CN110132999A - A kind of imaging system and method detecting FPD substrate - Google Patents

A kind of imaging system and method detecting FPD substrate Download PDF

Info

Publication number
CN110132999A
CN110132999A CN201910448588.XA CN201910448588A CN110132999A CN 110132999 A CN110132999 A CN 110132999A CN 201910448588 A CN201910448588 A CN 201910448588A CN 110132999 A CN110132999 A CN 110132999A
Authority
CN
China
Prior art keywords
illumination device
image
line
fpd substrate
dark
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
CN201910448588.XA
Other languages
Chinese (zh)
Other versions
CN110132999B (en
Inventor
李波
曾耀
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Wuhan Zhong Dao Optoelectronic Device Co Ltd
Original Assignee
Wuhan Zhong Dao Optoelectronic Device Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Wuhan Zhong Dao Optoelectronic Device Co Ltd filed Critical Wuhan Zhong Dao Optoelectronic Device Co Ltd
Priority to CN201910448588.XA priority Critical patent/CN110132999B/en
Publication of CN110132999A publication Critical patent/CN110132999A/en
Application granted granted Critical
Publication of CN110132999B publication Critical patent/CN110132999B/en
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Classifications

    • GPHYSICS
    • G01MEASURING; TESTING
    • G01NINVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84Systems specially adapted for particular applications
    • G01N21/88Investigating the presence of flaws or contamination
    • G01N21/8806Specially adapted optical and illumination features
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01NINVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84Systems specially adapted for particular applications
    • G01N21/88Investigating the presence of flaws or contamination
    • G01N21/95Investigating the presence of flaws or contamination characterised by the material or shape of the object to be examined
    • G01N21/956Inspecting patterns on the surface of objects
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01NINVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84Systems specially adapted for particular applications
    • G01N21/88Investigating the presence of flaws or contamination
    • G01N21/8806Specially adapted optical and illumination features
    • G01N2021/8822Dark field detection
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01NINVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84Systems specially adapted for particular applications
    • G01N21/88Investigating the presence of flaws or contamination
    • G01N21/8806Specially adapted optical and illumination features
    • G01N2021/8835Adjustable illumination, e.g. software adjustable screen

Landscapes

  • Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Biochemistry (AREA)
  • General Health & Medical Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Immunology (AREA)
  • Pathology (AREA)
  • Investigating Materials By The Use Of Optical Means Adapted For Particular Applications (AREA)
  • Image Processing (AREA)

Abstract

The invention discloses a kind of imaging systems and method for detecting FPD substrate, are related to FPD base board defect detection technique field.System includes: in-line illumination device, is used to highlight the orientative feature of circuit line on FPD substrate;Image collecting device is used to acquire the first image for being highlighted the FPD substrate of circuit line orientative feature;Dark-ground illumination device is used to highlight the defect characteristic of circuit line on FPD substrate;Image processing apparatus is used for the angle according to the first image determination circuitry lines, and FPD substrate is marked off different characteristic areas according to the angle of circuit line;Image collecting device is also used to acquire the second image of all characteristic areas, and image processing apparatus carries out defect characteristic identification after obtaining all second images, and positions to the image of defective feature.The present invention highlights the feature of circuit line on FPD substrate using in-line illumination device and dark-ground illumination device, improves the accuracy to the detection of FPD base board defect and detection efficiency.

