CN106483719A - A kind of electronic equipment, array base palte and preparation method thereof - Google Patents
A kind of electronic equipment, array base palte and preparation method thereof Download PDFInfo
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- CN106483719A CN106483719A CN201611247179.6A CN201611247179A CN106483719A CN 106483719 A CN106483719 A CN 106483719A CN 201611247179 A CN201611247179 A CN 201611247179A CN 106483719 A CN106483719 A CN 106483719A
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- Prior art keywords
- color blocking
- blocking layer
- layer
- projection
- light shield
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Classifications
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- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/1333—Constructional arrangements; Manufacturing methods
- G02F1/1339—Gaskets; Spacers; Sealing of cells
- G02F1/13394—Gaskets; Spacers; Sealing of cells spacers regularly patterned on the cell subtrate, e.g. walls, pillars
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/1333—Constructional arrangements; Manufacturing methods
- G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
- G02F1/133509—Filters, e.g. light shielding masks
- G02F1/133512—Light shielding layers, e.g. black matrix
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/1333—Constructional arrangements; Manufacturing methods
- G02F1/1339—Gaskets; Spacers; Sealing of cells
- G02F1/13396—Spacers having different sizes
Abstract
The invention discloses a kind of electronic equipment, array base palte and preparation method thereof, wherein manufacture method includes by forming the multiple color blocking layers being arranged side by side and multiple projection in basic unit side, projection is formed by least a portion stacking in color blocking layer, and the height of projection differs, and light shield layer is arranged on color blocking layer, light shield layer forms spacer together with projection further.By the way, the present invention need not design special light shield to form the separation material with differing heights difference, simplify processing procedure and reduce production cost, and improves the uneven situation of display base plate display.
Description
Technical field
The present invention relates to display technology field, more particularly to a kind of electronic equipment, array base palte and preparation method thereof.
Background technology
In prior art, liquid crystal display substrate includes BM (black matrix) and PS (Photo Space；Sept), wherein, BM
Play interception in liquid crystal display substrate so that display floater reaches preferably display effect, PS be arranged at two substrates it
Between to maintain the distance between liquid crystal display substrate two substrates, it is (auxiliary that PS generally includes Main PS (primary interval thing) and Sub PS
Help sept), wherein, Main PS plays the effect supporting liquid crystal cell thick, Sub PS with color membrane substrates when array base palte is sealed
Play support and cushioning effect when liquid crystal cell is subject to further external force extruding.
Industry makes BM and PS of liquid crystal display substrate at present, can adopt following methods：
First, conventional design, using transparent PS material, the processing procedure of BM and PS twice independence respectively completes, its process efficiency
Low, high cost, and in order to realize the difference in height of Main PS and Sub PS, different shapes are typically designed on PS light shield
To realize the purpose of Main PS and Sub PS differing heights, need to be separately provided type and the quantity of PS light shield, increased processing procedure
Complexity.
2nd, adopt improved material BPS (Black Photo Space), by BM and PS synthesis together with complete in processing procedure,
But current processing method needs by MTM (Multi Tone Mask；Multisection type adjusts light shield) technology, so that three are realized to BPS
The BPS figure of three different-thickness, i.e. BM, Main PS and Sub is obtained after planting the exposure light irradiation of varying strength, and then development
PS, but because MTM light shield is complicated and expensive, and need to take into account three height in exposure, the more difficult tune of BPS gold-tinted technique simultaneously
Section, therefore, production cost also remains high, and production efficiency is not high.
Content of the invention
In view of this, the present invention provides a kind of electronic equipment, array base palte and preparation method thereof, it is possible to decrease LCD
The production cost of plate, and reduce processing procedure difficulty, improve production efficiency.
For solving above-mentioned technical problem, an aspect of of the present present invention provides a kind of manufacture method of array base palte, including：In base
Layer side forms at least first color blocking layer being arranged side by side, the second color blocking layer, at least first projection, the second projection, the first projection
Formed by each part stacking of two color blocking layers at least first color blocking layer, the second color blocking layer, the second projection is by extremely
The part composition of few one of first color blocking layer, second color blocking layer color blocking layer, the first projection is higher than the second projection；In basic unit
The light shield layer that side formation is arranged side by side together with least first color blocking layer, the second color blocking layer, and the screening on the first projection
Photosphere follows projection to form the first spacer, and follows between raised to be formed second higher than the light shield layer on the second projection
Spacer post.
