CN110514824A - To suction chemical illumination immunity analysis instrument washing system - Google Patents
To suction chemical illumination immunity analysis instrument washing system Download PDFInfo
- Publication number
- CN110514824A CN110514824A CN201910902256.4A CN201910902256A CN110514824A CN 110514824 A CN110514824 A CN 110514824A CN 201910902256 A CN201910902256 A CN 201910902256A CN 110514824 A CN110514824 A CN 110514824A
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- washing
- substrate
- adsorption plate
- cup holder
- magnet
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- 238000005406 washing Methods 0.000 title claims abstract description 151
- 238000004458 analytical method Methods 0.000 title claims abstract description 20
- 239000000126 substance Substances 0.000 title claims abstract description 20
- 230000036039 immunity Effects 0.000 title claims abstract description 19
- 238000005286 illumination Methods 0.000 title claims abstract description 18
- 238000001179 sorption measurement Methods 0.000 claims abstract description 80
- 239000000758 substrate Substances 0.000 claims abstract description 78
- 238000010521 absorption reaction Methods 0.000 claims abstract description 40
- 238000002156 mixing Methods 0.000 claims description 16
- 240000007643 Phytolacca americana Species 0.000 claims description 15
- 230000007246 mechanism Effects 0.000 claims description 14
- 230000000694 effects Effects 0.000 claims description 6
- 238000003756 stirring Methods 0.000 claims 1
- 239000006249 magnetic particle Substances 0.000 abstract description 12
- 238000012360 testing method Methods 0.000 abstract description 5
- 238000006243 chemical reaction Methods 0.000 description 19
- 239000000243 solution Substances 0.000 description 10
- 238000010586 diagram Methods 0.000 description 9
- 238000009434 installation Methods 0.000 description 6
- 229910000831 Steel Inorganic materials 0.000 description 5
- 238000000034 method Methods 0.000 description 5
- 239000010959 steel Substances 0.000 description 5
- 238000001514 detection method Methods 0.000 description 4
- NJPPVKZQTLUDBO-UHFFFAOYSA-N novaluron Chemical compound C1=C(Cl)C(OC(F)(F)C(OC(F)(F)F)F)=CC=C1NC(=O)NC(=O)C1=C(F)C=CC=C1F NJPPVKZQTLUDBO-UHFFFAOYSA-N 0.000 description 4
- 230000008569 process Effects 0.000 description 4
- 239000012530 fluid Substances 0.000 description 3
- 238000002347 injection Methods 0.000 description 3
- 239000007924 injection Substances 0.000 description 3
- 239000000203 mixture Substances 0.000 description 3
- 239000011324 bead Substances 0.000 description 2
- 210000001124 body fluid Anatomy 0.000 description 2
- 239000010839 body fluid Substances 0.000 description 2
- 230000007423 decrease Effects 0.000 description 2
- 230000003028 elevating effect Effects 0.000 description 2
- 238000005213 imbibition Methods 0.000 description 2
- 238000003018 immunoassay Methods 0.000 description 2
- 238000007689 inspection Methods 0.000 description 2
- 230000009286 beneficial effect Effects 0.000 description 1
- 230000008859 change Effects 0.000 description 1
- 238000002474 experimental method Methods 0.000 description 1
- 238000011010 flushing procedure Methods 0.000 description 1
- 230000006698 induction Effects 0.000 description 1
- 230000002045 lasting effect Effects 0.000 description 1
- 238000004020 luminiscence type Methods 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 238000005086 pumping Methods 0.000 description 1
- 238000011084 recovery Methods 0.000 description 1
- 230000004044 response Effects 0.000 description 1
- 238000000926 separation method Methods 0.000 description 1
- 230000006641 stabilisation Effects 0.000 description 1
- 238000011105 stabilization Methods 0.000 description 1
- 230000001360 synchronised effect Effects 0.000 description 1
- 230000009466 transformation Effects 0.000 description 1
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B08—CLEANING
- B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
- B08B9/00—Cleaning hollow articles by methods or apparatus specially adapted thereto
- B08B9/08—Cleaning containers, e.g. tanks
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/75—Systems in which material is subjected to a chemical reaction, the progress or the result of the reaction being investigated
- G01N21/76—Chemiluminescence; Bioluminescence
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N33/00—Investigating or analysing materials by specific methods not covered by groups G01N1/00 - G01N31/00
- G01N33/48—Biological material, e.g. blood, urine; Haemocytometers
- G01N33/50—Chemical analysis of biological material, e.g. blood, urine; Testing involving biospecific ligand binding methods; Immunological testing
- G01N33/53—Immunoassay; Biospecific binding assay; Materials therefor
- G01N33/5302—Apparatus specially adapted for immunological test procedures
Abstract
The invention discloses a kind of pair of suction chemical illumination immunity analysis instrument washing system, including substrate, be movably set with wash thereon, wash can opposing substrate move up and down, mobile foundation is movably set on substrate, and can opposing substrate sliding；It is installed with washing cup holder on mobile foundation, is distributed with sets cup aperture thereon；Magnet mounting base, it is movably set on mobile foundation, and it is respectively equipped with preceding adsorption plate and rear adsorption plate in the position of face washing cup holder front and rear sides, the magnet that cup aperture is arranged in a one-to-one correspondence is all had and set on preceding adsorption plate and rear adsorption plate, and magnet mounting base opposite can wash cup holder and slide back and forth.Using coordinated type magnet mount structure, magnet absorption time and magnetic pole switching etc. can be increased, reduce magnetic particle Loss Rate, improve testing result precision, while compact overall structure, be conducive to the Miniaturization Design for improving detersive efficiency and analyzer.
