CN106483719B - A kind of electronic equipment, array substrate and preparation method thereof - Google Patents

A kind of electronic equipment, array substrate and preparation method thereof Download PDF

Info

Publication number
CN106483719B
CN106483719B CN201611247179.6A CN201611247179A CN106483719B CN 106483719 B CN106483719 B CN 106483719B CN 201611247179 A CN201611247179 A CN 201611247179A CN 106483719 B CN106483719 B CN 106483719B
Authority
CN
China
Prior art keywords
color blocking
blocking layer
layer
convex block
light shield
Prior art date
Application number
CN201611247179.6A
Other languages
Chinese (zh)
Other versions
CN106483719A (en
Inventor
邓竹明
Original Assignee
深圳市华星光电技术有限公司
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 深圳市华星光电技术有限公司 filed Critical 深圳市华星光电技术有限公司
Priority to CN201611247179.6A priority Critical patent/CN106483719B/en
Publication of CN106483719A publication Critical patent/CN106483719A/en
Application granted granted Critical
Publication of CN106483719B publication Critical patent/CN106483719B/en

Links

Classifications

    • GPHYSICS
    • G02OPTICS
    • G02FDEVICES OR ARRANGEMENTS, THE OPTICAL OPERATION OF WHICH IS MODIFIED BY CHANGING THE OPTICAL PROPERTIES OF THE MEDIUM OF THE DEVICES OR ARRANGEMENTS FOR THE CONTROL OF THE INTENSITY, COLOUR, PHASE, POLARISATION OR DIRECTION OF LIGHT, e.g. SWITCHING, GATING, MODULATING OR DEMODULATING; TECHNIQUES OR PROCEDURES FOR THE OPERATION THEREOF; FREQUENCY-CHANGING; NON-LINEAR OPTICS; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating, or modulating; Non-linear optics
    • G02F1/01Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating, or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating, or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333Constructional arrangements; Manufacturing methods
    • G02F1/1339Gaskets; Spacers; Sealing of cells
    • G02F1/13394Gaskets; Spacers; Sealing of cells spacers regularly patterned on the cell subtrate, e.g. walls, pillars
    • GPHYSICS
    • G02OPTICS
    • G02FDEVICES OR ARRANGEMENTS, THE OPTICAL OPERATION OF WHICH IS MODIFIED BY CHANGING THE OPTICAL PROPERTIES OF THE MEDIUM OF THE DEVICES OR ARRANGEMENTS FOR THE CONTROL OF THE INTENSITY, COLOUR, PHASE, POLARISATION OR DIRECTION OF LIGHT, e.g. SWITCHING, GATING, MODULATING OR DEMODULATING; TECHNIQUES OR PROCEDURES FOR THE OPERATION THEREOF; FREQUENCY-CHANGING; NON-LINEAR OPTICS; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating, or modulating; Non-linear optics
    • G02F1/01Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating, or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating, or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333Constructional arrangements; Manufacturing methods
    • G02F1/1335Structural association of cells with optical devices, e.g. polarisers or reflectors
    • G02F1/133509Filters, e.g. light shielding masks
    • G02F1/133512Light shielding layers, e.g. black matrix
    • G02F1/13396

Abstract

The invention discloses a kind of electronic equipment, array substrate and preparation method thereof, wherein production method includes by forming multiple color blocking layers arranged side by side and multiple convex blocks in base side, convex block is stacked by least part in color blocking layer and is formed, and the height of convex block is different, and light shield layer is further set in color blocking layer, and light shield layer and convex block are formed together spacer column.By the above-mentioned means, the present invention forms the separation material with different height difference without designing special light shield, simplify processing procedure and reduce production cost, and improves the uneven situation of display base plate display.

Description

A kind of electronic equipment, array substrate and preparation method thereof

Technical field

The present invention relates to field of display technology, more particularly to a kind of electronic equipment, array substrate and preparation method thereof.

Background technique

In the prior art, liquid crystal display substrate includes BM (black matrix) and PS (Photo Space;Spacer), wherein BM Interception is played in liquid crystal display substrate so that display panel reaches preferable display effect, PS be set to two substrates it Between to maintain the distance between liquid crystal display substrate two substrates, PS generally includes Main PS (primary interval object) and Sub PS is (auxiliary Help spacer), wherein Main PS plays the effect of support liquid crystal cell thickness, Sub PS when array substrate and color membrane substrates seal Support and buffer function are played when liquid crystal cell is squeezed by further external force.