Description

A kind of imaging system and method detecting FPD substrate
Technical field
The present invention relates to FPD base board defect detection technique field and field, is specifically related to a kind of imaging for detecting FPD substrate System and method.
Background technique
In FPD substrate actual production process, for example there are wire fractures, notch, lines for FPD substrate surface circuit for often appearance All kinds of defects such as edge protuberance, lines hole, the accumulation of non-fringe area, in this regard, need by FPD base board defect detection technique come Realize the detection of FPD base board defect.In particular, being detected for FPD base board defect usual in FPD substrate detection technique FPD substrate surface defects image is obtained using isolated bright field illumination or dark-ground illumination, thus lacking according to FPD substrate surface Sunken image determines specific defect type.
And in the case where using isolated bright field illumination or dark-ground illumination, interference is generated to the imaging of camera, to camera Resolution requirement is higher, and still insufficient to the detection dynamics of FPD substrate surface, is difficult to find such as line in the detection process Item fracture, notch, line edge protrusion, lines hole, the segmental defects such as non-fringe area accumulation.Therefore, it improves at present to FPD base The inspecting force of plate surface defect plays particularly important effect to the quality improving of FPD substrate.
Summary of the invention
The purpose of the invention is to overcome the isolated bright field illumination or dark-ground illumination in above-mentioned background technique Under, interference is generated to the imaging of camera, the deficiency of FPD substrate circuit line defect is difficult to find in the detection process, provides one The imaging system and method for kind detection FPD substrate.
The present invention provides a kind of imaging system for detecting FPD substrate comprising:
In-line illumination device, the in-line illumination device are used to highlight the orientative feature of circuit line on FPD substrate;
Image collecting device is used to acquire the first image for being highlighted the FPD substrate of circuit line orientative feature;
Dark-ground illumination device, the dark-ground illumination device are used to highlight the defect characteristic of circuit line on FPD substrate;
Image processing apparatus is used for the angle according to the first image determination circuitry lines, and according to circuit line Angle marks off FPD substrate different characteristic areas;
Described image acquisition device, which is also used to acquire one by one, simultaneously is highlighted all described of FPD circuit line defect characteristic Second image of characteristic area;Described image processing unit carries out defect characteristic identification after being also used to obtain all second images, And the image of defective feature is positioned.
Preferred embodiment: described image acquisition device is camera, and the in-line illumination device is connected on the camera lens of camera, institute The light for stating in-line illumination device is parallel with the primary optical axis of camera lens.
Preferred embodiment: the light ejecting end of the in-line illumination device is equipped with object lens, and the object lens are for amplifying FPD substrate Upper circuit line improves the image definition of image collecting device.
Preferred embodiment: the dark-ground illumination device is set in the outer circle of object lens, and dark-ground illumination device provides for object lens to be set Determine the dark field light of angle.
Preferred embodiment: the system also includes: control the light source control of the in-line illumination device and dark-ground illumination device Device, the light source control device are electrically connected with in-line illumination device and dark-ground illumination device respectively, the light source control device For controlling the working condition of in-line illumination device and dark-ground illumination device.
Preferred embodiment: the camera is linear array CCD camera or Matrix C CD camera.
Another aspect of the present invention additionally provides a kind of imaging method for detecting FPD substrate, and the method includes following steps It is rapid:
FPD substrate to be detected is placed in the range of the image acquisition region of image collecting device;
The light source for opening in-line illumination device, highlights the orientative feature of FPD substrate circuit lines;
Image acquisition device is highlighted the first image of the FPD substrate of circuit line orientative feature;
Image processing apparatus is according to the angles of the first image determination circuitry lines, and according to the angle handle of circuit line FPD substrate marks off different characteristic areas;
The light source of in-line illumination device is closed, the light source of dark-ground illumination device is opened, highlights circuit line on FPD substrate Defect characteristic;
