CN110168135A - Hard coat system and for continuous takeup type technique manufacture hard coat system method - Google Patents

Hard coat system and for continuous takeup type technique manufacture hard coat system method Download PDF

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Publication number
CN110168135A
CN110168135A CN201780082884.1A CN201780082884A CN110168135A CN 110168135 A CN110168135 A CN 110168135A CN 201780082884 A CN201780082884 A CN 201780082884A CN 110168135 A CN110168135 A CN 110168135A
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China
Prior art keywords
layer
adhesion promoting
hard coat
base board
flexible base
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CN201780082884.1A
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CN110168135B (en
Inventor
尼尔·莫里森
乔斯·曼纽尔·迭格斯-坎波
海克·兰特格雷夫
斯蒂芬·海因
托比亚斯·斯托利
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Applied Materials Inc
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Applied Materials Inc
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    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/54—Apparatus specially adapted for continuous coating
    • C23C16/545—Apparatus specially adapted for continuous coating for coating elongated substrates
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/02—Pretreatment of the material to be coated
    • C23C16/0272—Deposition of sub-layers, e.g. to promote the adhesion of the main coating
    • C23C16/029—Graded interfaces
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
    • C23C16/30—Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
    • C23C16/32—Carbides
    • C23C16/325—Silicon carbide
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
    • C23C16/30—Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
    • C23C16/40—Oxides
    • C23C16/401—Oxides containing silicon
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C28/00—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D
    • C23C28/04—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D only coatings of inorganic non-metallic material
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C28/00—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D
    • C23C28/04—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D only coatings of inorganic non-metallic material
    • C23C28/042—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D only coatings of inorganic non-metallic material including a refractory ceramic layer, e.g. refractory metal oxides, ZrO2, rare earth oxides
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C28/00—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D
    • C23C28/04—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D only coatings of inorganic non-metallic material
    • C23C28/048—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D only coatings of inorganic non-metallic material with layers graded in composition or physical properties
    • G—PHYSICS
    • G06—COMPUTING; CALCULATING OR COUNTING
    • G06F—ELECTRIC DIGITAL DATA PROCESSING
    • G06F3/00—Input arrangements for transferring data to be processed into a form capable of being handled by the computer; Output arrangements for transferring data from processing unit to output unit, e.g. interface arrangements
    • G06F3/01—Input arrangements or combined input and output arrangements for interaction between user and computer
    • G06F3/03—Arrangements for converting the position or the displacement of a member into a coded form
    • G06F3/041—Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means
    • G—PHYSICS
    • G06—COMPUTING; CALCULATING OR COUNTING
    • G06F—ELECTRIC DIGITAL DATA PROCESSING
    • G06F2203/00—Indexing scheme relating to G06F3/00 - G06F3/048
    • G06F2203/041—Indexing scheme relating to G06F3/041 - G06F3/045
    • G06F2203/04103—Manufacturing, i.e. details related to manufacturing processes specially suited for touch sensitive devices

Abstract

It describes a kind of suitable for the hard coat system used in touch-screen panel (100).Hard coat system (100) includes flexible base board (101) and the layer stacking material (110) being set on flexible base board (101).Layer stacking material (110) includes that adhesion promoting layer (111) and inorganic hard painting top layer (113), adhesion promoting layer are set on flexible base board (101).Adhesion promoting layer (111) is configured to the surface with covalently bonded together in flexible base board, and wherein engineering properties of the adhesion promoting layer (111) at the interface (102) with flexible base board (101) is suitable for the engineering properties of flexible base board (101).

Description

Hard coat system and for continuous takeup type technique manufacture hard coat system Method
Technical field
Multiple embodiments of present disclosure be related to it is a variety of be suitable for the hard coat system used in electrooptical device and A variety of methods that this kind of hard coat system is manufactured with continuous takeup type (roll-to-roll) technique.In particular, present disclosure Multiple embodiments be related to including a variety of hard coat systems for being deposited on the stacking material of multilayer on flexible base board.It is more specific next It says, multiple embodiments of present disclosure are related to a variety of hard conating systems manufactured by continuous take-up type vacuum depositing operation System.
Background technique
In encapsulation industry, semiconductor industry and other industries, the processing to flexible base board such as plastic foil or foil is that have Height requirement.Processing can be flexible by being coated with desired material such as metal especially aluminium, semiconductor and dielectric substance Substrate, etching and other processing behaviors carried out on substrate are applied to be formed in order to desired.Execute this task is System typically comprises processing drum, such as cylindrical roller.Processing drum is couple to processing system for transmitting substrate, and substrate is extremely Few a part is upper processed in processing drum.Therefore, takeup type (R2R) coating system can provide high yield system.
