CN110158154A - Constant-current stabilizer and crystal pulling furnace - Google Patents

Abstract

The present invention provides a stabilizing device and a crystal pulling furnace, wherein the stabilizing device is applied to a crystal pulling furnace, and includes: a first stabilizing cover, and a plurality of first through holes are arranged on the first stabilizing cover, so The first swirl hood is used to be installed in the auxiliary furnace chamber of the crystal pulling furnace to adjust the flow direction of the inert gas passing into the crystal pulling furnace; the second swirl hood, on the second swirl hood A plurality of second through holes are provided, and the second turbulence cover is used to be installed in the auxiliary furnace chamber of the crystal pulling furnace, and is arranged opposite to the first turbulence cover, and is used to adjust the The flow direction of the inert gas is adjusted by the flow stabilization hood. According to the flow stabilizing device of the present invention, the flow direction of the inert gas can be restricted, the swing amplitude of the single crystal silicon rod can be reduced, the probability of dislocation phenomenon during single crystal growth can be reduced, and impurities can be prevented from polluting the crystal rod and the side wall of the thermal field components. and erosion.

Description

Steady flow device and crystal pulling furnace

technical field

The invention relates to the technical field of semiconductor manufacturing, in particular to a current stabilizing device and a crystal pulling furnace.

Background technique

Magnetic Field Applied Czochralski Method, MCZ (Magnetic Field Applied Czochralski Method), is currently the most common crystal pulling process method. a form of content.

In the prior art, a crystal pulling furnace is used to manufacture monocrystalline silicon rods, and the polysilicon raw material is melted through the quartz crucible in the crystal pulling furnace. In the molten state of the polysilicon raw material, the following reaction occurs in the quartz crucible: SiO ₂ (s)→Si(l )+2O, the oxygen atoms generated by the wall of the quartz crucible are evenly distributed in the silicon solution by the stirring effect of natural convection, and some oxygen atoms existing on the surface of the silicon solution will undergo the following reaction: Si(l)+ O→SiO(g), volatilized in the form of silicon monoxide (SiO). In order to control the impurities in the crystal pulling furnace, it is necessary to evacuate the furnace and then introduce argon gas. As a protective gas, argon gas is fed through the upper part of the auxiliary furnace chamber, and devices such as guide tubes are installed in the main furnace chamber to adjust the flow direction and speed of argon gas and improve the oxide transmission direction in the crystal pulling furnace. However, when the argon gas is passed into the sub-furnace chamber of the crystal pulling furnace, since the velocity range of the argon gas in the furnace is between 0.9m/s and 8.0m/s, the overall turbulent flow in the sub-furnace chamber is relatively large. The traction rope is long, and it is easy to cause shaking at the initial stage of drawing the single crystal silicon rod, which is not conducive to the stable contact of the growth crystal interface, and easily causes crystal dislocation, etc., which increases the number of remelting of the crystal rod and increases the cost. It will also cause more turbulence in the main furnace chamber, which is not conducive to the discharge of impurities, resulting in impurities sticking to the side walls of the thermal field components.

Contents of the invention

In view of this, the present invention provides a flow stabilizing device. By installing the flow stabilizing device in the sub-furnace chamber of the crystal pulling furnace, the flow direction of the inert gas passing into the sub-furnace chamber can be arranged to solve the problem of gas in the sub-furnace chamber. More turbulent flow makes the single crystal silicon rod easy to shake in the early stage of growth, which leads to unstable contact between the growth crystal interface and the melt surface, and the crystal is prone to dislocations.

In order to solve the above technical problems, the present invention provides a flow stabilizing device.

The current stabilizing device according to the embodiment of the first aspect of the present invention is applied to a crystal pulling furnace, including:

The first swirl cover, the first swirl cover is provided with a plurality of first through holes, and the first swirl cover is used to be installed in the auxiliary furnace chamber of the crystal pulling furnace to adjust the access to the The flow direction of the inert gas in the crystal pulling furnace;

The second swirl hood, the second swirl hood is provided with a plurality of second through holes, the second swirl hood is used to be installed in the auxiliary furnace chamber of the crystal pulling furnace, and is connected with the first The flow stabilization hoods are arranged opposite to each other, and are used to adjust the flow direction of the inert gas adjusted by the first flow stabilization hood.

