CN110441951A - A kind of color membrane substrates and its manufacturing method - Google Patents

A kind of color membrane substrates and its manufacturing method Download PDF

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Publication number
CN110441951A
CN110441951A CN201910614376.4A CN201910614376A CN110441951A CN 110441951 A CN110441951 A CN 110441951A CN 201910614376 A CN201910614376 A CN 201910614376A CN 110441951 A CN110441951 A CN 110441951A
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CN
China
Prior art keywords
layer
color blocking
blocking layer
chromatograph
display area
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CN201910614376.4A
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Chinese (zh)
Inventor
祝宏勋
孔施琴
李淑君
时陶
张丽洁
黄威
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nanjing CEC Panda LCD Technology Co Ltd
Original Assignee
Nanjing CEC Panda LCD Technology Co Ltd
Nanjing Huadong Electronics Information and Technology Co Ltd
Nanjing CEC Panda FPD Technology Co Ltd
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Application filed by Nanjing CEC Panda LCD Technology Co Ltd, Nanjing Huadong Electronics Information and Technology Co Ltd, Nanjing CEC Panda FPD Technology Co Ltd filed Critical Nanjing CEC Panda LCD Technology Co Ltd
Priority to CN201910614376.4A priority Critical patent/CN110441951A/en
Publication of CN110441951A publication Critical patent/CN110441951A/en
Pending legal-status Critical Current

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    • GPHYSICS
    • G02OPTICS
    • G02FOPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333Constructional arrangements; Manufacturing methods
    • GPHYSICS
    • G02OPTICS
    • G02FOPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333Constructional arrangements; Manufacturing methods
    • G02F1/1335Structural association of cells with optical devices, e.g. polarisers or reflectors
    • G02F1/133509Filters, e.g. light shielding masks
    • G02F1/133512Light shielding layers, e.g. black matrix
    • GPHYSICS
    • G02OPTICS
    • G02FOPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333Constructional arrangements; Manufacturing methods
    • G02F1/1335Structural association of cells with optical devices, e.g. polarisers or reflectors
    • G02F1/133509Filters, e.g. light shielding masks
    • G02F1/133514Colour filters
    • GPHYSICS
    • G02OPTICS
    • G02FOPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333Constructional arrangements; Manufacturing methods
    • G02F1/1335Structural association of cells with optical devices, e.g. polarisers or reflectors
    • G02F1/133509Filters, e.g. light shielding masks
    • G02F1/133514Colour filters
    • G02F1/133516Methods for their manufacture, e.g. printing, electro-deposition or photolithography
    • GPHYSICS
    • G02OPTICS
    • G02FOPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333Constructional arrangements; Manufacturing methods
    • G02F1/1339Gaskets; Spacers; Sealing of cells
    • G02F1/13394Gaskets; Spacers; Sealing of cells spacers regularly patterned on the cell subtrate, e.g. walls, pillars
    • GPHYSICS
    • G02OPTICS
    • G02FOPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333Constructional arrangements; Manufacturing methods
    • G02F1/133357Planarisation layers

Abstract

The present invention provides a kind of color membrane substrates and its manufacturing method, belongs to the technical field of liquid crystal display panel.Color membrane substrates are equipped with display area, non-display area and the spare area between display area and non-display area, and color membrane substrates include in display area and in the flatness layer or semiconductor layer of the black matrix" of matrix distribution, the black barrier layer in spare area, the groove being arranged in black barrier layer, the first color blocking layer between adjacent black matrix, the second color blocking layer in the groove on black barrier layer, the first color blocking layer of covering and the second color blocking layer and the support column being formed on flatness layer or semiconductor layer;Wherein the support column is respectively positioned on display area and spare area.The present invention reduces the difference in height between spare area and display area by adjusting the different stack-designs of the spare area of color membrane substrates, and the edge for improving display panel whitens the problem of turning to be yellow.

Description

A kind of color membrane substrates and its manufacturing method
Technical field
The present invention relates to the technical field of liquid crystal display panel more particularly to a kind of color membrane substrates and its manufacturing methods.
