CN106483719B - A kind of electronic equipment, array substrate and preparation method thereof - Google Patents
A kind of electronic equipment, array substrate and preparation method thereof Download PDFInfo
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- CN106483719B CN106483719B CN201611247179.6A CN201611247179A CN106483719B CN 106483719 B CN106483719 B CN 106483719B CN 201611247179 A CN201611247179 A CN 201611247179A CN 106483719 B CN106483719 B CN 106483719B
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- Prior art keywords
- color blocking
- blocking layer
- layer
- convex block
- light shield
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- 239000000758 substrates Substances 0.000 title claims abstract description 64
- 238000002360 preparation methods Methods 0.000 title abstract description 7
- 239000010410 layers Substances 0.000 claims abstract description 306
- 230000000903 blocking Effects 0.000 claims abstract description 219
- 238000004519 manufacturing process Methods 0.000 claims abstract description 25
- 239000000463 materials Substances 0.000 claims abstract description 25
- 239000011248 coating agents Substances 0.000 claims description 3
- 238000000576 coating method Methods 0.000 claims description 3
- 238000000034 methods Methods 0.000 abstract description 14
- 238000000926 separation method Methods 0.000 abstract 1
- 238000003475 lamination Methods 0.000 description 7
- 239000004973 liquid crystal related substances Substances 0.000 description 7
- 230000000875 corresponding Effects 0.000 description 6
- 230000015572 biosynthetic process Effects 0.000 description 3
- 238000010586 diagrams Methods 0.000 description 3
- 230000000694 effects Effects 0.000 description 3
- 238000005755 formation reactions Methods 0.000 description 3
- 210000002858 crystal cell Anatomy 0.000 description 2
- 238000005516 engineering processes Methods 0.000 description 2
- 238000007711 solidification Methods 0.000 description 2
- 210000003027 Ear, Inner Anatomy 0.000 description 1
- 230000001276 controlling effects Effects 0.000 description 1
- 238000005530 etching Methods 0.000 description 1
- 239000011521 glasses Substances 0.000 description 1
- 239000011159 matrix materials Substances 0.000 description 1
- 238000003672 processing method Methods 0.000 description 1
- 239000002356 single layers Substances 0.000 description 1
- 238000002834 transmittance Methods 0.000 description 1
Classifications
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- G—PHYSICS
- G02—OPTICS
- G02F—DEVICES OR ARRANGEMENTS, THE OPTICAL OPERATION OF WHICH IS MODIFIED BY CHANGING THE OPTICAL PROPERTIES OF THE MEDIUM OF THE DEVICES OR ARRANGEMENTS FOR THE CONTROL OF THE INTENSITY, COLOUR, PHASE, POLARISATION OR DIRECTION OF LIGHT, e.g. SWITCHING, GATING, MODULATING OR DEMODULATING; TECHNIQUES OR PROCEDURES FOR THE OPERATION THEREOF; FREQUENCY-CHANGING; NON-LINEAR OPTICS; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating, or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating, or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating, or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/1333—Constructional arrangements; Manufacturing methods
- G02F1/1339—Gaskets; Spacers; Sealing of cells
- G02F1/13394—Gaskets; Spacers; Sealing of cells spacers regularly patterned on the cell subtrate, e.g. walls, pillars
-
- G—PHYSICS
- G02—OPTICS
- G02F—DEVICES OR ARRANGEMENTS, THE OPTICAL OPERATION OF WHICH IS MODIFIED BY CHANGING THE OPTICAL PROPERTIES OF THE MEDIUM OF THE DEVICES OR ARRANGEMENTS FOR THE CONTROL OF THE INTENSITY, COLOUR, PHASE, POLARISATION OR DIRECTION OF LIGHT, e.g. SWITCHING, GATING, MODULATING OR DEMODULATING; TECHNIQUES OR PROCEDURES FOR THE OPERATION THEREOF; FREQUENCY-CHANGING; NON-LINEAR OPTICS; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating, or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating, or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating, or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/1333—Constructional arrangements; Manufacturing methods
- G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
- G02F1/133509—Filters, e.g. light shielding masks
- G02F1/133512—Light shielding layers, e.g. black matrix
-
- G02F1/13396—
Abstract
Description
Technical field
The present invention relates to field of display technology, more particularly to a kind of electronic equipment, array substrate and preparation method thereof.
