CN1104523C - 半导体净化室中使用的防尘织物及其制造方法 - Google Patents
半导体净化室中使用的防尘织物及其制造方法 Download PDFInfo
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Abstract
提供一种半导体净化室用防尘织物,能够实现高防尘性能和高穿着舒适性,这种防尘织物包括:由针织品构成的内层;固定于内层上且由非微孔型高吸湿性聚氨基甲酸酯树脂膜形成的中间层;固定于中间层上的外层,该层由高密度的聚酯纺织品形成,具有彼此间以很小间距排列的导电丝经线和纬线。
Description
本发明涉及半导体净化室中使用的防尘织物及其制造方法,特别涉及半导体器件制造工艺的净化室中使用的防尘织物及其制造方法,通过叠加亲水的聚氨基甲酸酯树脂膜、聚酯高密度纺织品和针织品提供很好的防尘性能和穿着舒适性。
净化室越来越常用于各领域。对保持半导体制造净化室的洁净度的需求非常近切。为避免因如灰尘或工人自身产生的湿汽(以后称作颗粒)等污物造成的污染危险,必须非常小心的设计和制造引入和用在净化环境的净化服的织物。
在早期的半导体器件制造工艺中,不需要制造象现在那样的高集成度半导体器件,净化室的洁净度保持在10-100K的净化级,用普通的尼龙或聚酯塔夫绸作为制造工作服的材料。
然而,由于半导体器件制造工艺自身对如沾污、静电问题等净化环境更敏感,所以,采用了导电聚酯织物制作净化服。
近年来,针对如64M DRAM、256M DRAM等集成度日益提高的半导体器件及其亚微米级的临界尺寸,对用于净化服的织物材料的研究更加深入,净化室的洁净度应保持低于10K级。
因为由常规尼龙塔夫绸或聚酯塔夫绸的经线和纬线限定的孔隙甚至在用超细纤维时也很大,所以这些材料不足以防止来源自工人身体的湿汽或细颗粒的污染。因此,为了解决此问题,用透湿性和防水性、斥水性涂层或聚氨基甲酸酯树脂或氟树膜的叠层处理织物。图1示出了作过上述处理的的织物的一部分,该产品是由美国的杜邦(Dupon)公司生产的,商标为GORETEX。
如图1所示,具有透湿性和防水性及防尘性的上述织物,是通过用聚氨基甲酸酯和/或氟树脂膜1涂敷聚酯纺织品3制造的,聚酯纺织3中具有排成行的导电丝2。如图2所示,人体产生的颗粒无法通过所涂敷的树脂膜1,湿汽颗粒从透湿汽的织物通过树脂颗粒的细孔。然而,较大尺寸的水分子不能透过形成于涂层15上的孔(或气孔),因此,透湿性降低,穿着舒适性变差。在织物中设置树脂涂层1、15时,由于人体皮肤直接与防水材料接触,其穿着舒适性进一步变差。
本发明旨在提供一种用于半导体器件制造工艺所用净化室的防尘织物,用以提高防尘性能,基本上克服由于现有技术的缺点和局限造成的一个或多个问题。
本发明另一目的是提供防尘织物,其透水性和穿着舒适性提高。
为实现这些和其它优点,根据所具体和概括描述的本发明的目的,用于净化室的防尘织物包括:由针织品构成的内层;固定于内层上且由非微孔型高吸湿性聚氨基甲酸酯树脂膜形成的中间层;固定于中间层上的外层,该层由高密度的聚酯纺织品形成,具有彼此间以很小间距排列的导电丝经线和纬线。
内层针织品较好是由具有高强度和弹性的尼龙针织品的经线针织品构成,更好是可以用Smith结构。
中间层和内层通过点结合固定,最好是固定时可以用热熔粘合剂。
中间层和外层通过点结合或粘合剂的薄涂层膜固定。
外层的高密度聚酯纺织品是通过波浪和岛型或隔离型的共轭纺丝由长丝旦数为0.1以下的超细丝构成的。
此外,对于外层的高密度聚酯纺织品来说,关于纺织品的高密度编织和弹性性能,较好是用2/1斜纹结构,尤其是,更好用人字形斜纹结构。
制造半导体净化室用的防尘织物的方法包括以下步骤:(a)制备旦数为50-100且包括丝旦数为15-30的导电丝的普通聚酯经线和纬线,所说导电丝沿经线和纬线方向以一定间隔排列,每英寸经线密度为140-170,每英寸纬线密度为90-130,利用常规聚酯织物的染色和处理方法,用白染料将织物染色,并干燥和热定形,由此制造作为外层的纺织品;(b)用作为皮肤层的高吸湿性的非微孔型聚氨基甲酸酯树脂涂敷脱模纸(release paper),利用粘合剂涂层将第一步制造的外层织物固定到其上,并在100-130℃的温度下热定形10-30分钟,由此完成移膜涂布;(c)在50-80℃的温度下老化结合在一起的各层15小时以上,以便在皮肤层聚氨基甲酸酯树脂中发生充分的桥接反应,并去掉脱模纸;(d)将尼龙针织品固定到聚氨基甲酸酯涂层上,并在50-80℃的温度下老化15小时以上。