Description
Technical field
The present invention relates to medicinal chemistry luminescence immunoassay detection technique fields, and in particular to a kind of pair of suction chemiluminescence
Immunity analysis instrument washing system.
Background technique
In immunoassay experiment, generallys use chemiluminescence immune analysis method and body fluid is tested and analyzed, detecting
In the process, experimenter needs to contain body fluid to be detected using dedicated reaction cup, it will usually by filling, mixing, incubating
Educate, wash and detect and etc., wherein being mainly the separation to completion test substance and other materials in the washing stage, and fill
Substrate, and existing washing system occupied space is larger, has a single function, and in washing process, magnetic bead Loss Rate is larger in solution,
Cause testing result precision lower.
Summary of the invention
To solve the above problems, the present invention provides a kind of pair of suction chemical illumination immunity analysis instrument washing system, to increase
Add washing system function, while reducing washing solution magnetic bead Loss Rate, improves testing result precision.
To achieve the above object, technical solution of the present invention is as follows:
A kind of pair of suction chemical illumination immunity analysis instrument washing system, it is critical that including:
Substrate, is movably set with wash thereon, and the wash can opposing substrate lifting；
Mobile foundation is movably set on substrate, and can opposing substrate sliding；
Cup holder is washed, is fixedly arranged on mobile foundation, and has what is be distributed along its length to set cup aperture；
Magnet mounting base, is movably set on mobile foundation, and distinguishes in the position of face washing cup holder front and rear sides
Equipped with preceding adsorption plate and rear adsorption plate, the magnetic that cup aperture is arranged in a one-to-one correspondence is all had and set on the preceding adsorption plate and rear adsorption plate
Body, the magnet mounting base can opposite washing cup holder slide back and forth so that preceding adsorption plate or rear adsorption plate are close with washing cup holder
Face side.
Using above scheme, mainly by the way that movable magnet mounting base is arranged on mobile foundation, pass through magnet mounting base
Linkage so that preceding adsorption plate and rear adsorption plate have always side with washing cup holder is close to, to be placed in react cup aperture in react
Magnetic particle in cup solution is adsorbed, and remains adsorbed state, reduces Loss Rate, in addition, magnet mounting base passes through sliding,
Preceding adsorption plate and the position of rear adsorption plate can be made to change, realize the switching of the position of reaction cup face magnet, is i.e. magnetic pole is cut
It changes, magnetic particle is adsorbed on the side wall of the other side from the side side wall of reaction cup, to further increase washing effect, improves inspection
Survey precision.
As preferred: the magnet is distributed in a manner of Halbach array.Using the above structure, with lesser installation site
Obtain maximum magnetic field strength, improve magnet absorption ability, further decrease magnetic particle Loss Rate, at the same do not occupy additionally it is extra
Space.
As preferred: the wash includes and washing cup holder washing mounting plate disposed in parallel, the washing mounting plate
It is upper with the washing needle group setting cup aperture and be arranged in a one-to-one correspondence；
One end of the corresponding washing mounting plate of the substrate is equipped with Z-direction and washs sliding rail, and Z-direction washing sliding rail is vertically fixedly arranged on substrate
On, there is the Z-direction being slidably matched with Z-direction washing sliding rail to wash sliding block, the substrate is equipped with and is used on the washing mounting plate
Driving motor A of the driving washing mounting plate along Z-direction washing sliding rail lifting carriage.Using above scheme, it is by washing mounting plate
It realizes washing head mass activity installation, that is, reaches elevating function and meet the flushing of washing needle group and pumping requirements.
As preferred: having the Y-direction filling sliding rail being arranged along its length, Y-direction filling on the washing mounting plate
There is the Y-direction being slidably matched with it to fill sliding block on sliding rail, there is the substrate needle stand connected with it on the Y-direction filling sliding block,
The substrate needle stand is equipped at least one substrate and fills needle；
The washing mounting plate is equipped with driving motor C close to one end of Z-direction washing sliding rail, and the driving motor C is for driving
Dynamic substrate needle stand is along Y-direction filling sliding rail level sliding.Using above scheme, by the substrate needle stand of sliding setting, in this way along Y
Into filling sliding rail sliding process, the substrate filling of multiple reaction cups can be realized, without setting cup aperture setting one for single
A substrate fills needle, is conducive to improve its utilization rate, reduces production cost.
