CN110160663A - A kind of high-resolution near field Wavefront measuring apparatus and measurement method - Google Patents
A kind of high-resolution near field Wavefront measuring apparatus and measurement method Download PDFInfo
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- CN110160663A CN110160663A CN201910412320.0A CN201910412320A CN110160663A CN 110160663 A CN110160663 A CN 110160663A CN 201910412320 A CN201910412320 A CN 201910412320A CN 110160663 A CN110160663 A CN 110160663A
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Classifications
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- G—PHYSICS
- G01—MEASURING; TESTING
- G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
- G01J9/00—Measuring optical phase difference; Determining degree of coherence; Measuring optical wavelength
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- G—PHYSICS
- G01—MEASURING; TESTING
- G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
- G01J9/00—Measuring optical phase difference; Determining degree of coherence; Measuring optical wavelength
- G01J2009/002—Wavefront phase distribution
Abstract
A kind of high-resolution near field Wavefront measuring apparatus and measurement method, device includes the detector assembly being made of diffraction object and ccd detector, for the two-dimentional motorized precision translation stage and computer of detector assembly placement, the diffraction object is fixedly connected with ccd detector by sleeve, and diffraction object is parallel with the target surface of ccd detector；The computer is connected with the ccd detector and two-dimentional motorized precision translation stage respectively, carries out instrument controlling and data storage.The present invention improves Measurement Resolution in the case where not increasing scanning recording process, avoid limitation of the CCD pixel number to Measurement Resolution, reduce the requirement to detector, and the limited diffraction object of spatial dimension can also increase the convergence rate and precision of iterative calculation.Apparatus of the present invention structure is simple, requires environmental stability low, it is easy to accomplish, the medium-high frequency information before near field wave to be measured can effectively be rebuild.
Description
Technical field
The present invention relates to laser beam wavefront and wavefront of optical components fields of measurement, especially a kind of high-resolution near field wave
Preceding measuring device and measurement method.
Background technique
As a kind of emerging coherent diffraction imaging technology, Ptychographic Iterative Engine (PIE) quilt
It is widely used in the fields such as X-ray and electron beam micro-imaging, biomedical imaging.PIE is to be measured using illumination light array scanning
Sample simultaneously guarantees there is a certain proportion of overlapping lighting area between adjacent position, while recording the diffraction pattern of each position, passes through
The calculation of iteration reconstructs the amplitude and phase information of scanned sample.PIE is originally to scanning sample imaging, in 2009
After extended-PIE (ePIE) algorithm is suggested, the amplitude and phase information for being irradiated to the incident light on sample to be tested surface can also
To be reconstructed simultaneously, therefore it is modified to the wavefront measurement of illumination light.Joined based on the measuring technique of ePIE due to not needing
It is simple and low to environmental stability requirement to examine light beam, structure, succeeds in fields such as beam quality measurement, optical element detections
Using and obtain a series of research achievements.
When being measured before being rebuild by illumination light near field waves such as beam quality and optical elements using ePIE technology,
Since information measured is included in illumination light complex amplitude, although carrying out multiple motion scan to object, spread out in every width of record
It penetrates in hot spot, illumination light complex amplitude all participates in calculating rebuilding as a whole, therefore the lateral resolution before the near field wave finally obtained
Rate will receive the limitation of CCD pixel number used, can't increase with the increase of object scanning times.Especially swash to high power
When optical elements of large caliber in the high technical optics equipment such as CD-ROM driver, astronomical telescope measures, such as patent of invention
The measurement method that 201310382709.8 " transmission-type heavy-calibre element Method for Phase Difference Measurement " propose, by existing CCD pixel number
There is the medium-high frequency information being strict with to be difficult to obtain for limitation.S.Mcdermott in 2018 etc. propose near field it is mobile to
The method of sample is (referring to S.McDermott, A.Maiden.Near-field ptychographic microscope for
Quantitative phase imaging [J] .OpticsExpress, 2018,26 (19): 25471-25480), though this method
It so can be used for the measurement of optical element, promote lateral resolution, but component size is larger, inconvenience is scanned movement, therefore
This method is not particularly suited for the measurement of heavy-calibre element, is also not used to the promotion of beam quality inspection time measurement resolution.For this purpose, I
Propose that a kind of high-resolution near field Wavefront measuring apparatus and method, this method are suitable for laser beam wavefront and optical element
The measurement of wavefront.