Background technique
Fig. 1 show the structural schematic diagram of existing color membrane substrates, and color membrane substrates are equipped with the region display area AA, non-display area Domain and spare area (region abbreviation Dummy) between display area and non-display area, color membrane substrates include glass base Black matrix" 20 in display area of plate 10, arranged in matrix is arranged in spare area and is formed simultaneously with black matrix" 20 Black barrier layer 30, the color blocking layer 40 in display area and spare area, covering black barrier layer 30 and color blocking layer 40 simultaneously Flatness layer or semiconductor layer 50 and the support column 60 being formed on flatness layer or semiconductor layer 50, wherein support column 60 be also Simultaneously in display area and spare area.Wherein the effect of the color blocking layer 40 of spare area is to prevent the color blocking layer 40 of display area Position precision lead to light leakage when there is difference, the effect of the support column 60 of spare area is to guarantee display area and spare area Domain does not occur biggish height fall, whitens jaundice in order to avoid there is periphery.
Since the black barrier layer 30 of spare area uses comprehensive coating method, the black matrix" 20 of display area is matrix Mode, the color blocking layer 40 of display area are filled between two neighboring black matrix" 20, and the color blocking layer 40 of spare area is caused Height there is height difference H than the height of the color blocking layer 40 of display area, H causes display surface close to the height of black matrix" 20 The edge of plate whitens the problem of turning to be yellow.
Summary of the invention
Use different stack-designs, in spare area the purpose of the present invention is to provide a kind of to improve display panel Whiten the color membrane substrates and its manufacturing method of the problem of turning to be yellow at edge.
The present invention provides a kind of color membrane substrates, is equipped with display area, non-display area and is located at display area and non- Spare area between display area, color membrane substrates include in display area and are in the black matrix" of matrix distribution, positioned at standby With in region black barrier layer, be arranged in black barrier layer groove, the first color blocking between adjacent black matrix The flatness layer or half of layer, the second color blocking layer in the groove on black barrier layer, the first color blocking layer of covering and the second color blocking layer Conductor layer and the support column being formed on flatness layer or semiconductor layer;Wherein the support column is respectively positioned on display area and spare Region.
Further, first color blocking layer and the second color blocking layer include multiple chromatographs, and multiple chromatographs are with landscape mode Separately constitute the first color blocking layer and the second color blocking layer.
The present invention also provides a kind of manufacturing methods of color membrane substrates, include the following steps:
S1: while forming black matrix" in display area and being formed in spare area and having reeded black blocking Layer;
S2: the first color blocking layer is formed between the adjacent black matrix of display area, while in the groove of spare area Form the second color blocking layer;
S3: whole face, which is laid with, in the first color blocking layer and the second color blocking layer to form flatness layer or semiconductor layer;
S4: the support column positioned at display area and the support positioned at spare area are respectively formed in flatness layer or semiconductor layer Column.
The present invention also provides a kind of color membrane substrates, be equipped with display area, non-display area and be located at display area and Spare area between non-display area, color membrane substrates include in display area and being in the black matrix" of matrix distribution, being located at Black barrier layer in spare area, through slot, the first color between adjacent black matrix being arranged in black barrier layer Resistance layer, the second color blocking layer, covering the first color blocking layer and second being arranged in the through slot on black barrier layer and with stacked system The flatness layer or semiconductor layer of color blocking layer and the support column being formed on flatness layer or semiconductor layer;The wherein support column position In display area.
Further, first color blocking layer and the second color blocking layer include multiple chromatographs, and multiple chromatographs are with landscape mode point The first color blocking layer is not formed, and multiple chromatographs form the second color blocking layer with stacked system.
The present invention also provides a kind of manufacturing methods of color membrane substrates, include the following steps:
S1: while forming black matrix" in display area and formed in spare area, there is the black of through slot to stop Layer;
S2: the first color blocking layer is formed between adjacent black matrix, while with stacked system in the through slot of spare area Form the second color blocking layer;
S3: whole face, which is laid with, in the first color blocking layer and the second color blocking layer to form flatness layer or semiconductor layer;
S4: the support column for being located at display area is formed on flatness layer or semiconductor layer.
