method, and computer-readable recording medium with program recorded |
| CN108878321A (en) * | 2018-06-25 | 2018-11-23 | 扬州思普尔科技有限公司 | A kind of semiconductor crystal wafer cleaning fast row's flushing tank of energy conservation |
| CN210575853U (en) * | 2019-09-17 | 2020-05-19 | 江苏爱康能源研究院有限公司 | High-efficient crystal silicon heterojunction solar cell silicon chip belt cleaning device |
-
2019
- 2019-09-17 CN CN201910873976.2A patent/CN110534463A/en active Pending
Patent Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN202595795U (en) * | 2012-06-15 | 2012-12-12 | 苏州晶樱光电科技有限公司 | Water recycle device for solar silicon chip production |
| JP2018171679A (en) * | 2017-03-31 | 2018-11-08 | 株式会社荏原製作所 | Substrate holding device, substrate treatment apparatus, substrate treatment method, and computer-readable recording medium with program recorded |
| CN108878321A (en) * | 2018-06-25 | 2018-11-23 | 扬州思普尔科技有限公司 | A kind of semiconductor crystal wafer cleaning fast row's flushing tank of energy conservation |
| CN210575853U (en) * | 2019-09-17 | 2020-05-19 | 江苏爱康能源研究院有限公司 | High-efficient crystal silicon heterojunction solar cell silicon chip belt cleaning device |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN111151489A (en) * | 2019-12-31 | 2020-05-15 | 中威新能源(成都)有限公司 | Method for cleaning silicon wafer in spraying mode through ozone |
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