Summary of the invention
The present invention is for the above-mentioned prior art in the problems near field wavefront measurement and high spatial resolution wavefront measurement
Demand proposes a kind of high-resolution near field Wavefront measuring apparatus and measurement method.The device is by the derivative of a limited space
Body is integrated with detector, and this mobile detector assembly carries out wavefront division scanning and guarantees two neighboring scan position
There is overlapping between corresponding wavefront, while recording a series of diffraction patterns of its formation, is then iterated by computer
It calculates and realizes near field wave-front reconstruction.The present invention is simple with structure, requires environmental stability low and high Measurement Resolution spy
Point, and its lateral resolution is not only restricted to detector.The measurement method can be used for the wavefront measurement and optical element of stable light-beam
Detection, especially optical elements of large caliber medium-high frequency wave surface error detection.
Technical solution of the invention is as follows:
A kind of high-resolution near field Wavefront measuring apparatus, it is characterized in that, including by diffraction object and ccd detector structure
At detector assembly, for detector assembly place two-dimentional motorized precision translation stage and computer, the diffraction object and CCD
Detector is fixedly connected by sleeve, and diffraction object is parallel with the target surface of ccd detector；The computer respectively with it is described
Ccd detector and two-dimentional motorized precision translation stage be connected, carry out instrument controlling and data storage.
There is diffracting power, remaining range is opaque, the derivative in the diffraction object certain space range S
The distance between body and ccd detector target surface are Z, make the diffraction pattern diameter after diffraction object and ccd detector target surface
Diameter it is suitable.
The COMPLEX AMPLITUDE of the diffraction object is O (r), can be measured in advance as known quantity to improve iteration convergence
Speed can also be used as unknown quantity and rebuild simultaneously with wavefront to be measured.
Further, the invention also includes laser, spatial filter, collimation lens and shrink beam devices；Optical element to be measured is set
Between the collimation lens and shrink beam device, the diffraction object is located at the image planes of optical element to be measured；
The laser issues coherent light and successively forms collimated light beam after spatial filter and collimation lens, successively passes through
Vertical incidence is acquired to the image planes of optical element to be measured by the ccd detector after optical element to be measured and shrink beam device shrink beam.
The method for carrying out near field wavefront measurement using above-mentioned high-resolution near field Wavefront measuring apparatus, it is characterized in that
This method includes the following steps:
1) computer, which controls two-dimentional motorized precision translation stage, makes detector assembly carry out the N column scan of M row, and scanning step l is less than
The bore of the diffraction object makes the presence of overlapping between wavefront corresponding to two neighboring scan position；
2) when detector assembly is located at the scan position of m row n column, the ccd detector records the position diffraction
The intensity distribution I of hot spotm,n, and be stored in the computer with the matrix form that a row b is arranged, until being obtained after the completion of scanning
To the intensity distribution data I of one group of diffraction pattern1,1,I1,2...Im,n...IM,N；
3) computer is iterated processing according to diffraction pattern data, realizes wave-front reconstruction.
Iterative processing described in the step 3), the specific steps are as follows:
3.1) the p row q random guess P arranged is provided to the illumination light on diffraction object (1) face1As initial value,
Middle p=a+ (M-1) l, q=b+ (N-1) l；
If the COMPLEX AMPLITUDE O of diffraction object is measured in advance, calculating is brought into as known quantity and is changed following
Without any update during generation；If the COMPLEX AMPLITUDE of diffraction object is not measured in advance, an a is provided to diffraction object
The random guess O0 of row b column, and construct the distribution of corresponding diaphragm H diffraction-limited object, initial distribution O1=O0×H；
The intensity distribution data of the diffraction pattern of acquisition is brought into iteration according to random order, when all diffraction patterns are all used
It is to complete an iteration in once updating backsight；
3.2) from PkMiddle taking-up scan position Rm,nPlace's illumination light distribution Pk(r-Rm,n), correspond to matrix Pk1+ (m-
1) l to a+ (m-1) l row, 1+ (n-1) l to b+ (n-1) l are arranged, and transmit wave function after diffraction object are as follows:Wherein k indicates the number of iterations；
3.3) COMPLEX AMPLITUDE at ccd detector is calculated:Wherein
Represent positive transmission process；And obtained complex amplitude is constrained, its phase invariant is kept, with the diffraction pattern intensity measured
Square root replace its amplitude:Subscript c indicates updated COMPLEX AMPLITUDE；
3.4) diffraction object plane is returned into updated complex amplitude anti-passWhereinIt indicates reverse transmission process, and diffraction object and illumination light is updated using following formula:
Wherein max indicates maximum value, and * represents conjugation, and α is 0 meaningless and customized parameter to prevent denominator, and β is used for
It adjusts and updates step-length；
Then updated P ' is utilizedk(r-Rm,n) replacement matrix Pk1+ (m-1) l to a+ (m-1) l row, 1+ (n-1)
L to b+ (n-1) l column；
3.5) by updated Pk、O′k(r) it is used as initial input, step 2) -4 is repeated at next scan position), directly
An iteration is completed after all updating to all positions；
Iteration error is calculated:
If EkThreshold value less than setting then stops iteration and enters step 6), otherwise return step 2) repeat above-mentioned calculated
Journey.