The BM and PS of the liquid crystal display substrate of industry production at present, can be used following methods:

One, conventional design, using transparent PS material, BM and the independent processing procedure of PS difference twice are completed, process efficiency It is low, it is at high cost, and the difference in height in order to realize Main PS and Sub PS, different shapes is usually designed on PS light shield To realize the purpose of Main PS Yu Sub PS different height, needs to be separately provided the type and quantity of PS light shield, increase processing procedure Complexity.

Two, using improved material BPS (Black Photo Space), BM is synthesized with PS and is completed in processing procedure together, But current processing method is needed by MTM (Multi Tone Mask;Multisection type adjusts light shield) technology, to realize three to BPS The exposure light irradiation of kind varying strength, and then the BPS figure of three different-thickness, i.e. BM, Main PS and Sub are obtained after developing PS, but need to combine three height, the more difficult tune of BPS yellow light technique since MTM light shield is complicated and expensive, and in exposure Section, therefore, production cost also remains high, and production efficiency is not high.

Summary of the invention

In view of this, the present invention provides a kind of electronic equipment, array substrate and preparation method thereof, LCD display can be reduced The production cost of plate, and process difficulty is reduced, improve production efficiency.

In order to solve the above technical problems, an aspect of of the present present invention provides a kind of production method of array substrate, comprising: in base Layer side forms at least the first color blocking layer arranged side by side, the second color blocking layer, at least the first convex block, the second convex block, the first convex block It is stacked by respective a part of two color blocking layers at least the first color blocking layer, the second color blocking layer, the second convex block is by extremely Few first color blocking layer, a part of of a color blocking layer in the second color blocking layer are constituted, and the first convex block is higher than the second convex block;In base Side forms the light shield layer being arranged side by side together at least the first color blocking layer, the second color blocking layer, and the screening on the first convex block Photosphere follows protrusion to form the first spacer column, and is higher than between the light shield layer on the second convex block follows protrusion to be formed second Spacer post.

Wherein, the light shield layer packet being arranged side by side together at least the first color blocking layer, the second color blocking layer is formed in base side Include: in the shading layer material of base's side coating fluid shape, shading layer material covers at least the first convex block, the second convex block;It is hiding Before photosphere material levelling, using light shield to light shield layer material exposure, wherein between respective pixel region lightproof area light shield Zonal ray percent of pass is identical;Etch away the shading layer material in respective pixel region.

Wherein, production method further comprises: be further formed third color blocking layer in the side of base, third color blocking layer with At least the first color blocking layer, the second color blocking layer, at least the first convex block, the second convex block be arranged side by side, the first convex block by the first color blocking layer, Respective a part of second color blocking layer stacks, and the second convex block is made of a part of three color blocking layers;Forming the first color It while resistance layer, the second color blocking layer, respectively leaves a part and forms stacking color blocking block, to form the first convex block, forming third color While resistance layer, leaves a part of color blocking block and form the second convex block.

Wherein, light shield layer extends along the orientation strip of the first color blocking layer, the second color blocking layer, while also along first Boundary linear between color blocking layer, the second color blocking layer extends;Or light shield layer is only along the row of the first color blocking layer, the second color blocking layer Column direction strip extends, and array substrate includes pixel electrode and along the line of demarcation between the first color blocking layer, the second color blocking layer The array public electrode that strip extends, array public electrode and pixel electrode same layer are arranged, and voltage with to public on substrate Electrode is identical.

In order to solve the above technical problems, another aspect of the present invention provides a kind of array substrate, comprising: base;At least first Color blocking layer, the second color blocking layer, are arranged side by side in base side;Light shield layer, together at least the first color blocking layer, the second color blocking layer simultaneously Row is set to base side;At least the first convex block, the second convex block, are set between light shield layer and base, and the first convex block is by least Respective a part of two color blocking layers in first color blocking layer, the second color blocking layer stacks, and the second convex block is by least first A part of a color blocking layer in color blocking layer, the second color blocking layer is constituted, and the first convex block is higher than the second convex block, so that the first convex block On light shield layer follow protrusion to form the first spacer column, and be higher than the light shield layer on the second convex block and follow protrusion to be formed The second spacer column

Wherein, light shield layer is etched using light shield, and the light shield zonal ray percent of pass of corresponding light shield layer is identical.

