CN110197784A - A kind of protective device of the vacuum measurement tool of ion beam etching system - Google Patents
A kind of protective device of the vacuum measurement tool of ion beam etching system Download PDFInfo
- Publication number
- CN110197784A CN110197784A CN201910469599.6A CN201910469599A CN110197784A CN 110197784 A CN110197784 A CN 110197784A CN 201910469599 A CN201910469599 A CN 201910469599A CN 110197784 A CN110197784 A CN 110197784A
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- China
- Prior art keywords
- measurement tool
- ion beam
- vacuum measurement
- etching system
- beam etching
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32431—Constructional details of the reactor
- H01J37/32798—Further details of plasma apparatus not provided for in groups H01J37/3244 - H01J37/32788; special provisions for cleaning or maintenance of the apparatus
- H01J37/3288—Maintenance
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
- H01J2237/32—Processing objects by plasma generation
- H01J2237/33—Processing objects by plasma generation characterised by the type of processing
- H01J2237/334—Etching
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- Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Plasma & Fusion (AREA)
- Chemical & Material Sciences (AREA)
- Analytical Chemistry (AREA)
- Drying Of Semiconductors (AREA)
- Hall/Mr Elements (AREA)
Abstract
The invention discloses a kind of protective devices of the vacuum measurement tool of ion beam etching system; the ion beam etching system includes the vacuum measurement tool of reaction cavity and the internal vacuum for measuring reaction cavity; ventilation interface is provided on the reaction chamber body wall, the vacuum measurement tool is connected on ventilation interface；The protective device includes the metallic particles Attraction block filled in ventilation interface, further includes the snap ring that metallic particles Attraction block outer wall is arranged between interface of ventilating；Several ventholes are offered on the snap ring.The present invention has obstructed solid particle and ion beam through ventilation interface and has entered vacuum measurement tool by metallic particles Attraction block and snap ring；It is provided with several ventholes on snap ring, guarantees vacuum measurement tool and reaction cavity ventilation.The adsorbable metallic particles of metallic particles Attraction block of strong magnet material simultaneously, ensure that metallic particles will not be passed through through venthole.The present invention is installed by flange and is fixed, cleaning maintenance easy to disassemble.
Description
Technical field
The invention belongs to semiconductor etching techniques field more particularly to a kind of vacuum measurement tools of ion beam etching system
Protective device.
Background technique
In the manufacturing process of semiconductor devices, etching technics is most frequent in numerous techniques to be used and occur.
As chip key structure from plane turns to 3D structure (such as: the FinFET structure in logical device), advanced deposits
Reservoir structures (such as: the essence that magnetic memory (MRAM) and resistance-variable storing device (ReRAM) these device architectures require etching technics
Exactness, repeatability and processing quality require higher and higher；It is special there are many planting simultaneously in these device manufacturing processes of MRAM
Metal material and metal compound material are needed using etching technics；In addition the quarter generated during plasma etch process
Pattern side wall after erosion byproduct of reaction major part and metal or rich metalliferous film and partial etching technique is not
It is steep to be also required to technique to supplement modification.Find the ion sputtering in ion beam etching of Fresnel to three of the above by Germicidal efficacy
Problem can be extremely improved.
Ion beam etching is to sputter material atom using the ion bombardment material surface with certain energy, from
And reach etching purpose.Ar, Kr or Xe etc inert gas are filled with ion source discharge room and its ionization are made to form plasma,
Then ion is drawn and is accelerated in pencil by grid, the ion beam with certain energy enters operating room, the directive surface of solids
Surface of solids atom is hit, material atom is sputtered, reaches etching purpose, belong to pure physical process.Ion beam etching it is excellent
Point is good directionality, anisotropy, and steepness is high；High resolution can reach 0.01 μm；Do not limited by etachable material (metal and
Compound, inorganic matter and organic matter, insulator and semiconductor)；Ion beam incident angles θ can be changed in etching process to control
Graph outline.Since ion beam etching is to material non-selectivity, those can not or be difficult to be situated between by chemical grinding, electricity and ground
Tribulation can be carried out thinned with thinned material by ion beam.In addition, due to the layer-by-layer stripped atom layer of ion beam energy, institute
With the microanalysis sample capability having, and can be used to carry out Precision Machining.
In ion beam etching system, the intracorporal vacuum state of chamber in etching process needs to monitor at any time, to guarantee to set
Standby and gas path module is in the state of normal work, therefore vacuum measuring device is connected on cavity wall, and sends out in ion beam
It dissipates in etching process, is directly contacted inside vacuum measuring device with inside cavity vacuum, to measure monitoring immediately.Vacuum measurement
The position of device is normally in divergence of ion beam angle, therefore can enter vacuum measurement dress in the transmitting of etching process intermediate ion beam
Inside is set, measuring circuit is destroyed, causes the damages such as vacuum gauge not to be available, improve the frequency of replacement, cost consumption is excessively high.