3.6) the illumination light P in resulting derivative dignity is updated at this timekPhase be wavefront to be measured.
Compared with prior art, technical effect of the invention is as follows:
The formula segmentation scanning that partly overlaps is carried out to wavefront to be measured using detector assembly, is not increasing scanning recording process
In the case of improve Measurement Resolution, avoid limitation of the CCD pixel number to Measurement Resolution, reduce and detector is wanted
It asks, and the limited diffraction object of spatial dimension can also increase the convergence rate and precision of iterative calculation.Apparatus of the present invention knot
Structure is simple, requires environmental stability low, it is easy to accomplish, the medium-high frequency information before near field wave to be measured can effectively be rebuild.
Detailed description of the invention
Fig. 1 is the structural schematic diagram of high-resolution near field of the present invention Wavefront measuring apparatus.
Fig. 2 is the schematic device that the present invention realizes the detection of high-resolution transmission optical component.
Specific embodiment
Below with reference to embodiment and attached drawing, the invention will be further described, but protection model of the invention should not be limited with this
It encloses.
It is please the structural schematic diagram of high-resolution near field of the present invention Wavefront measuring apparatus referring initially to Fig. 2, Fig. 2.As shown,
The device include the detector assembly 3 being made of diffraction object 1 and ccd detector 2, for detector assembly 3 place two dimension electricity
Dynamic translation stage 4, computer 5, laser 6, spatial filter 7, collimation lens 8 and shrink beam device 9.Optical element 10 to be measured is placed in institute
Between the collimation lens 8 stated and shrink beam device 9, the diffraction object 1 is located at the image planes 11 of optical element 10 to be measured.Laser
6 sending coherent lights successively form collimated light beam after spatial filter 7 and collimation lens 8, successively through 10 He of optical element to be measured
Vertical incidence is acquired to the image planes 11 of optical element 10 to be measured by the ccd detector 2 after 9 shrink beam of shrink beam device.
The diffraction object 1 is fixedly connected with ccd detector 2 by sleeve, and diffraction object 1 and ccd detector 2
Target surface is parallel；The computer 5 is connected with the ccd detector 2 and two-dimentional motorized precision translation stage 4 respectively, carries out instrument control
System and data storage.The diffraction object 1 only has diffracting power in certain space range S, remaining range is all opaque.
The distance between described diffraction object 1 and 2 target surface of ccd detector are Z, make the diffraction pattern diameter after diffraction object 1
It is suitable with the diameter of 2 target surface of ccd detector.The COMPLEX AMPLITUDE of the diffraction object 1 is O (r), it can be measured in advance
As known quantity to improve iterative convergence speed, it can also be used as unknown quantity and rebuild simultaneously with wavefront to be measured.
In the present embodiment, diffraction object 1 uses continuous type phase-plate, and spatial distribution range is the circle of radius 5mm.Derivative
The distance between body 1 and ccd detector 2 are 60mm, and the resolution ratio of ccd detector 2 is 2048 × 2048, and minimum unit is 7.4 μ
m×7.4μm.Mobile detector component 3 carries out the scanning of 11 rows 11 column in image planes 11, and scanning step is 2.22mm (2.22mm
Corresponding to 300 pixels).
Transmission optical component is measured using above-mentioned measuring device, including the following steps:
1) by optical element 10 to be measured be placed in parallel light path and and beam orthogonal, determine optical element 10 to be measured by contracting
The position for the image planes 11 that beam device 9 is formed.
2) detector assembly 3 is placed on two-dimentional motorized precision translation stage 4, is put into optical path to be measured, and entering perpendicular to light beam
Direction is penetrated, while is located at diffraction object 1 at image planes 11.
