CN110527979A - Tail gas pipeline assembly and vapor deposition apparatus for vapor deposition apparatus - Google Patents
Tail gas pipeline assembly and vapor deposition apparatus for vapor deposition apparatus Download PDFInfo
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- CN110527979A CN110527979A CN201810515736.0A CN201810515736A CN110527979A CN 110527979 A CN110527979 A CN 110527979A CN 201810515736 A CN201810515736 A CN 201810515736A CN 110527979 A CN110527979 A CN 110527979A
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- Prior art keywords
- internal lining
- tail gas
- lining pipe
- gas pipeline
- pipe
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/4401—Means for minimising impurities, e.g. dust, moisture or residual gas, in the reaction chamber
- C23C16/4408—Means for minimising impurities, e.g. dust, moisture or residual gas, in the reaction chamber by purging residual gases from the reaction chamber or gas lines
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- General Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Chemical Vapour Deposition (AREA)
Abstract
The present invention provides a kind of tail gas pipeline assembly for vapor deposition apparatus, including outer tube and internal lining pipe, wherein the internal lining pipe is arranged in the lumen of the outer tube, forms cavity between the internal lining pipe and the outer tube；The main injection orifice for running through the internal lining pipe along the thickness direction of the liner tube wall is formed on the internal lining pipe, the main injection orifice is connected to the cavity；The fluid inlet for running through the outer tube along the thickness direction of the housing tube wall is provided on the outer tube, fluid can be through the cavity by main injection orifice ejection fog-like.The present invention also provides a kind of vapor deposition apparatus including the tail gas pipeline assembly.Residual particles are less even without therefore, can reducing the damage even being eliminated to vacuum pump in the vent gas treatment pipeline assembly of the vapor deposition apparatus.
Description
Technical field
The present invention relates to vapor deposition apparatus fields, and in particular, to a kind of tail gas pipeline for vapor deposition apparatus
Component and a kind of vapor deposition apparatus including the tail gas pipeline assembly.
Background technique
So-called vapor deposition refers to, is being arranged by way of being passed through process gas in the process cavity to vapor deposition apparatus
Film layer structure is formed on substrate in process cavity.Vapor deposition apparatus includes the tail gas that reaction end gas is discharged out of process cavity
It manages, after deposition step, needs to extract superfluous process gas out process cavity by offgas duct using vacuum pump.In this process
In, unreacted process gas may be further deposited on the tube wall of offgas duct and the valve being arranged in offgas duct,
It is not only the possibility to influence the regular event of valve, it is also possible to be drawn into vacuum pump, damage vacuum pump.
For example, carrying out forming Al using vapor deposition apparatus shown in Fig. 12O3The Atomic layer deposition technique of film
When, trimethyl aluminium (TMA, Trimethyl Aluminum) gas is passed through into the process cavity of processing chamber 200 first, makes front three
Base aluminium is attached on substrate, is passed through purification gas and is purged, and passes through vent gas treatment pipe 100 for purified gas using vacuum pump 500
Body and the extraction of the TMA gas of surplus.After the completion of purging, it is passed through aqueous vapor mist, so that hydrone is deposited on substrate, and and TMA
Molecule reaction, forms Al2O3Film.It is subsequently passed purification gas, process cavity and pipeline are purged.In the process, not
The process gas of reaction may the reaction was continued, generates Al2O3It is attached on tube wall and on valve.Due to Al2O3It is harder, such as
It is drawn into vacuum pump, then is very likely to cause vacuum pump seizure.
Common practice is change technological parameter, so that TMA and the fully reacting as far as possible of aqueous vapor mist, still, all chemistry
Reaction all cannot 100% complete reaction therefore still can have unreacted process gas.
Therefore, how to prevent from purge unreacted process gas the reaction was continued generating granular product becomes this field
Technical problem urgently to be resolved.
Summary of the invention
It include the tail the purpose of the present invention is to provide a kind of tail gas pipeline assembly for vapor deposition apparatus and one kind
The vapor deposition apparatus of air pipe component, residual particles are less even without therefore, can reducing in the tail gas pipeline assembly
It even is eliminated the damage to vacuum pump.