A kind of technique, such as physical vapour deposition (PVD) (physical vapor deposition, PVD) technique, chemical vapor deposition Product (chemical vapor deposition, CVD) technique and plasma enhanced vapor deposition (plasma enhanced Chemical vapor deposition, PECVD) technique, it is typically capable of that flexible base board can be applied to for depositing Thin metal layer.In particular, takeup type depositing system is just being undergone in display industry and photovoltaic (photovoltaic, PV) industry Demand strongly increases.
The example of the product made of coated flexible base board is that touch panel or Organic Light Emitting Diode (OLED) are aobvious Show device.Compared to liquid crystal display (LCD), since touch panel or Organic Light Emitting Diode (OLED) display respond faster Time, bigger visual angle, higher contrast, lighter weight, lower power and the adaptability to flexible base board (amenability), it is significantly paid close attention in a display application recently.
So for many years, electrooptical device such as display device or touch panel have been developing progressively multilayer system, wherein different Layer have the function of it is different.However, the quality of traditional multilayer system still needs to improve, such as resistance to scraping (scratch Resistance it) still needs to improve.
In view of afore-mentioned, exist provide overcome at least partly the problems of the prior art suitable for electrooptical device The demand of the hard coat system that uses and the method for manufacturing these hard coat systems.
Summary of the invention
In view of the foregoing, it provides according to the hard coat system of independent claims and for manufacturing hard coat system Method.The other aspect of present disclosure, advantage and feature from claim, the description and the appended drawings and it is bright and clear.
According to the one side of present disclosure, provide a kind of suitable for the hard conating system used in touch-screen panel System.Hard coat system includes the layer stacking material of flexible base board and setting on flexible substrates.Layer stacking material includes adhesion promoting layer And inorganic hard painting top layer, adhesion promoting layer are set on flexible base board.Adhesion promoting layer is configured to covalently bonded together in flexibility The surface of substrate, wherein engineering properties of the adhesion promoting layer in the interface with flexible base board is suitable for the mechanicalness of flexible base board Matter.
According to another aspect of the present disclosure, it provides a kind of suitable for the hard conating system used in touch-screen panel System.Hard coat system includes flexible base board, selected from by polycarbonate (polycarbonate), polyethylene terephthalate (polyethylene terephthalate), polymethyl methacrylate (poly (methacrylic acid methyl Ester)), Triafol T (triacetyl cellulose), cyclic olefin polymer (cyclo olefin polymer), Group composed by poly- (ethylene terephthalate) (poly (ethylene naphthalate)).Further, hard coat system packet The layer stacking material of setting on flexible substrates is included, wherein layer stacking material includes adhesion promoting layer and inorganic hard painting top layer, and adherency promotees It is set on flexible base board into layer.Adhesion promoting layer is configured to the surface with covalently bonded together in flexible base board, wherein adherency promotees Into hardness be configured to, to be incrementally increased from flexible base board to inorganic hard painting top layer.Inorganic hard painting top layer has from 2H to 9H Pencil hardness.Adhesion promoting layer and inorganic hard painting top layer are by using one and the takeup type PECVD work of identical predecessor Skill deposition.
According to the another aspect of present disclosure, a kind of electrooptical device is provided, the electrooptical device has according in this institute State the hard coat system of any embodiment.
According to the another aspect of present disclosure, provide a kind of for continuous takeup type technique manufacture hard coat system Method.This method is included in do not destroy vacuum in the case where, provide flexible base board at least one first processing region and at least One second processing region；In at least one first processing region, deposit adhesion promotes layer on flexible substrates；And extremely Inorganic hard painting top layer is deposited in a few second processing region, wherein deposit adhesion promotes layer to be included in flexible base board and adherency rush Into forming covalent bond between layer.Further, it includes that the engineering properties of adhesion promoting layer is made to be suitable for flexibility that deposit adhesion, which promotes layer, The engineering properties of substrate.
Multiple embodiments are also related to the equipment for executing disclosed method, and including each described for executing Environment division in terms of method.In terms of these methods can by hardware component, with the computer of appropriate software programming, both appoint Meaning combination executes in any other manner.Further, also it is related to according to multiple embodiments of present disclosure for operating The method of the equipment.These methods for operating the equipment include for executing the multiple of each function of the equipment In terms of method.