Image collecting device acquires the second figure for being highlighted all characteristic areas of FPD circuit line defect characteristic one by one Picture;
Image processing apparatus, which obtains, carries out defect characteristic identification after all second images, and to the image of defective feature into Row positioning.
Preferred embodiment: the light source for opening dark-ground illumination device specifically:
The absolute value A of the difference between the light-source angle of dark-ground illumination device and the angle of circuit line is calculated, wherein 0≤ The dark field for meeting the angle of 45≤A≤90 is opened in A≤90.
Preferred embodiment: the defect characteristic is wire fractures, notch, line edge protrusion, lines hole, non-fringe area heap One of product is a variety of.
Based on the above technical solution, compared with prior art, advantages of the present invention is as follows:
The imaging system and method for a kind of detection FPD substrate of the invention are carried out in the circuit line to FPD substrate surface When detection, the light source for being first turned on in-line illumination device highlights the orientative feature of FPD substrate circuit lines, in-line illumination device It is the orientative feature for clearly highlighting FPD substrate circuit lines, it is corresponding dark to be selected according to circuit line orientative feature The angle of field lighting device;Dark-ground illumination device is used to clearly highlight the defect characteristic of circuit line on FPD substrate, reduces Unnecessary illumination bring interference.What camera can be more clear obtains the orientative feature of circuit line on FPD substrate and lacks Fall into the image of feature.The image of orientative feature and defect characteristic that image processing apparatus will acquire circuit line identified, and The image of defective feature is positioned.Improve the accuracy and detection efficiency that camera detects FPD base board defect.
Detailed description of the invention
Fig. 1 is the structural schematic diagram of the embodiment of the present invention;
Fig. 2 is the administrative division map of FPD substrate of the invention;
Fig. 3 is that the light angle of dark-ground illumination device of the invention defines figure.
Appended drawing reference: 1- image collecting device, 2- object lens, 3- dark-ground illumination device, 4- in-line illumination device, at 5- image Manage device, 6- light source control device, 7-FPD substrate.
Specific embodiment
With reference to the accompanying drawing and specific embodiment the present invention is described in further detail.
Shown in Figure 1, the embodiment of the present invention provides a kind of imaging system for detecting FPD substrate comprising:
In-line illumination device 4, the in-line illumination device 4 are used to highlight the orientative feature of circuit line on FPD substrate 7; On the coaxial light direct beam FPD substrate 7 that in-line illumination device 4 issues, illumination more evenly, coaxial-illuminating dress are provided than traditional lighting After setting on 4 direct projection FPD substrates 7, image collecting device 1 receives its reflected light, and brightness is more preferable, can reinforce circuit on FPD substrate 7 The orientative feature of lines forms obvious comparison in mirror surface, diffusing reflection or sorbent surface, reduces the transmission of transparent substance Rate.
Image collecting device 1 is used to acquire the first image for being highlighted the FPD substrate 7 of circuit line orientative feature.
Dark-ground illumination device 3, the dark-ground illumination device 3 are used to highlight the defect characteristic of circuit line on FPD substrate 7. The dark-ground illumination device 3 mainly utilizes the irreflexive feature of object, enhances the feature of surface texture, is capable of the convex of high degree Show such as wire fractures of circuit line on FPD substrate 7, notch, line edge protrusion, lines hole, non-fringe area accumulation Equal segmental defects.
Image processing apparatus 5 is used for the angle according to the first image determination circuitry lines, and according to circuit line Angle marks off FPD substrate 7 different characteristic areas.Meanwhile image collecting device 1 is also used to acquire one by one and is highlighted FPD Second image of all characteristic areas of circuit line defect characteristic;Image processing apparatus 5 is also used to obtain all second images Defect characteristic identification is carried out afterwards, and the image of defective feature is positioned.
Working principle
A kind of imaging system of detection FPD substrate of the invention, the imaging system when in use, first to be detected FPD substrate 7 is placed on the platform of the image acquisition region of image collecting device 1, secondly opens the light of in-line illumination device 4 Source, in-line illumination device 4 can clearly highlight the orientative feature of 7 circuit line of FPD substrate;Then image collecting device 1 Acquisition in-line illumination device 4 highlights the first image of the circuit line orientative feature of FPD substrate 7;Following image procossing dress Set 5 according to image collecting device 1 acquire FPD substrate 7 circuit line orientation the first image determination circuitry lines angle, And FPD substrate 7 is marked off according to the angle character of circuit line by different characteristic areas (as shown in Figure 2).