To achieve the goals above, as one aspect of the present invention, a kind of tail gas for vapor deposition apparatus is provided
Pipeline assembly, wherein the tail gas pipeline assembly includes outer tube and internal lining pipe, wherein
The internal lining pipe is arranged in the lumen of the outer tube, is formed between the internal lining pipe and the outer tube empty
Chamber；
The main injection orifice for running through the internal lining pipe along the thickness direction of the liner tube wall is formed on the internal lining pipe,
The main injection orifice is connected to the cavity；
The fluid inlet for running through the outer tube along the thickness direction of the housing tube wall is provided on the outer tube,
Fluid can be through the cavity by main injection orifice ejection fog-like.
Preferably, the tail gas pipeline assembly further includes upper junction plate and lower connecting plate, wherein
The upper junction plate is connected to one end of the outer tube and the internal lining pipe, and described in lower connecting plate connection
The other end of outer tube and the internal lining pipe, so that the appearance of the upper junction plate, the lower connecting plate, the internal lining pipe
Face, the outer tube inner surface surround the cavity jointly.
Preferably, it is formed on the lower connecting plate along the lower connecting plate thickness direction through the auxiliary of the lower connecting plate
Help spray-hole；
The axis in the secondary injection hole is increasingly towards the axis of the internal lining pipe since the upper surface of the lower connecting plate
Line inclination.
Preferably, the internal lining pipe includes an at least knot tube body, and the sub- tube body includes along the axis side of the sub- tube body
To the outlet portion being arranged successively and diversion division；
The main injection orifice is provided in the outlet portion, the inner surface of the diversion division since the outlet portion gradually
It is tilted towards the axis of the sub- tube body.
Preferably, the periphery wall of the sub- tube body is formed with water conservancy diversion recess portion to lumen sunken inside along the radial of the sub- tube body,
The water conservancy diversion recess portion is located at one end far from the main injection orifice of the sub- tube body；
The water conservancy diversion recess portion includes stationary plane and the guide face being circumferentially arranged along the sub- tube body.
Preferably, the internal lining pipe includes the sub- tube body of more piece, in sub- tube body described in two adjacent sections, sub- tube body described in later section
Connect close to the end face of the main injection orifice with the stationary plane of sub- tube body described in previous section, and sub- tube body described in later section
Outlet portion and previous section described in sub- tube body water conservancy diversion face interval be arranged.
Preferably, the axial length of the outer tube is greater than the axial length of the internal lining pipe, and under the outer tube
End is more than the lower end of the internal lining pipe；
The tail gas pipeline assembly further includes exhaust tube, first switch valve and second switch valve, and the exhaust tube is described
Beyond being connected on the part of the internal lining pipe with the outer tube, the first switch valve is arranged in the outer tube outer tube
On, the second switch valve is arranged on the exhaust tube.
Preferably, the tail gas pipeline assembly further includes waste collection box；
The lower port of the outer tube forms waste liquid outlet, and the waste collection box selectively connects with the waste liquid outlet
It is logical.
Preferably, the tail gas pipeline assembly further includes that the first diversion pipe, the second diversion pipe, third switch valve and the 4th are opened
Close valve；
One end of first diversion pipe is connected to the fluid inlet, second diversion pipe and first diversion pipe
It is connected to, is provided with the third switch valve on first diversion pipe, the 4th switch is provided on second diversion pipe
Valve.
As the second aspect of the invention, a kind of vapor deposition apparatus, including processing chamber and tail gas pipeline group are provided
Part, wherein the tail gas pipeline assembly is above-mentioned tail gas pipeline assembly provided by the present invention, the inner sleeve and the technique
Chamber.
At the end of purging process, being passed through by the fluid inlet into the cavity between outer tube and internal lining pipe can be with
The product reacts and generates the high-pressure solution of solable matter, which passes through the main injection orifice quilt on internal lining pipe
Atomization, and be injected into the lumen of internal lining pipe, it is attached on the inner surface of internal lining pipe, so as to sink on liner inside pipe wall
Long-pending product reacts, and generates solable matter, which is dissolved in the solvent in aerosol and along internal lining pipe
Inner wall outflow.
In the present invention, can stop being passed through high-pressure solution, and until institute after being passed through high-pressure solution predetermined hold-time
Some solable matters recycle vacuum pump to pass through the tail gas pipeline assembly pair after being discharged in the tail gas pipeline assembly
The process cavity of the vapor deposition apparatus is vacuumized.Since the product of unreacted process gas generation is from offgas duct
It is discharged in road, therefore, will not be drawn into vacuum pump, to will not cause to damage to vacuum pump, and then extend vacuum pump
Service life.
