CN110430947A - Use the cleaning method of W/O lotion cleaning solution - Google Patents
Use the cleaning method of W/O lotion cleaning solution Download PDFInfo
- Publication number
- CN110430947A CN110430947A CN201880019153.7A CN201880019153A CN110430947A CN 110430947 A CN110430947 A CN 110430947A CN 201880019153 A CN201880019153 A CN 201880019153A CN 110430947 A CN110430947 A CN 110430947A
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- China
- Prior art keywords
- lotion
- rinsing liquid
- cleaning
- cleaning solution
- water
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Classifications
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B08—CLEANING
- B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
- B08B3/00—Cleaning by methods involving the use or presence of liquid or steam
- B08B3/04—Cleaning involving contact with liquid
- B08B3/08—Cleaning involving contact with liquid the liquid having chemical or dissolving effect
-
- C—CHEMISTRY; METALLURGY
- C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
- C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
- C11D3/00—Other compounding ingredients of detergent compositions covered in group C11D1/00
- C11D3/16—Organic compounds
- C11D3/18—Hydrocarbons
Abstract
It provides: being effectively discharged out the cleaning method using W/O lotion cleaning solution of moisture and water-soluble dirt from potcher.Cleaning method using W/O lotion cleaning solution of the invention is characterised by comprising following process: cleaning process (A), and cleaned material is cleaned with comprising W/O lotion cleaning solution made of hydrocarbon system solvent, surfactant and water；Rinsing process (B) is rinsed by the cleaned material for carrying aforementioned W/O lotion cleaning solution secretly the rinsing liquid formed by aforementioned hydrocarbon system solvent and aforementioned surfactants or by the rinsing liquid that aforementioned hydrocarbon system solvent is formed；Moisture removal process (C), a part of moisture removal is at least gone from aforementioned rinsing liquid；With separation process (D), from the separated isolate of aforementioned rinsing liquid removal after aforementioned moisture removal process (C).
Description
Technical field
The present invention relates to the cleaning method for using W/O lotion cleaning solution, more particularly to: can be attached to automobile, machinery,
In the various industrial circles such as precision instrument, electrical, electronics, optics component to be processed, dirt that polarity is low and polarity it is high
The cleaning method using W/O lotion cleaning solution that the dirt that dirt is combined is cleaned and removed.
Background technique
It is attached with the purposes of the component of Water-soluble processing oil as cleaning, proposes a kind of cleansing composition, with rule
Fixed-ratio includes hydrocarbon system solvent, surfactant and water, and forms lotion (referring to patent document 1 with 2).It include moisture in dirt
The case where or water management in the cleaning system using the cleansing composition comprising moisture in rinse bath and later
In the case that moisture removal in potcher does not carry out suitably, become the reason of generating bad cleaning, ponding.
Existing technical literature
Patent document
Patent document 1: Japanese Unexamined Patent Publication 2010-174106 bulletin
Patent document 2: Japanese Unexamined Patent Publication 2015-40217 bulletin
Summary of the invention
Problems to be solved by the invention
However, being discharged from the cleaning machine in and being deposited as the method for the water-soluble dirt of dirt in these motions
In big problem.
For example, after the rinsing treatment, the standing of the cleaning agent of rinse bath is carried out, by root for the cleaning agent of patent document 1
According to the isolated water layer discharge of specific gravity, so that water-soluble dirt is expelled to outside system.However, in operating from cleaning
Slot is introduced to the moisture of potcher, does not make any consideration, if introduced amount of moisture becomes more, there is the reason of as ponding
Worry.
In addition, distill cleaned cleaning agent in patent document 2, it will be living comprising the surface of water-soluble dirt
Property agent be expelled in the form of bottoms outside system, in the base solvent and water recycled supplement necessary amount surface-active
Agent, and supply to conservation tank.However, in patent document 2, for being introduced to the dirt of potcher, although distillation regeneration can be passed through
And remove, but for introduced moisture, do not make any consideration, introduced moisture is supplied again together with base solvent
To potcher, therefore, if the amount of moisture of potcher becomes more, the reason of as ponding.
The present invention has been made in view of the above problems, it is intended that provide: from potcher be effectively discharged out moisture and
The cleaning method using W/O lotion cleaning solution of water-soluble dirt.
The solution to the problem
In view of the foregoing, various researchs have been repeated in order to solve foregoing problems in the inventors of the present invention, as a result, it has been found that:
The cleaning of the cleaning method and W/O lotion cleaning solution using W/O lotion cleaning solution of ponding is not likely to produce in cleaned material
Device so far completes the present invention.