Summary of the invention
To solve the above problems, the present invention proposes a kind of protective device of the vacuum measurement tool of ion beam etching system,
It prevents that the vacuum measurement tool in installation ion beam etching system is caused to damage in ion beam etching system work process, reduces
The failure rate of the vacuum measurement tool of ion beam etching system.
Technical solution: the present invention proposes a kind of protective device of the vacuum measurement tool of ion beam etching system, it is described from
Beamlet etching system includes the vacuum measurement tool of reaction cavity and the internal vacuum for measuring reaction cavity, the reaction
Ventilation interface is provided on cavity wall, the vacuum measurement tool is connected on ventilation interface；The protective device includes setting
In the gas permeability baffling device of ventilation interface, the gas permeability baffling device barrier solid particle and ion beam enter vacuum survey
Amount tool.
Further, the gas permeability baffling device plug obstructs solid particle in ventilation interface and ion beam passes through；It is described
Several ventholes are provided on gas permeability baffling device；And the gas permeability baffling device includes the metal of strong magnet material
Grain Attraction block.
Further, the gas permeability baffling device further includes setting between metallic particles Attraction block outer wall and ventilation interface
Snap ring；Several ventholes are provided on snap ring.
Further, the removable activity in one end of one end and vacuum measurement tool of the ventilation interface of the reaction cavity connects
It connects.
Further, the snap ring inner sidewall setting is fluted；The outer wall of the metallic particles Attraction block is provided with boss, institute
Boss insertion is stated to be connected in groove；
One end of the ventilation interface of the reaction cavity is flexibly connected with one end of vacuum measurement tool by the way that flange is removable；Institute
It states flange and is provided with step-like sealing surface；The step-like sealing surface includes second of the first table top and protrusion on the first table top
Table top；First table top is located at the inside of the second table top；The outer rim of the snap ring be clamped in two end flanges the first table top it
Between；Gasket is provided between second table top of two end flanges.
Further, the snap ring is rigid, and snap ring is divided into two halves along perpendicular to axial plane in groove.
Further, the flange is edge of a knife flange；Second table top of the flange is edge seal face.
Further, several ventholes are located on metallic particles Attraction block.
Further, the venthole is circular hole or long slot hole.
The utility model has the advantages that the present invention by the metallic particles Attraction block and snap ring of strong magnet material, obstructed solid particle and
Ion beam enters vacuum measurement tool through ventilation interface；It is provided with several ventholes on snap ring, guarantees vacuum measurement tool and anti-
Cavity is answered to ventilate.The adsorbable metallic particles of metallic particles Attraction block of strong magnet material simultaneously ensure that metallic particles will not be through
Venthole passes through.The present invention is installed by flange and is fixed, cleaning maintenance easy to disassemble.
Detailed description of the invention
Fig. 1 is decomposition texture schematic diagram of the invention；
Fig. 2 is cross-sectional view of the invention；
Fig. 3 is the structural schematic diagram of ion beam etching system；
Fig. 4 is the schematic diagram of the first embodiment of snap ring of the invention；
Fig. 5 is the schematic diagram of the second embodiment of snap ring of the invention；
Fig. 6 is the schematic diagram of the 3rd embodiment of snap ring of the invention.
Specific embodiment
Ion beam etching system of the invention is rotatable in reaction cavity 1 as shown in Figure 1, include reaction cavity 1
Etching slide holder 2, the rotatable baffle 4 in reaction cavity 1 and the ion source 6 that can produce ion beam.
Reaction cavity 1 is the hollow cavity of irregular shape, and one side is provided with the outer sleeve 8 of prominent cavity, outer sleeve 8
Inside installation ion source 6, the divergent ion beam into reaction cavity 1 of ion source 6.Wafer 3 to be processed is placed in etching slide holder 2
On, the ion beam dissipated by ion source 6 performs etching wafer 3.Baffle 4 is located inside reaction cavity 1, can be in driving device 5
As adjusted position under the action of motor or cylinder.Before wafer 3 on etching slide holder 2 not yet reaches setting position, baffle 4 hinders
It is interposed between ion source 6 and etching slide holder 2, etching slide holder 2 and wafer 3 is protected, prevent them by ion beam
Damage to influencing final product quality；After etching the arrival setting position of wafer 3 on slide holder 2, the position of regulating fender 4 makes
It is moved to ion source 6 and etches the position except slide holder 2.