As preferred: the opposite washing cup holder of the magnet mounting base has preceding absorption position and rear absorption position, the magnetic
It is equipped with elastic holding structure between body mounting base and washing cup holder, magnet mounting base can be elastically held in preceding suction by elastic force
Attached position or rear absorption position, are movably set with adjustment part on the substrate, and the adjustment part can be under driving force effect gram
The elastic force of elastic holding structure is taken, so that magnet mounting base from preceding absorption position is moved to rear absorption position or from rear absorption position
It is moved to preceding absorption position.Preceding adsorption plate or rear adsorption plate can be made to have one and washing cup holder always by elastic holding structure
It is close to, another, which is then in, is relatively distant from posture, and the mutual switching of the two then can be achieved in adjustment part, realizes magnetic pole switching
The holding of automatic operating and magnetic pole switching position improves switching adsorption efficiency, and structure is relatively ingenious, convenient to carry out and drop
Low cost.
As preferred: the elastic holding structure includes the guide rod for being symmetrically disposed on washing cup holder both ends, and is arranged
Pressure spring on the guide rod, the rear end of the guide rod are fixedly connected with rear adsorption plate, the preceding adsorption plate and rear absorption
The position that guide rod is corresponded on plate is equipped with guide hole, and washing the position that guide rod is corresponded on cup holder has via hole, the pressure spring
Both ends are abutted with rear adsorption plate and washing cup holder respectively, it is described wash cup holder both ends and be installed be slidably matched with magnet mounting base
Guide rail.Using guide rod and pressure spring fit system, it is advantageously ensured that the stability and reliability of elastic holding structure, while leading to again
Guide rail realization is crossed to the sliding support of magnet mounting base, reduces radial force suffered by pressure spring, guarantees that the sliding of magnet mounting base is smooth,
It is conducive to extend pressure spring service life simultaneously.
As preferred: the adjustment part includes vertically arranged poke rod, and the poke rod can be gone up and down with wash,
And controllably protrude between washing cup holder and preceding adsorption plate or washing cup holder after between adsorption plate, selectively to make preceding adsorption plate
Or rear adsorption plate is close to or far from washing cup holder.Using above scheme, poke rod is protruded between washing cup holder and adsorption plate, i.e. class
Like chock is added between, so that corresponding the two be made to be relatively distant from, magnetic pole switching is completed, and it is protruded into using up-down mode
In, its occupied space is advantageously reduced, and gone up and down using the lifting structure of wash, magnetic pole can be completed in washing
Switching, avoids mechanism lengthy and tedious, and overall structure is more compact reliable.
As preferred: the poke rod lower end is installed with bearing, when the elastic holding structure is in original state, washing
Distance is adapted between the sum of width and bearing diameter of cup holder and preceding adsorption plate and rear adsorption plate；
The poke rod is fixedly arranged on the bottom of substrate needle stand, the close washing cup in one end of the preceding adsorption plate or rear adsorption plate
The side of seat is equipped with guiding surface.
Using above scheme, is cooperated by the bearing and guiding surface of rotation setting, bearing can be made to be easier to protrude into absorption
Between plate and washing cup holder, and in substrate needle stand slipping, keep the state of magnetic pole switching, without with other component
Generate interference.
As preferred: the washing system further includes two eccentric mixing mechanisms, two eccentric mixing mechanism difference
Positioned at the front end two sides of substrate.It using above scheme, will mix in conjunction with washing operation, can further improve washing and mix
Efficiency improves the detection efficiency of analyzer.
As preferred: the mobile foundation is located at below substrate, correspond on substrate the position at mobile foundation both ends equipped with X to
Sliding rail, the mobile foundation both ends have the X being slidably matched with the X to sliding rail to sliding block, and the substrate is equipped with for driving
The power mechanism that mobile foundation is slided along X to sliding rail, substrate are equipped with installing port, the sliding stroke of the installing port and mobile foundation
It is adapted.Using above scheme, installing port, without generating interference, improves for washing cup holder and the integral slipping of magnet mounting base
The assembling of system, while being cooperated by X to sliding block and X to sliding rail, it can make to wash cup holder sliding stability more preferably, prevent solution
It splashes out.
Compared with prior art, the beneficial effects of the present invention are:
Using provided by the invention to suction chemical illumination immunity analysis instrument washing system, using coordinated type magnet mount
Structure can increase magnet absorption time and magnetic pole switching etc., reduce magnetic particle Loss Rate, improve testing result precision, simultaneously
Compact overall structure, it is multiple functional, be conducive to the Miniaturization Design for improving detersive efficiency and analyzer.
Detailed description of the invention
Fig. 1 is mounting structure schematic diagram of the invention；
Fig. 2 is the mounting structure schematic diagram of substrate；
Fig. 3 is wash mounting structure schematic diagram；
Fig. 4 is the bottom substance schematic diagram of Fig. 3；
Fig. 5 is wash structural schematic diagram；
Fig. 6 is the axonometric drawing of Fig. 5；
Fig. 7 is magnet mounting base and the mounting structure schematic diagram for washing cup holder；
Fig. 8 is the scheme of installation of elastic holding structure；
Fig. 9 is magnet structure schematic diagram；
Figure 10 is eccentric mixing mechanism structural schematic diagram；
Figure 11 is eccentric mixing mechanism other side structural schematic diagram.