Background technique
In the prior art, liquid crystal display substrate includes BM (black matrix) and PS (Photo Space；Spacer), wherein BM Interception is played in liquid crystal display substrate so that display panel reaches preferable display effect, PS be set to two substrates it Between to maintain the distance between liquid crystal display substrate two substrates, PS generally includes Main PS (primary interval object) and Sub PS is (auxiliary Help spacer), wherein Main PS plays the effect of support liquid crystal cell thickness, Sub PS when array substrate and color membrane substrates seal Support and buffer function are played when liquid crystal cell is squeezed by further external force.
The BM and PS of the liquid crystal display substrate of industry production at present, can be used following methods:
One, conventional design, using transparent PS material, BM and the independent processing procedure of PS difference twice are completed, process efficiency It is low, it is at high cost, and the difference in height in order to realize Main PS and Sub PS, different shapes is usually designed on PS light shield To realize the purpose of Main PS Yu Sub PS different height, needs to be separately provided the type and quantity of PS light shield, increase processing procedure Complexity.
Two, using improved material BPS (Black Photo Space), BM is synthesized with PS and is completed in processing procedure together, But current processing method is needed by MTM (Multi Tone Mask；Multisection type adjusts light shield) technology, to realize three to BPS The exposure light irradiation of kind varying strength, and then the BPS figure of three different-thickness, i.e. BM, Main PS and Sub are obtained after developing PS, but need to combine three height, the more difficult tune of BPS yellow light technique since MTM light shield is complicated and expensive, and in exposure Section, therefore, production cost also remains high, and production efficiency is not high.
Summary of the invention
In view of this, the present invention provides a kind of electronic equipment, array substrate and preparation method thereof, LCD display can be reduced The production cost of plate, and process difficulty is reduced, improve production efficiency.
In order to solve the above technical problems, an aspect of of the present present invention provides a kind of production method of array substrate, comprising: in base Layer side forms at least the first color blocking layer arranged side by side, the second color blocking layer, at least the first convex block, the second convex block, the first convex block It is stacked by respective a part of two color blocking layers at least the first color blocking layer, the second color blocking layer, the second convex block is by extremely Few first color blocking layer, a part of of a color blocking layer in the second color blocking layer are constituted, and the first convex block is higher than the second convex block；In base Side forms the light shield layer being arranged side by side together at least the first color blocking layer, the second color blocking layer, and the screening on the first convex block Photosphere follows protrusion to form the first spacer column, and is higher than between the light shield layer on the second convex block follows protrusion to be formed second Spacer post.
Wherein, the light shield layer packet being arranged side by side together at least the first color blocking layer, the second color blocking layer is formed in base side Include: in the shading layer material of base's side coating fluid shape, shading layer material covers at least the first convex block, the second convex block；It is hiding Before photosphere material levelling, using light shield to light shield layer material exposure, wherein between respective pixel region lightproof area light shield Zonal ray percent of pass is identical；Etch away the shading layer material in respective pixel region.
Wherein, production method further comprises: be further formed third color blocking layer in the side of base, third color blocking layer with At least the first color blocking layer, the second color blocking layer, at least the first convex block, the second convex block be arranged side by side, the first convex block by the first color blocking layer, Respective a part of second color blocking layer stacks, and the second convex block is made of a part of three color blocking layers；Forming the first color It while resistance layer, the second color blocking layer, respectively leaves a part and forms stacking color blocking block, to form the first convex block, forming third color While resistance layer, leaves a part of color blocking block and form the second convex block.
Wherein, light shield layer extends along the orientation strip of the first color blocking layer, the second color blocking layer, while also along first Boundary linear between color blocking layer, the second color blocking layer extends；Or light shield layer is only along the row of the first color blocking layer, the second color blocking layer Column direction strip extends, and array substrate includes pixel electrode and along the line of demarcation between the first color blocking layer, the second color blocking layer The array public electrode that strip extends, array public electrode and pixel electrode same layer are arranged, and voltage with to public on substrate Electrode is identical.