Cleaning method using W/O lotion cleaning solution of the invention is characterised by comprising following process: cleaning process
(A), cleaned material is cleaned with comprising W/O lotion cleaning solution made of hydrocarbon system solvent, surfactant and water；Fuller
Sequence (B), by the cleaned material of carrying aforementioned W/O lotion cleaning solution secretly with being formed by aforementioned hydrocarbon system solvent and aforementioned surfactants
Rinsing liquid is rinsed by the rinsing liquid that aforementioned hydrocarbon system solvent is formed；Moisture removal process (C), at least from aforementioned rinsing liquid
Go a part of moisture removal；With separation process (D), from the aforementioned rinsing liquid removal after aforementioned moisture removal process (C) through separating
Isolate.
The effect of invention
Such as above-mentioned, cleaning method according to the present invention, moisture and water-soluble dirt can be effectively discharged out from potcher.
Detailed description of the invention
Fig. 1 is the explanatory diagram for showing the major part configuration example of cleaning device involved in embodiments of the present invention 1.
Fig. 2 is the explanatory diagram for showing the major part configuration example of cleaning device involved in embodiments of the present invention 2.
Fig. 3 is the explanatory diagram for showing the major part configuration example of cleaning device involved in embodiments of the present invention 3.
Fig. 4 is the explanatory diagram for showing the major part configuration example of cleaning device involved in embodiments of the present invention 4.
Fig. 5 is the explanatory diagram for showing the major part configuration example of cleaning device involved in embodiments of the present invention 5.
Fig. 6 is the explanatory diagram for showing the major part configuration example of cleaning device involved in embodiments of the present invention 6.
Specific embodiment
Hereinafter, to the preferred embodiment of the cleaning method of the invention using W/O lotion cleaning solution, while referring to attached drawing
It is illustrated, but specific contents do not limit the present invention.
Cleaning method using W/O lotion cleaning solution of the invention is characterised by comprising following process: cleaning process
(A), cleaned material is cleaned with comprising W/O lotion cleaning solution made of hydrocarbon system solvent, surfactant and water；Fuller
Sequence (B), by carry secretly W/O lotion cleaning solution the cleaned material rinsing liquid formed by hydrocarbon system solvent and surfactant or by
The rinsing liquid that hydrocarbon system solvent is formed is rinsed；Moisture removal process (C), a part of moisture removal is at least gone from rinsing liquid；With,
Separation process (D) removes separated isolate from the rinsing liquid after moisture removal process (C).Hereinafter, successively to each process
It is illustrated.
The purpose of cleaning process (A) is, is cleaned with comprising W/O lotion made of hydrocarbon system solvent, surfactant and water
Liquid removes dirt from cleaned materials such as components.It as the gimmick of removal dirt, is not particularly limited, preferably W/O lotion is cleaned
The method that liquid assigns physical force and cleaned.For example, can from ultrasonic irradiation, using blender stirring, utilize pump
It is used alone or combines a variety of and make in the gimmicks such as jet flow, spray, injection, rotation dynamic using component Oscillating, mobile cleaning
With.
In the cleaned material being cleaned in cleaning process (A), Water-soluble processing oil is attached with as dirt.Do not limit especially
It is fixed, as water-soluble dirt, comprising: for assigning the fatty acid metal salts of lubricity, for assigning having for anti-iron rust performance
It was added originally in the processing oils stostes such as machine inorganic inhibitor, water soluble polymer, organic-inorganic alkali, waterborne-type preservation
Ingredient.In addition to this, further includes: calcium component in industrial water used in dilution is dissolved out with processing from cleaned material
Aluminium, magnesium etc. metal ion etc..These water-soluble dirts, which have the feature that, to be not readily dissolved in hydrocarbon system solvent or hydrocarbon system
The mixture of solvent and surfactant is precipitated and insoluble if the amount of moisture of W/O lotion cleaning solution is reduced in cleaning solution
Solution.
W/O lotion cleaning solution used in cleaning process (A) is not particularly limited, and is comprising hydrocarbon system solvent, surface-active
Made of agent and water, water is dispersed in the form of water droplet in the mixture of hydrocarbon system solvent and surfactant.It is straight according to the water droplet
Diameter and transparent or opaque and gonorrhoea appearance.W/O lotion cleaning solution can from if not applying physical force segregator to
Mixing is carried out to select in stabilization person as Natural Emulsification.In addition, antioxidant, preservative can also be compounded as needed
Equal additives.
When the W/Oization of cleaning solution used in cleaning process (A) is unstable, cleaning solution is applied and utilizes ultrasonic oscillation
Ultrasonic irradiation, using blender, homogenizer stirring, using pump liquid recycle, it is lo-tionized so as to carry out W/O.It
Can be used alone or combine a variety of and use, and can have concurrently cleaning needed for physical force.