In ion beam etching system, the intracorporal vacuum state of chamber needs to monitor at any time, offers on 1 wall of reaction cavity logical
Gas interface 10 is connected with vacuum measurement tool 50 on interface 10 of ventilating, and in divergence of ion beam etching process, vacuum measurement work
50 inside of tool is directly contacted with 1 inside of reaction cavity, to measure monitoring immediately.
It is located in the spacious angular region of divergence of ion beam due to vacuum measurement tool 50, the ion beam emittance that ion source 6 emits
It can enter inside vacuum measurement tool 50, destroy measuring circuit.Ion beam bombardment is to 4 surface of baffle, the material of baffle 4 simultaneously
It is sputtered out, the material granule sputtered out can also enter the inside of vacuum measurement tool 50, cause internal blocking；Baffle
4 materials are usually conductive metal material, and the entrance of metallic particles will cause 50 internal short circuits of vacuum measurement tool, and damage is true
Empty measuring tool 50.
Such as Fig. 2, the protective device of the present embodiment is the gas permeability baffling device filled in ventilation interface 10.
The gas permeability baffling device includes the metallic particles Attraction block 201 of strong magnet material, the metal of the present embodiment
Grain Attraction block 201 be it is cylindric, fill in ventilation interface 10 circular hole in, further include be arranged in 201 outer wall of metallic particles Attraction block
The snap ring 200 of insulating materials between ventilation interface 10；In order to guarantee that vacuum measurement tool 50 and reaction cavity 1 are ventilated, card
Several ventholes are provided on ring 200.By metallic particles Attraction block 201 and snap ring 200, metallic particles and ion beam have been obstructed
Enter vacuum measurement tool 50, while the adsorbable metal of metallic particles Attraction block 201 of strong magnet material through ventilation interface 10
Grain, ensure that metallic particles will not be passed through through venthole.
Such as Fig. 3, clears up and repair for gas permeability baffling device easy disassembly, one end of the ventilation interface of the reaction cavity
It is flexibly connected with one end of vacuum measurement tool by the way that flange is removable.The flange is provided with step-like sealing surface；Described
Scalariform sealing surface includes the first table top 13 of the first table top 12 and protrusion on the first table top 12；First table top 12 is located at the
The inside of one table top 13.The flange is preferably the edge of a knife flange of standard component；First table top 13 of the flange is that the edge of a knife is close
Cover.
It is provided with gasket 11 between first table top 13 of two end flanges, prevents flange connections from communicating with the outside world, is sealed
Pad 11 is preferably copper material.
The outer rim of the snap ring 200 is clamped between the first table top 12 of two end flanges.200 inner sidewall of the snap ring setting
Fluted, the outer wall of the metallic particles Attraction block 201 is provided with boss, and the boss insertion is connected in groove.Metal
Grain Attraction block 201 and snap ring 200 are fixed in ventilation interface 10 by above structure.
Several ventholes are arranged in part of the snap ring 200 between the first table top 12 and boss, ensure that vacuum
Measuring tool 50 and reaction cavity 1 are ventilated.
In order to facilitate snap ring 200 from the dismounting of metallic particles Attraction block 201, snap ring 200 is in groove along perpendicular to axial direction
Plane be divided into two halves.The snap ring 200 of the present embodiment is rigid simultaneously, and seperated snap ring 200 can be by the folder of flange
Metallic particles Attraction block 201 is acted under tight active force, metallic particles Attraction block 201 is clamped.
The present invention is also designed to columned metallic particles Attraction block 201 and directly connects with ventilation 10 inner wall of interface,
It is not required to setting snap ring 200, and venthole is provided on metallic particles Attraction block 201.But the processing punched on strong magnet
Higher cost.
As shown in Figures 4 to 6, the venthole can be circular hole or long slot hole, and long slot hole can radially or be circumferentially arranged.
Under the premise of can guarantee measurement of vacuum accuracy, the fewer number of air hole the better, and size is the smaller the better.
Claims (9)
1. a kind of protective device of the vacuum measurement tool of ion beam etching system, the ion beam etching system includes reaction chamber
The vacuum measurement tool of body and the internal vacuum for measuring reaction cavity is provided with ventilation on the reaction chamber body wall and connects
Mouthful, the vacuum measurement tool is connected on ventilation interface, it is characterised in that: the protective device includes setting in ventilation interface
The gas permeability baffling device at place, the gas permeability baffling device barrier solid particle and ion beam enter vacuum measurement tool.
2. the protective device of the vacuum measurement tool of ion beam etching system according to claim 1, it is characterised in that: institute
Gas permeability baffling device plug barrier solid particle and ion beam in ventilation interface is stated to pass through；It is set on the gas permeability baffling device
It is equipped with several ventholes；And the gas permeability baffling device includes the metallic particles Attraction block of strong magnet material.