It is corresponding to open dark-ground illumination device 3 according to the angle of circuit line for the light source of then off in-line illumination device 4 The light source of angle, the light angle of the light source of dark-ground illumination device 3 and the angle vertical of circuit line are best light illumination angle Degree, dark-ground illumination device 3 highlight the wire fractures of circuit line on FPD substrate 7, notch, line edge protrusion, lines hole, The defects of non-fringe area is accumulated feature.Further image collecting device 1, which is also used to acquire one by one, is highlighted FPD circuit line and is lacked Fall into the second image of all characteristic areas of feature;Last image processing apparatus 5 carries out defect spy after obtaining all second images Sign identification, and the image of defective feature is positioned.
Preferred embodiment scheme: the image collecting device 1 is camera, camera be preferably but not limited to as linear array CCD camera or Matrix C CD camera, in-line illumination device 4 are connected on the camera lens of camera, the light of in-line illumination device 4 and the master of camera lens Optical axis is parallel.Object lens 2 are equipped in the light ejecting end of in-line illumination device 4, object lens 2 are for amplifying circuit line on FPD substrate 7 Item improves the image definition of camera.Dark-ground illumination device 3 is set in the outer circle of object lens 2, and dark-ground illumination device 3 is object lens 2 The dark field light of setting orientation angles is provided, what is be more clear highlights the defect characteristic of circuit line on FPD substrate 7.
Preferred embodiment scheme: a kind of imaging system of detection FPD substrate of the invention further includes control coaxial-illuminating dress The light source control device 6 of 4 and dark-ground illumination device 3 is set, which shines with in-line illumination device 4 and dark field respectively Bright device 3 is electrically connected, and light source control device 6 is used to control the working condition of in-line illumination device 4 and dark-ground illumination device 3, example Such as in-line illumination device 4 and the job order of dark-ground illumination device 3, working time, light intensity or light orientation angles.
Another aspect of the present invention additionally provides a kind of imaging method for detecting FPD substrate, and the method includes following steps It is rapid:
Step 1: FPD substrate 7 to be detected is placed in the range of the image acquisition region of image collecting device 1;
Step 2: opening the light source of in-line illumination device 4, highlight the orientative feature of 7 circuit line of FPD substrate;
Step 3: image collecting device 1 acquires the first image for being highlighted the FPD substrate 7 of circuit line orientative feature;
Step 4: image processing apparatus 5 is according to the angles of the first image determination circuitry lines, and according to circuit line Angle marks off FPD substrate 7 different characteristic areas;
Step 5: closing the light source of in-line illumination device 4, open the light source of dark-ground illumination device 3, highlight on FPD substrate 7 The defect characteristic of circuit line;
Step 6: image collecting device 1 acquires all characteristic areas for being highlighted FPD circuit line defect characteristic one by one Second image;
Step 7: image processing apparatus 5 carries out defect characteristic identification after obtaining all second images, and defect characteristic is lines One of fracture, notch, line edge protrusion, lines hole, the accumulation of non-fringe area are a variety of, and to the figure of defective feature As being positioned.
Preferred embodiment scheme: the light source of dark-ground illumination device 3 is opened in above-mentioned steps 5 specifically: image procossing dress The absolute value A of the difference between the light-source angle of 5 calculating dark-ground illumination devices 3 and the angle of circuit line is set, wherein 0≤A≤ 90, open the dark field for meeting the angle of 45≤A≤90.The light angle of dark-ground illumination device 3 defines as shown in figure 3, dark field The light angle of the light source of lighting device 3 and the angle vertical of circuit line are best light irradiating angle.
Those skilled in the art can carry out various modifications to the embodiment of the present invention and modification, if these modifications and change For type within the scope of the claims in the present invention and its equivalent technologies, then these modifications and variations are also in protection scope of the present invention Within.
The prior art that the content being not described in detail in specification is known to the skilled person.