The hydrocarbon system solvent on the basis used in the present invention as W/O lotion cleaning solution is not particularly limited, can be from carbon
The normal alkane solvent of 8 or more number, cycloalkanes series solvent, is used alone in aromatic system solvent or mixing is more at Isopars
It plants and uses.It is expected that hydrocarbon system solvent used in rinsing process (B) with back segment is general.Furthermore, it is also possible to include alcohol, glycol ethers
Equal organic solvents, as long as there is no problem as long as the range for interfering cleaning.
Surfactant used in the present invention is not particularly limited, can be from nonionic system or anionic system surface-active
It is used alone or combines a variety of in agent and use.The concentration of surfactant is also not particularly limited, and relative to hydrocarbon system solvent, is
It 0.01 mass % or more and 10 mass % or less, is preferably respectively 0.1 mass % more than or lower than 4 mass %.Content is lower than
In the case where 0.01 mass %, it is unable to get sufficient cleaning effect, cleaning effect can not also be expected by containing more than 10 mass %
The improvement of fruit.
It as nonionic surfactants, can enumerate: ester type through ester linkage of polyalcohol and fatty acid, advanced
Alcohol, alkyl phenol etc. are with ether made of the alkylene oxides such as addition in the raw material of hydroxyl ethylene oxide, propylene oxide, epoxy butane
Ester-ether type made of the above-mentioned alkylene oxide of addition in type, the ester formed as polyalcohol and fatty acid, by alkylamine and fatty acid
The fatty acid amine type of formation, the fatty acid ethanol amide type formed by alkyl alcohol amide and fatty acid etc..
As anionic surfactant, the sulfonate types such as petroleum sulfonate, sulfated oil, sulfuric acid can be enumerated
Type etc..
Water used in W/O lotion cleaning solution used in the present invention is not particularly limited, can be used ion exchange water,
Distilled water, tap water etc., even if comprising alcohol, glycol ethers, inorganic salts etc., as long as can also as long as in the range of interfering cleaning
To use.Moisture concentration is also not particularly limited, and is 0.1 mass % or more and 70 mass % or less, excellent relative to hydrocarbon system solvent
Choosing is respectively 1 mass % more than or lower than 20 mass %.In the case that content is lower than 0.1 mass %, it is unable to get to water solubility
Dirt sufficient cleaning effect, more than 70 mass % containing can not also expect the improvement of cleaning effect.
W/O lotion cleaning solution used in cleaning process (A) is usually used, and the safe level of water-soluble dirt is
The W/O lotion cleaning solution of 2g/L or more, further preferred 30g/L or more.When water-soluble waste concentration is lower than 2g/L, cleaning force
It disappears without preferred.
In the present invention, quilt after the water-soluble amount of contaminants and cleaning that cleaned material introduces in cleaning process (A) is preferably remained
The harmony for the water-soluble amount of contaminants that cleaning materials is taken out of from cleaning process (A).In the case that the former with the latter is equivalent, W/O
Water-soluble waste concentration in lotion cleaning solution becomes equilibrium state.
For example following calculating of water-soluble waste concentration under the equilibrium state.
Cconst=Mout÷Vout (1)
Herein
Cconst: the water-soluble dirt equilibrium concentration (g/L) in the W/O lotion cleaning solution of cleaning process (A)
Mout: the water-soluble amount of contaminants (g/hr) from the W/O lotion per unit time that cleaning process (A) is taken out of
Vout: the amount (L/hr) for the W/O lotion cleaning solution per unit time taken out of from cleaning process (A)
Reduction amount caused by the evaporation of W/O lotion cleaning solution in operating is sufficiently small and can ignore, therefore, (1) formula into
One step is indicated with (2) formula.
Cconst≒Min÷Vsupplid (2)
Herein
Min: it is attached to cleaned material and is introduced to the water-soluble amount of contaminants (g/hr) of cleaning process (A)
Vsupplid: it is attached to the W/O lotion cleaning fluid volume (L/ for the amount that cleaned material and supplement are taken out of from cleaning process (A)
hr)
As common numerical value, such as by MinIt is set as 2g/hr, VsupplidWhen being set as 2L/hr, CconstAs 1g/L.The number
The common dirt that value is sufficiently smaller than the water-soluble waste concentration (g/L) of W/O lotion cleaning solution used in the present invention allows
30g/L or so is measured, thus, it can be known that cleaning process (A) can be used only with the supplement of such as cleaning solution.
In the case where being introduced in the mode that water-soluble amount of contaminants becomes safe level or more, carried out in multiple rinse baths
Cleaning process (A) carries out the discarded of a part of W/O lotion cleaning solution from the slot for the safe level for becoming dirt as needed,
Rinse bath overflow in W/O lotion cleaning solution from from the rinse bath of its back segment to leading portion supplements new liquid to the rinse bath of back segment, from
And it can be with each slot without weak point.
