CN110246989A - A kind of production method of Full-color OLED display - Google Patents
A kind of production method of Full-color OLED display Download PDFInfo
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- CN110246989A CN110246989A CN201910376314.4A CN201910376314A CN110246989A CN 110246989 A CN110246989 A CN 110246989A CN 201910376314 A CN201910376314 A CN 201910376314A CN 110246989 A CN110246989 A CN 110246989A
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- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K50/00—Organic light-emitting devices
- H10K50/80—Constructional details
- H10K50/84—Passivation; Containers; Encapsulations
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- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K50/00—Organic light-emitting devices
- H10K50/80—Constructional details
- H10K50/84—Passivation; Containers; Encapsulations
- H10K50/844—Encapsulations
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- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K50/00—Organic light-emitting devices
- H10K50/80—Constructional details
- H10K50/86—Arrangements for improving contrast, e.g. preventing reflection of ambient light
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- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K59/00—Integrated devices, or assemblies of multiple devices, comprising at least one organic light-emitting element covered by group H10K50/00
- H10K59/30—Devices specially adapted for multicolour light emission
- H10K59/32—Stacked devices having two or more layers, each emitting at different wavelengths
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- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K59/00—Integrated devices, or assemblies of multiple devices, comprising at least one organic light-emitting element covered by group H10K50/00
- H10K59/30—Devices specially adapted for multicolour light emission
- H10K59/38—Devices specially adapted for multicolour light emission comprising colour filters or colour changing media [CCM]
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- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K71/00—Manufacture or treatment specially adapted for the organic devices covered by this subclass
Abstract
The present invention provides a kind of production methods of Full-color OLED display, comprising the following steps: successively makes color film layer on the transparent substrate and flatness layer forms color membrane substrates；Water oxygen barrier layer is formed on the color membrane substrates；OLED functional layer is formed on the water oxygen barrier layer；Wherein, the film thickness of the water oxygen barrier layer is determined according to color film layer mask plate TP value and OLED functional layer mask plate TP value.Production method provided by the invention make the film thickness of water oxygen barrier layer to be determined according to color film layer mask plate TP value and OLED functional layer mask plate TP value, determine that color film pattern and OLED function layer pattern caused by the film thickness of water oxygen barrier layer can more preferably be compensated because of mask plate error are mismatched according to color film layer mask plate TP value and OLED functional layer mask plate TP value, so that finally formed coloured silk film pattern and OLED functional layer pattern match, have been effectively ensured display quality.
Description
Technical field
The present invention relates to field of display technology, more particularly to a kind of production method of Full-color OLED display.
Background technique
White light cooperation colorized optical filtering (CF+W) is the important method realizing true color and showing.This kind of Full-color OLED display
Color film layer is first arranged generally on substrate, then OLED functional layer is arranged above it for production method.Its prize film layer need with
The matching of OLED display layer, but color film layer mask plate and OLED functional layer mask plate often have one due to making respectively
Fixed error, so that color film layer mask plate TP value and OLED functional layer mask plate TP value deviation coloured silk that is larger, and then resulting in
Also there is relatively large deviation in film pattern TP value and OLED function layer pattern TP value, TP (total pitch) value be film pattern or
The side length of mask plate, such that color film layer and OLED function layer pattern fitting deviation, reduce display quality.
Summary of the invention
Technical problem to be solved by the invention is to provide a kind of production methods of Full-color OLED display, it can be effective
Solve coloured silk film layer caused by color film layer mask plate TP value and OLED functional layer mask plate TP value deviation and OLED function layer pattern not
The problem of matching.
In order to solve the above technical problems, the present invention provides a kind of production methods of Full-color OLED display, including with
Lower step:
It successively makes color film layer on the transparent substrate and flatness layer forms color membrane substrates；
Water oxygen barrier layer is formed on the color membrane substrates；
OLED functional layer is formed on the water oxygen barrier layer；
Wherein, the film thickness of the water oxygen barrier layer is true according to color film layer mask plate TP value and OLED functional layer mask plate TP value
It is fixed.