Preferably, the first turbulence hood is formed into a funnel shape with a wide opening at one end and a narrow opening at the other end, and the first turbulence hood is used to rectify the inert gas flowing into the crystal pulling furnace, so The inert gas flows in from the wide mouth end of the first steady flow cover, and flows out from the narrow mouth end;

The second swirl hood is formed into a funnel shape with a wide opening at one end and a narrow opening at the other end. The narrow end of the second swirl hood is opposite to the narrow end of the first swirl hood. The two stabilizing hoods are used to evenly distribute the rectified inert gas.

Preferably, the flow stabilization device also includes:

The distance adjustment mechanism is used to adjust the distance between the first flow stabilization cover and the second flow stabilization cover to expand the flow stabilization interval.

Preferably, the distance adjustment mechanism includes:

The spacing adjustment bracket is connected to the first swirl cover and the second swirl cover respectively, or the spacing adjustment bracket is connected to the first swirl cover or the second swirl cover;

The first driving mechanism is connected with the distance adjusting bracket, and is used to drive the distance adjusting bracket, so that the distance adjusting bracket drives the first swirl cowl and the second swirl cowl to move closer to or move away from each other.

Preferably, the flow stabilization device also includes:

A height adjustment mechanism, connected to the distance adjustment mechanism, used to drive the distance adjustment mechanism to move to adjust the heights of the first swirl hood and the second swirl hood in the auxiliary furnace chamber of the crystal pulling furnace .

Preferably, the first driving mechanism is connected to the distance adjustment bracket through a transmission component, and the transmission component includes a transmission belt or a transmission chain.

Preferably, each of the first flow stabilization covers and each of the second flow stabilization covers is a set, and the flow stabilization device includes multiple sets of first flow stabilization covers and second flow stabilization covers.

Preferably, the porosity of the first swirl cap and the second swirl cap is 80%-95%.

Preferably, the cross sections of the first through hole and the second through hole are circular, square, triangular, or mixed.

Preferably, the cross-sections of the first through hole and the second through hole are circular, and the diameters of the first through hole and the second through hole range from 5 mm to 20 mm.

The crystal pulling furnace according to the embodiment of the second aspect of the present invention includes a furnace body, the furnace body includes a main furnace chamber and an auxiliary furnace chamber communicated with the main furnace chamber, and the auxiliary furnace chamber is provided with the Steady flow device.

Preferably, the flow stabilizing device includes a distance adjustment mechanism, which is used to adjust the distance between the first flow stabilization cover and the second flow stabilization cover to expand the flow stabilization interval;

One end of the first swirl hood and the second swirl hood pass through the furnace body of the auxiliary furnace chamber, and one end of the first swirl hood and/or one end of the second swirl hood It is connected with the distance adjusting mechanism.

Preferably, the distance adjustment mechanism includes:

A spacing adjustment bracket, the spacing adjustment bracket is respectively connected to one end of the first swirl cover and one end of the second swirl cover, or, the spacing adjustment bracket is connected to one end of the first swirl cover or the One end of the second swirl is connected;

The first driving mechanism is connected with the distance adjusting bracket and is used to drive the distance adjusting bracket to move so that the first swirler and the second swirl move closer to or move away from each other in the auxiliary furnace chamber .

The beneficial effects of above-mentioned technical scheme of the present invention are as follows:

1) According to the flow stabilizing device of the embodiment of the present invention, the flow direction of the inert gas passing into the sub-furnace of the crystal pulling furnace can be arranged to reduce the turbulence intensity of the inert gas inside the sub-furnace of the crystal pulling furnace. flow direction, reduce the swing of the single crystal silicon rod caused by the air flow, help the stable contact between the single crystal silicon rod and the molten liquid surface, reduce the probability of single crystal growth dislocation, and at the same time, reduce the unsatisfactory temperature of the main furnace chamber. The pure matter is carried to the auxiliary furnace chamber by the turbulent flow, causing pollution and erosion to the side wall of the ingot and the thermal field components;

2) The first turbulence hood and the second turbulence hood have a relatively high opening ratio, which can be set according to the actual situation to further control the flow rate of the inert gas in the furnace and reduce the impurities in the main furnace chamber being carried by the turbulent flow to the Auxiliary furnace chamber to prevent contamination and erosion of the side walls of crystal ingots and thermal field components;

3) Through the distance adjustment mechanism, the distance between the first steady flow hood and the second steady flow shield can be changed to expand the steady flow interval, further improve the single crystal growth environment in the main furnace chamber, suppress the occurrence of turbulent flow, and reduce the probability of crystal remelting;

4) By controlling the heights of the first swirl hood and the second swirl hood at the auxiliary furnace chamber, crystal ingots of different lengths can be grown.