Wherein, array substrate further comprises third color blocking layer, the first convex block by the first color blocking layer, the second color blocking layer it is each It is stacked from a part, the second convex block is made of a part of three color blocking layers.

Wherein, the first color blocking layer, the second color blocking layer are red color resistance layer, green color blocking layer respectively, and third color blocking layer is blue Color color blocking layer.

Wherein, light shield layer extends along the orientation strip of the first color blocking layer, the second color blocking layer, while also along first Boundary linear between color blocking layer, the second color blocking layer extends;Or light shield layer is only along the row of the first color blocking layer, the second color blocking layer Column direction strip extends, and array substrate includes pixel electrode and along the line of demarcation between the first color blocking layer, the second color blocking layer The array public electrode that strip extends, array public electrode and pixel electrode same layer are arranged, and voltage with to public on substrate Electrode is identical.

In order to solve the above technical problems, the third aspect of the present invention provides a kind of electronic equipment, including above-mentioned array substrate.

Through the above scheme, the beneficial effects of the present invention are: being different from the prior art, array substrate of the invention can lead to It crosses the side in base and forms multiple color blocking layers, and multiple convex blocks, and convex block are formed by at least partly stacking of multiple color blocking layers Height it is different, and then light shield layer is further set on convex block, so that the spacer column of different height is formed, to realize simplification Processing procedure, and the light shield by labyrinth is not needed, production cost is reduced, production efficiency is improved.

Detailed description of the invention

To describe the technical solutions in the embodiments of the present invention more clearly, make required in being described below to embodiment Attached drawing is briefly described, it should be apparent that, drawings in the following description are only some embodiments of the invention, for For those of ordinary skill in the art, without creative efforts, it can also be obtained according to these attached drawings other Attached drawing.Wherein:

Fig. 1 is the flow diagram of the production method of the array substrate of one embodiment of the invention;

Fig. 2 is the top view of the array substrate of one embodiment of the invention;

Fig. 3 is sectional view of the array substrate shown in Fig. 2 along A-A' line;

Fig. 4 is the top view of the array substrate of further embodiment of this invention;

Fig. 5 is the structural schematic diagram of the electronic equipment of one embodiment of the invention.

Specific embodiment

Following will be combined with the drawings in the embodiments of the present invention, and technical solution in the embodiment of the present invention carries out clear, complete Site preparation description, wherein identical label indicates same or similar element or element with the same or similar functions in the present invention. Obviously, described embodiments are only a part of the embodiments of the present invention, rather than whole embodiments.Based on the reality in the present invention Apply example, those of ordinary skill in the art's every other embodiment obtained under the premise of not making creative labor, all Belong to the scope of protection of the invention.

It is please the flow diagram of the production method of the array substrate of one embodiment of the invention referring to Fig. 1-3, Fig. 1 together, Fig. 2 is the top view of array substrate made from the production method using Fig. 1, and Fig. 3 is the cuing open along A-A' line of array substrate shown in Fig. 2 Face figure.As shown in Figure 1-3, the production method of the array substrate 100 of the present embodiment includes:

S101: at least the first color blocking layer 120 arranged side by side, the second color blocking layer 130, at least are formed in 110 side of base First convex block 101 and the second convex block 102.

Wherein, the material of base 110 can be glass baseplate or plastic basis material.First convex block 101 is by least the first color blocking layer 120, respective a part of two color blocking layers in the second color blocking layer 130 stacks, and the second convex block 102 is by least the first color A part of a color blocking layer in resistance layer 120, the second color blocking layer 130 is constituted, and the height h1 of the first convex block 101 is greater than the The height h2 of two convex blocks 102.Wherein, the first color blocking layer 120 and the second color blocking layer 130 can be red color resistance layer R, green color blocking layer Any two kinds in G or blue color blocking layer B.Therefore, can be while forming the first color blocking layer 120 and the second color blocking layer 130, it will First color blocking layer 120 and the second color blocking layer 130, which respectively leave a part and formed, stacks color blocking block, and the stacking color blocking block is made to be formed as the One convex block 101, and while forming the first color blocking layer 120 or the second color blocking layer 130, by the first color blocking layer 120 or second Color blocking layer 130 leaves a part and forms color blocking block, so that the color blocking block is formed as the second convex block 102, and keep the first convex block 101 high In the second convex block 102.

