CN110160663B - High-resolution near-field wavefront measuring device and method - Google Patents

High-resolution near-field wavefront measuring device and method Download PDF

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CN110160663B
CN110160663B CN201910412320.0A CN201910412320A CN110160663B CN 110160663 B CN110160663 B CN 110160663B CN 201910412320 A CN201910412320 A CN 201910412320A CN 110160663 B CN110160663 B CN 110160663B
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CN110160663A (en
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张雪洁
程北
沈卫星
刘诚
朱健强
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Shanghai Institute of Optics and Fine Mechanics of CAS
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    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
    • G01J9/00—Measuring optical phase difference; Determining degree of coherence; Measuring optical wavelength
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
    • G01J9/00—Measuring optical phase difference; Determining degree of coherence; Measuring optical wavelength
    • G01J2009/002—Wavefront phase distribution

Abstract

A high-resolution near-field wavefront measuring device and a measuring method are disclosed, the device comprises a detector assembly consisting of a diffraction object and a CCD detector, a two-dimensional electric translation table for placing the detector assembly and a computer, wherein the diffraction object is fixedly connected with the CCD detector through a sleeve, and the diffraction object is parallel to a target surface of the CCD detector; and the computer is respectively connected with the CCD detector and the two-dimensional electric translation table for instrument control and data storage. The invention improves the measurement resolution without increasing the scanning and recording process, avoids the limitation of CCD pixel number to the measurement resolution, reduces the requirement on a detector, and can increase the convergence speed and precision of iterative calculation for the diffraction object with limited space range. The device has simple structure, low requirement on environmental stability and easy realization, and can effectively reconstruct the medium-high frequency information of the near-field wavefront to be measured.

Description

High-resolution near-field wavefront measuring device and method
Technical Field
The invention relates to the field of laser beam wavefront and optical element wavefront measurement, in particular to a high-resolution near-field wavefront measurement device and a measurement method.
Background
As an emerging coherent diffraction imaging technology, Ptychographic Iterative Engine (PIE) is widely used in the fields of X-ray and electron beam microscopy, biomedical imaging, and the like. The PIE utilizes the illumination light array to scan a sample to be detected, ensures a certain proportion of overlapping illumination area between adjacent positions, simultaneously records diffraction light spots of each position, and reconstructs the amplitude and phase information of the scanned sample in an iterative calculation mode. The PIE originally images a scanned sample, and after the 2009 extended-PIE (epie) algorithm is proposed, the amplitude and phase information of incident light irradiated to the surface of a sample to be measured can also be reconstructed at the same time, so that the method is improved and used for wavefront measurement of illumination light. The measurement technology based on ePIE is successfully applied in the fields of light beam quality measurement, optical element detection and the like and obtains a series of research results because reference light beams are not needed, the structure is simple, and the requirement on environmental stability is low.
When the ePIE technology is adopted to measure the near-field wave front such as beam quality, optical elements and the like through illumination light reconstruction, the measured information is contained in the complex amplitude of the illumination light, although the object is scanned in a plurality of times of moving, in each recorded diffraction spot, the complex amplitude of the illumination light participates in calculation reconstruction as a whole, so that the transverse resolution of the finally obtained near-field wave front is limited by the number of CCD pixels and cannot be increased along with the increase of the number of times of scanning the object. Particularly, when a large-aperture optical element in high-power laser drivers, astronomical telescopes and other high-technology optical equipment is measured, the measurement method proposed in invention patent 201310382709.8, namely transmission type large-aperture element phase measurement method, is limited by the number of pixels of the existing CCD, and medium-high frequency information with strict requirements is difficult to obtain. Mcdrmott et al proposed a method for moving a sample to be measured in the near field in 2018 (see S. McDermott, A. Main. near-field ptc photonic microscopic for quantitative phase imaging [ J ]. Optics Express,2018,26(19):25471 and 25480), which can be used for measuring optical elements to improve the lateral resolution, but is inconvenient for scanning movement due to the large size of the element, and therefore, the method is not suitable for measuring large-caliber elements and cannot be used for improving the resolution in beam quality detection. Therefore, the high-resolution near-field wavefront measuring device and the high-resolution near-field wavefront measuring method are suitable for measuring the laser beam wavefront and the optical element wavefront.