In order to solve the above technical problems, another aspect of the present invention provides a kind of array substrate, comprising: base；At least first Color blocking layer, the second color blocking layer, are arranged side by side in base side；Light shield layer, together at least the first color blocking layer, the second color blocking layer simultaneously Row is set to base side；At least the first convex block, the second convex block, are set between light shield layer and base, and the first convex block is by least Respective a part of two color blocking layers in first color blocking layer, the second color blocking layer stacks, and the second convex block is by least first A part of a color blocking layer in color blocking layer, the second color blocking layer is constituted, and the first convex block is higher than the second convex block, so that the first convex block On light shield layer follow protrusion to form the first spacer column, and be higher than the light shield layer on the second convex block and follow protrusion to be formed The second spacer column
Wherein, light shield layer is etched using light shield, and the light shield zonal ray percent of pass of corresponding light shield layer is identical.
Wherein, array substrate further comprises third color blocking layer, the first convex block by the first color blocking layer, the second color blocking layer it is each It is stacked from a part, the second convex block is made of a part of three color blocking layers.
Wherein, the first color blocking layer, the second color blocking layer are red color resistance layer, green color blocking layer respectively, and third color blocking layer is blue Color color blocking layer.
Wherein, light shield layer extends along the orientation strip of the first color blocking layer, the second color blocking layer, while also along first Boundary linear between color blocking layer, the second color blocking layer extends；Or light shield layer is only along the row of the first color blocking layer, the second color blocking layer Column direction strip extends, and array substrate includes pixel electrode and along the line of demarcation between the first color blocking layer, the second color blocking layer The array public electrode that strip extends, array public electrode and pixel electrode same layer are arranged, and voltage with to public on substrate Electrode is identical.
In order to solve the above technical problems, the third aspect of the present invention provides a kind of electronic equipment, including above-mentioned array substrate.
Through the above scheme, the beneficial effects of the present invention are: being different from the prior art, array substrate of the invention can lead to It crosses the side in base and forms multiple color blocking layers, and multiple convex blocks, and convex block are formed by at least partly stacking of multiple color blocking layers Height it is different, and then light shield layer is further set on convex block, so that the spacer column of different height is formed, to realize simplification Processing procedure, and the light shield by labyrinth is not needed, production cost is reduced, production efficiency is improved.
Detailed description of the invention
To describe the technical solutions in the embodiments of the present invention more clearly, make required in being described below to embodiment Attached drawing is briefly described, it should be apparent that, drawings in the following description are only some embodiments of the invention, for For those of ordinary skill in the art, without creative efforts, it can also be obtained according to these attached drawings other Attached drawing.Wherein:
Fig. 1 is the flow diagram of the production method of the array substrate of one embodiment of the invention；
Fig. 2 is the top view of the array substrate of one embodiment of the invention；
Fig. 3 is sectional view of the array substrate shown in Fig. 2 along A-A' line；
Fig. 4 is the top view of the array substrate of further embodiment of this invention；
Fig. 5 is the structural schematic diagram of the electronic equipment of one embodiment of the invention.
Specific embodiment
Following will be combined with the drawings in the embodiments of the present invention, and technical solution in the embodiment of the present invention carries out clear, complete Site preparation description, wherein identical label indicates same or similar element or element with the same or similar functions in the present invention. Obviously, described embodiments are only a part of the embodiments of the present invention, rather than whole embodiments.Based on the reality in the present invention Apply example, those of ordinary skill in the art's every other embodiment obtained under the premise of not making creative labor, all Belong to the scope of protection of the invention.
It is please the flow diagram of the production method of the array substrate of one embodiment of the invention referring to Fig. 1-3, Fig. 1 together, Fig. 2 is the top view of array substrate made from the production method using Fig. 1, and Fig. 3 is the cuing open along A-A' line of array substrate shown in Fig. 2 Face figure.As shown in Figure 1-3, the production method of the array substrate 100 of the present embodiment includes:
S101: at least the first color blocking layer 120 arranged side by side, the second color blocking layer 130, at least are formed in 110 side of base First convex block 101 and the second convex block 102.