Detailed description of the invention
In order to understand present disclosure features described above details, can refer to multiple embodiments, obtain for letter The disclosure more detailed description being summarized in.Attached drawing is related to multiple embodiments of present disclosure and is described as follows:
Fig. 1 and 2 shows the schematic diagram of the hard coat system according to embodiment described herein；
Fig. 3 shows the schematic diagram of the hard coat system according to other embodiments described herein；
Fig. 4 to 6 shows the schematic diagram of the hard coat system according to another embodiment described herein；
Fig. 7 shows the schematic diagram of the processing system for manufacturing hard coat system according to embodiment described herein；
Fig. 8 shows the schematic diagram of the electrooptical device with hard coat system according to embodiment described herein；And
Fig. 9 shows diagram according to embodiment described herein for continuous takeup type technique manufacture hard coat system The flow chart of method.
Specific embodiment
Various embodiments will be described in detail now, one or more examples of these embodiments are illustrated in respectively In figure.Each example is provided in a manner of explaining, rather than is meaned as limitation.For example, as embodiment The feature that a part is shown or describes can be used for or combine any other embodiments, to generate a further embodiment. This means that present disclosure includes this kind of modifications and variations.
In the description below for attached drawing, identical reference marker indicates same or similar component.In general, only The difference of individual embodiments is described.Unless otherwise clearly indicating, otherwise for the portion in an embodiment Divide or the description of aspect is also applicable to corresponding part or aspect in another embodiment.
Before the various embodiments of present disclosure are more fully described, first explain about some arts as used herein Certain situations of language and expression.
In this disclosure, " hard coat system " is interpreted as the stacking material of multilayer, in the stacking material of the multilayer, until Few top includes hard conating.In particular, " hard coat system " is it will be appreciated that be the stacking for including the inorganic hard multilayer for applying top layer Object.More particularly, hard conating, which may be characterized as the hard conating, has at least pencil hardness of 2H.For this point, it will be appreciated that, The hardness for the layer that the resistance of coating namely has been coated with can determine that for the grade of most hard pencil, the grade of the most hard pencil is not It can for good and all leave marks when being firmly pressed against the layer having been coated with 45 degree of angle.In general, pencil utilizes 7.5N Force and be butted on the surface of test.Pencil hardness test also is known as " Wolff-Wilborn test ".
In this disclosure, " layer stacking material " is interpreted as the stacking material of multilayer, and the stacking material of the multilayer has at least Two layers of different materials composition.In particular, the stacking material of multilayer described herein can be transparent.Term used herein " transparent " can include especially the structure with the ability of transmitted light in a manner of relatively low scattering, so that for example therefrom transmiting By light can substantially be seen in a clear manner.
In this disclosure, it is flexible that " flexible base board ", which may be characterized as substrate,.For example, flexible base board can be Foil.In particular, it will be appreciated that flexible base board described herein can be handled in continuous takeup type technique described herein, example Such as handled in takeup type processing system described herein.In particular, flexible base board described herein is suitable in flexible base board Upper manufacture coating or electronic device.In particular, flexible base board described herein can be transparent, such as flexible base board can be by saturating Bright polymer material is made.More particularly, flexible base board described herein may include as the material following material: poly- to benzene Dioctyl phthalate second diester (polyethylene terephthalate, PET), polycarbonate (polycarbonate, PC), poly- second Alkene (polyethylene, PE), polyimides (polyimide, PI), polyurethane (polyurethane, PU), polymethyl Sour methyl esters (poly (methacrylic acid methyl ester)), Triafol T (triacetyl Cellulose), Triafol T (cellulose triacetate, TAC), cyclic olefin polymer (cyclo olefin Polymer), polyethylene terephthalate (poly (ethylene naphthalate)), one or more metals, paper, they Combination and the substrate that has been applied as following material: firmly coating PET (HC-PET) or be coated with firmly TAC (HC-TAC) and Analog.
In this disclosure, " adhesion promoting layer " is interpreted as the layer being set between two structures, for example, substrate and Layer between layer or the layer between two layers, and adhesion promoting layer is configured to promote the adherency between two structures.Citing For, adhesion promoting layer APL can be configured to, with covalently bonded together in two structures at least one, adhesion promoting layer is set It is placed between two structures.Therefore, adhesion promoting layer APL can be configured to, with covalently bonded together in flexibility described herein Substrate and/or covalently bonded are together in the succeeding layer being deposited on adhesion promoting layer APL.Further, the mechanicalness of adhesion promoting layer Matter can be suitable for the engineering properties of flexible base board described herein.For example, adhesion promoting layer APL's is flexible for example elastic Modulus can be suitable for the engineering properties of flexible base board.Therefore, because adhesion promoting layer APL can follow the deformation of flexible base board, Thus the adherency of adhesion promoting layer APL to substrate can improve.
In this disclosure, " painting top layer firmly " is interpreted as the top of the stacking material of multilayer.In particular, applying top layer firmly It may be characterized as applying top layer firmly at least pencil hardness of 2H.