The purpose of rinsing process (B) is, the W/O lotion cleaning solution for being attached to cleaned material is formed with by hydrocarbon system solvent
Rinsing liquid or the rinsing liquid that is formed by hydrocarbon system solvent and surfactant replace.Hand as displacement W/O lotion cleaning solution
Method is not particularly limited, it is expected that applying the gimmick of physical force to rinsing liquid.For example, can be from surpassing using ultrasonic oscillation
It is sound wave irradiation, the stirring using blender, the jet flow using pump, spray, injection, dynamic using cleaned material Oscillating, rotation clear
It is used alone or combines a variety of and use in washing etc..
Rinsing process (B) if used in rinsing liquid with W/O lotion cleaning solution dissolve or disperse hydrocarbon system solvent based on
Ingredient and moisture are few.It can be the substance that surfactant is added in hydrocarbon system solvent, or it is living not add surface
The hydrocarbon system solvent of property agent.In the case that the introducing of W/O lotion cleaning solution is more, it is attached to more than the granular dirt of cleaned material
In the case of, it is preferably added with the hydrocarbon system solvent of surfactant, in the case that the introducing of W/O lotion cleaning solution is few, in order to reduce
The slot number of device, it is appropriate that, using the hydrocarbon system solvent without surfactant as rinsing liquid.
Moisture removal process (C) is the process that a part of moisture removal is gone from the rinsing liquid containing W/O lotion cleaning solution.Its
Purpose is, is removed by the moisture that the ingredient of W/O lotion cleaning solution will be used as to introduce from rinsing liquid, to keep W/O lotion clear
Water-soluble dirt contained in washing lotion is precipitated.Moisture removal process (C) preferably makes water in rinsing liquid and removes.As
The gimmick of moisture removal, is not particularly limited, can be used alone from decompression, heating, gas-liquid contact, ultrasonic irradiation etc. or
It combines a variety of and uses.
The purpose of separation process (D) is, separated water-soluble from the rinsing liquid removal after moisture removal process (C)
Dirt.As above-mentioned, water-soluble dirt not readily dissolves the mixture in hydrocarbon system solvent or hydrocarbon system solvent and surfactant, drift
If the amount of moisture in washing lotion is reduced, it is precipitated and does not dissolve in rinsing liquid.In separation process (D), removal is gone by moisture
The water-soluble dirt of separation is precipitated from rinsing liquid except process (C).As the minimizing technology of water-soluble dirt, without spy
It does not limit, as long as based on solid-liquids such as filtering, absorption, UF membrane, gravitational settling, centrifuge separation, the distillation and concentrations for utilizing filter
Concentration and separation, it is economically preferred in particular with the filtering, centrifuge separation or distillation and concentration of filter.At this point, according to
It needs that flocculant, filtration adjuvant etc. also can be used.
As filter, it is not particularly limited, it can be from around yarn filter, non-woven fabrics, sponge even depth filter, metal
It is used alone or combines a variety of in surface filters such as net, filter paper, molecular filter etc. and use.Water-soluble dirt or particle etc. are different
Deep filter in the case that object is more, preferably more than trapping maintenance dose, it is desirable that in the case where filtering accuracy, preferred surface filtration
Device.
It as centrifuge separation, is not particularly limited, can be used alone from decantation type, basket-type, dish-type, whirlwind type etc.
Or it combines a variety of and uses.Wherein, whirlwind type has the feature that structure is simple and does not have movable part, is easy miniaturization, dish-type
With the feature for being easy to get high centrifugal force, easily removing particle.
It as distillation and concentration, is not particularly limited, air-distillation, steam distillation, vacuum distillation etc. can be used,
In, it is suitable that the distillation regenerated liquid of vacuum distillation, which is not easily deteriorated,.
In the present invention, rinsing process (B) and moisture removal process (C) can also be carried out in same slot.But above-mentioned feelings
It under condition, needs to worry in advance, so that separated water-soluble dirt is not again attached to cleaned material.It is carried out in same slot
, it is preferable to use the rinsing formed by hydrocarbon system solvent and surfactant in the case where rinsing process (B) and moisture removal process (C)
Liquid is as rinsing liquid.This is because, rinsing liquid includes surfactant, so that the water-soluble dirt through separation is precipitated is by table
Face activating agent is dispersed, and the attachment again to cleaned material can be prevented.
Alternatively, it is also possible to carry out moisture removal process (C) and separation process (D) in same slot.For example: it is logical
Distillation is crossed, moisture and hydrocarbon system solvent are fractionated, while removing moisture removal, as the water-soluble dirt of kettle base solution or water will be included
The surfactant of insoluble soils removes, and the mixture of surfactant will be added in gained hydrocarbon system solvent or hydrocarbon system solvent
It supplies to the process of potcher.