Wherein, the light shield layer bag being arranged side by side together with least first color blocking layer, the second color blocking layer in basic unit's side formation
Include：In the shading layer material of basic unit's side coating fluid shape, shading layer material covers at least first projection, the second projection；Hiding
Before photosphere material levelling, using light shield to light shield layer material exposure, the light shield of lightproof area wherein between respective pixel region
Zonal ray percent of pass is identical；Etch away the shading layer material in respective pixel region.
Wherein, manufacture method further includes：Form tertiary color resistance layer further in the side of basic unit, tertiary color resistance layer with
At least first color blocking layer, the second color blocking layer, at least first projection, the second projection are arranged side by side, the first projection by the first color blocking layer,
Each part stacking of the second color blocking layer forms, and the second projection is to be made up of a part for three color blocking layers；Forming the first color
While resistance layer, the second color blocking layer, respectively stay a part to form stacking color blocking block, to form the first projection, form tertiary color
While resistance layer, a part of color blocking block is stayed to form the second projection.
Wherein, light shield layer extends along the orientation strip of the first color blocking layer, the second color blocking layer, simultaneously also along first
Boundary linear between color blocking layer, the second color blocking layer extends；Or light shield layer is only along the row of the first color blocking layer, the second color blocking layer
Column direction strip extends, and array base palte includes pixel electrode and along the demarcation line between the first color blocking layer, the second color blocking layer
The array public electrode that strip extends, array public electrode and pixel electrode are arranged with layer, and voltage with to public on substrate
Electrode is identical.
For solving above-mentioned technical problem, another aspect of the present invention provides a kind of array base palte, including：Basic unit；At least first
Color blocking layer, the second color blocking layer, are arranged side by side in basic unit side；Light shield layer, together with least first color blocking layer, the second color blocking layer simultaneously
Row is arranged at basic unit side；At least first projection, the second projection, are arranged between light shield layer and basic unit, and the first projection is by least
Each part stacking of two color blocking layers in the first color blocking layer, the second color blocking layer forms, and the second projection is by least first
The part composition of one of color blocking layer, the second color blocking layer color blocking layer, the first projection is higher than the second projection so that the first projection
On light shield layer follow raised to form the first spacer, and higher than the light shield layer on the second projection follow raised to be formed
The second spacer
Wherein, light shield layer is formed using light shield etching, and the light shield zonal ray percent of pass of corresponding light shield layer is identical.
Wherein, array base palte further includes tertiary color resistance layer, the first projection by the first color blocking layer, the second color blocking layer each
Form from part stacking, the second projection is to be made up of a part for three color blocking layers.
Wherein, the first color blocking layer, the second color blocking layer are red color resistance layer, green color blocking layer respectively, and tertiary color resistance layer is blue
Color color blocking layer.
Wherein, light shield layer extends along the orientation strip of the first color blocking layer, the second color blocking layer, simultaneously also along first
Boundary linear between color blocking layer, the second color blocking layer extends；Or light shield layer is only along the row of the first color blocking layer, the second color blocking layer
Column direction strip extends, and array base palte includes pixel electrode and along the demarcation line between the first color blocking layer, the second color blocking layer
The array public electrode that strip extends, array public electrode and pixel electrode are arranged with layer, and voltage with to public on substrate
Electrode is identical.
For solving above-mentioned technical problem, a third aspect of the present invention provides a kind of electronic equipment, including above-mentioned array base palte.
By such scheme, the invention has the beneficial effects as follows：It is different from prior art, the array base palte of the present invention, can lead to
Cross and form multiple color blocking layers in the side of basic unit, and multiple projections are formed by least part of stacking of multiple color blocking layers, and projection
Height differ, and then light shield layer is arranged on projection further, thus forming the spacer of differing heights, thus realizing simplifying
Processing procedure, and do not need the light shield by labyrinth, reduce production cost, improve production efficiency.
Brief description
For the technical scheme being illustrated more clearly that in the embodiment of the present invention, will make to required in embodiment description below
Accompanying drawing be briefly described it should be apparent that, drawings in the following description are only some embodiments of the present invention, for
For those of ordinary skill in the art, on the premise of not paying creative work, other can also be obtained according to these accompanying drawings
Accompanying drawing.Wherein：
Fig. 1 is the schematic flow sheet of the manufacture method of the array base palte of one embodiment of the invention；
Fig. 2 is the top view of the array base palte of one embodiment of the invention；
Fig. 3 is the profile along A-A' line for the array base palte shown in Fig. 2；
Fig. 4 is the top view of the array base palte of further embodiment of this invention；
Fig. 5 is the structural representation of the electronic equipment of one embodiment of the invention.