Disclosure of Invention
The invention provides a high-resolution near-field wavefront measuring device and a high-resolution near-field wavefront measuring method aiming at the problems in the near-field wavefront measurement and the requirements of high-spatial resolution wavefront measurement in the prior art. The device integrates a diffraction object with limited space with a detector, moves the detector component to carry out wavefront segmentation scanning, ensures that the wavefronts corresponding to two adjacent scanning positions are overlapped, simultaneously records a series of diffraction spots formed by the diffraction objects, and then carries out iterative calculation by a computer to realize near-field wavefront reconstruction. The invention has the characteristics of simple structure, low requirement on environmental stability and high measurement resolution, and the transverse resolution is not limited by the detector. The measuring method can be used for wavefront measurement of a stable light beam and detection of an optical element, in particular to medium-high frequency wavefront error detection of a large-aperture optical element.
The technical solution of the invention is as follows:
a high-resolution near-field wavefront measuring device is characterized by comprising a detector assembly, a two-dimensional electric translation table and a computer, wherein the detector assembly is composed of a diffraction object and a CCD detector; and the computer is respectively connected with the CCD detector and the two-dimensional electric translation table for instrument control and data storage.
The diffraction object has diffraction capability in a certain space range S, the rest ranges are opaque, the distance between the diffraction object and the target surface of the CCD detector is Z, and the diameter of a diffraction light spot passing through the diffraction object is equivalent to that of the target surface of the CCD detector.
The complex amplitude distribution of the diffraction object is O (r), can be measured in advance as a known quantity to improve the iterative convergence speed, and can also be used as an unknown quantity to be reconstructed simultaneously with the wavefront to be measured.
Furthermore, the invention also comprises a laser, a spatial filter, a collimating lens and a beam reducer; the optical element to be measured is arranged between the collimating lens and the beam reducer, and the diffraction object is positioned at the image surface of the optical element to be measured;
the laser emits coherent light which sequentially passes through the spatial filter and the collimating lens to form parallel light beams, and the parallel light beams are sequentially condensed by the optical element to be detected and the beam condenser and then vertically incident to the image surface of the optical element to be detected and collected by the CCD detector.
The method for performing near-field wavefront measurement by using the near-field wavefront measuring device with high resolution is characterized by comprising the following steps of:
1) the computer controls the two-dimensional electric translation table to enable the detector assembly to scan M rows and N columns, and the scanning step length l is smaller than the aperture of the diffraction object, so that the wavefronts corresponding to two adjacent scanning positions are overlapped;
2) when the detector assembly is positioned at the scanning position of the m row and n columns, the CCD detector records the intensity distribution I of diffraction spots at the positionm,nAnd storing the data in the computer in a matrix form of a row a and a column b until the scanning is finished to obtain a group of intensity distribution data I of diffraction spots1,1,I1,2…Im,n…IM,N；
3) And the computer performs iterative processing according to the diffraction spot data to realize wavefront reconstruction.
The iterative processing in the step 3) comprises the following specific steps:
3.1) providing a random guess P of P rows and q columns for the illumination light on the surface of the diffractive object (1)1As initial values, wherein p ═ a + (M-1) l, q ═ b + (N-1) l;
if the complex amplitude distribution O of the diffractive object has been measured in advance, it is taken as a known quantity to be brought into calculation without any update in the following iterative process; if the complex amplitude distribution of the diffractive object is not measured in advance, a random guess O of a row a and a column b is provided for the diffractive object0And constructing a corresponding diaphragm H to limit the distribution range of the diffraction object, the initial distribution of which is O1＝O0×H；
Bringing the acquired intensity distribution data of the diffraction spots into iteration according to a random order, and considering that one iteration is finished after all the diffraction spots are used for one updating;
3.2) from PkTaking out the scanning position Rm,nDistribution of illumination light Pk(r-Rm,n) Which corresponds to the matrix PkFrom row 1+ (m-1) l to a + (m-1) l, and column 1+ (n-1) l to b + (n-1) l, the transmitted wave function after diffracting the object is:
Figure GDA0002071216080000031
wherein k represents the number of iterations;
3.3) calculating the complex amplitude distribution at the CCD detector:
Figure GDA0002071216080000032
wherein
Figure GDA0002071216080000033
Representing a forward transmission process; and constraining the obtained complex amplitude, keeping the phase of the complex amplitude unchanged, and replacing the amplitude of the complex amplitude with the square root of the measured diffraction spot intensity:
Figure GDA0002071216080000034
subscript c represents the updated complex amplitude distribution;
3.4) transmitting the updated complex amplitude back to the diffraction object plane
Figure GDA0002071216080000035
Wherein
Figure GDA0002071216080000036
Representing the reverse transport process and updating the diffractive object and the illumination light using:
Figure GDA0002071216080000037
Figure GDA0002071216080000038
wherein max represents the maximum value, x represents the conjugate, α is a parameter that prevents the denominator from being meaningless and self-defined, and β is used to adjust the update step size;
then using the updated P'k(r-Rm,n) Replacement matrix PkLine 1+ (m-1) l to a + (m-1) l, column 1+ (n-1) l to b + (n-1) l;
3.5) updating Pk、O′k(r) as initialStarting inputting, and repeating the steps 2) -4) at the next scanning position until all positions are updated, and finishing one iteration;
calculating an iteration error:
Figure GDA0002071216080000041
if EkStopping iteration and entering step 6) if the threshold value is less than the set threshold value, otherwise, returning to step 2) and repeating the calculation process.