Specific embodiment
The invention will be further described with attached drawing with reference to embodiments.
Referring to figs. 1 to suction chemical illumination immunity analysis instrument washing system, mainly include shown in Figure 11 substrate 1,
Mobile foundation 2 washs cup holder 3, wash 4 and magnet mounting base 5, wherein the generally rectangular frame structure of substrate 1, mobile base
Seat 2 is movably set on substrate 1, and can the front-rear direction of opposing substrate 1 (coordinate is illustrated in front-rear direction, that is, Fig. 3 referred to herein
X to, corresponding left and right directions be Y-direction, short transverse is Z-direction), on its sliding stroke there is dress to take, substrate filling and wash
Three positions are washed, and corresponding position can be rested on, waiting or the process for completing corresponding position.
Washing cup holder 3 is fixedly arranged on mobile foundation 2, and to follow the sliding of mobile foundation 2 to reach, dress is taken, substrate fills or washing
Position washs to have on cup holder 3 and sets cup aperture 30 along what its Y-direction was distributed, sets cup aperture 30 and be mainly used for placing response cup 33, substrate 1
Upper corresponding washing location be equipped with wash 4, wash 4 can opposing substrate 1 carry out Z-direction lifting moving, with complete washing behaviour
Make.
Magnet mounting base 5 relatively moves 2 activity setting of pedestal, but can follow 2 synchronous slide of mobile foundation, magnet installation
Preceding adsorption plate 5a and rear adsorption plate 5b with the setting of front and back face on seat 5, with can on preceding adsorption plate 5a and rear adsorption plate 5b
Releasably mode is equipped with magnet M, and magnet M is arranged in a one-to-one correspondence with cup aperture 30 is set, and magnet mounting base 5 relatively moves pedestal 2 and slides
When, when current adsorption plate 5a is close to the front side of washing cup holder 3, then rear adsorption plate 5b is relatively distant from the rear side of washing cup holder 3, this
When, magnetic particle absorption is carried out by the magnet M on preceding adsorption plate 5a, magnetic particle is adsorbed to the front side of reaction cup 33, opposite,
When rear adsorption plate 5b is close to far from the rear side for washing cup holder 3, preceding adsorption plate 5a is then relatively distant from the front side of washing cup holder 3, this
Shi Ze carries out magnetic particle absorption by the magnet M on rear adsorption plate 5b, i.e., magnetic particle is adsorbed to the rear side of reaction cup.
Referring to figs. 1 to Fig. 6, wash mainly includes and the washing washing mounting plate disposed in parallel of cup holder 3 in the application
40, and the top that mounting plate 40 is located at washing cup holder 3 is washed, washing on mounting plate 40 has the washing needle group being distributed along Y-direction
400, washing needle group 400 is arranged in a one-to-one correspondence with cup aperture 30 is set, and each washing needle group 400 includes a washing filling needle and suction
Needle.
The position of corresponding washing 40 one end of mounting plate is equipped with Z-direction and washs sliding rail 10 on substrate 1, and it is vertical that Z-direction washs sliding rail 10
It is supported on substrate 1, there is the Z-direction being slidably matched with Z-direction washing sliding rail 10 to wash sliding block 41 for washing 40 end of mounting plate, with this
Meanwhile the top of Z-direction washing sliding rail 10 is equipped with for driving washing mounting plate 40 to carry out lifting carriage along Z-direction washing sliding rail 10
Driving motor A1a when washing mounting plate 40 is gone up and down, can drive washing needle group 400 to be gone up and down, complete washing operation.
In addition, the front side of washing mounting plate 40, which has, fills sliding rail 42 along the Y-direction that Y-direction is arranged, have on Y-direction filling sliding rail 42
Have and fill sliding block 43 with the Y-direction of its sliding rail cooperation, while there is the substrate needle stand being firmly connected with it on Y-direction filling sliding block 43
44, there are on substrate needle stand 44 one or more substrates to fill needles 440, for filling substrate solution, meanwhile, washing mounting plate 40
One end is installed with the driving motor C45 for driving substrate needle stand 44 to slide along Y-direction filling sliding rail 42, in this way when substrate needle stand 44
When sliding along Y-direction filling sliding rail 42, the substrate filling of multiple reaction cups 33 can be completed.
With reference to Fig. 2, Fig. 3 Fig. 7 and Fig. 8, magnet mounting base 5 is substantially in U-shape frame structure in the application, magnet mounting base 5
In sliding, preceding adsorption plate 5a with washing cup holder 3 front side be close to when, then be absorption position before magnet mounting base 5, conversely, when after
It is then the rear absorption position of magnet mounting base 5, while in magnet mounting base 5 when adsorption plate 5b is close to the rear side of washing cup holder 3
It is equipped with elastic holding structure between washing cup holder 3, elastic holding structure in the initial state can apply magnet mounting base 5
Certain elastic acting force makes magnet mounting base 5 be maintained at preceding absorption position or be maintained at rear absorption position, that is, ensures not by it
When his active force, preceding adsorption plate 5a or any side corresponding with washing cup holder 3 rear adsorption plate 5b are close to, to keep lasting absorption
State.