Claims (9)

1. a kind of imaging system for detecting FPD substrate, characterized in that it comprises:
In-line illumination device (4), the orientation that the in-line illumination device (4) is used to highlight circuit line on FPD substrate (7) are special Sign;
Image collecting device (1) is used to acquire the first image for being highlighted the FPD substrate (7) of circuit line orientative feature;
Dark-ground illumination device (3), the defect that the dark-ground illumination device (3) is used to highlight circuit line on FPD substrate (7) are special Sign;
Image processing apparatus (5) is used for the angle according to the first image determination circuitry lines, and according to the angle of circuit line FPD substrate (7) is marked off different characteristic areas by degree;Meanwhile
Described image acquisition device (1) is also used to acquire all features for being highlighted FPD circuit line defect characteristic one by one Second image in region;Described image processing unit (5) carries out defect characteristic identification after being also used to obtain all second images, and The image of defective feature is positioned.
2. the system as claimed in claim 1, it is characterised in that:
Described image acquisition device (1) is camera, and the in-line illumination device (4) is connected on the camera lens of camera, described coaxial The light of lighting device (4) is parallel with the primary optical axis of camera lens.
3. the system as claimed in claim 1, it is characterised in that:
The light ejecting end of the in-line illumination device (4) is equipped with object lens (2), and the object lens (2) are for amplifying FPD substrate (7) Upper circuit line improves the image definition of image collecting device (1).
4. system as claimed in claim 3, it is characterised in that:
The dark-ground illumination device (3) is set in the outer circle of object lens (2), and dark-ground illumination device (3) is that object lens (2) provide setting The dark field light of angle.
5. the system as claimed in claim 1, which is characterized in that the system also includes:
Control the light source control device (6) of the in-line illumination device (4) and dark-ground illumination device (3), the light source control dress It sets (6) to be electrically connected with in-line illumination device (4) and dark-ground illumination device (3) respectively, the light source control device (6) is for controlling The working condition of in-line illumination device (4) and dark-ground illumination device (3).
6. system as claimed in claim 2, it is characterised in that: the camera is linear array CCD camera or Matrix C CD camera.
7. a kind of imaging method for detecting FPD substrate, which is characterized in that the described method comprises the following steps:
FPD substrate (7) to be detected is placed in the range of the image acquisition region of image collecting device (1);
The light source for opening in-line illumination device (4), highlights the orientative feature of FPD substrate (7) circuit line;
Image collecting device (1) acquisition is highlighted the first image of the FPD substrate (7) of circuit line orientative feature;
Image processing apparatus (5) is according to the angles of the first image determination circuitry lines, and according to the angle of circuit line FPD Substrate (7) marks off different characteristic areas;
The light source of in-line illumination device (4) is closed, the light source of dark-ground illumination device (3) is opened, highlights circuit on FPD substrate (7) The defect characteristic of lines;
Image collecting device (1) acquires the second image for being highlighted all characteristic areas of FPD circuit line defect characteristic one by one;
Image processing apparatus (5), which obtains, carries out defect characteristic identification after all second images, and to the image of defective feature into Row positioning.
8. the method for claim 7, which is characterized in that
The light source concrete mode for opening dark-ground illumination device (3) are as follows:
The absolute value A of the difference between the light-source angle of dark-ground illumination device (3) and the angle of circuit line is calculated, opens and meets The dark field of the angle of 45≤A≤90.
9. a kind of imaging method for detecting FPD substrate as claimed in claim 7, it is characterised in that: the defect characteristic is line One of item fracture, notch, line edge protrusion, lines hole, the accumulation of non-fringe area are a variety of.
CN201910448588.XA 2019-05-27 2019-05-27 Imaging system and method for detecting FPD substrate Active CN110132999B (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
CN201910448588.XA CN110132999B (en) 2019-05-27 2019-05-27 Imaging system and method for detecting FPD substrate

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
CN201910448588.XA CN110132999B (en) 2019-05-27 2019-05-27 Imaging system and method for detecting FPD substrate

Publications (2)

Publication Number Publication Date
CN110132999A true CN110132999A (en) 2019-08-16
CN110132999B CN110132999B (en) 2021-11-19

Family

ID=67582202

Family Applications (1)

Application Number Title Priority Date Filing Date
CN201910448588.XA Active CN110132999B (en) 2019-05-27 2019-05-27 Imaging system and method for detecting FPD substrate

Country Status (1)

Country Link
CN (1) CN110132999B (en)