Then, the cleaning method of the invention using W/O lotion cleaning solution is described in detail referring to figure.Fig. 1~6 are
The explanatory diagram of the major part configuration example of cleaning device involved in embodiments of the present invention 1~6 is shown.
In embodiment 1 shown in FIG. 1, the cleaned material of water-soluble dirt is attached with rinse bath 1, the 1st potcher
2, the 2nd potcher 3, the 3rd potcher 4 and it is dried under reduced pressure being sequentially supplied for slot 5, it is cleaned, dry, become pure cleaned
Object.
Rinse bath 1 is the device for carrying out cleaning process (A) using W/O lotion cleaning solution, 6 quilt of W/O lotion cleaning solution
It is stored in slot.It is impregnated in cleaned material in W/O lotion cleaning solution 6, irradiates ultrasonic wave with ultrasonic oscillation 7, go to remove water
The dirt etc. of dissolubility.
1st potcher 2 is the device for carrying out rinsing process (B), the drift formed by surfactant and hydrocarbon system solvent
Washing lotion 8 is stored in slot.By the cleaning process (A) in rinse bath 1, make the cleaned material for being attached with W/O lotion cleaning solution 6
It is impregnated in rinsing liquid 8, irradiates ultrasonic wave with ultrasonic oscillation 7.By the rinsing process (B), it is attached to cleaned material
W/O lotion cleaning solution 6 is scattered in rinsing liquid 8, and the W/O lotion 6 for being attached to cleaned material is replaced into rinsing liquid 8.
Bubble slot 9 is the device for carrying out moisture removal process (C).It is dispersed with the W/O cream for being introduced to the 1st potcher 2
The rinsing liquid 8 of liquid cleaning solution 6 is transported to bubble slot 9, is bubbled with air or nitrogen gas 10.Compared with hydrocarbon system solvent,
The vapour pressure of water is high, therefore, by being bubbled, moisture as water vapor preferentially by gasification finish to system outside.With W/O lotion
Cleaning solution 6 is introduced into the 1st potcher 2 together and is dissolved in the water-soluble dirt in rinsing liquid 8 due in rinsing liquid 8
The reduction of moisture and can not be dissolved in rinsing liquid 8, in rinsing liquid 8 be precipitated separation.
Filter cell 11 is the device for carrying out separation process (D).The rinsing liquid of moisture has been removed in bubble slot 9
8 by pumping 12 from 9 liquor charging of bubble slot to filter cell 11, and filtering is through being precipitated the water-soluble dirt of separation.Eliminate water
The rinsing liquid 8 of the dirt of dissolubility is back to the 1st potcher 2.
2nd potcher 3 and the 3rd potcher 4 are for removing the table for remaining on the cleaned material surface through rinsing process (B)
The device of face activating agent.In 2nd potcher 3 and the 3rd potcher 4, hydrocarbon system solvent is stored in the form of rinsing liquid 13.Make clear
Washing is impregnated in rinsing liquid 13, irradiates ultrasonic wave with ultrasonic oscillation 7, so that the surface that removal is attached to cleaned material is living
Property agent.
Being dried under reduced pressure slot 5 is for making the gasification of rinsing liquid 13 for remaining on cleaned material surface and dry device.It utilizes
Vacuum pump 14, being dried under reduced pressure in slot 5 becomes decompression, and rinsing liquid 13 gasifies and is removed from cleaned material surface.As needed,
The process for importing the steam of rinsing liquid 13 can be set, before it is dried preheat cleaned material.
Distillation regeneration tank 15 is the surface for removing the rinsing liquid 13 being dissolved in the 2nd potcher 3 and the 3rd potcher 4
The device of activating agent, other dirts.Rinsing liquid 13 comprising dirt is introduced into distillation regeneration tank 15 from the 2nd potcher 3, through adding
It is thermal evaporation to become steam, it is liquefied in cooler 16.The 3rd potcher 4 is supplied to as clear rinsing liquid 13.Separately
Outside, rinsing liquid 13 is from the 3rd potcher 4 to 3 overflow of the 2nd potcher, accordingly it is also possible to inhibit the rinsing liquid 13 in the 2nd potcher 3
Waste concentration rising.
Embodiment 2 shown in Fig. 2 is that the 1st potcher 2 of embodiment 1 shown in FIG. 1 is replaced with decompression potcher
17, filter cell 11 replaces with mode made of whirlwind type whizzer 18.It is attached with the cleaned of water-soluble dirt
Object with rinse bath 1, decompression potcher 17, the 2nd potcher 3, the 3rd potcher 4 and be dried under reduced pressure being sequentially supplied of slot 5, clean,
It dries and becomes pure.