Description of drawings

Fig. 1 a is the front view of a structure of flow stabilizing device of the present invention;

Figure 1b is a top view of the flow stabilization device in Figure 1;

Fig. 1c is the front view of another structure of the flow stabilizing device of the present invention;

Figure 1d is a top view of the flow stabilization device in Figure 1c;

Fig. 1 e is the front view of another structure of the flow stabilizing device of the present invention;

Figure 1f is a top view of the flow stabilization device in Figure 1e;

Fig. 1 g is the front view of another structure of the flow stabilizing device of the present invention;

Fig. 2a is a schematic structural view of the first and second swirl hoods of the present invention;

Fig. 2b is another schematic view of the structure of the first swirl cover and the second swirl cover of the present invention;

Fig. 2c is another schematic structural view of the first and second swirl hoods of the present invention;

Fig. 2d is another structural schematic view of the first and second swirl hoods of the present invention;

Fig. 2e is another schematic structural view of the first and second swirl hoods of the present invention;

Fig. 2f is another schematic structural view of the first and second swirl hoods of the present invention;

Fig. 2g is another schematic structural view of the first and second swirl hoods of the present invention;

Fig. 2h is another schematic structural view of the first and second swirl hoods of the present invention;

Fig. 2i is another schematic structural view of the first and second swirl hoods of the present invention;

Fig. 3 a is a structural representation of the transmission part of the present invention;

Fig. 3b is another schematic structural view of the transmission part of the present invention;

Fig. 3c is another structural schematic diagram of the transmission part of the present invention;

Fig. 3d is another structural schematic diagram of the transmission part of the present invention;

Fig. 4 is a state diagram of gas flow in a crystal pulling furnace of the present invention;

FIG. 5 is a state diagram of gas flow in another crystal pulling furnace of the present invention.

reference sign

Steady flow device 100;

The first swirl cover 110; the first through hole 111;

The second swirl cover 120; the second through hole 121;

The spacing adjustment mechanism 130; the spacing adjustment bracket 131; the first driving mechanism 132; the transmission part 133;

height adjustment mechanism 140;

Crystal pulling furnace 200;

Furnace body 210; main furnace chamber 211; auxiliary furnace chamber 212; guide tube 213;

Inert gas 300;

Impurities 400.

Detailed ways

In order to make the purpose, technical solutions and advantages of the embodiments of the present invention more clear, the following will clearly and completely describe the technical solutions of the embodiments of the present invention in conjunction with the drawings of the embodiments of the present invention. Apparently, the described embodiments are some, not all, embodiments of the present invention. All other embodiments obtained by those skilled in the art based on the described embodiments of the present invention belong to the protection scope of the present invention.

The flow stabilizing device 100 according to the embodiment of the present invention will be described in detail below with reference to the accompanying drawings.

As shown in FIG. 1 a to FIG. 5 , a current stabilization device 100 according to an embodiment of the present invention is applied to a crystal pulling furnace 200 and includes a first current stabilization hood 110 and a second current stabilization hood 120 .

Specifically, a plurality of first through holes 111 are provided on the first swirl hood 110, and the first swirl hood 110 is used to be installed in the auxiliary furnace chamber 212 of the crystal pulling furnace 200 to regulate the flow into the crystal pulling furnace 200. The flow direction of the inert gas 300; the second steady flow hood 120 is provided with a plurality of second through holes 121, the second steady flow hood 120 is used to be installed in the auxiliary furnace chamber 212 of the crystal pulling furnace 200, and is connected with the first steady flow The cover 110 is arranged opposite to each other, and is used to adjust the flow direction of the inert gas 300 adjusted by the first flow stabilization cover 110 .

That is to say, after the inert gas 300 is passed into the auxiliary furnace chamber 212 of the crystal pulling furnace 200, the inert gas 300 first passes through the first through hole 111 of the first steady flow cover 110, and its flow direction is sorted out from the original The turbulent flow becomes a vertical downward flow, thereby reducing the turbulent flow of the inert gas 300, and then the flow flows out from the second through hole 121 of the second stabilization cover 120 and combs here to form a more stable and orderly flow, When the combed gas flows through the surface of the single crystal silicon rod in the main furnace chamber 211, it can reduce the swing amplitude of the single crystal silicon rod due to the influence of the air flow, contribute to the stable contact between the single crystal silicon rod and the molten liquid surface, and reduce the temperature of the single crystal silicon rod. Increase the probability of growth dislocation and other phenomena, and improve the production efficiency of single crystal silicon rods. At the same time, due to the uniform and stable flow of air flow, it can reduce the impurity 400 in the main furnace chamber 211 being carried to the auxiliary furnace chamber 212 by turbulent flow, which is beneficial to the discharge of the impurity 400 and avoids the impact of the impurity 400 on the ingot and the thermal field. Part sidewalls cause problems such as contamination and erosion.