Specific embodiment
Below in conjunction with the accompanying drawing in the embodiment of the present invention, the technical scheme in the embodiment of the present invention is carried out clear, complete
Site preparation describes, the element that wherein in the present invention, identical label represents same or similar element or has same or like function.
Obviously, described embodiment is only a part of embodiment of the present invention, rather than whole embodiments.Based on the reality in the present invention
Apply example, the every other embodiment that those of ordinary skill in the art are obtained under the premise of not making performing creative labour, all
Belong to the scope of protection of the invention.
Please in the lump referring to Fig. 1-3, Fig. 1 is the schematic flow sheet of the manufacture method of the array base palte of one embodiment of the invention,
Fig. 2 is the top view of the array base palte being obtained using the manufacture method of Fig. 1, and Fig. 3 is the cuing open along A-A' line of array base palte shown in Fig. 2
Face figure.As Figure 1-3, the manufacture method of the array base palte 100 of the present embodiment includes：
S101：At least first color blocking layer 120 of being arranged side by side in the formation of basic unit 110 side, the second color blocking layer 130, at least
First projection 101 and the second projection 102.
Wherein, the material of basic unit 110 can be glass baseplate or plastic basis material.First projection 101 is by least first color blocking layer
120th, each part stacking of two color blocking layers in the second color blocking layer 130 forms, and the second projection 102 is by least first color
The part composition of one of resistance layer 120, the second color blocking layer 130 color blocking layer, and the height h1 of the first projection 101 is more than the
The height h2 of two projections 102.Wherein, the first color blocking layer 120 and the second color blocking layer 130 can be red color resistance layer R, green color blocking layer
In G or blue color blocking layer B any two kinds.Therefore, can be while forming the first color blocking layer 120 and the second color blocking layer 130, will
First color blocking layer 120 and the second color blocking layer 130 respectively stay a part to form stacking color blocking block, make this stacking color blocking block be formed as the
One projection 101, and while forming the first color blocking layer 120 or the second color blocking layer 130, by the first color blocking layer 120 or second
Color blocking layer 130 stays a part to form color blocking block, makes this color blocking block be formed as the second projection 102, and makes the first projection 101 high
In the second projection 102.
In other embodiments, also can form tertiary color resistance layer 140 further in the side of basic unit 110, and make tertiary color
Resistance layer 140 is arranged side by side with least first color blocking layer 120, the second color blocking layer 130, at least first projection 101, the second projection 102,
And then, the first projection 101 can be formed by each part stacking of the first color blocking layer 120, the second color blocking layer 130, the second projection
102 can be made up of a part for tertiary color resistance layer 140.Therefore, formed the first color blocking layer 120, the second color blocking layer 130 same
When, color blocking layer can be formed by the part stacking that each stays of described first color blocking layer 120, the second color blocking layer 130, and then be formed
First projection 101, while forming tertiary color resistance layer 140, stays a part to form color blocking layer to form the second projection 102,
And make the first projection 101 be higher than the second projection 102.
S102：It is arranged side by side together with least first color blocking layer 120, the second color blocking layer 130 in basic unit 110 side formation
Light shield layer 103.
Wherein, in light shield layer 103 material of basic unit 110 side coating fluid shape, such as BPS, light shield layer 103 material covers
At least first projection 101, the second projection 102, before light shield layer 103 material levelling, i.e. light shield layer on the first projection 101
103 materials are still above the period of light shield layer 103 material on the second projection 102, using light shield, light shield layer 103 material are exposed
Light, and then by light shield layer 103 material solidification on the light shield layer 103 on the first projection 101 and the second projection 102, that is, make
Light shield layer 103 material on first projection 101 is higher than the relation solidification of light shield layer 103 material on the second projection 102.Then,
Etch away light shield layer 103 material in respective pixel region so that the light shield layer 103 that is formed on the first projection 101 follow convex
Rise to form the first spacer 104, be formed at the light shield layer 103 on the second projection 102 and follow between raised to be formed second
Spacer post 105, the height h6 of the first spacer 104 is more than the height h7 of the second spacer 105.Wherein, corresponding to pixel region it
Between the light shield region of lightproof area light transmittance identical.Therefore, after development etching, light shield layer 103 is each in array base palte 100
The thickness in individual region is identical, that is, make the first spacer 104 and the second spacer 105 difference in height be color blocking lamination height
Difference.