Decompression potcher 17 is the device for carrying out rinsing process (B) and moisture removal process (C).Depressurize potcher 17
In, it is stored with the rinsing liquid 8 formed by surfactant and hydrocarbon system solvent.By the cleaning process (A) in rinse bath 1, make attached
There is the cleaned material of W/O lotion cleaning solution 6 to be impregnated in rinsing liquid 8 after, made to depressurize with vacuum pump 14 in potcher 17 at
In the state of decompression, ultrasonic wave is irradiated with ultrasonic oscillation 7.By the rinsing process (B), it is attached to the W/ of cleaned material
O lotion cleaning solution 6 is replaced into rinsing liquid 8.On the other hand, the hydrocarbon system of moisture introduced in rinsing liquid 8 and composition rinsing liquid 8
Solvent is compared, and vapour pressure is high, therefore, is depressurized by making to depressurize in potcher 17, so that moisture is preferential as water vapor
Outside by gasification finish to system.It is introduced into decompression potcher 17 together with W/O lotion cleaning solution 6 and is dissolved in rinsing liquid 8
Water-soluble dirt due to the moisture in rinsing liquid 8 reduction and can not be dissolved in rinsing liquid 8, be precipitated in rinsing liquid 8
Separation.The effect for the water-soluble dirt surfactant as contained in rinsing liquid 8 being precipitated in rinsing liquid 8 and become dispersion
State, do not generate the attachment again to cleaned material.
In embodiment 2, by using the decompression potcher 17 for having both rinsing process (B) and moisture removal process (C), from
And even if the component with pocket is cleaned material, it is also easy displacement W/O lotion with the rinsing liquid 8 comprising surfactant and cleans
Liquid 6, the advantages of being not likely to produce ponding.
Whirlwind type whizzer 18 is the device for carrying out separation process (D), and the rinsing liquid 8 for eliminating moisture passes through
Pump 12 is by liquor charging to whirlwind type centrifugal separator 18.The water-soluble dirt being precipitated is removed with the whirlwind type whizzer 18
Afterwards, it is back to decompression potcher 17.
Embodiment 3 shown in Fig. 3 be the bubble slot 9 of embodiment 1 shown in FIG. 1 is replaced with decompression dehydration slot 19,
It is dried under reduced pressure the mode that slot 5 replaces with heated-air drying slot 20.The cleaned material of water-soluble dirt is attached with rinse bath the 1, the 1st
Potcher 2, the 2nd potcher 3, the 3rd potcher 4 and heated-air drying slot 20 are sequentially supplied, clean, drying and become pure.
Decompression dehydration slot 19 is the device for carrying out moisture removal process (C).In 1st potcher 2 by surface-active
In the rinsing liquid 8 that agent and hydrocarbon system solvent are formed, it is dispersed with the W/O lotion cleaning solution 6 introduced from rinse bath 1.It is dispersed with W/O lotion
The rinsing liquid 8 of cleaning solution 6 is transported to decompression dehydration slot 19, is depressurized in decompression dehydration slot 19 with vacuum pump 14.It is molten with hydrocarbon system
Agent is compared, and the vapour pressure of water is high, therefore, moisture in rinsing liquid 8 as water vapor preferentially by gasification finish to system outside.
Moisture in rinsing liquid 8 reduces, so that water-soluble dirt can not dissolve, separation is precipitated in rinsing liquid 8.Decompression dehydration slot
Rinsing liquid 8 in 19 as needed, can also promote the gas of moisture using the heating coil 21 for being connected with steam, thermal medium oil etc.
Change.
Heated-air drying slot 20 is for the dry rinsing liquid 13 formed by hydrocarbon system solvent for remaining on cleaned material surface
Rinsing liquid 13 is gasified and is removed from cleaned material surface by carrying out the hot wind of Self-air-heating pressure fan 22 by device.
In embodiment 3 shown in Fig. 3, rinse bath 1, the 1st potcher 2, the 2nd potcher 3, the 3rd potcher 4 and hot air drying
Dry slot 20 is employed under atmospheric pressure, it may be thus possible, for example, to carry out the cleaning for continuously drawing band-like component.
Embodiment 4 shown in Fig. 4 is that the mode of the 1st potcher 2 of embodiment 1 shown in FIG. 1 is omitted.It is attached with
The cleaned material of water-soluble dirt with rinse bath 1, the 2nd potcher 3, the 3rd potcher 4 and be dried under reduced pressure slot 5 sequence it is defeated
It send, clean, dry and become pure.
2nd potcher 3 is the device for carrying out rinsing process (B), is stored with the rinsing liquid 13 formed by hydrocarbon system solvent.