3. the protective device of the vacuum measurement tool of ion beam etching system according to claim 2, it is characterised in that: institute
Stating gas permeability baffling device further includes the snap ring that metallic particles Attraction block outer wall is arranged between interface of ventilating；It is described several logical
Stomata is provided on snap ring.
4. the protective device of the vacuum measurement tool of ion beam etching system according to claim 3, it is characterised in that: institute
State one end of the ventilation interface of reaction cavity with one end of vacuum measurement tool is removable is flexibly connected.
5. the protective device of the vacuum measurement tool of ion beam etching system according to claim 4, it is characterised in that: institute
It is fluted to state the setting of snap ring inner sidewall；The outer wall of the metallic particles Attraction block is provided with boss, and the boss insertion is connected to
In groove；
One end of the ventilation interface of the reaction cavity is flexibly connected with one end of vacuum measurement tool by the way that flange is removable；Institute
It states flange and is provided with step-like sealing surface；The step-like sealing surface includes second of the first table top and protrusion on the first table top
Table top；First table top is located at the inside of the second table top；Gasket is provided between second table top of two end flanges；The card
The outer rim of ring is clamped between the first table top of two end flanges, several ventholes be arranged in snap ring be located at the first table top with it is convex
Part between platform.
6. the protective device of the vacuum measurement tool of ion beam etching system according to claim 5, it is characterised in that: institute
Stating snap ring is rigid, and snap ring is divided into two halves along perpendicular to axial plane in groove.
7. the protective device of the vacuum measurement tool of ion beam etching system according to claim 5, it is characterised in that: institute
Stating flange is edge of a knife flange；Second table top of the flange is edge seal face.
8. the protective device of the vacuum measurement tool of ion beam etching system according to claim 2, it is characterised in that: institute
Several ventholes are stated to be located on metallic particles Attraction block.
9. according to the protective device of the vacuum measurement tool of ion beam etching system described in claim 2-8 any one,
Be characterized in that: the venthole is circular hole or long slot hole.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201910469599.6A CN110197784B (en) | 2019-05-31 | 2019-05-31 | Protection device of vacuum measuring tool of ion beam etching system |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201910469599.6A CN110197784B (en) | 2019-05-31 | 2019-05-31 | Protection device of vacuum measuring tool of ion beam etching system |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN110197784A true CN110197784A (en) | 2019-09-03 |
| CN110197784B CN110197784B (en) | 2021-07-27 |
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Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201910469599.6A Active CN110197784B (en) | 2019-05-31 | 2019-05-31 | Protection device of vacuum measuring tool of ion beam etching system |
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| Country | Link |
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| CN (1) | CN110197784B (en) |
Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS60225039A (en) * | 1984-04-23 | 1985-11-09 | Toshiba Corp | Vacuum degree detection apparatus of vacuum breaker |
| CN101313204A (en) * | 2005-11-25 | 2008-11-26 | 英飞康有限责任公司 | Diaphragm arrangement for a vacuum measurement cell |
| CN203964978U (en) * | 2014-06-25 | 2014-11-26 | 游庆 | A kind of flowmeter of carry magnet filtration unit |
| CN205079816U (en) * | 2015-10-26 | 2016-03-09 | 重庆通耐仪表科技有限公司 | Filter sealed water gauge |
-
2019
- 2019-05-31 CN CN201910469599.6A patent/CN110197784B/en active Active
Patent Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS60225039A (en) * | 1984-04-23 | 1985-11-09 | Toshiba Corp | Vacuum degree detection apparatus of vacuum breaker |
| CN101313204A (en) * | 2005-11-25 | 2008-11-26 | 英飞康有限责任公司 | Diaphragm arrangement for a vacuum measurement cell |
| CN203964978U (en) * | 2014-06-25 | 2014-11-26 | 游庆 | A kind of flowmeter of carry magnet filtration unit |
| CN205079816U (en) * | 2015-10-26 | 2016-03-09 | 重庆通耐仪表科技有限公司 | Filter sealed water gauge |
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| Publication number | Publication date |
|---|---|
| CN110197784B (en) | 2021-07-27 |
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Address after: 221300 No.8, Liaohe West Road, Pizhou Economic Development Zone, Xuzhou City, Jiangsu Province Patentee after: Jiangsu Luwen Instrument Co.,Ltd. Address before: 221300 No.8, Liaohe West Road, Pizhou Economic Development Zone, Xuzhou City, Jiangsu Province Patentee before: JIANGSU LEUVEN INSTRUMMENTS Co.,Ltd. |