In the present embodiment, light shield layer 103 prolongs along the orientation strip of the first color blocking layer 120, the second color blocking layer 130
Stretch, extend also along the boundary linear between the first color blocking layer 120, the second color blocking layer 130 simultaneously.In other embodiments,
As shown in figure 4, light shield layer 103 can extend only along the orientation strip of the first color blocking layer 120, the second color blocking layer 130, array
Substrate 200 further includes pixel electrode (not shown) and along dividing between the first color blocking layer 120, the second color blocking layer 130
The array public electrode 220 that boundary line strip extends, array public electrode 220 is arranged with layer with pixel electrode, and voltage with to base
Public electrode on plate is identical.
To sum up, the making of the array base palte 100 of the present embodiment, is arranged side by side multiple color blockings by the side in basic unit 110
Layer, forms multiple projections by each part stacking in multiple color blocking layers, and arranges light shield layer 103, shading in color blocking layer
Layer 103 is formed on projection and with projection projection and then forms spacer, and the height due to projection differs, therefore between formation
The height of spacer post also differs, and therefore, the present embodiment need not additionally arrange BM, and the difference in height by color blocking lamination and then formation
The spacer of differing heights, that is, simultaneously formed BM, Main PS and Sub PS, without design complex configurations light shield to be formed not
Level spacer, reduces production cost, and simplifies processing procedure, reduces processing procedure difficulty.
Please referring further to Fig. 2, Fig. 2 is the top view of the array base palte of one embodiment of the invention.As shown in Fig. 2 this reality
Apply example array base palte 100 include basic unit 110, the light shield layer 103 being formed in basic unit 110, be formed at light shield layer 103 enclose set and
Monolayer color blocking layer in the subpixel area becoming, wherein, arranges red color resistance layer R, green sub-pixels in red subpixel areas
In region, green color blocking layer G is set, in setting blue color blocking layer B, and adjacent subpixel area in blue subpixel areas
Form the color blocking lamination of the part stacking in corresponding color blocking layer, as shown in Fig. 2 taking two row's subpixel area as a example,
In the corresponding region of controlling grid scan line, it is formed with the color blocking lamination that part red color resistance layer R and green color blocking layer G are formed, and
In addition blue color blocking layer B of position.
In conjunction with Fig. 2, please referring further to Fig. 3, Fig. 3 is the profile along A-A' line for the array base palte shown in Fig. 2.As Fig. 3 institute
Show, array base palte 100 include basic unit 110, at least first color blocking layer 120, the second color blocking layer 130, light shield layer 103, at least first
Projection 101 and the second projection 102.Wherein, at least first color blocking layer 120 and the second color blocking layer 130 are arranged side by side in basic unit 110 1
Side, light shield layer 103 is arranged side by side in basic unit 110 side together with least first color blocking layer 120 and the second color blocking layer 130, at least
First projection 101 and the second projection 102 are arranged between light shield layer 103 and basic unit 110, and the first projection 101 is by least
Each part stacking of two color blocking layers in one color blocking layer 120, the second color blocking layer 130 forms, and the second projection 102 is by extremely
The part composition of few one of first color blocking layer 120, second color blocking layer 130 color blocking layer, the first projection 101 is convex higher than second
Block 102 is so that the light shield layer 103 on the first projection 101 follows projection to form the first spacer 104 and convex higher than second
Light shield layer 103 on block 102 follows raised the second spacer 105 to be formed.
In other embodiments, array base palte 100 further includes tertiary color resistance layer 140, and the first projection 101 is by the first color
Resistance layer 120, each part stacking of the second color blocking layer 130 form, and the second projection 102 is by a part of structure of three color blocking layers
Become, alternatively, the first color blocking layer 120, the second color blocking layer 130 are red color resistance layer R, green color blocking layer G respectively, tertiary color resistance layer
140 is blue color blocking layer B.Or, the first color blocking layer 120, the second color blocking layer 130 and tertiary color resistance layer 140 are red respectively
Any one in color blocking layer R, green color blocking layer G and blue color blocking layer B, here no longer limits.