The present invention also provides a kind of color membrane substrates, be equipped with display area, non-display area and be located at display area and Spare area between non-display area, color membrane substrates include in display area and being in the black matrix" of matrix distribution, being located at Black barrier layer in spare area, the first color blocking layer between adjacent black matrix, on black barrier layer Two color blocking layers, covering the first color blocking layer and the second color blocking layer flatness layer or semiconductor layer and be formed in flatness layer or semiconductor Support column on layer;Wherein the support column is located at display area;Second color blocking layer is formed by two chromatographs with lamination;Institute It states the first color blocking layer and is formed by three or four chromatographs with landscape mode.
The present invention also provides a kind of manufacturing methods of color membrane substrates, include the following steps:
S1: while forming black matrix" in display area and forming black barrier layer in spare area;
S2: forming the first color blocking layer being made of three or four chromatographs with landscape mode between adjacent black matrix, Simultaneously with stacked system and the second color blocking layer for being made of two chromatographs on black barrier layer;
S3: whole face, which is laid with, in the first color blocking layer and the second color blocking layer to form flatness layer or semiconductor layer;
S4: the support column for being located at display area is formed on flatness layer or semiconductor layer.
Further, the specific steps of step S2 are as follows: red chromatograph, green is sequentially formed with landscape mode in display area Color chromatograph and blue chromatograph sequentially form red chromatograph, green chromatograph, blue chromatograph and white chromatograph;In spare area Red chromatograph and green chromatograph or green chromatograph and blue chromatograph or blue chromatograph and white are sequentially formed with stacked system Chromatograph;Wherein red chromatograph, green chromatograph and blue chromatograph form the first color blocking layer or red chromatograph, green chromatograph, blue Chromatograph and white chromatograph form the first color blocking layer;Red chromatograph and green chromatograph form the second color blocking layer or green chromatograph and indigo plant Color chromatograph forms the second color blocking layer or blue chromatograph and white chromatograph forms the second color blocking layer.
The present invention reduces spare area and display area by adjusting the different stack-designs of the spare area of color membrane substrates Between difference in height, the edge for improving display panel whitens the problem of turning to be yellow.
Detailed description of the invention
Fig. 1 is the structural schematic diagram of existing color membrane substrates;
Fig. 2 is the structural schematic diagram for the first embodiment that the present invention forms black matrix" and black barrier layer;
Fig. 3 is the structural schematic diagram that entire color membrane substrates are formed on the basis of Fig. 2;
Fig. 4 is the structural schematic diagram for the second embodiment that the present invention forms black matrix" and black barrier layer;
Fig. 5 is the structural schematic diagram for forming entire color membrane substrates on the basis of fig. 4;
Fig. 6 is the structural schematic diagram of the 3rd embodiment of color membrane substrates of the present invention.
Specific embodiment
In the following with reference to the drawings and specific embodiments, the present invention is furture elucidated, it should be understood that these embodiments are merely to illustrate It the present invention rather than limits the scope of the invention, after the present invention has been read, those skilled in the art are to of the invention each The modification of kind equivalent form falls within the application range as defined in the appended claims.
To make simplified form, part related to the present invention is only schematically shown in each figure, they are not represented Its practical structures as product.In addition, there is identical structure or function in some figures so that simplified form is easy to understand Component only symbolically depicts one of those, or has only marked one of those.Herein, "one" is not only indicated " only this ", can also indicate the situation of " more than one ".
Fig. 2 and Fig. 3 show first embodiment of the invention.
As shown in Figures 2 and 3, color membrane substrates are equipped with the region display area AA, non-display area and are located at display area Spare area (region abbreviation Dummy) between non-display area, color membrane substrates include being located on glass substrate 10 and being located to show Show the black matrix" 20 in region, exist positioned at the black barrier layer 30 on the glass substrate 10 and in spare area, setting Groove 31 in black barrier layer 30, is located at black barrier layer 30 at the first color blocking layer 40 between adjacent black matrix 20 Groove 31 in the second color blocking layer 50, covering the first color blocking layer 40 and the second color blocking layer 50 flatness layer or semiconductor layer 60 with And it is formed in the support column 70 on flatness layer or semiconductor layer 60.Wherein, black matrix" 20 is distributed in matrix;The equal position of support column 70 In display area and spare area.