By the cleaning process (A) in rinse bath 1, it is impregnated in the cleaned material for being attached with W/O lotion cleaning solution 6 in rinsing liquid 13
Afterwards, ultrasonic wave is irradiated with ultrasonic oscillation 7.By the rinsing process (B), so that the W/O lotion for being attached to cleaned material is clear
Washing lotion 6 is replaced into rinsing liquid 13.
In cleaning device involved in embodiment 4, by omitting the 1st potcher 2 of Fig. 1, to there is plant bulk change
Small advantage.
In embodiment 5 shown in fig. 5, equipped with carried out in 1 slot W/O lotion cleaning solution 6 and rinsing liquid 13 disengaging,
The cleaning-drying slot 23 being dried under reduced pressure.If the cleaned material for being attached with water-soluble dirt, which is installed in, is cleaned and dried slot 23
It is interior, then W/O lotion cleaning solution 6 is conveyed to slot 23 is cleaned and dried from the tank 24 of storage W/O lotion cleaning solution 6, carries out cleaning process
(A).Rinsing liquid 13 is conveyed to slot 23 is cleaned and dried from the tank 25 for storing the rinsing liquid 13 formed from hydrocarbon system solvent later, is carried out
Rinsing process (B).Then, it is cleaned and dried in slot 23 and is depressurized with vacuum pump 14, cleaned material is dried, and becomes pure.
The W/O lotion cleaning solution 6 for carrying out cleaning process (A) is stored in tank 24, as desired by blender 26
It is stirred.
By valve 27, valve 28, W/O lotion cleaning solution 6 is delivered to and is cleaned and dried slot 23, is cleaned and dried slot 23 from being set to
Washer jet 29 blow W/O lotion cleaning solution 6 to cleaned material, further make cleaned material be impregnated in storage W/O cream
In the state of in liquid cleaning solution 6, it is bubbled W/O lotion cleaning solution 6, to carry out the cleaning of cleaned material.
After cleaning process (A), W/O lotion cleaning solution 6 passes through valve 30, pump 12, valve 31 in tank 24 from slot 23 is cleaned and dried
It is recovered.
For carrying out 13 trend of rinsing liquid of rinsing process (B) formed by hydrocarbon system solvent in tank 25.
By valve 32, valve 28, rinsing liquid 13 is delivered to and is cleaned and dried slot 23, from the cleaning for being set to cleaning-drying slot 23
Nozzle 29 blows rinsing liquid 13 to cleaned material, further the state in the rinsing liquid 13 for making cleaned material be impregnated in storage
Under, it is bubbled rinsing liquid 13, to carry out the rinsing of cleaned material.
Rinsing liquid 13 after rinsing process (B) is returned in tank 25 by valve 30, pump 12, valve 33 from slot 23 is cleaned and dried
It receives.After rinsing process (B), it is cleaned and dried in slot 23 and is depressurized by vacuum pump 14, cleaned material surface will be remained on
13 vaporizing and drying of rinsing liquid.As needed, it also can be set and be cleaned and dried the steam for importing rinsing liquid 13 in slot 23
Process before it is dried preheats cleaned material.
After rinsing process (B), the rinsing liquid 13 in tank 25 is added using the heating coil 21 for being connected with steam, thermal medium oil etc.
Temperature is depressurized with vacuum pump 35, is carried out moisture removal process (C).Compared with hydrocarbon system solvent, the vapour pressure of water is high, therefore, water
Point as water vapor preferentially by gasification finish to system outside.The moisture in rinsing liquid 13 is reduced, thus water-soluble dirt
It can not dissolve, separation is precipitated in a liquid.
Filter cell 11 is the device for carrying out separation process (D), the rinsing that the water-soluble dirt of precipitation is precipitated
Liquid 13 is filtered by pumping 36 by liquor charging to filter cell 11.Moreover, a part of of the rinsing liquid 13 of liquor charging can distill
Concentrated surfactant, water-soluble dirt in regeneration tank 15, and remove to outside system.
In the device of embodiment 5 shown in fig. 5, the conveying of cleaned material tails off, and therefore, conveying system can be made most by having
Small advantage.
Embodiment 6 shown in fig. 6 is to replace with the bubble slot 9 of embodiment 4 shown in Fig. 4 and filter cell 11
Distill the mode of regeneration tank 15, cooler 16, oil-water separation tank 34.The component of water-soluble dirt is attached with rinse bath 1,
2 potchers 3, the 3rd potcher 4 and it is dried under reduced pressure being sequentially supplied, clean, drying and become pure for slot 5.