In other embodiments, also it can be further formed third color blocking layer 140 in the side of base 110, and makes third color Resistance layer 140 and at least the first color blocking layer 120, the second color blocking layer 130, at least the first convex block 101, the second convex block 102 are arranged side by side, In turn, the first convex block 101 can be stacked by respective a part of the first color blocking layer 120, the second color blocking layer 130, the second convex block 102 can be made of a part of third color blocking layer 140.Therefore, formed the first color blocking layer 120, the second color blocking layer 130 it is same When, it can be stacked into color blocking layer by first color blocking layer 120, a part that respectively leaves of the second color blocking layer 130, and then be formed First convex block 101, while forming third color blocking layer 140, leave a part formed color blocking layer to form the second convex block 102, And the first convex block 101 is made to be higher than the second convex block 102.

S102: in 110 side of base, formation is arranged side by side together at least the first color blocking layer 120, the second color blocking layer 130 Light shield layer 103.

Wherein, in 103 material of light shield layer of 110 side coating fluid shape of base, such as BPS, the covering of 103 material of light shield layer At least the first convex block 101, the second convex block 102, the light shield layer before 103 material levelling of light shield layer, i.e. on the first convex block 101 During 103 materials are still higher than 103 material of light shield layer on the second convex block 102,103 material of light shield layer is exposed using light shield Light, and then by 103 material solidification of light shield layer on the light shield layer 103 and the second convex block 102 on the first convex block 101, that is, make 103 material of light shield layer on first convex block 101 is higher than the relationship solidification of 103 material of light shield layer on the second convex block 102.Then, Etch away 103 material of light shield layer in respective pixel region so that the light shield layer 103 being formed on the first convex block 101 follow it is convex It rises to form the first spacer column 104, is formed between the light shield layer 103 on the second convex block 102 follows protrusion to be formed second Spacer post 105, the height h6 of the first spacer column 104 are greater than the height h7 of the second spacer column 105.Wherein, correspond to pixel region it Between lightproof area light shield region light transmittance it is identical.Therefore, after development etching, light shield layer 103 is each in array substrate 100 The thickness in a region is identical, i.e., so that the difference in height of the first spacer column 104 and the second spacer column 105 is the height of color blocking lamination Difference.

In the present embodiment, light shield layer 103 prolongs along the orientation strip of the first color blocking layer 120, the second color blocking layer 130 It stretches, while extending also along the boundary linear between the first color blocking layer 120, the second color blocking layer 130.In other embodiments, As shown in figure 4, light shield layer 103 can extend only along the orientation strip of the first color blocking layer 120, the second color blocking layer 130, array Substrate 200 further comprise pixel electrode (not shown) and along between the first color blocking layer 120, the second color blocking layer 130 point The array public electrode 220 that boundary line strip extends, array public electrode 220 and pixel electrode same layer are arranged, and voltage with to base Public electrode on plate is identical.

To sum up, the production of the array substrate 100 of the present embodiment, by the way that multiple color blockings are arranged side by side in the side of base 110 Layer is stacked by respective a part in multiple color blocking layers and forms multiple convex blocks, and light shield layer 103, shading are arranged in color blocking layer Layer 103 is formed on convex block and with convex block protrusion and then formation spacer column, since the height of convex block is different, between being formed The height of spacer post is also different, and therefore, the present embodiment is formed without additional setting BM by the difference in height of color blocking lamination The spacer column of different height is formed simultaneously BM, Main PS and Sub PS, the light shield without design complex configurations is to form not Level spacer column reduces production cost, and simplifies processing procedure, reduces process difficulty.