As a preferred solution of the present invention, the film thickness of the water oxygen barrier layer is directly proportional to mask plate TP value difference value,
Wherein the mask plate TP value difference value is that OLED functional layer mask plate TP value subtracts the difference that color film layer mask plate TP value obtains.
As a preferred solution of the present invention, the film thickness of the water oxygen barrier layer is configured so that the color membrane substrates are swollen
It is swollen to elongate and the color film pattern TP value after expansion is matched with OLED function layer pattern TP value to be formed.
As a preferred solution of the present invention, the color film pattern TP value after the expansion and OLED function to be formed
The matching of layer pattern TP value is that the difference of the color film pattern TP value and OLED function layer pattern TP value to be formed after expanding is small
In error threshold.
As a preferred solution of the present invention, the material of the water oxygen barrier layer is SiNx or SiOxNy.
As a preferred solution of the present invention, the water oxygen barrier layer using plasma chemical vapour deposition technique system
Make, wherein depositing temperature is 150~230 DEG C.
As a preferred solution of the present invention, the water oxygen barrier layer with a thickness of 1000~10000A.
As a preferred solution of the present invention, water oxygen barrier layer transmitance in 400~700nm wave-length coverage is big
In 80%.
The present invention has the following technical effect that production method provided by the invention makes the film thickness of water oxygen barrier layer be basis
What color film layer mask plate TP value and OLED functional layer mask plate TP value determined, due to the water oxygen barrier layer made on color membrane substrates
Water oxygen barrier require to need to make the big film of consistency, i.e., compression is presented in water oxygen barrier layer, so that color membrane substrates
From edge to it is intermediate, gradually generate and arch upward towards water oxygen barrier layer, i.e. color membrane substrates are at convex bending, then even up again
In the case of color membrane substrates expansion elongate, in this way, water oxygen barrier layer can make the color film layer formed pattern expand become larger, and
Thickness is bigger, the expansion of the pattern of color film layer become larger it is bigger, therefore according to color film layer mask plate TP value and OLED functional layer mask plate
TP value determines color film pattern and OLED function caused by the film thickness of water oxygen barrier layer can more preferably be compensated because of mask plate error
Energy layer pattern mismatches, so that finally formed coloured silk film pattern and OLED functional layer pattern match, have been effectively ensured display matter
Amount.
Detailed description of the invention
In order to illustrate the technical solution of the embodiments of the present invention more clearly, the attached drawing to embodiment is simply situated between below
It continues, it should be apparent that, the accompanying drawings in the following description merely relates to some embodiments of the present invention, rather than limitation of the present invention.
Fig. 1 is a kind of flow diagram of the production method of Full-color OLED display provided by the invention；
Fig. 2 is a kind of arrangement schematic diagram of water oxygen barrier layer provided by the invention.
Specific embodiment
To make the purpose of the present invention, technical solution and advantage are clearer, with reference to the accompanying drawing to embodiment of the present invention
It is described in further detail.Obviously, described embodiment is a part of the embodiments of the present invention, rather than whole implementation
Example.Based on described the embodiment of the present invention, those of ordinary skill in the art are obtained under the premise of being not necessarily to creative work
The every other embodiment obtained, shall fall within the protection scope of the present invention.
As shown in Figure 1, which show a kind of production method of Full-color OLED display provided by the invention, the production method
The following steps are included:
It successively makes color film layer on the transparent substrate and flatness layer forms color membrane substrates；
Water oxygen barrier layer is formed on the color membrane substrates；
OLED functional layer is formed on the water oxygen barrier layer；
Wherein, the film thickness of the water oxygen barrier layer is true according to color film layer mask plate TP value and OLED functional layer mask plate TP value
It is fixed.