Herein on basis, adjustment part is movably set on substrate 1, adjustment part is mainly used for exerting a force to magnet mounting base 5,
So that it is overcome the elastic force of elastic holding structure, and make magnet mounting base 5 from preceding absorption position be moved to rear absorption position or from
Absorption position is moved to preceding absorption position afterwards.
Its specific structure is referring to FIG. 8, elastic holding structure mainly includes two guiding along X to setting in the present embodiment
Bar 50 is arranged with pressure spring 51 on guide rod 50, as shown, two guide rods 50 are located at the both ends of washing cup holder 3, washing
The position that guide rod 50 is corresponded on cup holder 3 is equipped with via hole 31, and the rear end of guide rod 50 is fixed on rear adsorption plate 5b, meanwhile, it is preceding
The position that guide rod 50 is corresponded on adsorption plate 5a and rear adsorption plate 5b is equipped with guide hole 52, the front end of pressure spring 51 and washing cup holder 3
It abuts, washs and correspond to the counterbore that there is via hole 31 to be arranged concentrically for the position of pressure spring 51 on cup holder 3, the rear end of pressure spring 51 and rear absorption
Plate 5b is abutted, because washing cup holder 3 is in relatively fixed state, then pressure spring 51 applies thrust backwards to rear adsorption plate 5b,
So that magnet mounting base 5 has mobile trend backwards, until preceding adsorption plate 5a is close to the front side of washing cup holder 3, certainly, will press
The setting of spring 51 is between preceding adsorption plate 5a and washing cup holder 3, then original state is opposite.
To guarantee that magnet mounting base 5 is slided in opposite washing cup holder 3, and stabilization when with 2 integral slipping of mobile foundation
Property, guide rail 32 is equipped at the both ends of washing cup holder 3 in the present embodiment, washs the both ends of cup holder 3 respectively with guide rail 32, washs cup holder
3 be to be fixedly supported on mobile foundation 2, and the two sides of magnet mounting base 5 are then slidably matched with guide rail 32, while realizing magnet
The sliding support of mounting base 5.
With reference to Fig. 5 to Fig. 8, adjustment part is mainly poke rod 46 in the present embodiment, and poke rod 46 is vertically arranged at pedestal needle
The bottom of seat 44, so that it can follow wash 4 to carry out elevating movement, poke rod 46 is located at substrate filling needle in the present embodiment
Between 440 and washing needle group 400, depending on height and position is as needed, when wash 4 declines, poke rod 46 can then be stretched
Before entering between adsorption plate 5a and washing cup holder 3, so that magnet mounting base 5 be made to overcome the reaction force of pressure spring 51, cup is washed relatively
Seat 3 moves forward, it is made to be moved to rear absorption position from preceding absorption position, so that the switching of magnetic pole is realized, if pressure spring 51 is arranged certainly
Between preceding adsorption plate 5a and washing cup holder 3, when original state is opposite, the position of poke rod 46 then accordingly changes, when it
It when declining with wash 4, then can protrude between rear adsorption plate 5b and washing cup holder 3, to keep it mobile from rear absorption position
To preceding absorption position.
For allow poke rod 46 smoothly protrude into preceding adsorption plate 5a and washing cup holder 3 between or protrude into rear adsorption plate 5b with
It washs between cup holder 3, therefore is entered by the way of transverse shifting, as shown, the lower end of poke rod 46 is installed with bearing 47, when
When magnet mounting base 5 is in preceding absorption position, the sum of width of the diameter of bearing 47 and washing cup holder 3 and preceding adsorption plate 5a and after
Hanging down away from being adapted between adsorption plate 5b, i.e., as shown in figure 8, enabling the vertical relief width between washing cup holder 3 and rear adsorption plate 5b
Degree is D, and the diameter of bearing 47 is then just equal with D, in preceding adsorption plate 5a or the one end rear adsorption plate 5b close to the one of washing cup holder 3
Side is equipped with guiding surface 52, and in the present embodiment, guiding surface 52 is located at the left end preceding adsorption plate 5a, and elastic holding structure is in initially
When state, the gradually smaller entrance of opening is formed between guiding surface 52 and washing cup holder 3, is entered when bearing 47 drops to this
It when mouth position, drives substrate needle stand 44 to slide along Y-direction by driving motor C, then can make, bearing 47 can smoothly enter into washing cup holder 3
Between preceding adsorption plate 5a, the two is separated, then adsorption plate 5b is then close to the rear side of washing cup holder 3.