Detailed description of the invention
The drawings are intended to provide a further understanding of the invention, and constitutes part of specification, with following tool
Body embodiment is used to explain the present invention together, but is not construed as limiting the invention.In the accompanying drawings:
Fig. 1 is the structural schematic diagram of vapor deposition apparatus in the prior art；
Fig. 2 is the structural schematic diagram of vapor deposition apparatus provided by the present invention；
Fig. 3 is internal lining pipe stereochemical structure cross-sectional view；
Fig. 4 is the cross-sectional view of sub- tube body.
Description of symbols
100: tail gas pipeline 110: outer tube
120: internal lining pipe 121: main injection orifice
120a: sub- tube body 120a1: outlet portion
120a2: diversion division 130: upper junction plate
140: lower connecting plate 141: secondary injection hole
150: exhaust tube 160: first switch valve
161: chamber gate valve 162: butterfly valve
170: second switch valve 180: waste collection box
181: the five switch valves 182: acid draw-off valve
191: the first diversion pipe, 192: the second diversion pipe
193: 194: the four switch valve of third switch valve
200: 310: the first process gas pipe of processing chamber
310: the second process gas pipes 330: purification gas pipe
410: the first process gas source, 420: the second process gas source
500: vacuum pump
Specific embodiment
Below in conjunction with attached drawing, detailed description of the preferred embodiments.It should be understood that this place is retouched
The specific embodiment stated is merely to illustrate and explain the present invention, and is not intended to restrict the invention.
It should be pointed out that in the present invention, the noun of locality " upper and lower " used is " upper and lower " orientation of Fig. 2 into Fig. 4.
As one aspect of the present invention, a kind of tail gas pipeline assembly for vapor deposition apparatus is provided, wherein as schemed
Shown in 2, the tail gas pipeline assembly includes outer tube 110 and internal lining pipe 120, which is arranged in outer tube 110.
As shown in figure 3, forming cavity between internal lining pipe 120 and outer tube 110, it is formed on internal lining pipe along the internal lining pipe
The thickness direction of 120 tube wall runs through the main injection orifice 121 of internal lining pipe 120, is provided on outer tube 110 along the outer tube
The thickness direction of 110 tube walls runs through the fluid inlet of the outer tube 110, so it is easy to understand that 110 He of fluid inlet outer tube
Cavity connection between internal lining pipe 120, fluid can flow through the cavity by main injection orifice ejection fog-like.
Shown in Fig. 2 is the vapor deposition apparatus for including tail gas pipeline assembly shown in Fig. 3, the lumen of internal lining pipe with
The process chamber.When vapor deposition apparatus work, by technique air inlet pipe to the process cavity of vapor deposition apparatus
Inside it is passed through process gas.When purging to process cavity, the purification gas for purging is passed through into process cavity, it is unreacted
Process gas and the purification gas are extracted by the lumen of internal lining pipe 120.Unreacted process gas may be in internal lining pipe
It reacts in 120 lumen, product is attached on the inner surface of internal lining pipe 120.
When vapor deposition apparatus work, work is passed through into the process cavity of vapor deposition apparatus by technique air inlet pipe
Skill gas.When purging to process cavity, the purification gas for purging, unreacted process gas are passed through into process cavity
It is extracted with the purification gas by the lumen of internal lining pipe 120.Unreacted process gas may be in the lumen of internal lining pipe 120
It inside reacts, product is attached on the inner surface of internal lining pipe 120.
At the end of purging process, it is passed through by the fluid inlet into the cavity between outer tube 110 and internal lining pipe 120
The high-pressure solution of solable matter can be reacted and generated with the product, which passes through described on internal lining pipe 120
Main injection orifice is atomized, and is injected into the lumen of internal lining pipe 120, is attached on the inner surface of internal lining pipe 120, so as to
It reacts with the product deposited on 120 inner wall of internal lining pipe, and generates solable matter, which is dissolved in aerosol
Solvent is simultaneously flowed out along the inner wall of internal lining pipe 120.
In the present invention, can stop being passed through high-pressure solution, and until institute after being passed through high-pressure solution predetermined hold-time
Some solable matters recycle vacuum pump to pass through the tail gas pipeline assembly pair after being discharged in the tail gas pipeline assembly
The process cavity of the vapor deposition apparatus is vacuumized.Since the product of unreacted process gas generation is from offgas duct
It is discharged in road, therefore, will not be drawn into vacuum pump, to will not cause to damage to vacuum pump, and then extend vacuum pump
Service life.