Specifically, the production needs of color film layer are formed by using color film layer mask plate, and the production of OLED functional layer needs
It is formed using OLED functional layer mask plate, when color film layer mask plate TP value and OLED functional layer mask plate TP value are there are when difference,
The color film pattern and OLED function layer pattern being correspondingly formed can also have difference, so as to cause pattern mismatch, influence to show
Quality.In production method provided in this embodiment, the film thickness of water oxygen barrier layer is according to color film layer mask plate TP value and OLED function
What ergosphere mask plate TP value determined, as shown in Fig. 2, since the water oxygen barrier for making water oxygen barrier layer 1 on color membrane substrates CF is wanted
Ask and need to make the big film of consistency, i.e., water oxygen barrier layer present compression so that color membrane substrates from edge to centre,
It gradually generates and arches upward towards water oxygen barrier layer, is i.e. color membrane substrates are at convex bending, then carry out the test of TP value or OLED function
When ergosphere makes, under platform suction, color membrane substrates expansion is elongated in the case that substrate is evened up again, in this way, water oxygen obstructs
Layer meeting is so that the pattern expansion of the color film layer formed becomes larger, and thickness is bigger, the pattern of color film layer expand become larger it is bigger, because
This determines that the film thickness of water oxygen barrier layer can be more preferable according to color film layer mask plate TP value and OLED functional layer mask plate TP value
Color film pattern and OLED function layer pattern caused by compensating because of mask plate error mismatch, so that finally formed coloured silk film layer figure
Case and OLED functional layer pattern match, have been effectively ensured display quality.
Further, in the present embodiment, the film thickness of the water oxygen barrier layer is directly proportional to mask plate TP value difference value, wherein
The mask plate TP value difference value is that OLED functional layer mask plate TP value subtracts the difference that color film layer mask plate TP value obtains.Namely
Bigger to the expansion of color membrane substrates in view of water oxygen barrier layer is thicker, the pattern increase of color film layer is bigger, therefore in OLED
Functional layer mask plate TP value subtract difference that color film layer mask plate TP value obtains it is bigger when, the film of bigger water oxygen barrier layer is set
Thickness can preferably realize the pattern of color film layer and the pattern match of OLED functional layer.
Specifically, after the film thickness of the water oxygen barrier layer is configured so that the color membrane substrates expansion is elongated and makes expansion
Color film pattern TP value matched with OLED function layer pattern TP value to be formed.Color film pattern TP value after the expansion with
OLED function layer pattern TP value matching to be formed is the color film pattern TP value and OLED functional layer to be formed after expanding
The difference of pattern TP value is less than error threshold.For example, error threshold can be set as 3um, when color film layer mask plate TP value and
When the difference of OLED functional layer mask plate TP value is greater than 3um, color film pattern TP value and OLED function layer pattern TP value are resulted in
Difference also greater than 3um, cover right poor.Therefore, the film thickness of configuration water oxygen barrier layer can be carried out according to deviation situation, for example,
As water oxygen barrier layer film thickness 4000A, the TP value of the more color film pattern of TP value of OLED function layer pattern is 3 μm big, at this point, by water
Oxygen barrier layer film thickness is configured to 8000A so that color film pattern is elongated about 2 μm so that the TP value of OLED function layer pattern compared with
About 1 μm of the TP value of color film pattern is less than error threshold 3um, and two patterns set is right to improve.For another example water oxygen obstructs tunic
When thick 4000A, the TP value of the more color film pattern of TP value of OLED function layer pattern is 3 μm small, causes pattern to cover right difference, by water
Oxygen barrier layer film thickness is configured to 1500A, so that color film pattern is elongated about 1.5 μm so that only elongating color membrane substrates, in this way
About 1.5 μm of TP value of the more color film pattern of OLED function layer pattern TP value, two patterns set are right preferably.