3.6) updating the resulting illumination light P on the diffractive object surface at this timekThe phase of (1) is the wavefront to be measured.
Compared with the prior art, the invention has the following technical effects:
the detector assembly is used for carrying out partial overlapped segmentation scanning on the wavefront to be detected, the measurement resolution is improved under the condition of not increasing the scanning recording process, the limitation of CCD pixel number to the measurement resolution is avoided, the requirement on the detector is reduced, and the convergence speed and the accuracy of iterative calculation can be increased by the diffraction object with limited space range. The device has simple structure, low requirement on environmental stability and easy realization, and can effectively reconstruct the medium-high frequency information of the near-field wavefront to be measured.
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FIG. 1 is a schematic diagram of the structure of a high resolution near field wavefront measuring device of the present invention.
FIG. 2 is a schematic diagram of an apparatus for implementing high resolution transmission optical element detection according to the present invention.
Detailed Description
The present invention will be further described with reference to the following examples and drawings, but the scope of the present invention should not be limited thereto.
Referring to fig. 2, fig. 2 is a schematic structural diagram of a high resolution near-field wavefront measuring device according to the present invention. As shown in the figure, the device comprises a detector assembly 3 consisting of a diffraction object 1 and a CCD detector 2, a two-dimensional motorized translation stage 4 on which the detector assembly 3 is placed, a computer 5, a laser 6, a spatial filter 7, a collimating lens 8 and a beam reducer 9. The optical element to be measured 10 is arranged between the collimating lens 8 and the beam reducer 9, and the diffraction object 1 is positioned at an image plane 11 of the optical element to be measured 10. Coherent light emitted by the laser 6 sequentially passes through the spatial filter 7 and the collimating lens 8 to form parallel light beams, which are sequentially condensed by the optical element 10 to be detected and the beam condenser 9 and then vertically incident to the image surface 11 of the optical element 10 to be detected, and are collected by the CCD detector 2.
The diffraction object 1 and the CCD detector 2 are fixedly connected through a sleeve, and the diffraction object 1 is parallel to the target surface of the CCD detector 2; and the computer 5 is respectively connected with the CCD detector 2 and the two-dimensional electric translation table 4 for instrument control and data storage. The diffractive object 1 has a diffractive power only in a certain spatial range S, the remaining ranges being opaque. The distance between the diffraction object 1 and the target surface of the CCD detector 2 is Z, so that the diameter of a diffraction light spot passing through the diffraction object 1 is equivalent to that of the target surface of the CCD detector 2. The complex amplitude distribution of the diffraction object 1 is O (r), and the complex amplitude distribution can be measured in advance as a known quantity to improve the iterative convergence speed, and can also be used as an unknown quantity to be reconstructed simultaneously with the wavefront to be measured.
In this embodiment, the diffraction object 1 is a continuous phase plate and has a spatial distribution range of a circle with a radius of 5 mm. The distance between the diffractive object 1 and the CCD detector 2 is 60mm, the resolution of the CCD detector 2 is 2048 × 2048, and the minimum unit is 7.4 μm × 7.4 μm. The detector assembly 3 is moved to perform a scan of 11 rows and 11 columns over the image plane 11 with a scan step of 2.22mm (2.22mm corresponding to 300 pixels).
The measurement device is used for measuring the transmission optical element and comprises the following steps:
1) and placing the optical element 10 to be measured in the parallel light path and perpendicular to the light beam, and determining the position of an image plane 11 formed by the optical element 10 to be measured through the beam reducer 9.
2) The detector assembly 3 is placed on the two-dimensional electric translation table 4, is placed in a light path to be detected, is perpendicular to the incident direction of the light beam, and meanwhile, the diffraction object 1 is located at the image surface 11.