Fig. 1 shows the schematic diagram of the hard coat system according to embodiment described herein.According to can with it is described herein any Multiple embodiments that other embodiments combine, hard coat system touch-screen panel suitable for using.In particular, hard Coat system includes flexible base board 101 and the layer stacking material 110 being set on flexible base board 101.For example, flexible base board 101 may include polymer material, selected from by polycarbonate (polycarbonate), polyethylene terephthalate (polyethylene terephthalate), polymethyl methacrylate (poly (methacrylic acid methyl Ester)), Triafol T (triacetyl cellulose), cyclic olefin polymer (cyclo olefin polymer) And group composed by poly- (ethylene terephthalate) (poly (ethylene naphthalate)).It is exemplary shown as shown in figure 1, Layer stacking material 110 includes adhesion promoting layer 111 and inorganic hard painting top layer 113, and adhesion promoting layer 111 is set to flexible base board 101 On.Adhesion promoting layer 111 is configured to the surface with covalently bonded together in flexible base board.Further, on the boundary with flexible base board 101 The engineering properties of adhesion promoting layer 111 is suitable for the engineering properties of flexible base board 101 at face 102.For example, adhesion promoting layer The flexible such as modulus of elasticity of APL is applicable to the engineering properties of flexible base board.
Therefore, multiple embodiments described herein provide the hard coat system of improvement.In particular, hard compared to traditional Coat system, hard coat system described herein have the structural stability and integrality (integrity) of improvement.Therefore, lead to Multiple embodiments that hard coat system as described herein is used in electrooptical device such as display device or touch panel are crossed, Structural stability and resistance to scraping can be improved, so that the durability of product of the improvement of electrooptical device can be realized.
It is exemplary referring to Fig. 2, according to can be with multiple embodiments any other embodiment described herein ins conjunction with, adherency Promote layer 111 that there can be 100nm≤TAPLThe thickness T of≤800nmAPL。
For example, the thickness T of adhesion promoting layer 111APLIt can be selected from the range with lower limit and the upper limit.Lower limit is 100nm, especially 200nm, more particularly 300nm, and the upper limit is 600nm, especially 700nm, more particularly 800nm.Therefore, There is thickness T described herein by providingAPLAdhesion promoting layer hardness layer system, entire hard coat system stability can Improvement.
Further, exemplary referring to Fig. 2, according to can be with multiple embodiment party in conjunction with any other embodiment described herein Formula, the inorganic hard thickness T for applying top layer 113HTLIt can be 100nm≤THTL≤1μm.For example, the inorganic hard thickness for applying top layer THTLIt can be selected from the range with lower limit and the upper limit.Lower limit is 100nm, especially 200nm, more particularly 300nm, and the upper limit is 600nm, especially 800nm, more particularly 1 μm.Therefore, there is thickness T described herein by providingHTLInorganic hard painting top The hard coat system of layer, entire hard coat system stability can improve, and especially resistance to scraping can be improved.
According to can include with multiple embodiments in conjunction with any other embodiment described herein, adhesion promoting layer 111 Silicon oxide carbide SiOxCy.In particular, adhesion promoting layer 111 can be by silicon oxide carbide SiOxCyComposition.Therefore, by using have The adhesion promoting layer of material component described in this, adhesion promoting layer are configured to covalently bonded together in flexible base board described herein Surface, this be conducive to improve hard coat system structural stability.
According to can be wrapped with multiple embodiments in conjunction with any other embodiment described herein, inorganic hard painting top layer 113 Include silicon oxide siox.In particular, inorganic hard painting top layer 113 can be by silicon oxide sioxComposition.Alternatively, inorganic hard painting top layer 113 may include silicon carbide SiC, and especially inorganic hard painting top layer 113 can be made of silicon carbide SiC.
According to can with multiple embodiments in conjunction with any other embodiment described herein, inorganic hard painting top layer have from The pencil hardness of 2H to 9H.For example, the inorganic hard pencil hardness for applying top layer can for 2H, 3H, 4H, 5H, 6H, 7H, 8H or 9H.The inorganic hard pencil hardness for applying top layer is able to use pencil hardness test measurement, and pencil hardness test also is known as Wolff- Wilborn test.In particular, the hardness for applying top layer firmly can determine that for the grade of most hard pencil, the grade of the most hard pencil is not It can for good and all leave marks when being firmly pressed against hard painting top layer with 45 degree of angle applying top layer firmly.In general, pencil It is butted on using forcing for 7.5N by the surface of test, such as the inorganic hard surface for applying top layer.