Fig. 3 taking red color resistance layer R, green color blocking layer G and blue color blocking layer B as a example explanation.Wherein first projection 101 and
Two projections 102 are arranged between light shield layer 103 and basic unit 110, and the first projection 101 is by red color resistance layer R and green color blocking layer G
Each part stacking forms, and the second projection 102 is made up of the part in blue color blocking layer B, and the height h1 of the first projection 101 is big
Light shield layer 103 on the height h2 of the second projection 102, the first projection 101 is followed the first projection 101 and is convexed to form the first interval
Post 104, the light shield layer 103 on the second projection 102 is followed the second projection 102 and is convexed to form the second spacer 105.
Wherein, light shield layer 103 is formed using light shield etching, and the light shield zonal ray percent of pass phase of corresponding light shield layer 103
With therefore so that corresponding to the thickness h 3 of light shield layer 103 on the first projection 101, corresponding to the shading on the second projection 102
The thickness h 5 of the light shield layer 103 in the thickness h 4 of layer 103 and remaining region is equal.
And, light shield layer 103 extends along the orientation strip of red color resistance layer R, green color blocking layer G, also edge simultaneously
Red coloration color blocking layer R, the boundary linear of green color blocking layer G extend.
In other embodiments, as shown in figure 4, light shield layer 103 can be only along the row of red color resistance layer R, green color blocking layer G
Column direction strip extends, and array base palte 200 also includes pixel electrode (not shown) and along red color resistance layer R and green color blocking
The array public electrode 220 that boundary linear between layer G extends, array public electrode 220 is arranged with layer with pixel electrode, and
Voltage with identical to the public electrode (not shown) in substrate (not shown).
Therefore, the present embodiment can form color blocking lamination in basic unit 110, and arranges light shield layer further on color blocking lamination
103, thus using the difference in height of color blocking lamination, difference being formed on array base palte 100 and there is differing heights spacer, that is,
BM, Main PS and Sub PS, simplifies the processing procedure of array base palte 100, reduces processing procedure difficulty and light shield cost, and need not be extra
Setting BM, improve production efficiency.
As shown in figure 5, the present invention also provides a kind of electronic equipment 300, including color membrane substrates 310, array base palte 100 or
200 and be arranged at liquid crystal layer 320 between color membrane substrates 310 and array base palte 100 or 200, wherein array base palte 100 or 200
For the array base palte 100 or 200 of above-described embodiment, will not be described here.
In sum, it is different from prior art, electronic equipment of the present invention, array base palte and preparation method thereof, wherein array
Substrate can be by the multiple color blocking layers being arranged side by side in basic unit's side formation, and the respective part in multiple color blocking layer stacks shape
Become projection, and light shield layer is provided with projection, thus forming the spacer of differing heights as BM, Main PS and Sub PS,
Reduce the processing procedure difficulty of array base palte, and reduce the cost of light shield, improve production efficiency.
The foregoing is only embodiments of the invention, not thereby limit the present invention the scope of the claims, every using this
Equivalent structure or equivalent flow conversion that bright description and accompanying drawing content are made, or directly or indirectly it is used in other related skills
Art field, is included within the scope of the present invention.
Claims (10)
1. a kind of manufacture method of array base palte is it is characterised in that described manufacture method includes：
Form at least first color blocking layer being arranged side by side, the second color blocking layer, at least first projection, the second projection in basic unit side,
Described first projection is by each part stacking of two color blocking layers in described at least first color blocking layer, the second color blocking layer
Become, described second projection is to be made up of a part for one of described at least first color blocking layer, the second color blocking layer color blocking layer, institute
Stating the first projection is higher than described second projection；
The light shield layer being arranged side by side together with described at least first color blocking layer, the second color blocking layer in the side formation of described basic unit, and
And the described light shield layer on described first projection follow raised to form the first spacer, and higher than on described second projection
Described light shield layer follow raised the second spacer to be formed.
2. manufacture method according to claim 1 is it is characterised in that described form and described at least first in basic unit side
The light shield layer that color blocking layer, the second color blocking layer are arranged side by side together includes：
In the shading layer material of described basic unit side coating fluid shape, described shading layer material cover described at least first projection,
Second projection；
Before described light shield layer material levelling, using light shield to described light shield layer material exposure, wherein respective pixel region it
Between lightproof area described light shield zonal ray percent of pass identical；
Etch away the described shading layer material in described respective pixel region.