3) The computer 5 controls the two-dimensional electric translation table 4 to make the detector assembly 3 perform 11 rows and 11 columns in the image plane 11Scanning, wherein the scanning step length l is 2.22mm, and the overlapping area between the wavefronts corresponding to two adjacent scanning positions is 72% of the aperture of the diffraction object 1; when the detector assembly 3 is located at the scanning position of the m row and n column, the CCD detector 2 records the intensity distribution I of diffraction spots at the scanning positionm,n，Im,nStoring the data in the computer 5 in a matrix form of 2048 multiplied by 2048 until the scanning is finished to obtain a group of diffraction spot data I1,1,I1,2…Im,n...I11,11。
4) The computer 5 performs iterative processing according to the diffraction spot data, and the specific steps are as follows:
(1) providing a random guess P of P rows and q columns for the illumination light on the surface of the diffractive object 11As initial values, p is 2048+ (11-1) × 300, and q is 2048+ (11-1) × 300. Providing the diffractive object 1 with a 2048 × 2048 random guess O0And constructing a corresponding diaphragm H to limit the distribution range of the diffraction object 1, the initial distribution of which is O1＝O0XH. And (3) bringing the acquired 11 x 11 diffraction spot data into iteration according to a random order, and finishing one iteration after all the diffraction spots are used for one updating.
(2) From PkTaking out the scanning position Rm,nDistribution of illumination light Pk(r-Rm,n) Which corresponds to the matrix P k1+ (m-1) x 300 to 2048+ (m-1) x 300, 1+ (n-1) x 300 to 2048+ (n-1) x 300, and a transmitted wave function after diffracting the object 1 is:
Figure GDA0002071216080000051
where k represents the number of iterations.
(3) Calculating the complex amplitude distribution at the CCD detector 2:
Figure GDA0002071216080000061
wherein
Figure GDA0002071216080000062
Representing a forward transmission process; and constraining the obtained complex amplitude, keeping the phase of the complex amplitude unchanged, and replacing the amplitude of the complex amplitude with the square root of the measured diffraction spot intensity:
Figure GDA0002071216080000063
the subscript c represents the updated complex amplitude distribution.
(4) Repeatedly transmitting the updated complex amplitude back to the plane of the diffractive object 1
Figure GDA0002071216080000064
Wherein
Figure GDA0002071216080000065
The reverse transport process is represented and the diffractive object 1 and the illumination light are updated using the following formula:
Figure GDA0002071216080000066
Figure GDA0002071216080000067
where max represents the maximum value, and represents the conjugate, α is 0.001, and β is 1. Then using the updated P'k(r-Rm,n) Replacement matrix PkLine 1+ (m-1). times.300 to 2048+ (m-1). times.300, and column 1+ (n-1). times.300 to 2048+ (n-1). times.300.
(5) P after updatek、Ok' (r) as an initial input, repeating steps (2) - (4) at the next scan position until one iteration is completed after all positions have been updated. Calculating an iteration error:
Figure GDA0002071216080000068
if EkAnd (5) stopping iteration and entering the step (6) if the iteration is less than 1%, otherwise, returning to the step (2) and repeating the calculation process.
(6) The illumination light P on the surface of the diffraction object (1) updated at this timekThe phase of the optical wavefront is the wavefront of the optical element to be measured. If the influence caused by uneven wavefront of the parallel light beam is further removed and the measurement precision is improved, the method can be used for further removing the influenceRemoving the optical element 10 to be measured from the optical path, and repeating the above steps 3) -4) to obtain the illumination light distribution P on the surface of the diffraction object 1 without the optical element 10 to be measuredb,kThe wavefront of the optical element to be measured is PkAnd Pb,kThe phase difference of (2).

Claims (6)

1. The high-resolution near-field wavefront measuring device is characterized by comprising a detector assembly (3) consisting of a diffraction object (1) and a CCD detector (2), a two-dimensional electric translation table (4) for placing the detector assembly (3) and a computer (5), wherein the diffraction object (1) and the CCD detector (2) are fixedly connected through a sleeve, and the diffraction object (1) is parallel to a target surface of the CCD detector (2); and the computer (5) is respectively connected with the CCD detector (2) and the two-dimensional electric translation table (4) for instrument control and data storage.
2. The near-field wavefront measuring device with high resolution according to claim 1, wherein the diffractive object (1) has a diffractive power in a certain spatial range S, and is opaque in the rest ranges, the distance between the diffractive object (1) and the target surface of the CCD detector (2) is Z, so that the diameter of a diffraction spot passing through the diffractive object (1) is equivalent to the diameter of the target surface of the CCD detector (2).