Unreacted process gas enters the cavity between outer tube 110 and internal lining pipe 120 in order to prevent, it is preferable that such as
Shown in Fig. 3, the tail gas pipeline assembly further includes upper junction plate 130 and lower connecting plate 140, and upper junction plate 130 is connected to outer
One end of casing 110 and internal lining pipe 120, lower connecting plate 140 are connected to the other end of outer tube 110 and internal lining pipe 120, so that
Upper junction plate 130, lower connecting plate 140, the outer surface of internal lining pipe 120, outer tube 110 inner surface surround the cavity jointly.
Also, the fluid inlet is connected to the cavity, and main injection orifice 121 is also connected to the cavity.
Due to the cavity between outer tube 110 and internal lining pipe 120 be it is closed, unreacted technique in process cavity
Gas will not enter between outer tube 110 and internal lining pipe 120, thereby it can be assured that fluid inlet is not closed, and further really
Guarantor can be normally carried out the step of reaction product cleaning.It in addition to this, can be to closed sky when clearing up tail gas pipeline assembly
Intracavitary offer highly pressurised liquid, highly pressurised liquid can be atomized by main injection orifice 121, form aerosol.
For the ease of highly pressurised liquid is atomized, it is preferable that the aperture of main injection orifice 121 can 1mm to 10mm it
Between.Preferably, the aperture of main injection orifice 121 can be 2mm.
In the present invention, multiple main injection orifices 121 are provided on internal lining pipe 120, for the ease of processing, multiple main injection orifices
121 are distributed on multiple circumference.5 to 20 main injection orifices 121 can be set on each circumference.As a kind of preferred implementation side
Formula, each 10 main injection orifices 121 provided circumferentially about.
Tail gas pipeline assembly provided by the present invention is carried out to tail gas in the prior art pipeline assembly shown in Fig. 1
Improvement.Therefore, in tail gas pipeline assembly reserved graph 1 provided by the present invention tail gas pipeline assembly some attachmentes, for example, packet
Include the butterfly valve that 120 lower end of outer tube is set.When carrying out purging process, butterfly valve is opened.For the ease of the valve plate to butterfly valve into
Row cleaning, it is preferable that as shown in figure 3, being formed with the thickness direction along the lower connecting plate 140 on lower connecting plate 140 under this
The secondary injection hole 141 of connecting plate, and the axis in the secondary injection hole 141 gradually court since the upper surface of lower connecting plate 140
It is tilted to the axes O of internal lining pipe 120.
Secondary injection hole 141 is set and is conducive to the valve plate surface that the aerosol of cleaning is ejected into chamber gate valve 161, it is right
Chamber gate valve 161 is more thoroughly cleared up.
In the present invention, the specific structure of internal lining pipe is not particularly limited.Internal lining pipe can be a Duan Gangguan.
In the present invention, it can use corrosion resistant stainless steel material and internal lining pipe be made.
For the ease of mounting and dismounting and improving versatility, it is preferable that the internal lining pipe includes an at least knot tube body
120a, as shown in figure 4, sub- tube body 120a includes the outlet portion 120a being arranged successively along the direction of the axes O of the sub- tube body 120a1
With diversion division 120a2, main injection orifice 121 is provided with outlet portion 120a1On, diversion division 120a2Inner surface from outlet portion 120a1
Start the axes O inclination for being increasingly towards sub- tube body 120a.
When formation internal lining pipe 120 in the lumen that sub- tube body 120a is mounted on outer tube 110 according to mode shown in Fig. 3
Afterwards, outlet portion 120a1Closer to the process cavity of the vapor deposition apparatus.Due to diversion division 120a2For inclined surface, therefore, when
Aerosol is from outlet portion 120a1On main injection orifice spray after, can be with diversion division 120a2It comes into full contact with, so that it is guaranteed that greatest extent
Remove the reaction product in internal lining pipe in ground.Also, by diversion division 120a2Be set as inclined surface also help by with reaction product
Internal lining pipe 120 is discharged in the solable matter that reaction generates.
The periphery wall of sub- tube body 120a is formed with water conservancy diversion recess portion A to lumen sunken inside along the radial of the sub- tube body 120a, should
Water conservancy diversion recess portion A is located at one end of the separate main injection orifice 121 of sub- tube body 120a.
Water conservancy diversion recess portion A includes stationary plane and the guide face being circumferentially arranged along the sub- tube body.