The first color blocking layer 40 is reduced in the height on black barrier layer 30 by groove 31, and the second of spare area is reduced with this Difference in height between color blocking layer 50 and the first color blocking layer 40 of display area, so that being located at support column 70 and the display of spare area Difference in height between the support column 70 in region is almost 0.
In the present embodiment, the first color blocking layer 40 and the second color blocking layer 50 include multiple chromatographs, and multiple chromatographs are RBG color Layer, the respectively first red chromatograph, the second green chromatograph and third blue chromatograph.In other embodiments, multiple chromatographs are RGBW chromatograph, the respectively first red chromatograph, the second green chromatograph, third blue chromatograph and the 4th white chromatograph.
A kind of manufacturing method of color membrane substrates, includes the following steps:
S1: on the glass substrate 10 sequentially by coating, prebake conditions, exposure, development and curing mode simultaneously in viewing area Black matrix" 20 is formed in domain and forms black barrier layer 30 in spare area, wherein the mask plate in display area is impermeable Photomask board forms black matrix" 20, is that semi-transparent photomask board forms the black barrier layer 30 with groove 31 in spare area, The bottom of groove 31 also has black barrier material, to ensure the light shielding ability of spare area;
S2: the first color blocking layer 40 is formed between the adjacent black matrix 20 of display area, while in the recessed of spare area The second color blocking layer 50 is formed in slot 31;
S3: whole face, which is laid with, in the first color blocking layer 40 and the second color blocking layer 50 to form flatness layer or semiconductor layer 60;
S4: it is respectively formed in flatness layer or semiconductor layer 60 positioned at the support column 70 of display area and positioned at spare area Support column 70.
Wherein, the specific steps of step S2 are as follows: sequentially form red chromatograph, green chromatograph and blue chromatograph or sequentially shape At red chromatograph, green chromatograph, blue chromatograph and white chromatograph.
Multiple chromatographs of spare area are that landscape mode is formed in groove 31.
Wherein the flatness layer of step S4 or semiconductor layer 60 can also cover the black barrier layer 30 in other regions.
Fig. 4 and Fig. 5 show second embodiment of the invention.
The difference of second embodiment and above-mentioned first embodiment is: firstly, setting in the black barrier layer 30 of spare area There is the through slot 31 for being through to glass substrate 10;Secondly, formed the second color blocking layer 50 multiple chromatographs be formed in stacked system it is logical In slot 31, i.e., red chromatograph is located on glass substrate 10, and green chromatograph is located at the upper surface of red chromatograph, and blue chromatograph is located at green The upper surface of chromatograph, in this way can be with the height of padded spare area, so that flatness layer or semiconductor layer 60 that whole face is laid with are spare It can be used as support column use in region;The support column 70 eventually formed is positioned only in display area.
Since the second color blocking layer 50 of multiple chromatographs is formed in a stacked in through slot 41, so that the second barrier layer 50 With light shielding ability.
A kind of manufacturing method of color membrane substrates, includes the following steps:
S1: on the glass substrate 10 sequentially by coating, prebake conditions, exposure, development and curing mode simultaneously in viewing area Black matrix" 20 is formed in domain and forms black barrier layer 30 in spare area, wherein the mask plate in display area is impermeable Photomask board forms black matrix" 20, is that impermeable photomask board forms the black barrier layer 30 with through slot 31 in spare area, The bottom of through slot 31 is glass substrate;
S2: the first color blocking layer 40, while the through slot of spare area are formed between the adjacent black matrix 20 of display area Second color blocking layer 50 is formed with stacked system in 31;
S3: whole face, which is laid with, in the first color blocking layer 40 and the second color blocking layer 50 to form flatness layer or semiconductor layer 60;
S4: the support column 70 for being located at display area is formed on flatness layer or semiconductor layer 60.