3. The near-field wavefront measuring device with high resolution according to claim 2, wherein the complex amplitude distribution of the diffractive object (1) is o (r), which can be measured in advance as a known quantity to improve the iterative convergence speed, or can be reconstructed as an unknown quantity simultaneously with the wavefront to be measured.
4. A high resolution near field wavefront measuring device according to any of claims 1-3, further comprising a laser (6), a spatial filter (7), a collimating lens (8) and a beam reducer (9); the optical element (10) to be measured is arranged between the collimating lens (8) and the beam reducer (9), and the diffraction object (1) is positioned on an image surface (11) of the optical element (10) to be measured;
the laser (6) emits coherent light which sequentially passes through the spatial filter (7) and the collimating lens (8) to form parallel light beams, and the parallel light beams are sequentially condensed by the optical element to be detected (10) and the beam reducer (9) and then vertically incident to an image plane (11) of the optical element to be detected (10), and are collected by the CCD detector (2).
5. A method of near field wavefront measurement using the high resolution near field wavefront measuring device of any of claims 1-3, the method comprising the steps of:
1) the computer (5) controls the two-dimensional electric translation table (4) to enable the detector assembly (3) to scan M rows and N columns, and the scanning step length l is smaller than the aperture of the diffraction object (1), so that wavefronts corresponding to two adjacent scanning positions are overlapped;
2) when the detector assembly (3) is positioned at the scanning position of the m-th row and n-th column, the CCD detector (2) records the intensity distribution I of diffraction spots at the positionm,nAnd stored in the computer (5) in a matrix form of a row a and a column b until the scanning is finished to obtain a group of intensity distribution data I of diffraction spots1,1,I1,2...Im,n...IM,N；
3) And the computer (5) performs iterative processing according to the diffraction spot data to realize wavefront reconstruction.
6. The method for near-field wavefront measurement according to claim 5, wherein the iterative processing of step 3) comprises the following specific steps:
1) providing a random guess P of P rows and q columns for the illumination light on the surface of the diffractive object (1)1As initial values, wherein p ═ a + (M-1) l, q ═ b + (N-1) l;
if the complex amplitude distribution O of the diffractive object (1) has been measured in advance, it is taken as a known quantity into the calculation without any updating in the following iterative process; if the complex amplitude distribution of the diffractive object (1) is not determined in advance, a random guess O of a row a and a column b is given to the diffractive object (1)0And a corresponding diaphragm H is constructed to limit the distribution range of the diffraction object (1), the initial distribution of which is O1＝O0×H；
Bringing the acquired intensity distribution data of the diffraction spots into iteration according to a random order, and considering that one iteration is finished after all the diffraction spots are used for one updating;
2) from PkTaking out the scanning position Rm,nDistribution of illumination light Pk(r-Rm,n) Which corresponds to the matrix PkFrom row 1+ (m-1) l to a + (m-1) l, and column 1+ (n-1) l to b + (n-1) l, the transmitted wave function after diffracting the object (1) is:
Figure FDA0002717289680000021
wherein k represents the number of iterations;
3) calculating the complex amplitude distribution at the CCD detector (2):
Figure FDA0002717289680000022
wherein
Figure FDA0002717289680000023
Representing a forward transmission process; and constraining the obtained complex amplitude, keeping the phase of the complex amplitude unchanged, and replacing the amplitude of the complex amplitude with the square root of the measured diffraction spot intensity:
Figure FDA0002717289680000024
subscript c represents the updated complex amplitude distribution;
4) the updated complex amplitude is transmitted back to the plane of the diffraction object (1)
Figure FDA0002717289680000025
Wherein
Figure FDA0002717289680000026
Representing the reverse transport process and updating the diffractive object (1) and the illumination light with the following formula:
Figure FDA0002717289680000027
Figure FDA0002717289680000028
wherein max represents the maximum value, x represents the conjugate, α is a parameter that prevents the denominator from being meaningless and self-defined, and β is used to adjust the update step size;
then using the updated P'k(r-Rm,n) Replacement matrix PkLine 1+ (m-1) l to a + (m-1) l, column 1+ (n-1) l to b + (n-1) l;
5) p after updatek、O′k(r) as an initial input, repeating steps 2) -4) at the next scanning position until one iteration is completed after all positions are updated;
calculating an iteration error:
Figure FDA0002717289680000031
if EkStopping iteration and entering step 6) if the threshold value is smaller than the set threshold value, otherwise, returning to step 2) and repeating the calculation process;
6) the illumination light P on the surface of the diffraction object (1) updated at this timekThe phase of (1) is the wavefront to be measured.
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