Wherein, the material of base 110 can be glass baseplate or plastic basis material.First convex block 101 is by least the first color blocking layer 120, respective a part of two color blocking layers in the second color blocking layer 130 stacks, and the second convex block 102 is by least the first color A part of a color blocking layer in resistance layer 120, the second color blocking layer 130 is constituted, and the height h1 of the first convex block 101 is greater than the The height h2 of two convex blocks 102.Wherein, the first color blocking layer 120 and the second color blocking layer 130 can be red color resistance layer R, green color blocking layer Any two kinds in G or blue color blocking layer B.Therefore, can be while forming the first color blocking layer 120 and the second color blocking layer 130, it will First color blocking layer 120 and the second color blocking layer 130, which respectively leave a part and formed, stacks color blocking block, and the stacking color blocking block is made to be formed as the One convex block 101, and while forming the first color blocking layer 120 or the second color blocking layer 130, by the first color blocking layer 120 or second Color blocking layer 130 leaves a part and forms color blocking block, so that the color blocking block is formed as the second convex block 102, and keep the first convex block 101 high In the second convex block 102.
In other embodiments, also it can be further formed third color blocking layer 140 in the side of base 110, and makes third color Resistance layer 140 and at least the first color blocking layer 120, the second color blocking layer 130, at least the first convex block 101, the second convex block 102 are arranged side by side, In turn, the first convex block 101 can be stacked by respective a part of the first color blocking layer 120, the second color blocking layer 130, the second convex block 102 can be made of a part of third color blocking layer 140.Therefore, formed the first color blocking layer 120, the second color blocking layer 130 it is same When, it can be stacked into color blocking layer by first color blocking layer 120, a part that respectively leaves of the second color blocking layer 130, and then be formed First convex block 101, while forming third color blocking layer 140, leave a part formed color blocking layer to form the second convex block 102, And the first convex block 101 is made to be higher than the second convex block 102.
S102: in 110 side of base, formation is arranged side by side together at least the first color blocking layer 120, the second color blocking layer 130 Light shield layer 103.
Wherein, in 103 material of light shield layer of 110 side coating fluid shape of base, such as BPS, the covering of 103 material of light shield layer At least the first convex block 101, the second convex block 102, the light shield layer before 103 material levelling of light shield layer, i.e. on the first convex block 101 During 103 materials are still higher than 103 material of light shield layer on the second convex block 102,103 material of light shield layer is exposed using light shield Light, and then by 103 material solidification of light shield layer on the light shield layer 103 and the second convex block 102 on the first convex block 101, that is, make 103 material of light shield layer on first convex block 101 is higher than the relationship solidification of 103 material of light shield layer on the second convex block 102.Then, Etch away 103 material of light shield layer in respective pixel region so that the light shield layer 103 being formed on the first convex block 101 follow it is convex It rises to form the first spacer column 104, is formed between the light shield layer 103 on the second convex block 102 follows protrusion to be formed second Spacer post 105, the height h6 of the first spacer column 104 are greater than the height h7 of the second spacer column 105.Wherein, correspond to pixel region it Between lightproof area light shield region light transmittance it is identical.Therefore, after development etching, light shield layer 103 is each in array substrate 100 The thickness in a region is identical, i.e., so that the difference in height of the first spacer column 104 and the second spacer column 105 is the height of color blocking lamination Difference.
In the present embodiment, light shield layer 103 prolongs along the orientation strip of the first color blocking layer 120, the second color blocking layer 130 It stretches, while extending also along the boundary linear between the first color blocking layer 120, the second color blocking layer 130.In other embodiments, As shown in figure 4, light shield layer 103 can extend only along the orientation strip of the first color blocking layer 120, the second color blocking layer 130, array Substrate 200 further comprise pixel electrode (not shown) and along between the first color blocking layer 120, the second color blocking layer 130 point The array public electrode 220 that boundary line strip extends, array public electrode 220 and pixel electrode same layer are arranged, and voltage with to base Public electrode on plate is identical.
To sum up, the production of the array substrate 100 of the present embodiment, by the way that multiple color blockings are arranged side by side in the side of base 110 Layer is stacked by respective a part in multiple color blocking layers and forms multiple convex blocks, and light shield layer 103, shading are arranged in color blocking layer Layer 103 is formed on convex block and with convex block protrusion and then formation spacer column, since the height of convex block is different, between being formed The height of spacer post is also different, and therefore, the present embodiment is formed without additional setting BM by the difference in height of color blocking lamination The spacer column of different height is formed simultaneously BM, Main PS and Sub PS, the light shield without design complex configurations is to form not Level spacer column reduces production cost, and simplifies processing procedure, reduces process difficulty.