Wherein, the specific steps of step S2 are as follows: red chromatograph, green color are sequentially formed with landscape mode in display area Layer and blue chromatograph sequentially form red chromatograph, green chromatograph, blue chromatograph and white chromatograph;With folded in spare area Layer mode sequentially forms red chromatograph, green chromatograph and blue chromatograph or sequentially forms red chromatograph, green chromatograph, blue color Layer and white chromatograph.
It is formed by the second color blocking layer in spare area with stacked system, the support column in spare area is substituted, together Sample can reduce the difference in height between spare area and display area.
Fig. 6 show third embodiment of the invention.
The difference of 3rd embodiment and above-mentioned second embodiment is: black barrier layer 30 is whole face in spare area first It is laid with, is not provided with groove or through slot;Second color blocking layer 50 is arranged on black barrier layer 30 with stacked system, the second color blocking layer 50 are formed with lamination by two color chromatographs and form, so that the second color blocking layer 50 can be with the height of padded spare area, so that whole The flatness layer or semiconductor layer 60 that face is laid with can be used as support column use in spare area;The support column 70 eventually formed It is positioned only in display area.
A kind of manufacturing method of color membrane substrates, includes the following steps:
S1: on the glass substrate 10 sequentially by coating, prebake conditions, exposure, development and curing mode simultaneously in viewing area Black matrix" 20 is formed in domain and forms black barrier layer 30 in spare area, wherein the mask plate in display area is semi-transparent Mask plate and formation black matrix" 20 form black barrier layer 30 in spare area whole face;
S2: the first color blocking layer being made of three or four chromatographs with landscape mode is formed between adjacent black matrix 20 40, while the second color blocking layer 50 that 30 superimposed layer mode of black barrier layer is made of two chromatographs;
S3: whole face, which is laid with, in the first color blocking layer 40 and the second color blocking layer 50 to form flatness layer or semiconductor layer 60;
S4: the support column 70 for being located at display area is formed in flatness layer or semiconductor layer 60.
Wherein, the specific steps of step S2 are as follows: red chromatograph, green color are sequentially formed with landscape mode in display area Layer and blue chromatograph sequentially form red chromatograph, green chromatograph, blue chromatograph and white chromatograph;With folded in spare area Layer mode sequentially forms red chromatograph and green chromatograph (or green chromatograph and blue chromatograph or blue chromatograph and white color Layer).
Wherein red chromatograph, green chromatograph and blue chromatograph form the first color blocking layer or red chromatograph, green chromatograph, indigo plant Color chromatograph and white chromatograph form the second color blocking layer;Red chromatograph and green chromatograph form the second color blocking layer or green chromatograph and Blue chromatograph forms the second color blocking layer or blue chromatograph and white chromatograph forms the second color blocking layer.
The second color blocking layer is formed with stacked system by two chromatographs in spare area, the branch in spare area is substituted Dagger can equally reduce the difference in height between spare area and display area.
The present invention reduces spare area and display area by adjusting the different stack-designs of the spare area of color membrane substrates Between difference in height, the edge for improving display panel whitens the problem of turning to be yellow.
The preferred embodiment of the present invention has been described above in detail, but during present invention is not limited to the embodiments described above Detail can carry out a variety of equivalents to technical solution of the present invention (in full within the scope of the technical concept of the present invention Amount, shape, position etc.), these equivalents all belong to the scope of protection of the present invention.

Claims (9)

1. a kind of color membrane substrates are equipped with display area, non-display area and between display area and non-display area Spare area, which is characterized in that color membrane substrates include in display area and are in the black matrix" of matrix distribution, positioned at spare Black barrier layer in region, the groove being arranged in black barrier layer, the first color blocking layer between adjacent black matrix, The flatness layer or semiconductor of the second color blocking layer, covering the first color blocking layer and the second color blocking layer in the groove on black barrier layer Layer and the support column being formed on flatness layer or semiconductor layer;Wherein the support column is respectively positioned on display area and spare area Domain.
2. color membrane substrates according to claim 1, it is characterised in that: first color blocking layer and the second color blocking layer are including more A chromatograph, multiple chromatographs separately constitute the first color blocking layer and the second color blocking layer with landscape mode.