用于第一步编织的聚酯丝可以是拉伸加捻的丝。此外,较好是在第一步将外层的高密度纺织品染色后,可以进行抗静电处理。
应该理解,上述一般性的说明和以下的具体说明都是例示性和解释性的,意在对所申请的本发明作进一步的解释。
各附图中:
图1示意性地展示了半导体器件制造工艺中净化室中所用的常规防尘织物的层状结构;
图2是半导体器件制造工艺中净化室中所用的常规防尘织物的涂层的剖面图,展示了湿汽分子通过涂层排放的情况;
图3示意性地展示了本发明半导体器件制造工艺中净化室中所用防尘织物的层状结构;
图4展示了制造本发明防尘织物的方法的处理流程;
图5是半导体器件制造工艺中净化室中所用防尘织物的涂层的剖面图,展示了湿汽分子通过本发明的涂层排放的情况。
下面将具体说明本发明的优选实施例,这些实施例是各附图所示的实例。
图3是展示本发明半导体器件制造工艺中净化室中所用防尘织物的层状结构、其剖面结构的构形和其防尘性能及透水性的示意图。
参见图3,防尘织物的外层101由包括导电丝104的高密度聚酯纺织品构成,所说导电丝104沿经线和纬线方向以彼此很小的间隔排列,外层101由高密度纺织品构成,其中其编织密度T为230-300(T是表示纤维编织结构的密度单位。由经线和纬线方向上的每英寸的长丝数总和表示,是该行业常用的单位。)。上述高密度纺织品因其结构点小且其孔隙小而具有很好的防尘性能。
本发明的高密度纺织品外层中可以使用各种导电丝104,例如用碳覆盖长丝表面,或通过共轭纺丝将碳注入到长丝中等。外层中的导电丝104的排列间隔为0.3-1cm,从编织效率和导电性方面考虑这样较好。
关于本发明纺织品的长丝和导电丝的旦数,前者由丝旦数为50-100的丝构成,后者由丝旦数为15-30的丝构成,从编织效率和导电性方面考虑这样做特别好。令人满意的是,纺织品的经线和纬线为方便纺织的长丝。
聚酯纺织品的结构较好是2/1斜纹结构,尤其是人字形斜纹结构,这对于提供高弹性和高密度结构有益。
关于外层101下的中间层102,有一种是由高吸湿性的非微孔型聚氨基甲酸酯树脂膜形成的,这种聚氨基甲酸酯树脂包括酯或醚基团。粘结层设置于外层101和中间层102之间,粘结层的厚度应尽可能的薄,以避免由于厚粘线层导致的透水性变差,或采用点结合法。
所以来自人体的湿汽或汗通过内层103的针织品,被高密度的聚氨基甲酸酯树脂膜所吸收。如此,在湿汽或汗通过聚氨基甲酸酯树脂膜时,它们变成细得不足以构成半导体器件制造工艺中的沾污的汽化分子(0.001微米或更小),并从外层101排放到大气中。因此,在提高其穿着舒适性的同时防止了细颗粒通过织物。
由于内层103直接与人体的皮肤接触,考虑到可动性,内层103的针织品和中间层102最好是通过点结合法固定,但也可以采用热熔粘合剂作为固定用粘合剂。
同时,参见图4,该图展示了制造本发明的半导体净化室用防尘织物的方法的处理流程,首先,制造作为外层的高密度聚酯纺织品,然后,借助移膜涂布,利用脱模纸,制造作为中间层的高吸湿性聚氨基甲酸酯树脂膜,中间层将固定于外层上,由此制造防尘织物。然后,在将外层和中间层粘结后,通过将作为内层的针织品固定到中间层上完成该方法。
制造本发明半导体净化室用防尘织物的详细方法包括以下步骤:通过编织、洗净、染色和热定形工艺制造作为外层的高密度聚酯纺织品(第一步);用将作为中间的皮肤层的高吸湿性聚氨基甲酸酯树脂膜涂敷脱模纸,将高密度聚酯纺织品固定于其上,然后,进行热定形(第二步);在结合在一起的外层和中间老化后,去掉脱模纸(第三步);将一种针织品固定于中间层上,并老化结合在一起的各层(第四步)。
第一步的编织是利用普通的喷水织机进行的,为了提高织物的编织密度和弹性,较好是采用斜纹结构。尤其是,为了同时保持织物的结构强度和弹性,采用2/1斜纹结构,更好是采用人字形斜纹结构。
由于用作构成聚酯纺织品的经线和纬线的普通聚酯丝和导电丝具有不同的长丝旦数,且因此强度和拉伸率皆不同,所以,在编织时应控制经线和纬线的张力。本发明的织物中,经线密度为每英寸140-170,纬线密度为每英寸90-130,将这些数相加,制造密度为230-300T的高密度织物。此外,聚酯的丝旦数为50-100,导电丝的丝旦数为15-30,这对于编织性能和穿着舒适性来说都有益。使用普通聚酯织物的普通处理方法进行洗净、染色和干燥工艺。
为了提高弹性和对树脂层的良好粘附性,对于普通聚酯来说可以采用拉伸加捻丝,为了最小化静电的发生,可以在染色后再采用抗静电处理。