It is please the top view of the array substrate of one embodiment of the invention referring further to Fig. 2, Fig. 2.As shown in Fig. 2, this reality Apply example array substrate 100 include base 110, be formed in base 110 light shield layer 103, be formed in light shield layer 103 enclose set and At subpixel area in single layer color blocking layer, wherein in red subpixel areas be arranged red color resistance layer R, green sub-pixels Green color blocking layer G is set in region, blue color blocking layer B is set in blue subpixel areas, and in adjacent subpixel area Color blocking lamination made of a part in corresponding color blocking layer stacks is formed, as shown in Fig. 2, by taking two rows of subpixel areas as an example, In the corresponding region of controlling grid scan line, it is formed with the color blocking lamination of part red color resistance layer R and green color blocking layer G formation, and In addition the blue color blocking layer B of position.
In conjunction with Fig. 2, please further referring to Fig. 3, Fig. 3 is sectional view of the array substrate shown in Fig. 2 along A-A' line.Such as Fig. 3 institute Show, array substrate 100 includes base 110, at least the first color blocking layer 120, the second color blocking layer 130, light shield layer 103, at least first Convex block 101 and the second convex block 102.Wherein, at least the first color blocking layer 120 and the second color blocking layer 130 are arranged side by side in base 110 1 Side, light shield layer 103 are arranged side by side in 110 side of base, at least together at least the first color blocking layer 120 and the second color blocking layer 130 First convex block 101 and the second convex block 102 are set between light shield layer 103 and base 110, and the first convex block 101 is by least Respective a part of two color blocking layers in one color blocking layer 120, the second color blocking layer 130 stacks, and the second convex block 102 is by extremely Few first color blocking layer 120, a part of of a color blocking layer in the second color blocking layer 130 are constituted, and it is convex that the first convex block 101 is higher than second Block 102, so that the light shield layer 103 on the first convex block 101 follows protrusion to form the first spacer column 104, and it is convex to be higher than second Light shield layer 103 on block 102 follows second spacer column 105 of the protrusion to be formed.
In other embodiments, array substrate 100 further comprises third color blocking layer 140, and the first convex block 101 is by the first color Resistance layer 120, respective a part of the second color blocking layer 130 stack, and the second convex block 102 is a part of structure by three color blocking layers At optionally, the first color blocking layer 120, the second color blocking layer 130 are red color resistance layer R, green color blocking layer G, third color blocking layer respectively 140 be blue color blocking layer B.Or first color blocking layer 120, the second color blocking layer 130 and third color blocking layer 140 are red respectively Any one in color blocking layer R, green color blocking layer G and blue color blocking layer B, no longer limits herein.
Fig. 3 illustrates by taking red color resistance layer R, green color blocking layer G and blue color blocking layer B as an example.Wherein the first convex block 101 and Two convex blocks 102 are set between light shield layer 103 and base 110, and the first convex block 101 is by red color resistance layer R's and green color blocking layer G It respectively partially stacks, the second convex block 102 is made of a part in blue color blocking layer B, and the height h1 of the first convex block 101 is big The first convex block 101 is followed to convex to form the first interval in the light shield layer 103 on the height h2 of the second convex block 102, the first convex block 101 Column 104, the light shield layer 103 on the second convex block 102 follow the second convex block 102 to convex to form the second spacer column 105.
Wherein, light shield layer 103 is etched using light shield, and the light shield zonal ray percent of pass phase of corresponding light shield layer 103 Together, therefore, so that corresponding to the thickness h 3 of the light shield layer 103 on the first convex block 101, corresponding to the shading on the second convex block 102 The thickness h 5 of the light shield layer 103 of the thickness h 4 and remaining region of layer 103 is equal.
Also, light shield layer 103 extends along the orientation strip of red color resistance layer R, green color blocking layer G, while also edge The boundary linear extension of red coloration color blocking layer R, green color blocking layer G.
In other embodiments, as shown in figure 4, light shield layer 103 can be only along the row of red color resistance layer R, green color blocking layer G Column direction strip extends, and array substrate 200 further includes pixel electrode (not shown) and along red color resistance layer R and green color blocking The array public electrode 220 that boundary linear between layer G extends, array public electrode 220 and pixel electrode same layer are arranged, and Voltage is identical as to the public electrode (not shown) in substrate (not shown).