3. a kind of manufacturing method of color membrane substrates, which comprises the steps of:
S1: while forming black matrix" in display area and being formed in spare area and having reeded black barrier layer;
S2: the first color blocking layer is formed between the adjacent black matrix of display area, while being formed in the groove of spare area Second color blocking layer;
S3: whole face, which is laid with, in the first color blocking layer and the second color blocking layer to form flatness layer or semiconductor layer;
S4: the support column positioned at display area and the support column positioned at spare area are respectively formed in flatness layer or semiconductor layer.
4. a kind of color membrane substrates are equipped with display area, non-display area and between display area and non-display area Spare area, which is characterized in that color membrane substrates include in display area and are in the black matrix" of matrix distribution, positioned at spare Black barrier layer in region, the through slot being arranged in black barrier layer, the first color blocking layer between adjacent black matrix, In the through slot on black barrier layer and with the second color blocking layer of stacked system setting, the first color blocking layer of covering and the second color blocking layer Flatness layer or semiconductor layer and the support column being formed on flatness layer or semiconductor layer;Wherein the support column is located at display Region.
5. color membrane substrates according to claim 1, it is characterised in that: first color blocking layer and the second color blocking layer are including more A chromatograph, multiple chromatographs separately constitute the first color blocking layer with landscape mode, and multiple chromatographs form the second color blocking layer with stacked system.
6. a kind of manufacturing method of color membrane substrates, characterized by the following steps:
S1: while forming black matrix" in display area and forming the black barrier layer with through slot in spare area;
S2: the first color blocking layer is formed between adjacent black matrix, while being formed in the through slot of spare area with stacked system Second color blocking layer;
S3: whole face, which is laid with, in the first color blocking layer and the second color blocking layer to form flatness layer or semiconductor layer;
S4: the support column for being located at display area is formed on flatness layer or semiconductor layer.
7. a kind of color membrane substrates are equipped with display area, non-display area and between display area and non-display area Spare area, which is characterized in that color membrane substrates include in display area and are in the black matrix" of matrix distribution, positioned at spare Black barrier layer in region, the first color blocking layer between adjacent black matrix, the second color on black barrier layer Resistance layer, covering the first color blocking layer and the second color blocking layer flatness layer or semiconductor layer and be formed on flatness layer or semiconductor layer Support column;Wherein the support column is located at display area;Second color blocking layer is formed by two chromatographs with lamination;Described One color blocking layer is formed by three or four chromatographs with landscape mode.
8. a kind of manufacturing method of color membrane substrates, characterized by the following steps:
S1: while forming black matrix" in display area and forming black barrier layer in spare area;
S2: the first color blocking layer being made of three or four chromatographs with landscape mode is formed between adjacent black matrix, simultaneously With stacked system and the second color blocking layer for being made of two chromatographs on black barrier layer;
S3: whole face, which is laid with, in the first color blocking layer and the second color blocking layer to form flatness layer or semiconductor layer;
S4: the support column for being located at display area is formed on flatness layer or semiconductor layer.
9. the manufacturing method of color membrane substrates according to claim 8, it is characterised in that: the specific steps of step S2 are as follows: In Red chromatograph, green chromatograph and blue chromatograph sequentially formed with landscape mode in display area or sequentially form red chromatograph, Green chromatograph, blue chromatograph and white chromatograph;Red chromatograph and green chromatograph are sequentially formed with stacked system in spare area Or green chromatograph and blue chromatograph or blue chromatograph and white chromatograph;Wherein red chromatograph, green chromatograph and blue chromatograph It forms the first color blocking layer or red chromatograph, green chromatograph, blue chromatograph and white chromatograph forms the first color blocking layer;Red chromatograph The second color blocking layer or green chromatograph are formed with green chromatograph and blue chromatograph forms the second color blocking layer or blue chromatograph and white Color chromatograph forms the second color blocking layer.
CN201910614376.4A 2019-07-09 2019-07-09 A kind of color membrane substrates and its manufacturing method Pending CN110441951A (en)

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