It is please the top view of the array substrate of one embodiment of the invention referring further to Fig. 2, Fig. 2.As shown in Fig. 2, this reality Apply example array substrate 100 include base 110, be formed in base 110 light shield layer 103, be formed in light shield layer 103 enclose set and At subpixel area in single layer color blocking layer, wherein in red subpixel areas be arranged red color resistance layer R, green sub-pixels Green color blocking layer G is set in region, blue color blocking layer B is set in blue subpixel areas, and in adjacent subpixel area Color blocking lamination made of a part in corresponding color blocking layer stacks is formed, as shown in Fig. 2, by taking two rows of subpixel areas as an example, In the corresponding region of controlling grid scan line, it is formed with the color blocking lamination of part red color resistance layer R and green color blocking layer G formation, and In addition the blue color blocking layer B of position.

In conjunction with Fig. 2, please further referring to Fig. 3, Fig. 3 is sectional view of the array substrate shown in Fig. 2 along A-A' line.Such as Fig. 3 institute Show, array substrate 100 includes base 110, at least the first color blocking layer 120, the second color blocking layer 130, light shield layer 103, at least first Convex block 101 and the second convex block 102.Wherein, at least the first color blocking layer 120 and the second color blocking layer 130 are arranged side by side in base 110 1 Side, light shield layer 103 are arranged side by side in 110 side of base, at least together at least the first color blocking layer 120 and the second color blocking layer 130 First convex block 101 and the second convex block 102 are set between light shield layer 103 and base 110, and the first convex block 101 is by least Respective a part of two color blocking layers in one color blocking layer 120, the second color blocking layer 130 stacks, and the second convex block 102 is by extremely Few first color blocking layer 120, a part of of a color blocking layer in the second color blocking layer 130 are constituted, and it is convex that the first convex block 101 is higher than second Block 102, so that the light shield layer 103 on the first convex block 101 follows protrusion to form the first spacer column 104, and it is convex to be higher than second Light shield layer 103 on block 102 follows second spacer column 105 of the protrusion to be formed.

In other embodiments, array substrate 100 further comprises third color blocking layer 140, and the first convex block 101 is by the first color Resistance layer 120, respective a part of the second color blocking layer 130 stack, and the second convex block 102 is a part of structure by three color blocking layers At optionally, the first color blocking layer 120, the second color blocking layer 130 are red color resistance layer R, green color blocking layer G, third color blocking layer respectively 140 be blue color blocking layer B.Or first color blocking layer 120, the second color blocking layer 130 and third color blocking layer 140 are red respectively Any one in color blocking layer R, green color blocking layer G and blue color blocking layer B, no longer limits herein.

Fig. 3 illustrates by taking red color resistance layer R, green color blocking layer G and blue color blocking layer B as an example.Wherein the first convex block 101 and Two convex blocks 102 are set between light shield layer 103 and base 110, and the first convex block 101 is by red color resistance layer R's and green color blocking layer G It respectively partially stacks, the second convex block 102 is made of a part in blue color blocking layer B, and the height h1 of the first convex block 101 is big The first convex block 101 is followed to convex to form the first interval in the light shield layer 103 on the height h2 of the second convex block 102, the first convex block 101 Column 104, the light shield layer 103 on the second convex block 102 follow the second convex block 102 to convex to form the second spacer column 105.

Wherein, light shield layer 103 is etched using light shield, and the light shield zonal ray percent of pass phase of corresponding light shield layer 103 Together, therefore, so that corresponding to the thickness h 3 of the light shield layer 103 on the first convex block 101, corresponding to the shading on the second convex block 102 The thickness h 5 of the light shield layer 103 of the thickness h 4 and remaining region of layer 103 is equal.

Also, light shield layer 103 extends along the orientation strip of red color resistance layer R, green color blocking layer G, while also edge The boundary linear extension of red coloration color blocking layer R, green color blocking layer G.

In other embodiments, as shown in figure 4, light shield layer 103 can be only along the row of red color resistance layer R, green color blocking layer G Column direction strip extends, and array substrate 200 further includes pixel electrode (not shown) and along red color resistance layer R and green color blocking The array public electrode 220 that boundary linear between layer G extends, array public electrode 220 and pixel electrode same layer are arranged, and Voltage is identical as to the public electrode (not shown) in substrate (not shown).

Therefore, the present embodiment can form color blocking lamination in base 110, and light shield layer further is arranged on color blocking lamination 103, so that forming difference in array substrate 100 has different height spacer column, i.e., using the difference in height of color blocking lamination BM, Main PS and Sub PS simplify the processing procedure of array substrate 100, reduce process difficulty and light shield cost, and without additional BM is set, production efficiency is improved.