With reference to Fig. 9, magnet M is distributed in a manner of Halbach array in the present embodiment, as shown, each magnet M
The magnetic patch of distribution including at least three in a manner of Halbach array, from left to right respectively left magnetic patch M1, intermediate magnetic patch M2
With right magnetic patch M3, the magnetic induction line direction of three is as shown in hollow arrow in figure, and the width and thickness ratio of three is substantially as schemed
Shown, i.e., the width of intermediate magnetic patch M2 accounts for the half or more more of 33 width of reaction cup, and left magnetic patch M1 and right magnetic patch M3
Thickness it is almost the same, and be symmetrically disposed on the two sides of intermediate magnetic patch M2, and be at least partially in the width range of reaction cup 33
Within, to achieve the purpose that obtain maximum magnetic field strength with minimum volume.
Referring to figs. 1 to Fig. 4, mobile foundation 2 is located at 1 lower section of substrate in the present embodiment, and 1 bottom of substrate corresponds to mobile foundation 2
The position at both ends has along X to the X of setting to sliding rail 11, and the both ends of mobile foundation 2 are then installed with and match with X to the sliding of sliding rail 11
The X of conjunction is to sliding block 20, correspondingly, substrate 1 is equipped with the power mechanism for driving mobile foundation 2 to slide along X to sliding rail 11, this
Its power mechanism of embodiment is driving motor B1b, and driving motor B1b with and driving motor A1a and driving motor C45 structure
It is similar, lead screw motor or telescope motor etc. can be used, certainly, being substituted for pneumatic structure can also be with the application's
Within protection scope.
Substrate 1 is substantially in " mouth " shape frame structure, and the position of corresponding washing cup holder 3 and magnet mounting base 5 is equipped with peace thereon
Fill mouth 12, the sliding stroke setting of the corresponding mobile foundation 2 of installing port 12, so that the two can be slid up by the installing port 12 in X
It moves, and protrudes from the upper surface of substrate 1, in order to wash the operation such as filling or magnetic pole switching.
From detection efficiency angle is improved, it is mixed that a bias is respectively provided in the application at left and right sides of the front of substrate 1
Even mechanism 6 mainly includes as shown in Figure 10 and Figure 11 mixing mounting plate 60, and mixing on mounting plate 60 has with rotatable side
The vertically arranged eccentric shaft 61 of formula, and the mixing motor 62 for driving eccentric shaft 61 to rotate by belt gear, wherein partially
Fixed be supported by mixes seat 63 at the top of mandrel 61, mixes to be equipped in seat 63 and mixes slot 630, when mixing, can be put into reaction cup 33
It mixes in slot 630.
At the same time, the corresponding seat 63 that mixes is additionally provided with mixing guide frame, mainly includes being arranged in a mutually vertical manner lower part
Guide rail 64 and upper rall 67, wherein upper rall 64 is fixedly connected with seat 63 is mixed, and is had in lower guide 64 and slided with it
The lower slider 65 of cooperation is moved, there is the upper slider 65 being slidably matched with it, lower slider 65 and top on upper rall 67
Sliding block 65 is mutually permanently connected by attachment base 66, in this way when mixing motor 62 eccentric shaft 61 being driven to rotate, mix seat 63 by
The limitation for mixing guide frame, actually does rotary motion, is improving mixed effect in this way while can guarantee to mix seat to greatest extent
63 stability prevents the solution in reaction cup 33 from splashing out.
Referring to figs. 1 to shown in Figure 11 to suction chemical illumination immunity analysis instrument washing system, when installation, first by substrate
1 is fixed on the platform steel plate 7 of analyzer, and the position that installing port 12 is corresponded on platform steel plate 7 is equally open, and is then sequentially completed
Mobile foundation 2, the installation for washing cup holder 3, magnet mounting base 5 and wash 4, and corresponding each moving parts setting senses in place
Device, to ensure that position is mobile accurate, setting-up eccentricity mixing mechanism 6 again later, and make to mix motor 62 and be located under platform steel plate 7
Side, and lower guide 64 is then fixedly arranged on the upper surface of platform steel plate 7, makes full use of down space on platform steel plate 7 with this, improves empty
Between utilization rate.
In the course of work, when initial, mobile foundation 2 is in dress fetch bit and sets, and completes the reaction cup 33 being incubated for, is put into through handgrip
It sets in cup aperture 30, magnet mounting base 5 is in preceding absorption position at this time, and magnetic particle is adsorbed to instead substantially in solution in reaction cup 33
The front side wall of cup 33 is answered, then by driving motor B1b, makes mobile foundation 2 along X to the washing location for sliding into rearmost end, into
And by driving motor A1a, decline wash 4, washing needle group 400, which protrudes into reaction cup, completes washing imbibition movement, washes
It washs component 4 and is lifted up appropriate distance, start fluid injection, pass through driving motor C45 mobile substrate needle while fluid injection movement is completed
Seat 44 makes magnet mounting base 5 be moved to rear absorption position before being caught in bearing 47 between adsorption plate 5a and washing pedestal 3, realizes
Magnetic pole switching, then the magnetic particle in solution is adsorbed to the rear wall of reaction cup 33, and magnetic pole recovery has recycled after stagnating the several seconds
At after imbibition and fluid injection and complete one wheel washing movement.