Therefore, according to the flow stabilizing device 100 of the embodiment of the present invention, the flow direction of the inert gas 300 passing into the sub-furnace 212 of the crystal pulling furnace 200 can be sorted out to make the gas flow more orderly and reduce the cost of the sub-furnace of the crystal pulling furnace 200. The turbulence intensity of the inert gas 300 inside the chamber 212 restricts the flow direction of the inert gas 300, reduces the swing of the single crystal silicon rod caused by the air flow, contributes to the stable contact between the single crystal silicon rod and the molten liquid surface, and reduces the growth potential of the single crystal. Increase the production efficiency of single crystal silicon rods, reduce the impurity 400 in the main furnace chamber 211 being carried to the auxiliary furnace chamber 212 by turbulent flow, and avoid the pairing of the impurity 400 on the crystal rod and the thermal field components The walls cause problems such as pollution and erosion.

Preferably, as shown in Fig. 1c, Fig. 4 and Fig. 5, the first turbulence hood 110 is formed into a funnel shape with a wide opening at one end and a narrow opening at the other end. The inert gas 300 inside is rectified, the inert gas 300 flows in from the wide mouth end of the first steady flow cover 110, and flows out from the narrow mouth end, and the second steady flow cover 120 is formed into a funnel shape with a wide mouth at one end and a narrow mouth at the other end. The narrow opening end of the flow stabilization cover 120 is arranged opposite to the narrow opening end of the first flow stabilization cover 110 , and the second flow stabilization cover 120 is used for evenly splitting the flow of the rectified inert gas 300 .

That is to say, both the first flow stabilization cover 110 and the second flow stabilization cover 120 are funnel-shaped, that is, one end is a wide mouth and the other end is a narrow opening. The narrow mouth ends of 120 are arranged adjacently. When the flow is steady, the inert gas 300 first flows in from the wide mouth end of the first steady flow hood 110, and the narrow mouth end flows out. After the inert gas 300 passes through the first through hole 111, the flow direction is combed, rectification to reduce the turbulent flow of the inert gas 300, and then the airflow flows in from the narrow mouth end of the second stabilization cover 120 and flows out from the wide mouth end, and the rectified airflow passes through the second through hole 121 to form a more stable flow The orderly air flow further reduces the swing amplitude of the single crystal silicon rod due to the influence of the air flow, reduces the probability of occurrence of dislocations in the growth of the single crystal silicon rod, further improves the production efficiency of the single crystal silicon rod, and is more conducive to the discharge of impurities 400. Good protection of ingot and thermal field parts.

Wherein, the shapes of the first swirl cap 110 and the second swirl cap 120 in the present invention are not limited thereto. In other embodiments of the present invention, swirl caps of other shapes can also be used, such as conical, etc., which can be It is designed according to the shape of the secondary chamber 212 of the crystal pulling furnace, and the shapes of the first swirl hood 110 and the second swirl hood 120 may also be different.

The inert gas 300 in the present invention may preferably be argon, which has better stability as a protective gas.

According to an embodiment of the present invention, the flow stabilization device 100 further includes a distance adjustment mechanism 130 for adjusting the distance between the first flow stabilization cover 110 and the second flow stabilization cover 120 to expand the flow stabilization interval.

In other words, the first flow stabilization cover 110 and the second flow stabilization cover 120 are connected through the distance adjustment mechanism 130, and the distance adjustment mechanism 130 can adjust the distance between the first flow stabilization cover 110 and the second flow stabilization cover 120, so that the The air flow of the first flow stabilization hood 110 flows to the second flow stabilization hood 120 after passing through a longer flow stabilization interval, further stabilizing the flow velocity of the gas, and the air flow becomes more stable and orderly after passing through the second flow stabilization hood 120, so as to further improve the main furnace chamber 211 The growth environment of monocrystalline silicon rods.

Preferably, the distance adjustment mechanism 130 includes a distance adjustment bracket 131 and a first drive mechanism 132, and the distance adjustment bracket 131 is respectively connected with the first stabilizer cover 110 and the second stabilizer cover 120, or, the distance adjustment bracket 131 is connected with the first stabilizer cover 120. The flow cover 110 or the second flow stabilization cover 120 is connected, and the first driving mechanism 132 is connected with the spacing adjustment bracket 131 for driving the spacing adjustment bracket 131, so that the spacing adjustment bracket 131 drives the first flow stabilization cover 110 and the second flow stabilization cover 120 move closer or away from each other.