Fumarole is located in the water conservancy diversion recess portion A, the diversion division 120a of the gas quilt tube body 120a of ejection2Lower end resistance
It keeps off and reflects, along diversion division 120a2Guide face flow down.
In the present invention, special limitation is not done to the particular number of sub- tube body 120a.It can be according to outer tube 110
Length determines the joint number of sub- tube body.
In specific embodiment shown in figure 2 and figure 3, internal lining pipe 120 includes the sub- tube body 120a of more piece, adjacent two
In knot tube body 120a, the end face of close main injection orifice of sub- tube body 120a and consolidating for previous knot tube body 120a described in later section
Determine face connection, and the water conservancy diversion face interval of the outlet portion of latter knot tube body 120a and previous knot tube body 120a are arranged.
Furthermore, it is desirable to, it is noted that upper junction plate is connected with the upper end of the sub- tube body of the top, lower connecting plate and bottom
Sub- tube body lower end be connected.
In addition to that can guarantee that aerosol normally sprays, setting water conservancy diversion recess portion A may also be ensured that be connected between the sub- tube body of two adjacent sections
The stability connect, it is preferable that as shown in figure 4, sub- tube body 120a's deviates from outlet portion 120a1End face and previous knot tube body
The stationary plane of the upper water conservancy diversion recess portion of 120a is bonded, and the area of the end face of the close main injection orifice 121 of sub- tube body 120a is no more than
Sub- tube body 120a's deviates from outlet portion 121a1End face on be located at water conservancy diversion recess portion A on the outside of fixation end face area.In Fig. 3
It is shown, when the sub- tube body of two adjacent sections is connected, the upper surface of latter knot tube body 120a and the lower end surface of previous knot group 120a
The upper stationary plane positioned at water conservancy diversion recess portion A connects, and can not only be formed and is stably connected with, but also will not stop the stream of gas in main injection orifice
Out.
The aerosol outflow of water conservancy diversion recess portion A is flowed into for the ease of guidance, it is preferable that the top surface of water conservancy diversion recess portion A is inner sunken face.
In order to preferably guide the gas sprayed from main injection orifice, it is preferable that sub- tube body 120a's deviates from outlet portion
120a1End face on the part that is located on the inside of water conservancy diversion recess portion A deviate from institute axially beyond sub- tube body 120a in sub- tube body 120a
State the part being located on the outside of water conservancy diversion recess portion A on the end face in outlet portion.Specifically, after the sub- tube body 120a assembling of more piece, spray
Stomata is located in the water conservancy diversion recess portion A, the diversion division 120a of the gas quilt tube body 120a of ejection2Lower end stop and reflect,
Along diversion division 120a2Inner surface flow down.
For the ease of being connected to vacuum pump, it is preferable that as shown in Figure 2, the axial length of outer tube 110 is greater than internal lining pipe
110 axial length, and the lower end of outer tube 110 is more than the lower end of internal lining pipe 120.
Correspondingly, the tail gas pipeline assembly further includes exhaust tube 150 and first switch valve 160, and exhaust tube 150 is in housing
Beyond being connected and communicating with outer tube 110 on the part of internal lining pipe 120, first switch valve 160 is arranged in outer tube 110 pipe 110
On.The lower port of outer tube 110 is formed as waste liquid outlet.
In the present invention, it is only necessary to open up the aspirating hole being connected to exhaust tube 150 on the tube wall of outer tube 110, be not required to
Aspirating hole is opened up on internal lining pipe 110, to simplify the processing step of manufacture tail gas pipeline, reduce processing cost.
The purpose that first switch valve 160 is arranged is, when carrying out depositing operation, first switch valve 160 can be closed,
To prevent process gas from escaping by tail gas pipeline assembly.When needing to carry out tail gas cleaning and purging process, by first switch valve
160 open.
In a specific embodiment of the invention, first switch valve 160 may include gate valve 161 and butterfly valve 162.
In order to prevent during depositing operation carries out and during the progress of purging process, gas enters exhaust tube
150, it is preferable that the tail gas pipeline assembly further includes second switch valve 170, which is arranged in exhaust tube 150
On.
Waste liquid outlet is different mouths from bleeding point, therefore, so as to avoid the discharge of waste liquid from causing shadow to exhaust tube
It rings.
In the present invention, waste liquid outlet is set by the lower port of outer tube 110, waste liquid can be made in the effect of gravity
It is discharged from tail gas pipeline assembly automatically down.