Specifically, the film thickness of the water oxygen barrier layer is according to color film layer mask plate TP value and OLED functional layer mask plate TP value
Determine both include the deviation situation for determining color film layer mask plate TP value and OLED functional layer mask plate TP value, further includes determining water oxygen
The corresponding situation of barrier layer film thickness and color film pattern swell value；Specifically, can establish is water oxygen barrier layer film thickness and color film
The correspondence database of layer pattern swell value, thus when know the inclined of color film layer mask plate TP value and OLED functional layer mask plate TP value
After difference, the deviation situation of color film pattern TP value and OLED function layer pattern TP value can be determined, then determine water as needed
The thickness of oxygen barrier layer.Such as the TP value difference value of mask plate will lead to OLED function layer pattern TP value and color film pattern TP value
Difference be b, and the OLED function layer pattern TP value that completes and the difference of color film pattern TP value is required to be less than error threshold
Value a then can determine water oxygen barrier layer most in the database by b-a then the swell value of color film pattern is at least b-a
Small film thickness.
More specifically, in the present embodiment, the material of the water oxygen barrier layer is SiNx or SiOxNy.The water oxygen barrier
Layer using plasma chemical vapour deposition technique production, wherein depositing temperature is 150~230 DEG C.The thickness of the water oxygen barrier layer
Degree is 1000~10000A；Water oxygen barrier layer transmitance in 400~700nm wave-length coverage is greater than 80%.
Embodiments of the present invention above described embodiment only expresses, the description thereof is more specific and detailed, but can not
Therefore limitations on the scope of the patent of the present invention are interpreted as, as long as skill obtained in the form of equivalent substitutions or equivalent transformations
Art scheme should all be fallen within the scope and spirit of the invention.
Claims (8)
1. a kind of production method of Full-color OLED display, which comprises the following steps:
It successively makes color film layer on the transparent substrate and flatness layer forms color membrane substrates；
Water oxygen barrier layer is formed on the color membrane substrates；
OLED functional layer is formed on the water oxygen barrier layer；
Wherein, the film thickness of the water oxygen barrier layer is determined according to color film layer mask plate TP value and OLED functional layer mask plate TP value.
2. the production method of Full-color OLED display according to claim 1, which is characterized in that the water oxygen barrier layer
Film thickness is directly proportional to mask plate TP value difference value, wherein the mask plate TP value difference value is that OLED functional layer mask plate TP value subtracts coloured silk
The difference that film layer mask plate TP value obtains.
3. the production method of Full-color OLED display according to claim 1, which is characterized in that the water oxygen barrier layer
Film thickness is configured so that the color membrane substrates expansion is elongated and makes color film pattern TP value and OLED to be formed after expansion
The matching of function layer pattern TP value.
4. the production method of Full-color OLED display according to claim 3, which is characterized in that the color film after the expansion
Layer pattern TP value matched with OLED function layer pattern TP value to be formed Ji Wei expansion after color film pattern TP value with it is to be formed
OLED function layer pattern TP value difference be less than error threshold.
5. the production method of Full-color OLED display according to claim 1, which is characterized in that the water oxygen barrier layer
Material is SiNx or SiOxNy.
6. the production method of Full-color OLED display according to claim 1, which is characterized in that the water oxygen barrier layer is adopted
It is made of plasma chemical vapor deposition, wherein depositing temperature is 150~230 DEG C.
7. the production method of Full-color OLED display according to claim 1, which is characterized in that the water oxygen barrier layer
With a thickness of 1000~10000A.
8. the production method of Full-color OLED display according to claim 1, which is characterized in that the water oxygen barrier layer exists
Transmitance is greater than 80% in 400~700nm wave-length coverage.
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| CN201910376314.4A CN110246989B (en) | 2019-05-07 | 2019-05-07 | Manufacturing method of full-color OLED display |
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| CN201910376314.4A CN110246989B (en) | 2019-05-07 | 2019-05-07 | Manufacturing method of full-color OLED display |
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| CN110246989B CN110246989B (en) | 2021-04-30 |
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| CN110246989B (en) | 2021-04-30 |
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