3) computer 5, which controls two-dimentional motorized precision translation stage 4, makes detector assembly 3 carry out sweeping for 11 rows 11 column in image planes 11
It retouches, scanning step l=2.22mm, the overlapping area between the corresponding wavefront of two neighboring scan position is 1 bore of diffraction object
72%；When detector assembly 3 is located at the scan position of m row n column, ccd detector 2 records the strong of the position diffraction pattern
Degree distribution Im,n, Im,nIt is stored in computer 5 with 2048 × 2048 matrix forms, until obtaining one group of diffraction after the completion of scanning
Hot spot data I1,1,I1,2...Im,n...I11,11。
4) computer 5 is iterated processing according to diffraction pattern data, the specific steps are as follows:
(1) the p row q random guess P arranged is provided to the illumination light on 1 face of diffraction object1As initial value, wherein p
=2048+ (11-1) × 300, q=2048+ (11-1) × 300.To the offer of diffraction object 1 one 2048 × 2048 guess at random
Survey O0, and construct the distribution of corresponding diaphragm H diffraction-limited object 1, initial distribution O1=O0×H.By the 11 of acquisition ×
11 width diffraction pattern data bring iteration into according to random order, when all diffraction patterns are used to once update backsight all as completion one
Secondary iteration.
(2) from PkMiddle taking-up scan position Rm,nPlace's illumination light distribution Pk(r-Rm,n), correspond to matrix Pk1+ (m-
1) it × 300 arranges to 2048+ (m-1) × 300 row, 1+ (n-1) × 300 to 2048+ (n-1) × 300, is transmitted after diffraction object 1
Wave function are as follows:Wherein k indicates the number of iterations.
(3) COMPLEX AMPLITUDE at ccd detector 2 is calculated:WhereinGeneration
Table forward direction transmission process；And obtained complex amplitude is constrained, its phase invariant is kept, with the diffraction pattern intensity measured
Square root replaces its amplitude:Subscript c indicates updated COMPLEX AMPLITUDE.
(4) 1 plane of diffraction object is returned in complex amplitude anti-pass after updatingWherein
It indicates reverse transmission process, and diffraction object 1 and illumination light is updated using following formula:
Wherein max indicates maximum value, and * represents conjugation, α=0.001, β=1.Then updated P ' is utilizedk(r-Rm,n)
Replace matrix Pk1+ (m-1) × 300 Dao 2048+ (m-1) × 300 row, 1+ (n-1) × 300 arrive 2048+ (n-1) × 300
Column.
(5) by updated Pk、O′k(r) it is used as initial input, step (2)-(4) are repeated at next scan position,
An iteration is completed after all positions all update.Iteration error is calculated:
If EkStop iteration less than 1% and enter step (6), otherwise return step (2) repeats above-mentioned calculating process.
(6) the illumination light P on resulting diffraction object (1) face is updated at this timekPhase be wavefront of optical components to be measured.
To further remove the influence of the introducings such as collimated light beam wavefront out-of-flatness, improve measurement accuracy, can be removed from optical path to
Photometry element 10, repeats the above steps 3) -4), obtain the illumination light point when without optical element 10 to be measured on 1 face of diffraction object
Cloth Pb,k, then wavefront of optical components to be measured is PkWith Pb,kPhase difference.
Claims (6)
1. a kind of high-resolution near field Wavefront measuring apparatus, which is characterized in that including by diffraction object (1) and ccd detector
(2) detector assembly (3) constituted, the two-dimentional motorized precision translation stage (4) and computer (5) placed for detector assembly (3), institute
The diffraction object (1) stated is fixedly connected with ccd detector (2) by sleeve, and the target of diffraction object (1) and ccd detector (2)
Face is parallel；The computer (5) is connected with the ccd detector (2) and two-dimentional motorized precision translation stage (4) respectively, carries out instrument
Device control and data storage.
2. high-resolution near field Wavefront measuring apparatus according to claim 1, which is characterized in that the diffraction object
(1) there is diffracting power, remaining range is opaque, the diffraction object (1) and ccd detector (2) in certain space range S
The distance between target surface is Z, makes the diameter phase of the diffraction pattern diameter after diffraction object (1) with ccd detector (2) target surface
When.
3. high-resolution near field Wavefront measuring apparatus according to claim 2, which is characterized in that the diffraction object
(1) COMPLEX AMPLITUDE is (O r), can measure in advance as known quantity to improve iterative convergence speed, can also be used as not
The amount of knowing is rebuild simultaneously with wavefront to be measured.