Environment is polluted in order to prevent, regenerant is reused, it is preferable that the tail gas pipeline assembly further includes giving up
Liquid collection box 180.The waste collection box 180 is selectively connected to the waste liquid outlet.
It is to be understood that " selectivity connection " herein refers to that operator can be selected according to the actual situation by waste liquid
Collection box 180 is connected to waste liquid outlet or disconnects with waste liquid outlet.
It can be realized in such a way that the 5th switch valve 181 is set at the waste liquid outlet in outer tube 110 by the waste liquid
Outlet is selectively communicated with waste collection box 180.
In order to which the waste liquid collected in waste collection box 180 is discharged, it is preferable that can be set with inside waste collection box 180
The drain pipe of connection, and tapping valve 182 is set on drain pipe and is beaten when the liquid in waste collection box 180 reaches predetermined amount
Tapping valve 182 is opened, the liquid in waste collection box 180 is discharged.Alternatively, tapping valve 182 is opened after cleaning, by waste liquid
Liquid discharge in collection box 180.
For the ease of tail gas pipeline assembly is purged and is cleared up, it is preferable that the tail gas pipeline assembly further includes
One diversion pipe 191, the second diversion pipe 192, third switch valve 193 and the 4th switch valve 194.As shown in Figure 2, the first diversion pipe
191 one end is connected to the fluid inlet, and the second diversion pipe 192 is connected to the first diversion pipe 191, on the first diversion pipe 191
It is provided with third switch valve 193, is provided with the 4th switch valve 194 on the second diversion pipe 192.
One of first diversion pipe 191 and the second diversion pipe 192 are for being passed through purification gas (for example, nitrogen, argon gas
Deng), the other of the first diversion pipe 191 and the second diversion pipe 192 are for being passed through the solution that can be reacted with the product.
As another aspect of the present invention, a kind of vapor deposition apparatus is provided, as shown in Fig. 2, the vapor deposition is set
Standby includes having processing chamber 200 and tail gas pipeline assembly, wherein the tail gas pipeline assembly is provided by the present invention above-mentioned
Tail gas pipeline assembly, inner sleeve 120 are connected to processing chamber 200.
When vapor deposition apparatus work, work is passed through into the process cavity of vapor deposition apparatus by technique air inlet pipe
Skill gas.When purging to process cavity, the purification gas for purging, unreacted process gas are passed through into process cavity
It is extracted with the purification gas by the lumen of internal lining pipe 120.Unreacted process gas may be in the lumen of internal lining pipe 120
It inside reacts, product is attached on the inner surface of internal lining pipe 120.
At the end of purging process, it is passed through by the fluid inlet into the cavity between outer tube 110 and internal lining pipe 120
The high-pressure solution of solable matter can be reacted and generated with the product, which passes through described on internal lining pipe 120
Main injection orifice is atomized, and is injected into the lumen of internal lining pipe 120, is attached on the inner surface of internal lining pipe 120, so as to
It reacts with the product deposited on 120 inner wall of internal lining pipe, and generates solable matter, which is dissolved in aerosol
Solvent is simultaneously flowed out along the inner wall of internal lining pipe 120.
In the present invention, can stop being passed through high-pressure solution, and until institute after being passed through high-pressure solution predetermined hold-time
Some solable matters recycle vacuum pump to pass through the tail gas pipeline assembly pair after being discharged in the tail gas pipeline assembly
The process cavity of the vapor deposition apparatus is vacuumized.Since the product of unreacted process gas generation is from offgas duct
It is discharged in road, therefore, will not be drawn into vacuum pump, to will not cause to damage to vacuum pump, and then extend vacuum pump
Service life.
As a kind of specific embodiment, the vapor deposition apparatus, which can be used for depositing, forms aluminum oxide film.
Specifically, the vapor deposition apparatus includes the first process gas access tube 310, the second process gas access tube 320 and purification
Flue 330.One end of first process gas access tube 310 is connected to the first process gas source (that is, TMA source) 410, the first work
The other end of skill gas inlet pipe 310 is connected to process cavity 210；One end of second process gas access tube 320 and the second technique
Gas source (that is, source of water vapor) 420 is connected to, and the other end of the second process gas access tube 320 is connected to process cavity 210.It is not anti-
The product that the process gas answered generates is aluminum oxide, and lye aerosol can be sprayed by main injection orifice to being attached to internal lining pipe
Aluminum oxide on 120 inner surface is handled, and specific reaction formula is as follows:
Al2O3+ 2NaOH=2NaAlO2+H2O。
Wherein, NaAlO2It is soluble.