It is exemplary referring to Figure 4 and 5, according to can with multiple embodiments in conjunction with any other embodiment described herein, Layer stacking material 110 can further comprise being set to adhesion promoting layer 111 and the inorganic hard anti-reflecting layer stacking applied between top layer 113 Object 120.For example, as shown in exemplary in Fig. 4, anti-reflecting layer stacking material 120 may include being set on adhesion promoting layer 111 SiOxFirst layer 121, the NbO that is set on first layer 121xThe second layer 122 and the SiO that is set on the second layer 122x Third layer 123.Further, as shown in exemplary in Fig. 5, anti-reflecting layer stacking material 120 may include being set in third layer 123 The 4th layer 124 of ITO (tin indium oxide, inidium tin oxide).
For example, first layer 121 can have 5nm≤T1The thickness T of≤10nm1.For example, the thickness of first layer 121 T1It can be selected from the range with lower limit and the upper limit.Lower limit is 5nm, especially 6nm, more particularly 7nm, and the upper limit is 8nm, special It is not 9nm, more particularly 10nm.
The second layer 122 can have 5nm≤T2The thickness T of≤10nm2.For example, the thickness T of the second layer 1222It can select From the range with lower limit and the upper limit.Lower limit is 5nm, especially 6nm, more particularly 7nm, and the upper limit be 8nm, especially 9nm, More particularly 10nm.
Third layer 123 can have 40nm≤T2The thickness T of≤80nm3.For example, the thickness T of third layer 1233It can select From the range with lower limit and the upper limit.Lower limit is 40nm, especially 45nm, more particularly 50nm, and the upper limit is 60nm, especially 70nm, more particularly 80nm.
There can be 20nm≤T for 4th layer 1243The thickness T of≤60nm4.For example, the 4th layer 124 of thickness T4It can select From the range with lower limit and the upper limit.Lower limit is 20nm, especially 25nm, more particularly 30nm, and the upper limit is 40nm, especially 50nm, more particularly 60nm.
Compared to traditional layer structure, providing the hard coat system with layer stacking material 120 described herein can be advantageous In the optical property for reinforcing hard coat system, especially for being used in electrooptical device such as OLED display.For example, Layer stacking material described herein can be conducive to obtain the hard coat system with anti-reflection property.
It is exemplary referring to Fig. 6, can be in anti-reflective according to can be with some embodiments in conjunction with other embodiments described herein It penetrates between layer stacking material 120 and inorganic hard painting top layer 113 and other adhesion promoting layers 112 is set.For example, other adherency promote The thickness of layer 112 can be selected from the range with lower limit and the upper limit.Lower limit is 100nm, especially 200nm, more particularly 300nm, and the upper limit is 600nm, especially 700nm, more particularly 800nm.Therefore, by providing with thickness described herein The hard coat system of other adhesion promoting layers of degree, entire hard coat system stability can improve.
Further, according to can be with some embodiments in conjunction with other embodiments described herein, other adhesion promoting layers 112 can be configured to, and with covalently bonded together in the top of anti-reflecting layer stacking material 120, such as covalently bonded is together in third layer 123 or the 4th layer 124.Further, the engineering properties of other adhesion promoting layers 112 is applicable to anti-reflecting layer stacking material 120 The engineering properties of top, such as third layer 123 or the 4th layer 124 of engineering properties.For example, other adhesion promoting layers Flexible such as modulus of elasticity can be suitable for the engineering properties of the top of anti-reflecting layer stacking material 120.Therefore, compared to tradition Hard coat system, the structural stability and integrality of hard coat system described herein can improve more.
According to can with the example in conjunction with other embodiments described herein, suitable for being applied firmly used in touch-screen panel Layer system 100 includes flexible base board 101.Flexible base board 101 is selected from by polycarbonate (polycarbonate), poly- terephthaldehyde Sour second diester (polyethylene terephthalate), polymethyl methacrylate (poly (methacrylic acid Methyl ester)), Triafol T (triacetyl cellulose), cyclic olefin polymer (cyclo olefin Polymer), group composed by poly- (ethylene terephthalate) (poly (ethylene naphthalate)).Further, hard to apply Layer system 100 includes the layer stacking material 110 being arranged on flexible base board 101, and wherein layer stacking material 110 includes adhesion promoting layer 111 and inorganic hard painting top layer 113, adhesion promoting layer 111 is set on flexible base board 101.In particular, 111 structure of adhesion promoting layer Cause the surface with covalently bonded together in flexible base board, wherein adhering to the hardness of promotion can be configured to, with from flexible base board to Inorganic hard painting top layer 113 is incrementally increased.Inorganic hard painting top layer 113 can have the pencil hardness from 2H to 9H.In general, Adhesion promoting layer 111 and the inorganic hard top layer 113 that applies are sunk by using the takeup type pecvd process of one and identical predecessor Product.