As shown in figure 5, the present invention also provides a kind of electronic equipment 300, including color membrane substrates 310, array substrate 100 or 200 and the liquid crystal layer 320 that is set between color membrane substrates 310 and array substrate 100 or 200, wherein array substrate 100 or 200 For the array substrate 100 or 200 of above-described embodiment, details are not described herein.

In conclusion be different from the prior art, electronic equipment of the present invention, array substrate and preparation method thereof, wherein array Substrate can be by forming multiple color blocking layers arranged side by side in base side, and the respective part in multiple color blocking layers stacks shape At convex block, and light shield layer is provided on convex block, thus form the spacer column of different height as BM, Main PS and Sub PS, The process difficulty of array substrate is reduced, and reduces the cost of light shield, improves production efficiency.

The above description is only an embodiment of the present invention, is not intended to limit the scope of the invention, all to utilize this hair Equivalent structure or equivalent flow shift made by bright specification and accompanying drawing content is applied directly or indirectly in other relevant skills Art field, is included within the scope of the present invention.

Claims (10)

1. a kind of production method of array substrate, which is characterized in that the production method includes:
At least the first color blocking layer arranged side by side, the second color blocking layer, at least the first convex block, the second convex block are formed in base side, First convex block by two color blocking layers at least first color blocking layer, the second color blocking layer it is respective a part stack and At second convex block is made of a part of a color blocking layer at least first color blocking layer, the second color blocking layer, institute The first convex block is stated higher than second convex block;
The light shield layer being arranged side by side together at least first color blocking layer, the second color blocking layer is formed in the base side, and And the light shield layer on first convex block follows protrusion to form the first spacer column, and is higher than on second convex block The light shield layer follow second spacer column of the protrusion to be formed.
2. manufacturing method according to claim 1, which is characterized in that described to be formed and described at least first in base side The light shield layer that color blocking layer, the second color blocking layer are arranged side by side together includes:
In the shading layer material of the base side coating fluid shape, the shading layer material cover at least first convex block, Second convex block;
Before the light shield layer material levelling, using light shield to the light shield layer material exposure, wherein respective pixel region it Between lightproof area the light shield zonal ray percent of pass it is identical;
Etch away the shading layer material in the respective pixel region.
3. production method according to claim 1 or 2, which is characterized in that the production method further comprises:
Third color blocking layer is further formed in the side of the base, the third color blocking layer and at least first color blocking layer, Second color blocking layer, at least first convex block, second convex block are arranged side by side, and first convex block is by first color Resistance layer, respective a part of the second color blocking layer stack, and second convex block is made of a part of three color blocking layer;
While forming first color blocking layer, second color blocking layer, respectively leaves a part and form stacking color blocking block, with shape It leaves a part of color blocking block while forming the third color blocking layer at first convex block and forms second convex block.
4. production method according to claim 3, which is characterized in that the light shield layer is along first color blocking layer, The orientation strip of two color blocking layers extends, while also along the boundary lines between first color blocking layer, the second color blocking layer Shape extends;Or
The light shield layer extends only along the orientation strip of first color blocking layer, the second color blocking layer, the array substrate Including pixel electrode and the array common electrical extended along the boundary linear between first color blocking layer, the second color blocking layer Pole, the array public electrode and the pixel electrode same layer are arranged, and voltage is identical as to the public electrode on substrate.
5. a kind of array substrate, which is characterized in that the array substrate includes:
Base;
At least the first color blocking layer, the second color blocking layer are arranged side by side in the base side;
Light shield layer is arranged side by side together at least first color blocking layer, the second color blocking layer in the base side;
At least the first convex block, the second convex block, are set between the light shield layer and the base, first convex block by it is described extremely Few first color blocking layer, respective a part of two color blocking layers in the second color blocking layer stack, and second convex block is by institute State at least the first color blocking layer, a part of a color blocking layer in the second color blocking layer is constituted, first convex block is higher than described the Two convex blocks so that the light shield layer on first convex block follows protrusion to form the first spacer column, and are higher than described the The light shield layer on two convex blocks follows second spacer column of the protrusion to be formed.
6. array substrate according to claim 5, which is characterized in that the light shield layer is etched using light shield, and right Answer the light shield zonal ray percent of pass of the light shield layer identical.
7. array substrate according to claim 5, which is characterized in that the array substrate further comprises third color blocking Layer, first convex block are stacked by first color blocking layer, respective a part of the second color blocking layer, and second convex block is It is made of a part of three color blocking layer.
8. array substrate according to claim 7, which is characterized in that first color blocking layer, the second color blocking layer are respectively Red color resistance layer, green color blocking layer, the third color blocking layer is blue color blocking layer.
9. array substrate according to claim 5, which is characterized in that the light shield layer is along first color blocking layer, The orientation strip of two color blocking layers extends, while also along the boundary lines between first color blocking layer, the second color blocking layer Shape extends;Or
The light shield layer extends only along the orientation strip of first color blocking layer, the second color blocking layer, the array substrate Including pixel electrode and the array common electrical extended along the boundary linear between first color blocking layer, the second color blocking layer Pole, the array public electrode and the pixel electrode same layer are arranged, and voltage is identical as to the public electrode on substrate.
10. a kind of electronic equipment, which is characterized in that including the array substrate as described in any one of claim 5 to 9.
CN201611247179.6A 2016-12-29 2016-12-29 A kind of electronic equipment, array substrate and preparation method thereof CN106483719B (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
CN201611247179.6A CN106483719B (en) 2016-12-29 2016-12-29 A kind of electronic equipment, array substrate and preparation method thereof