第二步中,聚氨基甲酸酯是一种非微孔高吸湿性聚氨基甲酸酯树脂。
特别是,最好可以采用那些包括亲水酯或醚类的聚氨基甲酸酯树脂。此外,可以用普通移膜涂布机作为涂敷机。
第三步中,最好是在50-80℃老化结合在一起的各层15小时以上,以使聚氨基甲酸酯树脂中发生充分地桥接反应。
第四步中,最好是在50-80℃老化结合在一起的各层15小时以上。最好是通过点结合法进行固定,以使最终制造的产品具有活动灵活性。
图5是半导体器件制造工艺中净化室中所用防尘织物的涂层的剖面图,展示了湿汽分子通过本发明的涂层排放的情况。与现有技术不同,颗粒通过细气隙排放,汽化的颗粒12在涂层13上被吸收,并向外扩散,在变成汽化分子11后排放出去。因此,沾污颗粒在变细后排放,可以防止由于孔隙的阻塞导致的妨碍沾污排放。
下面用一个实施例充分说明本发明。应该理解,该实施例只是用于说明本发明,并不意味着对发明的限定。
实施例
利用喷水织机制造将作为外层的高密度纺织品,经线和纬线方向上导电丝间的间隔为0.6cm。经线和纬线的长丝是聚酯长丝,两者的旦数皆为70,导电丝长丝的旦数为20。编织密度为65×115。纺织品为2/1斜纹结构。
在连续的洗净机中,在90℃的温度下,以每分钟60米的速度洗净原材料织物,利用圆形染色机,用白色染料染色,并在拉幅机中在140℃的温度下,以每分钟60米的速度进行热定形,以得到作为外层的高密度纺织品。
利用连续的涂敷机,在110-120℃的温度下,以每分钟20米的速度,用含高吸湿性酯类的非微孔型聚氨基甲酸酯树脂膜涂敷平坦型脱模纸,并再用粘结剂涂敷。然后,在通过压在两滚轴间将上述高密度纺织品粘结于粘结层上后,在60℃的温度下老化24小时,以使尿烷树脂分子内发生充分的桥接反应。
然后,去掉脱模纸,利用点结合法将Smith结构的尼龙针织品粘结于去掉了脱模纸的表面上,在60-70℃的温度下老化24小时,最终制造本发明的半导体净化室用防尘织物。
下表展示了本发明的防尘织物和现有技术的织物的性能比较结果,现有技术的织物是由微孔型聚氨基甲酸酯树脂涂层和聚酯纺织品构成的双层结构。
表1
类别 | 颗粒防护 | 透湿性 | 电阻 | 膜强度 | 弹性 | 透气性 |
本实施例的防尘织物 | 对于0.1微米的颗粒超过99% | 10000 | △ | ◎ | ◎ | 0.11 |
常规防尘织物 | 对于0.3微米的颗粒超过99% | 8000 | △ | △ | △ | 小于0.05 |
上表中,利用KSK 0594标准的乙酸钾法探测透湿性,利用KSK0570标准的Frazier法探测透气性。
由本发明的防尘织物制作的净化室制服基本上能满足用于对于0.1-0.001微米的颗粒来说洁净度应保持低于10级的高集成度半导体器件用的净化室。
由于人体产生的湿汽容易排放,所以,本发明的净化室制服具有很好的穿着舒适性,另外,由于净化服所用的织物是通过在使用了导电丝的高密度纺织品上涂敷高吸湿性聚氨基甲酸酯膜、对纺织品的抗静电处理、及导电丝排的电晕放电处理制造的,所以其防尘性能得到了显著的提高。
此外,可以借助本发明的作为中间层的高吸湿性聚氨基甲酸酯膜和高密度纺织品防止由人体产生的尺寸为0.001-0.1微米的超细颗粒。
另外,尽管以上具体描述了本发明,但应该理解,在不背离由所附权利要求书所限定的范围的情况下,可以作出各种改变、替换和变换。
Claims (11)
1.半导体净化室用防尘织物,包括:
由针织品构成的内层;
用粘合剂固定于内层上且由非微孔型高吸湿性聚氨基甲酸酯树脂膜形成的中间层;以及
固定于中间层上的外层,该层由高密度的聚酯纺织品形成,具有彼此间隔排列的导电丝经线和纬线。
2.如权利要求1所述的防尘织物,其中内层针织品由高强度和弹性的尼龙针织品的经线针织品构成。
3.如权利要求1所述的防尘织物,其中中间层和内层通过点结合固定。
4.如权利要求1所述的防尘织物,其中中间层和外层通过利用粘合剂薄涂层膜的点结合固定。
5.如权利要求1所述的防尘织物,其中高密度聚酯纺织品通过波浪和岛型或隔离型的共轭纺丝,由长丝旦数为0.1以下的超细丝构成。
6.如权利要求1所述的防尘织物,其中高吸湿性聚氨基甲酸酯树脂含酯或醚基团。
7.如权利要求1所述的防尘织物,其中高密度聚酯纺织品具有斜纹结构。
8.制造半导体净化室用的防尘织物的方法,包括以下步骤:
(a)制备丝旦数为50-100且包括丝旦数为15-30的导电丝的普通聚酯经线和纬线,所说导电丝沿经线和纬线方向以一定间隔排列,编织成每英寸经线密度为140-170,每英寸纬线密度为90-130的2/1斜纹结构的高密度,利用聚酯织物的染色和处理方法,用白染料将织物染色,并干燥和热定形,由此制造作为外层的纺织品;