That is to say, the first swirl cover 110 and the second swirl cover 120 can be connected to the spacing adjustment bracket 131 respectively, or the first swirl cover can be connected to the spacing adjustment bracket, or the second swirl cover 120 can be connected to the spacing adjustment bracket. The adjustment bracket 131 is connected, and when the spacing adjustment bracket 131 is connected with the first flow stabilization cover 110 and the second flow stabilization cover 120, the first driving mechanism 132 can drive the spacing adjustment bracket 131 to drive the first flow stabilization cover 110 and the second flow stabilization cover The covers 120 move closer or farther away from each other, and then adjust the distance between the first flow stabilization cover 110 and the second flow stabilization cover 120. This distance can effectively improve the flow stabilization effect of the airflow, so that the airflow can adjust the direction again after passing through the distance. It is not only convenient to control the flow rate, but also can better adjust the flow direction of the airflow. It is also possible to use the spacing adjustment bracket 131 to connect with the first flow stabilization cover 110, while the second flow stabilization cover 120 is fixed, or the first flow stabilization cover 110 is fixed, and the spacing adjustment bracket 131 is connected to the second flow stabilization cover 120, and the drive The first swirl cover 110 or the second swirl cover 120 is used to adjust the distance between the first swirl cover 110 and the second swirl cover 120 .

Preferably, the first driving mechanism 132 is connected to the distance adjusting bracket 131 through a transmission component 133, and the transmission component 133 includes a transmission belt or a transmission chain.

As shown in Figures 3a to 3d, the first driving mechanism 132 and the spacing adjustment bracket 131 can be connected by a transmission belt or a transmission chain, and the transmission belt can be a transmission mode of a gear and a transmission belt, or a transmission mode of a transmission chain and a gear. This structure has Better transmission effect, and the movement is more stable. Of course, in other embodiments of the present invention, other structures can also be adopted to realize that the first drive mechanism 132 drives the distance adjustment bracket 131 to move, and then realize that the first drive mechanism 132 drives the first swirl cover 110 or the second swirl cover 120 To move, wherein, the first driving mechanism 132 can adopt a motor. Driving methods such as air cylinders can also be used, which are not limited here.

According to another embodiment of the present invention, the flow stabilization device 100 further includes a height adjustment mechanism 140, the height adjustment mechanism 140 is connected with the spacing adjustment mechanism 130, and is used to drive the spacing adjustment mechanism 130 to move to adjust the first flow stabilization cover 110 and the second spacing adjustment mechanism. The height of the swirl hood 120 in the auxiliary furnace chamber 212 of the crystal pulling furnace 200 .

As shown in Figure 5, the height adjustment mechanism 140 is connected with the spacing adjustment mechanism 130, and the height adjustment mechanism 140 can drive the spacing adjustment mechanism 130 to move up and down, so as to adjust the first flow stabilization cover 110 and the second flow stabilization cover 120 in the crystal pulling furnace. The height of the furnace chamber 212 further enables the crystal pulling furnace to adapt to growing crystal rods of different lengths, which improves the flexibility of use of the crystal pulling furnace.

Preferably, the height adjustment mechanism 140 and the distance adjustment mechanism 130 can also be connected by a transmission component 133 , and the specific structure can be referred to the transmission component 133 in the above embodiment, which will not be repeated here.

According to some embodiments of the present invention, each first flow stabilization cover 110 and each second flow stabilization cover 120 is a set, and the flow stabilization device 100 includes multiple sets of first flow stabilization covers 110 and second flow stabilization covers 120 .

As shown in Fig. 1e to Fig. 1g, the flow stabilization device 100 includes a combination of multiple sets of first flow stabilization hoods 110 and second flow stabilization hoods 120. 212 is provided with a combination of a first swirl cover 110 and a second swirl cover 120, or a combination of multiple sets of a first swirl cover 110 and a second swirl cover 120, so that, under appropriate circumstances, The flow direction and flow rate of the inert gas 300 in the sub-furnace 212 of the crystal pulling furnace can be better adjusted to further improve the flexibility of use of the flow stabilization device 100 .

Optionally, the porosity of the first swirl cover 110 and the second swirl cover 120 is 80%-95%.