4. high-resolution near field Wavefront measuring apparatus according to claim 1 to 3, which is characterized in that further include swashing
Light device (6), spatial filter (7), collimation lens (8) and shrink beam device (9)；It is saturating that optical element (10) to be measured is placed in the collimation
Between mirror (8) and shrink beam device (9), the diffraction object (1) is located at the image planes (11) of optical element to be measured (10)；
The laser (6) issues coherent light and successively forms collimated light beam after spatial filter (7) and collimation lens (8),
Successively after optical element to be measured (10) and shrink beam device (9) shrink beam vertical incidence to optical element to be measured (10) image planes (11),
It is acquired by the ccd detector (2).
5. carrying out the side of near field wavefront measurement using any high-resolution near field Wavefront measuring apparatus of claim 1-4
Method, it is characterised in that this method includes the following steps:
1) computer (5), which controls two-dimentional motorized precision translation stage (4), makes detector assembly (3) to carry out the N column scan of M row, and scanning step l
Less than the bore of the diffraction object (1), make the presence of overlapping between wavefront corresponding to two neighboring scan position；
2) when detector assembly (3) is located at the scan position of m row n column, the ccd detector (2) records the position and spreads out
Penetrate the intensity distribution I of hot spotm,n, and be stored in the computer (5) with the matrix form that a row b is arranged, until scanning is completed
Afterwards, the intensity distribution data I of one group of diffraction pattern is obtained1,1,I1,2...Im,n...IM,N；
3) computer (5) is iterated processing according to diffraction pattern data, realizes wave-front reconstruction.
6. the method for near field wavefront measurement according to claim 4, which is characterized in that at iteration described in the step 3)
Reason, the specific steps are as follows:
1) the p row q random guess P arranged is provided to the illumination light on diffraction object (1) face1As initial value, wherein p=a+
(M-1) l, q=b+ (N-1) l；
If the COMPLEX AMPLITUDE O of diffraction object (1) is measured in advance, calculating is brought into as known quantity and in following iteration
In the process without any update；If the COMPLEX AMPLITUDE of diffraction object (1) is not measured in advance, provided to diffraction object (1)
The random guess O0 of one a row b column, and the distribution of corresponding diaphragm H diffraction-limited object (1) is constructed, initial distribution is
O1=O0×H；
The intensity distribution data of the diffraction pattern of acquisition is brought into iteration according to random order, when all diffraction patterns are all used for one
Secondary update backsight is to complete an iteration；
2) from PkMiddle taking-up scan position Rm,nPlace's illumination light distribution Pk(r-Rm,n), correspond to matrix Pk1+ (m-1) l to a
+ (m-1) l row, 1+ (n-1) l to b+ (n-1) l column, diffraction object (1) transmit wave function afterwards are as follows:Wherein k indicates the number of iterations；
3) COMPLEX AMPLITUDE at ccd detector (2) is calculated:WhereinIt represents
Positive transmission process；And obtained complex amplitude is constrained, its phase invariant is kept, with putting down for the diffraction pattern intensity measured
Root replaces its amplitude:Subscript c indicates updated COMPLEX AMPLITUDE；
4) diffraction object (1) plane is returned into updated complex amplitude anti-passWherein
It indicates reverse transmission process, and diffraction object (1) and illumination light is updated using following formula:
Wherein max indicates maximum value, and * represents conjugation, and α is 0 meaningless and customized parameter to prevent denominator, and β is for adjusting
Update step-length；
Then updated P ' is utilizedk(r-Rm,n) replacement matrix Pk1+ (m-1) l to a+ (m-1) l row, 1+ (n-1) l to b
+ (n-1) l column；
5) by updated Pk、O′k(r) it is used as initial input, step 2) -4 is repeated at next scan position), until all
An iteration is completed after all updating in position；
Iteration error is calculated:
If EkThreshold value less than setting then stops iteration and enters step 6), otherwise return step 2) repeat above-mentioned calculating process.
6) the illumination light P on resulting diffraction object (1) face is updated at this timekPhase be wavefront to be measured.
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Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
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| WO2021068594A1 (en) * | 2019-10-10 | 2021-04-15 | 浙江大学 | Wavefront reconstruction device and method based on extended rotationally symmetric structured light illumination |
| CN115598091A (en) * | 2022-10-31 | 2023-01-13 | 中国科学院上海光学精密机械研究所（Cn） | Crystal refractive index non-uniformity measuring method based on wavefront measurement |
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