3. manufacture method according to claim 1 and 2 is it is characterised in that described manufacture method further includes：
Form tertiary color resistance layer in the side of described basic unit further, described tertiary color resistance layer and described at least first color blocking layer,
Described second color blocking layer, described at least first projection, described second projection are arranged side by side, and described first projection is by described first color
Resistance layer, each part stacking of the second color blocking layer form, and described second projection is to be made up of a part for described three color blocking layers；
While forming described first color blocking layer, described second color blocking layer, a part is respectively stayed to form stacking color blocking block, with shape
Become described first projection, while forming described tertiary color resistance layer, stay a part of color blocking block to form described second projection.
4. manufacture method according to claim 3 it is characterised in that described light shield layer along described first color blocking layer,
The orientation strip of two color blocking layers extends, simultaneously also along the boundary lines between described first color blocking layer, the second color blocking layer
Shape extends；Or
Described light shield layer extends only along the orientation strip of described first color blocking layer, the second color blocking layer, described array base palte
The array common electrical extend including pixel electrode and along the boundary linear between described first color blocking layer, the second color blocking layer
Pole, described array public electrode and described pixel electrode are arranged with layer, and voltage with identical to the public electrode on substrate.
5. a kind of array base palte is it is characterised in that described array base palte includes：
Basic unit；
At least first color blocking layer, the second color blocking layer, are arranged side by side in described basic unit side；
Light shield layer, is arranged side by side in described basic unit side together with described at least first color blocking layer, the second color blocking layer；
At least first projection, the second projection, are arranged between described light shield layer and described basic unit, described first projection by described extremely
Each part stacking of two color blocking layers in few first color blocking layer, the second color blocking layer forms, and described second projection is by institute
State the part composition of one of at least first color blocking layer, the second color blocking layer color blocking layer, described first projection is higher than described the
Two projections so that the described light shield layer on described first projection follow raised to form the first spacer, and higher than described the
Described light shield layer on two projections follows raised the second spacer to be formed.
6. array base palte according to claim 5 is it is characterised in that described light shield layer is formed using light shield etching and right
Answer the described light shield zonal ray percent of pass of described light shield layer identical.
7. array base palte according to claim 5 is it is characterised in that described array base palte further includes that tertiary color hinders
Layer, described first projection is formed by each part stacking of described first color blocking layer, the second color blocking layer, and described second projection is
It is made up of a part for described three color blocking layers.
8. array base palte according to claim 7 is it is characterised in that described first color blocking layer, the second color blocking layer are respectively
Red color resistance layer, green color blocking layer, described tertiary color resistance layer is blue color blocking layer.
9. array base palte according to claim 5 it is characterised in that described light shield layer along described first color blocking layer,
The orientation strip of two color blocking layers extends, simultaneously also along the boundary lines between described first color blocking layer, the second color blocking layer
Shape extends；Or
Described light shield layer extends only along the orientation strip of described first color blocking layer, the second color blocking layer, described array base palte
The array common electrical extend including pixel electrode and along the boundary linear between described first color blocking layer, the second color blocking layer
Pole, described array public electrode and described pixel electrode are arranged with layer, and voltage with identical to the public electrode on substrate.
10. a kind of electronic equipment is it is characterised in that include the array base palte as any one of claim 5 to 9.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201611247179.6A CN106483719B (en) | 2016-12-29 | 2016-12-29 | A kind of electronic equipment, array substrate and preparation method thereof |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201611247179.6A CN106483719B (en) | 2016-12-29 | 2016-12-29 | A kind of electronic equipment, array substrate and preparation method thereof |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN106483719A true CN106483719A (en) | 2017-03-08 |
| CN106483719B CN106483719B (en) | 2019-08-02 |
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| CN108535909A (en) * | 2018-04-17 | 2018-09-14 | 深圳市华星光电技术有限公司 | The production method and BPS type array substrates of BPS type array substrates |
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| WO2020155620A1 (en) * | 2019-01-28 | 2020-08-06 | 南京中电熊猫平板显示科技有限公司 | Color film substrate and manufacturing method therefor |
| WO2023207904A1 (en) * | 2022-04-27 | 2023-11-02 | 京东方科技集团股份有限公司 | Display panel and display device |
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