After completing washing operation, and mobile foundation 2 is moved to substrate filling position forward, needle 440 is filled by substrate
Substrate is filled into reaction cup 33, it should be noted that as long as mobile foundation 2 leaves washing location, magnet mounting base 5 is restored
To preceding absorption position, after substrate filling is completed, mobile foundation 2, which continues to be moved to dress fetch bit forward, to be set, and will fill substrate
The taking-up of reaction cup 33 is put to after being mixed in the eccentric mixing mechanism 6 in left side, can be sent into lower part detection process, simultaneously
Reaction cup 33 to be washed is filled into cup aperture 30 to setting of vacating, is successively gradually carried out, and repeatedly washing greatly improves detersive efficiency
And quality, while being kept by the intensity of magnet M and position, the Loss Rate of magnetic particle in solution is effectively reduced, to improve inspection
Survey result precision.
Finally, it should be noted that foregoing description is only the preferred embodiment of the present invention, the ordinary skill people of this field
Member under the inspiration of the present invention, without prejudice to the purpose of the present invention and the claims, can make multiple similar tables
Show, such transformation is fallen within the scope of protection of the present invention.
Claims (10)
1. a kind of pair of suction chemical illumination immunity analysis instrument washing system characterized by comprising
Substrate (1) is movably set with wash (4) thereon, and the wash (4) can opposing substrate (1) lifting；
Mobile foundation (2) is movably set on substrate (1), and can opposing substrate (1) sliding；
It washs cup holder (3), is fixedly arranged on mobile foundation (2), and have what is be distributed along its length to set cup aperture (30)；
Magnet mounting base (5) is movably set on mobile foundation (2), and in the position of face washing cup holder (3) front and rear sides
It is respectively equipped with preceding adsorption plate (5a) and rear adsorption plate (5b), all has and sets on the preceding adsorption plate (5a) and rear adsorption plate (5b)
The magnet (M) that cup aperture (30) is arranged in a one-to-one correspondence, the magnet mounting base (5) opposite can wash cup holder (3) and slide back and forth, so that
Preceding adsorption plate (5a) or the close face side with washing cup holder (3) of rear adsorption plate (5b).
2. according to claim 1 to suction chemical illumination immunity analysis instrument washing system, it is characterised in that: the magnet
(M) it is distributed in a manner of Halbach array.
3. according to claim 1 to suction chemical illumination immunity analysis instrument washing system, it is characterised in that: the washing
Component (4) includes and washs cup holder (3) washing mounting plate (40) disposed in parallel, has on the washing mounting plate (40) and sets cup
The washing needle group (400) that hole (30) is arranged in a one-to-one correspondence；
One end of corresponding washing mounting plate (40) of the substrate (1) is equipped with Z-direction washing sliding rail (10), and it is perpendicular that Z-direction washs sliding rail (10)
To being fixedly arranged on substrate (1), there is the Z-direction being slidably matched with Z-direction washing sliding rail (10) to wash on washing mounting plate (40)
Sliding block (41), the substrate (1) are equipped with the drive for driving washing mounting plate (40) along Z-direction washing sliding rail (10) lifting carriage
Dynamic motor A (1a).
4. according to claim 3 to suction chemical illumination immunity analysis instrument washing system, it is characterised in that: the washing
On mounting plate (40) have be arranged along its length Y-direction filling sliding rail (42), the Y-direction filling sliding rail (42) on have and its
Y-direction filling sliding block (43) being slidably matched, the Y-direction, which fills, has the substrate needle stand (44) connected with it on sliding block (43), should
Substrate needle stand (44) is equipped at least one substrate filling needle (440)；
Washing mounting plate (40) is equipped with driving motor C (45) close to one end of Z-direction washing sliding rail (10), the driving motor
C (45) is for driving substrate needle stand (44) along the horizontal sliding of Y-direction filling sliding rail (42).
5. according to claim 4 to suction chemical illumination immunity analysis instrument washing system, it is characterised in that: the magnet
Opposite washing cup holder (3) of mounting base (5) has preceding absorption position and rear absorption position, the magnet mounting base (5) and washing cup
Seat (3) between be equipped with elastic holding structure, elastic force magnet mounting base (5) can be elastically held in front of absorption position or after
Absorption position is movably set with adjustment part on the substrate (1), and the adjustment part can overcome elastic guarantor under driving force effect
The elastic force of structure is held, so that magnet mounting base (5) is moved to rear absorption position from preceding absorption position or moves from rear absorption position
To preceding absorption position.
6. according to claim 5 to suction chemical illumination immunity analysis instrument washing system, it is characterised in that: the elasticity
Keeping structure includes the guide rod (50) for being symmetrically disposed on washing cup holder (3) both ends, and is sheathed on the guide rod (50)
Pressure spring (51), the rear end of the guide rod (50) is fixedly connected with rear adsorption plate (5b), the preceding adsorption plate (5a) and rear inhales
The position that guide rod (50) is corresponded in attached plate (5b) is equipped with guide hole (52), and the position of guide rod (50) is corresponded in washing cup holder (3)
It sets with via hole (31), the both ends of the pressure spring (51) are abutted with rear adsorption plate (5b) and washing cup holder (3) respectively, the washing
Cup holder (3) both ends are installed with the guide rail (32) being slidably matched with magnet mounting base (5).