That is to say, the opening ratio of the first swirl cover 110 and the second swirl cover 120 can be controlled between 80% and 95%, which can better control the flow velocity and distribution of the inert gas 300 Uniformity, to ensure a smooth and orderly flow of gas, wherein the opening ratio of the first flow stabilization cover 110 accounts for the sum of the cross-sectional areas of all the first through holes 111 on the first flow stabilization cover 110 The percentage of the surface area of the peripheral wall of the cover 110, the opening rate of the second swirl cover 120 is the sum of the cross-sectional areas of all the second through holes 121 on the second swirl cover 120 to the outer circumference of the second swirl cover 120 The percentage of the surface area of the wall.

Further, the cross sections of the first through hole 111 and the second through hole 211 are circular, square, triangular, or mixed.

As shown in Figures 2a to 2e, the shape of the cross-section of the first through hole 111 and the second through hole 211 can be set according to the actual situation, and different shapes and sizes will affect the opening ratio. Therefore, it can be set according to the actual situation. Choose circular, triangular, square or other shapes, and you can also choose several shapes mixed to ensure that the opening rate is controlled at 80% to 95%, wherein the shape of the cross section of the hole is not limited.

In a preferred embodiment of the present invention, the cross-sections of the first through hole 111 and the second through hole 211 are circular, and the diameters of the first through hole 111 and the second through hole 211 range from 5 mm to 20 mm.

That is to say, the size of the aperture in the present invention can be limited within a certain range, and the opening rate can be ensured by controlling the size of the aperture. Preferably, when the cross-sections of the first through hole 111 and the second through hole 211 are circular When shaped, the aperture range is controlled between 5 and 20mm to better control the flow direction and velocity of the airflow. Of course, in other embodiments of the present invention, the shapes of the cross sections of the first through hole 111 and the second through hole 120 and the shape of the cross section of the first through hole 111 and the second through hole 120 can also be appropriately adjusted according to the size of the surface area of the first swirl cover 110 and the second swirl cover 120 . The size of the aperture is not limited here.

In short, according to the flow stabilizing device 100 of the embodiment of the present invention, the flow direction of the inert gas 300 passing into the sub-furnace chamber 212 of the crystal pulling furnace 200 can be sorted out, so that the gas flow direction is more orderly, and the inertness in the sub-furnace chamber 212 can be reduced. The turbulence intensity of the gas 300 restricts the flow direction of the inert gas 300, reduces the swing of the single crystal silicon rod caused by the air flow, helps the stable contact between the single crystal silicon rod and the molten liquid surface, and reduces the occurrence of dislocations in the growth of the single crystal The probability of improving the production efficiency of single crystal silicon rods can reduce the impurity 400 in the main furnace chamber 211 being carried to the auxiliary furnace chamber 212 by turbulent flow, so as to avoid the pollution and damage caused by the impurities 400 to the crystal rod and the side wall of the thermal field components. erosion etc. At the same time, the distance between the first swirl hood 110 and the second swirl hood 120 can be adjusted to further adjust the flow velocity of the air flow and ensure the stability of the air flow. The height of the chamber 212 can be adapted to grow crystal rods of different lengths, which improves the flexibility of using the flow stabilization device 100 .

As shown in Fig. 1 and Fig. 5, the crystal pulling furnace 200 of the embodiment of the present invention includes a furnace body 210, and the furnace body 210 includes a main furnace chamber 211 and an auxiliary furnace chamber 212 communicated with the main furnace chamber 211, and the auxiliary furnace chamber 212 is provided with the flow stabilizing device 100 as in the above-mentioned embodiment.

That is to say, the flow stabilizing device 100 is arranged in the sub-furnace chamber 212 of the crystal pulling furnace 200. When the flow is stabilized, the inert gas 300 flows in from the upper end of the sub-furnace chamber 212, and passes through the first stabilizing hood 110 and the second stabilizing flow cover 110 in sequence. Cover 120, the guide tube 213 of the main furnace chamber 211, after the inert gas 300 passes through the first flow stabilization cover 110 and the second flow stabilization cover 120, its flow direction is changed to make the air flow more orderly, and the redirected inert gas 300 After entering the main furnace chamber 211, the flow of the air flow is smooth and orderly, which reduces the turbulence of the inert gas 300. When the air flow passes through the guide tube 213 of the main furnace chamber 211 and flows to the surface of the single crystal silicon rod, it can reduce the temperature of the single crystal silicon rod. The swing range of the silicon rod due to the influence of the airflow is conducive to the stable contact between the single crystal silicon rod and the molten liquid surface, reduces the probability of occurrence of dislocations in the growth of the single crystal, improves the production efficiency of the single crystal silicon rod, and can reduce the main furnace chamber 211 The impurity 400 is carried to the auxiliary furnace chamber 212 by the turbulent flow, which is conducive to the timely discharge of the impurity 400 from the main furnace chamber, and avoids problems such as pollution and erosion caused by the impurity 400 to the crystal rod and the side wall of the thermal field components.