When carrying out depositing operation, gate valve 161 and butterfly valve 162 are closed.After depositing operation, 161 He of gate valve is opened
Butterfly valve 162, and second switch valve 170 is closed.Third switch valve 193 is opened, by the first diversion pipe 192 to outer tube
The NaOH hot solution of closed cavity injection high pressure between 110 and internal lining pipe 120, until the NaOH hot solution of high pressure is full of described
After closed cavity, it is atomized and sprays from main injection orifice.NaOH aerosol is attached on the inner surface of internal lining pipe 120, and is gone downstream, together
When, the NaOH aerosol that secondary injection hole sprays is injected on the valve plate of gate valve 161, it is possible thereby to the interior table of internal lining pipe 120
Al on face and on the valve plate of gate valve 1612O3It is cleared up.
After the predetermined time, third switch valve 193 is closed, the 4th switch valve 194 is opened, passes through the second diversion pipe 192
Inert purification gas is passed through (for example, N2), the inner cavity of internal lining pipe 120 is entered by main injection orifice and secondary injection hole.In
This is passed through purification gas into process cavity simultaneously, by purification gas pipe 330, by the inner surface and butterfly valve of internal lining pipe 120
162 valve plate surface drying, and not dry liquid is blown into waste collection box.
It is understood that the principle that embodiment of above is intended to be merely illustrative of the present and the exemplary implementation that uses
Mode, however the present invention is not limited thereto.For those skilled in the art, essence of the invention is not being departed from
In the case where mind and essence, various changes and modifications can be made therein, these variations and modifications are also considered as protection scope of the present invention.
Claims (10)
1. a kind of tail gas pipeline assembly for vapor deposition apparatus, which is characterized in that including outer tube and internal lining pipe, wherein
The internal lining pipe is arranged in the lumen of the outer tube, forms cavity between the internal lining pipe and the outer tube；
The main injection orifice for running through the internal lining pipe along the thickness direction of the liner tube wall is formed on the internal lining pipe, it is described
Main injection orifice is connected to the cavity；
The fluid inlet for running through the outer tube along the thickness direction of the housing tube wall, fluid are provided on the outer tube
It can be through the cavity by main injection orifice ejection fog-like.
2. tail gas pipeline assembly according to claim 1, which is characterized in that it further include upper junction plate and lower connecting plate,
In,
The upper junction plate is connected to one end of the outer tube and the internal lining pipe, and the lower connecting plate connects the housing
The other end of pipe and the internal lining pipe, so that the outer surface of the upper junction plate, the lower connecting plate, the internal lining pipe, institute
The inner surface for stating outer tube surrounds the cavity jointly.
3. tail gas pipeline assembly according to claim 2, which is characterized in that be formed on the lower connecting plate under described
Connect the secondary injection hole that plate thickness direction runs through the lower connecting plate；
The axis that the axis in the secondary injection hole is increasingly towards the internal lining pipe since the upper surface of the lower connecting plate inclines
Tiltedly.
4. tail gas pipeline assembly according to claim 2, which is characterized in that the internal lining pipe includes an at least knot pipe
Body, the sub- tube body include the outlet portion being arranged successively along the axis direction of the sub- tube body and diversion division；
The main injection orifice is provided in the outlet portion, and the inner surface of the diversion division is increasingly towards since the outlet portion
The axis of the sub- tube body tilts.
5. tail gas pipeline assembly according to claim 4, which is characterized in that the periphery wall of the sub- tube body is along the sub- tube body
It is radial be formed with water conservancy diversion recess portion to lumen sunken inside, the water conservancy diversion recess portion is located at the separate main injection orifice of the sub- tube body
One end；
The water conservancy diversion recess portion includes stationary plane and the guide face being circumferentially arranged along the sub- tube body.
6. tail gas pipeline assembly according to claim 5, which is characterized in that the internal lining pipe includes the sub- tube body of more piece, phase
In sub- tube body described in adjacent two sections, the end face close to the main injection orifice of sub- tube body described in later section and sub- tube body described in previous section
Stationary plane connection, and the outlet portion of sub- tube body described in later section and the water conservancy diversion face interval of sub- tube body described in previous section are set
It sets.