Citations (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN102023164A (en) * 2009-09-23 2011-04-20 法国圣-戈班玻璃公司 Device and method for detecting local defects of transparent surface plate
JP2015055631A (en) * 2013-09-12 2015-03-23 ヒ ハン、ドン Inspection device of display panel
CN204359710U (en) * 2014-12-29 2015-05-27 武汉中导光电设备有限公司 A kind of glass surface defects pick-up unit
CN205941399U (en) * 2016-08-10 2017-02-08 武汉科技大学 A imaging system for lithium - ion battery pole pieces surface defect detection device
CN107688029A (en) * 2017-09-20 2018-02-13 广州视源电子科技股份有限公司 Appearance detecting method and device
CN207571049U (en) * 2017-12-13 2018-07-03 武汉中导光电设备有限公司 A kind of device for detecting tablet cleannes and flatness
JP2018146442A (en) * 2017-03-07 2018-09-20 キヤノン株式会社 Inspection device, inspection system, and method of manufacturing goods
CN207895143U (en) * 2017-12-13 2018-09-21 武汉中导光电设备有限公司 A kind of device for micro- coaxial-illuminating

Patent Citations (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN102023164A (en) * 2009-09-23 2011-04-20 法国圣-戈班玻璃公司 Device and method for detecting local defects of transparent surface plate
JP2015055631A (en) * 2013-09-12 2015-03-23 ヒ ハン、ドン Inspection device of display panel
CN204359710U (en) * 2014-12-29 2015-05-27 武汉中导光电设备有限公司 A kind of glass surface defects pick-up unit
CN205941399U (en) * 2016-08-10 2017-02-08 武汉科技大学 A imaging system for lithium - ion battery pole pieces surface defect detection device
JP2018146442A (en) * 2017-03-07 2018-09-20 キヤノン株式会社 Inspection device, inspection system, and method of manufacturing goods
CN107688029A (en) * 2017-09-20 2018-02-13 广州视源电子科技股份有限公司 Appearance detecting method and device
CN207571049U (en) * 2017-12-13 2018-07-03 武汉中导光电设备有限公司 A kind of device for detecting tablet cleannes and flatness
CN207895143U (en) * 2017-12-13 2018-09-21 武汉中导光电设备有限公司 A kind of device for micro- coaxial-illuminating

Also Published As

Publication number Publication date
CN110132999B (en) 2021-11-19

Similar Documents

Publication Publication Date Title
JP4357355B2 (en) Pattern inspection method and apparatus
CN107796825B (en) Device detection method
CN103196554B (en) System and method for testing and adjusting light intensity uniformity of light source
KR101679205B1 (en) Device for detecting defect of device
CN213933620U (en) Polarized light source and surface defect detection device
KR100281881B1 (en) cream solder inspection apparatus and the method thereof
CN105277574B (en) Multi-exposure image mixing detection method applying repeated exposure
US8184282B2 (en) Method and system for defect detection using transmissive bright field illumination and transmissive dark field illumination
US20100245560A1 (en) Method and device for imaging a fragmentation pattern formed in a ply of toughened glass
CN112129764A (en) Polarized light source, surface defect detection method and device
JP2020112367A (en) Wafer inspection device
CN109785290A (en) Normalized steel plate defect detection method is shone based on local light
JP2012083351A (en) Defect inspection device and method of the same
KR100785308B1 (en) Chip led surface inspection method and apparatus
CN105928952B (en) AOI control system and its control method
JP4184511B2 (en) Method and apparatus for defect inspection of metal sample surface
CN110132999A (en) A kind of imaging system and method detecting FPD substrate
JP2008175818A (en) Surface inspection apparatus and method
CN109087290B (en) Optical element surface defect detection method based on spectral estimation and electronic beam splitting technology
JP4444273B2 (en) Transparency or translucent article embossed character reading method and apparatus
JP2002243647A (en) Method of detecting and analyzing surface facture of sample
JP5011348B2 (en) Pattern inspection method and apparatus
JPH08136876A (en) Substrate inspecting device
KR100710703B1 (en) Inspection system for a measuring plating line width of semiconductor reed frame and thereof method
KR200336984Y1 (en) A device for inspecting surface and shape of an object of examination

Legal Events

Date Code Title Description
PB01 Publication
PB01 Publication
SE01 Entry into force of request for substantive examination
SE01 Entry into force of request for substantive examination
GR01 Patent grant
GR01 Patent grant