Preferably, the flow stabilization device 100 also includes a distance adjustment mechanism 130 for adjusting the distance between the first flow stabilization cover 110 and the second flow stabilization cover 120 to expand the flow stabilization interval, the first flow stabilization cover 110 and the second flow stabilization cover 110 One end of the swirl hood 120 passes through the furnace body of the auxiliary furnace chamber 212 , and one end of the first swirl hood 110 and/or one end of the second swirl hood 120 is connected to the distance adjusting mechanism 130 .

That is to say, one end of the first swirl hood 110 and the second swirl hood 120 can pass through the furnace wall of the auxiliary furnace chamber 212 and be connected to the distance adjustment mechanism 130 , or one end of the first swirl hood 110 Or one end of the second swirl hood 120 passes through the furnace wall of the auxiliary furnace chamber 212 and is connected to the spacing adjustment mechanism 130, thereby realizing the spacing between the first swirl hood 110 and the second swirl hood 120 by the spacing adjustment mechanism 130 adjustment. Of course, in other embodiments of the present invention, it can also be adopted that one end of the distance adjusting mechanism 130 passes through the furnace wall of the auxiliary furnace chamber 212 and is connected with the first swirl hood 110 and/or the second swirl hood 120, where Not as limiting.

Preferably, the spacing adjustment mechanism 130 includes a spacing adjustment bracket 131 and a first drive mechanism 132, and one end of the spacing adjustment bracket 131 is connected to the first swirl cover 110 and the second swirl cover 120 respectively, or the spacing adjustment bracket is connected to the first swirl cover 120. One end of the flow stabilization cover or one end of the second flow stabilization cover is connected, and the connection between the first driving mechanism 132 and the distance adjustment bracket 131 is used to drive the distance adjustment support 131 to move closer or away from each other to adjust the first flow stabilization cover 110 and the second flow stabilization cover. The distance between the two stabilized flow shields 120 .

That is to say, the spacing adjustment bracket 131 can be arranged outside the auxiliary furnace chamber, and one end of the first swirl hood 110 and/or the second swirl hood 120 passes through the furnace wall of the auxiliary furnace chamber and is connected to the spacing adjustment bracket. The driving mechanism 132 is connected with the spacing adjustment bracket 131, and the first driving mechanism drives the spacing adjustment bracket to move so that the first swirl cover 110 and the second swirl cover 120 move up and down in the auxiliary furnace chamber 212, thereby controlling the first swirl cover 110 and the second stabilizing cover 120 to better control the flow direction and velocity of the inert gas, as in the above embodiment, the first stabilizing cover 110 and the second stabilizing cover 110 can be adjusted through the height adjustment mechanism The height of the cover 120 in the auxiliary furnace chamber 212 is suitable for growing crystal rods of different lengths, which improves the flexibility of the crystal pulling furnace.

The flow stabilization device 100 in the present invention adopts the flow stabilization device 100 of the above-mentioned embodiment. Since the structure and technical effects of the flow stabilization device 100 have been described in detail in the above embodiments, other specific structures and effects of the flow stabilization device Please refer to the current stabilizing device 100 in the above-mentioned embodiments, which will not be repeated here.

The crystal pulling furnace 200 of the present invention can reduce the swing of the single crystal silicon rod caused by air flow, contribute to the stable contact between the single crystal silicon rod and the molten liquid surface, reduce the probability of occurrence of phenomena such as single crystal growth dislocation, and improve the single crystal silicon rod. The production efficiency of crystal silicon rods can reduce the impurity 400 in the main furnace chamber 211 being carried to the auxiliary furnace chamber 212 by turbulent flow, avoiding the pollution and erosion caused by the impurities 400 to the crystal rods and the side walls of the thermal field components.

Unless otherwise defined, the technical terms or scientific terms used in the present invention shall have the usual meanings understood by those skilled in the art to which the present invention belongs. "First", "second" and similar words used in the present invention do not indicate any order, quantity or importance, but are only used to distinguish different components. Words such as "connected" or "connected" are not limited to physical or mechanical connections, but may include electrical connections, whether direct or indirect. "Up", "Down", "Left", "Right" and so on are only used to indicate the relative positional relationship. When the absolute position of the described object changes, the relative positional relationship also changes accordingly.