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
CN201611247179.6A CN106483719B (en) 2016-12-29 2016-12-29 A kind of electronic equipment, array substrate and preparation method thereof

Publications (2)

Publication Number Publication Date
CN106483719A CN106483719A (en) 2017-03-08
CN106483719B true CN106483719B (en) 2019-08-02

Family

ID=58285162

Family Applications (1)

Application Number Title Priority Date Filing Date
CN201611247179.6A CN106483719B (en) 2016-12-29 2016-12-29 A kind of electronic equipment, array substrate and preparation method thereof

Country Status (1)

Country Link
CN (1) CN106483719B (en)

Families Citing this family (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN106896571B (en) 2017-04-10 2019-01-15 深圳市华星光电半导体显示技术有限公司 The production method of the production method and liquid crystal display panel of color membrane substrates
CN107039352B (en) * 2017-04-12 2019-09-10 深圳市华星光电半导体显示技术有限公司 The production method and TFT substrate of TFT substrate
CN107065320A (en) * 2017-06-05 2017-08-18 深圳市华星光电技术有限公司 A kind of liquid crystal panel and its manufacture method
CN107275288B (en) * 2017-06-16 2019-12-24 深圳市华星光电半导体显示技术有限公司 TFT substrate manufacturing method and TFT substrate
CN107290911A (en) * 2017-07-19 2017-10-24 深圳市华星光电半导体显示技术有限公司 A kind of display panel and its processing procedure
CN107315287A (en) * 2017-07-19 2017-11-03 深圳市华星光电半导体显示技术有限公司 A kind of display panel and its processing procedure
CN107193162A (en) * 2017-07-31 2017-09-22 深圳市华星光电技术有限公司 A kind of array base palte and manufacture method
CN107728389A (en) * 2017-10-17 2018-02-23 深圳市华星光电技术有限公司 Liquid crystal display panel and preparation method thereof
CN108535909A (en) * 2018-04-17 2018-09-14 深圳市华星光电技术有限公司 The production method and BPS type array substrates of BPS type array substrates
CN109085713A (en) * 2018-07-25 2018-12-25 深圳市华星光电半导体显示技术有限公司 A kind of display panel and preparation method thereof
CN109814314A (en) * 2018-12-25 2019-05-28 惠科股份有限公司 The array substrate manufacturing method and display device of display device
CN109445178B (en) * 2019-01-28 2019-04-26 南京中电熊猫平板显示科技有限公司 A kind of color membrane substrates and its manufacturing method

Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20060135091A (en) * 2005-06-24 2006-12-29 엘지.필립스 엘시디 주식회사 Liquid crystal display device and fabricating the same
KR20070036867A (en) * 2005-09-30 2007-04-04 엘지.필립스 엘시디 주식회사 Liquid crystal display device and method of fabricating the same
CN105116596A (en) * 2015-09-09 2015-12-02 深圳市华星光电技术有限公司 Color film substrate and manufacturing method thereof
CN105319760A (en) * 2014-07-30 2016-02-10 三星显示有限公司 Liquid crystal display panel
CN105759520A (en) * 2016-04-21 2016-07-13 深圳市华星光电技术有限公司 Liquid crystal display panel
CN106125391A (en) * 2016-08-27 2016-11-16 深圳市华星光电技术有限公司 Display floater and display device

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN103676294B (en) * 2013-12-03 2016-02-03 京东方科技集团股份有限公司 Substrate and preparation method thereof, display device
KR20160098607A (en) * 2015-02-09 2016-08-19 삼성디스플레이 주식회사 Liquid crystal display and method manufacturing of the same

Patent Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20060135091A (en) * 2005-06-24 2006-12-29 엘지.필립스 엘시디 주식회사 Liquid crystal display device and fabricating the same
KR20070036867A (en) * 2005-09-30 2007-04-04 엘지.필립스 엘시디 주식회사 Liquid crystal display device and method of fabricating the same
CN105319760A (en) * 2014-07-30 2016-02-10 三星显示有限公司 Liquid crystal display panel
CN105116596A (en) * 2015-09-09 2015-12-02 深圳市华星光电技术有限公司 Color film substrate and manufacturing method thereof
CN105759520A (en) * 2016-04-21 2016-07-13 深圳市华星光电技术有限公司 Liquid crystal display panel
CN106125391A (en) * 2016-08-27 2016-11-16 深圳市华星光电技术有限公司 Display floater and display device

Also Published As

Publication number Publication date
CN106483719A (en) 2017-03-08

Similar Documents

Publication Publication Date Title
US9851600B2 (en) Liquid crystal display panel and manufacturing method thereof
CN104282727B (en) A kind of dot structure and its display methods, display device
CN105974636B (en) The production method of liquid crystal display panel
CN105511189B (en) VA type COA liquid crystal display panels
CN105353567B (en) Using the VA type liquid crystal display panel and preparation method thereof of no black matrix" technology
CN105118383B (en) A kind of display base plate and display device
TWI227340B (en) Color filter and liquid crystal display
CN103309081B (en) Array base palte and manufacture method, display device
TWI550320B (en) Pixel structure
CN100412664C (en) Liquid crystal display and mfg. method
TWI308656B (en) Color filter array substrate and fabricating method thereof
CN104280947B (en) Liquid crystal display
CN105974651B (en) The production method of liquid crystal display panel
JP5261300B2 (en) Liquid crystal display
CN103268037B (en) A kind of color membrane substrates, preparation method and display device
TWI228187B (en) MVA-LCD device with color filters on a TFT array substrate
US8698995B2 (en) Liquid crystal display panel having particular laminate spacer
US9001007B2 (en) Display panels
TWI226462B (en) Color filter and fabricating method thereof
US9874777B2 (en) Color filter substrate, touch display device and method for manufacturing the color filter substrate
US5587818A (en) Three color LCD with a black matrix and red and/or blue filters on one substrate and with green filters and red and/or blue filters on the opposite substrate
CN104965333A (en) COA type liquid crystal display panel and preparation method thereof
KR101965305B1 (en) Liquid crystal display and method for manufacturing the same
CN103645589B (en) Display device, array base palte and preparation method thereof
CN102681246B (en) Color film substrate, method for manufacturing same and liquid crystal display

Legal Events

Date Code Title Description
C06 Publication
PB01 Publication
SE01 Entry into force of request for substantive examination
SE01 Entry into force of request for substantive examination
GR01 Patent grant
GR01 Patent grant
CP01 Change in the name or title of a patent holder
CP01 Change in the name or title of a patent holder

Address after: No.9-2 Tangming Avenue, Guangming New District, Shenzhen City, Guangdong Province

Patentee after: TCL Huaxing Photoelectric Technology Co.,Ltd.

Address before: No.9-2 Tangming Avenue, Guangming New District, Shenzhen City, Guangdong Province

Patentee before: Shenzhen China Star Optoelectronics Technology Co.,Ltd.