Therefore, the present embodiment can form color blocking lamination in base 110, and light shield layer further is arranged on color blocking lamination 103, so that forming difference in array substrate 100 has different height spacer column, i.e., using the difference in height of color blocking lamination BM, Main PS and Sub PS simplify the processing procedure of array substrate 100, reduce process difficulty and light shield cost, and without additional BM is set, production efficiency is improved.
As shown in figure 5, the present invention also provides a kind of electronic equipment 300, including color membrane substrates 310, array substrate 100 or 200 and the liquid crystal layer 320 that is set between color membrane substrates 310 and array substrate 100 or 200, wherein array substrate 100 or 200 For the array substrate 100 or 200 of above-described embodiment, details are not described herein.
In conclusion be different from the prior art, electronic equipment of the present invention, array substrate and preparation method thereof, wherein array Substrate can be by forming multiple color blocking layers arranged side by side in base side, and the respective part in multiple color blocking layers stacks shape At convex block, and light shield layer is provided on convex block, thus form the spacer column of different height as BM, Main PS and Sub PS, The process difficulty of array substrate is reduced, and reduces the cost of light shield, improves production efficiency.
The above description is only an embodiment of the present invention, is not intended to limit the scope of the invention, all to utilize this hair Equivalent structure or equivalent flow shift made by bright specification and accompanying drawing content is applied directly or indirectly in other relevant skills Art field, is included within the scope of the present invention.
Claims (10)
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| CN107039352B (en) * | 2017-04-12 | 2019-09-10 | 深圳市华星光电半导体显示技术有限公司 | The production method and TFT substrate of TFT substrate |
| CN107065320A (en) * | 2017-06-05 | 2017-08-18 | 深圳市华星光电技术有限公司 | A kind of liquid crystal panel and its manufacture method |
| CN107275288B (en) * | 2017-06-16 | 2019-12-24 | 深圳市华星光电半导体显示技术有限公司 | TFT substrate manufacturing method and TFT substrate |
| CN107290911A (en) * | 2017-07-19 | 2017-10-24 | 深圳市华星光电半导体显示技术有限公司 | A kind of display panel and its processing procedure |
| CN107315287A (en) * | 2017-07-19 | 2017-11-03 | 深圳市华星光电半导体显示技术有限公司 | A kind of display panel and its processing procedure |
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| CN107728389A (en) * | 2017-10-17 | 2018-02-23 | 深圳市华星光电技术有限公司 | Liquid crystal display panel and preparation method thereof |
| CN108535909A (en) * | 2018-04-17 | 2018-09-14 | 深圳市华星光电技术有限公司 | The production method and BPS type array substrates of BPS type array substrates |
| CN109085713A (en) * | 2018-07-25 | 2018-12-25 | 深圳市华星光电半导体显示技术有限公司 | A kind of display panel and preparation method thereof |
| CN109814314A (en) * | 2018-12-25 | 2019-05-28 | 惠科股份有限公司 | The array substrate manufacturing method and display device of display device |
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| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR20060135091A (en) * | 2005-06-24 | 2006-12-29 | 엘지.필립스 엘시디 주식회사 | Liquid crystal display device and fabricating the same |
| KR20070036867A (en) * | 2005-09-30 | 2007-04-04 | 엘지.필립스 엘시디 주식회사 | Liquid crystal display device and method of fabricating the same |
| CN105319760A (en) * | 2014-07-30 | 2016-02-10 | 三星显示有限公司 | Liquid crystal display panel |
| CN105116596A (en) * | 2015-09-09 | 2015-12-02 | 深圳市华星光电技术有限公司 | Color film substrate and manufacturing method thereof |
| CN105759520A (en) * | 2016-04-21 | 2016-07-13 | 深圳市华星光电技术有限公司 | Liquid crystal display panel |
| CN106125391A (en) * | 2016-08-27 | 2016-11-16 | 深圳市华星光电技术有限公司 | Display floater and display device |
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| CN106483719A (en) | 2017-03-08 |
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Address after: No.9-2 Tangming Avenue, Guangming New District, Shenzhen City, Guangdong Province Patentee after: TCL Huaxing Photoelectric Technology Co.,Ltd. Address before: No.9-2 Tangming Avenue, Guangming New District, Shenzhen City, Guangdong Province Patentee before: Shenzhen China Star Optoelectronics Technology Co.,Ltd. |