The above description is a preferred embodiment of the present invention, it should be pointed out that for those of ordinary skill in the art, without departing from the principle of the present invention, some improvements and modifications can also be made, and these improvements and modifications can also be made. It should be regarded as the protection scope of the present invention.

Claims (13)

1. A steady flow device, applied to a crystal pulling furnace, is characterized in that, comprising: The first swirl cover, the first swirl cover is provided with a plurality of first through holes, and the first swirl cover is used to be installed in the auxiliary furnace chamber of the crystal pulling furnace to adjust the access to the The flow direction of the inert gas in the auxiliary furnace chamber of the crystal pulling furnace; The second swirl hood, the second swirl hood is provided with a plurality of second through holes, the second swirl hood is used to be installed in the auxiliary furnace chamber of the crystal pulling furnace, and is connected with the first The flow stabilization hoods are arranged opposite to each other, and are used to adjust the flow direction of the inert gas adjusted by the first flow stabilization hood. 2. The flow stabilization device according to claim 1, characterized in that, the first flow stabilization cover is formed into a funnel shape with a wide opening at one end and a narrow opening at the other end, and the first flow stabilization cover is used to counteract the inlet The inert gas in the crystal pulling furnace is rectified, the inert gas flows in from the wide mouth end of the first steady flow hood, and flows out from the narrow mouth end; The second swirl hood is formed into a funnel shape with a wide opening at one end and a narrow opening at the other end. The narrow end of the second swirl hood is opposite to the narrow end of the first swirl hood. The two stabilizing hoods are used to evenly distribute the rectified inert gas. 3. The flow stabilizing device according to claim 1, further comprising: The distance adjustment mechanism is used to adjust the distance between the first flow stabilization cover and the second flow stabilization cover to expand the flow stabilization interval. 4. The flow stabilizing device according to claim 3, wherein the spacing adjustment mechanism comprises: The spacing adjustment bracket is connected to the first swirl cover and the second swirl cover respectively, or the spacing adjustment bracket is connected to the first swirl cover or the second swirl cover; The first driving mechanism is connected with the distance adjusting bracket, and is used to drive the distance adjusting bracket, so that the distance adjusting bracket drives the first swirl cowl and the second swirl cowl to move closer to or move away from each other. 5 . The flow stabilizing device according to claim 4 , wherein the first driving mechanism is connected to the spacing adjustment bracket through a transmission component, and the transmission component includes a transmission belt or a transmission chain. 6. The flow stabilizing device according to claim 4, further comprising: A height adjustment mechanism, connected to the distance adjustment mechanism, used to drive the distance adjustment mechanism to move to adjust the heights of the first swirl hood and the second swirl hood in the auxiliary furnace chamber of the crystal pulling furnace . 7. The flow stabilization device according to claim 1, wherein each of the first flow stabilization covers and each of the second flow stabilization covers forms a group, and the flow stabilization device includes multiple groups of first Spoiler and second spinner. 8 . The flow stabilizing device according to claim 1 , wherein the porosity of the first flow stabilization cover and the second flow stabilization cover is 80%-95%. 9. The flow stabilizing device according to claim 1, characterized in that, the cross-sections of the first through hole and the second through hole are circular, square, triangular, or a combination of them. 10. The flow stabilizing device according to claim 9, wherein the cross-sections of the first through hole and the second through hole are circular, and the diameters of the first through hole and the second through hole are The range is between 5 and 20mm. 11. A crystal pulling furnace, characterized in that it comprises a furnace body, the furnace body includes a main furnace chamber and an auxiliary furnace chamber communicated with the main furnace chamber, and the auxiliary furnace chamber is provided with the The flow stabilizing device described in any one. 12. The crystal pulling furnace according to claim 11, wherein the flow stabilization device comprises a distance adjustment mechanism for adjusting the distance between the first flow stabilization cover and the second flow stabilization cover to Expand the steady flow interval; One end of the first swirl hood and the second swirl hood pass through the furnace body of the auxiliary furnace chamber, and one end of the first swirl hood and/or one end of the second swirl hood It is connected with the distance adjusting mechanism. 13. The crystal pulling furnace according to claim 12, wherein the distance adjustment mechanism comprises: A spacing adjustment bracket, the spacing adjustment bracket is respectively connected to one end of the first swirl cover and one end of the second swirl cover, or, the spacing adjustment bracket is connected to one end of the first swirl cover or the One end of the second swirl is connected; The first driving mechanism is connected with the distance adjusting bracket, and is used to drive the distance adjusting bracket to move so that the first swirler and the second swirl move closer to or move away from each other in the auxiliary furnace chamber .