Therefore, in view of the embodiment of hard coat system described herein, it will be appreciated that, hard coat system is very suitable It closes with the manufacture of continuous takeup type technique, especially with continuous vacuum deposition takeup type technique manufacture.
For example, shown according to the processing system 300 for manufacturing hard coat system of embodiment described herein For in Fig. 7.In particular, Fig. 7 shows takeup type processing system, which is configured to for executing according to herein The method for manufacturing hard coat system with continuous takeup type technique of the embodiment.
As shown in citing in Fig. 7, processing system 300 can include at least three chamber portions, such as first chamber part 302A, second chamber part 302B and third chamber portion 302C.In third chamber portion 302C, it is capable of providing one or more Sedimentary origin 630 and the etching station 430 selected are as handling implement.The flexible base board for example described herein of flexible base board 101, setting In for example on the first roller 764 of axis.Flexible base board is transported from 764 unwinding of the first roller, such as substrate as shown by arrow 108 Shown in dynamic direction.Partition wall 701 is set to separate first chamber part 302A and second chamber part 302B.701 energy of partition wall It is further equipped with gap lock (gap sluices) 740, enough to allow flexible base board 101 to extend there through.It is set to second chamber Vacuum flange 312 between part 302B and third chamber portion 302C can be equipped with aperture, to receive at least some processing Tool.
The mobile deposition region by being set to coating drum 710 and the position corresponding to sedimentary origin 630 of flexible base board 101. During operation, coating drum 710 is rotated around axis, so that flexible base board 101 moves on the direction of arrow 108.According to some Embodiment, flexible base board 101 from the first roller 764 via one, two or multiple rollers guide to coating drum 710 and from coating drum 710 Guidance is to for example with the second roller 764 ' around axis.Flexible base board 101 is rolled up after coating drum processing on the second roller 764'.
According to some embodiments, sedimentary origin 630 can be configured to for deposit hard coat system described herein this A little layers.For example, at least one sedimentary origin can be suitable for deposit adhesion and promote layer 111, and at least one sedimentary origin It can be suitable for depositing inorganic hard painting top layer 113.Further, it is possible to provide respective sedimentary origin, respective sedimentary origin are suitable for heavy Product first layer 121, the second layer 122, third layer 123, the 4th layer 124 and other adhesion promoting layers 112.
In some embodiments, first chamber part 302A is separated into inset (interleaf) chamber portion unit 302A1 And substrate chamber unit 302A2.For example, inset roller 766/766 ' and inset roller 305 are capable of providing as processing system The module component of system 300.Processing system 300 can further comprise preheating unit 394, to heat flexible base board.Further, may be used Preconditioning plasma source 392 is provided, additionally or alternatively to utilize plasma before entering third chamber portion 302C Body handles substrate.Such as RF of preconditioning plasma source 392 (radio frequency, radio frequency) plasma source.
According to optical measurement also being selectively arranged with the another embodiment in conjunction with other embodiments described herein Unit 494 and/or one or more ionizing units 492.Optical measurement unit 494 be used for assess processing substrate as a result, from Sonization unit 492 is used to adjust the charge on (adapting) substrate.
According to some embodiments, deposition materials can be selected according to the subsequent applications of depositing operation and the substrate having been coated with. For example, the deposition materials of sedimentary origin can be according to adhesion promoting layer 111 described herein, inorganic hard painting top layer 113, first layer 121, the respective material selection of the second layer 122, third layer 123, the 4th layer 124 and other adhesion promoting layers 112.
It is exemplary to be provided according to present disclosure one side with according to any embodiment described herein referring to Fig. 8 The electrooptical device 150 of hard coat system 100.It will be appreciated, therefore, that hard coat system described herein can be advantageously used In optical application, such as in the protection of OLED.
Exemplary reference Fig. 9 is described for the embodiment party of the method 200 of continuous takeup type technique manufacture hard coat system Formula.According to can be with multiple embodiments in conjunction with any other embodiment described herein, method 200, which is included in, destroy vacuum In the case where, (square block 210) flexible base board is provided at least one first processing region and at least one second processing region. Further, this method, which is included at least one first processing region, deposits (square block 220) adhesion promoting layer in flexible base board On, and (square block 230) inorganic hard painting top layer is deposited at least one second processing region.
In particular, it may include forming covalent bond between flexible base board and adhesion promoting layer that deposit adhesion, which promotes layer,.Into one Step, it may include the engineering properties for making the engineering properties of adhesion promoting layer be suitable for flexible base board that deposit adhesion, which promotes layer,.Citing comes It says, the flexible such as modulus of elasticity of adhesion promoting layer is applicable to the engineering properties of flexible base board.