7. according to claim 5 to suction chemical illumination immunity analysis instrument washing system, it is characterised in that: the adjustment
Part includes vertically arranged poke rod (46), and the poke rod (46) can go up and down with wash (4), and controllably protrude into and wash
It washs between cup holder (3) and preceding adsorption plate (5a) or washing cup holder (3) is afterwards between adsorption plate (5b), selectively to make preceding adsorption plate
(5a) or rear adsorption plate (5b) are close to or far from washing cup holder (3).
8. according to claim 7 to suction chemical illumination immunity analysis instrument washing system, it is characterised in that: described to stir
Bar (46) lower end is installed with bearing (47), when the elastic holding structure is in original state, washs the width and axis of cup holder (3)
Distance between the sum of (47) diameter and preceding adsorption plate (5a) and rear adsorption plate (5b) is held to be adapted；
The poke rod (46) is fixedly arranged on the bottom of substrate needle stand (44), the preceding adsorption plate (5a) or afterwards the one of adsorption plate (5b)
End is equipped with guiding surface (52) close to the side of washing cup holder (3).
9. as claimed in any of claims 1 to 6 to suction chemical illumination immunity analysis instrument washing system, feature
Be: the washing system further includes two eccentric mixing mechanisms (6), and two eccentric mixing mechanisms (6) are located at base
The front end two sides of plate (1).
10. it is as claimed in any of claims 1 to 6 to suction chemical illumination immunity analysis instrument washing system, it is special
Sign is: the mobile foundation (2) is located at below substrate (1), and the position that mobile foundation (2) both ends are corresponded on substrate (1) is equipped with X
To sliding rail (11), mobile foundation (2) both ends have with the X to the X that sliding rail (11) is slidably matched to sliding block (20), described
Substrate (1) is equipped with the power mechanism for driving mobile foundation (2) to slide along X to sliding rail (11), and substrate (1) is equipped with installing port
(12), the installing port (12) and the sliding stroke of mobile foundation (2) are adapted.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201910902256.4A CN110514824A (en) | 2019-09-24 | 2019-09-24 | To suction chemical illumination immunity analysis instrument washing system |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201910902256.4A CN110514824A (en) | 2019-09-24 | 2019-09-24 | To suction chemical illumination immunity analysis instrument washing system |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN110514824A true CN110514824A (en) | 2019-11-29 |
Family
ID=68631951
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201910902256.4A Pending CN110514824A (en) | 2019-09-24 | 2019-09-24 | To suction chemical illumination immunity analysis instrument washing system |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN110514824A (en) |
Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2016046402A1 (en) * | 2014-09-25 | 2016-03-31 | Altergon Italia S.R.L. | Apparatus for separation, washing and mixing of magnetic particles in a reaction cup, adapted to be used in an immunoanalyzer system |
| WO2016046403A1 (en) * | 2014-09-25 | 2016-03-31 | Altergon Italia S.R.L. | Device for mixing magnetic particles and liquid in a reaction cup, adapted to be used in an apparatus for separation, washing and mixing of the contents of said reaction cup, in an immunoanalyzer system |
| CN109675889A (en) * | 2019-02-20 | 2019-04-26 | 重庆科斯迈生物科技有限公司 | With the chemical illumination immunity analysis instrument washing system for mixing function |
| CN109675890A (en) * | 2019-02-20 | 2019-04-26 | 重庆科斯迈生物科技有限公司 | Disc type chemical illumination immunity analysis instrument washing system |
| CN210954054U (en) * | 2019-09-24 | 2020-07-07 | 重庆科斯迈生物科技有限公司 | Washing system of strong-suction type chemiluminescence immunoassay analyzer |
-
2019
- 2019-09-24 CN CN201910902256.4A patent/CN110514824A/en active Pending
Patent Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2016046402A1 (en) * | 2014-09-25 | 2016-03-31 | Altergon Italia S.R.L. | Apparatus for separation, washing and mixing of magnetic particles in a reaction cup, adapted to be used in an immunoanalyzer system |
| WO2016046403A1 (en) * | 2014-09-25 | 2016-03-31 | Altergon Italia S.R.L. | Device for mixing magnetic particles and liquid in a reaction cup, adapted to be used in an apparatus for separation, washing and mixing of the contents of said reaction cup, in an immunoanalyzer system |
| CN109675889A (en) * | 2019-02-20 | 2019-04-26 | 重庆科斯迈生物科技有限公司 | With the chemical illumination immunity analysis instrument washing system for mixing function |
| CN109675890A (en) * | 2019-02-20 | 2019-04-26 | 重庆科斯迈生物科技有限公司 | Disc type chemical illumination immunity analysis instrument washing system |
| CN210954054U (en) * | 2019-09-24 | 2020-07-07 | 重庆科斯迈生物科技有限公司 | Washing system of strong-suction type chemiluminescence immunoassay analyzer |
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