7. tail gas pipeline assembly as claimed in any of claims 1 to 5, which is characterized in that the axis of the outer tube
It is greater than the axial length of the internal lining pipe to length, and the lower end of the outer tube is more than the lower end of the internal lining pipe；
The tail gas pipeline assembly further includes exhaust tube, first switch valve and second switch valve, and the exhaust tube is in the housing
Pipe on the part of the internal lining pipe with the outer tube beyond being connected to, and the first switch valve is arranged on the outer tube, institute
Second switch valve is stated to be arranged on the exhaust tube.
8. tail gas pipeline assembly according to claim 7, which is characterized in that the tail gas pipeline assembly further includes that waste liquid is received
Collect box；
The lower port of the outer tube forms waste liquid outlet, and the waste collection box is selectively connected to the waste liquid outlet.
9. tail gas pipeline assembly as claimed in any of claims 1 to 4, which is characterized in that the tail gas pipeline group
Part further includes the first diversion pipe, the second diversion pipe, third switch valve and the 4th switch valve；
One end of first diversion pipe is connected to the fluid inlet, and second diversion pipe and first diversion pipe connect
It is logical, it is provided with the third switch valve on first diversion pipe, the 4th switch valve is provided on second diversion pipe.
10. a kind of vapor deposition apparatus, including processing chamber and tail gas pipeline assembly, which is characterized in that the tail gas pipeline group
Part is tail gas pipeline assembly described in any one of claim 1 to 9, and the inner sleeve is connected to the processing chamber.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201810515736.0A CN110527979B (en) | 2018-05-25 | 2018-05-25 | Tail gas pipeline assembly for vapor deposition equipment and vapor deposition equipment |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201810515736.0A CN110527979B (en) | 2018-05-25 | 2018-05-25 | Tail gas pipeline assembly for vapor deposition equipment and vapor deposition equipment |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN110527979A true CN110527979A (en) | 2019-12-03 |
| CN110527979B CN110527979B (en) | 2021-08-13 |
Family
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| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201810515736.0A Active CN110527979B (en) | 2018-05-25 | 2018-05-25 | Tail gas pipeline assembly for vapor deposition equipment and vapor deposition equipment |
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| Country | Link |
|---|---|
| CN (1) | CN110527979B (en) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN113913784A (en) * | 2020-11-13 | 2022-01-11 | 台湾积体电路制造股份有限公司 | Gas curtain element, duct system for conveying gas and method for conveying gas |
| CN115522182A (en) * | 2022-03-21 | 2022-12-27 | 黄特伟 | Modularized chemical vapor deposition reactor for semiconductor chip production |
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|---|---|---|---|---|
| EP0346893A1 (en) * | 1988-06-15 | 1989-12-20 | Centrotherm Elektrische Anlagen Gmbh + Co. | Apparatus for purifying exhaust gases emitted in CVD processes |
| CN1459324A (en) * | 2002-05-25 | 2003-12-03 | 优尼森有限公司 | Device and method for pretreating waste gas under moisture environment |
| CN2716284Y (en) * | 2004-07-07 | 2005-08-10 | 中国航空工业第一集团公司北京航空制造工程研究所 | Device for treating tail gas from chemical vapor codeposition and infiltration |
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2018
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Patent Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP0346893A1 (en) * | 1988-06-15 | 1989-12-20 | Centrotherm Elektrische Anlagen Gmbh + Co. | Apparatus for purifying exhaust gases emitted in CVD processes |
| CN1459324A (en) * | 2002-05-25 | 2003-12-03 | 优尼森有限公司 | Device and method for pretreating waste gas under moisture environment |
| CN2716284Y (en) * | 2004-07-07 | 2005-08-10 | 中国航空工业第一集团公司北京航空制造工程研究所 | Device for treating tail gas from chemical vapor codeposition and infiltration |
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN113913784A (en) * | 2020-11-13 | 2022-01-11 | 台湾积体电路制造股份有限公司 | Gas curtain element, duct system for conveying gas and method for conveying gas |
| CN113913784B (en) * | 2020-11-13 | 2024-03-08 | 台湾积体电路制造股份有限公司 | Gas curtain element, gas delivery conduit system and gas delivery method |
| US11971057B2 (en) | 2020-11-13 | 2024-04-30 | Taiwan Semiconductor Manufacturing Co., Ltd. | Gas transport system |
| CN115522182A (en) * | 2022-03-21 | 2022-12-27 | 黄特伟 | Modularized chemical vapor deposition reactor for semiconductor chip production |
Also Published As
| Publication number | Publication date |
|---|---|
| CN110527979B (en) | 2021-08-13 |
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