(b)用作为皮肤层的高吸湿性的非微孔型聚氨基甲酸酯树脂涂敷脱模纸,利用粘合剂涂层将第一步制造的外层织物固定到其上,并在100-130℃的温度下热定形10-30分钟,由此完成移膜涂布;
(c)在50-80℃的温度下老化结合在一起的各层15小时以上,以便在皮肤层聚氨基甲酸酯树脂中发生充分的桥接反应,并去掉脱模纸;以及
(d)将尼龙针织品固定到聚氨基甲酸酯涂层上,并在50-80℃的温度下老化15小时以上。
9.如权利要求8所述的制造防尘织物的方法,其中编织步骤中的聚酯丝是拉伸加捻丝。
10.如权利要求8所述的制造防尘织物的方法,其中在编织步骤将高密度纺织品外层染色后,进行抗静电处理。
11.利用权利要求1的防尘织物制造的半导体净化室用防尘服。
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DE102008003965A1 (de) | 2007-10-26 | 2009-04-30 | HÄNSEL VERBUNDTECHNIK GmbH | Textiles Flächengebilde für einen Fahrzeugsitzbezug |
KR101021091B1 (ko) * | 2008-05-22 | 2011-03-14 | 이왕섭 | 피브이에이 폴리우레탄폼 클린패드 제조방법 및 그클린패드 |
KR101028578B1 (ko) | 2008-12-11 | 2011-04-12 | 웅진케미칼 주식회사 | 착용감이 개선된 무진의용 원단 |
US9810704B2 (en) | 2013-02-18 | 2017-11-07 | Theranos, Inc. | Systems and methods for multi-analysis |
CN103361871A (zh) * | 2012-03-19 | 2013-10-23 | 厦门市康保无尘科技有限公司 | 防静电无尘布的制作方法 |
KR101458463B1 (ko) * | 2013-05-09 | 2014-11-07 | (주)셈텍스 | 다층 구조의 청바지 원단 및 그에 의한 청바지 |
CN104294446B (zh) * | 2014-08-06 | 2016-01-27 | 江苏顺远纺织科技有限公司 | 一种经纬向剪花面料 |
ES2870489T3 (es) * | 2017-01-23 | 2021-10-27 | Munksjoe Ahlstrom Oyj | Material textil de barrera transpirable para sala blanca |
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US4435458A (en) * | 1982-12-22 | 1984-03-06 | Becton, Dickinson And Company | Laminate for wearing apparel and methods for the manufacture of the laminate |
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DE3928163A1 (de) * | 1989-08-25 | 1991-02-28 | Ruiter Ernest De | Material fuer reinraumanzuege |
US5409564A (en) * | 1989-11-14 | 1995-04-25 | Aaldijk; Cornelius | Flexible crack spread preventing, separable web-type joining material for joining a bearing face of a structure to a covering layer to be provided thereon, method for use of and covering layer construction formed with this material |