According to can with multiple embodiments of this method in conjunction with any other embodiment described herein, deposit adhesion promote It may include using pecvd process and/or HWCVD (hot-wire chemical gas-phase deposition (Hot Wire into layer and the inorganic hard painting top layer of deposition Chemical Vapor Deposition)) technique.Further, deposit anti-reflective layer stacking material 120, which may also comprise, utilizes PECVD Technique and/or HWCVD technique.For example, adhesion promoting layer described herein and/or inorganic hard painting top layer and/or antireflection Layer stacking material 120 can be deposited using low-temperature microwave pecvd process.
According to can with the other embodiments of this method in conjunction with any other embodiment described herein, deposit adhesion promote It include using at least one predecessor, selected from by HMDSO hexamethyldisiloxane (Hexamethyldisiloxane) into layer； PpHMDSO plasma polymerization hexamethyldisiloxane (plasmapolymer Hexamethyldisiloxane)；TOMCAT Tetramethyl-ring tetrasiloxane (Tetramethyl Cyclotetrasiloxane) (C4H16O4Si4)；Two silicon nitrogen of HMDSN hexamethyl Alkane (Hexamethyldisilazane) ([(CH3)3Si]2) and TEOS tetraethoxysilane (Tetraethyl NH Orthosilicate)(Si(OC2H5)4) composed by group.
Further, depositing inorganic hard painting top layer may also comprise using at least one predecessor, selected from by HMDSO； ppHMDSO；TOMCAT tetramethyl-ring tetrasiloxane (Tetramethyl Cyclotetrasiloxane) (C4H16O4Si4)； HMDSN hexamethyldisilazane (Hexamethyldisilazane) ([(CH3)3Si]2NH)；And TEOS tetraethoxysilane (Tetraethyl Orthosilicate)(Si(OC2H5)4) composed by group.In particular, deposit adhesion promotes layer and deposition Inorganic hardness top layer may include using identical predecessor.
In particular, it can further comprise using at least one reagent, selected from by as initiator that deposit adhesion, which promotes layer, Peroxide, especially TBPO (tributylphosphine oxide tert-butyl peroxide)；Acrylate monomer (acrylate Monomers), especially ethylhexyl acrylate (ethyl-hexyl acrylate)；And crosslinking agent (crosslinking Agent), group composed by especially BDDA (butanediol diacrylate, butanediol-diacrylate).Therefore, lead to It crosses using at least one reagent for being selected from above-mentioned group, the adhesive capacity of adhesion promoting layer can improve.Further, using being selected from At least one reagent of the group can be conducive to improve the structural stability of hard coat system described herein.
In view of aforementioned, it will be appreciated that, multiple embodiments described herein provide the hard coat system and use of improvement In the method for the hard coat system for manufacturing this improvement, used especially in electrooptical device such as touch panel.
, can be without departing substantially from this public affairs in conclusion although foregoing teachings are to be related to multiple embodiments of present disclosure In the case where the base region for opening content, other and further embodiment of present disclosure are designed, in the disclosure The range of appearance is determined by appended claims.
In particular, this specification carries out disclosure for present disclosure using including multiple examples of best mode, and And but also any one skilled in the art can implement the theme, including manufacture and use any device or system and execution Any method being included into.Although foregoing teachings disclose various specific embodiments, in above embodiment not mutually The technical characteristic violated can be bonded to each other.Patentable range determines by claim, and if what claim had Structural detail and the literal language of claim different, or if claim comprising the literal language with claim without The equivalent structural elements of substantial difference, then other examples, which are also intended to, is included among the scope of the claims.

Claims (15)

1. a kind of hard coat system (100), suitable for using touch-screen panel, the hard coat system includes:
Flexible base board (101), and
Layer stacking material (110), is set on the flexible base board (101), wherein it includes that adherency promotes that the layer heap, which folds object (110), Layer (111) and inorganic hard painting top layer (113), the adhesion promoting layer are set on the flexible base board (101),
Wherein the adhesion promoting layer (111) is configured to the surface with covalently bonded together in the flexible base board, and wherein described Engineering properties of the adhesion promoting layer (111) at the interface (102) with the flexible base board (101) is suitable for the flexible base board (101) engineering properties.
2. hard coat system (100) as described in claim 1, wherein the adhesion promoting layer (111) has 100nm≤TAPL The thickness T of≤800nmAPL。
3. hard coat system (100) as claimed in claim 1 or 2, wherein the inorganic hard thickness T for applying top layer (113)HTL For 100nm≤THTL≤1μm。
4. hard coat system (100) as described in any one of claims 1 to 3, wherein the adhesion promoting layer (111) includes carbon Silicon oxide sioxCy, especially wherein the adhesion promoting layer (111) by silicon oxide carbide SiOxCyComposition.