Distillation regeneration tank 15 is the dress for carrying out the separation process (D) of moisture removal process (C) and water-soluble dirt
It sets, and is also the device for removing the dirt for being dissolved in rinsing liquid 13.Rinsing liquid 13 comprising dirt is from the 2nd potcher 3
By liquor charging to distillation regeneration tank 15.The rinsing liquid 13 that gasification is heated in distillation regeneration tank 15 becomes steam, in cooler 16
It is liquefied, is injected into oil-water separation tank 34.The drift for being heated gasification in distillation regeneration tank 15, being liquefied in cooler 16
Washing lotion 13 is clear.The hydrocarbon system solvent of the composition rinsing liquid 13 distillated in oil-water separation tank 34 becomes supernatant, the moisture of introducing
It is discharged as draining.It distills in regeneration tank 15, the water-soluble dirt for being rinsed the introducing of liquid 13 is concentrated by distillation
In addition to system.
Description of symbols
1 cleaning mortise
2 the 1st potchers
3 the 2nd potchers
4 the 3rd potchers
5 are dried under reduced pressure slot
6 W/O lotion cleaning solutions
7 ultrasonic oscillations
8 rinsing liquids (hydrocarbon system solvent added with surfactant)
9 bubble slots
10 air or nitrogen gas
11 filter cells
12 pumps
13 rinsing liquids (hydrocarbon system solvent)
14 vacuum pumps
15 distillation regeneration tanks
16 coolers
17 decompression potchers
18 whirlwind type whizzers
19 decompression dehydration slots
20 heated-air drying slots
21 heating coils
22 hot wind pressure fan
23 are cleaned and dried slot
24 tanks
25 tanks
26 blenders
27 valves
28 valves
29 washer jets
30 valves
31 valves
32 valves
33 valves
34 oil-water separation tanks
35 vacuum pumps
36 pumps
Claims (5)
1. a kind of cleaning method using W/O lotion cleaning solution, which is characterized in that comprise the following steps:
Cleaning process (A), by cleaned material with comprising W/O lotion cleaning solution made of hydrocarbon system solvent, surfactant and water into
Row cleaning；
Rinsing process (B) lives the cleaned material for carrying the W/O lotion cleaning solution secretly with by the hydrocarbon system solvent and the surface
Property dosage form at rinsing liquid or rinsed by the rinsing liquid that the hydrocarbon system solvent is formed；
Moisture removal process (C), a part of moisture removal is at least gone from the rinsing liquid；With,
Separation process (D) removes separated isolate from the rinsing liquid after the moisture removal process (C).
2. the cleaning method according to claim 1 using W/O lotion cleaning solution, wherein the moisture removal process (C)
It is carried out and making water.
3. the cleaning method according to claim 1 or 2 using W/O lotion cleaning solution, wherein the separation process (D)
It is carried out and filtering, centrifuge separation or distillation and concentration using filter.
4. the cleaning method described in any one of claim 1 to 3 using W/O lotion cleaning solution, wherein the rinsing
Process (B) and the moisture removal process (C) carry out in same slot.
5. the cleaning method according to any one of claims 1 to 4 using W/O lotion cleaning solution, wherein the moisture
Removing step (C) and the separation process (D) carry out in same slot.
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2017-062973 | 2017-03-28 | ||
| JP2017062973A JP6829639B2 (en) | 2017-03-28 | 2017-03-28 | Cleaning method using W / O emulsion cleaning solution |
| PCT/JP2018/010893 WO2018180731A1 (en) | 2017-03-28 | 2018-03-19 | Cleaning method using w/o emulsion cleaning liquid |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN110430947A true CN110430947A (en) | 2019-11-08 |
| CN110430947B CN110430947B (en) | 2022-09-23 |
Family
ID=63675540
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201880019153.7A Active CN110430947B (en) | 2017-03-28 | 2018-03-19 | Cleaning method using W/O emulsion cleaning liquid |
Country Status (3)
| Country | Link |
|---|---|
| JP (1) | JP6829639B2 (en) |
| CN (1) | CN110430947B (en) |
| WO (1) | WO2018180731A1 (en) |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP7056952B2 (en) * | 2019-06-03 | 2022-04-19 | アクア化学株式会社 | Cleaning method |
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| JP6437949B2 (en) * | 2016-04-09 | 2018-12-12 | 株式会社クリンビー | Emulsion cleaning device |
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| JP2006022167A (en) * | 2004-07-06 | 2006-01-26 | Tosoh Corp | Detergent composition and deterging system using the same |
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Also Published As
| Publication number | Publication date |
|---|---|
| JP2018164878A (en) | 2018-10-25 |
| JP6829639B2 (en) | 2021-02-10 |
| CN110430947B (en) | 2022-09-23 |
| WO2018180731A1 (en) | 2018-10-04 |
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