DE4027797A1 (de) * | 1990-02-08 | 1992-03-05 | Hasso Von Bluecher | Schichtmaterial fuer medizinische zwecke |
DE4038705A1 (de) * | 1990-12-05 | 1992-06-11 | Hasso Von Bluecher | Schichtmaterial fuer medizinische zwecke |
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US5637368A (en) * | 1992-06-04 | 1997-06-10 | Minnesota Mining And Manufacturing Company | Adhesive tape having antistatic properties |
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US6168857B1 (en) * | 1996-04-09 | 2001-01-02 | E. Khashoggi Industries, Llc | Compositions and methods for manufacturing starch-based compositions |
US6001749A (en) * | 1997-07-30 | 1999-12-14 | Milliken & Company | Patterned conductive textiles |
-
1997
- 1997-12-24 KR KR1019970073509A patent/KR100244926B1/ko not_active IP Right Cessation
-
1998
- 1998-07-02 TW TW087110738A patent/TW396383B/zh not_active IP Right Cessation
- 1998-07-03 GB GB9814346A patent/GB2332643B/en not_active Expired - Lifetime
- 1998-07-16 JP JP20168198A patent/JP3639121B2/ja not_active Expired - Fee Related
- 1998-07-28 CN CN98103438A patent/CN1104523C/zh not_active Expired - Lifetime
- 1998-09-01 DE DE19839753A patent/DE19839753C2/de not_active Expired - Lifetime
- 1998-10-08 US US09/168,095 patent/US6040254A/en not_active Expired - Lifetime
-
1999
- 1999-12-21 US US09/468,320 patent/US6348116B1/en not_active Expired - Lifetime
Also Published As
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KR19990053808A (ko) | 1999-07-15 |
GB9814346D0 (en) | 1998-09-02 |
KR100244926B1 (ko) | 2000-03-02 |
DE19839753C2 (de) | 2001-12-06 |
GB2332643B (en) | 2002-03-06 |
US6348116B1 (en) | 2002-02-19 |
DE19839753A1 (de) | 1999-07-08 |
JP3639121B2 (ja) | 2005-04-20 |
JPH11189944A (ja) | 1999-07-13 |
US6040254A (en) | 2000-03-21 |
TW396383B (en) | 2000-07-01 |
CN1221052A (zh) | 1999-06-30 |
GB2332643A (en) | 1999-06-30 |
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