5. such as the described in any item hard coat systems of Claims 1-4 (100), wherein the inorganic hard painting top layer (113) includes Silicon oxide siox, especially wherein the inorganic hard painting top layer (113) by silicon oxide sioxComposition or in which the inorganic hard painting Top layer (113) includes silicon carbide SiC, and especially wherein the inorganic hard painting top layer (113) is made of silicon carbide SiC.
6. such as hard coat system described in any one of claim 1 to 5 (100), wherein the inorganic hard painting top layer has from 2H To the pencil hardness (pencilhardness) of 9H.
7. further being wrapped such as hard coat system as claimed in any one of claims 1 to 6 (100) wherein the layer heap folds object (110) It includes and is set to the adhesion promoting layer (111) and the inorganic hard anti-reflecting layer stacking material (120) applied between top layer (113).
8. hard coat system (100) as claimed in claim 7, wherein the anti-reflecting layer stacking material (120) includes SiOx? One layer of (121), NbOxThe second layer (122) and SiOxThird layer (123), the first layer (121) is set to the adherency and promotees Into on layer (111), the second layer (122) is set on the first layer (121), and the third layer (123) is set to described On the second layer (122).
9. hard coat system (100) as claimed in claim 8, wherein the anti-reflecting layer stacking material (120) further comprises The 4th layer (124) of ITO, the 4th layer (124) are set on the third layer (123).
10. further comprising other adhesion promoting layers such as the described in any item hard coat systems of claim 7 to 9 (100) (112), other described adhesion promoting layers (112) are located at the anti-reflecting layer stacking material (120) and the inorganic hard painting top layer (113) between.
11. a kind of hard coat system (100), suitable for using touch-screen panel, the hard coat system includes:
Flexible base board (101), selected from by polycarbonate (polycarbonate), polyethylene terephthalate (polyethylene terephthalate), polymethyl methacrylate (poly (methacrylic acid methyl Ester)), Triafol T (triacetyl cellulose), cyclic olefin polymer (cyclo olefin polymer), Group composed by poly- (ethylene terephthalate) (poly (ethylene naphthalate))；And
Layer stacking material (110), is set on the flexible base board (101), wherein it includes that adherency promotes that the layer heap, which folds object (110), Layer (111) and inorganic hard painting top layer (113), the adhesion promoting layer (111) are set on the flexible base board (101)；
Wherein the adhesion promoting layer (111) is configured to the surface with covalently bonded together in the flexible base board, wherein described viscous The hardness of attached promotion is configured to, to be incrementally increased from the flexible base board to the inorganic hard painting top layer (113), wherein described Inorganic hard painting top layer (113) has the pencil hardness (pencil hardness) from 2H to 9H, and the wherein adhesion promoting layer (111) and inorganic hard apply top layer (113) are deposited by using the takeup type pecvd process of one and identical predecessor.
12. a kind of electrooptical device (150) has hard coat system as described in any one of claim 1 to 11 (100).
13. a kind of in the method (200) of continuous takeup type technique manufacture hard coat system, which comprises
In the case where not destroying vacuum, provide (210) flexible base board at least one first processing region and at least one Two processing regions；
In at least one described first processing region, (220) adhesion promoting layer is deposited on the flexible base board；And
(230) inorganic hard painting top layer is deposited at least one described second processing region；
Wherein deposition (220) described adhesion promoting layer is included between the flexible base board and the adhesion promoting layer and is formed covalently Key, and wherein deposition (220) described adhesion promoting layer includes that the engineering properties of the adhesion promoting layer is made to be suitable for the flexibility The engineering properties of substrate.
14. the method (200) of manufacture layer system as claimed in claim 13, wherein deposition (220) described adhesion promoting layer and (230) described inorganic hard painting top layer is deposited including the use of pecvd process and/or HWCVD technique.
15. the method (200) of manufacture barrier-layer system according to claim 13 or 14, wherein deposition (220) described adherency Promoting layer includes using at least one predecessor, selected from by HMDSO；ppHMDSO；TOMCAT tetramethyl-ring tetrasiloxane (C4H16O4Si4)；HMDSN hexamethyldisilazane ([(CH3)3Si]2) and TEOS tetraethoxysilane (Si (OC NH2H5)4) institute's group At group, and wherein deposition (220) described adhesion promoting layer further comprises using at least one reagent, selected from by as more Multiple peroxide especially TBPO (tributylphosphine oxide) of a initiator；Multiple acrylate monomers especially acrylic acid second The own ester of base；And group composed by crosslinking agent especially BDDA (butanediol diacrylate).
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